CN108118296A - A kind of coldplate - Google Patents

A kind of coldplate Download PDF

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Publication number
CN108118296A
CN108118296A CN201711297818.4A CN201711297818A CN108118296A CN 108118296 A CN108118296 A CN 108118296A CN 201711297818 A CN201711297818 A CN 201711297818A CN 108118296 A CN108118296 A CN 108118296A
Authority
CN
China
Prior art keywords
coldplate
water channel
bottom plate
cyclic water
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201711297818.4A
Other languages
Chinese (zh)
Inventor
邓曾红
管长乐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zishi Energy Co ltd
Original Assignee
Beijing Chong Yu Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Chong Yu Technology Co Ltd filed Critical Beijing Chong Yu Technology Co Ltd
Priority to CN201711297818.4A priority Critical patent/CN108118296A/en
Publication of CN108118296A publication Critical patent/CN108118296A/en
Priority to PCT/CN2018/092236 priority patent/WO2019109626A1/en
Priority to JP2018152954A priority patent/JP2019104984A/en
Priority to KR1020180095583A priority patent/KR20190068407A/en
Priority to US15/998,844 priority patent/US20190178582A1/en
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D9/00—Heat-exchange apparatus having stationary plate-like or laminated conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall
    • F28D9/0081—Heat-exchange apparatus having stationary plate-like or laminated conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall the conduits for one heat-exchange medium being formed by a single plate-like element ; the conduits for one heat-exchange medium being integrated in one single plate-like element
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C23C16/463—Cooling of the substrate
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D1/00—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators
    • F28D1/02—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid
    • F28D1/04—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with tubular conduits
    • F28D1/047—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with tubular conduits the conduits being bent, e.g. in a serpentine or zig-zag
    • F28D1/0472—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with tubular conduits the conduits being bent, e.g. in a serpentine or zig-zag the conduits being helically or spirally coiled
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F27/00—Control arrangements or safety devices specially adapted for heat-exchange or heat-transfer apparatus
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F3/00—Plate-like or laminated elements; Assemblies of plate-like or laminated elements
    • F28F3/12—Elements constructed in the shape of a hollow panel, e.g. with channels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D1/00—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators
    • F28D1/02—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid
    • F28D1/03—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with plate-like or laminated conduits
    • F28D1/0366—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with plate-like or laminated conduits the conduits being formed by spaced plates with inserted elements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D21/00—Heat-exchange apparatus not covered by any of the groups F28D1/00 - F28D20/00
    • F28D2021/0019—Other heat exchangers for particular applications; Heat exchange systems not otherwise provided for
    • F28D2021/0077—Other heat exchangers for particular applications; Heat exchange systems not otherwise provided for for tempering, e.g. with cooling or heating circuits for temperature control of elements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F2210/00—Heat exchange conduits
    • F28F2210/10—Particular layout, e.g. for uniform temperature distribution
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

Abstract

The present invention relates to the cooling device technical fields of field of vacuum coating, disclose a kind of coldplate, including coldplate body, are provided with cyclic water channel in the coldplate body, and the cyclic water channel is into the parallel water channel of, backwater channel.Coldplate provided by the invention, into the parallel cyclic water channel of, backwater channel, improves the heat exchange efficiency of coldplate by being set in coldplate body, solves the problems, such as the whole coldplate non-uniform temperature caused by water inlet, backwater temperature difference.

Description

A kind of coldplate
Technical field
Cooling device technical field more particularly to a kind of coldplate the present invention relates to field of vacuum coating.
Background technology
The coldplate of vacuum coating is typically mounted at filming equipment process chamber and slice side, can be cold by repeats itself But liquid persistently takes away heat, so as to accelerate the cooling velocity of substrate, effectively reduces own temperature during substrate exposure air, shortens Equipment integrated artistic beat.
The plate structure of cooling of existing field of vacuum coating processes single loop water channel, water using slab medium-length hole brill mostly Manage the structure of direct bending and molding.This slab depth drill processing channel structure is limited by processing technology, be mostly one into, one go out Single loop water channel, cooling efficiency is low, and influent side and the return water side temperature difference are big, and it is whole to have seriously affected equipment for whole plate poor temperature uniformity The technique beat of body；And the calandria structure of water pipe bending and molding because between each pipeline gap it is more, large area use when mostly by water Pipe is fixed on tablet, and the thermal conduction effect between pipe and tablet is poor, maintenance and cleaning heavy workload.
The content of the invention
(1) technical problems to be solved
The present invention provides a kind of cold water plate, to solve the technical issues of temperature of coldplate itself is uneven.
(2) technical solution
In order to solve the above technical problem, the present invention provides a kind of coldplates, including coldplate body, the coldplate It is provided with cyclic water channel in body, the cyclic water channel is into the parallel water channel of, backwater channel.
