CN108663125A - The parameter calibration device and method of Wavefront sensor - Google Patents

The parameter calibration device and method of Wavefront sensor Download PDF

Info

Publication number
CN108663125A
CN108663125A CN201710210774.0A CN201710210774A CN108663125A CN 108663125 A CN108663125 A CN 108663125A CN 201710210774 A CN201710210774 A CN 201710210774A CN 108663125 A CN108663125 A CN 108663125A
Authority
CN
China
Prior art keywords
wavefront sensor
shack
hartmann
hartmann wavefront
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201710210774.0A
Other languages
Chinese (zh)
Other versions
CN108663125B (en
Inventor
翟思洪
何经雷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Micro Electronics Equipment Co Ltd
Original Assignee
Shanghai Micro Electronics Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment Co Ltd filed Critical Shanghai Micro Electronics Equipment Co Ltd
Priority to CN201710210774.0A priority Critical patent/CN108663125B/en
Publication of CN108663125A publication Critical patent/CN108663125A/en
Application granted granted Critical
Publication of CN108663125B publication Critical patent/CN108663125B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)

Abstract

The invention discloses a kind of parameter calibration device and method of Wavefront sensor, which includes:Plane wave generation device;Diaphragm is arranged between plane wave generation device and Shack Hartmann wave front sensor, for constraining plane wave;Position regulator, for carrying out angle adjustment to Shack Hartmann wave front sensor;Three-shaft displacement interferometer, the angle adjustment amount for measuring Shack Hartmann wave front sensor;And Data Management Analysis system, it is separately connected with Shack Hartmann wave front sensor and three-shaft displacement interferometer, for measurement data and the three-shaft displacement interferometer Shack Hartmann wave front sensor angle adjustment amount that measures of the real-time reception Shack Hartmann wave front sensor in angle adjustment, the measurement of the physical parameter of Shack Hartmann wave front sensor is calculated.The present invention can measure microlens array to the distance between photodetector, the dip deviation of installation, realize the calibration to Shack Hartmann wave front sensor.

