CN108873470A - A kind of quantum stippling film backing structure - Google Patents

A kind of quantum stippling film backing structure Download PDF

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Publication number
CN108873470A
CN108873470A CN201810657412.0A CN201810657412A CN108873470A CN 108873470 A CN108873470 A CN 108873470A CN 201810657412 A CN201810657412 A CN 201810657412A CN 108873470 A CN108873470 A CN 108873470A
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sub
black matrix
film
water oxygen
lens
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CN108873470B (en
Inventor
徐胜
郭太良
陈恩果
叶芸
缪煌辉
黄佳敏
雷霄霄
谢洪兴
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Fuzhou University
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Fuzhou University
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336Illuminating devices
    • G02F1/133615Edge-illuminating devices, i.e. illuminating from the side
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336Illuminating devices
    • G02F1/133614Illuminating devices using photoluminescence, e.g. phosphors illuminated by UV or blue light

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)
  • Planar Illumination Modules (AREA)

Abstract

The present invention relates to a kind of quantum stippling film backing structures, including the reflector plate set gradually from the bottom to top, light guide plate, lower water oxygen obstructs diffusion barrier, quantum stippling film, upper water oxygen obstructs lens coating, lower polarizing film, liquid crystal film and upper polarizer, quantum stippling film includes the black matrix structure of multiple sub- black matrix splicing compositions to match with red green blue sub-pixels, with in the matched sub- black matrix of red sub-pixel be filled with the slurry containing red quantum dot, with in the matched sub- black matrix of green sub-pixels be filled with the slurry containing green quantum dot, with in the matched sub- black matrix of blue subpixels without filling, the upper surface of upper water oxygen barrier lens coating is in the lens microstructure to match with sub-pixel.Compared with prior art, the present invention is equipped with special material and micro-structure by the position of improvement quantum dot film again and the utilization rate of light can be improved, solve the problems, such as quantum dot encapsulation and can substitute the effect of the diffusion barrier and prism film in backlight.