Further, the coldplate body is divided into multiple branches of integral structure, is correspondingly arranged in each branch A set of independent cyclic water channel.
Further, each branch of the coldplate body is the groove of adjacent branch's share common sidewalls, often A cyclic water channel is arranged in the corresponding groove.
Further, the cyclic water channel is included in the water parallel into, return water formed at the quarter of milling in the groove surfaces Slot and/or, the water pipe parallel into, return water.
Further, be additionally provided with bottom plate on the coldplate body, the coldplate body using its two center lines as Baseline is divided into 4 rectangular recess, and the bottom plate being tightly connected with the groove is inlaid on each groove.
Further, stagger on the coldplate cyclic water channel position on be provided with multiple boss, the bottom plate The upper correspondence boss is provided with accommodating hole, and the boss is arranged in the accommodating hole and is connected with the bottom plate.
Further, gas-distributing pipe is provided on the bottom plate, the position for the cyclic water channel that staggers on the coldplate body Put and be additionally provided with perforative stomata, be provided on the bottom plate with the corresponding venthole of the stomata, set on the gas-distributing pipe It is equipped with the fumarole connected with the stomata, venthole.
Further, a gas-distributing pipe is set respectively on the diagonal of each bottom plate, on each gas-distributing pipe It is correspondingly arranged on air inlet pipe.
Further, main air inlet pipe and multiple gas-distributing pipes, the gas-distributing pipe and institute there are one being set on the bottom plate State main air inlet pipe connection.
Further, the cyclic water channel is provided with strip projected parts along the direction of motion of current.
Further, the thermocouple of detection coldplate temperature uniformity and/or controllable is provided on the coldplate body The water circulating pump of flow.
(3) advantageous effect
The above-mentioned technical proposal of the present invention has the following advantages that：Coldplate provided by the invention passes through in coldplate body It sets into the parallel cyclic water channel of, backwater channel, solves the whole coldplate non-uniform temperature caused by water inlet, backwater temperature difference The problem of.
Except it is described above present invention solves the technical problem that, form technical solution technical characteristic and have this Outside advantage caused by the technical characteristic of a little technical solutions, what other technical characteristics of the invention and these technical characteristics were brought Advantage will be further illustrated with reference to attached drawing.
Description of the drawings
Fig. 1 is the assembling schematic diagram of coldplate of the embodiment of the present invention；
Fig. 2 is the floor map of coldplate of the embodiment of the present invention；
Fig. 3 is the A-A sectional views of Fig. 2；
Fig. 4 is the B portions enlarged drawing of Fig. 3；
Fig. 5 is the C portions enlarged drawing of Fig. 3；
Fig. 6 is the D portions enlarged drawing of Fig. 3.
In figure：1：Coldplate body, 11：Boss, 12：Stomata；2：Bottom plate, 21：First bottom plate, 22：Second bottom plate, 23： 3rd bottom plate, 24：4th bottom plate；25：The welding position of bottom plate and coldplate body；3：Cyclic water channel, 31：Pectinate texture；4： Water inlet pipe；5：Return pipe；6：Water pipe head；7：Ferrule fitting, 8：Gas-distributing pipe, 81：The welding position of gas-distributing pipe and bottom plate, 82： Fumarole；9：Air inlet pipe, 91：The welding point of air inlet pipe and gas-distributing pipe, 92：VCR male contacts, 93：VCR sun nuts.
Specific embodiment
To make the purpose, technical scheme and advantage of the embodiment of the present invention clearer, below in conjunction with the embodiment of the present invention In attached drawing, the technical solution in the embodiment of the present invention is clearly and completely described, it is clear that described embodiment is The part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, ordinary skill people Member's all other embodiments obtained on the premise of creative work is not made, belong to the scope of protection of the invention.
In the description of the present invention, it is necessary to illustrate, unless otherwise clearly defined and limited, term " installation ", " phase Even ", " connection " should be interpreted broadly, for example, it may be being fixedly connected or being detachably connected or be integrally connected；It can To be mechanical connection or be electrically connected；It can be directly connected, can also be indirectly connected by intermediary, Ke Yishi Connection inside two elements.For the ordinary skill in the art, with concrete condition above-mentioned term can be understood at this Concrete meaning in invention.
In addition, in the description of the present invention, unless otherwise indicated, " multiple ", " more ", " multigroup " be meant that two or Two or more, " several ", " several ", " several groups " are meant that one or more.
As shown in Figure 1, coldplate provided in an embodiment of the present invention, including coldplate body 1, in the coldplate body 1 It is provided with the cyclic water channel 3, the cyclic water channel 3 is intake tunnel and the parallel water channel of backwater channel.
It is meant that it should be noted that intake tunnel and backwater channel are parallel：Intake tunnel and water outlet water channel shape It is same or similar and be disposed adjacent, while the water inlet of intake tunnel and the water outlet of exhalant canal are in the same end, the water inlet The water outlet of passage is connected with the water inlet of exhalant canal or head end of the end of intake tunnel directly with exhalant canal is integrated Structure.
