CN108427151A - The manufacturing method of optical mirror slip with atomization interface - Google Patents

The manufacturing method of optical mirror slip with atomization interface Download PDF

Info

Publication number
CN108427151A
CN108427151A CN201710075609.9A CN201710075609A CN108427151A CN 108427151 A CN108427151 A CN 108427151A CN 201710075609 A CN201710075609 A CN 201710075609A CN 108427151 A CN108427151 A CN 108427151A
Authority
CN
China
Prior art keywords
mirror slip
optical mirror
optical
interface
outer portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710075609.9A
Other languages
Chinese (zh)
Inventor
张又升
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GENIE PRECISION MACHINING CO Ltd
Original Assignee
GENIE PRECISION MACHINING CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GENIE PRECISION MACHINING CO Ltd filed Critical GENIE PRECISION MACHINING CO Ltd
Priority to CN201710075609.9A priority Critical patent/CN108427151A/en
Publication of CN108427151A publication Critical patent/CN108427151A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Powder Metallurgy (AREA)

Abstract

The present invention relates to the manufacturing methods of the optical mirror slip with atomization interface, it is used on the interface of the optical active area of optical mirror slip and outer portion forms atomization interface with rapid laser carving, allow the stray light irradiated towards optical active area by outer portion to be effectively atomized interfacial barrier, stray light is avoided to enter in optical active area the imaging for influencing optical mirror slip.In addition, the periphery that the present invention is separately provided in optical mirror slip forms a location structure, optical mirror slip is helped mutually to be aligned with laser device, it can be accurately produced on the interface of optical active area and outer portion with ensuring to be atomized interface, the effect of best blocking stray light is provided, and makes the optical mirror slip with atomization interface with best image quality.