Description

A kind of quantum stippling film backing structure
Technical field
The present invention relates to field of liquid crystal display, more particularly, to a kind of quantum stippling film backing structure.
Background technique
LCD technology is widely applied in social every field in recent years.It is horizontal continuous along with people's lives It improves, the requirement to the display quality of liquid crystal display is also gradually increased, wherein there is very high want in terms of colour gamut and brightness It asks.Quantum dot preferably solves this problem as a kind of appearance of new material, and quantum dot has emission wavelength tunable, hair Light width, luminous efficiency is high, light, heat and good chemical stability, forms a film by solution processing, spin coating or ink jet printing It is the luminescent material of new generation shown applied to solid-state lighting and full color flat panel afterwards by luminescence generated by light.Quantum dot LED and tradition Fluorescent powder LED and current organic LED compare, when for showing and illuminate, have colour gamut is wide, the high and low power consumption of excitation purity, The advantages that low cost, easy processing.
With the color in spectra collection, with high purity and luminous in utilizing structure of the quanta point material for luminescence generated by light It can be adjusted by the ratio of quanta point material.Its advantage applied display field can be very good improve display set Standby contrast and colour gamut.However present technology is essentially consisted in R(It is red)G(It is green)Quantum dot pass through solution or slurry Quantum dot site, quantum dot film and quantum dot pipe is made in proportion mode hybrid package in site, diaphragm and glass tube, and By these structures as the structure of backlight among, and using blue light as backlight, excite red green quantum dot to issue by blue light and correspond to Color light.
Summary of the invention
It is an object of the present invention to overcome the above-mentioned drawbacks of the prior art and provide a kind of quantum stippling films to carry on the back Photo structure, the position by improving quantum dot film is equipped with special material and micro-structure again can be improved the utilization rate of light, solution Certainly quantum dot encapsulates problem and can substitute the effect of the diffusion barrier and prism film in backlight.
The purpose of the present invention can be achieved through the following technical solutions:
A kind of quantum stippling film backing structure includes the reflector plate set gradually from the bottom to top, light guide plate, the barrier diffusion of lower water oxygen Film, quantum stippling film, upper water oxygen barrier lens coating, lower polarizing film, liquid crystal film and upper polarizer, the lower water oxygen obstruct diffusion barrier It is inside laid with scattering particles, the quantum stippling film includes that multiple sub- black matrix to match with red green blue sub-pixels are spliced The slurry containing red quantum dot is filled in the black matrix structure of composition, with the matched sub- black matrix of red sub-pixel, with green Filled with nothing in the slurry containing green quantum dot, with the matched sub- black matrix of blue subpixels in the sub- black matrix of subpixel matching The upper surface of filling, the upper water oxygen barrier lens coating is in the lens microstructure to match with sub-pixel.
The production method of the quantum stippling film includes the following steps:
1)Black matrix structure is made by the technique of photoetching or printing in lower water oxygen barrier diffusion barrier upper surface;
2)According to practical light requirement out, the red green quantum dot for setting usage ratio is dissolved in toluene, chlorobenzene, n-hexane, normal octane In corresponding slurry is obtained in one or more solvents, by the technique that prints or print by the slurry of red green quantum dot point It is not transferred in the sub- black matrix position of corresponding sub-pixel, the sub- black matrix position of corresponding blue subpixels is empty;
3)Upper water oxygen barrier lens coating is depressed into above quantum stippling film.
The material of the upper water oxygen barrier lens coating is PS, is modified PS, AS, PMMA, PC, diallyl diglycol carbonates Polymer, diallyl phthalate, diene Poly-s 179, styrene, methyl methacrylate, polymethylacrylic acid hydroxyl Ethyl ester or ethylene glycol dimethacrylate.
Heat dissipation particle in the lower water oxygen barrier diffusion barrier is polystyrene, poly- polymethacrylic acid methyl ester, silicide, propylene One of acid is a variety of.
It is produced by way of surface imprint for improving light diffusion the lower surface of the lower water oxygen barrier diffusion barrier The irregular structure of ability.
The lens microstructure of the upper water oxygen barrier lens coating is the convex lens being made by roll-to-roll coining, each The setting position of sub- black matrix of the setting position of a convex lens with matching with corresponding sub-pixel is consistent, the base of convex lens With a thickness of 15um-50um, radius of curvature is 7 × 10 at bottom-5 m-10×10-5m。
The lens microstructure of the upper water oxygen barrier lens coating is to imprint the prism being made by roll-to-roll, each The setting position of sub- black matrix of the setting position of prism with matching with corresponding sub-pixel is consistent, the substrate thickness of prism For 15um-50um, the section of prism is in isosceles triangle, and the corner angle of prism is 10 degree of -90 degree.
Compared with prior art, the present invention has the following advantages that:It is special that position by improving quantum dot film is equipped with again Material and micro-structure can be improved the utilization rate of light efficiency, solve the problems, such as quantum dot encapsulation and can substitute the expansion in backlight Dissipate the effect of film and prism film.
Detailed description of the invention
Fig. 1 is the schematic diagram of the quantum stippling film backing structure of embodiment one;
Fig. 2 is the schematic diagram of the quantum stippling film backing structure of embodiment two.
In figure, 11- reflector plate, 12- light guide plate, the site 121-, water oxygen obstructs diffusion barrier under 21-, 211- scattering particles, 31- black matrix structure, 32- red quantum dot, 33- green quantum dot, the oxygen barrier convex lens substrate of the upper water proof of 41-, the upper water proof of 42- every Oxygen prism substrate, polarizing film under 13-, 14- liquid crystal film, 15- upper polarizer, 16- blue LED lamp.
Specific embodiment