For example, cyclic water channel can be S types, at this point, intake tunnel and backwater channel are identical S types, two S type passages The same end is respectively inlet and outlet, and the opposite other end is interconnected integral structure.It is equivalent to a pipe Road completes two S types, two mouth is respectively inlet and outlet.
Naturally, the shape of cyclic water channel is not limited to above-mentioned S types or other shapes such as Z-type, snakelike.
It it is understood that is set in coldplate body 1 into the parallel cyclic water channel 3 of, backwater channel, on the one hand, follow Ring water channel 3 increases the heat exchange area of coldplate and the liquid in cyclic water channel 3, so as to improve the heat exchange efficiency of coldplate； On the other hand, using into the parallel cyclic water channel 3 of, backwater channel, solves the whole coldplate caused by water inlet, backwater temperature difference The problem of non-uniform temperature.
Preferably, the cyclic water channel of the embodiment of the present invention is rectangular-ambulatory-plane.It is described as the first specific embodiment of the present invention Cyclic water channel 3 is to be set directly to form at milling quarter on the bottom surface of coldplate body 1, while is welded on the bottom surface of coldplate body It is the bottom plate with the circulating water chennel on 1 bottom surface of coldplate body to connect bottom plate and seal the cyclic water channel namely cyclic water channel 3 And it is formed.
As the second specific embodiment of the present invention, the cyclic water channel 3 includes water pipe, and is provided in the coldplate On the bottom surface of body 1.It should be noted that the cyclic water channel of water pipe form can be set directly at the first specific embodiment In groove, it can also be fixed using other forms.
As the 3rd specific embodiment of the present invention, the cyclic water channel 3 can be the first specific embodiment and the second tool Both body embodiments be used in combination form, also can, cyclic water channel can with one section be milling quarter form groove, one section be with The form of the water pipe of groove connection.
The 4th specific embodiment of the present invention is specific real in the first specific embodiment, the second specific embodiment or the 3rd It applies and adds stomata on the basis of example.Specifically, it is that stagger on the coldplate body position of cyclic water channel sets multiple perforations Stomata.It is understood that the stomata arranged on coldplate body, can blow while logical coolant from bottom to top Gas effectively takes away heat, enhances the heat-exchange capacity between coldplate and substrate.
Wherein, the gaseous input devices of stomata can be the gas-distributing pipe set in the lower section of coldplate body, on gas-distributing pipe Fumarole is provided with to connect with stomata.Certainly, the gaseous input devices of stomata can also be other components, for example, with vent board Deng.
The 5th specific embodiment of the present invention, the coldplate body 1 divide multiple branches for integral structure, each branch On be correspondingly arranged a set of independent cyclic water channel 3.It should be noted that specific set of the cyclic water channel of the present embodiment can adopt With any form of the first specific embodiment, the second specific embodiment or the 3rd specific embodiment, while can also set The stomata scheme of 4th specific embodiment.
It is to be appreciated that multiple branches can shorten the time of heat exchange of the circulating liquid in coldplate body 1, so as to The circulating liquid of each several part can be maintained with coldplate there are larger temperature difference, so as to improve heat exchange efficiency；It is and corresponding The sphere of circulation of every set cyclic water channel is shortened, further improves the uniformity of cooling plate temperature.
It is divided into below by coldplate body exemplified by 4 parts cool down respectively and coldplate of the present invention is specifically described.
As shown in Figure 1, the bottom of the coldplate body of the present embodiment coldplate is using its two center lines as baseline point For the groove of 4 deciles, adjacent grooves share common sidewalls, the groove is rectangular.4 cyclic water channels 3 are correspondingly arranged respectively In four grooves, bottom plate 2 has been embedded on each groove, has described for convenience, is respectively defined as the first bottom plate 21, the second bottom Plate 22, the 3rd bottom plate 23, the 4th bottom plate 24, the first bottom plate 21, the second bottom plate 22, the 3rd bottom plate 23, the 4th bottom plate 24 respectively with Its corresponding groove full weld shaping.In Fig. 2, what label 25 represented is the welding position of bottom plate and coldplate body.
Bottom plate 2,1 respective slot of coldplate body diagonal on, the position for the recirculated water 3 that staggers is provided with multiple run through The stomata 12 of coldplate body 1, bottom plate 2 also offer venthole (not shown) on corresponding position, divide described in four The diagonal (namely with bottom plate 2 along 45 ° of directions) that tracheae 8 corresponds to each groove respectively is welded on the outer surface of each bottom plate 2, And stomata 12 is corresponded on every gas-distributing pipe 8 and is provided with the fumarole 82 connected with stomata 12 and venthole, give tool in Fig. 6 The stomata 12 of body and the schematic diagram of fumarole 82.In Fig. 2, what label 81 represented is the welding position of gas-distributing pipe and bottom plate.It can be with Understand, set using diagonal, maximum jet scope can be formed, and be positioned at the center of bottom plate 2, be conducive to from gas The uniformity of the gas of 12 the inside of hole out；The structure welded on a base plate 2 using gas-distributing pipe 8 simultaneously can realize fumarole into The sealing of gas side.
