CN108550540B - 一种二极管酸洗处理*** - Google Patents
一种二极管酸洗处理*** Download PDFInfo
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- CN108550540B CN108550540B CN201810491386.9A CN201810491386A CN108550540B CN 108550540 B CN108550540 B CN 108550540B CN 201810491386 A CN201810491386 A CN 201810491386A CN 108550540 B CN108550540 B CN 108550540B
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- 238000005554 pickling Methods 0.000 title claims abstract description 59
- 239000002253 acid Substances 0.000 claims abstract description 83
- 239000007788 liquid Substances 0.000 claims description 63
- 230000000903 blocking effect Effects 0.000 claims description 32
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 238000005406 washing Methods 0.000 abstract description 19
- 239000012530 fluid Substances 0.000 abstract description 16
- 238000001914 filtration Methods 0.000 abstract description 7
- 239000012535 impurity Substances 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000012634 fragment Substances 0.000 description 16
- 230000005484 gravity Effects 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000011435 rock Substances 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
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- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/044—Cleaning involving contact with liquid using agitated containers in which the liquid and articles or material are placed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201810491386.9A CN108550540B (zh) | 2018-05-21 | 2018-05-21 | 一种二极管酸洗处理*** |
Applications Claiming Priority (1)
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CN201810491386.9A CN108550540B (zh) | 2018-05-21 | 2018-05-21 | 一种二极管酸洗处理*** |
Publications (2)
Publication Number | Publication Date |
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CN108550540A CN108550540A (zh) | 2018-09-18 |
CN108550540B true CN108550540B (zh) | 2020-11-20 |
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Family Applications (1)
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CN201810491386.9A Active CN108550540B (zh) | 2018-05-21 | 2018-05-21 | 一种二极管酸洗处理*** |
Country Status (1)
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CN (1) | CN108550540B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109047161A (zh) * | 2018-09-30 | 2018-12-21 | 湖州金业电镀有限公司 | 一种电镀前预处理用浸泡装置 |
CN111048446B (zh) * | 2019-11-25 | 2022-09-30 | 东台市高科技术创业园有限公司 | 一种高效二极管制备酸洗装置 |
CN115041455A (zh) * | 2022-08-12 | 2022-09-13 | 南通高米精密机械有限公司 | 一种半导体设备零部件加工用酸洗装置 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08201273A (ja) * | 1995-01-31 | 1996-08-09 | Ket Kagaku Kenkyusho:Kk | 近赤外成分分析器の光源装置 |
CN201359997Y (zh) * | 2009-03-04 | 2009-12-09 | 泰州银河寰宇半导体有限公司 | 酸洗板 |
CN201655762U (zh) * | 2010-04-26 | 2010-11-24 | 贵州雅光电子科技股份有限公司 | 二极管碱腐蚀机 |
CN202097155U (zh) * | 2011-05-31 | 2012-01-04 | 常州佳讯光电产业发展有限公司 | 二极管表面清洗装置 |
CN105390424A (zh) * | 2015-12-10 | 2016-03-09 | 重庆凯西驿电子科技有限公司 | 二极管酸洗装置 |
CN105405792A (zh) * | 2015-11-24 | 2016-03-16 | 如皋市大昌电子有限公司 | 一种二极管清洗槽 |
CN105921445A (zh) * | 2016-06-22 | 2016-09-07 | 贵州雅光电子科技股份有限公司 | 具有摆动式喷头的二极管清洗装置及清洗方法 |
CN106128981A (zh) * | 2016-08-29 | 2016-11-16 | 天津汉德威药业有限公司 | 一种轴向二极管酸洗装置 |
CN106356323A (zh) * | 2016-11-28 | 2017-01-25 | 广东技术师范学院 | 一种二极管制作用酸洗设备 |
CN106964591A (zh) * | 2017-04-28 | 2017-07-21 | 南通中邦微电子股份有限公司 | 一种超薄贴片二极管自动溶剂型线路板清洗机 |
CN206401279U (zh) * | 2017-01-19 | 2017-08-11 | 东莞市康瑞电子有限公司 | 一种用于二极管生产的悬挂式酸洗设备 |
-
2018
- 2018-05-21 CN CN201810491386.9A patent/CN108550540B/zh active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08201273A (ja) * | 1995-01-31 | 1996-08-09 | Ket Kagaku Kenkyusho:Kk | 近赤外成分分析器の光源装置 |
CN201359997Y (zh) * | 2009-03-04 | 2009-12-09 | 泰州银河寰宇半导体有限公司 | 酸洗板 |
CN201655762U (zh) * | 2010-04-26 | 2010-11-24 | 贵州雅光电子科技股份有限公司 | 二极管碱腐蚀机 |
CN202097155U (zh) * | 2011-05-31 | 2012-01-04 | 常州佳讯光电产业发展有限公司 | 二极管表面清洗装置 |
CN105405792A (zh) * | 2015-11-24 | 2016-03-16 | 如皋市大昌电子有限公司 | 一种二极管清洗槽 |
CN105390424A (zh) * | 2015-12-10 | 2016-03-09 | 重庆凯西驿电子科技有限公司 | 二极管酸洗装置 |
CN105921445A (zh) * | 2016-06-22 | 2016-09-07 | 贵州雅光电子科技股份有限公司 | 具有摆动式喷头的二极管清洗装置及清洗方法 |
CN106128981A (zh) * | 2016-08-29 | 2016-11-16 | 天津汉德威药业有限公司 | 一种轴向二极管酸洗装置 |
CN106356323A (zh) * | 2016-11-28 | 2017-01-25 | 广东技术师范学院 | 一种二极管制作用酸洗设备 |
CN206401279U (zh) * | 2017-01-19 | 2017-08-11 | 东莞市康瑞电子有限公司 | 一种用于二极管生产的悬挂式酸洗设备 |
CN106964591A (zh) * | 2017-04-28 | 2017-07-21 | 南通中邦微电子股份有限公司 | 一种超薄贴片二极管自动溶剂型线路板清洗机 |
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Address after: 230009 Guoxuan K Xijia, No. 502 Wangjiangxi Road, Shushan District, Hefei City, Anhui Province Applicant after: Li Hui Address before: 214432 Jiangsu Sfeir Electric Co., Ltd. No. 99 Chengjiang East Road, Jiangyin City, Wuxi City, Jiangsu Province Applicant before: Li Hui |
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Effective date of registration: 20201021 Address after: Wafang Xiang Wa Fang Cun, Si county, Suzhou City, Anhui Province Applicant after: Sixian Tianyuan straw recycling Co., Ltd Address before: 230009 Guoxuan K Xijia, No. 502 Wangjiangxi Road, Shushan District, Hefei City, Anhui Province Applicant before: Li Hui |
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