The present invention is described in detail with specific embodiment below in conjunction with the accompanying drawings.The present embodiment is with technical solution of the present invention Premised on implemented, the detailed implementation method and specific operation process are given, but protection scope of the present invention is not limited to Following embodiments.
Embodiment one
As shown in Figure 1, a kind of quantum stippling film backing structure include the reflector plate 11 set gradually from the bottom to top, light guide plate 12, Lower water oxygen barrier diffusion barrier 21, quantum stippling film, upper water oxygen barrier lens coating, lower polarizing film 13, liquid crystal film 14 and upper polarizer 15, lower water oxygen obstructs and is laid with scattering particles 211 in diffusion barrier 21, and quantum stippling film includes multiple and red green blue sub-pixels The black matrix structure 31 of the sub- black matrix splicing composition to match, is filled with in the matched sub- black matrix of red sub-pixel containing red The slurry containing green quantum dot 33 is filled in the slurry of color quantum dot 32, with the matched sub- black matrix of green sub-pixels, with indigo plant Without filling in the matched sub- black matrix of sub-pixels, the upper surface of upper water oxygen barrier lens coating is in the lens to match with sub-pixel Micro-structure.
The production method of quantum stippling film includes the following steps:
1)The obstacle of black matrix structure 31 is made by the technique of photoetching or printing in lower water oxygen barrier 21 upper surface of diffusion barrier;
2)According to practical light requirement out, the red green quantum dot for setting usage ratio is dissolved in toluene, chlorobenzene, n-hexane, normal octane In corresponding slurry is obtained in one or more solvents, by the technique that prints or print by the slurry of red green quantum dot point It is not transferred in the sub- black matrix position of corresponding sub-pixel, the sub- black matrix position of corresponding blue subpixels is empty;
3)Upper water oxygen barrier lens coating is depressed into above quantum stippling film, plays the role of that water proof is oxygen barrier and optically focused.
The material of upper water oxygen barrier lens coating is PS, is modified PS, AS, PMMA, PC, diallyl diglycol carbonate polyisocyanate polyaddition Object, diallyl phthalate, diene Poly-s 179, styrene, methyl methacrylate, poly hydroxy ethyl acrylate Or ethylene glycol dimethacrylate.
Heat dissipation particle in lower water oxygen barrier diffusion barrier 21 is polystyrene, poly- polymethacrylic acid methyl ester, silicide, acrylic acid One of or it is a variety of.Irregular structure is produced in the lower surface of lower water oxygen barrier diffusion barrier 21 by way of surface imprint, For improving light diffusivity.
The lens microstructure of upper water oxygen barrier lens coating is to imprint the convex lens being made by roll-to-roll, i.e., upper water oxygen Obstruct lens coating and use the oxygen barrier convex lens substrate 41 of upper water proof, the setting position of each convex lens with corresponding sub-pixel phase The setting position for the sub- black matrix matched is consistent, and the substrate thickness of convex lens is 15um-50um, and radius of curvature is 7 × 10-5 m-10×10-5m.Such as:The substrate thickness of convex lens is 15um, and radius of curvature is 7 × 10-5M, alternatively, the substrate of convex lens With a thickness of 30um, radius of curvature is 8 × 10-5 m。
The manufacturing process of quantum stippling film backing structure is as follows:
1)Lower water oxygen barrier diffusion barrier 21 is made first, by optical grade PMMA particle and doping scattering particles 211(It is inorganic Particle or polymer particles)With high temperature and high pressure injects cooling forming in mold, the specification of substrate required for being formed and its Irregular structure is produced in lower surface, improves light diffusivity.
2)Black matrix structure 31 is made on the substrate of lower water oxygen barrier diffusion barrier 21, passes through the method for photoetching, photoetching Effect be to be realized in the pattern transfer to glass surface on mask especially by gluing, graph exposure, development.Often One sub- black matrix obstacle width is 20um, is highly 1um, and center size is 73um*210um.According still further to red green blue three A sub-pixel is distributed.
3)The slurry of red quantum dot 3232 and green quantum dot 3333 is divided using inkjet printing or the technique of printing It is not transferred in sub- black matrix barrier in corresponding red green sub-pixel position, sub-pixel position is according to red, green, empty suitable Sequence arrangement, and empty sub-pixel position is not filled with.
4)The oxygen barrier convex lens substrate 41 of upper water proof is made again, the spin coating OPI resin on transparent pmma substrate, it will It sets shape and carries out roll-to-roll coining and UV above it and solidify and form micro-structure.By the oxygen barrier convex lens substrate of upper water proof 41 are impressed into quantum coloured silk film is packaged up.
5)Finally lower polarizing film 13, liquid crystal film 14 and upper polarizer are set gradually on the upper oxygen barrier convex lens substrate 41 of water proof again 15, lower surface, which is set gradually, in the case where lower water oxygen obstructs diffusion barrier 21 is printed on the light guide plate 12 of site 121, reflector plate 11, light guide plate Blue LED lamp 16 is arranged in 12 side.
By changing position of the quantum stippling film in backlight and adding specific baseplate material and micro-structure, compare With traditional backlight module, diffusion sheet and prism film on backlight can be saved.The benefit of light is improved at the same time With rate, reduce loss of light during back-light propagation.And its NTSC color gamut has reached 110% or more, has preferable face The vividness of color.
Embodiment two
The difference between this embodiment and the first embodiment lies in as shown in Fig. 2, the lens microstructure of upper water oxygen barrier lens coating is to pass through It is roll-to-roll to imprint the prism being made(That is prism film), i.e., upper water oxygen barrier lens coating is using the oxygen barrier prism substrate of upper water proof 42, the setting position of sub- black matrix of the setting position of each prism with matching with corresponding sub-pixel is consistent, prism Substrate thickness be 15um-50um, the section of prism is in isosceles triangle, and the corner angle of prism is 10 degree -90 and spends.Such as: The substrate thickness of prism is 15um, and rib is that the angle of apex angle on isosceles triangle is 40 degree, alternatively, the substrate thickness of prism is 30um, rib are that the angle of apex angle on isosceles triangle is 50 degree.
Remaining structure is as in the first embodiment, repeat no more.

