CN109402598A - 一种双面往返连续真空镀膜设备 - Google Patents

一种双面往返连续真空镀膜设备 Download PDF

Info

Publication number
CN109402598A
CN109402598A CN201811519640.8A CN201811519640A CN109402598A CN 109402598 A CN109402598 A CN 109402598A CN 201811519640 A CN201811519640 A CN 201811519640A CN 109402598 A CN109402598 A CN 109402598A
Authority
CN
China
Prior art keywords
transport mechanism
coating equipment
vacuum coating
retractable volume
ratchet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811519640.8A
Other languages
English (en)
Inventor
严佐毅
刘文卿
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Anhui New Mstar Technology Ltd
Original Assignee
Anhui New Mstar Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anhui New Mstar Technology Ltd filed Critical Anhui New Mstar Technology Ltd
Priority to CN201811519640.8A priority Critical patent/CN109402598A/zh
Priority to EP19159784.8A priority patent/EP3666924A1/en
Priority to US16/288,732 priority patent/US20200199742A1/en
Publication of CN109402598A publication Critical patent/CN109402598A/zh
Priority to KR1020190029776A priority patent/KR20200073101A/ko
Priority to JP2019051709A priority patent/JP6750151B2/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/351—Sputtering by application of a magnetic field, e.g. magnetron sputtering using a magnetic field in close vicinity to the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating Apparatus (AREA)

Abstract

本发明公开了一种双面往返连续真空镀膜设备，包括真空腔体，所述真空腔体内设置有上收放卷机构、上传送机构、下传送机构及下收放卷机构；所述下收放卷机构及下传送机构分别位于上收放卷机构及上传送机构的下方，待镀膜材料从上或下收放卷机构开始依次经过上或下传送机构、下或上传送机构后回到下或上收放卷机构；与所述上传送机构及下传送机构处的待镀膜材料对应的位置处均设置有一套镀膜装置。本发明通过设置上下两个收放卷机构以及上下两个镀膜装置，能够在真空腔体内实现连续往返镀膜，极大地提高了工作效率。

