CN109830884A - A kind of modular VUV LASER device - Google Patents
A kind of modular VUV LASER device Download PDFInfo
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- CN109830884A CN109830884A CN201910244398.6A CN201910244398A CN109830884A CN 109830884 A CN109830884 A CN 109830884A CN 201910244398 A CN201910244398 A CN 201910244398A CN 109830884 A CN109830884 A CN 109830884A
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Abstract
The invention discloses a kind of modular VUV LASER devices, it is related to VUV LASER field, including laser, multiplier unit, the first reflector element, collimation unit, the second reflector element, focusing unit, ultravacuum bellows, external adjusting operating mechanism;The multiplier unit, first reflector element, the collimation unit, second reflector element, the focusing unit are disposed as independent modular unit, the multiplier unit, first reflector element, the collimation unit, second reflector element, the focusing unit are fixed on the independent external adjusting operating mechanism, the multiplier unit, first reflector element, the collimation unit, second reflector element, the focusing unit are sequentially connected by the ultravacuum bellows, form the transmission channel of light.VUV LASER device of the invention has the advantages that design is succinct, scalability is strong, easy to operate, at low cost.
Description
Technical field
The present invention relates to VUV LASER field more particularly to a kind of modular VUV LASER devices.
Background technique
Since the VUV LASER generated based on nonlinear optical crystal is had, wavelength is short, stable, generation efficiency is high
Advantage, VUV LASER has been widely used in various scientific experiment equipment, such as the superelevation based on VUV LASER
Energy resolution angle resolved photoelectron spectroscope instrument.It is usual as the angle resolved photoelectron spectroscope analytical equipment of light source using VUV LASER
Energy and momentum resolution all with higher.
Since ultraviolet light is easy to be absorbed in air, such device usually works under vacuum conditions, therefore current state
The inside and outside VUV LASER device used usually all has bulky vacuum cavity, not only takes up a large area, but also using
It is difficult to switch the fundamental frequency light source of its own in the process.Meanwhile the adjusting operating mechanism of such device generally also works in vacuum ring
Under border, need to meet vacuum work condition, cost is usually higher, and operation difficulty is big.In addition, the limit by vacuum cavity space
System generally increases optical component extremely inconvenient in the optical path, or even needs whole redesign, and scalability is not strong.And
Since vacuum cavity volume is big, pumping, gas washing time are long, cumbersome.The disadvantages mentioned above of existing ultraviolet light generating apparatus causes,
Causing it to be commercialized, difficulty is high, large-scale application is relatively difficult.
Therefore, those skilled in the art is dedicated to developing a kind of modular VUV LASER device, the vacuum
Ultraviolet laser apparatus has the advantages that design is succinct, scalability is strong, easy to operate, at low cost.
Summary of the invention
In view of the above drawbacks of the prior art, the technical problem to be solved by the present invention is to how reduce vacuum ultraviolet to swash
The vacuum cavity volume of electro-optical device reduces operation difficulty, reduces cost, propose scalability.
To achieve the above object, the present invention provides a kind of modular VUV LASER device, including laser, times
Frequency unit, the first reflector element, collimation unit, the second reflector element, focusing unit, ultravacuum bellows, external adjust operate
Mechanism;The laser is as basic frequency laser source;It is the multiplier unit, first reflector element, the collimation unit, described
Second reflector element, the focusing unit are disposed as independent modular unit, and the multiplier unit, first reflection are single
First, the described collimation unit, second reflector element, the focusing unit are fixed at independent external adjust and grasp
Make in mechanism, the multiplier unit includes multiplier unit inner chamber body, multiplier unit optical component, the multiplier unit optics member
Device is fixed in the multiplier unit inner chamber body;First reflector element includes the first reflector element inner chamber body, the
One reflector element optical component, the first reflector element optical component are fixed at the first reflector element inner chamber body
It is interior;The collimation unit includes collimation unit inner chamber body, collimation unit optical component, and the collimation unit optical component is solid
It is fixed to be arranged in the collimation unit inner chamber body;Second reflector element includes the second reflector element inner chamber body, the second reflection
Unit optical component, the second reflector element optical component are fixed in the second reflector element inner chamber body;
The focusing unit includes focusing unit inner chamber body, focusing unit optical component, and the focusing unit optical component is fixed
It is arranged in the focusing unit inner chamber body;The external operating mechanism that adjusts is for controlling the multiplier unit, described first
The posture of reflector element, the collimation unit, second reflector element, the focusing unit, the ultravacuum bellows will
The multiplier unit, first reflector element, the collimation unit, second reflector element, the focusing unit are successively
Connection, forms the transmission channel of light;The basic frequency laser that the laser issues, is converted into vacuum ultraviolet by the multiplier unit and swashs
Light is transmitted according still further to the transmission channel, is finally projected from the focusing unit.