Description

The parameter calibration device and method of Wavefront sensor
Technical field
The present invention relates to sensor field, more particularly to the parameter calibration device and method of a kind of Wavefront sensor.
Background technology
Shack-Hartmann wavefront sensor is a kind of Wave-front measurement instrument, and critical piece includes microlens array and photoelectricity Detector (CCD/CMOS).The measuring principle of Wavefront sensor is based on to the incident gradient that leans forward in each lenticule sub-aperture It measures, the wave aberration of entire incident wavefront is spliced into using the tilt quantity of incident wavefront in each sub-aperture.Usual lenticule arrives The distance of photodetector is the focal length of lenticule, but there are certain errors in the processing of lenticule, installation process, if pressed The processing according to reason discussed and mounting distance calculate, and will introduce error in final wavefront calculations.Therefore it is passed in Hartmann's wavefront In sensor integrating process, needs to demarcate the installation error of lenticule, otherwise will influence Shack-Hartmann wavefront sensing The measurement accuracy of device.
Invention content
The present invention provides a kind of parameter calibration device and method of Wavefront sensor, to realize to Shack-Hartmann wavefront The calibration of sensor physics parameter.
In order to solve the above technical problems, the present invention provides a kind of parameter calibration device of Wavefront sensor, including:
Plane wave generation device, for generating plane wave;
Diaphragm is arranged between plane wave generation device and Shack-Hartmann wavefront sensor, for being carried out to plane wave Constraint;
Position regulator, for carrying out angle adjustment to the Shack-Hartmann wavefront sensor;
Three-shaft displacement interferometer, the angle adjustment amount for measuring the Shack-Hartmann wavefront sensor;
And
Data Management Analysis system is separately connected with the Shack-Hartmann wavefront sensor and three-shaft displacement interferometer, For Shack-Hartmann wavefront sensor described in real-time reception angle adjustment in measurement data and three-shaft displacement interferometer survey The Shack-Hartmann wavefront sensor angle adjustment amount obtained, calculates the physical parameter of Shack-Hartmann wavefront sensor It measures.
Preferably, the plane wave generation device includes:Point light source and the collimation being correspondingly arranged with the point light source are saturating Mirror.
Preferably, the plane wave generation device uses ZYGO interferometers.
Preferably, the angle adjustment includes being adjusted around X to adjustment and/or around Y-direction.
Preferably, further including the testing light source for providing test light to the three-shaft displacement interferometer.
Preferably, further including plane mirror, the plane mirror is fixed on the Shack-Hartmann wavefront sensing Side on device, opposite with the three-shaft displacement interferometer.
It is passed preferably, the physical parameter of the Shack-Hartmann wavefront sensor includes the Shack-Hartmann wavefront Between microlens array is installed relative to photodetector in sensor dip deviation, microlens array and photodetector away from From and the inclination measurement precision of the Shack-Hartmann wavefront sensor in it is one or more.
The present invention also provides a kind of parameter calibration methods of Wavefront sensor, using the parameter mark of the Wavefront sensor Determine device, including:
Step 1:Plane wave incidence utilizes the Shack-Hartmann wavefront sensor to Shack-Hartmann wavefront sensor Record the spot array of initial position;
Step 2:Angle of inclination adjustment is carried out to the Shack-Hartmann wavefront sensor, described in interferometer measurement The tilt adjustments amount of Shack-Hartmann wavefront sensor, and after utilization Shack-Hartmann wavefront sensor record adjustment Spot array;
