CN108335916A - A kind of multi-walled carbon nanotube@X combination electrodes and its preparation method and application - Google Patents
A kind of multi-walled carbon nanotube@X combination electrodes and its preparation method and application Download PDFInfo
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- CN108335916A CN108335916A CN201711383259.9A CN201711383259A CN108335916A CN 108335916 A CN108335916 A CN 108335916A CN 201711383259 A CN201711383259 A CN 201711383259A CN 108335916 A CN108335916 A CN 108335916A
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- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/24—Electrodes characterised by structural features of the materials making up or comprised in the electrodes, e.g. form, surface area or porosity; characterised by the structural features of powders or particles used therefor
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- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
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- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
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- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/84—Processes for the manufacture of hybrid or EDL capacitors, or components thereof
- H01G11/86—Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
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Abstract
The present invention relates to a kind of multi-walled carbon nanotube@X combination electrodes and its preparation method and application, the preparation method of the multi-walled carbon nanotube@X combination electrodes is as follows:S1:By the method for Direct current plasma enhanced chemical vapour deposition, the orderly array of multi-walled carbon nanotubes of growth of vertical on vitreous carbon;S2:Active material X is coated on array of multi-walled carbon nanotubes surface described in S1 by the method for magnetron sputtering;Wherein, a diameter of 10~300nm of the multi-walled carbon nanotube, length are 100~5000nm, and the distance between array of multi-walled carbon nanotubes middle pipe is 50nm or more.Multi-walled carbon nanotube@X combination electrodes provided by the invention have higher specific surface area, excellent electric conductivity, higher mechanical performance and chemical stability, can be widely applied to the various electrochemical applications fields such as electro-catalysis, electrochemical analysis, ultracapacitor, battery.
Description
Technical field
The present invention relates to electrochemical applications technical fields, and in particular, to a kind of multi-walled carbon nanotube@X combination electrodes and
Preparation method and application.
Background technology
When carrying out electrochemical applications, it usually needs uniformly coat active material such as metal, half on the surface of entire electrode
Conductor, molecule etc. obtain a kind of linear nucleocapsid, then linear nucleocapsid are fixed in substrate again.This structure tool
There is larger specific surface area, it will help the promotion of total charge transfer efficiency.In recent years, it can reach online there are many technology
Shape material such as silicon nanowires, carbon nanotube, on memory metal nano wire coating material purpose:Chemical vapor deposition, electro-deposition,
Atomic deposition, sputtering sedimentation etc..When conventional method prepares nucleocapsid, reached by the way that core material to be dispersed in suspension
The material of nucleocapsid, is then disorderly fixed in substrate by the purpose for coating shell material at random.The shortcomings that this method, exists
Be arranged in substrate in linear Core-shell structure material is unordered, some stand some tilings in addition some can occur to stack and cause
It can not well be contacted with substrate, this disordered structure can influence the conductivity and charge transport rate of entire combination electrode.In addition,
Conventional method is first to prepare core-shell material, on being fixed to substrate, this make sheathing material and electrode or nucleocapsid interface it
Between resistance seriously affected the electric conductivity of electrode.
In order to ensure the good electric conductivity of electrode, core material well orderly should be arranged in substrate, and each core
Core material should be all in direct contact with electrode, at the same sheathing material also should uniform fold on core material surface.At the same time,
Core material and core-shell material will not only have good electric conductivity with block type electrode, also there is stronger mechanical stability and electricity
Chemical inertness, to prevent from decomposing or corroding when carrying out electrochemical applications.Up to the present, fixed on a large electrode
, all there is the above problem in monodimension nanometer material, either metal or semiconductor.Therefore they are also only applicable to small-sized answer
With field, general-purpose platform can not be ranged.
Therefore, it is necessary to research and develop a kind of with satisfactory electrical conductivity and stronger mechanical stability and electrochemicaUy inert
Combination electrode and preparation method thereof.
Invention content
It is an object of the invention to overcome the deficiencies of the prior art and provide a kind of multi-walled carbon nanotube@X combination electrodes, originally
Invent the multi-walled carbon nanotube@X combination electrodes provided has higher specific surface area, higher under the premise of ensuring electric conductivity
Mechanical performance and electrochemical stability, it is each to can be widely applied to electro-catalysis, electrochemical analysis, ultracapacitor, battery etc.
Kind electrochemical applications field.
Another object of the present invention is to provide above-mentioned multi-walled carbon nanotube@X combination electrodes in electrochemical applications platform
Application.
