CN108231921A - A kind of printing process of PERC cell back fields - Google Patents

A kind of printing process of PERC cell back fields Download PDF

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Publication number
CN108231921A
CN108231921A CN201711483066.0A CN201711483066A CN108231921A CN 108231921 A CN108231921 A CN 108231921A CN 201711483066 A CN201711483066 A CN 201711483066A CN 108231921 A CN108231921 A CN 108231921A
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CN
China
Prior art keywords
perc
width
radical
printing
batteries
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201711483066.0A
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Chinese (zh)
Inventor
王英超
徐卓
王红芳
李锋
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Yingli Energy China Co Ltd
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Yingli Energy China Co Ltd
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Priority to CN201711483066.0A priority Critical patent/CN108231921A/en
Publication of CN108231921A publication Critical patent/CN108231921A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H01L31/022441Electrode arrangements specially adapted for back-contact solar cells
    • H01L31/02245Electrode arrangements specially adapted for back-contact solar cells for metallisation wrap-through [MWT] type solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • H01L31/0682Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells back-junction, i.e. rearside emitter, solar cells, e.g. interdigitated base-emitter regions back-junction cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

The present invention relates to battery process technical fields, specifically disclose a kind of printing process of PERC cell back fields.The present invention prints Al-BSF, and the pattern of Al-BSF printing screen is using the method for silk-screen printing:The direction parallel with PERC battery slotted lines is defined as Y-direction, the direction vertical with PERC battery slotted lines is defined as X-direction, and the radical of Y-direction is consistent with the quantity that PERC batteries are slotted, and width is 24 times of PERC battery groove widths, X-direction radical is 100 150,30 80 microns of width.The present invention effectively reduces the usage amount of aluminium paste, monolithic aluminium paste dosage reduces by 60 80%, the purpose for reducing production cost is finally reached, suitable for the making of crystal silicon solar PERC batteries by changing back side aluminium paste printing screen pattern.