Step 3:The summer is calculated according to the spot array variation after the spot array of the initial position and the adjustment Gram-Hartmann wave front sensor in microlens array with respect to the dip deviation that photodetector is installed.
Preferably, the step 3 is specially:
When adjusting the angle of inclination of the Shack-Hartmann wavefront sensor around Y-direction, the interferometer measurement obtains institute Shack-Hartmann wavefront sensor is stated around Y-direction adjustment amount δ θy, after the spot array and the adjustment to the initial position In spot array the X of the hot spot of corresponding position to position take mathematic interpolation obtain each hot spot X to amount of movement δ x1..., δ xn, then calculate the offset deviation δ d that caused adjacent spots are tilted by microlens array1..., δ dn, wherein n expression hot spot battle arrays The quantity of hot spot in row, δ dn=δ xn-δxn-1
According to the offset deviation δ d of the adjacent spots1..., δ dnWith the period P of microlens arrayLCalculate the summer Gram-Hartmann wave front sensor in microlens array with respect to the dip deviation that photodetector is installed:
Preferably, the parameter calibration method further includes step 4:
According to each hot spot being calculated X to amount of movement δ x1..., δ xnCalculate whole hot spot X to translational movement δ x, according to the whole hot spot along X to translational movement δ x and the Shack-Hartmann wavefront sensor around Y-direction adjustment amount δ θyMeter Calculate the theoretical distance L between microlens array and photodetector in the Shack-Hartmann wavefront sensor:
It is inclined with respect to the inclination of photodetector installation in conjunction with microlens array in the Shack-Hartmann wavefront sensor Theoretical distance L in the poor and described Shack-Hartmann wavefront sensor between microlens array and photodetector, described in calculating Actual range in Shack-Hartmann wavefront sensor between microlens array and photodetector.
Preferably, calculate whole hot spot X to translational movement δ x be specially:By all hot spots X to amount of movement δ x1..., δ xnIt is averaged.
Preferably, the scaling method further includes:
Multiple tilt adjustments are carried out to the Shack-Hartmann wavefront sensor, it is respectively sharp after each tilt adjustments Incident angle of the plane wave with respect to Shack-Hartmann wavefront sensor is measured with the Shack-Hartmann wavefront sensor With the angle of inclination using Shack-Hartmann wavefront sensor described in the interferometer measurement;
It calculates under multiple and different obliquities, incident angle of the plane wave with respect to Shack-Hartmann wavefront sensor Variable quantity δ θHiAnd the angle change amount δ θ of the Shack-Hartmann wavefront sensorIi, then calculate the Shack-Kazakhstan The inclination measurement precision δ θ of special graceful Wavefront sensor:
Wherein n indicates tilt adjustments number.
Compared with prior art, the present invention has the following advantages:
1, structure of the invention is simple, easy to operate;
2, the calibration of the spacing to microlens array and photodetector may be implemented in the present invention;
3, the present invention realizes that the installation inclination between microlens array and photodetector is demarcated;
4, the detection to the inclination measurement precision of Shack-Hartmann wavefront sensor may be implemented in the present invention;
5, the present invention realizes the accurate measurement to angle adjustment amount using three-shaft displacement interferometer.
Description of the drawings
Fig. 1 is the structural schematic diagram of the parameter calibration device of Wavefront sensor in the embodiment of the invention;
Fig. 2 is the measuring principle figure of three-shaft displacement interferometer in the embodiment of the invention;
Fig. 3 a~3b are the principle that microlens array and photodetector spacing are measured in the embodiment of the invention Schematic diagram;