Description

一种双面往返连续真空镀膜设备
技术领域
本发明属于镀膜设备技术领域，尤其涉及一种双面往返连续真空镀膜设备。
背景技术
出于柔性导电和屏蔽材料的应用需要，为了能够对很薄的薄膜镀较厚的金属导电层，需要开发一种特殊的设备机构。所谓很薄的薄膜一般厚度为2～12μm，材料一般为PP、PE、PET、PI薄膜和聚酯纤维布、纸张等；所谓较厚的金属层从200～2000nm不等，金属层材料一般为导电和屏蔽材料，如镍、铝、铜、铅、银、金以及合金材料等。要想在薄膜表面获得对应厚度的金属导电层，其最大的难度是沉积效率，一般情况下，受薄膜耐热性能的影响，金属在薄膜表面的单次沉积厚度一般为5～100nm，要想获得200～2000nm厚度的金属导电层，就需要使用多次沉积的方法实现。而薄膜导电层的沉积一般是在真空条件下进行，如果真空设备不能往返镀膜，则每次沉积一层金属层之后都需要开仓，将需要沉积金属层的薄膜卷料进行收放卷换卷，这样操作每次都需要抽放真空，真空设备运行效率很低，如果能够在真空环境中实现往返连续镀膜，则真空镀膜的效率将大大提高。
发明内容
本发明的目的是提供一种双面往返连续真空镀膜设备，解决现有技术中的真空镀膜设备无法往返连续镀膜、效率较低的问题。
本发明所采用的技术方案是：
一种双面往返连续真空镀膜设备，包括真空腔体，所述真空腔体内设置有上收放卷机构、上传送机构、下传送机构及下收放卷机构；所述下收放卷机构及下传送机构分别位于上收放卷机构及上传送机构的下方，待镀膜材料从上或下收放卷机构开始依次经过上或下传送机构、下或上传送机构后回到下或上收放卷机构；与所述上传送机构及下传送机构处的待镀膜材料对应的位置处均设置有一套镀膜装置。
本发明的特点还在于：
所述上传送机构及下传送机构均包括一套皮带轮组件，所述皮带轮组件包括主动皮带轮、传动皮带以及分别设置在所述主动皮带轮两侧的两个棘轮传动件，所述主动皮带轮与两个棘轮传动件通过传动皮带连接。
所述棘轮传动件包括棘轮、棘爪及压缩弹簧，所述棘爪的自由端一侧与棘轮的棘齿啮合，所述棘爪的自由端另一侧与压缩弹簧连接。
所述皮带轮组件还包括冷却主鼓及展平辊，所述冷却主鼓与主动皮带轮同轴连接；所述展平辊设置两个，两个展平辊分别与两个棘轮同轴连接。
所述真空镀膜设备还包括至少一对过辊，所述至少一对过辊设置在上传送机构与下传送机构之间。
所述真空镀膜设备还包括等离子源清洗装置，所述等离子源清洗装置设置在待镀膜材料的一侧用于清洗待镀膜材料。
所述镀膜装置为电阻蒸发装置、中频感应坩埚蒸发装置、磁控溅射装置、电子枪式装置中的一种。
本发明的有益效果是：
与现有技术相比，本发明的一种双面往返连续真空镀膜设备，通过设置上下两个收放卷机构以及上下两个镀膜装置，能够在真空腔体内实现连续往返镀膜，极大地提高了工作效率。
附图说明
图1为本发明一种双面往返连续真空镀膜设备的整体结构示意图；
图2为本发明一种双面往返连续真空镀膜设备中皮带轮组件的结构示意图一；
图3为本发明一种双面往返连续真空镀膜设备中皮带轮组件的结构示意图二；
图4为本发明一种双面往返连续真空镀膜设备中棘轮传动件的结构示意图一；
图5为本发明一种双面往返连续真空镀膜设备中棘轮传动件的结构示意图二。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本发明进行进一步详细说明；应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。
本发明的一种双面往返连续真空镀膜设备，如图1所示，包括真空腔体1，所述真空腔体1内设置有上收放卷机构2、上传送机构3、下传送机构4及下收放卷机构5；所述下收放卷机构5及下传送机构4分别位于上收放卷机构2及上传送机构3的下方，待镀膜材料从上或下收放卷机构5开始依次经过上或下传送机构4、下或上传送机构3后回到下或上收放卷机构2；与所述上传送机构3及下传送机构4处的待镀膜材料对应的位置处均设置有一套镀膜装置6。
如图2、图3所示，所述上传送机构3包括一套皮带轮组件31，下传送机构4包括一套皮带轮组件41，所述皮带轮组件31/41包括主动皮带轮311/411、传动皮带312/412以及分别设置在所述主动皮带轮311/411两侧的两个棘轮传动件313/413，所述主动皮带轮311/411与两个棘轮传动件313/413通过传动皮带312/412连接。
如图4、图5所示，所述棘轮传动件313/413包括棘轮3131/4131、棘爪3132/4132及压缩弹簧3133/4133，所述棘爪3132/4132的自由端一侧与棘轮3131/4131的棘齿3134/4134啮合，所述棘爪3132/4132的自由端另一侧与压缩弹簧3133/4133连接。
所述皮带轮组件31还包括冷却主鼓314/414及展平辊315/415、316/416，所述冷却主鼓314/414通过键与主动皮带轮311/411同轴连接，主动皮带轮311/411与冷却主鼓314/414的动力来源于外部电机；所述展平辊设置两个，两个展平辊315/415、316/416分别与两个棘轮3131/4131通过平键同轴连接并同步旋转。
