CN108803005A - A kind of two dimension MEMS galvanometer control methods - Google Patents
A kind of two dimension MEMS galvanometer control methods Download PDFInfo
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- CN108803005A CN108803005A CN201810584679.1A CN201810584679A CN108803005A CN 108803005 A CN108803005 A CN 108803005A CN 201810584679 A CN201810584679 A CN 201810584679A CN 108803005 A CN108803005 A CN 108803005A
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- mems galvanometers
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- galvanometers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Optical Scanning Systems (AREA)
Abstract
The invention discloses a kind of two dimension MEMS galvanometer control methods.By the present invention in that MEMS galvanometers according to Lissajou figure into horizontal deflection,It is certain relationship to make the output voltage of MEMS galvanometers current angular and MEMS galvanometers,Using the SPI interface of ARM to the resolution ratio of MEMS galvanometers,Maximum deflection angle and rotational frequency are configured,And utilize GPIO output zero degree index pulses and angle index pulse,To the existing driving method to MEMS galvanometers,To the state collection method of MEMS galvanometers,The configurable method and external output method of MEMS galvanometers are improved,The control of efficient stable can be carried out to two-dimentional MEMS galvanometers,Simply the parameter of two-dimentional MEMS galvanometers can be configured,And simulation Lissajou figure carries out continuous scanning,Make the efficiency of two-dimentional MEMS galvanometers,Resolution ratio is improved,And the service life of two-dimentional MEMS galvanometers is made to extend.
Description
Technical field
The present invention relates to laser scanner technique field, specific field is a kind of two dimension MEMS galvanometer control methods.
Background technology
Light scanning lens are a kind of outstanding vector scan equipment, and incident beam can be made suitable with the time in particular manner
Sequence reflects, to realize scanning imagery in image planes.It is divided into a peacekeeping two-dimensional scan according to scanning dimension, two-dimentional MEMS shakes
Mirror is actually the optical mirror that simple harmonic oscillation can be done along two axis, and one-dimensional galvanometer is more than in control difficulty.In laser
In radar, high-resolution scan image, generally use two dimension MEMS galvanometers make laser according to preset angle in order to obtain
Degree and frequency are scanned.The control that stability and high efficiency can be carried out to two-dimentional MEMS galvanometers, is before laser radar is achieved
One of carry, it is therefore desirable to a kind of control method of the two-dimentional MEMS galvanometers of stability and high efficiency.
Invention content
The purpose of the present invention is to provide a kind of two dimension MEMS galvanometer control methods, to solve to propose in above-mentioned background technology
The problem of.
To achieve the above object, the present invention provides the following technical solutions：A kind of two dimension MEMS galvanometer control methods, including it is right
The driving method of MEMS galvanometers, the state collection method to MEMS galvanometers, the configurable method to MEMS galvanometers and externally output
The main contents of method, the driving method to MEMS galvanometers are：Make MEMS galvanometers according to Lissajou figure into horizontal deflection；
The main contents of the state collection method to MEMS galvanometers are：Make the defeated of MEMS galvanometers current angular and MEMS galvanometers
It is certain relationship to go out voltage, and herein under relationship, real-time collected voltage is angle-data；
The main contents of the configurable method to MEMS galvanometers are：Resolution using the SPI interface of ARM to MEMS galvanometers
Rate, maximum deflection angle and rotational frequency are configured；
The main contents of the external output method are：Zero degree index pulse and angle index pulse are exported using GPIO.
Preferably, the particular content of the driving method to MEMS galvanometers is：
1）It is the sine wave of integer multiple to generate two frequencies not using DAC, and one represents x-axis, another represents y-axis；
2）Using horizontal direction as x-axis, vertical direction is y-axis, and simulation Lissajou figure carries out continuous scanning.
Preferably, the particular content of the state collection method to MEMS galvanometers is：
1）In initialization, output voltage of the acquisition without the MEMS galvanometers under DAC input states is worth as the reference voltage, is zero degree
Voltage value；
2）In normal operation, acquisition crest voltage corresponds to the maximum deflection angle angle value of MEMS galvanometers；
3）Calculate the difference of crest voltage and zero degree voltage, the pressure difference as maximum deflection angle；
4）Above-mentioned voltage value is acquired in real time, calculates the variation of current angular.
Preferably, the particular content of the configurable method to MEMS galvanometers is：
1）The resolution ratio, maximum deflection angle and rotational frequency of MEMS galvanometers are configured using the SPI interface of ARM；
2）The configuration of MEMS galvanometers is read using the SPI interface of ARM；
3）The state of MEMS galvanometers is read using the SPI interface of ARM；
4）The work and stopping of MEMS galvanometers are controlled using the SPI interface of ARM.