Description

The manufacturing method of optical mirror slip with atomization interface
Technical field
The present invention is a kind of manufacturing method of optical mirror slip, espespecially a kind of manufacturer with the optical mirror slip for being atomized interface Method.
Background technology
It please refers to shown in Fig. 5, discloses the optical mirror slip 100 in traditional optical lens 90, which has Effective 102 and one outer portion 103 of portion of one optical axis 101, an optics.The optical axis 101 is located at the centre bit of the optical mirror slip 100 It sets, the effective portion 102 of the optics is the regional extent that the optical mirror slip 100 is mainly used for imaging, and the outer portion 103 is located at the light The outer peripheral edge in effective portion 102 is learned, outer portion 103 is mainly used for that the optical mirror slip 100 and another eyeglass are stacked with or are consolidated On lens barrel frame 91.And it is formed with an edge optical track on the interface of the effective portion 102 of optics and the outer portion 103 104, the optics effective district limit a that wherein the edge optical track 104 is the image end A of optical mirror slip 100 and the optics for being imaged end B The line of effective district limit b, the edge optical track 104 are the interface that a naked eyes can not understand identification, when an extraneous light shines When being incident upon side of the edge optical track 104 towards the effective portion of the optics 102, which is mainly used for imaging and uses;Outside one When light exposes to side of the edge optical track 104 towards the outer portion 103, which is mainly veiling glare, can not be imaging There is provided help, in some instances it may even be possible to influence the imaging definition of optical mirror slip 100, therefore the edge optical track 104 is a discrimination exterior light Line is irradiated into after optical mirror slip 100 for critical margin line whether imaging.
Since the edge optical track 104 is substantially a transparent interface, when an extraneous light is irradiated into the outer shroud Behind portion 103, which can wear to penetrate after roundtrip in outer portion 103 again enters optics by the edge optical track 104 In effective portion 102, the stray light in the effective portion of optics 102 is formed, therefore can be to script by 100 outside direct irradiation of optical mirror slip Interference is generated into the light for imaging in the effective portion of the optics 102, and then generates ghost in the imaging of optical mirror slip 100 Shadow.
As shown in fig. 6, optical mirror slip 100A in the optical lens 90A of the prior art is in order to avoid being irradiated into its outer shroud The light of portion 103A is injected by repeatedly being worn after outer portion 103A internal reflections or scattering into optical active area 102A interior focusings The imaging for learning eyeglass interferes, and has dealer can the sandwiched shading between the outer portion 103A for the optical mirror slip 100A being stacked Plate 110 helps optical mirror slip 100A to hinder the light being irradiated into outer portion 103A by extraneous light with barn door 110 Gear reduces the ratio that the light being irradiated into outer portion 103A is entered by edge optical track 104A in the effective portion 102A of optics Rate interferes to avoid to imaging.
In addition, as shown in fig. 7, optical mirror slip 100B in the optical lens 90B of the prior art is in order to avoid being irradiated into The light of its outer portion 103B is injected by repeatedly being worn after outer portion 103B internal reflections or scattering into optical active area 102B The imaging of interior focusing eyeglass interferes, and also has dealer that can utilize sandblasting or electric discharge engineering method on the surface of outer portion 103B, So that the surface of outer portion 103B forms rough projection area 120, whereby so that being irradiated into the light in outer portion 103B Line can be inhibited by rough projection area 120, reduce to be worn injecting into light by edge optical track 104B excessively by outer portion 103B The light quantity in the 102B of effective coverage is learned, the imaging of optical mirror slip 100B is avoided to be interfered or the generation of ghost.
But the setting of the barn door 110 of the prior art causes the sky between the optical mirror slip 100A in optical lens 90A Gas interval is easy to lead to airspace cause not of uniform size because the mode that is sticked of barn door 110 is different;And utilize sandblasting or It is very big that electric discharge engineering method makes its quality drop of the rough projection area 120 to be formed, thus the depth of each recessed portion with And the height of each protrusion can not be consistent, can equally cause the sky between the optical mirror slip 100B in optical lens 90B The inconsistent problem of gas gap size, and equally can not effectively inhibit the light for being irradiated into outer portion 103B by projection area The ratio of 120 blockings causes light still to be easy further to wear after reflection or scattering to inject in the 102B of optical active area The imaging of optical mirror slip is interfered, the image quality of optical mirror slip is reduced.
In addition, aforementioned blast or electric discharge engineering method can only be processed the surface of optical mirror slip 100B, it can not be in light The inside processing of eyeglass 100B is learned, therefore, the prior art is still difficult to overcome the stray light from outer portion 103A, 103B for light Learn the interference problem of the imaging of eyeglass 100A, 100B.
Invention content
In view of the shortcomings that the prior art and deficiency, need at this stage it is a kind of can not only the surface of optical mirror slip into The optical texture manufacturing method of row processing, can also select the inside in optical mirror slip to prepare to form optical texture, thus more Can effectively help the light for being irradiated into outer portion to be suppressed, avoid the light for being irradiated into outer portion further wear inject into In optical active area, the clarity of the imaging of optical mirror slip is influenced.
To achieve the purpose that foregoing invention, the technology used in the present invention means are to provide a kind of light with atomization interface The manufacturing method of eyeglass is learned, wherein this method includes:By the optical active area of an optical mirror slip and the interface of outer portion Edge optical track aligned with a laser device, wherein the edge optical track be optical mirror slip image end optics effective district side The line in the optics effective district limit at border and imaging end carries out one atomization circle of engraving formation on the edge optical track with laser Face.
The advantage of the invention is that being laser machined to the inside of optical mirror slip using laser, use in optical mirror slip An atomization interface is formed on edge optical track, and is shone towards optical active area by outer portion using the setting at atomization interface blocking The light penetrated effectively reduces the interference of the stray light from outer portion, helps the imaging of optical mirror slip to be more clear, provide imaging Quality more preferably optical mirror slip.
Preferably, the edge optical track of the interface of the optical active area and outer portion of the optical mirror slip and the laser Before device is aligned, a location structure is arranged in the outer rim prior to the optical mirror slip, which includes:In the optical mirror slip The outer peripheral edge of outer portion multiple link blocks are set, and in the side for being different from the optical mirror slip of the link block be arranged to Few positioning piece, at least positioning piece are connected to a fixed with aforementioned link block.This technological means utilizes optical mirror slip outer rim Location structure setting, help optical mirror slip can be adjusted by adjusting the relative position of the location structure and laser device The contraposition situation of optical mirror slip and laser device.