如图2所示，棘轮3131被传动皮带312带动向方向B旋转，此时由于压缩弹簧3133顶出棘爪3132，棘爪3132顶住棘齿3134，此时旋转方向上该棘轮传动件313为主动状态；反之，棘轮3131被传动皮带312带动向方向A旋转，虽然压缩弹簧3133顶出棘爪3132，但棘爪3132无法顶住棘齿3134，而是随棘齿3134弧度自由转动，此时旋转方向上该棘轮传动件313为从动状态。
所述真空镀膜设备还包括至少一对过辊7，所述至少一对过辊7设置在上传送机构3与下传送机构4之间。所述真空镀膜设备还包括等离子源清洗装置8，所述等离子源清洗装置8设置在待镀膜材料的一侧用于清洗待镀膜材料。所述镀膜装置6为电阻蒸发装置、中频感应坩埚蒸发装置、磁控溅射装置、电子枪式装置中的一种。
本发明的一种双面往返连续真空镀膜设备具有上下两个收放卷机构2、5以及上下两个镀膜装置6，自上收放卷机构2下部收卷和自下收放卷机构5上部收卷均可实现双面往返连续真空镀膜的功能。以自上收放卷机构2下部收卷为例，如图1-图3所示，2为卷料放卷装置上收放卷机构，穿膜顺序为2→315→311→316→7→416→411→415→5。此时，卷料经过展平辊315后进入主动皮带轮311带动的冷却主鼓314，此时膜面一侧在上部镀膜装置6上首先被镀上金属导电层；然后经过展平辊316、过辊7、展平辊416后，进入下部主动皮带轮411带动的冷却主鼓414，此时膜面另一侧在下部镀膜装置6上也被镀上金属导电层；然后经过415号展平辊进入下收放卷机构5；这样一次镀膜即可实现在薄膜上同时完成在膜面两面都镀上导电金属层。由于镀膜时，需要膜面尽可能地贴紧主鼓表面，需要形成一种拉紧的状态，在动力结构上来讲，出冷却主鼓的展平辊需要有主动动力，进入冷却主鼓的展平辊需要为被动，这样在膜的前进方向上就会形成前边有动力，后边无动力的情况，使膜面处于一种被拉动的状态，这样就可以保证膜面与冷却主鼓处于一种完全贴紧的状态。以上部放卷，下部收卷为例，穿膜顺序为2→315→311→316→7→416→411→415→5，对于上部的冷却主鼓314而言，为了保证膜面在冷却主鼓314上处于拉紧状态，此时316号辊对应棘轮棘爪机构处于主动状态拉动316号辊选装；315号辊对应棘轮棘爪机构处于从动状态，315号辊被膜面拉动转动，这样对冷却主鼓314而言，膜面就处于一种在运动方向上的拉紧状态。如果需要向反方向镀膜时，穿膜顺序为5→415→411→416→7→316→311→315→2，对于上部的冷却主鼓314而言，为了保证膜面在冷却主鼓314上处于拉紧状态，此时315号辊对应棘轮棘爪机构处于主动状态拉动315号辊选装；316号辊对应棘轮棘爪机构处于从动状态，316号辊被膜面拉动转动，这样对314号主鼓而言，膜面任然处于一种在运动方向上的拉紧状态。采用该机构后，不论膜面往哪个方向运行，均可以使冷却主鼓膜面处于一种拉紧的贴鼓状态，从而实现了双面往返连续真空镀膜的功能。
实施例1：
在上收放卷机构2处放卷，放卷直径600mm，基材材料为PI薄膜，镀膜装置6-3为中频感应加热坩埚，6-1和6-2为磁控溅射靶，靶的形式为平面靶，靶材材料为镍，坩埚内投入纯铜颗粒，铜粒的纯度≥99.95％，靶材的纯度≥99.99％，穿膜顺序为2→315→311→316→7→416→411→415→5，314、414冷却主鼓采用冷却液循环冷却，冷却温度-25℃，在真空≤8×10-1Pa的条件下镀膜，第1遍工艺是开启磁控溅射靶6-1和坩埚6-3电源，以10～60m/min的走膜速度，一次可以同时在基材两面得到5-30nm的镍底层和50～300nm厚度的铜镀层；第1遍工艺镀完以后，在不出仓的情况下进行第2-6遍工艺，第2-6遍只开启坩埚6-3的电源，以10～60m/min的走膜速度，5次往返镀膜可以同时在基材两面共增加250～1500nm厚度的铜镀层；第6遍工艺镀完以后，在不出仓的情况下进行第7遍工艺，第7遍开启磁控溅射靶6-2和坩埚6-3电源，以10～60m/min的走膜速度，可以同时在基材两面先增加50～300nm厚度的铜镀层再在铜层上面镀一层5-30nm的镍层。往返连续7次镀膜，就可以得到厚度5-30nm的镍底层、厚度350-2100nm的铜中间层和厚度5-30nm的镍表面层，膜入仓后可一次成型，相比与原来的7次出入真空仓室，效率大大提升85.71％，同时原材料利用率也有较大幅度大提升8％，有效减少膜面杂质和氧化情况，无需每次出入仓重新收放卷换卷引膜。
本发明未能详尽描述的设备、机构、组件和操作方法，本领域普通技术人员均可选用本领域常用的具有相同功能的设备、机构、组件和操作方法进行使用和实施。或者依据生活常识选用的相同设备、机构、组件和操作方法进行使用和实施。
以上所述仅为本发明的优选实施例，并不用于限制本发明，显然，本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样，倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内，则本发明也意图包含这些改动和变型在内。

