CN108385059A - 高亮硬质装饰膜及其制作方法和应用 - Google Patents
高亮硬质装饰膜及其制作方法和应用 Download PDFInfo
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Abstract
本发明涉及一种高亮硬质装饰膜及其制作方法和应用。该高亮硬质装饰膜包括:底层膜;以及,层叠于所述底层膜表面的硬质膜;其中,所述底层膜选自TiN膜、CrN膜、TiC膜、CrC膜、C膜中的一种;所述硬质膜选自Si2N2O膜、Si3N4膜、Si2N2O/Si3N4复合膜中的一种;所述Si2N2O/Si3N4复合膜包括交替层叠的Si3N4膜和Si2N2O膜。该高亮硬质装饰膜相较传统的装饰膜具有更为优异的硬度和亮度。
Description
技术领域
本发明涉及薄膜材料技术领域,特别是涉及高亮硬质装饰膜及其制作方法和应用。
背景技术
随着物理气相沉积技术(PVD)的不断发展以及使用条件和场所的复杂化,市场对应用于钟表、手机等产品及其它高端装饰镀领域的装饰膜要求越来越高,除了要求装饰膜具有更为优良的硬度、耐磨损、抗刮伤外,还要求薄膜颜色、亮度等外观符合严苛的产品标准。
目前,常用的产品材质一般为塑料、金属或玻璃,其表面的装饰膜主要为N/C化物材料镀层。该镀层的亮度和硬度提升困难,此外,也较难实现多色炫彩效果,特别是难以实现高硬红色装饰效果。在针对塑料表面的产品进行装饰镀时,由于塑料温变的影响,更是增加了实现高硬、高亮、多色、炫彩的装饰效果的难度。
发明内容
基于此,有必要提供一种高亮硬质装饰膜。该高亮硬质装饰膜相较传统的装饰膜具有更为优异的硬度和亮度。
一种高亮硬质装饰膜,包括:
底层膜;以及,
层叠于所述底层膜表面的硬质膜;
其中,所述底层膜选自TiN膜、CrN膜、TiC膜、CrC膜、C膜中的一种;
所述硬质膜选自Si2N2O膜、Si3N4膜、Si2N2O/Si3N4复合膜中的一种;所述Si2N2O/Si3N4复合膜包括交替层叠的Si3N4膜和Si2N2O膜。
在其中一个实施例中,所述硬质膜为Si2N2O/Si3N4复合膜,所述Si2N2O/Si3N4复合膜按照Si3N4膜、Si2N2O膜的顺序循环交替。
在其中一个实施例中,所述Si3N4膜的折射率为2~3;所述Si2N2O的折射率为1.5~2。
在其中一个实施例中,所述Si3N4膜的厚度为5~500nm;所述Si2N2O厚度为5~500nm。
在其中一个实施例中,所述底层膜选自TiN膜、CrN膜、TiC膜、CrC膜中的一种。
在其中一个实施例中,所述底层膜的厚度为0.05~10μm,优选为1~5μm;所述硬质膜的厚度为0.05~10μm,优选为0.1~0.5μm。
上述的高亮硬质装饰膜可以通过所述底层膜或所述硬质膜层叠于基材表面,所述基材表面的材质可为玻璃、金属或塑料。该高亮硬质装饰膜可以作为表面装饰使用,也可以作为LOGO装饰使用。另外,根据需要还可以在所述底层膜或所述硬质膜层的表面再层叠设置防指纹层(AF层),实现优良的硬质防指纹效果。可理解的,防指纹层(AF层)也可以设置在基材上与设置有该高亮硬质装饰膜的表面相对的另一面。
本发明还提供所述的高亮硬质装饰膜的制作方法,包括如下步骤:
采用真空蒸发镀膜技术或反应溅射技术沉积所述底层膜和硬质膜;
其中,所述底层膜选自TiN膜、CrN膜、TiC膜、CrC膜、C膜中的一种;
所述硬质膜选自Si2N2O膜、Si3N4膜、Si2N2O/Si3N4复合膜中的一种;所述Si2N2O/Si3N4复合膜包括交替层叠的Si3N4膜和Si2N2O膜。
上述真空蒸发镀膜技术或反应溅射技术沉积所述底层膜和硬质膜的具体工艺可根据膜层材料和厚度工艺进行常规确定。具体地:
沉积所述Si2N2O膜的工艺过程如下:
在真空环境中离子束蒸发Si2N2O膜料(少量氮/氧气保护),物理气象沉积获得Si2N2O膜;或通过Si靶材在真空环境中磁控溅射的原子态Si与原子态N、原子态O(真空环境中充少量氮气、氧气在离子源等激化作用下获得)反应生成Si2N2O,沉积获得Si2N2O膜。通过沉积时间控制膜层厚度。
沉积所述Si3N4膜的工艺过程如下:
