CN108787645A - Line clear component and line clear method - Google Patents
Line clear component and line clear method Download PDFInfo
- Publication number
- CN108787645A CN108787645A CN201810457115.1A CN201810457115A CN108787645A CN 108787645 A CN108787645 A CN 108787645A CN 201810457115 A CN201810457115 A CN 201810457115A CN 108787645 A CN108787645 A CN 108787645A
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- CN
- China
- Prior art keywords
- pipeline
- gas
- line clear
- heating mechanism
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
- B08B9/027—Cleaning the internal surfaces; Removal of blockages
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Cleaning In General (AREA)
Abstract
A kind of line clear component of the application offer and line clear method.The line clear component includes heating mechanism and gas pipeline, and heating mechanism is used to heat gas, and gas pipeline is connected with pipeline to be cleaned, and the gas after heating is passed through the pipeline.Based on this, the application can be conducive to improve operation hours, reduce capacity loss while cleaning channels.
Description
Technical field
This application involves display technology fields, and in particular to the cleaning applications of the manufacturing equipment of display device, more particularly to
A kind of line clear component and line clear method.
Background technology
In the processing procedure of display device, each manufacturing equipment will produce a large amount of dust pollutant, these cannot be discharged
Pollutant cooling after can be adhered on the side wall of pipeline, it is insufficient or block to not only result in pipeline negative pressure, easily causes and sets
Standby delay machine, influences equipment normal operation, and pollutant can corrode sealing ring, accelerates its aging, increases pipeline gas leakage
Risk.In order to solve this problem, the prior art generally shuts down equipment, and periodically dismantles pipeline and maintain pipeline.But it should
The technology necessary equipment downtime long period, production capacity can be seriously affected.
Invention content
In consideration of it, the application provides a kind of line clear component and line clear method, can while cleaning channels,
Be conducive to improve operation hours, reduce capacity loss.
The line clear component of one embodiment of the application, including heating mechanism and gas pipeline, the heating mechanism are used for
Gas is heated, the gas pipeline is connected with pipeline to be cleaned, and the gas after heating is passed through the pipeline.
The line clear method of one embodiment of the application, including：
There is provided a line clear component comprising heating mechanism and gas pipeline；
The heating mechanism heats gas；
The gas pipeline is connected with pipeline to be cleaned；
Gas after heating is passed through the pipeline by the gas pipeline.
Advantageous effect：It includes heating mechanism and gas pipeline that the application, which designs line clear component, on gas inlet pipe road
Before, heating mechanism heats gas, and gas pipeline is connected with pipeline to be cleaned, the gas inlet pipe that will be heated
Road, gas conduction heat give dust pollutant so that dust pollutant is not easy to condense, be conducive to it is anti-blocking in pipeline, by
It is maintained in without dismantling pipeline, therefore is conducive to improve operation hours, reduce capacity loss.
Description of the drawings
Fig. 1 is the structural schematic diagram of the line clear component of one embodiment of the application；
Fig. 2 is the flow diagram of the line clear method of one embodiment of the application.
Specific implementation mode
The main purpose of the application is：It includes heating mechanism and gas pipeline, heating mechanism pair to design line clear component
Gas is heated, and the gas inlet pipe road that gas pipeline connects pipeline to be cleaned will heat, gas conduction heat is to powder
Dirt pollutant so that dust pollutant is not easy to condense, be conducive to this it is anti-blocking in pipeline, during entire cleaning,
It is maintained due to being not necessarily to dismantle pipeline, is conducive to improve operation hours, reduces capacity loss.
The line clear component of the application can be adapted for the manufacture containing special gas processing procedure in display device manufacturing field and set
It is standby, such as chemical vapor deposition machine, dry etching machine, flexible package machine.Wherein, the gas and gas transmission that the special gas processing procedure is passed through
The gas that pipeline is passed through is different, and the gas that gas pipeline is passed through will not be generated with any material involved by special gas processing procedure to react,
In this, the gas that the preferred gas pipeline of the application is passed through is inert gas, such as helium (He) gas.In addition, the display device can
It is including but not limited to OLED (Organic Light-Emitting Diode, organic light-emitting diodes for flexible display apparatus
Pipe) display, AMOLED (Active-matrix organic light emitting diode, two pole of active matrix light-emitting
Pipe) display.