Description

A kind of printing process of PERC cell back fields
Technical field
The present invention relates to battery process technical field more particularly to a kind of printing processes of PERC cell back fields.
Background technology
AT&T Labs of the U.S. in 1954 prepares the monocrystaline silicon solar cell of first piece of transfer efficiency 6% in the world, By the continuous exploration of more than 60 years, solar cell power generation technology achieved huge progress, in solar cells crystal silicon How solar cell improves battery conversion efficiency, reduces single watt of cost, be the skill that we study always in occupation of the market mainstream Art subject.With being constantly thinned for crystal silicon battery thickness, the compound master for being increasingly becoming limitation battery conversion efficiency of cell backside Want factor.PERC batteries are a kind of new construction batteries in order to solve back side Complex Problem, which effectively improves crystal silicon The transfer efficiency of battery, so as to be applied in large-scale production.But the printing technology of existing Al-BSF can cause aluminium paste A large amount of wastes, are unfavorable for the cost reduction of PERC batteries and large-scale industrial production.
Invention content
For existing PERC batteries it is of high cost the problems such as, the present invention provides a kind of printing process of PERC cell back fields.
To achieve the above object of the invention, the embodiment of the present invention employs following technical solution:
A kind of printing process of PERC cell back fields prints Al-BSF, and the screen printing using the method for silk-screen printing The pattern of brush is:The direction parallel with PERC battery slotted lines is defined as Y-direction, and the direction vertical with PERC battery slotted lines is determined For justice for X-direction, the radical of Y-direction is consistent with the quantity that PERC batteries are slotted, and width is 2-4 times of PERC battery groove widths, X Direction radical be 100-150 roots, 30-80 microns of width.
Relative to the prior art, the printing process of PERC cell back fields provided by the invention, according to PERC battery structures spy The printing feature of property and existing Al-BSF, the only aluminium paste of slotted section is contacted with silicon and is played a role, and area of slotting only accounts for 5% or so of silicon area by changing back side aluminium paste printing screen pattern, effectively reduces the usage amount of aluminium paste, monolithic Aluminium paste dosage reduces 60-80%, the purpose for reducing production cost is finally reached, suitable for the system of crystal silicon solar PERC batteries Make.
Description of the drawings
It to describe the technical solutions in the embodiments of the present invention more clearly, below will be to needed in the embodiment Attached drawing is briefly described, it should be apparent that, the accompanying drawings in the following description is only some embodiments of the present invention, for ability For the those of ordinary skill of domain, without creative efforts, it can also be obtained according to these attached drawings other attached Figure.
Fig. 1 is the process flow chart of PERC batteries provided in an embodiment of the present invention;
Fig. 2 is local Al-BSF vertical view provided in an embodiment of the present invention;
Fig. 3 is existing PERC battery structures schematic diagram;
Fig. 4 is PERC battery structures schematic diagram provided in an embodiment of the present invention.
Specific embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, with reference to embodiments, to the present invention It is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, it is not used to Limit the present invention.
The embodiment of the present invention provides a kind of printing process of PERC cell back fields, using the method printing aluminium back of the body of silk-screen printing , and the pattern of the silk-screen printing is:The direction parallel with PERC battery slotted lines is defined as Y-direction, is opened with PERC batteries The vertical direction of the line of rabbet joint is defined as X-direction, and the radical of Y-direction is consistent with the quantity that PERC batteries are slotted, and width is PERC batteries 2-4 times of groove width, X-direction radical be 100-150 roots, 30-80 microns of width.
The manufacturing technology of patterns flow of the Al-BSF printing screen of the present invention is simple, technical conditions requirement is low, and does not influence The transfer efficiency of PERC batteries, the reduction of aluminium paste dosage are conducive to large-scale industrial production, reduce production cost.
Preferably, the PERC batteries are 6 cun of silicon chips.
Preferably, the pattern of the silk-screen printing is:The radical of Y-direction is consistent with the quantity that PERC batteries are slotted, width It is 2.6-4 times of PERC battery groove widths, X-direction radical is 100,30-50 microns of width.
Preferably, the pattern of the silk-screen printing is:The radical of Y-direction is consistent with the quantity that PERC batteries are slotted, width It is 2.6 times of PERC battery groove widths, X-direction radical is 100,30-50 microns of width.
Preferably, PERC batteries fluting radical is 150,45 microns of line width, and the pattern of the silk-screen printing is:Y-direction Radical be 150, width is 120 microns, X-direction radical be 100,50 microns of width.
Preferably, PERC cell back fields are prepared using full Al-BSF printing technology.
The PERC batteries Al-BSF is full Al-BSF printing technology, with common crystal silicon battery Al-BSF printing technology one It causes, does not change the manufacture craft of the PERC batteries of the present invention.
The technological process of PERC batteries includes crystal silicon chip making herbs into wool, non-flocking mirror polish, and making herbs into wool face phosphorus doping makes PN junction, wet Method etch cleaner, burnishing surface deposition of aluminium oxide, front and back make silicon nitride film, to burnishing surface silicon nitride slot, printing just, the back of the body Face electrode, sintering, test.Secondly printed back main gate line first is printed Al-BSF using Al-BSF printing screen, is finally printed Front electrode, drying sintering obtain PERC batteries.
The printing process of PERC cell back fields provided by the invention does not influence PERC battery conversion efficiencies, does not change making Technique by changing back side aluminium paste printing screen pattern, effectively reduces the usage amount of aluminium paste, monolithic aluminium paste dosage reduces 60-80% is finally reached the purpose for reducing production cost.
It is provided in an embodiment of the present invention in order to better illustrate, it is illustrated below by embodiment is further.
Embodiment 1
The present embodiment provides a kind of printing processes of PERC cell back fields, print Al-BSF using the method for silk-screen printing, The PERC batteries fluting radical of selection is 150, and 45 microns of line width, the direction parallel with PERC battery slotted lines is defined as Y side To the direction vertical with PERC battery slotted lines is defined as X-direction, and the pattern of Al-BSF printing screen (6 cun of silicon chips) is:Y side To radical be 150, width is 120 microns, X-direction radical be 100,50 microns of width.The present invention provides PERC batteries Al-BSF is full Al-BSF printing technology, consistent with common crystal silicon battery Al-BSF printing technology.PERC provided by the invention The process flow chart of battery is as shown in Figure 1.During printing, secondly printed back main gate line first is printed using Al-BSF printing screen Brush Al-BSF, finally prints front electrode, with reference to local Al-BSF vertical view, as shown in Fig. 2, drying sintering obtains PERC electricity Pond.
Existing PERC battery structures as shown in figure 3, the PERC battery structures that prepare of the present invention as shown in figure 4, the present invention not Change manufacture craft, PERC battery structures will not be changed.
PERC batteries prepared by embodiment 1 are compared with conventional batteries and routine PERC batteries, as a result such as 1 institute of table Show.
Table 1
As can be seen from Table 1, the printing process of ERC cell back fields provided in an embodiment of the present invention, does not influence PERC batteries Transfer efficiency does not change manufacture craft, by changing back side aluminium paste printing screen pattern, effectively reduces the usage amount of aluminium paste Monolithic aluminium paste dosage reduces 60-80%.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention Any modification, equivalent replacement or improvement made within refreshing and principle etc., should all be included in the protection scope of the present invention.

