CN109775416A - 基板传输单元与镀膜设备 - Google Patents
基板传输单元与镀膜设备 Download PDFInfo
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- 239000010687 lubricating oil Substances 0.000 claims description 5
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- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H18/00—Winding webs
- B65H18/08—Web-winding mechanisms
- B65H18/14—Mechanisms in which power is applied to web roll, e.g. to effect continuous advancement of web
- B65H18/145—Reel-to-reel type web winding and unwinding mechanisms
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
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- B65H16/10—Arrangements for effecting positive rotation of web roll
- B65H16/106—Arrangements for effecting positive rotation of web roll in which power is applied to web roll
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B65H23/08—Registering, tensioning, smoothing or guiding webs longitudinally by retarding devices, e.g. acting on web-roll spindle acting on web roll being unwound
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- C—CHEMISTRY; METALLURGY
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
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- Physical Vapour Deposition (AREA)
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Abstract
本发明公开了一种基板传输单元与镀膜设备。基板传输单元包括传动轴、多个传输滚轮与多个轴承。这些传输滚轮分别用以传输基板。每一个传输滚轮经由对应的轴承而组装至传动轴。每一个轴承包括转子以及定子。每一个传输滚轮固定至对应的转子。定子固定至传动轴。转子与定子之间具有平行于传动轴的轴向的磁性互斥力。定子经由磁性互斥力于转子与定子之间产生的摩擦力带动转子转动。
Description
技术领域
本发明涉及一种传输单元与镀膜设备,尤其涉及一种基板传输单元与镀膜设备。
背景技术
现今,高效率的卷对卷工艺普遍应用于许多产品的工艺中,以降低制造成本。为了进一步提升产量而降低制造成本,在现有的卷对卷工艺设备中,会同时设置多个传输滚轮以同时传输多种基板。然而,在工艺中,各个传输滚轮所传输的基板的张力大小可能有所差异,并导致部分的基板难以精准对位或甚至松脱。若要以个别驱动各个传输滚轮的方式解决上述问题,会面临机构设计困难以及设备成本过高的问题。
发明内容
本发明提供一种基板传输单元与镀膜设备,可解决各个传输滚轮所传输的基板的张力大小有差异的问题。
