CN109494194A - A kind of display panel and preparation method thereof - Google Patents

A kind of display panel and preparation method thereof Download PDF

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Publication number
CN109494194A
CN109494194A CN201811352700.1A CN201811352700A CN109494194A CN 109494194 A CN109494194 A CN 109494194A CN 201811352700 A CN201811352700 A CN 201811352700A CN 109494194 A CN109494194 A CN 109494194A
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layer
thin
spacer material
film encapsulation
device layer
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CN109494194B (en
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李晓虎
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259Multistep manufacturing methods
    • H01L27/1262Multistep manufacturing methods with a particular formation, treatment or coating of the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1218Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or structure of the substrate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/841Self-supporting sealing arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/1201Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/124Insulating layers formed between TFT elements and OLED elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The present invention relates to field of display technology, a kind of display panel and preparation method thereof is disclosed, which includes: that TFT device layer is formed on the substrate;Multiple spacer materials of folding region and non-collapsible district are distributed on TFT device layer;Organic electroluminescence device layer is formed on TFT device layer;Electroluminescent organic material layer of at least partly spacer material being distributed in multiple spacer materials of folding region on the surface of substrate is completely removed to form exposed surface;Thin-film encapsulation layer is formed on organic electroluminescence device layer and spacer material.The display panel of preparation method preparation, separate underbed in the middle part of multiple spacer materials of folding region directly to contact and connect with thin-film encapsulation layer towards the surface of thin-film encapsulation layer, enhance the adhesion strength for separating underbed in the middle part of thin-film encapsulation layer and folding region, it effectively avoids causing thin-film encapsulation layer to be easy the case where starting, falling off since bent area is frequently bent, is conducive to improve display effect.

Description

A kind of display panel and preparation method thereof
Technical field
The present invention relates to field of display technology, in particular to a kind of display panel and preparation method thereof.
Background technique
Currently, OLED display device is widely popularized, especially OLED display device is with its frivolous feature, It is gradually applied to Folding display, but in existing OLED display device, due to the organic electroluminescent film layer in OLED Preparation method be different from Array sections in Sputter, CVD and Resin technique, electroluminescent organic material film preparation side Formula generally be deposited or printing, so, between each film layer of electroluminescent organic material and electroluminescent organic material film layer with The binding force for encapsulating film layer part is weaker, and the binding force of electroluminescent organic material film layer and encapsulation film layer part is poor, then aobvious in folding In showing, as the increase of folding times easily be easy to cause organic electroluminescence film layer to fall off with encapsulation film layer part, it be easy to cause It starts, be detached between encapsulation film layer and substrate, so that it is bad to generate display.
Summary of the invention
The present invention provides a kind of display panel and preparation method thereof, in the display panel, it is distributed in the multiple of folding region Separate underbed in the middle part of spacer material directly to contact and connect with thin-film encapsulation layer towards the surface of thin-film encapsulation layer, enhances film envelope The adhesion strength for separating underbed in the middle part of layer and folding region is filled, to enhance the attachment of the thin-film encapsulation layer of folding region on substrate Power is conducive to improve it is possible to prevente effectively from causing thin-film encapsulation layer to be easy the case where starting, falling off since bent area is frequently bent Display effect.
In order to achieve the above objectives, the present invention the following technical schemes are provided:
A kind of preparation method of display panel, the display panel include at least one folding region and at least two non-collapsible Area, the preparation method include:
TFT device layer is formed on the substrate;
Multiple spacer materials of the folding region and non-collapsible district are distributed on the TFT device layer;
Organic electroluminescence device layer is formed on the TFT device layer;
At least partly spacer material in multiple spacer materials of the folding region will be distributed on the surface of the substrate Electroluminescent organic material layer completely remove to form exposed surface;
Thin-film encapsulation layer is formed on the organic electroluminescence device layer and the spacer material, wherein is distributed in institute The spacer material in multiple spacer materials of folding region with exposed surface is stated directly to contact and connect with the thin-film encapsulation layer.