To achieve the above object, the present invention adopts the following technical scheme that:
The preparation method of a kind of multi-walled carbon nanotube@X combination electrodes, the multi-walled carbon nanotube@X combination electrodes is as follows:
S1:Pass through Direct current plasma enhanced chemical vapour deposition(DC-PECVD)Method, growth of vertical has on vitreous carbon
The array of multi-walled carbon nanotubes of sequence;
S2:Active material X is coated on array of multi-walled carbon nanotubes surface described in S1 by the method for magnetron sputtering;
Wherein, a diameter of 10~300nm of the multi-walled carbon nanotube, length are 100~5000nm, array of multi-walled carbon nanotubes
The distance between middle pipe is 50nm or more.
Vitreous carbon and carbon nanotube are the carbon materials in terms of being widely used in electrochemical applications.Wherein vitreous carbon is a kind of heavy
It wants and efficient inert electrode material, is used usually as catalyst carrier.Carbon nanotube is a kind of nano level carbon material, tool
There are unique electronic property and excellent thermal stability, mechanical stability and chemical stability.By vitreous carbon and carbon nanotube
Combine, i.e., directly grow the multi-walled carbon nanotube of independent vertical arrangement on vitreous carbon, multi-wall carbon nano-tube can be obtained
The full carbon electrode of pipe/glass carbon structure, this electrode can be used as further electrochemical applications.The present invention passes through on vitreous carbon
The multi-walled carbon nanotube for growing independent vertical arrangement ensure that the well-ordered of multi-walled carbon nanotube, it is ensured that charge transfer
Homogeneity;Meanwhile multi-walled carbon nanotube also has higher conductivity and chemical stability.The present invention is also by multi wall carbon
Nanotube surface uniformly coats active material X such as metal, semiconductor, molecule etc.), obtain by multi-walled carbon nanotube being core, activity
Material X is the linear nucleocapsid of the vertical arrangement of shell composition.This structure has larger specific surface area, it will help whole
The promotion of charge transfer effciency.When active material X is semiconductor, this structure design has shorter diffusion path, simultaneously
Reach higher light absorption by light scattering, to generate more photo-generated carriers.
Multi-walled carbon nanotube@X combination electrodes provided by the invention are nucleocapsid, and this nucleocapsid is by core(Directly
In the array of multi-walled carbon nanotubes of the vertical ordering growth of glass carbon surface)With sheathing material X(Directly or by reactive deposition more
The active material of wall carbon nano-tube pipe surface)Composition.This nucleocapsid combination electrode provided by the invention is expected to manage as one
The general-purpose platform thought provides catalyst for extensive electrochemical applications and supports.
In the present invention, the shell thickness of sheathing material X can be adjusted by the parameter of sputtering, and shell thickness also takes simultaneously
Certainly in the density of multi-walled carbon nanotube and length.
In the present invention, array of multi-walled carbon nanotubes can use the carbon of diameter a certain uniform diameters in 10~300nm
Nanotube can also use the carbon nanotube of random size in the range.Enhance chemical vapor deposition by direct-current plasma
Long-pending method is difficult to prepare the multi-walled carbon nanotube of smaller or bigger.The length of carbon nanotube is by controlling growth time control
Between 100~5000nm.Length of carbon nanotube is too short to be completely covered by active material X, and long is difficult then in carbon nanotube
Lower part uniformly coats Shell Materials.The distance between every carbon nanotube is maintained at 50nm or bigger, with ensure can be with shape
At a grid.
Preferably, a diameter of 50~200nm of the multi-walled carbon nanotube, length are 100~500nm, multi-wall carbon nano-tube
The distance between pipe array middle pipe is 50~200nm.
In the present invention, any to all can serve as active material X with Direct precipitation or by material obtained by the reaction.
Preferably, the active material X be alloy, metal, oxide, nitride and it is other have characteristic of semiconductor,
The substance of electro-chemical activity.
Preferably, the active material X is copper, zinc oxide or nitrided iron.
Preferably, in S2, during magnetron sputtering, array of multi-walled carbon nanotubes is placed in perpendicular to the position of sputtering target
It sets to avoid shadow effect.In the present invention, sputtering can be realized by direct current, exchange or radio-frequency sputtering.Sputtering process
In can pass through the pressure of 0.1~10Pa and generate effective plasma.
Use argon gas as protective gas, the sputtering target material various alloys or metal directly bought, oxidation when Direct precipitation
Object and nitride etc.(It is including but not limited to above-mentioned).By the way that coating material is obtained by the reaction, by 5~40% active gases and argon
Gas mixes, and is chemically reacted with sputter material during to substrate adsorption, obtains target product.
In plasma discharge processes, under the conditions of certain environment(Such as N2Environment)Inert gas can react.O2Atmosphere
It can be used for the deposition of oxidation film;N2It can be used for the deposition of nitride film;CO2It can be used for the deposition of oxide covering;C2H2It can be used for gold
The deposition of category-DLC, hydrogenated carbon compound, carbon nitride film;CH4Effect and C2H2It is similar;Several reactant gases(Such as O2+
N2)It can be with depositing multi-component function film, such as oxygen-nitride, oxygen-carbide etc.;Further, H2S can be used for generating vulcanization
Object, H2Se can be used for generating selenides.