Claims (7)

1.一种双面往返连续真空镀膜设备，其特征在于，包括真空腔体，所述真空腔体内设置有上收放卷机构、上传送机构、下传送机构及下收放卷机构；所述下收放卷机构及下传送机构分别位于上收放卷机构及上传送机构的下方，待镀膜材料从上或下收放卷机构开始依次经过上或下传送机构、下或上传送机构后回到下或上收放卷机构；与所述上传送机构及下传送机构处的待镀膜材料对应的位置处均设置有一套镀膜装置。
2.根据权利要求1所述的一种双面往返连续真空镀膜设备，其特征在于，所述上传送机构及下传送机构均包括一套皮带轮组件，所述皮带轮组件包括主动皮带轮、传动皮带以及分别设置在所述主动皮带轮两侧的两个棘轮传动件，所述主动皮带轮与两个棘轮传动件通过传动皮带连接。
3.根据权利要求2所述的一种双面往返连续真空镀膜设备，其特征在于，所述棘轮传动件包括棘轮、棘爪及压缩弹簧，所述棘爪的自由端一侧与棘轮的棘齿啮合，所述棘爪的自由端另一侧与压缩弹簧连接。
4.根据权利要求3所述的一种双面往返连续真空镀膜设备，其特征在于，所述皮带轮组件还包括冷却主鼓及展平辊，所述冷却主鼓与主动皮带轮同轴连接；所述展平辊设置两个，两个展平辊分别与两个棘轮同轴连接。
5.根据权利要求1-4中任一项所述的一种双面往返连续真空镀膜设备，其特征在于，所述真空镀膜设备还包括至少一对过辊，所述至少一对过辊设置在上传送机构与下传送机构之间。
6.根据权利要求5所述的一种双面往返连续真空镀膜设备，其特征在于，所述真空镀膜设备还包括等离子源清洗装置，所述等离子源清洗装置设置在待镀膜材料的一侧用于清洗待镀膜材料。
7.根据权利要求1-4中任一项所述的一种双面往返连续真空镀膜设备，其特征在于，所述镀膜装置为电阻蒸发装置、中频感应坩埚蒸发装置、磁控溅射装置、电子枪式装置中的一种。
CN201811519640.8A 2018-12-12 2018-12-12 一种双面往返连续真空镀膜设备 Pending CN109402598A (zh)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CN201811519640.8A CN109402598A (zh) 2018-12-12 2018-12-12 一种双面往返连续真空镀膜设备
EP19159784.8A EP3666924A1 (en) 2018-12-12 2019-02-27 A double-sided vacuum coating device for continuously coating a film back and forth
US16/288,732 US20200199742A1 (en) 2018-12-12 2019-02-28 Double-Sided Vacuum Coating Device For Continuously Coating A Film Back And Forth
KR1020190029776A KR20200073101A (ko) 2018-12-12 2019-03-15 양면 왕복 연속 진공 도금 장치
JP2019051709A JP6750151B2 (ja) 2018-12-12 2019-03-19 両面連続往復真空コーティング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811519640.8A CN109402598A (zh) 2018-12-12 2018-12-12 一种双面往返连续真空镀膜设备