Claims (6)

1. a kind of printing process of PERC cell back fields, it is characterised in that:Al-BSF, and institute are printed using the method for silk-screen printing The pattern for stating silk-screen printing is:The direction parallel with PERC battery slotted lines is defined as Y-direction, vertical with PERC battery slotted lines Direction be defined as X-direction, the radical of Y-direction is consistent with the quantity that PERC batteries are slotted, and width is PERC battery groove widths 2-4 times, X-direction radical be 100-150 roots, 30-80 microns of width.
2. the printing process of PERC cell back fields as described in claim 1, it is characterised in that:The PERC batteries are 6 cun of silicon Piece.
3. such as the printing process of claim 1-2 any one of them PERC cell back fields, it is characterised in that:The silk-screen printing Pattern be:The radical of Y-direction is consistent with the quantity that PERC batteries are slotted, and width is 2.6-4 times of PERC battery groove widths, X-direction radical is 100,30-50 microns of width.
4. the printing process of PERC cell back fields as claimed in claim 3, it is characterised in that:The pattern of the silk-screen printing For:The radical of Y-direction is consistent with the quantity that PERC batteries are slotted, and width is 2.6 times of PERC battery groove widths, X-direction root Number is 100,30-50 microns of width.
5. such as the printing process of claim 1-2 any one of them PERC cell back fields, it is characterised in that:PERC batteries are slotted Radical is 150,45 microns of line width, and the pattern of the silk-screen printing is:The radical of Y-direction is 150, and width is 120 microns, X-direction radical is 100,50 microns of width.
6. the printing process of PERC cell back fields as described in claim 1, it is characterised in that:Using full Al-BSF printing technology Prepare PERC cell back fields.
CN201711483066.0A 2017-12-29 2017-12-29 A kind of printing process of PERC cell back fields Pending CN108231921A (en)

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Application Number Priority Date Filing Date Title
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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102593204A (en) * 2011-01-10 2012-07-18 Lg电子株式会社 Solar cell and method for manufacturing the same
CN202633327U (en) * 2012-07-05 2012-12-26 宁波尤利卡太阳能科技发展有限公司 Facade grid line electrode of crystalline silicon solar cell
CN203277400U (en) * 2013-05-21 2013-11-06 江苏爱多光伏科技有限公司 Solar cell back field with reticular structure
CN103489934A (en) * 2013-09-25 2014-01-01 晶澳(扬州)太阳能科技有限公司 Local aluminum back surface field solar battery with two diaphanous faces and preparation method thereof
CN203491270U (en) * 2013-08-31 2014-03-19 山东力诺太阳能电力股份有限公司 Back electrode structure of crystalline silicon solar cell
CN106449877A (en) * 2016-10-17 2017-02-22 浙江晶科能源有限公司 PERC preparation method
CN106876495A (en) * 2017-03-03 2017-06-20 浙江爱旭太阳能科技有限公司 A kind of p-type PERC double-sided solar batteries and preparation method thereof

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102593204A (en) * 2011-01-10 2012-07-18 Lg电子株式会社 Solar cell and method for manufacturing the same
CN202633327U (en) * 2012-07-05 2012-12-26 宁波尤利卡太阳能科技发展有限公司 Facade grid line electrode of crystalline silicon solar cell
CN203277400U (en) * 2013-05-21 2013-11-06 江苏爱多光伏科技有限公司 Solar cell back field with reticular structure
CN203491270U (en) * 2013-08-31 2014-03-19 山东力诺太阳能电力股份有限公司 Back electrode structure of crystalline silicon solar cell
CN103489934A (en) * 2013-09-25 2014-01-01 晶澳(扬州)太阳能科技有限公司 Local aluminum back surface field solar battery with two diaphanous faces and preparation method thereof
CN106449877A (en) * 2016-10-17 2017-02-22 浙江晶科能源有限公司 PERC preparation method
CN106876495A (en) * 2017-03-03 2017-06-20 浙江爱旭太阳能科技有限公司 A kind of p-type PERC double-sided solar batteries and preparation method thereof

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Application publication date: 20180629

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