Claims (7)

1. a kind of quantum stippling film backing structure, which is characterized in that including set gradually from the bottom to top reflector plate, light guide plate, Lower water oxygen barrier diffusion barrier, quantum stippling film, upper water oxygen barrier lens coating, lower polarizing film, liquid crystal film and upper polarizer, under described Scattering particles is laid in water oxygen barrier diffusion barrier, and the quantum stippling film includes multiple matching with red green blue sub-pixels Sub- black matrix splicing composition black matrix structure, in the matched sub- black matrix of red sub-pixel filled with contain red quantum dot Slurry, in the matched sub- black matrix of green sub-pixels be filled with the slurry containing green quantum dot, matched with blue subpixels Sub- black matrix in without filling, the upper surface of the upper water oxygen barrier lens coating is in the lens microstructure to match with sub-pixel.
2. a kind of quantum stippling film backing structure according to claim 1, which is characterized in that the system of the quantum stippling film Include the following steps as method:
1)Black matrix structure is made by the technique of photoetching or printing in lower water oxygen barrier diffusion barrier upper surface;
2)According to practical light requirement out, the red green quantum dot for setting usage ratio is dissolved in toluene, chlorobenzene, n-hexane, normal octane In corresponding slurry is obtained in one or more solvents, by the technique that prints or print by the slurry of red green quantum dot point It is not transferred in the sub- black matrix position of corresponding sub-pixel, the sub- black matrix position of corresponding blue subpixels is empty;
3)Upper water oxygen barrier lens coating is depressed into above quantum stippling film.
3. a kind of quantum stippling film backing structure according to claim 1, which is characterized in that the upper water oxygen obstructs lens The material of film is PS, is modified PS, AS, PMMA, PC, diallyl diglycol carbonate ester polymer, diallyl phthalic acid Ester, diene Poly-s 179, styrene, methyl methacrylate, poly hydroxy ethyl acrylate or ethylene glycol dimethacrylate Ester.
4. a kind of quantum stippling film backing structure according to claim 1, which is characterized in that the lower water oxygen barrier diffusion Heat dissipation particle in film is one of polystyrene, poly- polymethacrylic acid methyl ester, silicide, acrylic acid or a variety of.
5. a kind of quantum stippling film backing structure according to claim 1, which is characterized in that the lower water oxygen barrier diffusion The irregular structure for improving light diffusivity is produced by way of surface imprint in the lower surface of film.
6. a kind of quantum stippling film backing structure according to claim 1, which is characterized in that the upper water oxygen obstructs lens The lens microstructure of film is to imprint the convex lens that is made by roll-to-roll, the setting position of each convex lens with it is corresponding The setting position for the sub- black matrix that sub-pixel matches is consistent, and the substrate thickness of convex lens is 15um-50um, radius of curvature It is 7 × 10-5 m-10×10-5m。
7. a kind of quantum stippling film backing structure according to claim 1, which is characterized in that the upper water oxygen obstructs lens The lens microstructure of film is to imprint the prism that is made by roll-to-roll, the setting position of each prism with corresponding sub- picture The setting position for the sub- black matrix that element matches is consistent, and the substrate thickness of prism is 15um-50um, the section of prism in etc. Lumbar triangle shape, the corner angle of prism are 10 degree of -90 degree.
CN201810657412.0A 2018-06-25 2018-06-25 Quantum dot color film backlight structure Active CN108873470B (en)

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Cited By (6)

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CN109445174A (en) * 2019-01-02 2019-03-08 京东方科技集团股份有限公司 A kind of display panel and preparation method thereof, display device
CN110190096A (en) * 2019-05-27 2019-08-30 深圳市华星光电半导体显示技术有限公司 Display panel and preparation method thereof
CN110518112A (en) * 2019-08-26 2019-11-29 纳晶科技股份有限公司 A kind of aeroge quantum dot film, preparation method and the display device comprising it
CN111048693A (en) * 2019-12-06 2020-04-21 深圳市华星光电半导体显示技术有限公司 Quantum dot color film substrate and manufacturing method thereof
WO2020244291A1 (en) * 2019-06-05 2020-12-10 京东方科技集团股份有限公司 Color filter substrate, display panel, and preparation method for display panel
CN114265230A (en) * 2021-12-29 2022-04-01 绵阳惠科光电科技有限公司 Display panel, manufacturing method thereof and display device

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CN107089039A (en) * 2017-04-24 2017-08-25 宁波东旭成新材料科技有限公司 A kind of multi-functional quantum dot film and preparation method thereof
CN107797333A (en) * 2017-12-04 2018-03-13 福州大学 A kind of quantum dot color membrane structure for being applied to multiple bases and ultrahigh resolution
CN108008565A (en) * 2017-12-04 2018-05-08 福州大学 A kind of preparation method of the quantum dot color filter based on self assembly

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Publication number Priority date Publication date Assignee Title
CN109445174A (en) * 2019-01-02 2019-03-08 京东方科技集团股份有限公司 A kind of display panel and preparation method thereof, display device
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CN110190096A (en) * 2019-05-27 2019-08-30 深圳市华星光电半导体显示技术有限公司 Display panel and preparation method thereof
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CN114265230A (en) * 2021-12-29 2022-04-01 绵阳惠科光电科技有限公司 Display panel, manufacturing method thereof and display device

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