Publications (1)

Publication Number Publication Date
CN109402598A true CN109402598A (zh) 2019-03-01

Family

ID=65458798

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811519640.8A Pending CN109402598A (zh) 2018-12-12 2018-12-12 一种双面往返连续真空镀膜设备

Country Status (5)

Country Link
US (1) US20200199742A1 (zh)
EP (1) EP3666924A1 (zh)
JP (1) JP6750151B2 (zh)
KR (1) KR20200073101A (zh)
CN (1) CN109402598A (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110129771A (zh) * 2019-04-16 2019-08-16 中国科学院电工研究所 一种薄膜沉积镀膜***及对薄膜进行沉积镀膜的方法
CN112795895A (zh) * 2021-03-31 2021-05-14 辽宁分子流科技有限公司 一种用于卷绕式真空镀膜机的真空穿膜机构
CN113210212A (zh) * 2021-03-23 2021-08-06 谢新荣 一种基于环境监测的反光条实验样品制备装置

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6791389B2 (ja) * 2018-03-30 2020-11-25 Ｊｆｅスチール株式会社 方向性電磁鋼板の製造方法および連続成膜装置
US20220186360A1 (en) * 2019-03-05 2022-06-16 Xefco Pty Ltd Improved vapour deposition system, method and moisture control device
CN112813400B (zh) * 2021-03-31 2024-05-24 泊肃叶科技(沈阳)有限公司 一种双面多工位卷绕式真空镀膜机
CN114481034B (zh) * 2022-01-04 2022-12-16 重庆金美新材料科技有限公司 一种复合金属箔的制备方法、设备和***
CN115433917B (zh) * 2022-10-18 2023-07-18 北京北方华创真空技术有限公司 一种主鼓组件及其应用的真空镀膜设备

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108624860A (zh) * 2018-08-07 2018-10-09 安徽金美新材料科技有限公司 一种双面往返连续真空镀膜设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11200046A (ja) * 1998-01-12 1999-07-27 Ricoh Co Ltd 巻き取り式成膜装置
JP2000307139A (ja) * 1999-04-21 2000-11-02 Fuji Electric Co Ltd 薄膜太陽電池の製造方法及び薄膜電極層形成装置
JP2004099961A (ja) * 2002-09-09 2004-04-02 Nippon Steel Corp 金属箔コート設備及びコーティング金属箔の製造方法
JP2010047784A (ja) * 2008-08-19 2010-03-04 Sumitomo Metal Mining Co Ltd 巻取装置及びロール・ツー・ロール処理装置
US8697582B2 (en) * 2011-11-22 2014-04-15 Panasonic Corporation Substrate conveying roller, thin film manufacturing device, and thin film manufacturing method
JP2016166378A (ja) * 2013-07-11 2016-09-15 日産自動車株式会社 表面処理装置および表面処理方法
JP6028711B2 (ja) * 2013-10-23 2016-11-16 住友金属鉱山株式会社 両面成膜方法と金属ベース層付樹脂フィルムの製造方法
KR20170069229A (ko) * 2014-10-17 2017-06-20 로터스 어플라이드 테크놀로지, 엘엘씨 혼합 산화물 장벽 피막의 고속 증착
KR20180013581A (ko) * 2016-07-29 2018-02-07 한국전력공사 그래핀 제조 장치, 그래핀 제조 방법 및 수퍼커패시터