本发明的基板传输单元包括传动轴、多个传输滚轮与多个轴承。这些传输滚轮分别用以传输基板。每一个传输滚轮经由对应的轴承而组装至传动轴。每一个轴承包括转子以及定子。每一个传输滚轮固定至对应的转子。定子固定至传动轴。转子与定子之间具有平行于传动轴的轴向的磁性互斥力。定子经由磁性互斥力于转子与定子之间产生的摩擦力带动转子转动。
本发明的镀膜设备包括如前述的基板传输单元、放卷单元、镀膜单元以及收卷单元。前述的基板为镀膜屏蔽。放卷单元用以输出目标基板。镀膜单元用以经由镀膜屏蔽而镀膜于目标基板。收卷单元用以回收镀膜完成的目标基板。
基于上述,在本发明的基板传输单元与镀膜设备中,定子经由磁性互斥力于转子与定子之间产生的摩擦力带动转子转动。因此,转子与定子之间可适度地产生相对转动,进而达成适时调整张力大小的目的。
为让本发明的上述特征和优点能更明显易懂,下文特举实施例,并配合附图作详细说明如下。
附图说明
图1是依照本发明一实施例的镀膜设备的示意图。
图2是依照本发明一实施例的基板传输单元的立体示意图。
图3是图2的基板传输单元的轴承处的剖面示意图。
图4是图2的基板传输单元的轴承的分解示意图。
图5A与图5B分别是图2的基板传输单元在调整轴承的位置的前后的示意图。
图6A与图6B分别是本发明另一实施例的基板传输单元在调整轴承的位置的前后的示意图。
【符号说明】
10:基板
20:目标基板
100:基板传输单元
110、110A:传动轴
112:定位点
114:定位平面
120:传输滚轮
130:轴承
132:转子
132A:筒体
132B:底盘
132C:第一磁铁
134:定子
134C:第二磁铁
136:润滑油
138:定位销
1000:镀膜设备
1200:收卷单元
1300:镀膜单元
1400:放卷单元
1500:主滚轮
1600:真空腔体
M10:磁性互斥力
D10:轴向
F10:摩擦力
C10:内腔
W12:轴向壁
W14:径向壁
具体实施方式
图1是依照本发明一实施例的镀膜设备的示意图。请参照图1,本发明一实施例的镀膜设备1000包括至少一个基板传输单元100、一放卷单元1400、一镀膜单元1300以及一收卷单元1200。本实施例中,有两个基板传输单元100是如下将介绍的本发明一实施例的基板传输单元100。在其他实施例中,镀膜设备1000也可以仅包括一个如下将介绍的本发明一实施例的基板传输单元100,而与此基板传输单元100搭配用以收放基板10的另一基板传输单元可以与基板传输单元100采用不同设计。基板传输单元100所传输的基板10为镀膜屏蔽。本实施例的基板传输单元100所传输的基板10是制作成连续条状的,且适合收纳成卷。放卷单元1400用以输出一目标基板20。镀膜单元1300用以经由镀膜屏蔽而镀膜于目标基板20。收卷单元1200用以回收镀膜完成的目标基板20。
此外,依据实际需求,本实施例的镀膜设备1000可还包括一主滚轮1500或是其他组件。另外,本实施例的镀膜设备1000可还包括一真空腔体1600。镀膜单元1300位于真空腔体1600内。因此,本实施例的镀膜单元1300是在真空环境下操作,但本发明不局限于此。此外,本实施例的镀膜单元1300是在真空环境下对基板20进行镀膜,因此用于在镀膜时承载目标基板20的主滚轮1500也位于真空腔体1600内。另外,基板传输单元100、放卷单元1400以及收卷单元1200也可选择性地放在真空腔体1600内。
图2是依照本发明一实施例的基板传输单元的立体示意图。请参照图2,本发明一实施例的基板传输单元100可应用于如图1所示的镀膜设备1000,但本发明不局限于此。本实施例的基板传输单元100包括一传动轴110、多个传输滚轮120与多个轴承130。每个传输滚轮120用以传输一基板10。每一个传输滚轮120经由对应的一个轴承130而组装至传动轴110。由于本实施例中是以单一传动轴110带动多个传输滚轮120,因此可以简化传动机构的设计且节省所占用的空间。每个传输滚轮120所传输的基板10可以是相同或不同的。