It can reach the active purpose of intensified response by heating sample to sample surfaces sputtering, but cannot be more than
450 DEG C of limitation can also burn because admixture of gas can discharge active oxygen more than this limit carbon nano-electrode.
The present invention protects application of the above-mentioned multi-walled carbon nanotube@X combination electrodes in electrochemical applications platform simultaneously.
Preferably, the multi-walled carbon nanotube@X combination electrodes are in electro-catalysis, electrochemical analysis, ultracapacitor or battery
In application.
Compared with prior art, the present invention has the advantages that:
Compared with other prepare the method for multi-walled carbon nanotube, the present invention passes through Direct current plasma enhanced chemical vapour deposition
(DC-PECVD)Method, the array of multi-walled carbon nanotubes of vertical ordered arrangement is directly grown in glass carbon surface, ensure that
The good electric conductivity of combination electrode, while also rational space is provided for further coating active material X.Meanwhile as
The multi-walled carbon nanotube of core material in structure ensure that whole good mechanical performance and chemical stability, avoid other
The defect for easily corroding and dissolving that electrode material occurs in the application.Multi-walled carbon nanotube@X combination electrodes provided by the invention
There is higher specific surface area, higher mechanical performance and electrochemical stability, Ke Yiguang under the premise of ensuring electric conductivity
It is general to be applied to the various electrochemical applications fields such as electro-catalysis, electrochemical analysis, ultracapacitor, battery.
Description of the drawings
Fig. 1 is a kind of preparation flow figure of multi-walled carbon nanotube@X combination electrodes;
Fig. 2 is to pass through Direct current plasma enhanced chemical vapour deposition(DC-PECVD)Method on vitreous carbon growth of vertical have
The growth course schematic diagram of the array of multi-walled carbon nanotubes of sequence;
Fig. 3 is that position activity substance X obtains multi-walled carbon nanotube@in the array of multi-walled carbon nanotubes of vertical-growth on vitreous carbon
The process schematic of X electrochemical applications platforms;
Fig. 4 is the scanning electron microscope image of different samples:A) the multi-walled carbon nanotube grown on vitreous carbon;B)Multi wall carbon is received
After mitron sputtering sedimentation metal.
Specific implementation mode
Further illustrated the present invention below in conjunction with specific embodiments and the drawings, but embodiment the present invention is not done it is any
The restriction of form.Unless stated otherwise, the present invention uses reagent, method and apparatus is the art conventional reagent, methods
And equipment.
Unless stated otherwise, agents useful for same and material of the present invention are purchased in market.
Embodiment 1
The preparation process flow of multi-walled carbon nanotube@X combination electrodes is as shown in Figure 1 in the present embodiment.
Pass through Direct current plasma enhanced chemical vapour deposition(DC-PECVD)Method, grown on clean vitreous carbon
Vertical orderly array of multi-walled carbon nanotubes, i.e., " core " in nucleocapsid.The diameter control of multi-walled carbon nanotube 10 ~
In the range of 300nm, by control growth time, obtain length be 500nm multi-walled carbon nanotube, meanwhile, between pipe away from
From control in 50nm or more.
It selects active material X for copper, can directly use copper target, the composite carbon electrode prepared in previous step is placed in vertically
The position of copper target avoids that shadow effect occurs in sputtering process.Argon gas is passed through as protective gas, by controlling sputtering time
Length controls the thickness of coating metal layer, and sputtering terminates, and obtains multi-walled carbon nanotube@copper combination electrodes.
Embodiment 2
The preparation process flow of multi-walled carbon nanotube@X electrochemical applications platforms is as shown in Figure 1 in the present embodiment.
Pass through Direct current plasma enhanced chemical vapour deposition(DC-PECVD)Method, grown on clean vitreous carbon
Vertical orderly array of multi-walled carbon nanotubes, i.e., " core " in nucleocapsid.The diameter control of multi-walled carbon nanotube 10 ~
In the range of 300nm, by control growth time, the multi-walled carbon nanotube that length is 1 μm is obtained, meanwhile, the distance between pipe
Control is in 50nm or more.
It selects active material X for zinc oxide, can directly use zinc oxide target, by the composite carbon prepared in previous step electricity
Pole is placed in the position of vertical zinc oxide target, avoids that shadow effect occurs in sputtering process.Argon gas is passed through as protective gas, is passed through
The thickness of the length control coating zinc oxide film of sputtering time is controlled, sputtering terminates, and it is compound to obtain multi-walled carbon nanotube@zinc oxide
Electrode.
Embodiment 3
The preparation process flow of multi-walled carbon nanotube@X electrochemical applications platforms is as shown in Figure 1 in the present embodiment.