Further, the multiplier unit optical component is the nonlinear optical crystal with deep ultraviolet frequency multiplication ability;
First reflector element optical component and the second reflector element optical component are laser mirror;The collimation unit optics member
Device is collimation lens;The focusing unit optical component is condenser lens.
Further, the multiplier unit, first reflector element, the collimation unit, second reflector element,
The focusing unit and the ultravacuum bellows pass through CF flange or KF flanged joint.
Further, the modular VUV LASER device further includes polarization unit, the polarization unit setting
It is independent modular unit, the polarization unit includes polarization unit inner chamber body, polarization unit optical component, the polarization
Unit optical component is fixed in the polarization unit inner chamber body;The polarization unit setting is single in second reflection
Between the first and described focusing unit, pass through between the polarization unit setting and second reflector element and the focusing unit
The ultravacuum bellows connection;The polarization unit setting is fixed on the independent external adjusting operating mechanism.
Further, the polarization unit optical component is one or more of combinations of polarizing film or wave plate, described
The polarization mode of polarization unit optical component be one of horizontal polarization, vertical polarization, left-hand polarization or dextropolarization or
Several combinations.
Further, the external operating mechanism that adjusts includes two-dimension translational platform, horizontal rotating table, inclination angle platform;Described two
The upper and lower surfaces for tieing up translation stage are horizontal plane;The horizontal rotating table includes rotation fixed part, rotating part, and the rotation is fixed
Portion is fixedly installed in the upper surface of the two-dimension translational platform, and the rotating part is set to the rotation fixed part top, the rotation
Transfer part and the rotation fixed part constitute revolute pair;The inclination angle platform includes inclination angle pedestal, inclination angle seat, and the inclination angle pedestal is fixed
It is installed on the rotating part upper surface, the inclination angle seat setting is at inclination angle pedestal top, the inclination angle seat and the inclination angle
Pedestal constitutes arc sliding pair;The modular unit is fixedly installed in inclination angle seat top.
Further, the driving method of the rotation of the rotating part and the rotation fixed part is manually or motor drives;
The driving method that the sliding of the inclination angle seat and the inclination angle pedestal is fascinated is manually or motor drives.
Further, filling high-purity nitrogen or inert gas in the transmission channel.
Further, the laser be all solid state laser, solid state laser, semiconductor laser, gas laser,
One of liquid laser, excimer laser or optical fiber laser.
The VUV LASER that the modular VUV LASER device generates is applied to femtosecond laser or picosecond swashs
Optical arena.
Compared with prior art, implementation through the invention at least has following advantageous effects:
1: modular VUV LASER device provided by the invention, small in size, occupied area is small, pumping, gas washing side
Just, easy to operate;
2: modular VUV LASER device provided by the invention, it is convenient to which switching is as the described of fundamental frequency light source
Laser, it is convenient to increase optical component in the VUV LASER device, scalability is strong;
3: modular VUV LASER device provided by the invention adjusts operating mechanism without work under vacuum conditions
Make, at low cost, easy to operate, utilization easy to spread.
It is described further below with reference to technical effect of the attached drawing to design of the invention, specific structure and generation, with
It is fully understood from the purpose of the present invention, feature and effect.
Detailed description of the invention
Fig. 1 is the system block diagram of a preferred embodiment of the invention;
Fig. 2 is the external side view for adjusting operating mechanism of a preferred embodiment of the invention.
Wherein, 1- first laser reflecting mirror;2- second laser reflecting mirror;3- supplementary lens;4- multiplier unit optics member device
Part;5- multiplier unit;6- ultravacuum bellows;The first reflector element of 7-;8- the first reflector element optical component;9- collimation is single
Member;10- collimation unit optical component;The second reflector element of 11-;12- the second reflector element optical component;13- polarization is single
Member;14- polarization unit optical component;15- focusing unit;16- focusing unit optical component;17- laser;18- module
Change unit;The inclination angle 19- platform;20- horizontal rotating table;21- two-dimension translational platform.
Specific embodiment
Multiple preferred embodiments of the invention are introduced below with reference to Figure of description, keep its technology contents more clear and just
In understanding.The present invention can be emerged from by many various forms of embodiments, and protection scope of the present invention not only limits
The embodiment that Yu Wenzhong is mentioned.