Below in conjunction with the attached drawing in the embodiment of the present application, to the skill of each exemplary embodiment provided herein
Art scheme is clearly and completely described.In the absence of conflict, following each embodiments and its technical characteristic can be mutual
Combination.Also, directional terminology used by text of the statement, such as "upper", "lower" etc. are for preferably describing each
The technical solution of embodiment is not intended to limit the protection domain of the application.
Fig. 1 is the structural schematic diagram of the line clear component of one embodiment of the application.Refering to Figure 1, the pipeline
Cleaning assemblies 10 includes heating mechanism 11 and gas pipeline 12, and gas pipeline 12 can be the tube body of inner hollow, gas pipeline
12 one end is connected with pipeline 20 to be cleaned, and the other end of gas pipeline 12 is connect with heating mechanism 11.
The heating mechanism 11 includes resistive heater and the pipeline 111 being arranged in the shape of a spiral, the resistive heater
Set on the inside of pipeline 111, the pipeline 111 is connected with gas pipeline 12.Wherein, spiral helicine pipeline 111 can increase gas
The circulation stroke of body (such as helium), keeps the time of contact of gas and resistive heater more long, and heat transmission is more abundant, to reach
To the higher efficiency of heating surface.In practical application scene, heating mechanism 11 can be provided with shell, the pipeline 111 and heating
Resistance wire is located in the shell, and the shell can be provided with thermal insulation layer, which is attached at the inner wall or packet of shell
It is wrapped in the outside of shell.
High temperature resistant can be used in the gas pipeline 12 and acid and alkali-resistance material is made, and material includes but not limited to PVC
(Polyvinyl chloride, polyvinyl fluoride), PE (Polyethylene, polyethylene), PP (Polypropylene, poly- third
Alkene), PFA (Polytetrafluoro ethylene, polytetrafluoroethylene (PTFE)).Also, gas pipeline 12 and the one of the conducting of pipeline 20
End can be equipped with purge nozzle, and purge nozzle will purge easy piston part position in the gas inlet pipe road 20 after heating.
As shown in Figure 1, dotted arrow indicates that the trend of inert gas, heavy line indicate the trend of the gas of special gas processing procedure,
When being cleaned to pipeline 20, for being heated to gas, the gas after heating is passed through by gas pipeline to be waited for clearly heating mechanism 11
Clean pipeline 20, gas conduction heat give dust pollutant so that dust pollutant is not easy to condense, and reduces pollutant adherency
Probability on 20 side wall of pipeline, it is anti-blocking in pipeline 20 to be conducive to, it is maintained due to being not necessarily to dismantle pipeline 20,
Be conducive to improve operation hours, reduce capacity loss.
It should be appreciated that when to being cleaned for the pipeline 20 of special gas processing procedure, gas that gas pipeline 12 is passed through with
The mixed gases that pipeline 20 is passed through, at this point, the gas that gas pipeline 12 is passed through more importantly conducts heat in pipeline 20
Dust pollutant so that dust pollutant is not easy to condense.And to the non-pipeline 20 for special gas processing procedure and special gas
Before processing procedure starts or after pipeline 20 when being cleaned, the gas that gas pipeline 12 is passed through can also pass through itself stream
Speed causes 20 inside of pipeline to generate negative pressure, helps, by the dust pollutant discharge in pipeline 20, to be further conducive to pipeline
It is anti-blocking in 20.
In application scenarios, the gas pipeline 12 can access multiple positions of pipeline 20, for example, in conjunction with shown in Fig. 1,
When to having pump (Pump) 21 and the process apparatus of Drechsel system (scrubber) 22 to clean, gas pipeline 12 can be
Gas accesses pipeline 20 before reaching pump 21, can also access the part between the pump 21 of pipeline 20 and Drechsel system 22.
