Summary of the invention
Based on this, it is necessary to be asked for particle is caducous in the existing transparent conducting film with resist blocking and that function
Topic, providing a kind of can effectively enhance transparent conducting film, touch screen of particle adhesive force and preparation method thereof.
A kind of transparent conducting film, comprising:
Substrate, including the first surface and second surface being oppositely arranged;
It is sequentially formed in the first optical adjustment layer, the first transparency conducting layer and the first metal layer of the first surface;
It is sequentially formed in the second pH effect, the second transparency conducting layer and second metal layer of the second surface;
Contain multiple particles in first optical adjustment layer and/or second optical adjustment layer, described first
The surface of metal layer and/or the second metal layer forms multiple protrusions;
Wherein, the outer surface of the particle is formed with surface relief structure, so that the outer surface of the particle is in Non-smooth surface
Curved surface.
Since the outer surface of particle is formed with surface relief structure, and make the outer surface of particle in Non-smooth surface curved surface.One side
The roughness in face, particle exterior surface increases.On the other hand, the contact area of particle and optical adjustment layer increases.And particle is attached
Put forth effort to be positively correlated with roughness and contact area.Therefore, adhesive force of the particle in optical adjustment layer increases, so as to effectively anti-
Only particle falls off.
Compared with conventional conductive film, above-mentioned transparent conducting film does not include hard conating, and particle is located at optical adjustment layer
In (at least one in the first optical adjustment layer and the second optical adjustment layer).On the one hand, film layer knot can be reduced after omitting hard conating
Structure blocks light to mitigate.On the other hand, optical adjustment layer itself has the function of adjusting optical effect, therefore light
When the particle being placed through in optical adjustment layer, generated refraction, scattering phenomenon enhancing.Therefore, above-mentioned transparent conductivity is thin
The integral light-transmitting rate of film increases, so as to effectively improving optical effect.
Moreover, transparent conducting film can reduce film layer structure after omitting hard conating, so that it is thin to simplify transparent conductivity
The structure of film.Therefore, be conducive to simplify the processing technology of transparent conducting film and reduce cost.
Further, in traditional conductive film, hard conating can discharge steam or organic solvent in making technology, from
And causing conductive layer (for example, ITO layer) crystallinity poor, sheet resistance is uneven.And transparent conducting film of the invention is not due to
Including hard conating, therefore the steam or organic solvent that discharge are reduced, so as to improve the crystallinity of conductive layer, so that its side
Resistance is more uniform.Moreover, the brittleness of transparent conducting film reduces, conductive film cutting and winding processing procedure are significantly improved
Can, so as to effectively avoid punching from being cracked when opening material greatly.
There is interval, and described between the multiple particle and the surface of the substrate in one of the embodiments,
The partial size of grain is less than the thickness of flat site, and the flat site is first pH effect or second optical adjustment layer
It is not provided with the region of the particle.
Existing in the conductive film for preventing adhesion function, the thickness that the partial size of particle must be greater than hard conating could be in metal
The surface of layer forms protrusion.Therefore, the particle size of particle is limited to the thickness of hard conating, can not further reduce.However,
Grain partial size is bigger, then the haze value of conductive film increases, light transmission rate reduces, and then influences the optical effect of conductive film.
And in the present embodiment, since the partial size of particle is less than the thickness of optical adjustment layer.Therefore, the partial size of particle not by
The partial size of the limitation of optical adjustment layer thickness, particle can further contract relative to the partial size of particle in existing resist blocking and that conductive film
It is small, to reduce haze value, promote light transmission rate, finally improve optical effect.
The particle is located at first optical adjustment layer or second optical adjustment layer in one of the embodiments,
In part account for the particle ratio be less than half.
As noted previously, as adhesive force of the particle in optical adjustment layer increases.Therefore, even if particle is embedded in pH effect
Part in layer is less than the half of particle entirety, will not weaken the stability of particle attachment.And particle is embedded in optics tune
Part in flood is fewer, then in identical height of projection, the partial size of particle is smaller, therefore particle acts on also just blocking for light
It is weaker, so as to further improve optical effect.
In one of the embodiments, the flat site with a thickness of 45 to 145 nanometers.
