CN108950492B - Preparation method of VO2 composite file with optical limiting performance - Google Patents

Preparation method of VO2 composite file with optical limiting performance Download PDF

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CN108950492B
CN108950492B CN201810741672.6A CN201810741672A CN108950492B CN 108950492 B CN108950492 B CN 108950492B CN 201810741672 A CN201810741672 A CN 201810741672A CN 108950492 B CN108950492 B CN 108950492B
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film
layer
sio2
file
solution
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CN108950492A (en
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田野
曹雪
罗飞
刘大博
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AECC Beijing Institute of Aeronautical Materials
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0406Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being air
    • B05D3/0413Heating with air
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5806Thermal treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5846Reactive treatment
    • C23C14/5853Oxidation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2203/00Other substrates
    • B05D2203/30Other inorganic substrates, e.g. ceramics, silicon

Abstract

The information terms to The technical field of functional files, and The spatial relationship to a prediction method of a VO2 complex filter application to a laser processing technology, The information terms Au/SiO2 or Ag/SiO2 no-structure layer with an interface layer size and an adaptive size on The surface of The VO2 complex layer on The surface layer processing technology, The electronic efficiency modifying The layer size and The application processing The layer processing technology of The sample with a specific spatial relationship between The functional layer and The filter layer, The application layer and The application layer of The application layer and The application of The application layer and The application of The, the special requirements on the size and the shape of the VO2 file area, so that the so that a new technology is high in efficiency, short in period and capable of bearing in industry of the I2-based laser technical file.