In above-mentioned preparation method, prepared display panel is foldable display panel, wherein is provided on display panel At least one folding region and at least two non-collapsible districts, folding region can be bent, and make the bending that display panel is in different angles State;In the preparation process of above-mentioned display panel, TFT device layer is formed on the substrate, then forms distribution on TFF device layer Multiple spacer materials in folding region and non-collapsible district are interval between each spacer material, and the material of spacer material is inorganic matter, Then organic elctroluminescent device layer is formed on TFT device layer, wherein in the mistake for preparing organic electroluminescence device layer Cheng Zhong, organic material and metal material can inevitably fall in the surface of spacer material, i.e., the surface of spacer material can adhere to organic material and Metal material forms electroluminescent organic material layer, organic electro luminescent layer and spacer material on spacer material surface and film seals The cohesive force for filling layer is poor, easily causes the problem of thinner package film layer is started, fallen off, so, organic electroluminescence device layer After formation, Organic Electricity of at least partly spacer material in multiple spacer materials of folding region on the surface of substrate will be distributed in Electroluminescent material layer is completely removed to form exposed surface, in this way, the spacer material of surface removal electroluminescent organic material layer can Directly to connect with thin-film encapsulation layer, the surface that thin-film encapsulation layer is contacted with spacer material is inorganic material, so film Caking property is preferable when encapsulated layer is directly connected with spacer material, is formed on organic electroluminescence device layer and spacer material thin After film encapsulated layer, at least partly spacer material with exposed surface of thin-film encapsulation layer and folding region is directly connected, by Binding force is stronger between spacer material and thin-film encapsulation layer, enhances the adherency for separating underbed in the middle part of thin-film encapsulation layer and folding region Power, thus enhancing in folding region the adhesive force of thin-film encapsulation layer on substrate, and then can to avoid due to folding region it is frequently curved Folding causes thin-film encapsulation layer to be easy the case where starting, falling off, and is conducive to improve display effect.
Therefore, the display panel of above-mentioned preparation method preparation, is distributed in the middle part of multiple spacer materials of folding region and separates underbed It directly contacts and connects with thin-film encapsulation layer towards the surface of thin-film encapsulation layer, enhance part in thin-film encapsulation layer and folding region The adhesion strength of spacer material, so that the adhesive force of the thin-film encapsulation layer of folding region on substrate is enhanced, it is possible to prevente effectively from due to Bent area, which is frequently bent, causes thin-film encapsulation layer to be easy the case where starting, falling off, and is conducive to improve display effect.
Preferably, organic electroluminescence device layer is formed on the TFT device layer using the method for vapor deposition or printing.
Preferably, during forming organic electroluminescence device layer on the TFT device layer mask plate that uses for Open mask。
Preferably, using laser sintering processes at least partly dottle pin in the multiple spacer materials for being distributed in the folding region Electroluminescent organic material layer of the object on the surface of the substrate is completely removed.
Preferably, the thin-film encapsulation layer includes being sequentially arranged on the organic electroluminescence device layer and the spacer material First inorganic barrier layer, organic planarization layer and the second inorganic barrier layer;
Wherein, the thin-film encapsulation layer that formed on the organic electroluminescence device layer and the spacer material is specifically wrapped It includes:
Described first is formed on the organic electroluminescence device layer and the spacer material using vapor deposition method Inorganic barrier layer;
Organic planarization layer is formed in first inorganic barrier layer;
Second inorganic barrier layer is formed in the organic planarization layer using vapor deposition method.
A kind of display panel, including at least one folding region and at least two non-collapsible districts, further includes:
Substrate;
TFT device layer on the substrate;
Organic electroluminescence device layer on the TFT device layer is distributed in the folding region and non-collapsible district Multiple spacer materials;
Thin-film encapsulation layer on the organic electroluminescence device layer and the spacer material;
Wherein, be distributed in multiple spacer materials of the folding region at least partly spacer material away from the substrate surface with The thin-film encapsulation layer is directly contacted and is connected.
Preferably, be distributed in each of described folding region spacer material away from the substrate surface with the film Encapsulated layer is directly contacted and is connected.
Preferably, the spacer material distribution density of the folding region is greater than the spacer material distribution density of the non-collapsible district.
Preferably, at least partly table of the spacer material away from the substrate is distributed in multiple spacer materials of the non-collapsible district Face directly contacts and connects with the thin-film encapsulation layer.
Preferably, the thin-film encapsulation layer includes being sequentially arranged on the organic electroluminescence device layer and the spacer material First inorganic barrier layer, organic planarization layer and the second inorganic barrier layer.