More preferably, it is carried out after engraving forms the atomization interface, then by the light with laser on the edge optical track of the optical mirror slip It learns eyeglass to detach with the location structure, to obtain the optical mirror slip with atomization interface.This technological means is utilized and has been laser machined Further optical mirror slip is detached with location structure cutting at rear, you can obtain the simple optical frames with atomization interface Piece.
Again more preferably, the optical mirror slip and the link block and the locating piece are one of the forming setting.This technology hand Duan Liyong optical mirror slips and link block and locating piece are in the characteristic of integrally formed setting, avoid optical mirror slip and link block and The combination of locating piece generates unnecessary tolerance, and then influences the contraposition of optical mirror slip and laser device so that the atomization interface It can accurately be produced on the edge optical track of optical mirror slip.
More preferably, the quantity of the multiple link block is four.The quantity of link block herein is not limited according to this, the present invention Only it is four as an example, it also may be configured as more or less link block with the quantity of link block.
More preferably, at least positioning piece is an annular hollow structure, which has an inner edge and an outer rim, should Inner edge and the side for being different from the optical mirror slip of aforementioned each link block are connected to a fixed.
More preferably, at least positioning piece is a sphere, and the quantity of the locating piece is opposite with the quantity of the link block It answers, and the side for being different from the optical mirror slip of each locating piece and aforementioned each link block is connected to a fixed.
Description of the drawings
Fig. 1 is the solid that the optical mirror slip of the present invention and the locating piece of link block and first embodiment are connected to a fixed Outside drawing.
Fig. 2 is the schematic diagram that the present invention forms atomization interface with laser engraving optical mirror slip.
Fig. 3 be the present invention optical mirror slip self positioning structure on cut down after schematic diagram.
Fig. 4 is the solid that the optical mirror slip of the present invention and the locating piece of link block and second embodiment are connected to a fixed Outside drawing.
Fig. 5 is the setting schematic diagram of the optical mirror slip in the optical lens of the prior art.
Fig. 6 is the setting schematic diagram of the optical mirror slip and barn door in the optical lens of the prior art.
Fig. 7 is the setting schematic diagram of the optical mirror slip and projection area in the optical lens of the prior art.
Reference sign:
10 optical mirror slip, 11 optical active area
12 outer portion, 13 edge optical track
14 atomization 20 location structures of interface
21 link block, 22 locating piece
221 inner edge, 222 outer rim
30 laser device, 31 laser.
Specific implementation mode
It please coordinate attached drawing and presently preferred embodiments of the present invention below, the present invention is further explained to reach predetermined goal of the invention The technological means taken.
The first embodiment of the manufacturing method of the optical mirror slip with atomization interface of the present invention is as shown in Figures 1 and 2, One location structure 20 is set in the outer rim of an optical mirror slip 10 with an optical active area 11 and an outer portion 12 first, The location structure 20 includes:Four link blocks 21 are equally spaced in the outer peripheral edge of the outer portion 12 of the optical mirror slip 10, then Positioning piece 22 is set in the side for being different from the optical mirror slip 10 of the link block 21, wherein the optical mirror slip 10, company It connects block 21 and locating piece 22 is one of the forming setting, and the locating piece 22 is an annular hollow structure, the locating piece 22 tool There are an inner edge 221 and an outer rim 222, the side phase for being different from the optical mirror slip 10 of the inner edge 221 and aforementioned each link block 21 It is connected and fixed.
Then, then by the optical active area 11 of the optical mirror slip 10 and the edge optical track 13 of the interface of outer portion 12 It is aligned with a laser device 30, wherein the edge optical track 13 is the optics effective district limit a of the image end A of optical mirror slip 10 And the line of the optics effective district limit b of imaging end B so that the laser 31 that the laser device 30 is emitted can be effectively aligned The side towards outer portion 12 of the edge optical track 13 forms an atomization interface 14 in the edge to carry out laser engraving The side towards outer portion 12 of optical track 13.
Finally, then by the optical mirror slip 10 it is cut down from the location structure 20, makes the optical mirror slip 10 and the company Connect the separation of block 21, you can obtain the optical mirror slip 10 with atomization interface as shown in Figure 3.
The second embodiment of the manufacturing method of the optical mirror slip with atomization interface of the present invention is as shown in figure 4, it is same A location structure 20A is arranged in the outer rim of an optical mirror slip 10 with an optical active area 11 and an outer portion 12 in sample, Location structure 20A includes:Four link block 21A are equally spaced in the outer peripheral edge of the outer portion 12 of the optical mirror slip 10, Positioning piece 22A is set then at the side for being different from the optical mirror slip 10 of each link block 21A, wherein each locating piece 22A A respectively sphere, the quantity of the locating piece 22A is equal with the quantity of link block 21A and is similarly four, and described Optical mirror slip 10 and the link block 21A and locating piece 22A of each interconnection are in integrally formed setting.
Then, equally by the optical active area 11 of the optical mirror slip 10 and the edge optical track of the interface of outer portion 12 13 are aligned with a laser device 30 so that the laser 31 that the laser device 30 is emitted can effectively be directed at the optical mirror slip 10 edge optical track 13 forms an atomization interface 14 in the edge optical track 13 towards outer portion 12 to carry out laser engraving Side.
Finally, then by the optical mirror slip 10 it is cut down from location structure 20A, makes the optical mirror slip 10 and the company Connect block 21A separation, you can obtain the optical mirror slip 10 with atomization interface.
In conclusion the manufacturing method with the optical mirror slip at atomization interface provided herein is not only able to so that light Laser engraving shape can be utilized on the edge optical track 13 of the optical active area 11 of eyeglass 10 and the interface of outer portion 12 by learning At an atomization interface, it effectively prevent the veiling glare for being irradiated into outer portion 12 to be worn by the edge optical track 13 and injects into optics effective district Domain 11 avoids the imaging for influencing optical mirror slip 10, this manufacturing method from also capable of effectively assisting optical mirror slip 10 and laser device 30 Contraposition, help laser device 30 laser 31 can be precisely directed to the edge optical track 13 of optical mirror slip 10 to carry out laser carving It carves, it is ensured that atomization interface 13 is prepared in really on edge optical track 13, to provide imaging effect more good optical mirror slip.