在真空环境中离子束蒸发Si3N4膜料(少量氮气保护),物理气象沉积获得Si3N4膜;或通过Si靶材在真空环境中磁控溅射的原子态Si与原子态N(真空环境中充少量氮气在离子源等激化作用下获得)反应生成Si3N4,沉积获得Si3N4膜。通过沉积时间控制膜层厚度。
沉积所述底层膜的工艺过程如下:
在真空环境中离子束蒸发TiN膜料(或CrN、TiC、CrC、C膜料),物理气象沉积于基材和打底膜层上获得TiN膜(或CrN膜、TiC膜、CrC膜、C膜);或通过Ti靶材(或Cr靶材、C靶材),在真空环境中磁控溅射的原子态Ti与原子态N(或原子态Cr、原子态C,真空环境中充少量氮气在离子源等激化作用下获得)反应生成TiN(或CrN、TiC、CrC、C),沉积于基材和打底膜层上获得TiN膜(或CrN膜、TiC膜、CrC膜、C膜,碳化物的反应气体为乙炔)。通过沉积时间控制膜层厚度。
本发明还提供所述的高亮硬质装饰膜在装饰镀产品中的应用。
与现有技术相比,本发明具有以下有益效果:
本发明的高亮硬质装饰膜,以TiN膜、CrN膜、TiC膜、CrC膜、C膜中的一种作为底层膜,结合Si2N2O膜、Si3N4膜、Si2N2O/Si3N4复合膜中的一种作为硬质膜,与传统的N/C化物材料镀层相比较,能够有效提高装饰膜的硬度和亮度,且采用的膜层材质能够适应塑料温变,保证装饰膜硬度和亮度的工艺稳定性,适用于高品质装饰镀产品。
进一步地,采用按照一定顺序循环交替的Si2N2O/Si3N4复合膜,并对Si2N2膜和Si3N4膜的折射率和厚度进行调控,能够在优化装饰膜亮度和硬度的同时,使装饰膜具有绚丽丰富的颜色效果,可从不同角度呈现不同的颜色变化,尤其可以获得红色系的颜色效果。
附图说明
图1为实施例1的高亮硬质装饰膜的结构示意图;
图2为实施例2的高亮硬质装饰膜的结构示意图;
图3为实施例3的高亮硬质装饰膜的结构示意图;
图4为实施例4的高亮硬质装饰膜的结构示意图。
具体实施方式
以下结合具体实施例对本发明的高亮硬质装饰膜及其制作方法和应用作进一步详细的说明。
实施例1
本实施例一种高亮硬质装饰膜,如图1所示,包括:
层叠于基材101表面的底层膜102,厚度为3μm;以及,
层叠于底层膜102表面的硬质膜103,厚度为500nm。
其中,基材101表面的材质为塑料,底层膜102为TiN膜;硬质膜103为Si2N2O/Si3N4复合膜,按照Si3N4膜、Si2N2O膜的顺序循环交替层叠(即通过Si3N4膜层叠于底层膜102的表面),所述Si3N4膜的折射率为2.5,厚度为100~200nm;所述Si2N2O膜的折射率为1.8,厚度为100~200nm。根据需要,硬质膜300的表面还可以设置AF层104。
上述高亮硬质装饰膜的制作方法,步骤如下:
(1)清洗基材101表面,达到镀膜表面洁净度要求;
(2)清洗后的基材101上架,进入真空蒸发镀膜机或反应溅射镀膜机内,抽至需要真空度,并用等离子体对基材101的表面进行活化处理;
(3)在活化处理后的基材101的表面沉积底层膜102,工艺过程如下:
通过Ti靶材,在真空环境中磁控溅射的原子态Ti与原子态N(真空环境中所充少量氮气在离子源等激化作用下获得)反应生成TiN,沉积于基材上获得TiN膜。通过沉积时间控制膜层厚度。
(4)在底层膜102的表面交替沉积Si3N4膜和Si2N2O膜,形成硬质膜103,工艺过程如下:
采用真空溅射镀膜的镀膜方式,通过Si靶材在真空环境中磁控溅射的原子态Si,与原子态N(真空环境中充少量氮气在离子源等激化作用下获得)反应生成Si3N4,与原子态N、原子态O(真空环境中所充少量氮气、氧气在离子源等激化作用下获得)反应生成Si2N2O,在镀膜机中间歇***替沉积反应,于底层膜102上获得Si3N4和Si2N2O的交替膜。通过沉积时间控制膜层厚度。
实施例2
本实施例一种高亮硬质装饰膜,如图2所示,包括:
层叠于基材201表面的底层膜202,厚度为3μm;以及,
层叠于底层膜202表面的硬质膜203,厚度为300nm。
其中,基材201表面的材质为塑料,底层膜202为TiN膜;硬质膜203为Si3N4膜,折射率为2.5,厚度为300nm。根据需要,硬质膜203的表面还可以设置AF层204。
上述高亮硬质装饰膜的制作方法类似实施例1。
实施例3