Description

Preparation method of VO2 composite file with optical limiting performance
Technical   Field
The innovation weights to The technical field of functional files, and The spatial relationships to a preparation method of a VO2 composite file applied to a laser technology.
Backsound
With the aid of the longitudinal description of the laser interference and/or scanning applications, the non-material sub-for-laser protection from the present, and the inorganic component to the present protected generated In 1959, the Mobile distributed for the first time of the oxidation of the vacuum and/or titanium magnetic properties, the medium, the inorganic component, the, and has wide application potential in the aerospace field.
The term of material preparation, the term of related used variable methods, the VO2 by file is prepared by sol-gel, the term of magnetic separation, the term of pulse displacement, the term of phase displacement, the displacement, and the displacement, the displacement, and the displacement.
Surface Plasma Response (SPR) is a novel light management system, and has a background By using in fields chemical engineering, parametric analysis, materials, food, environment, etc. By using organized Nanostructures of Au, Ag, etc. on The Surface of relational analysis files, The parametric analysis programs, The parametric analysis, The electronic analysis, The electronic, the expression implementation of the surface area technology requiring the size of the Au, Ag and other nano-materials to have good understanding, on the other hand, expression implementation of the surface area technology requiring size of the non-metallic nano-structures sub-Ag, wireless functional inputs of the surface area technology, expression and Au nano-structure with the size of the surface area and the size of the surface area sub-size of the surface area and the surface area of the surface area, expression of the surface area and the surface area of the surface area with the size of the surface area and the size of the surface area sub-size of the surface area and the surface area of the surface area, VO, surface area of the surface area and the surface area of the biological filter VO, and surface area of the biological filter VO, and the surface area of the surface area of the surface of the biological filter VO, the surface area of the surface area of the surface of.
Discloseness of invasion
In order to solve the problem that the distribution of the existing optical limiting VO2 through film In the preparation process, the introduction of the distribution of the method a preparation method of a VO2 composite film with optical limiting performance.
The process comprises The following steps:
1) Spacing a metal V film with the thickness of 200nm on clean square substrate by measuring a metal target as a spacing source under the condition of mapping of area, mapping the substrate temperature at 200 ℃, spacing for 60min and spacing power at 150W;
2) (ii) plating the substrate spaced with the V film in a tube fuel, and interconnecting reagent-oxidant mixed gas for interconnecting, where the ratio of reagent to oxidant is 10: 1, interconnecting at 480 ℃ for 60min, and fusing to a reagent and labeling out;
3) A method for producing a porous silica gel comprises Mixing 50ml of absolute ethyl alcohol, 7ml of deionized water And 7ml of strong ammoniacal water, And unreacted cementing to biological water reaction, And slow drawing 5-20 ml of hydrolytic in a stable-hydrolytic water bath at 40 ℃, cementing And reactivating for 30min, And reactivating for 24 h.
4) An unreacted coating the SiO2 microspether solution on the surface of the VO2 file by using a film coater, a gaseous coating the particulate parameters low-speed-particulate coating the particulate of 300 temporal solution for 10s, And a high-speed particulate coating the particulate of 1000 temporal solution for 30 s, the particulate of 150 ℃ for 1 h.
5) The winding Au film or Ag film on the film under the orientation condition by using Au target or Ag target as winding source, the winding the substrate temperature is at 150 ℃, the winding time is 2min, And the winding power is 50W. Thus, the required VO2 composition film wall object.
The introduction has The advantages of The additives and The benefical effects
The information displacement of a prediction method of a VO2 composite file with optical property, An Au/SiO2 or Ag/SiO2 no-structure layer with inorganic property and An adaptive size prediction on The surface of The VO2 file based on The surface modification technology, a so-called "glue layer to layer thickness and layer thickness property", a so-called "glue layer to layer thickness and layer thickness property", a so-called "glue layer to layer thickness property and layer thickness property, a so-called" glue layer to layer thickness property and layer thickness property, a so-called glue layer thickness property and layer property, a glue layer, a so-called glue layer, a glue, so that The short in period and capable of being used for The VO 2-based laser technical film, The VO2 composite film prepared by The method has The following steps:
The Au/SiO2 or Ag/SiO2 nanostructured layer has high particulate size uniformity, and The particulate size can be connected to The conditioned adjusted.
The Au/SiO2 or Ag/SiO2 nanostructured layer has The surface area conductivity transformer, and under laser radiation, The photothermal effect of The Au or Ag nanostructured layer name a large amount of heat energy, so The surface temperature of The VO2 film is involved in The phase change temperature structure package, The phase change time of The film is short, and The device of The thermal efficiency of The film is open to The atmosphere.
3. The upper the string scattering effect of the Au/SiO2 or Ag/SiO2 nanostructured layer, the propagation length of the laser beam in the VO2 file is summary, the so at the surface temperature field of the file-Under laser radiation in the more mobile, and the VO2 m volume and index transformed to a metal state.
The Add 4, the Au/SiO2 or Ag/SiO2 nanostructured layer has good wiring property And compatibility with the basic VO2 film, And the laser transmittance of the VO2 composite film can be found following the prediction of not reflecting the information property of the VO2 film, And the middle, the laser data resistance threshold of the film growth.
5. The preparation process is simple, ex-dependent equivalent is not needed, and large-area preparation and batch production can be controlled to be reused.
Drawings
FIG. 1 is an SEM photograph of an Au/SiO2/VO2 composite film prepared in example 1;
FIG. 2 is an SEM photograph of the Ag/SiO2/VO2 composite film prepared in example 1;
FIG. 3 is an SEM photograph of the Au/SiO2/VO2 composite film prepared in example 2;
FIG. 4 is an SEM photograph of the Ag/SiO2/VO2 composite film prepared in example 2.
Detailed   Description
The present introduction is The dirty transported with reference to specific samples, while The high area is involved to The bit transporting only and not to The limit of The scope of The introduction.
Example 1
1) Spacing a metal V film with the thickness of 200nm on clean square substrate by measuring a metal target as a spacing source under the condition of mapping of area, mapping the substrate temperature at 200 ℃, spacing for 60min and spacing power at 150W;
2) (ii) plating the substrate spaced with the V film in a tube fuel, and interconnecting reagent-oxidant mixed gas for interconnecting, where the ratio of reagent to oxidant is 10: 1, interconnecting at 480 ℃ for 60min, and fusing to a reagent and labeling out;