Preferably, the particular content of the external output method is：
1）MEMS galvanometers, which are often scanned from negative angle to positive-angle to zero degree position, just exports a pulse, as zero degree mark arteries and veins
Punching；
2）The angle interval for often increaseing or decreasing a setting just exports a pulse, as angle index pulse；
3）The zero degree index pulse and the angle index pulse utilize GPIO to export.
Compared with prior art, the beneficial effects of the invention are as follows：By the present invention in that MEMS galvanometers are according to Lissajou figure
Into horizontal deflection, it is certain relationship to make MEMS galvanometers current angular and the output voltage of MEMS galvanometers, utilizes the SPI interface pair of ARM
Resolution ratio, maximum deflection angle and the rotational frequency of MEMS galvanometers are configured, and export zero degree index pulse using GPIO
And angle index pulse, to it is existing to the driving method of MEMS galvanometers, to the state collection method of MEMS galvanometers, shake to MEMS
The configurable method of mirror and external output method are improved, and the control of efficient stable can be carried out to two-dimentional MEMS galvanometers, can be with
Simply the parameter of two-dimentional MEMS galvanometers is configured, and simulates Lissajou figure and carries out continuous scanning, two-dimentional MEMS is made to shake
Efficiency, the resolution ratio of mirror are improved, and the service life of two-dimentional MEMS galvanometers is made to extend.
Description of the drawings
Fig. 1 is the job control flow chart using the inside of the MEMS of control method proposed by the present invention；
Fig. 2 is the external output flow chart using the MEMS of control method proposed by the present invention；
Fig. 3 is the connection diagram using the required modules of control method proposed by the present invention.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
- 3 are please referred to Fig.1, the present invention provides a kind of technical solution：A kind of two dimension MEMS galvanometer control methods, including it is right
The driving method of MEMS galvanometers, the state collection method to MEMS galvanometers, the configurable method to MEMS galvanometers and externally output
The main contents of method, the driving method to MEMS galvanometers are：Make MEMS galvanometers according to Lissajou figure into horizontal deflection；
The main contents of the state collection method to MEMS galvanometers are：Make the defeated of MEMS galvanometers current angular and MEMS galvanometers
It is certain relationship to go out voltage, and herein under relationship, real-time collected voltage is angle-data；
The main contents of the configurable method to MEMS galvanometers are：Resolution using the SPI interface of ARM to MEMS galvanometers
Rate, maximum deflection angle and rotational frequency are configured；
The main contents of the external output method are：Zero degree index pulse and angle index pulse are exported using GPIO.
Specifically, the particular content of the driving method to MEMS galvanometers is：
1）Two frequencies generated using DAC be the sine wave of integer multiple, one represents x-axis, another represents y-axis, can be with
Increase scanning element, improves resolution ratio；
2）Using horizontal direction as x-axis, vertical direction is y-axis, and simulation Lissajou figure carries out continuous scanning.
Specifically, the particular content of the state collection method to MEMS galvanometers is：
1）In initialization, output voltage of the acquisition without the MEMS galvanometers under DAC input states is worth as the reference voltage, is zero degree
Voltage value；
2）In normal operation, acquisition crest voltage corresponds to the maximum deflection angle angle value of MEMS galvanometers；
3）The difference for calculating crest voltage and zero degree voltage, as the pressure difference of maximum deflection angle, at this time 0 ° and maximum angle it
Between voltage value it is just linear incremental；
4）Above-mentioned voltage value is acquired in real time, calculates the variation of current angular.
Specifically, the particular content of the configurable method to MEMS galvanometers is：
1）The resolution ratio, maximum deflection angle and rotational frequency of MEMS galvanometers are configured using the SPI interface of ARM；
2）The configuration of MEMS galvanometers is read using the SPI interface of ARM；
3）The state of MEMS galvanometers is read using the SPI interface of ARM；
4）The work and stopping of MEMS galvanometers are controlled using the SPI interface of ARM.
Specifically, the particular content of the external output method is：
1）MEMS galvanometers are often scanned from negative angle to positive-angle to zero degree position, a pulse are just exported, as zero degree mark arteries and veins
Punching；
2）The angle interval for often increaseing or decreasing a setting just exports a pulse, as angle index pulse；
3）The zero degree index pulse and the angle index pulse utilize GPIO to export, to ensure real-time.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
Understanding without departing from the principles and spirit of the present invention can carry out these embodiments a variety of variations, modification, replace
And modification, the scope of the present invention is defined by the appended.