Please continue to refer to Fig. 1, the line clear component 10 of the application can also include temperature control mechanism 13,14 and of pressure regulating device
At least one of flowmeter 15.Temperature control mechanism 13 can connect between power supply 131 and heating mechanism 11, to control heating
Mechanism 11 adjusts the heating temperature to gas.The temperature control mechanism 13 can be PID (Proportion-Integral-
Derivative, proportional, integral-inverse) temperature controller, PID temperature controllers can be according to the temperature for needing automatic setting heating mechanism 11
Degree, while the temperature for controlling heating mechanism 11 is more accurate.The pressure regulating device 14 is set to one end of gas pipeline 12, to adjust
Save the pressure of gas in gas pipeline 12.The flowmeter 15 is set to one end of gas pipeline 12, can specifically be set to tune
Between press mechanism 14 and gas pipeline 12, which is used to control the amount of 12 be passed through gas of gas pipeline, is realized with this
Traffic monitoring to the inert gas being passed through.
In order to improve the maintenance convenience for the process apparatus that line clear component 10 is applicable in, the gas pipeline 12 and wait for
Valve 16 can be provided between clean pipeline 20.For example, a valve 16 is arranged in the blow vent in gas pipeline 12.Example again
Such as, one valve 16 is set in the gas outlet of heating mechanism 11, to cut off or make that gas enters pipeline 20 to be cleaned after heating.
In this, when maintaining process apparatus, line clear component 10 with process apparatus without separating.
Fig. 2 is the flow diagram of the line clear method of one embodiment of the application.Referring to Fig. 2, the line clear
Method may comprise steps of S21~S23.
S21：A line clear component is provided, which includes heating mechanism and gas pipeline.
S22：The heating mechanism heats gas.
S23：The gas pipeline is connected with pipeline to be cleaned.
S24：Gas after heating is passed through pipeline to be cleaned by gas pipeline.
The line clear method of the present embodiment can be based on above-mentioned line clear component 10, be based on this：
In the step s 21, the heating mechanism may include resistive heater and the pipeline being arranged in the shape of a spiral, described
Resistive heater is set to the inside for the pipeline being arranged in the shape of a spiral, and the pipeline being arranged in the shape of a spiral is connected with gas pipeline.In step
In rapid S22, spiral helicine pipeline can increase the circulation stroke of gas, keep it more long with the time of contact of resistive heater, heat
Transmission is more abundant, to reach the higher efficiency of heating surface.In practical application scene, the heating mechanism can be equipped with shell,
Resistive heater and the pipeline being arranged in the shape of a spiral are located in the shell, and the shell can be equipped with thermal insulation layer, thermal insulation layer patch
It invests inner walls or is wrapped in hull outside.
The line clear component of the present embodiment can also include temperature control mechanism.In step S22, temperature control mechanism with for being
Heating mechanism provides the power supply connection of energy, to control heating temperature of the heating mechanism adjusting to gas.The temperature control mechanism can
Think PID temperature controllers, can be according to the temperature for needing automatic setting heating mechanism, while the temperature for controlling heating mechanism is more smart
Really.
The line clear component of the present embodiment can also include pressure regulating device, which is set to the gas pipeline
One end.In step s 24, pressure regulating device adjusts the pressure of gas in gas pipeline.Certainly, the line clear component can be with
Flowmeter including being set to gas pipeline one end can be specifically set between pressure regulating device and gas pipeline, which is used for
The amount for controlling the be passed through gas of gas pipeline, the traffic monitoring of the inert gas to being passed through is realized with this.
Since the line clear method of the present embodiment is used in 10 mutually isostructural line clear of above-mentioned line clear component
Component, therefore there is same advantageous effect.
It should be understood that above is only an example of the present application, being not intended to limit the scope of the claims of the application, every profit
Technical characteristic between the equivalent structure or equivalent flow shift made by present specification and accompanying drawing content, such as each embodiment
Be combined with each other, be applied directly or indirectly in other relevant technical fields, the patent protection for being similarly included in the application
In range.
Claims (10)
1. a kind of line clear component, which is characterized in that the line clear component includes heating mechanism and gas pipeline, described
Heating mechanism is used to heat gas, and the gas pipeline is connected with pipeline to be cleaned, and the gas after heating is passed through institute
State pipeline.
2. line clear component according to claim 1, which is characterized in that the heating mechanism include resistive heater and
Spiral helicine pipeline, the resistive heater are set to the insides of pipes, and the pipeline is connected with the gas pipeline.
3. line clear component according to claim 1, which is characterized in that the line clear component further includes pressure regulator
Structure, the pressure regulating device are set to one end of the gas pipeline, the other end of the gas pipeline and the pipeline to be cleaned
Conducting.
4. line clear component according to claim 1, which is characterized in that the line clear component further include with it is described
The temperature control mechanism of heating mechanism connection, the temperature control mechanism are used to control heating temperature of the heating mechanism adjusting to the gas
Degree.
5. line clear component according to claim 1, which is characterized in that the gas pipeline and the pipe to be cleaned
Valve is additionally provided between road.
6. line clear component according to claim 1, which is characterized in that the gas is inert gas.
7. a kind of line clear method, which is characterized in that the line clear method includes：
There is provided a line clear component comprising heating mechanism and gas pipeline；
The heating mechanism heats gas；
The gas pipeline is connected with pipeline to be cleaned；
Gas after heating is passed through the pipeline to be cleaned by the gas pipeline.
8. line clear method according to claim 7, which is characterized in that the heating mechanism include resistive heater and
Spiral helicine pipeline, the resistive heater are set to the insides of pipes, and the pipeline is connected with the gas pipeline.
9. line clear method according to claim 7, which is characterized in that the line clear component further includes pressure regulator
Structure, the pressure regulating device are set to one end of the gas pipeline, the other end of the gas pipeline and the pipeline to be cleaned
Conducting,
Gas after heating is passed through the pipeline by the gas pipeline, including：The pressure regulating device adjusts the gas pipeline
The pressure of interior gas, then the gas is passed through the pipeline.
10. line clear method according to claim 7, which is characterized in that the line clear component further includes and institute
The temperature control mechanism of heating mechanism connection is stated,
The heating mechanism heats gas, including：
The temperature control mechanism controls heating temperature of the heating mechanism adjusting to the gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810457115.1A CN108787645A (en) | 2018-05-14 | 2018-05-14 | Line clear component and line clear method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810457115.1A CN108787645A (en) | 2018-05-14 | 2018-05-14 | Line clear component and line clear method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108787645A true CN108787645A (en) | 2018-11-13 |
Family
ID=64092394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810457115.1A Pending CN108787645A (en) | 2018-05-14 | 2018-05-14 | Line clear component and line clear method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108787645A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5827370A (en) * | 1997-01-13 | 1998-10-27 | Mks Instruments, Inc. | Method and apparatus for reducing build-up of material on inner surface of tube downstream from a reaction furnace |
| KR20050088649A (en) * | 2004-03-02 | 2005-09-07 | 주식회사 세미라인 | Device of supplying hot nitrogen used in processing of semiconductor and liquid crystal display |
| CN102576654A (en) * | 2009-08-10 | 2012-07-11 | 李承龙 | Nitrogen gas injection apparatus |
| US8383428B2 (en) * | 2011-04-15 | 2013-02-26 | J-Solution Co., Ltd. | Exhaust pressure detector |
| KR20130033052A (en) * | 2011-09-26 | 2013-04-03 | 주식회사 시뮬레이션테크 | Cleaning apparatus for exhaust gas of ship |
-
2018
- 2018-05-14 CN CN201810457115.1A patent/CN108787645A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5827370A (en) * | 1997-01-13 | 1998-10-27 | Mks Instruments, Inc. | Method and apparatus for reducing build-up of material on inner surface of tube downstream from a reaction furnace |
| KR20050088649A (en) * | 2004-03-02 | 2005-09-07 | 주식회사 세미라인 | Device of supplying hot nitrogen used in processing of semiconductor and liquid crystal display |
| CN102576654A (en) * | 2009-08-10 | 2012-07-11 | 李承龙 | Nitrogen gas injection apparatus |
| US8383428B2 (en) * | 2011-04-15 | 2013-02-26 | J-Solution Co., Ltd. | Exhaust pressure detector |
| KR20130033052A (en) * | 2011-09-26 | 2013-04-03 | 주식회사 시뮬레이션테크 | Cleaning apparatus for exhaust gas of ship |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181113 |
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| RJ01 | Rejection of invention patent application after publication |