Within this range, the pH effect effect of optical adjustment layer is best, and bright conductive membrane optical effect can be made to be in
Optimum state.
The material of the particle and first optical adjustment layer and the second optical adjustment layer in one of the embodiments,
It is identical.
Since particle is identical as the first optical adjustment layer and the second optical adjustment layer (being collectively referred to as optical adjustment layer below) material,
Therefore particle and the optical parameter of optical adjustment layer are also identical.Therefore, in the linkage interface of particle and optical adjustment layer, light is propagated
Institute is impacted smaller, and particle and optical adjustment layer are closer for an entirety.When light passes through the optical adjustment layer containing particle
When, the distortion that round generates is smaller.Therefore, transparent conducting film is achieving the purpose that resist blocking and that, resistance to compression connect simultaneously,
Also it is avoided that its optical property is adversely affected.
Moreover, because material is identical, adhesive force of the particle in optical adjustment layer can be made to further enhance.
Multiple strip grooves are offered on the outer surface of the particle in one of the embodiments, to form the table
Face concaveconvex structure.
By opening up groove, block effect of the particle to light can reduce, thus increase the light transmittance of optical adjustment layer, into
And it can also improve the optical effect of transparent conducting film.
The substrate is cyclic olefin polymer film in one of the embodiments,.
Cyclic olefin polymer (COP) is novel amorphism polymer material, and hardness with higher and excellent saturating
Photosensitiveness, but its brittleness is very big, therefore often coats hard conating on two surface to improve, but the way of this inertia is neglected
Later crystallization bring side effect is given depending on hard conating.In the present embodiment, due to being added with particle, intensity in optical adjustment layer
And toughness increases, therefore can play a protective role to substrate.Therefore, even if hard conating is omitted, COP material production base can also be used
Material, so that substrate be made to have the characteristic that hardness is high, translucency is good.
The distribution density of the protrusion is 100~3000/mm in one of the embodiments,2, the multiple protrusion
Height is 0.1~0.5 μm.
When the distribution density of protrusion is excessive, the haze value that will lead to transparent conducting film is excessive, light transmission rate reduces, into
And seriously affect the appearance and optical effect of transparent conducting film.And if the distribution density of protrusion is too small, resist blocking and that
Effect is limited.In above-mentioned density range, transparent conducting film can preferably take into account resist blocking and that and optical effect.
The height of protrusion is higher, then resist blocking and that effect is better.But with the raising of height, the size of particle is accordingly needed
Increase, can also be increased with it so as to cause the haze value of transparent conducting film, and will serious shadow after reaching a certain level
Ring the optical effect of transparent conducting film.And in above-mentioned altitude range, transparent conducting film can preferably be taken into account anti-stick
Company and optical effect.
A kind of touch screen, touch screen transparent conducting film as described in any one of above preferred embodiment are made
At the touch screen includes Touch Zone and lead district, and the first metal layer and the second metal layer are located at the lead district;
The Touch Zone include as first transparency conducting layer etching made of first electrode and by the second transparency conducting layer etching and
At second electrode;The lead district includes by the first metal layer and positioned at the first transparency conducting layer quilt of the lead district
The first lead formed is etched, and is etched shape by the second metal layer and positioned at the second transparency conducting layer of the lead district
At the second lead.
In above-mentioned touch screen, by the first metal layer, second metal layer, the first transparency conducting layer and the second transparency conducting layer
Directly etching obtains first lead and the second lead.It is therefore not necessary to be formed and first electrode and the second electricity by silk-screen mode again
The lead of pole electrical connection.Compared with traditional touch screen, due to being not necessarily to silk-screen, the contact conductor directly formed by yellow light process
Width can further reduce, therefore touch screen has narrow frame.
A kind of preparation method of touch screen, comprising steps of
A kind of transparent conducting film as described in any one of above preferred embodiment is provided;
The first metal layer and the second metal layer are etched, to expose the first transparency conducting layer and second of Touch Zone
Transparency conducting layer, and form the metal lead wire pattern for being located at lead district;
First transparency conducting layer and second transparency conducting layer are etched, to form the first electrode for being located at Touch Zone
And second electrode, and form the transparent lead pattern for being located at lead district, the metal lead wire pattern and the transparent lead pattern
Collectively form contact conductor.