Detailed description of the invention
Fig. 1 is the overall structure diagram of display panel provided in an embodiment of the present invention;
Fig. 2 to Fig. 5 is the local film layer structure in display panel preparation process provided in an embodiment of the present invention in folding region Change schematic diagram;
Fig. 6 is localized membrane schematic diagram of a layer structure in the folding region of display panel provided in an embodiment of the present invention;
Fig. 7 is the flow diagram of preparation method provided in an embodiment of the present invention;
Icon: 1- display panel;11- substrate;12-TFT device layer;13- organic electroluminescence device layer;14- spacer material; 15- thin-film encapsulation layer;16- electroluminescent organic material layer;The folding region 17-;18- non-collapsible district;The first inorganic barrier layer of 151-; 152- organic planarization layer;The second inorganic barrier layer of 153-.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other Embodiment shall fall within the protection scope of the present invention.
Fig. 7 and Fig. 2 are please referred to Fig. 6, the embodiment of the invention provides a kind of preparation methods of display panel, wherein Display panel 1 includes that at least one folding region 17 and at least two non-collapsible districts 18, above-mentioned preparation method specifically include:
Step S101 forms TFT device layer 12 on substrate 11;
Step S102 distributes in multiple spacer materials 14 of folding region 17 and non-collapsible district 18 on TFT device layer 12;
Step S103 forms organic electroluminescence device layer 13 on TFT device layer 12;
Step S104 will be distributed in at least partly spacer material 14 in multiple spacer materials 14 of folding region 17 away from substrate 11 Surface on electroluminescent organic material layer 16 completely remove to form exposed surface;
Step S105 forms thin-film encapsulation layer 15 on organic electroluminescence device layer 13 and spacer material 14, wherein point The spacer material 14 in multiple spacer materials 14 of folding region 17 with exposed surface is distributed in directly to contact and connect with thin-film encapsulation layer 15 It connects.
In the above preparation method, in conjunction with Fig. 1, as shown in Fig. 2, prepared display panel 1 is foldable display panel, Wherein, at least one folding region 17 and at least two non-collapsible districts 18 are provided on display panel, folding region 17 can bend, make Display panel bending state in different angles;In the preparation process of above-mentioned display panel 1, TFT device is formed on substrate 11 Part layer 12 has pixel region and non-pixel region in TFT device layer 12;As shown in figure 3, the then shape on TFT device layer 12 At multiple spacer materials 14, multiple spacer materials 14 are distributed in folding region 17 and non-collapsible district 18 respectively, and between each spacer material 14 It is spaced, wherein in the present embodiment for a folding region 17 and two non-collapsible districts 18 are set, folding region 17 Between two non-collapsible districts 18, multiple spacer materials 14 are each formed in folding region 17 and in two non-collapsible districts 18, and each Spacer material 14 is corresponding with the non-pixel region of TFT device layer 12;As shown in figure 4, being then prepared with after spacer material 14 is formed Electroluminescent display part layer, organic elctroluminescent device layer are corresponding with the pixel region of TFT device layer 12, wherein Organic material and metal material can inevitably fall in the surface of spacer material 14 during prepared by organic electroluminescence device layer 13, I.e. the surface of spacer material 14 can adhere to organic material and metal material, i.e., 14 surface of spacer material, which can adhere to, is used to prepare Organic Electricity The organic material and metal material of electroluminescence device layer 13 and form electroluminescent organic material layer 16, due to spacer material 14 be nothing The surface layer of machine material, thin-film encapsulation layer towards the spacer material 14 of subsequent preparation is also inorganic material, so spacer material 14 and film Binding force between encapsulated layer can be relatively good, electroluminescent organic material layer 16 and spacer material 14 and thin-film encapsulation layer 15 it is viscous Tie power it is poor, easily cause the problem of thin-film encapsulation layer 15 is started, fallen off, so, for increase folding region 17 spacer material 14 with The binding force of the thin-film encapsulation layer 15 of subsequent preparation, as shown in figure 5, multiple spacer materials 14 of folding region 17 next will be distributed in In at least partly spacer material 14 away from substrate 11 surface on electroluminescent organic material layer 16 completely removed with shape At exposed surface, and keep exposed surface clean, as shown in fig. 6, then in organic electroluminescence device layer 13 and spacer material 14 Upper formation thin-film encapsulation layer 15, then the spacer material 14 in multiple spacer materials 14 of folding region 17 with exposed surface and film seal Dress layer 15 is directly contacted and is connected, and the adhesion strength of the part spacer material 14 in thin-film encapsulation layer 15 and folding region 17 can be enhanced, To enhance adhesive force of the thin-film encapsulation layer 15 of folding region 17 on substrate 11, effectively avoid frequently bending due to folding region 17 It causes thin-film encapsulation layer 15 to be easy the case where starting, falling off, is conducive to improve display effect.
Specifically, in the above preparation method, organic electroluminescence is formed on TFT device layer using the method for vapor deposition or printing Light emitting device layer, and preferably, the mask plate used during forming organic electroluminescence device layer on TFT device layer for Open mask (Open mask, be open biggish mask plate) can use evaporation coating technique vapor deposition organic material to be used to form Organic electroluminescence device layer, and Open mask can be generally used when organic material is deposited.
Specifically, in above-mentioned preparation method, using laser sintering processes to the multiple spacer materials 14 for being distributed in folding region 17 In at least partly spacer material 14 away from substrate 11 surface on electroluminescent organic material layer 16 completely removed.Into During row is laser sintered, the position precision between strict control laser energy and laser and spacer material 14, to ensure to need It is dry towards the removal of electroluminescent organic material layer 16 on the surface of thin-film encapsulation layer 15 to carry out laser sintered spacer material 14 Only.
Specifically, above-mentioned thin-film encapsulation layer includes being sequentially arranged in first on organic electroluminescence device layer 13 and spacer material 14 Inorganic barrier layer 151, organic planarization layer 152 and the second inorganic barrier layer 153;
Wherein, the method tool of thin-film encapsulation layer 15 is formed on above-mentioned organic electroluminescence device layer 13 and spacer material 14 Body includes: to form the first inorganic barrier layer on organic electroluminescence device layer 13 and spacer material 14 using vapor deposition method 151;Organic planarization layer 152 is formed in the first inorganic barrier layer 151 using inkjet printing technology;Existed using vapor deposition method The second inorganic barrier layer 153 is formed in organic planarization layer 152.It is formed on spacer material using gas phase deposition technology first inorganic Barrier layer is conducive to the bonding between enhanced film encapsulated layer and spacer material with the spacer material good bonding strength of exposed surface Power avoids thin-film encapsulation layer from starting, fall off, advantageously ensures that display effect.
Based on same invention thought, Fig. 1 and Fig. 6, a kind of display panel 1 that the embodiment of the present invention also provides, packet are please referred to Include at least one folding region 17 and at least two non-collapsible districts 18, further includes: substrate 11;TFT device layer on substrate 11 12;Organic electroluminescence device layer 13 on TFT device layer 12, be distributed in folding region 17 and non-collapsible district 18 it is multiple every Underbed 14;Thin-film encapsulation layer 15 on organic electroluminescence device layer 13 and spacer material 14;Wherein, it is distributed in folding region At least partly spacer material 14 directly contacts and connects with thin-film encapsulation layer 15 away from the surface of substrate 11 in 17 multiple spacer materials 14 It connects.
In above-mentioned display panel, display panel is a foldable display panel, and wherein display panel 1 includes at least one folding Folded area 17 and at least two non-collapsible districts 18 specifically can be set a folding region 17 and two non-in above-mentioned display panel Folding region 18, and folding region 17 is between two non-collapsible districts 18, i.e. two non-collapsible districts 18 respectively in the two sides of folding region 17, Folding region 17 can be bent, the bending state for keeping display panel 1 in different angles;Display panel 1 includes substrate 11, on substrate 11 Equipped with TFT device layer 12, organic electroluminescence device layer 13 and multiple spacer materials 14 are formed on device layer, wherein folding Folded area 17 and two non-collapsible districts 18 are distributed with multiple spacer materials 14, cover on organic electroluminescence device layer 13 and spacer material 14 It is stamped the thin-film encapsulation layer 15 for obstructing steam, thin-film encapsulation layer 15 can protect organic electroluminescence device, be distributed in folding A part of spacer material 14 in the spacer material 14 in folded area 17 is indirectly towards the surface of thin-film encapsulation layer 15 and thin-film encapsulation layer 15 Touch and connect, since the surface that spacer material 14 is contacted with thin-film encapsulation layer 15 is inorganic material, the film layer of same class material it Between binding force it is stronger, then the adhesion strength for separating underbed 14 in the middle part of thin-film encapsulation layer 15 and folding region 17 is enhanced, so that enhancing exists Adhesive force of the thin-film encapsulation layer 15 on substrate 11 in folding region 17, and then can be to avoid due to folding region 17, frequently bending is caused Thin-film encapsulation layer 15 is easy the case where starting, falling off, and is conducive to improve display effect.
Therefore, it in above-mentioned display panel, is distributed in the middle part of multiple spacer materials 14 of folding region 17 and separates underbed 14 towards thin The surface of film encapsulated layer 15 directly contacts and connects with thin-film encapsulation layer 15, enhances 17 middle part of thin-film encapsulation layer 15 and folding region The adhesion strength for separating underbed 14, to enhance adhesive force of the thin-film encapsulation layer 15 of folding region 17 on substrate 11, Ke Yiyou Effect avoids causing thin-film encapsulation layer 15 to be easy the case where starting, falling off since bent area is frequently bent, and is conducive to improve display effect Fruit.
Wherein, in the above display panel, to further enhance in folding region 17 thin-film encapsulation layer 15 on substrate 11 Adhesive force can make each spacer material 14 for being distributed in folding region 17 direct with thin-film encapsulation layer 15 away from the surface of substrate 11 It contacts and connects.
Specifically, in above-mentioned display panel, 14 distribution density of spacer material of folding region 17 is greater than the dottle pin of non-collapsible district 18 14 distribution density of object.Folding region 17 and non-collapsible district 18 relative to display panel 1, general spacer material 14, which can be uniformly distributed, to be set It sets, it is appropriate to increase by 14 distribution density of spacer material in folding region 17 in the present embodiment, spacer material in folding region 17 can be effectively increased 14 quantity can effectively increase the contact area of spacer material 14 and film layer dress layer in folding region 17, then can make folding region The surface of 17 spacer material 14 towards thin-film package increases with the area that thin-film encapsulation layer 15 is directly contacted and connected, can be effective The adhesion strength for improving the spacer material 14 of thin-film encapsulation layer 15 and folding region 17, avoids thin-film encapsulation layer 15 from starting, fall off.
Specifically, it is adhesive force of the enhanced film encapsulated layer 15 on substrate 11, can also be arranged and be distributed in non-collapsible district At least partly spacer material 14 directly contacts and connects with thin-film encapsulation layer 15 away from the surface of substrate 11 in 18 multiple spacer materials 14 It connects, that is, the table that a part of spacer material 14 being distributed in multiple spacer materials 14 of non-collapsible district 18 deviates from substrate 11 can be set Face directly contacts and connects with thin-film encapsulation layer 15, and also can be set, which makes to be distributed in each spacer material 14 of non-collapsible district 18, deviates from The surface of substrate 11 directly contacts and connects with thin-film encapsulation layer 15, according to setting for the spacer material 14 in above-mentioned non-collapsible district 18 It sets, the whole adhesive force with substrate 11 of thin-film encapsulation layer 15 can be enhanced, thin-film encapsulation layer 15 is effectively avoided to start, fall off.
For the size setting of the spacer material 14 in above-mentioned display panel 1, spacer material 14 is set along perpendicular to substrate 11 The size in direction is more than or equal to 0.3 μm and to be less than or equal to 4 μm, that is, the thickness range of spacer material 14 is 0.3 μm~4 μm, It according to the specific design of above-mentioned display panel, is selected in 0.3 μm~4 μ ms suitably sized, is conducive to increase display surface The stability of spacer material 14 in plate is conducive to increase the bonding stability between spacer material 14 and thin-film encapsulation layer 15, Ke Yiyou Effect alleviates the situation that thin-film encapsulation layer 15 is started, fallen off.
Specifically, above-mentioned thin-film encapsulation layer 15 includes being sequentially arranged on organic electroluminescence device layer 13 and spacer material 14 the One inorganic barrier layer 151, organic planarization layer 152 and the second inorganic barrier layer 153.Wherein, the first inorganic barrier layer 151 and second The material of inorganic barrier layer 153 can be SiN, SiO or SiON, can play the role of obstructing water oxygen, and two layers of nothing is arranged Machine barrier layer can be organic material with the organic electroluminescence device in effective protection display panel, the material of organic planarization layer 152 Material can play the role of planarization and package foreign particles, can make the smooth setting of the second inorganic barrier layer 153, make film The overall structure of encapsulated layer 15 enhances.
In above-mentioned thin-film encapsulation layer 15, the first inorganic barrier layer 151 along the direction perpendicular to substrate 11 size be greater than Or it is equal to 0.3 μm and is less than or equal to 2 μm, that is, the thickness of the first inorganic barrier layer 151 can be in 0.3 μm~2 μ m It chooses, specifically, according to the specific design of display panel, the thickness of the first inorganic barrier layer 151 can be adjusted; Similarly, size of second inorganic barrier layer 153 along the direction perpendicular to substrate 11 is more than or equal to 0.3 μm and to be less than or equal to 2 μm, that is, the thickness of the second inorganic barrier layer 153 can be chosen in 0.3 μm~2 μ ms, likewise, according to display surface The specific design of plate can also be adjusted the thickness of the first inorganic barrier layer 151.
Specifically, organic planarization layer 152 along the direction perpendicular to substrate 11 size be more than or equal to 1 μm and be less than or Equal to 15 μm, that is, the thickness of organic planarization layer 152 is set as 1 μm~15 μm, more electedly in scheme, organic planarization layer 152 Thickness, according to the specific design of display panel, can adjust the thickness of organic planarization layer 152 at 6 μm~8 μm It is whole.
Obviously, those skilled in the art can carry out various modification and variations without departing from this hair to the embodiment of the present invention Bright spirit and scope.In this way, if these modifications and changes of the present invention belongs to the claims in the present invention and its equivalent technologies Within the scope of, then the present invention is also intended to include these modifications and variations.

Claims (10)

1. a kind of preparation method of display panel, the display panel includes at least one folding region and at least two non-collapsible Area, which is characterized in that the preparation method includes:
TFT device layer is formed on the substrate;
Multiple spacer materials of the folding region and non-collapsible district are distributed on the TFT device layer;
Organic electroluminescence device layer is formed on the TFT device layer;
By at least partly spacer material being distributed in multiple spacer materials of the folding region having on the surface of the substrate Electroluminescent material layer is completely removed to form exposed surface;
Thin-film encapsulation layer is formed on the organic electroluminescence device layer and the spacer material, wherein is distributed in the folding The spacer material with exposed surface is directly contacted and is connected with the thin-film encapsulation layer in multiple spacer materials in folded area.
2. preparation method according to claim 1, which is characterized in that using vapor deposition or the method for printing in the TFT device Organic electroluminescence device layer is formed on part layer.
3. preparation method according to claim 2, which is characterized in that form organic electroluminescence hair on the TFT device layer The mask plate used during optical device layer is Open mask.
4. preparation method according to claim 1, which is characterized in that using laser sintering processes to being distributed in the folding Electroluminescent organic material floor of at least partly spacer material on the surface of the substrate in multiple spacer materials in area carries out It completely removes.
5. preparation method according to claim 1, which is characterized in that the thin-film encapsulation layer includes being sequentially arranged in described to have First inorganic barrier layer, organic planarization layer and the second inorganic barrier layer on organic electroluminescence devices layer and the spacer material;
Wherein, the thin-film encapsulation layer that formed on the organic electroluminescence device layer and the spacer material specifically includes:
It is inorganic that described first is formed on the organic electroluminescence device layer and the spacer material using vapor deposition method Barrier layer;
Organic planarization layer is formed in first inorganic barrier layer;
Second inorganic barrier layer is formed in the organic planarization layer using vapor deposition method.
6. a kind of display panel prepared using preparation method as described in any one in claim 1-5, including at least one folding Folded area and at least two non-collapsible districts characterized by comprising
Substrate;
TFT device layer on the substrate;
Organic electroluminescence device layer on the TFT device layer is distributed in the multiple of the folding region and non-collapsible district Spacer material;
Thin-film encapsulation layer on the organic electroluminescence device layer and the spacer material;
Wherein, be distributed in multiple spacer materials of the folding region at least partly spacer material away from the substrate surface with it is described Thin-film encapsulation layer is directly contacted and is connected.
7. display panel according to claim 6, which is characterized in that be distributed in each of described folding region spacer material It directly contacts and connects with the thin-film encapsulation layer away from the surface of the substrate.
8. display panel according to claim 6, which is characterized in that the spacer material distribution density of the folding region is greater than institute State the spacer material distribution density of non-collapsible district.
9. display panel according to claim 6, which is characterized in that be distributed in multiple spacer materials of the non-collapsible district At least partly spacer material is directly contacted and is connected with the thin-film encapsulation layer away from the surface of the substrate.
10. display panel according to claim 6, which is characterized in that the thin-film encapsulation layer is described including being sequentially arranged in First inorganic barrier layer, organic planarization layer and the second inorganic barrier layer on organic electroluminescence device layer and the spacer material.
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