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108624860A (zh) * 2018-08-07 2018-10-09 安徽金美新材料科技有限公司 一种双面往返连续真空镀膜设备

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110129771A (zh) * 2019-04-16 2019-08-16 中国科学院电工研究所 一种薄膜沉积镀膜***及对薄膜进行沉积镀膜的方法
CN110129771B (zh) * 2019-04-16 2021-04-20 中国科学院电工研究所 一种薄膜沉积镀膜***及对薄膜进行沉积镀膜的方法
CN113210212A (zh) * 2021-03-23 2021-08-06 谢新荣 一种基于环境监测的反光条实验样品制备装置
CN113210212B (zh) * 2021-03-23 2023-07-07 南京万禾科研仪器有限公司 一种基于环境监测的反光条实验样品制备装置
CN112795895A (zh) * 2021-03-31 2021-05-14 辽宁分子流科技有限公司 一种用于卷绕式真空镀膜机的真空穿膜机构

Also Published As

Publication number Publication date
US20200199742A1 (en) 2020-06-25
EP3666924A1 (en) 2020-06-17
KR20200073101A (ko) 2020-06-23
JP2020094267A (ja) 2020-06-18
JP6750151B2 (ja) 2020-09-02

Similar Documents

Publication Publication Date Title
CN109402598A (zh) 一种双面往返连续真空镀膜设备
CN108624860A (zh) 一种双面往返连续真空镀膜设备
CN1332060C (zh) 真空成膜装置及真空成膜方法
CN108624861A (zh) 双面连续镀膜的真空蒸镀装置
CN108754446A (zh) 一种卷绕式双面磁控溅射真空镀膜设备及镀膜方法
CN104294220B (zh) 一种蒸镀装置以及蒸镀方法
CN103707608A (zh) Pvc装饰膜多层无胶复合压纹连续生产设备
CN102628163B (zh) 碲化镉薄膜太阳能电池背接触层制作方法及立式镀膜装置
CN109355634A (zh) 双面连续镀膜的真空蒸镀装置
WO2022047947A1 (zh) 一种多辊式真空镀膜装置
CN102054623B (zh) 一种热控超导开关
CN208667836U (zh) 卷绕式双面磁控溅射真空镀膜设备
CN112652649A (zh) 一种量子点显示装置及其制备方法与应用
WO2012065372A1 (zh) 一种干法人造革制造机
CN202131365U (zh) 双排全幅宽无间隔布局快速蒸发硫化锌镀膜设备
WO2022041446A1 (zh) 一种导电薄膜的制备方法、电流汇集传输材料以及能量储存装置
CN218321595U (zh) 超薄柔性基材真空双面磁控溅射镀铜卷绕镀膜设备
CN110007539B (zh) 高效均匀变色的曲面电致变色透明器件及其制备方法
CN106086822B (zh) 适于批处理的卷对卷真空镀膜反应装置
CN201857424U (zh) 一种新型真空镀膜机
CN111501008B (zh) 一种横向真空蒸镀彩虹膜生产装置及其镀膜工艺
CN209191438U (zh) 一种植绒布热熔喷胶贴合机
CN110184581A (zh) 一种多方位镀膜的方法
CN206705685U (zh) 大规模连续转移高质量单层石墨烯薄膜的装置
CN206075957U (zh) 一种漆包机的行程控制***

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB02 Change of applicant information

Address after: Building 1, Building A, Building 603, Huaqiang Creative Industry Park, Biyan Community, Guangming Street, Guangming District, Shenzhen City, Guangdong Province, 518107

Applicant after: Shenzhen Jinmei New Material Technology Co.,Ltd.

Address before: 232200 R&D Building No. 3 in Chuangkai Science and Technology Park, East Happiness Avenue and North Chuangkai Science and Technology Park, Shouxian Xinqiao International Industrial Park, Huainan City, Anhui Province

Applicant before: ANHUI JINMEI NEW MATERIAL TECHNOLOGY CO.,LTD.

CB02 Change of applicant information