Using the above method when preparing touch screen, directly to the first metal layer, second metal layer, the first transparency conducting layer
And second transparency conducting layer be etched, first electrode, second electrode can be obtained and be electrically connected with first electrode, second electrode
Contact conductor.It is therefore not necessary to lead be formed using silk-screen mode again, to effectively simplify technique, improve processing effect
Rate.Moreover, there is narrow frame by touch screen prepared by the above method.
Specific embodiment
To facilitate the understanding of the present invention, a more comprehensive description of the invention is given in the following sections with reference to the relevant attached drawings.In attached drawing
Give preferred embodiment of the invention.But the invention can be realized in many different forms, however it is not limited to herein
Described embodiment.On the contrary, purpose of providing these embodiments is keeps the understanding to the disclosure more saturating
It is thorough comprehensive.
It should be noted that it can directly on the other element when element is referred to as " being fixed on " another element
Or there may also be elements placed in the middle.When an element is considered as " connection " another element, it, which can be, is directly connected to
To another element or it may be simultaneously present centering elements.Term as used herein " vertical ", " horizontal ", " left side ",
" right side " and similar statement are for illustrative purposes only.
Unless otherwise defined, all technical and scientific terms used herein and belong to technical field of the invention
The normally understood meaning of technical staff is identical.Term as used herein in the specification of the present invention is intended merely to description tool
The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term " and or " used herein includes one or more phases
Any and all combinations of the listed item of pass.
Fig. 1 and Fig. 2 is please referred to, the transparent conducting film 10 in present pre-ferred embodiments includes substrate 11, the first light
Learn adjustment layer 12, the first transparency conducting layer 13, the first metal layer 14, the second optical adjustment layer 22, the second transparency conducting layer 23 and
Second metal layer 24.
Substrate 11 includes the first surface (upper surface shown in Fig. 1) and second surface (lower surface shown in Fig. 1) being oppositely arranged.
Wherein, first surface and second surface are intended merely to distinguish two surfaces of substrate 11, first surface and second surface
Position it is interchangeable.Substrate 11 is formed by amorphism thin polymer film.Since amorphism thin polymer film is thinner than crystalline polymer
Film birefringence is small and uniform, can eliminate the uneven color in transparent conducting film 10 of the invention.For the present invention
Amorphism thin polymer film face in birefringence be preferably 0~0.001, further preferably 0~0.0005.For this
The deviation of birefringence in the face of the amorphism thin polymer film of invention is preferably 0.0005 hereinafter, further preferably
0.0003 or less.
Aforementioned birefringence and its deviation can be by selecting the amorphism thin polymer film of suitable type to reach.By non-
Crystalline substance thin polymer film formed substrate 11 with a thickness of 20 μm~200 μm.
First optical adjustment layer 12, the first transparency conducting layer 13 and the first metal layer 14 are sequentially formed in the first of substrate 11
Surface.Second optical adjustment layer 22, the second transparency conducting layer 23 and second metal layer 24 are sequentially formed in the second table of substrate 11
Face.Wherein:
First optical adjustment layer 12 is used to improve the optical effect of transparent conducting film 10.In rear process, by first
After transparency conducting layer 13 patterns, makes the part of the first transparency conducting layer 13 and the difference of the reflectivity of its part is not reduced,
The pattern of the first transparency conducting layer 13 is set to be difficult to recognize.
In addition, the first optical adjustment layer 12 is also used to improve refraction situation of the light across different film layer structures when.First
The refractive index of optical adjustment layer 12 is preferably set between the refractive index of substrate 11 and the refractive index of the first transparency conducting layer 13
Numerical value.Therefore, transitional function can be played on the propagation path of light.The material for forming the first optical adjustment layer 12 is, for example,
One of silicone-based polymers, acrylic polymer, aromatic ring or naphthalene nucleus polymer, zirconium oxide, titanium oxide, antimony oxide
Or several coating.
First transparency conducting layer 13 is formed in the surface of the first optical adjustment layer 12.First transparency conducting layer 13 from
Sheet resistance value (the unit: Ω/m of transmissivity height (80% or more) and per unit area in light region (380nm~780nm)2)
For 500 Ω/m2Layer below is formed.Preferred 15nm~the 100nm of thickness of first transparency conducting layer 13, more preferably 15nm~
50nm.First transparency conducting layer 13 is for example by indium tin oxide (ITO), indium tin oxide or indium oxide-zinc oxide composites
Any formation.
The first metal layer 14 is formed on the surface of the first transparency conducting layer 13.The first metal layer 14 is of the invention transparent
When conductive membrane is used for such as touch panel, it is routed for being formed in the outside of touch input area.About forming the first gold medal
Belong to the material of layer 15, representational is copper, silver, it is possible to use the arbitrary metal of excellent electric conductivity in addition to this.First
The thickness of metal layer 14 is preferably 50nm~500nm, more preferably 100nm~300nm.
Further, the second optical adjustment layer 22, the second transparency conducting layer 23 and second metal layer 24 respectively with the first light
It is identical to learn adjustment layer 12, the first transparency conducting layer 13 and the film layer structure of the first metal layer 14, function transitivity, therefore herein no longer
It repeats.
In addition, the first optical adjustment layer 12 and/or the second optical adjustment layer 22 contain multiple particles 15, in the first metal
The surface of layer 14 and/or second metal layer 24 forms multiple raised 16.Wherein, the outer surface of particle 15 is formed with concave-convex surface knot
Structure (figure is not marked), so that the outer surface of particle 15 is in Non-smooth surface curved surface.
Specifically, smooth surface (smooth surface) refers to the curved surface for having the tangent plane continuously changed, and Non-smooth surface is bent
Face then refers to the curved surface for not having the tangent plane continuously changed.Therefore, there is prominent or recess in the outer surface of particle 15.Particle 15
Can irregularly, the first optical adjustment layer 12 and/or the second pH effect can also be distributed in preset rules (as equably)
In layer 22.Particle 15 can be only contained in the first optical adjustment layer 12 or the second optical adjustment layer 22, be formed to obtain single side
There is the transparent conducting film 10 of protrusion 16;Particle 15 can also be contained in the first optical adjustment layer 12, also be contained in second
In optical adjustment layer 22, to obtain the two-sided transparent conducting film 10 for being formed with protrusion 16.
Specifically in the present embodiment, also referring to Fig. 3, multiple strip grooves 151 are offered on the outer surface of particle 15,
To form surface relief structure.
By opening up groove 151, can make to form " hollow structure " inside particle 15.Therefore, it can reduce particle 15 to light
The effect of blocking, to increase the light transmittance of optical adjustment layer, and then can also improve the optical effect of transparent conducting film 10.
It should be pointed out that in other embodiments, forming surface relief structure and being not limited to open up a kind of this side of groove 151
Formula.For example, also the surface of particle 15 can be made to form random protrusion or recessed portion.
It is illustrated by taking the first optical adjustment layer 12 as an example:
Particle 15 protrudes from the surface of the first optical adjustment layer 12, so that it is outer to form the surface of the first optical adjustment layer 12
Convex region, and the region that the first optical adjustment layer 12 is not provided with particle 15 then forms flat site 17.It transparent leads due to first
Electric layer 13 and the first metal layer 14 are cascading the surface with the first optical adjustment layer 12, therefore the surface shape of the two and the
The surface shape of one optical adjustment layer 12 is identical.Therefore, it in the region corresponding with particle 15 of the first metal layer 14, will form multiple
Protrusion 16.
Similarly, when containing particle 15 in the second optical adjustment layer 22, the surface of second metal layer 24 can also form multiple convex
Play 16.
In the transparent conductive film 10 using roll-to-roll process (roll to roll process) to manufacture strip, by
The surface of the first metal layer 14 and/or second metal layer 24 is set to form multiple raised 16 in particle 15.Therefore, transparent lead is being crimped
When electric thin film 10, multiple raised 16 can make to form point contact between two neighboring metal layer, to prevent its stick to each other, pressure
It connects.
Moreover, because the outer surface of particle 15 is formed with surface relief structure, and make the outer surface of particle 15 in Non-smooth surface
Curved surface.On the one hand, the roughness of 15 outer surface of particle increases.On the other hand, the contact area of particle 15 and optical adjustment layer increases
Greatly.And the adhesive force of particle 15 and roughness and contact area are positively correlated.Therefore, adhesive force of the particle 15 in optical adjustment layer
Increase, falls off to can effectively prevent particle 15.
Further, compared with conventional conductive film, transparent conducting film 10 does not include hard conating, and particle 15 is located at light
It learns in adjustment layer (at least one in the first optical adjustment layer 12 and the second optical adjustment layer 22).On the one hand, after omitting hard conating
Film layer structure can be reduced, light is blocked to mitigate.Moreover, simplifying structure, being conducive to simplify technique and reducing cost.
On the other hand, optical adjustment layer itself has the function of adjusting optical effect, therefore light is placed through in optical adjustment layer
When grain 15, generated refraction, scattering phenomenon enhancing.
In traditional conductive film, hard conating can discharge steam or organic solvent in making technology, so as to cause leading
Electric layer (for example, ITO layer) crystallinity is poor, and sheet resistance is uneven.And transparent conducting film 10 of the invention is not due to including hard
Coating, therefore the steam or organic solvent that discharge are reduced, so as to improve the crystallinity of conductive layer, so that its sheet resistance is more
Uniformly.In addition, the brittleness of transparent conducting film 10 reduces, conductive film cutting and winding processing procedure performance are significantly improved, from
And punching can effectively be avoided to be cracked when opening material greatly.
Specifically in the present embodiment, substrate 11 is cyclic olefin polymer film.
Cyclic olefin polymer (COP) is novel amorphism polymer material, and hardness with higher and excellent saturating
Photosensitiveness, but its brittleness is very big, therefore often coats hard conating on two surface to improve, but the way of this inertia is neglected
Later crystallization bring side effect is given depending on hard conating.It is strong due to being added with particle 15 in optical adjustment layer in the present embodiment
Degree and toughness increase, therefore can play a protective role to substrate 11.Therefore, even if hard conating is omitted, COP material system can also be used
Make substrate 11, so that substrate 11 be made to have the characteristic that hardness is high, translucency is good.
In the present embodiment, contain particle 15 in the first optical adjustment layer 12 and the second optical adjustment layer 22, so that the
The surface of one metal layer 14 and second metal layer 24 is each formed with multiple raised 16.
That is, the two-sided of obtained transparent conducting film 10 is each formed with multiple raised 16.Therefore, it is crimping
When transparent conducting film 10, the point of point contact increases between two adjacent metal layers, therefore the effect that its resist blocking and that, resistance to compression connect
Fruit is more preferable.
Referring to Fig. 4, in another embodiment, any of the first optical adjustment layer 12 and the second optical adjustment layer 22
Containing particle 15, so that the surface of the first metal layer 14 or second metal layer 24 is formed with multiple raised 16.
That is, only single side is formed with multiple raised 16 to obtained transparent conducting film 10.Therefore, play it is anti-
While adhesion, resistance to compression connect effect, moreover it is possible to avoid the shade of two layers of particle 15 from being overlapped mutually, to mitigate mist degree, thus further
Promote the optical effect of transparent conducting film 10.
In the present embodiment, there is interval between multiple particles 15 and the surface of substrate 11, and the partial size of particle 15 is less than
The thickness of flat site 17.Flat site 17 is that the first pH effect 12 or the second optical adjustment layer 22 are not provided with particle 15
Region.
Existing in the conductive film for preventing adhesion function, the thickness that the partial size of particle must be greater than hard conating could be in metal
The surface of layer forms protrusion.Therefore, the particle size of particle is limited to the thickness of hard conating, can not further reduce.However,
Grain partial size is bigger, then the haze value of conductive film increases, light transmission rate reduces, and then influences the optical effect of conductive film.
And in the present embodiment, since the partial size of particle 15 is less than the thickness of optical adjustment layer.Therefore, the partial size of particle 15
It is not limited by optical adjustment layer thickness, the partial size of particle 15 can be into one relative to the partial size of particle in existing resist blocking and that conductive film
Step reduces, to further decrease haze value, promote light transmission rate, and finally improves optical effect.
Specifically in the present embodiment, particle 15 is located at the part in the first optical adjustment layer 12 or the second optical adjustment layer 22
The ratio for accounting for particle 15 is less than half.
As previously described, because adhesive force of the particle 15 in optical adjustment layer increases.Therefore, even if particle 15 is embedded in optics
Part in adjustment layer is less than the whole half of particle 15, will not weaken the stability of the attachment of particle 15.Further,
The part that particle 15 is embedded in optical adjustment layer is fewer, then in identical height of projection, the partial size of particle 15 is smaller.Partial size is smaller,
Particle 15 is also weaker to the effect of blocking of light.Therefore, the optical effect of transparent conducting film 10 can further improve.
In the present embodiment, flat site 17 with a thickness of 45 to 145 nanometers.
As previously mentioned, flat site 17 is that the first optical adjustment layer 12 or the second optical adjustment layer 22 are not provided with particle 15
Region.Within this range, the pH effect effect of optical adjustment layer is best, at the optical effect that can make bright conductive membrane 10
In optimum state.
The material phase of particle 15 and the first optical adjustment layer 12 and the second optical adjustment layer 22 in one of the embodiments,
Together.
Since particle 15 is identical as the material of optical adjustment layer, therefore the optical parameter of particle 15 and optical adjustment layer also phase
Together.Therefore, in the linkage interface of particle 15 and optical adjustment layer, light propagates impacted smaller, particle 15 and pH effect
Closer layer is an entirety.When light passes through optical adjustment layer containing particle 15, distortion that round generates compared with
It is small.Therefore, transparent conducting film 10 is achieving the purpose that resist blocking and that, resistance to compression connect simultaneously, moreover it is possible to avoid its optical property by
Adverse effect.
Moreover, because material is identical, adhesive force of the particle 15 in optical adjustment layer can be made to further enhance.
In order to realize that more preferably resist blocking and that and resistance to compression connect effect, has for the concentration of protrusion 16 and want accordingly
It asks.
In the present embodiment, the distribution density of protrusion 16 is 100~3000/mm2.Further, multiple raised 16
Height is 0.1~0.5 μm.
When the distribution density of protrusion 16 is excessive, the haze value that will lead to transparent conducting film 10 is excessive, light transmission rate drop
It is low, and then seriously affect the appearance and optical effect of transparent conducting film 10.And if the distribution density of protrusion 16 is too small,
The effect of resist blocking and that is limited.In above-mentioned density range, transparent conducting film 10 can preferably take into account resist blocking and that and optics effect
Fruit.
The height of protrusion 16 refers to that protrusion 16 protrudes from the height on 24 surface of the first metal layer 14 and/or second metal layer
Degree.Since 15 size of particle is smaller, therefore it is difficult to be accurately controlled each raised 16 height.Therefore, by protrusion 16
Height control is in above-mentioned altitude range.It should be pointed out that in actual production, due to being difficult to each particle 15
Accurately controlled, thus be difficult to avoid that have few partial particulate 15 be formed by protrusion 16 height be located above range
Outside.But it is influenced caused by part protrusion 16 negligible.Moreover, above-mentioned height also may refer in preset range
The arithmetic mean of instantaneous value of a certain number of raised 16 height.
Under normal circumstances, the height of protrusion 16 is higher, then resist blocking and that effect is better.But with the raising of height,
The size of grain 15 can also increase with it, and reach one mutually in requisition for increase so as to cause the haze value of transparent conducting film 10
Determine the optical effect that transparent conducting film 10 will be seriously affected after degree.And in above-mentioned altitude range, transparent conductivity
Film 10 can preferably take into account resist blocking and that and optical effect.
Above-mentioned transparent conducting film 10, particle 15 form the first metal layer 14 and/or the surface of second metal layer 24
Multiple raised 16, so that transparent conducting film 10 has the function of resist blocking and that.Further, the outer surface shape of particle 15
At there is surface relief structure, so that the outer surface of particle 15 is in Non-smooth surface curved surface.On the one hand, the roughness of 15 outer surface of particle increases
Add.On the other hand, the contact area of particle 15 and optical adjustment layer increases.And the adhesive force of particle 15 and roughness and contact surface
Product is positively correlated.Therefore, adhesive force of the particle 15 in optical adjustment layer increases, and falls off to can effectively prevent particle 15.