3) A Mixing 50ml of absolute ethyl alcohol, 7ml of deionized water And 7ml of strong ammoniacal water, And unsaturated cementing to biological a reaction solution, in an a constant temperature water bath at 40 ℃, 5ml of a hydrolytic slurry of said reaction solution, And said reaction is carried out for 24 waters with said neutralizing And reaction for 30 minutes, And for an And after said reaction is found, And for a lubricating slurry of said reaction solution And said reaction is carried out for said reacting to 2 SiO.
4) An unreacted coating the SiO2 microspether solution on the surface of the VO2 file by using a film coater, a gaseous coating the particulate parameters low-speed-particulate coating the particulate of 300 temporal solution for 10s, And a high-speed particulate coating the particulate of 1000 temporal solution for 30 s, the particulate of 150 ℃ for 1 h.
5) The winding Au film or Ag film on the film under the orientation condition by using Au target or Ag target as winding source, the winding the substrate temperature is at 150 ℃, the winding time is 2min, And the winding power is 50W. Thus, the required VO2 composition film wall object.
FIG. 1 shows SEM photosgraph of Au/SiO2/VO2 composite film prepared in example 1, and it can be seen from a third of The series of layers of Au/SiO2 nanostructured layer modified from a third of The series of layers of VO2 polycrystalline film, and The Au/SiO2 nanostructured layer size of both The series of layers of adhesive 300nm and The series of layers of adhesive high viscosity and bottom of The series of layers of adhesive high viscosity, and The series of layers of adhesive high viscosity, Au/SiO2 nanostructured layer of The series of layers of porous layer modified layer of adhesive high viscosity and bottom of The series of layers of adhesive high viscosity, and bottom of The series of layers of adhesive high viscosity, such as The series of layers of adhesive film, such as The series of layers of films of adhesive high viscosity, such as The composite film prepared from The series of layers of films of layers of The series of layers of adhesive films of layers of The series of adhesive low viscosity and bottom of layers of The series of layers of The series of layers the Au/SiO2 nanostructured layer, a flame released sites alkali, and the enhancement of the laser amplification performance is used by the surface plasma response of Au.
FIG. 2 show SEM pictures of The Ag/SiO2/VO2 composite filter expressed in extract 1, and it can be seen from The surface of The VO2 polycrystalline filter expressed with a layer of Ag/SiO2 nano structure layer, The grain size of Ag/SiO2 nano structure expressed 300nm, and The Ag/SiO2 nano structure having high viscosity and uniformity, The term of The porous structure of The Ag/SiO2 nano structure layer of The Ag/SiO2 nano structure layer expressed in layer of The SiO 5 nano structure layer, and The grain size of The porous structure of The SiO2 nano structure layer expressed in layer of The SiO 5 porous structure represented in layer of The SiO 5 porous layer expressed in layer of The SiO 5 porous structure represented in layer of The layer expressed in layer of The SiO 5 layer expressed in layer of The SiO 5 layer expressed in layer of The layer expressed in layer of The SiO 5 layer expressed in The efficiency of the laser transmission of the VO2 file, the flame replacement tests of the laser large resistance of the file is the negative impedance, and the enhancement of the laser amplitude limiting performance of the basic circuit used by the surface resistance effect of Ag.
Example 2
1) Spacing a metal V film with the thickness of 200nm on clean square substrate by measuring a metal target as a spacing source under the condition of mapping of area, mapping the substrate temperature at 200 ℃, spacing for 60min and spacing power at 150W;
2) (ii) plating the substrate spaced with the V film in a tube fuel, and interconnecting reagent-oxidant mixed gas for interconnecting, where the ratio of reagent to oxidant is 10: 1, interconnecting at 480 ℃ for 60min, and fusing to a reagent and labeling out;
3) A method for producing a porous silica gel includes Mixing 50ml of aqueous ethyl alcohol, 7ml of deionized water And 7ml of strong ammoniacal water, And inorganic cementing to an aqueous reaction solution, in an a constant temperature water bath at 40 ℃, 20ml of a hydrolytic slurry of the hydrolysis solution, And the reaction of the slurry of the hydrolysis solution for 24 waters with the neutralization, And the hydrolysis of the hydrolysis solution for refining the slurry of the hydrolysis solution And the hydrolysis of the hydrolysis solution for use of the aqueous reaction solution, And for the aqueous dispersion of the hydrolysis solution for the silica gel SiO 2.
4) An unreacted coating the SiO2 microspether solution on the surface of the VO2 file by using a film coater, a gaseous coating the particulate parameters low-speed-particulate coating the particulate of 300 temporal solution for 10s, And a high-speed particulate coating the particulate of 1000 temporal solution for 30 s, the particulate of 150 ℃ for 1 h.
5) The winding Au film or Ag film on the film under the orientation condition by using Au target or Ag target as winding source, the winding the substrate temperature is at 150 ℃, the winding time is 2min, And the winding power is 50W. Thus, the required VO2 composition film wall object.
FIG. 3 shows an SEM photograph of the Au/SiO2/VO2 composite film prepared in example 2, which shows that a thin Au/SiO2 nanostructure layer covers the surface of the VO2 polycrystalline film, and the Au/SiO2 nanoparticles have a particle size of about 1 μm and have high sphericity and uniformity. The test result of the ultraviolet-visible absorption spectrum shows that the Au/SiO2 nanostructure layer has good surface plasmon resonance absorption characteristics. As can be seen by comparing the results of FIG. 1, the particle size of Au/SiO2 is significantly increased. Under the irradiation of the pulse laser, the transmittance of the film is further compared, and the transmittance of the Au/SiO2/VO2 composite film under different pulse energies is lower than that of a single VO2 film. This shows that the laser transmittance of the VO2 film can be effectively reduced by the VO2 film compounded by the Au/SiO2 nanostructure layer. Further relevant tests also find that the laser damage resistance threshold of the film is obviously improved, and the enhancement of the laser amplitude limiting performance is probably caused by the surface plasmon resonance effect of Au.
FIG. 4 shows SEM photostage of Ag/SiO2/VO2 composite filter prepared in example 2, while The surface of VO2 polycrystalline filter is converted with a surface of Ag/SiO2 nanostructured layer, and The Ag/SiO2 nanostructured surface of adhesive layer of high uniformity and uniformity, The surface of The porous layer of The Ag/SiO2 nanostructured layer of adhesive layer of The surface of SiO 3526, The surface of The SiO2 of The surface of The SiO2, The surface of The SiO2 of The surface of The ceramic filter, The surface of The ceramic filter of the at the VO2 file completed by the Ag/SiO2 nanostructured layer expression of the laser transmission of the VO2 file, the flame retardant residual tests alkali formed at the laser database resistance of the file is not changed by the surface expression of the Ag.

Claims (1)

1. A preparation method of VO2 composition of files with optical limiting performance is a method of composing the following steps:
1) Spacing a metal V film with the thickness of 200nm on clean square substrate by measuring a metal target as a spacing source under the condition of mapping of area, mapping the substrate temperature at 200 ℃, spacing for 60min and spacing power at 150W;
2) (ii) plating the substrate spaced with the V film in a tube fuel, and interconnecting reagent-oxidant mixed gas for interconnecting, where the ratio of reagent to oxidant is 10: 1, interconnecting at 480 ℃ for 60min, and fusing to a reagent and labeling out;
3) Mixing 50ml of absolute ethyl alcohol, 7ml of deionized water and 7ml of strongg ammonias water, and unorganized cementing to biological a reaction solution, slow drainage adding 5-20 ml of hydrolytic in the solution of hydrolysis in a constant-hydrolytic water base at 40 ℃, cementing and reclaiming for 30min, and reclaiming for 24 h, after the reaction is finished, reclaimed centering and washing for the hydrolytic in the solution of hydrolytic in a SiO2 solution;
4) A uniformity coating the SiO2 microspether solution on the surface of the film compressed in the step 2) a by using a film coater, a personal film coating the surface of the film coated in the step for 10s, a high-speed film coating the surface of the film coated in the film coated for 300 r/min for 30s, and a film coating the surface of the film coated in the step for 1h for coating and film forming at 150 ℃;
5) An (3) partitioning an Au file or an Ag file on the file predicted in the step 4) under the aspect conditioning by a labeling Au target or an Ag target as a partitioning source, a labeling substrate temperature at 150 ℃, the partitioning time at 2min And the partitioning power at 50W to the object the purified VO2 composite file.
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CN110048227B (en) * 2019-04-23 2020-09-11 南京大学 Bowtie nano antenna device and method based on dynamic adjustment of vanadium dioxide phase change
CN111500265A (en) * 2020-02-21 2020-08-07 南京理工大学 Double-layer core-shell structure nanoparticle with adjustable surface temperature

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CN106435472A (en) * 2016-10-18 2017-02-22 天津大学 Preparation method of gold triangular nanoparticle array and vanadium dioxide film composite embedded structure
CN107177823A (en) * 2017-06-14 2017-09-19 中国航发北京航空材料研究院 A kind of Ag/VO with lasing safety performance2The preparation method of laminated film
CN108034927A (en) * 2017-11-06 2018-05-15 天津大学 VO for the more broad band absorbers of near-infrared2Film composite structure preparation method

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CN106435472A (en) * 2016-10-18 2017-02-22 天津大学 Preparation method of gold triangular nanoparticle array and vanadium dioxide film composite embedded structure
CN107177823A (en) * 2017-06-14 2017-09-19 中国航发北京航空材料研究院 A kind of Ag/VO with lasing safety performance2The preparation method of laminated film
CN108034927A (en) * 2017-11-06 2018-05-15 天津大学 VO for the more broad band absorbers of near-infrared2Film composite structure preparation method

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