图3是图2的基板传输单元的轴承处沿着传动轴110的轴向剖下所得的剖面示意图。请参照图2与图3,本实施例的每一个轴承130包括一转子132以及一定子134。每一个传输滚轮120固定至对应的转子132。定子134固定至传动轴110。转子132与定子134之间具有平行于传动轴110的一轴向D10的一磁性互斥力M10。换言之,转子132施加磁性互斥力M10于定子134,且定子134施加磁性互斥力M10于转子132。定子134经由磁性互斥力M10于转子132与定子134之间产生的一摩擦力F10带动转子132转动。换言之,磁性互斥力M10使定子134倾向于远离转子132,但磁性互斥力M10也将定子134压附于转子132上远离磁性互斥力M10发生的一侧的另一侧上。因此,当定子134被传动轴110带动旋转时,在定子134与转子132彼此紧密压附的接合面上便会产生摩擦力F10,而摩擦力F10带动转子132转动。摩擦力F10基本上垂直于传动轴110的轴向D10。
在本实施例的基板传输单元100中,单一传动轴110带动多个传输滚轮120。在运作时,可能因为所剩余的卷料的半径大小不同或其他差异而导致不同传输滚轮120上的基板10承受不同的张力。但是,因为传输滚轮120不是直接固定于传动轴110上,所以可以允许传输滚轮120相对传动轴110转动,进而达成调整基板10所承受的张力的大小的目的,同时避免基板10与图1的目标基板20之间产生摩擦而降低合格率。而且,定子134是施加非接触式的磁性互斥力M10于转子132,因此可减少定子134与转子132可能产生的机械磨耗,避免需要频繁更换轴承130而降低产量。
图4是图2的基板传输单元的轴承的分解示意图。请参照图3与图4,本实施例的每一个转子132例如包括一筒体132A以及一底盘132B。筒体132A具有一内腔C10。内腔C10具有一轴向壁W12与一径向壁W14。底盘132B组装至筒体132A。定子134配置于内腔C10内且被限位于底盘132B与径向壁W14之间。当定子134被传动轴110带动旋转时,底盘132B施加于定子134的磁性互斥力使定子134紧密压附于筒体132A的内腔C10的径向壁W14,且定子134与径向壁W14之间产生的摩擦力F10就会带动转子132转动。此外,本实施例的轴承130例如还包括润滑油136,配置于轴向壁W12与径向壁W14,用以排除机械加工精度限制以及转子132与定子134相对运动不顺畅的问题,并提供各传输滚轮120均一的传动阻力。润滑油136例如是含氟且具有高黏度,适合于真空环境下工作而不会有挥发气体。
另外,本实施例的底盘132B例如是螺合于筒体132A,但本发明不局限底盘132B与筒体132A的组装方式。此外,本实施例的每一个转子132具有一第一磁铁132C,每一个定子134具有一第二磁铁134C,前述的磁性互斥力M10由第一磁铁132C与第二磁铁134C提供。举例来说,第一磁铁132C设置于底盘132B面对定子134的一侧,而第二磁铁134C设置于定子134面对底盘132B的一侧。
图5A与图5B分别是图2的基板传输单元在调整轴承的位置的前后的示意图。请参照图5A与图5B,传动轴110上例如具有多个定位点112,而轴承130是可拆卸地组装于定位点112。举例来说,每个定位点112可以是一个孔洞,而轴承130例如还包括一定位销138。当轴承130已经组装于所要的定位点112时,定位销138***对应的定位点112而达成定位的目的,如图5A。当要移动轴承130至另一个定位点112时,将定位销138从原本的定位点112取出,即可移动轴承130,并且在轴承130移动完成后将定位销138***新的对应的定位点112而达成定位的目的,如图5B。在图5A中,多个轴承130是等距离地组装于传动轴110上,而在图5B中,多个轴承130则是非等距离地组装于传动轴110上,使用者可根据需求选择。此外,轴承130也可以是固定于传动轴110上而无法移动,本发明对此不设限。另外,本实施例的多个定位点112之间是等距离的,但在其他实施例中多个定位点之间也可以是不等距离的。