Fig. 4 a~4b are that microlens array is measured in the embodiment of the invention with respect to photodetector tilt quantity Principle schematic.
As shown in the figure:1- planes wave generation device, the first spot arrays of 101-, the second spot arrays of 102-, 2- diaphragms, 3- Shack-Hartmann wavefront sensor, 31- microlens arrays, 32- photodetectors;4- wavefront sensor locations adjusting apparatus, 5- Plane mirror, 6- three-shaft displacements interferometer, 61- first measure unthreaded hole, 62- second measures unthreaded hole, 63- thirds measure unthreaded hole, 7- testing light sources, 8- Data Management Analysis systems.
Specific implementation mode
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, below in conjunction with the accompanying drawings to the present invention Specific implementation mode be described in detail.It should be noted that attached drawing of the present invention is all made of simplified form and uses non-essence Accurate ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
As shown in Figure 1, the parameter calibration device of the Wavefront sensor of the present invention, including:Plane wave generation device 1, diaphragm 2, Shack-Hartmann wavefront sensor 3, wavefront sensor location adjusting apparatus 4, plane mirror 5, three-shaft displacement interferometer 6, Testing light source 7 and Data Management Analysis system 8.Wherein, the plane wave generation device 1 is for generating plane wave, the light Door screen 2 is arranged between plane wave generation device 1 and Shack-Hartmann wavefront sensor 3, for constraining plane wave, institute Wavefront sensor location adjusting apparatus 4 is stated to be used to carry out angle adjustment to the Shack-Hartmann wavefront sensor 3, it is described flat Face speculum 5 is fixed on the Shack-Hartmann wavefront sensor 3, the side opposite with the three-shaft displacement interferometer 6; The three-shaft displacement interferometer 6 is used to measure the adjustment tilt quantity of the Shack-Hartmann wavefront sensor 3, the test light Source 7 is used to project test light to the three-shaft displacement interferometer 6, which projects described after the reflection of plane mirror 5 Three-shaft displacement interferometer 6.The Data Management Analysis system 8 and the Shack-Hartmann wavefront sensor 3 and three-shaft displacement are dry Interferometer 6 is separately connected, and the data of Shack-Hartmann wavefront sensor 3 and three-shaft displacement interferometer 6 is detected in real time, to realize Measurement to the physical parameter of Shack-Hartmann wavefront sensor 3.Further, the Shack-Hartmann wavefront sensor 3 Physical parameter include in the Shack-Hartmann wavefront sensor 3 microlens array 31 relative to photodetector 32 install The distance between dip deviation, microlens array 31 and photodetector 32 and the Shack-Hartmann wavefront sensor 3 It is one or more in inclination measurement precision.
Specifically, the plane wave generation device 1 sends out plane wave, which is incident on after the constraint of diaphragm 2 The microlens array 31 of Shack-Hartmann wavefront sensor 3 with reference to Fig. 3 a, and forms on photodetector 32 light of dot matrix Spot array exports.
Preferably, the combination of common point light source and collimation lens may be used in the plane wave generation device 1 It realizes, the plane wave output of ZYGO interferometers can also be used to be used as light source.
The present invention also provides a kind of parameter calibration methods of Wavefront sensor, including:
Step 1:Plane wave incidence passes through the Shack-Hartmann to Shack-Hartmann wavefront sensor 3 to be measured Wavefront sensor 3 records the spot array of initial position, that is to say the hot spot battle array that plane wave is formed after microlens array 31 Row are distinguished, referred to as the first spot array 101 to show, specific as shown in Figure 3b, while being obtained using three-shaft displacement interferometer 6 The incident angle of plane wave.