Claims (5)
1. a kind of two dimension MEMS galvanometer control methods include to the driving method of MEMS galvanometers, to the state acquisition of MEMS galvanometers
Method, the configurable method to MEMS galvanometers and external output method, it is characterised in that：The driving method to MEMS galvanometers
Main contents be：Make MEMS galvanometers according to Lissajou figure into horizontal deflection；
The main contents of the state collection method to MEMS galvanometers are：Make the defeated of MEMS galvanometers current angular and MEMS galvanometers
It is certain relationship to go out voltage, and herein under relationship, real-time collected voltage is angle-data；
The main contents of the configurable method to MEMS galvanometers are：Resolution using the SPI interface of ARM to MEMS galvanometers
Rate, maximum deflection angle and rotational frequency are configured；
The main contents of the external output method are：Zero degree index pulse and angle index pulse are exported using GPIO.
2. a kind of two dimension MEMS galvanometer control methods according to claim 1, it is characterised in that：It is described to MEMS galvanometers
The particular content of driving method is：
1）It is the sine wave of integer multiple to generate two frequencies not using DAC, and one represents x-axis, another represents y-axis；
2）Using horizontal direction as x-axis, vertical direction is y-axis, and simulation Lissajou figure carries out continuous scanning.
3. a kind of two dimension MEMS galvanometer control methods according to claim 1, it is characterised in that：It is described to MEMS galvanometers
The particular content of state collection method is：
1）In initialization, output voltage of the acquisition without the MEMS galvanometers under DAC input states is worth as the reference voltage, is zero degree
Voltage value；
2）In normal operation, acquisition crest voltage corresponds to the maximum deflection angle angle value of MEMS galvanometers；
3）Calculate the difference of crest voltage and zero degree voltage, the pressure difference as maximum deflection angle；
4）Above-mentioned voltage value is acquired in real time, calculates the variation of current angular.
4. a kind of two dimension MEMS galvanometer control methods according to claim 1, it is characterised in that：It is described to MEMS galvanometers
The particular content of configurable method is：
1）The resolution ratio, maximum deflection angle and rotational frequency of MEMS galvanometers are configured using the SPI interface of ARM；
2）The configuration of MEMS galvanometers is read using the SPI interface of ARM；
3）The state of MEMS galvanometers is read using the SPI interface of ARM；
4）The work and stopping of MEMS galvanometers are controlled using the SPI interface of ARM.
5. a kind of two dimension MEMS galvanometer control methods according to claim 1, it is characterised in that：The external output method
Particular content be：
1）MEMS galvanometers, which are often scanned from negative angle to positive-angle to zero degree position, just exports a pulse, as zero degree mark arteries and veins
Punching；
2）The angle interval for often increaseing or decreasing a setting just exports a pulse, as angle index pulse；
3）The zero degree index pulse and the angle index pulse utilize GPIO to export.
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| CN201810584679.1A CN108803005A (en) | 2018-06-08 | 2018-06-08 | A kind of two dimension MEMS galvanometer control methods |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109444590A (en) * | 2018-11-19 | 2019-03-08 | 深圳市速腾聚创科技有限公司 | MEMS device detection circuit and method |
| CN111464801A (en) * | 2019-01-18 | 2020-07-28 | 广景视睿科技（深圳）有限公司 | Galvanometer adjusting device, system and method and projector |
| CN113977073A (en) * | 2020-07-27 | 2022-01-28 | 大族激光科技产业集团股份有限公司 | Laser scanning processing method, laser scanning processing device, computer equipment and storage medium |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109444590A (en) * | 2018-11-19 | 2019-03-08 | 深圳市速腾聚创科技有限公司 | MEMS device detection circuit and method |
| CN111464801A (en) * | 2019-01-18 | 2020-07-28 | 广景视睿科技（深圳）有限公司 | Galvanometer adjusting device, system and method and projector |
| CN111464801B (en) * | 2019-01-18 | 2021-07-16 | 广景视睿科技（深圳）有限公司 | Galvanometer adjusting device, system and method and projector |
| CN113977073A (en) * | 2020-07-27 | 2022-01-28 | 大族激光科技产业集团股份有限公司 | Laser scanning processing method, laser scanning processing device, computer equipment and storage medium |
| CN113977073B (en) * | 2020-07-27 | 2023-07-14 | 大族激光科技产业集团股份有限公司 | Laser scanning processing method, device, computer equipment and storage medium |
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Application publication date: 20181113 |