图6A与图6B分别是本发明另一实施例的基板传输单元在调整轴承的位置的前后的示意图。请参照图6A与图6B,本实施例的基板传输单元与图5A的实施例相似,差异在于本实施例的传动轴110A不具有定位点。取而代之,本实施例的传动轴110A具有一个定位平面114。轴承130同样是通过定位销138而定位。当轴承130已经到达所要位置时,便将定位销138穿过轴承130而抵紧于定位平面114上。利用定位销138与定位平面114之间的紧迫接触,当定位销138与定位平面114之间欲产生相对位移时,就可通过摩擦力而阻止相对位移的产生,进而使轴承130定位在传动轴110A的固定位置上,如图6A。当要移动轴承130至另一个位置时,解除定位销138与定位平面114之间的接触关系,即可移动轴承130,并且在轴承130移动到新的位置后将定位销138再次抵紧于定位平面114上的新的位置以达成定位的目的,如图6B。在图6A与图6B的架构下,轴承130可以定位在传动轴110A上的任何位置,不会如图5A般受到定位孔112的位置的限制。
综上所述,在本发明的基板传输单元与镀膜设备中,传输滚轮不是直接固定于传动轴上,而是由定子经由磁性互斥力所产生的摩擦力带动传输滚轮转动。因此,当传输滚轮上的基板所承受的张力过大或过小时,转子与定子之间可适度地相对转动,进而达成适时调整张力大小的目的。
虽然本发明已以实施例公开如上,然其并非用以限定本发明,本领域普通技术人员在不脱离本发明的精神和范围内,当可作些许的更动与润饰,故本发明的保护范围当视权利要求所界定的范围为准。
Claims (15)
1.一种基板传输单元,其特征在于,包括:
传动轴;
多个传输滚轮,分别用以传输基板;
多个轴承,其中每一该些传输滚轮经由对应的该轴承而组装至该传动轴,每一该些轴承包括:
转子,其中每一该些传输滚轮固定至对应的该转子;以及
定子,固定至该传动轴,其中该转子与该定子之间具有平行于该传动轴的轴向的磁性互斥力,该定子经由该磁性互斥力于该转子与该定子之间产生的摩擦力带动该转子转动。
2.如权利要求1所述的基板传输单元,其特征在于,每一该些转子包括:
筒体,具有内腔,其中该内腔具有轴向壁与径向壁;以及
底盘,组装至该筒体,其中对应的该定子配置于该内腔内且被限位于该底盘与该径向壁之间,该传动轴转动时,该底盘与对应的该定子之间的该磁性互斥力使对应的该定子与该径向壁之间产生该摩擦力。
3.如权利要求2所述的基板传输单元,其特征在于,该些轴承还包括润滑油,配置于该些轴向壁与该些径向壁。
4.如权利要求2所述的基板传输单元,其特征在于,该些底盘螺合于该些筒体。
5.如权利要求1所述的基板传输单元,其特征在于,每一该些转子具有第一磁铁,每一该些定子具有第二磁铁,该些第一磁铁与该些第二磁铁之间存在该磁性互斥力。
6.如权利要求1所述的基板传输单元,其特征在于,该些轴承等距离地组装于该传动轴上。
7.如权利要求1所述的基板传输单元,其特征在于,该传动轴具有多个定位点,该些轴承可拆卸地组装于该些定位点。
8.一种镀膜设备,包括:
如权利要求1所述的基板传输单元,其特征在于,该些基板为多个镀膜屏蔽;
放卷单元,用以输出目标基板;
镀膜单元,用以经由该些镀膜屏蔽而镀膜于该目标基板;以及
收卷单元,用以回收镀膜完成的该目标基板。
9.如权利要求8所述的镀膜设备,其特征在于,每一该些转子包括:
筒体,具有内腔,其中该内腔具有轴向壁与径向壁;以及
底盘,组装至该筒体,其中对应的该定子配置于该内腔内且被限位于该底盘与该径向壁之间,该传动轴转动时,该底盘与对应的该定子之间的该磁性互斥力使对应的该定子与该径向壁之间产生该摩擦力。
10.如权利要求9所述的镀膜设备,其特征在于,该些轴承还包括润滑油,配置于该些轴向壁与该些径向壁。
11.如权利要求9所述的镀膜设备,其特征在于,该些底盘螺合于该些筒体。
12.如权利要求8所述的镀膜设备,其特征在于,每一该些转子具有第一磁铁,每一该些定子具有第二磁铁,该些第一磁铁与该些第二磁铁之间存在该磁性互斥力。
13.如权利要求8所述的镀膜设备,其特征在于,该些轴承等距离地组装于该传动轴上。
14.如权利要求8所述的镀膜设备,其特征在于,该传动轴具有多个定位点,该些轴承可拆卸地组装于该些定位点。
15.如权利要求8所述的镀膜设备,其特征在于,还包括真空腔体,其中该镀膜单元位于该真空腔体内。
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