It specifically, can be to the angle change of Shack-Hartmann wavefront sensor 3 by the three-shaft displacement interferometer 6 It is accurately measured, you can accurately to be measured the incident angle for being incident on Shack-Hartmann wavefront sensor 3.Cause It can accomplish the resolution ratio of 0.2nm, the displacement measurement accuracy of 10nm, the angle of 0.5rad for the three-shaft displacement interferometer 6 of the present invention Measurement accuracy, therefore the high-acruracy survey of the adjustment angle to the Shack-Hartmann wavefront sensor 3 may be implemented.
As shown in Fig. 2, the testing light source 7 projects test light to the three-shaft displacement interferometer 6, the test light is through plane Speculum 5 projects after reflecting on the three-shaft displacement interferometer 6, forms three measurement unthreaded holes, to show that difference respectively claims it Unthreaded hole 61, second, which is measured, for first measures unthreaded hole 62 and third measurement unthreaded hole 63.And it can be obtained by the first measurement unthreaded hole 61 Position Z is measured to first1;The second measurement position Z can be obtained by measuring unthreaded hole 62 by described second2;Unthreaded hole is measured by the third 63, which can obtain third, measures position Z3.It is average that position is measured to this three:
It can be obtained the specific location of Shack-Hartmann wavefront sensor 3.
First to measure unthreaded hole 61 to measure unthreaded hole 62 in X with second be d1, third measurement unthreaded hole 63 and first, the at a distance from Distance of the two measurement unthreaded holes 61,62 in Y-direction is d2, then three positions for measuring unthreaded hole for combining three-shaft displacement interferometer 6 to obtain Confidence ceases, and can calculate the X for obtaining plane wave to incidence angle Rx and Y-direction incidence angle Ry:
Step 2:Shack-Hartmann wavefront sensor 3 to be measured is carried out according to the incident angle of plane wave in step 1 Angle of inclination adjusts, and the tilt adjustments amount of the Shack-Hartmann wavefront sensor 3 is measured using three-shaft displacement interferometer 6, and Utilize the spot array after the record adjustment of the Shack-Hartmann wavefront sensor 3.
Specifically, the step 2 includes:
Step 21:The Y-direction angle that the Shack-Hartmann wavefront sensor 3 is adjusted according to Y-direction incidence angle, that is, finely tune the summer Gram-the Ry angles of Hartmann wave front sensor 3;
Step 22:The Y-direction adjustment amount δ of the Shack-Hartmann wavefront sensor 3 is measured using three-shaft displacement interferometer 6 θy
Step 23:Meanwhile Shack-Hartmann wavefront sensor 3 records plane wave shape after microlens array 31 again At spot array, referred to as the second spot array 102 (as shown in Figure 3b, 101 and second light of certain first spot array Spot array 102 can not be recorded in piece image simultaneously, and the present invention is that statement is convenient, is drawn in only to lay down a definition in a width figure and show Meaning), according to first spot array, 101 and second spot array 102, calculates each and measure movement of the hot spot in X-direction Amount is averaged each amount of movement for measuring hot spot, obtains the X of the Shack-Hartmann wavefront sensor 3 to adjustment amount δ x.
Step 3:The summer is calculated according to the spot array variation after the spot array of the initial position and the adjustment Gram-Hartmann wave front sensor 3 in microlens array 31 with respect to photodetector 32 install dip deviation.Step 3 tool Body is:
When adjusting the angle of inclination of the Shack-Hartmann wavefront sensor 3 around Y-direction, the three-shaft displacement interferometer 6 Measurement obtains the Shack-Hartmann wavefront sensor 3 around Y-direction adjustment amount δ θy, the spot array to the initial position and institute State adjustment after spot array in corresponding position hot spot X to position take mathematic interpolation obtain each hot spot X to movement Measure δ x1..., δ xn, then calculate the offset deviation δ d that caused adjacent spots are tilted by microlens array 311..., δ dn, wherein N indicates the quantity of hot spot in spot array, δ dn=δ xn-δxn-1
According to the offset deviation δ d of the adjacent spots1..., δ dnWith the period P of microlens array 31LCalculate the summer Gram-Hartmann wave front sensor 3 in microlens array 31 with respect to photodetector 32 install dip deviation:
Step 4:According to each hot spot being calculated X to amount of movement δ x1..., δ xnCalculate whole hot spot X to Translational movement δ x, according to the whole hot spot along X to translational movement δ x and the Shack-Hartmann wavefront sensor 3 adjusted around Y-direction Measure δ θyCalculate the theoretical distance between microlens array 31 and photodetector 32 in the Shack-Hartmann wavefront sensor 3 L:
However, when photodetector 32 is there may be tilting relatively for the installation of microlens array 31, microlens array 31 The distance between photodetector 32 L is no longer constant, only belongs to a theoretical values.Therefore, it is necessary to by microlens array The tilt quantity of 31 opposite photodetectors 32 calibrates, to be compensated and corrected in later stage algorithm process.
Therefore, the step 4 further includes:It is opposite in conjunction with microlens array 31 in the Shack-Hartmann wavefront sensor 3 Microlens array 31 is visited with photoelectricity in dip deviation and the Shack-Hartmann wavefront sensor 3 that photodetector 32 is installed The theoretical distance L between device 32 is surveyed, microlens array 31 and photodetection in the Shack-Hartmann wavefront sensor 3 are calculated Actual range between device 32.
Specifically, as shown in figures 4 a and 4b, the present invention is by being compared the first, second spot array 101,102, Can calculate it is each measurement hot spot X-direction amount of movement δ x1, δ x2..., δ xn, δ xn+1.Then since microlens array 31 inclines The adjacent offset deviation for measuring hot spot caused by tiltedly is δ d1=δ x2-δx1, δ d2=δ x3-δx2..., δ dn=δ xn+1-δxn, PL For the period of microlens array 31, then the angle of inclination that can calculate microlens array 31 is:
In conjunction between above-mentioned microlens array 31 and photodetector 32 theoretical distance L and inclination angle ω be calculated Actual range in the Shack-Hartmann wavefront sensor 3 between microlens array 31 and photodetector 32.
Further, the present invention can also verify 3 inclined measurement accuracy of Shack-Hartmann wavefront sensor. Specially:Angle adjustment is carried out to Shack-Hartmann wavefront sensor 3, is at n different obliquity θi, use respectively Shack-Hartmann wavefront sensor 3 and three-shaft displacement interferometer 6 measure the tilt variation amount δ θ of corresponding each obliquityHi, δθIi;The inclination measurement precision of the Shack-Hartmann wavefront sensor 3 is calculated according to the tilt variation amount:
To sum up, by using the parameter calibration device and method of the Wavefront sensor of the present invention, lenticule can be measured Array 31 is the distance between to photodetector 32, the dip deviation that microlens array 31 is installed relative to photodetector 32, And then can be modified in the light spot image Processing Algorithm in later stage, realize the mark to Shack-Hartmann wavefront sensor 3 It is fixed, improve the performance of Shack-Hartmann wavefront sensor 3.
Obviously, those skilled in the art can carry out invention spirit of the various modification and variations without departing from the present invention And range.If in this way, these modifications and changes of the present invention belong to the claims in the present invention and its equivalent technologies range it Interior, then the present invention is also intended to including these modification and variations.