Claims (7)

1. a kind of manufacturing method with the optical mirror slip for being atomized interface comprising:
The edge optical track and a laser device of the optical active area of one optical mirror slip and the interface of outer portion are carried out pair Position;And
An atomization interface is formed in carrying out engraving on the edge optical track with laser.
2. there is the manufacturing method of the optical mirror slip at atomization interface as described in claim 1, wherein by the optics of the optical mirror slip Before the edge optical track of the interface of effective coverage and outer portion is aligned with the laser device, prior to the optical mirror slip A location structure is arranged in outer rim, which includes:
In the outer peripheral edge of the outer portion of the optical mirror slip, multiple link blocks are set;And
In the side setting at least positioning piece for being different from the optical mirror slip of the link block, at least positioning piece is with before Link block is stated to be connected to a fixed.
3. having the manufacturing method of the optical mirror slip at atomization interface, the wherein edge-light of the optical mirror slip as claimed in claim 2 It is carried out after engraving forms the atomization interface with laser on mark, then the optical mirror slip is detached with the location structure.
4. there is the manufacturing method of the optical mirror slip at atomization interface as described in Claims 2 or 3, wherein the link block and the light Learn the integrally formed setting of eyeglass.
5. have the manufacturing method of the optical mirror slip at atomization interface as claimed in claim 4, wherein at least positioning piece with The integrally formed setting of link block.
6. there is the manufacturing method of the optical mirror slip at atomization interface as described in Claims 2 or 3, wherein at least positioning piece For an annular hollow structure, which there is an inner edge and an outer rim, the inner edge to be different from the light with aforementioned each link block The side for learning eyeglass is connected to a fixed.
7. there is the manufacturing method of the optical mirror slip at atomization interface as described in Claims 2 or 3, wherein at least positioning piece For a sphere, the quantity of the locating piece is corresponding with the quantity of the link block, and each locating piece and aforementioned each link block The side for being different from the optical mirror slip is connected to a fixed.
CN201710075609.9A 2017-02-13 2017-02-13 The manufacturing method of optical mirror slip with atomization interface Pending CN108427151A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710075609.9A CN108427151A (en) 2017-02-13 2017-02-13 The manufacturing method of optical mirror slip with atomization interface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710075609.9A CN108427151A (en) 2017-02-13 2017-02-13 The manufacturing method of optical mirror slip with atomization interface