本实施例一种高亮硬质装饰膜,如图3所示,包括:
层叠于基材301表面的底层膜302,厚度为3μm;以及,
层叠于底层膜302表面的硬质膜303,厚度为300nm。
其中,基材301表面的材质为塑料,底层膜302为TiN膜;硬质膜303为Si2N2O,折射率为1.8,厚度为300nm。根据需要,硬质膜303的表面还可以设置AF层304。
上述高亮硬质装饰膜的制作方法类似实施例1。
实施例4
本实施例一种高亮硬质装饰膜,如图4所示,包括:
层叠于基材401表面的硬质膜403,厚度为3μm;以及,
层叠于硬质膜403表面的底层膜402,厚度为500nm。
其中,基材401表面的材质为塑料,底层膜402为TiN膜;硬质膜403为Si2N2O/Si3N4复合膜,按照Si3N4膜、Si2N2O膜的顺序循环交替层叠。所述Si3N4膜的折射率为2.5,厚度为100~200nm;所述Si2N2O的折射率为1.8,厚度为100~200nm。
上述高亮硬质装饰膜的制作方法类似实施例1。
实施例5
本实施例一种高亮硬质装饰膜,其结构和制作方法类似实施例1,区别在于:
底层膜102的厚度为2μm;以及,
层叠于底层膜102表面的硬质膜103的厚度为500nm。
其中,基材101表面的材质为金属,底层膜102为CrC膜。
实施例6
本实施例一种高亮硬质装饰膜,其结构和制作方法类似实施例1,区别在于:
底层膜102的厚度为2μm;以及,
层叠于底层膜102表面的硬质膜103的厚度为500nm。
其中,基材101表面的材质为玻璃,底层膜102为C膜。
对实施例1-6制得的装饰膜进行硬度、亮度和颜色效果的测试,结果如下表所示:
纳米硬度(GPa) | 亮度(L) | 颜色效果 | |
实施例1 | 11 | 70-95 | 红、绿、紫、蓝、金黄等 |
实施例2 | 11 | 80 | 绿、银 |
实施例3 | 11 | 80 | 绿、银 |
实施例4 | 11 | 70-95 | 红、黄紫、蓝、银等 |
实施例5 | 11 | 70-95 | 红、黄、绿、紫、蓝、黑等 |
实施例6 | 11 | 50-95 | 红、黄、绿、紫、蓝、黑等 |
以上所述实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。
Claims (8)
1.一种高亮硬质装饰膜,其特征在于,包括:
底层膜;以及,
层叠于所述底层膜表面的硬质膜;
其中,所述底层膜选自TiN膜、CrN膜、TiC膜、CrC膜、C膜中的一种;
所述硬质膜选自Si2N2O膜、Si3N4膜、Si2N2O/Si3N4复合膜中的一种;所述Si2N2O/Si3N4复合膜包括交替层叠的Si3N4膜和Si2N2O膜。
2.根据权利要求1所述的高亮硬质装饰膜,其特征在于,所述硬质膜为Si2N2O/Si3N4复合膜,所述Si2N2O/Si3N4复合膜按照Si3N4膜、Si2N2O膜的顺序循环交替层叠。
3.根据权利要求2所述的高亮硬质装饰膜,其特征在于,所述Si3N4膜的折射率为2~3;所述Si2N2O的折射率为1.5~2。
4.根据权利要求2所述的高亮硬质装饰膜,其特征在于,所述Si3N4膜的厚度为5~500nm;所述Si2N2O厚度为5~500nm。
5.根据权利要求1-4任一项所述的高亮硬质装饰膜,其特征在于,所述底层膜选自TiN膜、CrN膜、TiC膜、CrC膜中的一种。
6.根据权利要求1-4任一项所述的高亮硬质装饰膜,其特征在于,所述底层膜的厚度为0.05~10μm;所述硬质膜的厚度为0.05~10μm。
7.权利要求1-6任一项所述的高亮硬质装饰膜的制作方法,其特征在于,包括如下步骤:
采用真空蒸发镀膜技术或反应溅射技术沉积所述底层膜和硬质膜;
其中,所述底层膜选自TiN膜、CrN膜、TiC膜、CrC膜、C膜中的一种;
所述硬质膜选自Si2N2O膜、Si3N4膜、Si2N2O/Si3N4复合膜中的一种;所述Si2N2O/Si3N4复合膜包括交替层叠的Si3N4膜和Si2N2O膜。
8.权利要求1-6任一项所述的高亮硬质装饰膜在装饰镀产品中的应用。
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