Claims (12)

1. a kind of parameter calibration device of Wavefront sensor, which is characterized in that including:
Plane wave generation device, for generating plane wave;
Diaphragm is arranged between plane wave generation device and Shack-Hartmann wavefront sensor, for being carried out about to plane wave Beam;
Position regulator, for carrying out angle adjustment to the Shack-Hartmann wavefront sensor;
Three-shaft displacement interferometer, the angle adjustment amount for measuring the Shack-Hartmann wavefront sensor;
And
Data Management Analysis system is separately connected with the Shack-Hartmann wavefront sensor and three-shaft displacement interferometer, is used for Measurement data and three-shaft displacement interferometer of the Shack-Hartmann wavefront sensor described in real-time reception in angle adjustment measure The Shack-Hartmann wavefront sensor angle adjustment amount, calculates the physical parameter of the Shack-Hartmann wavefront sensor.
2. the parameter calibration device of Wavefront sensor as described in claim 1, which is characterized in that the plane wave generation device Including:Point light source and the collimation lens being correspondingly arranged with the point light source.
3. the parameter calibration device of Wavefront sensor as described in claim 1, which is characterized in that the plane wave generation device Using ZYGO interferometers.
4. the parameter calibration device of Wavefront sensor as described in claim 1, which is characterized in that further include to three axle position Move the testing light source that interferometer provides test light.
5. the parameter calibration device of Wavefront sensor as described in claim 1, which is characterized in that further include plane mirror, The plane mirror is fixed on opposite with the three-shaft displacement interferometer one on the Shack-Hartmann wavefront sensor Side.
6. the parameter calibration device of Wavefront sensor as described in claim 1, which is characterized in that angle adjustment include around X is adjusted to adjustment and/or around Y-direction.
7. the parameter calibration device of Wavefront sensor as described in claim 1, which is characterized in that the Shack-Hartmann wave The physical parameter of front sensor include in the Shack-Hartmann wavefront sensor microlens array relative to photodetector pacify The distance between dip deviation, microlens array and photodetector of dress and the Shack-Hartmann wavefront sensor incline It is one or more in oblique measurement accuracy.
8. a kind of parameter calibration method of Wavefront sensor, using the Wavefront sensor as described in claim 1~7 any one Parameter calibration device, which is characterized in that including:
Step 1:Plane wave incidence is recorded to Shack-Hartmann wavefront sensor using the Shack-Hartmann wavefront sensor The spot array of initial position;
Step 2:Angle of inclination adjustment is carried out to the Shack-Hartmann wavefront sensor, utilizes Shack-described in interferometer measurement The tilt adjustments amount of Hartmann wave front sensor, and utilize the hot spot after Shack-Hartmann wavefront sensor record adjustment Array;
Step 3:Shack-the Kazakhstan is calculated according to the spot array variation after the spot array of the initial position and the adjustment Microlens array is with respect to the dip deviation that photodetector is installed in special graceful Wavefront sensor.
9. the parameter calibration method of Wavefront sensor as claimed in claim 8, which is characterized in that the step 3 is specially:
When adjusting the angle of inclination of the Shack-Hartmann wavefront sensor around Y-direction, the interferometer measurement obtains the summer Gram-Hartmann wave front sensor is around Y-direction adjustment amount δ θy, the hot spot after spot array and the adjustment to the initial position In array the X of the hot spot of corresponding position to position take mathematic interpolation obtain each hot spot X to amount of movement δ x1..., δ xn, then Calculate the offset deviation δ d of adjacent spots caused by being tilted by microlens array1..., δ dn, wherein n indicate spot array in light The quantity of spot, δ dn=δ xn-δxn-1
According to the offset deviation δ d of the adjacent spots1..., δ dnWith the period P of microlens arrayLCalculate the Shack-Kazakhstan Microlens array is with respect to the dip deviation that photodetector is installed in special graceful Wavefront sensor:
10. the parameter calibration method of Wavefront sensor as claimed in claim 9, which is characterized in that the parameter calibration method It further include step 4:
According to each hot spot being calculated X to amount of movement δ x1..., δ xnCalculate whole hot spot X to translational movement δ x, root According to the whole hot spot along X to translational movement δ x and the Shack-Hartmann wavefront sensor around Y-direction adjustment amount δ θyCalculate institute State the theoretical distance L between microlens array and photodetector in Shack-Hartmann wavefront sensor:
In conjunction with microlens array in the Shack-Hartmann wavefront sensor with respect to photodetector installation dip deviation and Theoretical distance L in the Shack-Hartmann wavefront sensor between microlens array and photodetector, calculates the summer Gram-Hartmann wave front sensor in actual range between microlens array and photodetector.
11. the parameter calibration method of Wavefront sensor as claimed in claim 10, which is characterized in that calculate whole hot spot in X To translational movement δ x be specially:By all hot spots X to amount of movement δ x1..., δ xnIt is averaged.
12. the parameter calibration method of Wavefront sensor as claimed in claim 8, which is characterized in that the scaling method also wraps It includes:
Multiple tilt adjustments are carried out to the Shack-Hartmann wavefront sensor, institute is respectively utilized after each tilt adjustments State incident angle and profit that Shack-Hartmann wavefront sensor measures the plane wave with respect to Shack-Hartmann wavefront sensor The angle of inclination of Shack-Hartmann wavefront sensor described in the interferometer measurement;
It calculates under multiple and different obliquities, change of the plane wave with respect to the incident angle of Shack-Hartmann wavefront sensor Change amount δ θHiAnd the angle change amount δ θ of the Shack-Hartmann wavefront sensorIi, then calculate the Shack-Hartmann The inclination measurement precision δ θ of Wavefront sensor:
Wherein n indicates tilt adjustments number.
CN201710210774.0A 2017-03-31 2017-03-31 The parameter calibration device and method of Wavefront sensor Active CN108663125B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710210774.0A CN108663125B (en) 2017-03-31 2017-03-31 The parameter calibration device and method of Wavefront sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710210774.0A CN108663125B (en) 2017-03-31 2017-03-31 The parameter calibration device and method of Wavefront sensor