Pass through Direct current plasma enhanced chemical vapour deposition(DC-PECVD)Method, grown on clean vitreous carbon
Vertical orderly array of multi-walled carbon nanotubes, i.e., " core " in nucleocapsid.The diameter control of multi-walled carbon nanotube 10 ~
In the range of 300nm, by control growth time, obtain length be 200 nm multi-walled carbon nanotube, meanwhile, between pipe away from
From control in 50nm or more.
It selects active material X for nitrided iron, can use metallic iron target and nitrogen that mesh is obtained by the reaction at high temperature under high pressure
Mark product nitrided iron.The composite carbon electrode prepared in previous step is placed in the position of vertical iron target, avoids occurring in sputtering process
Shadow effect.It is passed through argon gas and nitrogen(A concentration of 35%), the thickness of the length control coating nitridation iron layer by controlling sputtering time
Degree, sputtering terminate, and obtain multi-walled carbon nanotube@nitrided iron combination electrodes.
Fig. 2 is to pass through Direct current plasma enhanced chemical vapour deposition(DC-PECVD)Method grown on vitreous carbon hang down
The growth course schematic diagram of straight orderly array of multi-walled carbon nanotubes.Using W metal as catalyst, glass carbon surface into
Row deposition obtains nano thin-film;The vitreous carbon for depositing Ni films is put into PECVD chamber, is passed through after protection gas in high temperature and pressure
Under the conditions of, the Ni films of liquid form particle on the surface of vitreous carbon, will provide growth for the carbon nanotube of vertical ordering growth
Site simultaneously limits its spacing and position;Carbon source C2H2 is passed through in cavity, opens glow discharge plasma under a certain pressure
Carbon nanotube starts to grow afterwards.The length of carbon nanotube is controlled over time.Closing plasma can stop immediately
Growth course.
Fig. 3 is that position activity substance X obtains multi wall carbon and receives in the array of multi-walled carbon nanotubes of vertical-growth on vitreous carbon
The process schematic of mitron@X electrochemical applications platforms.By magnetron sputtering method, what can directly be sputtered is made using argon gas
For protective gas;Cannot directly sputter, need it is obtained by the reaction, carrier gas be passed through in addition to the inactive gas the participations such as oxygen reaction
Gas, react to obtain target product X with sputtering particle.
Fig. 4 is the scanning electron microscope image of different samples:A) the multi-walled carbon nanotube grown on vitreous carbon;B)Multi wall
After carbon nanotube sputtering sedimentation metal.It can be seen that the diameter of every multi-walled carbon nanotube all slightly increases, while metal
Grain is coated uniformly in membranaceous in carbon nanotube and vitreous carbon.
Above-described specific implementation mode has carried out further the purpose of the present invention, technical solution and advantageous effect
It is described in detail, it should be understood that the foregoing is merely the specific implementation mode of the present invention, is not intended to limit the present invention
Protection domain, all within the spirits and principles of the present invention, any modification, equivalent substitution, improvement and etc. done should all include
Within protection scope of the present invention.
Claims (7)
1. a kind of multi-walled carbon nanotube@X combination electrodes, which is characterized in that the preparation of the multi-walled carbon nanotube@X combination electrodes
Method is as follows:
S1:By the method for Direct current plasma enhanced chemical vapour deposition, the orderly multi wall carbon of growth of vertical on vitreous carbon
Nano-tube array;
S2:Active material X is coated on array of multi-walled carbon nanotubes surface described in S1 by the method for magnetron sputtering;
Wherein, a diameter of 10~300nm of the multi-walled carbon nanotube, length are 100~5000nm, array of multi-walled carbon nanotubes
The distance between middle pipe is 50nm or more.
2. multi-walled carbon nanotube@X combination electrodes according to claim 1, which is characterized in that the multi-walled carbon nanotube it is straight
Diameter is 50~200nm, and length is 100~500nm, and the distance between array of multi-walled carbon nanotubes middle pipe is 50~200nm.
3. multi-walled carbon nanotube@X combination electrodes according to claim 1, which is characterized in that the active material X be alloy,
Metal, oxide, nitride and other substances with characteristic of semiconductor, electro-chemical activity.
4. multi-walled carbon nanotube@X combination electrodes according to claim 3, which is characterized in that the active material X is copper, oxygen
Change zinc or nitrided iron.
5. multi-walled carbon nanotube@X combination electrodes according to claim 1, which is characterized in that in S2, in the mistake of magnetron sputtering
Array of multi-walled carbon nanotubes is placed in perpendicular to the position of sputtering target by Cheng Zhong.
6. application of any multi-walled carbon nanotube@X combination electrodes of Claims 1 to 5 in electrochemical applications platform.
7. applying according to claim 6, which is characterized in that the multi-walled carbon nanotube@X combination electrodes are in electro-catalysis, electricity
Application in chemical analysis, ultracapacitor or battery.
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