In addition, the present invention also provides a kind of touch screens.Please refer to fig. 5, the touch screen in present pre-ferred embodiments
200 as made by the transparent conducting film 10 in above-described embodiment.Wherein:
Touch screen 200 includes Touch Zone 210 and lead district 220.Specifically, Touch Zone 210 is located in touch screen 200
Portion, and lead district 220 is then around the circumferential setting of Touch Zone 210.The first metal layer 14 and second metal layer 24 are located at lead district
220。
Touch Zone 210 includes first electrode 211 and second electrode 212.Wherein, first electrode 211 is by the first electrically conducting transparent
Layer 13 etches;Second electrode 212 is etched by the second transparency conducting layer 23.First electrode 211 and second electrode 212 are lost
It is carved into electrode pattern.Specifically, electrode pattern is general elongated and the first electrode 211 that intersects vertically grid-shaped, opposite
And second electrode 212 forms the two poles of the earth of capacitance structure.
Lead district 220 includes first lead 221 and the second lead 222.First lead 221 is by the first metal layer 14 and is located at
First transparency conducting layer 13 of lead district 220 is etched to form;Second lead 222 then by second metal layer 24 and is located at lead district
220 the second transparency conducting layer 23 is etched to form.First lead 221 and the second lead 222 are double-layer structure, thus realize with
First electrode 211 and second electrode 212 are electrically connected.
It is transparent by the first metal layer 14, second metal layer 24, the first transparency conducting layer 13 and second in above-mentioned touch screen
The directly etching of conductive layer 23 obtains first lead 221 and the second lead 222.Therefore, because silk-screen is not necessarily to, directly by yellow light process
The width of the contact conductor of formation can further reduce, therefore touch screen has narrow frame.
Referring to Figure 6 together, the present invention also provides a kind of preparation method of touch screen, the method comprising the steps of S310~
S330:
Step S310: a kind of transparent conducting film is provided.
Specifically, transparent conducting film is the transparent conducting film 100 in above-described embodiment comprising stacking is set
The first transparency conducting layer 13 and the first metal layer 14 set, and the second transparency conducting layer 23 and second metal layer that are stacked
24。
Step S320: etching the first metal layer 14 and second metal layer 24, to expose the first transparency conducting layer of Touch Zone
13 and second transparency conducting layer 23, and form the metal lead wire pattern for being located at lead district
Specifically, metal lead wire pattern can be formed in layer on surface of metal by one of yellow light process.Wherein, metal lead wire figure
Case is arranged along the edge of touch screen.After being etched to metal layer, the first transparency conducting layer 13 of lower layer and second transparent lead
24 part of electric layer is exposed.
Step S330 etches the first transparency conducting layer 13 and the second transparency conducting layer 23, to form be located at Touch Zone the
One electrode 211 and second electrode 212, and form the transparent lead pattern for being located at lead district, metal lead wire pattern and transparent lead
Pattern collectively forms contact conductor.
Specifically, the first transparency conducting layer 13 and the second transparency conducting layer 24 are exposed using another road yellow light process
Part be etched, to form electrode pattern, so that first electrode 211 and second electrode 212 can be obtained.Meanwhile in gold
Belong to lead pattern the first metal layer 14 and second metal layer 24 respectively with the first transparency conducting layer 13 and second in lead district
Transparency conducting layer 23 is superimposed, to form the first lead 221 and the second lead 222 of double-layer structure.First lead 221 and second
Lead 222 is electrically connected with first electrode 211 and the realization of second electrode 212 respectively.
Using the above method when preparing touch screen, directly to the first metal layer 14, second metal layer 24, first is transparent leads
Electric layer 13 and the second transparency conducting layer 23 are etched, and can obtain first electrode 211, second electrode 212 and and first electrode
211, the first lead 221 of the electrical connection of second electrode 212, the second lead 222.Draw it is therefore not necessary to be formed again using silk-screen mode
Line, to effectively simplify technique, improve processing efficiency.Moreover, there is narrow side by touch screen prepared by the above method
Frame.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, all should be considered as described in this specification.
The embodiments described above only express several embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention
Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.