In the accompanying drawings, the identical component of structure is indicated with same numbers label, everywhere the similar component of structure or function with
Like numeral label indicates.The size and thickness of each component shown in the drawings are to be arbitrarily shown, and there is no limit by the present invention
The size and thickness of each component.Apparent in order to make to illustrate, some places suitably exaggerate the thickness of component in attached drawing.
As shown in Figure 1, modular VUV LASER device provided in this embodiment, including laser 17, frequency multiplication list
First 5, first reflector element 7, collimation unit 9, the second reflector element 11, focusing unit 15, ultravacuum bellows 6, polarization unit
13, external to adjust operating mechanism;Laser 17 is used as basic frequency laser source;Laser 17 be all solid state laser, solid state laser,
One of semiconductor laser, gas laser, liquid laser, excimer laser or optical fiber laser, the present embodiment
Preferably all solid state laser;Multiplier unit 5, the first reflector element 7, collimation unit 9, the second reflector element 11, polarization unit
13, focusing unit 9 is disposed as independent modular unit 18, multiplier unit 5, the first reflector element 7, collimation unit 9, second
Reflector element 11, polarization unit 13, focusing unit 15 are fixed on independent external adjusting operating mechanism, multiplier unit
5 include multiplier unit inner chamber body, multiplier unit optical component 4, and multiplier unit optical component 4 is fixed at multiplier unit
In inner chamber body, multiplier unit optical component 4 is the nonlinear optical crystal with deep ultraviolet frequency multiplication ability;First reflector element
7 include the first reflector element inner chamber body, the first reflector element optical component 8, and the fixation of the first reflector element optical component 8 is set
It sets in the first reflector element inner chamber body, the first reflector element optical component 8 is laser mirror;Collimation unit 9 includes standard
Straight unit inner chamber body, collimation unit optical component 10, collimation unit optical component 10 are fixed at the collimation unit
In inner chamber body, collimation unit optical component 10 is collimation lens;Second reflector element 11 include the second reflector element inner chamber body,
Second reflector element optical component 12, the second reflector element optical component 12 are fixed at the second reflector element inner chamber body
Interior, the second reflector element optical component is laser mirror;Polarization unit 13 includes polarization unit inner chamber body, polarization unit light
Component 14 is learned, polarization unit optical component 14 is fixed in polarization unit inner chamber body, polarization unit optical component
14 for polarizing film or wave plate one or more of combinations, the polarization mode of polarization unit optical component 14 be horizontal polarization,
The combination of one or more of vertical polarization, left-hand polarization or dextropolarization;The present embodiment polarization unit optical component 14
Preferably polarizing film, the polarization mode of polarization unit optical component 14 are preferably horizontal polarization;The setting of polarization unit 13 is the
Between two reflector elements 12 and focusing unit 15;Focusing unit 15 includes focusing unit inner chamber body, focusing unit optical component
16, focusing unit optical component 16 is fixed in the focusing unit inner chamber body, and focusing unit optical component 16 is
Condenser lens;Outside adjusts operating mechanism for controlling multiplier unit 5, the first reflector element 7, the reflection list of collimation unit 9, second
Member 11, the posture of polarization unit 13, focusing unit 15;Each independent modular unit 18 is provided with the independence of different directions
Connector, connector can be used for be evacuated, inflation, observation or connection;The each independent modular unit 18 of the present embodiment is set
The connector quantity set is 5, and ultravacuum bellows 6 passes through the connector outside each independent modular unit 18 for multiplier unit
5, the first reflector element 7, collimation unit 9, the second reflector element 11, polarization unit 13, focusing unit 15 are sequentially connected, and form light
Transmission channel, filling high-purity nitrogen or inert gas, the present embodiment are preferably nitrogen in transmission channel;Multiplier unit 5,
One reflector element 7, collimation unit 9, the second reflector element 11, polarization unit 13, focusing unit 15 pass through with ultravacuum bellows 6
CF flange or KF flanged joint, the present embodiment use CF flanged joint.
As shown in Fig. 2, the external operating mechanism that adjusts includes two-dimension translational platform 21, horizontal rotating table 20, inclination angle platform 19;Two dimension
The upper and lower surfaces of translation stage 21 are horizontal plane;Horizontal rotating table 20 includes rotation fixed part, rotating part, and rotation fixed part is fixed
It is installed on the upper surface of two-dimension translational platform 21, rotating part is set to rotation fixed part top, and rotating part and rotation fixed part are constituted
Revolute pair;Inclination angle platform 19 includes inclination angle pedestal, inclination angle seat, and inclination angle pedestal is fixedly installed in rotating part upper surface, inclination angle seat setting
On inclination angle pedestal top, inclination angle seat and inclination angle pedestal constitute arc sliding pair;Modular unit 18 is fixedly installed on the seat of inclination angle
Portion.By adjusting two-dimension translational platform 21, the position of adjustable modular unit entirety;It, can by adjusting horizontal rotating table 20
To adjust modular unit level angle, by adjusting inclination angle platform 19, the inclination angle of adjustable modular unit.Rotating part and rotation
The driving method for turning the rotation of fixed part is manually or motor drives, and the present embodiment is preferably manual actuation;Inclination angle seat and inclination angle
The driving method that the sliding of pedestal is fascinated is manually or motor drives, and the present embodiment is preferably manual actuation.