Publications (2)

Publication Number Publication Date
CN108663125A true CN108663125A (en) 2018-10-16
CN108663125B CN108663125B (en) 2019-10-25

Family

ID=63784547

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710210774.0A Active CN108663125B (en) 2017-03-31 2017-03-31 The parameter calibration device and method of Wavefront sensor

Country Status (1)

Country Link
CN (1) CN108663125B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111902732A (en) * 2019-03-05 2020-11-06 深圳市大疆创新科技有限公司 Initial state calibration method and device for detection device
CN113776679A (en) * 2021-08-26 2021-12-10 浙江大学 Misregistration deviation compensation method of shack Hartmann wavefront sensor

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101639382A (en) * 2009-08-25 2010-02-03 中国科学院光电技术研究所 Method for absolutely calibrating Hartmann-shack sensor by using spherical wavefront
CN104677507A (en) * 2015-02-02 2015-06-03 中国科学院西安光学精密机械研究所 Wide-spectrum shack-Hartmann wavefront sensor absolute calibration device and method
JP5857887B2 (en) * 2012-06-13 2016-02-10 三菱電機株式会社 Wavefront measuring device
CN105865638A (en) * 2016-05-06 2016-08-17 中国科学院西安光学精密机械研究所 Calibration device and calibration method for frequency response characteristics of shack-Hartmann wavefront sensor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101639382A (en) * 2009-08-25 2010-02-03 中国科学院光电技术研究所 Method for absolutely calibrating Hartmann-shack sensor by using spherical wavefront
JP5857887B2 (en) * 2012-06-13 2016-02-10 三菱電機株式会社 Wavefront measuring device
CN104677507A (en) * 2015-02-02 2015-06-03 中国科学院西安光学精密机械研究所 Wide-spectrum shack-Hartmann wavefront sensor absolute calibration device and method
CN105865638A (en) * 2016-05-06 2016-08-17 中国科学院西安光学精密机械研究所 Calibration device and calibration method for frequency response characteristics of shack-Hartmann wavefront sensor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111902732A (en) * 2019-03-05 2020-11-06 深圳市大疆创新科技有限公司 Initial state calibration method and device for detection device
CN113776679A (en) * 2021-08-26 2021-12-10 浙江大学 Misregistration deviation compensation method of shack Hartmann wavefront sensor
CN113776679B (en) * 2021-08-26 2022-08-23 浙江大学 Misregistration deviation compensation method for shack Hartmann wavefront sensor

Also Published As

Publication number Publication date
CN108663125B (en) 2019-10-25

Similar Documents

Publication Publication Date Title
CN108061639B (en) Large dynamic range and high precision phase difference method wavefront measuring instrument combined with adaptive optics technology
CN108050933B (en) Pyramid prism retroreflection light spot positioning precision detection device and method
BR112021007644B1 (en) OPTICAL SYSTEM FOR MEASURING TILT, TURN AND ROLL ANGLES OF AN ELEMENT
CN101799271B (en) Method for obtaining camera calibration point under large viewing field condition
CN108489421A (en) A kind of fringe projection detection plane component face shape method and device
US7619191B1 (en) Increase spatial sampling for wave front mid-spatial frequency error recovery
CN102519510B (en) Calibration device and calibration method of position sensitive sensor
CN102564343B (en) Detection device for surface-shape errors of solar trench type curved surface reflector
CN106441816B (en) Calculate detection device and detection method that holography method measures long-focus lens transmission wavefront
CN100405003C (en) Method and apparatus for correcting conversion coefficient of stripe gauging device and stripe gauging device
CN102607461A (en) Method and device for measuring surface shape error of optical element at high precision
CN104808254B (en) High-precision absolute gravimeter optics frequency multiplier type laser interference system and application
CN108663125B (en) The parameter calibration device and method of Wavefront sensor
CN109059802B (en) Based on Tip Tilt mirror dynamic angle interferometric modulator system error calibrating method
CN103676487A (en) Workpiece height measuring device and correcting method thereof
CN105466576A (en) Device and method for synchronously measuring height and angle non-isohalo wavefront errors of atmospheric turbulence
CN107764518B (en) A kind of optical lens focal length measuring equipment and method
CN109579744A (en) Trailing type three-dimensional photoelectric auto-collimation method and apparatus based on grating
CN102087097A (en) Method for measuring aspheric body and device thereof
Li et al. The impact and compensation of tilt factors upon the surface measurement error
CN104065956A (en) Detection and calibration apparatus and method of image sensor
CN112013972A (en) Shearing amount calibration device and method for transverse shearing interference wavefront sensor
CN207636023U (en) Cube-corner prism retroreflective light spot positioning accuracy detection device
CN205580406U (en) Autocollimator
US20200240770A1 (en) Device and Method for Calibrating a Measuring Apparatus Using Projected Patterns and a Virtual Plane

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant