CN109545442A - Transparent conductive film, touch screen and preparation method thereof - Google Patents

Transparent conductive film, touch screen and preparation method thereof Download PDF

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Publication number
CN109545442A
CN109545442A CN201710863459.8A CN201710863459A CN109545442A CN 109545442 A CN109545442 A CN 109545442A CN 201710863459 A CN201710863459 A CN 201710863459A CN 109545442 A CN109545442 A CN 109545442A
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CN
China
Prior art keywords
metal layer
layer
transparent
lead
particle clusters
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Pending
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CN201710863459.8A
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Chinese (zh)
Inventor
张鹏
侯晓伟
王培红
古荣治
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Jiangxi Xinfei New Material Co ltd
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Nanchang OFilm Display Technology Co Ltd
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Priority to CN201710863459.8A priority Critical patent/CN109545442A/en
Publication of CN109545442A publication Critical patent/CN109545442A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G02B5/0242Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0273Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278Diffusing elements; Afocal elements characterized by the use used in transmission
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Abstract

The invention relates to a transparent conductive film, wherein a first hard coating layer and/or a second hard coating layer contain a plurality of particle clusters, the particle clusters are formed by agglomeration of a plurality of nano particles, and the particle diameter of the nano particles is 10-50 nm. The particle clusters form a plurality of protrusions on the surface of the first metal layer and/or the second metal layer. Therefore, the transparent conductive film can be made resistant to blocking. Also, since the particle cluster is formed by agglomeration of a plurality of nanoparticles. Thus, precise control over the size of the individual nanoparticles is not required. When the particle cluster is formed, the bulge meeting the size requirement can be obtained only by controlling the quantity of the agglomerated nano particles. Therefore, when the transparent conductive film is prepared, the size of the nano particles is not required to be accurately controlled, and the obtained nano particles are not required to be screened, so that the process flow can be simplified, and the processing efficiency is improved. In addition, the invention also provides a touch screen and a preparation method thereof.

Description

Transparent conducting film, touch screen and preparation method thereof
Technical field
The present invention relates to capacitance type touch control screen technical field, in particular to a kind of transparent conducting film, touch screen and its Preparation method.
Background technique
Transparent conducting film is the core element of capacitance type touch control screen.With the rapid development of intelligent terminals, to transparent The demand of conductive membrane is also increasingly to increase.Transparent conducting film generally comprises substrate and is set to the hard of substrate two sides Coating, conductive layer and metal layer.Currently, having two-fold since amorphism thin polymer film is compared with crystalline polymer film Penetrate the less and uniform advantage of rate, therefore the substrate that most of transparent conductive film is formed using armorphous polymer thin film.
Amorphism thin polymer film is more fragile than crystalline polymer film, and surface is easier to be damaged.It is crimping When transparent conducting film makes its tubular, the metal layer that can have adjacent transparent conductive film generates adhesion and crimping each other The problem of.Therefore, occur adding particle in hard conating, so that layer on surface of metal forms the transparent conducting film of protrusion. Protrusion can make adjacent metal layer form point contact, to avoid sticking together and crimp.
In existing conductive film, the partial size of particle is generally micron order, and individual particle forms a protrusion.Due to being directed to The size (height) of protrusion requires.Therefore, it also needs to carry out stringent control to the size of each particle when particle is prefabricated System, so that the finally formed protrusion of particle is met the size requirements.Moreover, the particle prepared is also screened, and The particle for not meeting size requirement is rejected.In this way, in the preparation process of conductive film, need to carry out the size Control of particle with And subsequent particle screen selecting step, therefore process is increased, it is not high so as to cause the processing efficiency of conductive film.
Summary of the invention
Based on this, it is necessary to not high in processing efficiency for the existing transparent conducting film with resist blocking and that function Problem, providing a kind of can effectively promote transparent conducting film, touch screen of processing efficiency and preparation method thereof.
A kind of transparent conducting film, comprising:
Substrate, including the first surface and second surface being oppositely arranged;
It is sequentially formed in the first hard conating, the first transparency conducting layer and the first metal layer of the first surface;
It is sequentially formed in the second hard conating, the second transparency conducting layer and second metal layer of the second surface;
First hard conating and/or second hard conating contain multiple particle clusters, in the first metal layer And/or the surface of the second metal layer forms multiple protrusions, the particle clusters are agglomerated by multiple nanoparticles, and institute The partial size for stating nanoparticle is 10~50nm.
Since particle clusters are agglomerated by multiple nanoparticles.Therefore, for the size of single nanoparticle be not necessarily into Row is accurately controlled, as long as being located at its partial size within the scope of 10~50nm.When forming particle clusters, it need to only pass through control The protrusion met the size requirements can be obtained in the quantity of the nanoparticle of reunion.It can be seen that preparing above-mentioned transparent conductivity When film, does not both have to be accurately controlled the size of nanoparticle, be screened without to obtained nanoparticle, from And can simplification of flowsheet, and then promoted processing efficiency.
Further, since particle clusters are agglomerated by multiple nanoparticles, therefore particle clusters can not form smooth surface. Therefore, particle clusters increase relative to single micron-sized particle, surface roughness, so that adhesive force increases.
Further, multiple nanoparticles are difficult to avoid that meeting between adjacent nanoparticle when being agglomerated into particle clusters There are gaps.Therefore, particle clusters are internal to have " hollow structure " compared with single micron particles, therefore the screening to light Keep off declines.That is, include that the first hard conating of particle clusters and/or the light transmittance of the second hard conating increase, from And it can effectively improve the optical effect of transparent conducting film.
The substrate is polycyclic alkene or polycarbonate or polyethylene terephthalate in one of the embodiments, Film.
The two kinds of film can meet the requirement to the birefringence and its deviation of substrate, and convenient for obtaining.Cause This, can advantageously reduce the cost of transparent conducting film.
The distribution density of the protrusion is 100~3000/mm in one of the embodiments,2
When the distribution density of protrusion is excessive, the haze value that will lead to transparent conducting film is excessive, light transmission rate reduces, into And seriously affect the appearance and optical effect of transparent conducting film.And if the distribution density of protrusion is too small, resist blocking and that Effect is limited.In above-mentioned roughness and density range, transparent conducting film can preferably take into account resist blocking and that and optical effect.
The material of the particle clusters and first hard conating and second hard conating in one of the embodiments, It is identical.
That is, the optical parameter of particle clusters and the first hard conating and the second hard conating (being collectively referred to as hard conating below) It is identical.Therefore, in the linkage interface of particle clusters and hard conating, light propagates impacted smaller, particle clusters and hard conating Closer is an entirety.When light passes through the hard conating containing particle clusters, the distortion that round generates is smaller.Cause This, transparent conducting film is achieving the purpose that resist blocking and that, resistance to compression connect simultaneously, moreover it is possible to avoid its optical property by unfavorable shadow It rings.
The material of the particle clusters is silica, organosilicon polymer, acrylic compounds in one of the embodiments, Polymer or styrene polymer.
The above material has the advantage that translucency is good, is easily obtained, can be before meeting performance requirement for particle clusters Putting reduces cost.
In one of the embodiments, along perpendicular to the first metal layer and/or the second metal layer surface On direction, the height of the multiple protrusion is 0.1~0.5 μm.
The height of protrusion is higher, then resist blocking and that effect is better.But with the raising of height, the size phase of particle clusters It in requisition for increase, can also be increased with it so as to cause the haze value of transparent conducting film, and will be tight after reaching a certain level Ghost image rings the optical effect of transparent conducting film.And in above-mentioned altitude range, transparent conducting film can preferably be taken into account Resist blocking and that and optical effect.
The quantity for the nanoparticle that each particle clusters include in one of the embodiments, is less than 100.
Partial size is that the nanoparticle of 10~50nm is easy to get under existing processing technology, and can the more conveniently group of realization The control of poly- rate and degree.Therefore, the partial size of the nanoparticle used in the present embodiment is 10~50nm.
And when the partial size of nanoparticle is 10~50nm, when the quantity of nanoparticle is less than 100 in each particle clusters, " hollow structure " formed in particle clusters is evenly distributed, so that light transmission is uniform on the whole for particle clusters.Therefore, include The translucent effect of first hard conating of particle clusters and/or the second hard conating also more evenly, on surface when avoidable light passes through Light and dark region is formed, to further improve the optical effect of transparent conducting film.
The nanoparticle is spherical in shape in one of the embodiments, and/or elliposoidal.
Spherical or elliposoidal nanoparticle surface is smooth, therefore the surface of the particle clusters agglomerated into not will form hair The structures such as thorn, corner angle, to be avoided that particle clusters damage substrate.
Distance between particle clusters and substrate surface indicates that particle clusters are embedded in the first hard conating and/or the second hard conating Depth.Within this range, the fastness of particle clusters attachment can be increased while guaranteeing height of projection.
A kind of touch screen, touch screen transparent conducting film as described in any one of above preferred embodiment are made At the touch screen includes Touch Zone and lead district, and the first metal layer and the second metal layer are located at the lead district; The Touch Zone include as first transparency conducting layer etching made of first electrode and by the second transparency conducting layer etching and At second electrode;The lead district includes by the first metal layer and positioned at the first transparency conducting layer quilt of the lead district The first lead formed is etched, and is etched shape by the second metal layer and positioned at the second transparency conducting layer of the lead district At the second lead.
In above-mentioned touch screen, by the first metal layer, second metal layer, the first transparency conducting layer and the second transparency conducting layer Directly etching obtains first lead and the second lead.It is therefore not necessary to be formed and first electrode and the second electricity by silk-screen mode again The lead of pole electrical connection.Compared with traditional touch screen, due to being not necessarily to silk-screen, the contact conductor directly formed by yellow light process Width can further reduce, therefore touch screen has narrow frame.
A kind of preparation method of touch screen, comprising steps of
A kind of transparent conducting film as described in any one of above preferred embodiment is provided;
The first metal layer and the second metal layer are etched, to expose the first transparency conducting layer and second of Touch Zone Transparency conducting layer, and form the metal lead wire pattern for being located at lead district;
First transparency conducting layer and second transparency conducting layer are etched, to form the first electrode for being located at Touch Zone And second electrode, and form the transparent lead pattern for being located at lead district, the metal lead wire pattern and the transparent lead pattern Collectively form contact conductor.
Using the above method when preparing touch screen, directly to the first metal layer, second metal layer, the first transparency conducting layer And second transparency conducting layer be etched, first electrode, second electrode can be obtained and be electrically connected with first electrode, second electrode Contact conductor.It is therefore not necessary to lead be formed using silk-screen mode again, to effectively simplify technique, improve processing effect Rate.Moreover, there is narrow frame by touch screen prepared by the above method.
Detailed description of the invention
Fig. 1 is the stepped construction schematic diagram of transparent conducting film in present pre-ferred embodiments;
Fig. 2 is the enlarged drawing of the local A of transparent conducting film shown in Fig. 1;
Fig. 3 is the structural schematic diagram of particle clusters in transparent conducting film shown in Fig. 1;
Fig. 4 is the stepped construction schematic diagram of transparent conducting film in another embodiment of the present invention;
Fig. 5 is the stepped construction schematic diagram of touch screen in present pre-ferred embodiments;
Fig. 6 is the flow diagram of touch screen preparation method in present pre-ferred embodiments.
Specific embodiment
To facilitate the understanding of the present invention, a more comprehensive description of the invention is given in the following sections with reference to the relevant attached drawings.In attached drawing Give preferred embodiment of the invention.But the invention can be realized in many different forms, however it is not limited to herein Described embodiment.On the contrary, purpose of providing these embodiments is keeps the understanding to the disclosure more saturating It is thorough comprehensive.
It should be noted that it can directly on the other element when element is referred to as " being fixed on " another element Or there may also be elements placed in the middle.When an element is considered as " connection " another element, it, which can be, is directly connected to To another element or it may be simultaneously present centering elements.Term as used herein " vertical ", " horizontal ", " left side ", " right side " and similar statement are for illustrative purposes only.
Unless otherwise defined, all technical and scientific terms used herein and belong to technical field of the invention The normally understood meaning of technical staff is identical.Term as used herein in the specification of the present invention is intended merely to description tool The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term " and or " used herein includes one or more phases Any and all combinations of the listed item of pass.
Fig. 1 and Fig. 2 is please referred to, the transparent conducting film 10 in present pre-ferred embodiments includes that substrate 11, first is hard Coating 12, the first transparency conducting layer 13, the first metal layer 14, the second hard conating 22, the second transparency conducting layer 23 and the second metal Layer 24.
Substrate 11 includes the first surface (upper surface shown in Fig. 1) and second surface (lower surface shown in Fig. 1) being oppositely arranged. Substrate 11 is formed by amorphism thin polymer film.Since amorphism thin polymer film is smaller simultaneously than crystalline polymer film birefringence And uniformly, the uneven color in transparent conducting film 10 of the invention can be eliminated.For amorphism polymer of the invention Birefringence in the face of film is preferably 0~0.001, and further preferably 0~0.0005.It is poly- for amorphism of the invention The deviation for closing the birefringence in the face of object film is preferably 0.0005 hereinafter, further preferably 0.0003 or less.
Aforementioned birefringence and its deviation can be by selecting the amorphism thin polymer film of suitable type to reach.Specifically In the present embodiment, substrate 11 is polycyclic alkene or polycarbonate or pet film.The two types Film can meet the requirement of birefringence and its deviation.The substrate 11 formed by amorphism thin polymer film with a thickness of 20 μm ~200 μm.
First hard conating 12, the first transparency conducting layer 13 and the first metal layer 14 are sequentially formed in the first table of substrate 11 Face.Second hard conating 22, the second transparency conducting layer 23 and second metal layer 24 are sequentially formed in the second surface of substrate 11.Its In:
First hard conating 12 plays a protective role to the first surface of substrate 11.First hard conating 12 includes binder tree Rouge.The binder resin is including, for example, the hardening resin composition based on ultraviolet light, electron ray.Hardening resin composition It preferably comprises glycidyl acrylate based polymer and acrylic acid carries out polymer obtained from addition reaction.Alternatively, solidification Property resin combination preferably comprises polyfunctional acrylic ester polymer (pentaerythrite, dipentaerythritol etc.).Curable resin group Closing object also includes polymerization initiator.
First transparency conducting layer 13 is formed in the surface of the first hard conating 12.First transparency conducting layer 13 is by visible region Sheet resistance value (the unit: Ω/m of transmissivity height (80% or more) and per unit area in domain (380nm~780nm)2) be 500Ω/m2Layer below is formed.Preferred 15nm~the 100nm of thickness of first transparency conducting layer 13, more preferably 15nm~ 50nm.First transparency conducting layer 13 is for example by indium tin oxide (ITO), indium tin oxide or indium oxide-zinc oxide composites Any formation.
The first metal layer 14 is formed on the surface of the first transparency conducting layer 13.The first metal layer 14 is of the invention transparent When conductive membrane is used for such as touch panel, it is routed for being formed in the outside of touch input area.About forming the first gold medal Belong to the material of layer 15, representational is copper, silver, it is possible to use the arbitrary metal of excellent electric conductivity in addition to this.First The thickness of metal layer 14 is preferably 50nm~500nm, more preferably 100nm~300nm.
Further, the second hard conating 22, the second transparency conducting layer 23 and second metal layer 24 respectively with the first hard conating 12, the film layer structure of the first transparency conducting layer 13 and the first metal layer 14, function and material composition are identical, therefore no longer superfluous herein It states.
In addition, the first hard conating 12 and/or the second hard conating 22 contain multiple particle clusters 15, in the first metal layer 14 And/or the surface of second metal layer 24 forms multiple raised 16.Also referring to Fig. 3, particle clusters 15 are by multiple nanoparticles 151 agglomerate into.Wherein, the partial size of nanoparticle 151 is 10~50nm.
Specifically, particle clusters 15 can irregularly, first can also be distributed in preset rules (as equably) hard apply In layer 12 and/or the second hard conating 22.The size of nanoparticle 151 is nanoscale, and multiple nanoparticles 151 are reunited acquired The size of grain cluster 15 is micron order.Wherein, nanoparticle 151 since its surface has accumulated a large amount of positive and negative charge.Moreover, Nanoparticle 151 has very high chemical activity, shows strong skin effect, it is easy to aggregation occur and reach stable shape State, to reunite.
It further, can be by controlling pH value, controlling nanoparticle 151 using modes such as dispersing agent, surfactants The rate and degree reunited, so that the quantity to nanoparticle 151 included in each particle clusters 150 realizes control System.
Particle clusters 15 can be only contained in the first hard conating 12 or the second hard conating 22, thus obtain single side be formed with it is convex Play 16 transparent conducting film 10;Particle clusters 15 can also be contained in the first hard conating 12, also be contained in the second hard painting In layer 22, to obtain the two-sided transparent conducting film 10 for being formed with protrusion 16.
It is illustrated by taking the first hard conating 12 as an example:
Particle clusters 15 protrude from the surface of the first hard conating 12, so that the surface of the first hard conating 12 be made to form evagination Region, and the region that the first hard conating 12 is not provided with particle clusters 15 then forms flat site 17.Due to the first transparency conducting layer 13 and the surface that is cascading with the first hard conating 12 of the first metal layer 14, therefore the surface shape of the two and the first hard conating 12 surface shape is identical.Therefore, in the region corresponding with particle clusters 14 of the first metal layer 14, multiple raised 16 be will form.
Similarly, when containing particle clusters 15 in the second hard conating 22, the surface of second metal layer 24 can also form multiple convex Play 16.
In the transparent conductive film 10 using roll-to-roll process (roll to roll process) to manufacture strip, by The surface of the first metal layer 14 and/or second metal layer 24 is set to form multiple raised 16 in particle clusters 15.Therefore, saturating in curling When bright conductive membrane 10, multiple raised 16 can make to form point contact between two neighboring metal layer, to prevent it mutually viscous Even, crimping.
Moreover, because particle clusters 15 are agglomerated by multiple nanoparticles 151.Therefore, for single nanoparticle 151 Size without being accurately controlled, controlled within the scope of 10~50nm.When forming particle clusters 15, only need By the quantity for the nanoparticle 151 that control is reunited, the protrusion 16 met the size requirements can be obtained.It can be seen that preparing When transparent conducting film 10, both do not have to be accurately controlled the size of nanoparticle 151, without to obtained nanometer Particle 151 is screened, and so as to simplification of flowsheet, and then promotes processing efficiency.
Further, since particle clusters 15 are agglomerated by multiple nanoparticles 151, therefore particle clusters 15 can not be formed smoothly Surface.Therefore, particle clusters 15 increase relative to single micron-sized particle, surface roughness, so that adhesive force increases.
Further, multiple nanoparticles 151 are difficult between adjacent nanoparticle 151 when being agglomerated into particle clusters 15 To avoid can have gap.Therefore, particle clusters 15 are internal to have " hollow structure " compared with single micron particles, therefore Declines are blocked to light.That is, including the first hard conating 12 and/or the second hard conating 22 of particle clusters 15 Light transmittance increase, to can effectively improve the optical effect of transparent conducting film 10.
In the present embodiment, contain particle clusters 15 in the first hard conating 12 and the second hard conating 22, so that the first gold medal The surface for belonging to layer 14 and second metal layer 24 is each formed with multiple raised 16.
That is, the two-sided of obtained transparent conducting film 10 is each formed with multiple raised 16.Therefore, it is crimping When transparent conducting film 10, the point of point contact increases between two adjacent metal layers, therefore the effect that its resist blocking and that, resistance to compression connect Fruit is more preferable.
Referring to Fig. 4, in another embodiment, any of the first hard conating 12 and the second hard conating 22 contain particle Cluster 15, so that the surface of the first metal layer 14 or second metal layer 24 is formed with multiple raised 16.
That is, only single side is formed with multiple raised 16 to obtained transparent conducting film 10.Therefore, two are avoided that The shade of layer particle clusters 15 is overlapped mutually, to mitigate mist degree, thus while playing the role of resist blocking and that, resistance to compression connects, moreover it is possible to Promote the optical effect of transparent conducting film 10.
In the present embodiment, particle clusters 15 are identical as the material of the first hard conating 12 and the second hard conating 22.
Since particle clusters 15 are identical as the material of the first hard conating 12 and the second hard conating 22 (being collectively referred to as hard conating below), Therefore its optical parameter is also identical.Therefore, in the linkage interface of particle clusters 15 and hard conating, light propagation institute is impacted smaller, Particle clusters 15 and hard conating are closer for an entirety.When light passes through the first hard conating 12 containing particle clusters 15 and the When two hard conatings 22, the distortion that round generates is smaller.Therefore, transparent conducting film 10 is reaching resist blocking and that, resistance to compression The purpose connect is simultaneously, moreover it is possible to its optical property be avoided to be adversely affected.
Further, in the present embodiment, the material of particle clusters 15 is silica, organosilicon polymer, acrylic acid Quasi polymer or styrene polymer.
The above material has the advantage that translucency is good, is easily obtained, and can meet performance requirement for particle clusters 15 Under the premise of reduce cost.Certainly, other suitable materials can also be selected according to actual performance and cost needs.
In the present embodiment, the quantity for the nanoparticle 151 that each particle clusters 15 include is less than 100.
Specifically, the nanoparticle 151 that partial size is 10~50nm is easy to get under existing processing technology, and can be relatively square Just the control for realizing reunion rate and degree.In 151 aggregation procedure of nanoparticle, when obtained particle clusters 15 reach pre- If when size, then controlling stopping and reuniting.
Moreover, when the partial size of nanoparticle 151 is 10~50nm, the quantity of nanoparticle 151 in each particle clusters 15 When less than 100, " hollow structure " formed in particle clusters 15 is evenly distributed, so that the light transmission on the whole of particle clusters 15 Uniformly.Therefore, include particle clusters 15 the first hard conating 12 and/or the second hard conating 22 translucent effect also more evenly, Light and dark region is formed when avoidable light passes through on surface, to further improve the optics of transparent conducting film 10 Effect.
Further, in the present embodiment, nanoparticle 151 is spherical in shape or elliposoidal.
Specifically, may include the nanoparticle 151 of various shapes in a particle clusters 15.Spherical or elliposoidal nanometer 151 surface of particle is smooth, therefore the surface of the particle clusters 15 agglomerated into not will form the structures such as burr, corner angle, so as to keep away Exempt from particle clusters 15 and damages substrate 11.
It should be pointed out that in other embodiments, nanoparticle 151 can also be in other shapes, and can between each other into Row is reunited.
In order to realize that more preferably resist blocking and that and resistance to compression connect effect, for the table of the first metal layer 14 and second metal layer 24 The concentration of surface roughness and protrusion 16 has corresponding requirement.
In the present embodiment, the first metal layer 14 and the surface arithmetic average roughness Ra of second metal layer 24 are 0.0025 ~0.025 μm.In addition, the distribution density of protrusion 16 is 100~3000/mm2
When the distribution density of protrusion 16 is excessive, the haze value that will lead to transparent conducting film 10 is excessive, light transmission rate drop It is low, and then seriously affect the appearance and optical effect of transparent conducting film 10.And if the distribution density of protrusion 16 is too small, The effect of resist blocking and that is limited.In above-mentioned roughness and density range, transparent conducting film 10 can preferably take into account resist blocking and that And optical effect.
Wherein, the first metal layer 14 and the surface arithmetic average roughness Ra and distribution density of second metal layer 24 can pass through 15 shape of particle clusters, size and content are adjusted to change.
Further, in the present embodiment, along the side perpendicular to 24 surface of the first metal layer 14 and/or second metal layer Upwards, multiple raised 16 height are 0.1~0.5 μm.
The height of protrusion 16 refers to that protrusion 16 protrudes from the height on 24 surface of the first metal layer 14 and/or second metal layer Degree.Since 15 size of particle clusters is smaller, therefore it is difficult to be accurately controlled each raised 16 height.It therefore, will be raised 16 height controls in above-mentioned altitude range.It should be pointed out that in actual production, due to being difficult to every cluster of grains The progress of cluster 15 accurately controls, therefore the height position for having few partial particulate cluster 15 and being formed by protrusion 16 being difficult to avoid that In outside above range.But it is influenced caused by part protrusion 16 negligible.
Under normal circumstances, the height of protrusion 16 is higher, then resist blocking and that effect is better.But with the raising of height, The size of grain cluster 15 can also increase with it, and reach mutually in requisition for increase so as to cause the haze value of transparent conducting film 10 The optical effect of transparent conducting film 10 will be seriously affected after to a certain extent.And in above-mentioned altitude range, it is transparent to lead Electric thin film 10 can preferably take into account resist blocking and that and optical effect.
Wherein, the height of protrusion 16 can change by adjusting the suspension degree of 15 size of particle clusters and particle clusters 15 Become.
Above-mentioned transparent conducting film 10, particle clusters 15 make the surface of the first metal layer 14 and/or second metal layer 24 Form multiple raised 16.Therefore, when crimping above-mentioned transparent conducting film 10, multiple raised 16 can make two neighboring metal layer Between form point contact, to prevent its stick to each other.Moreover, because particle clusters 15 are by multiple 151 reunion shapes of nanoparticle At.Therefore, for the size of single nanoparticle 151 without being accurately controlled.When forming particle clusters 15, need to only lead to The quantity for crossing the nanoparticle 151 that control is reunited, can be obtained the protrusion 16 met the size requirements.It can be seen that saturating in preparation When bright conductive membrane 10, both do not have to be accurately controlled the size of nanoparticle 151, without to obtained nanoparticle Son 151 is screened, and so as to simplification of flowsheet, and then promotes processing efficiency.
In addition, the present invention also provides a kind of touch screens.Please refer to fig. 5, the touch screen in present pre-ferred embodiments 200 as made by the transparent conducting film 10 in above-described embodiment.Wherein:
Touch screen 200 includes Touch Zone 210 and lead district 220.Specifically, Touch Zone 210 is located in touch screen 200 Portion, and lead district 220 is then around the circumferential setting of Touch Zone 210.The first metal layer 14 and second metal layer 24 are located at lead district 220。
Touch Zone 210 includes first electrode 211 and second electrode 212.Wherein, first electrode 211 is by the first electrically conducting transparent Layer 13 etches;Second electrode 212 is etched by the second transparency conducting layer 23.First electrode 211 and second electrode 212 are lost It is carved into electrode pattern.Specifically, electrode pattern is general elongated and the first electrode 211 that intersects vertically grid-shaped, opposite And second electrode 212 forms the two poles of the earth of capacitance structure.
Lead district 220 includes first lead 221 and the second lead 222.First lead 221 is by the first metal layer 14 and is located at First transparency conducting layer 13 of lead district 220 is etched to form;Second lead 222 then by second metal layer 24 and is located at lead district 220 the second transparency conducting layer 23 is etched to form.First lead 221 and the second lead 222 are double-layer structure, thus realize with First electrode 211 and second electrode 212 are electrically connected.
It is transparent by the first metal layer 14, second metal layer 24, the first transparency conducting layer 13 and second in above-mentioned touch screen The directly etching of conductive layer 23 obtains first lead 221 and the second lead 222.Therefore, because silk-screen is not necessarily to, directly by yellow light process The width of the contact conductor of formation can further reduce, therefore touch screen has narrow frame.
Referring to Figure 6 together, the present invention also provides a kind of preparation method of touch screen, the method comprising the steps of S310~ S330:
Step S310: a kind of transparent conducting film is provided.
Specifically, transparent conducting film is the transparent conducting film 100 in above-described embodiment comprising stacking is set The first transparency conducting layer 13 and the first metal layer 14 set, and the second transparency conducting layer 23 and second metal layer that are stacked 24。
Step S320: etching the first metal layer 14 and second metal layer 24, to expose the first transparency conducting layer of Touch Zone 13 and second transparency conducting layer 23, and form the metal lead wire pattern for being located at lead district
Specifically, metal lead wire pattern can be formed in layer on surface of metal by one of yellow light process.Wherein, metal lead wire figure Case is arranged along the edge of touch screen.After being etched to metal layer, the first transparency conducting layer 13 of lower layer and second transparent lead 24 part of electric layer is exposed.
Step S330 etches the first transparency conducting layer 13 and the second transparency conducting layer 23, to form be located at Touch Zone the One electrode 211 and second electrode 212, and form the transparent lead pattern for being located at lead district, metal lead wire pattern and transparent lead Pattern collectively forms contact conductor.
Specifically, the first transparency conducting layer 13 and the second transparency conducting layer 24 are exposed using another road yellow light process Part be etched, to form electrode pattern, so that first electrode 211 and second electrode 212 can be obtained.Meanwhile in gold Belong to lead pattern the first metal layer 14 and second metal layer 24 respectively with the first transparency conducting layer 13 and second in lead district Transparency conducting layer 23 is superimposed, to form the first lead 221 and the second lead 222 of double-layer structure.First lead 221 and second Lead 222 is electrically connected with first electrode 211 and the realization of second electrode 212 respectively.
Using the above method when preparing touch screen, directly to the first metal layer 14, second metal layer 24, first is transparent leads Electric layer 13 and the second transparency conducting layer 23 are etched, and can obtain first electrode 211, second electrode 212 and and first electrode 211, the first lead 221 of the electrical connection of second electrode 212, the second lead 222.Draw it is therefore not necessary to be formed again using silk-screen mode Line, to effectively simplify technique, improve processing efficiency.Moreover, there is narrow side by touch screen prepared by the above method Frame.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited In contradiction, all should be considered as described in this specification.
The embodiments described above only express several embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.

Claims (10)

1. a kind of transparent conducting film, comprising:
Substrate, including the first surface and second surface being oppositely arranged;
It is sequentially formed in the first hard conating, the first transparency conducting layer and the first metal layer of the first surface;
It is sequentially formed in the second hard conating, the second transparency conducting layer and second metal layer of the second surface;
It is characterized in that, first hard conating and/or second hard conating contain multiple particle clusters, described first The surface of metal layer and/or the second metal layer forms multiple protrusions, and the particle clusters are by multiple nanoparticle reunion shapes At, and the partial size of the nanoparticle is 10~50nm.
2. transparent conducting film according to claim 1, which is characterized in that the substrate is polycyclic alkene or poly- carbonic acid Ester or pet film.
3. transparent conducting film according to claim 1, which is characterized in that the distribution density of the protrusion be 100~ 3000/mm2
4. transparent conducting film according to claim 1, which is characterized in that the particle clusters and the described first hard painting The material of layer and second hard conating is identical.
5. transparent conducting film according to claim 4, which is characterized in that the material of the particle clusters is titanium dioxide Silicon, organosilicon polymer, acrylic polymer or styrene polymer.
6. transparent conducting film according to claim 1, which is characterized in that along perpendicular to the first metal layer And/or on the direction on the second metal layer surface, the height of the multiple protrusion is 0.1~0.5 μm.
7. transparent conducting film according to any one of claims 1 to 6, which is characterized in that each particle clusters The quantity for the nanoparticle for including is less than 100.
8. transparent conducting film according to claim 7, which is characterized in that the nanoparticle is spherical in shape and/or ellipse It is spherical.
9. a kind of touch screen, which is characterized in that the touch screen is by the described in any item electrically conducting transparents of the claims 1 to 8 Made by property film, the touch screen includes Touch Zone and lead district, and the first metal layer and the second metal layer are located at The lead district;The Touch Zone include as first transparency conducting layer etching made of first electrode and by second it is transparent Second electrode made of Conductive Layer Etch;The lead district includes by the first metal layer and positioned at the first of the lead district The first lead that transparency conducting layer is etched to form, and transparent led by the second metal layer and positioned at the second of the lead district The second lead that electric layer is etched to form.
10. a kind of preparation method of touch screen, which is characterized in that comprising steps of
It provides a kind of such as the described in any item transparent conducting films of the claims 1 to 8;
The first metal layer and the second metal layer are etched, to expose the first transparency conducting layer of Touch Zone and second transparent Conductive layer, and form the metal lead wire pattern for being located at lead district;
First transparency conducting layer and second transparency conducting layer are etched, to form the first electrode and for being located at Touch Zone Two electrodes, and the transparent lead pattern for being located at lead district is formed, the metal lead wire pattern and the transparent lead pattern are common Constitute contact conductor.
CN201710863459.8A 2017-09-22 2017-09-22 Transparent conductive film, touch screen and preparation method thereof Pending CN109545442A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111782091A (en) * 2019-04-04 2020-10-16 南昌欧菲显示科技有限公司 Transparent conductive film and touch panel
CN114746775A (en) * 2019-11-25 2022-07-12 日东电工株式会社 Antireflection film and image display device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111782091A (en) * 2019-04-04 2020-10-16 南昌欧菲显示科技有限公司 Transparent conductive film and touch panel
CN114746775A (en) * 2019-11-25 2022-07-12 日东电工株式会社 Antireflection film and image display device
CN114746775B (en) * 2019-11-25 2023-05-16 日东电工株式会社 Anti-reflection film and image display device

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