Basic frequency laser is issued by laser, after first laser reflecting mirror 1, second laser reflecting mirror 2, supplementary lens 3
It is converted into VUV LASER after into multiplier unit 5, according still further to successively by the first reflector element 7, collimation unit 9, second
Reflector element 11, polarization unit 13 are finally projected from focusing unit 15.
The light for the VUV LASER that the modular VUV LASER device provided through this embodiment finally projects
Spot diameter can be continuously adjusted between 1um-100um, and the photon energy of injection is continuously adjusted between 6.7eV-7.5eV, can
To be applied to femtosecond laser and picosecond laser field.
The preferred embodiment of the present invention has been described in detail above.It should be appreciated that the ordinary skill of this field is without wound
The property made labour, which according to the present invention can conceive, makes many modifications and variations.Therefore, all technician in the art
Pass through the available technology of logical analysis, reasoning, or a limited experiment on the basis of existing technology under this invention's idea
Scheme, all should be within the scope of protection determined by the claims.
Claims (10)
1. a kind of modular VUV LASER device, which is characterized in that single including laser, multiplier unit, the first reflection
Member, collimation unit, the second reflector element, focusing unit, ultravacuum bellows, external adjusting operating mechanism;The laser is made
For basic frequency laser source;It is the multiplier unit, first reflector element, the collimation unit, second reflector element, described
Focusing unit is disposed as independent modular unit, the multiplier unit, first reflector element, the collimation unit,
Second reflector element, the focusing unit are fixed on the independent external adjusting operating mechanism, and described times
Frequency unit includes multiplier unit inner chamber body, multiplier unit optical component, and the multiplier unit optical component is fixed at
In the multiplier unit inner chamber body;First reflector element includes the first reflector element inner chamber body, the first reflector element optics
Component, the first reflector element optical component are fixed in the first reflector element inner chamber body;The collimation unit
Including collimation unit inner chamber body, collimation unit optical component, the collimation unit optical component is fixed at the standard
In straight unit inner chamber body;Second reflector element includes the second reflector element inner chamber body, the second reflector element optical component,
The second reflector element optical component is fixed in the second reflector element inner chamber body;The focusing unit includes
Focusing unit inner chamber body, focusing unit optical component, it is single that the focusing unit optical component is fixed at the focusing
In first inner chamber body;The external operating mechanism that adjusts is for controlling the multiplier unit, first reflector element, the collimation
The posture of unit, second reflector element, the focusing unit, the ultravacuum bellows is by the multiplier unit, described
First reflector element, the collimation unit, second reflector element, the focusing unit are sequentially connected, and form the transmission of light
Channel;The basic frequency laser that the laser issues, is converted into VUV LASER by the multiplier unit, according still further to the transmission
Channel is transmitted, and is finally projected from the focusing unit.
2. modular VUV LASER device as described in claim 1, which is characterized in that the multiplier unit optics member
Device is the nonlinear optical crystal with deep ultraviolet frequency multiplication ability;First reflector element optical component and the second reflector element
Optical component is laser mirror;The collimation unit optical component is collimation lens;The focusing unit optics member device
Part is condenser lens.
3. modular VUV LASER device as claimed in claim 2, which is characterized in that the multiplier unit, described
First reflector element, the collimation unit, second reflector element, the focusing unit and the ultravacuum bellows pass through
CF flange or KF flanged joint.
4. modular VUV LASER device as claimed in claim 3, which is characterized in that the modular vacuum is purple
Outer laser aid further includes polarization unit, and the polarization unit setting is independent modular unit, and the polarization unit includes
Polarization unit inner chamber body, polarization unit optical component, it is single that the polarization unit optical component is fixed at the polarization
In first inner chamber body;The polarization unit is arranged between second reflector element and the focusing unit, the polarization unit
It is connected between setting and second reflector element and the focusing unit by the ultravacuum bellows;The polarization unit
Setting is fixed on the independent external adjusting operating mechanism.
5. modular VUV LASER device as claimed in claim 4, which is characterized in that the polarization unit optics member
Device is one or more of combinations of polarizing film or wave plate, and the polarization mode of the polarization unit optical component is horizontal inclined
The combination of one or more of vibration, vertical polarization, left-hand polarization or dextropolarization.
6. modular VUV LASER device as claimed in claim 5, which is characterized in that the external adjusting operation machine
Structure includes two-dimension translational platform, horizontal rotating table, inclination angle platform;The upper and lower surfaces of the two-dimension translational platform are horizontal plane;The level
Turntable includes rotation fixed part, rotating part, and the rotation fixed part is fixedly installed in the upper surface of the two-dimension translational platform, institute
It states rotating part and is set to the rotation fixed part top, the rotating part and the rotation fixed part constitute revolute pair;It is described to incline
Angle platform includes inclination angle pedestal, inclination angle seat, and the inclination angle pedestal is fixedly installed in the rotating part upper surface, the inclination angle seat setting
On inclination angle pedestal top, the inclination angle seat and the inclination angle pedestal constitute arc sliding pair;The modular unit is fixed
It is installed on inclination angle seat top.
7. modular VUV LASER device as claimed in claim 6, which is characterized in that the rotating part and the rotation
The driving method for turning the rotation of fixed part is manually or motor drives;What the sliding of the inclination angle seat and the inclination angle pedestal was fascinated
Driving method is manually or motor drives.
8. modular VUV LASER device as claimed in claim 7, which is characterized in that filling in the transmission channel
High-purity nitrogen or inert gas.
9. modular VUV LASER device as claimed in claim 8, which is characterized in that the laser is all solid state
Laser, solid state laser, semiconductor laser, gas laser, liquid laser, excimer laser or optical fiber laser
One of.
10. the VUV LASER that the modular VUV LASER device as described in any one of claim 6~9 generates
Applied to femtosecond laser or picosecond laser field.
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CN201910244398.6A CN109830884B (en) | 2019-03-28 | 2019-03-28 | Modular vacuum ultraviolet laser device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111103311A (en) * | 2019-12-12 | 2020-05-05 | 上海交通大学 | Picosecond laser driven ultrafast X-ray dynamic imaging method |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001352116A (en) * | 2000-06-07 | 2001-12-21 | Nikon Corp | Laser device, aligner using the same, and exposing method |
CN101102033A (en) * | 2006-07-08 | 2008-01-09 | 深圳市大族激光科技股份有限公司 | Four-time harmonic solid laser |
KR101349898B1 (en) * | 2012-08-30 | 2014-01-16 | 한국과학기술연구원 | Module for extreme ultra-violet beam generation |
CN104064949A (en) * | 2014-05-30 | 2014-09-24 | 中国科学院理化技术研究所 | Deep ultraviolet laser generating and transmitting device |
US20150139255A1 (en) * | 2012-07-12 | 2015-05-21 | Kla-Tencor Corporation | Reducing The Spectral Bandwidth Of Lasers |
CN107086430A (en) * | 2017-06-09 | 2017-08-22 | 武汉安扬激光技术有限责任公司 | A kind of third harmonic generation ultraviolet laser |
-
2019
- 2019-03-28 CN CN201910244398.6A patent/CN109830884B/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001352116A (en) * | 2000-06-07 | 2001-12-21 | Nikon Corp | Laser device, aligner using the same, and exposing method |
CN101102033A (en) * | 2006-07-08 | 2008-01-09 | 深圳市大族激光科技股份有限公司 | Four-time harmonic solid laser |
US20150139255A1 (en) * | 2012-07-12 | 2015-05-21 | Kla-Tencor Corporation | Reducing The Spectral Bandwidth Of Lasers |
KR101349898B1 (en) * | 2012-08-30 | 2014-01-16 | 한국과학기술연구원 | Module for extreme ultra-violet beam generation |
CN104064949A (en) * | 2014-05-30 | 2014-09-24 | 中国科学院理化技术研究所 | Deep ultraviolet laser generating and transmitting device |
CN107086430A (en) * | 2017-06-09 | 2017-08-22 | 武汉安扬激光技术有限责任公司 | A kind of third harmonic generation ultraviolet laser |
Non-Patent Citations (2)
Title |
---|
SHIZHEN XU ET AL.: "Effect of UV laser conditioning on fused silica in vacuum", 《OPTICAL MATERIALS》 * |
安海霞: "高功率激光装备小型化轻量化技术", 《中国光学》 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111103311A (en) * | 2019-12-12 | 2020-05-05 | 上海交通大学 | Picosecond laser driven ultrafast X-ray dynamic imaging method |
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