Publications (1)

Publication Number Publication Date
CN108427151A true CN108427151A (en) 2018-08-21

Family

ID=63154908

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710075609.9A Pending CN108427151A (en) 2017-02-13 2017-02-13 The manufacturing method of optical mirror slip with atomization interface

Country Status (1)

Country Link
CN (1) CN108427151A (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003252651A (en) * 2002-02-28 2003-09-10 Masao Yoshida Frosted glass or resin having opaque engraving inside and method of manufacturing it
JP2013114098A (en) * 2011-11-30 2013-06-10 Canon Inc Optical element, optical system and optical equipment
WO2013125544A1 (en) * 2012-02-20 2013-08-29 Canon Kabushiki Kaisha Light-shielding coating material and light-shielding film for optical element and optical element
CN206505197U (en) * 2017-02-13 2017-09-19 均英精密工业股份有限公司 Optical mirror slip
CN207528949U (en) * 2017-10-25 2018-06-22 瑞声科技(新加坡)有限公司 A kind of glass lens and camera lens module

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003252651A (en) * 2002-02-28 2003-09-10 Masao Yoshida Frosted glass or resin having opaque engraving inside and method of manufacturing it
JP2013114098A (en) * 2011-11-30 2013-06-10 Canon Inc Optical element, optical system and optical equipment
WO2013125544A1 (en) * 2012-02-20 2013-08-29 Canon Kabushiki Kaisha Light-shielding coating material and light-shielding film for optical element and optical element
CN206505197U (en) * 2017-02-13 2017-09-19 均英精密工业股份有限公司 Optical mirror slip
CN207528949U (en) * 2017-10-25 2018-06-22 瑞声科技(新加坡)有限公司 A kind of glass lens and camera lens module

Similar Documents

Publication Publication Date Title
WO2019079417A3 (en) Methods for laser processing transparent workpieces using pulsed laser beam focal lines and chemical etching solutions
CN106739589B (en) Printing and processing method
DE102020106965A1 (en) METHOD AND SYSTEM FOR PERFORMING AUTOMATIC CAMERA CALIBRATION FOR A SCANNING SYSTEM
CN201721134U (en) Near wavelength coaxial positioning laser marking system
CN101166601A (en) System and method for inspecting wafers in a laser marking system
CN106216856A (en) Double focus laser system of processing and processing method thereof
CN106077972A (en) A kind of real-time carving depth that actively controls realizes the method and apparatus of laser three-D stereo carving
US6740846B1 (en) Method for production of 3D laser-induced head image inside transparent material by using several 2D portraits
CN112276344B (en) Focus positioning method for ultrafast laser cutting of transparent material
CN108357206A (en) The method of glass cover-plate ink layer trepanning
CN206505197U (en) Optical mirror slip
CN108427151A (en) The manufacturing method of optical mirror slip with atomization interface
US20180299585A1 (en) Lens Module
US10955660B2 (en) Optical element with light shielding area, and imaging lens
CN210109840U (en) Device capable of collecting arc-shaped surface color-difference-free convex character image
KR101217698B1 (en) Laser processing method and laser processing apparatus using sequential multi-focusing
US20070273977A1 (en) Resin Optical Member and Method for Manufacturing the Same
JP2005316044A5 (en)
CN205464807U (en) Use and pierce through laser engraving machine that mirror surface carries out biax displacement
CN106670652A (en) Laser coaxial processing device and method
JPS5984515A (en) Marking to semiconductor substrate by laser light
US11940761B2 (en) Manufacturing method and watch component
CN204630547U (en) A kind of binocular two-way assembles the trickle butt-weld detection system of adjustable light path
US10146179B2 (en) Exposure method of holographic grating and exposure light path
CN103101191A (en) Laser welding structure

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20180821

WD01 Invention patent application deemed withdrawn after publication