Meanwhile as shown in the figures 1 and 2, every gas-distributing pipe 8 is connected to air inlet pipe 9, and every air inlet pipe 9 extends to cooling The centre position of plate entirety is welded with 8 side of gas-distributing pipe, realizes the hermetic seal between air inlet pipe and gas-distributing pipe.Label 91 in Fig. 2 What is represented is air inlet pipe and the welding point of gas-distributing pipe.The other end of air inlet pipe is welded with connector, which is preferably VCR male contacts 92, thereon equipped with VCR sun nut 93.
It is appreciated that air inlet pipe 9 extends to the centre position of coldplate body, the length increase of such air inlet pipe, from And there is certain flexibility during the connection of the vacuum chamber intake of air inlet pipe and gas；That is, the length increase of air inlet pipe, so exists When it is docked with vacuum chamber intake, though the position of vacuum chamber intake slightly deviation when, will not be to the air inlet of hard Pipe causes to damage.
Wherein, as shown in Figure 2 (only being shown in the groove in the lower right corner), the cyclic water channel 3 is described recessed Milling is carved on rooved face.It should be noted that Fig. 2 lower right corner is to show the structure of cyclic water channel, so eliminating bottom The structure of plate.
It is understood that the cyclic water channel 3 formed at milling quarter can be curved to avoid using water pipe be susceptible to when disk is set Lose bad situation.
In order to enhance the fixation of bottom plate 2 and coldplate body 1, as shown in figure 4, it is described to stagger on the coldplate body 1 Multiple boss 11 are reserved on the position of cyclic water channel 3, the boss 11 is corresponded on the bottom plate and is provided with accommodating hole, it is described convex Platform 11 is arranged in the accommodating hole and is welded to connect with the bottom plate, and the mode of its welding is specifically shown in Fig. 4.It can manage Solution, the auxiliary weld for cooperatively forming bottom plate 2 of boss 11 and accommodating hole increase the welding point in 2 big face of bottom plate, improve The rigidity in 2 big face of bottom plate.
Preferably, as shown in figure 5, the bottom surface of the cross section of the cyclic water channel 3 is pectinate texture 31, pectinate texture 31 is In cyclic water channel 3 and the more strip projected parts along the setting of the liquid communication direction of cyclic water channel 3.It is understood that pectination knot Structure 31 can be effectively increased the heat transfer area of liquid and coldplate body 1 in water flow process, improve heat exchanger effectiveness.
The specific process of coldplate of the embodiment of the present invention is given below.
1st, coldplate is processed：
A, four pieces of grooves (bottom plate inlays welding position) are processed in coldplate bottom, are reserved in the position for the water channel that staggers more A boss (the auxiliary weld with bottom plate increases the welding point in the big face of bottom plate, improves the big face rigidity of bottom plate).
B, cyclic water channel (as shown in Figure 2) is milled out respectively on four pieces of groove surfaces, wherein, each cyclic water channel is double Channel parallel circuit, inlet channel and return water road are parallel, are so conducive to the high temperature (40-60 DEG C) of return water and the low temperature (16- of water inlet 20 DEG C) between heat exchange, reduce the influence to entire big plate thermal uniformity；It is processed into " pectinate texture " (such as in the section of water channel Shown in Fig. 5), the heat transfer area being effectively increased in water flow process improves heat exchanger effectiveness；Four are independently followed bad water channel, are added In the coldplate unit interval by water flow, the cooling efficiency of coldplate can be effectively improved.
C, the position that watercourse port is corresponded in coldplate two sides is processed into, backwater hole, corresponding water pipe head (7) welding position It puts；
D, as shown in Figure 2：Fumarole is uniformly beaten along 45 degree of angular direction, jet can be effectively improved between coldplate and substrate Heat exchanger effectiveness；
2nd, the first bottom plate, the second bottom plate, the 3rd bottom plate, the 4th bottom plate are mounted in corresponding four grooves of coldplate, Full weld is integral, notices that postwelding is hunted leak, ensures sealing, realizes the sealing of cyclic water channel inside coldplate；
3rd, the gas outlet of 4 air inlet pipe is welded respectively with corresponding gas-distributing pipe, by the air inlet of 4 air inlet pipe point It Han Jie not upper VCR male contacts；
4th, by the gas-distributing pipe being welded into one with air inlet pipe each with the first bottom plate, the second bottom plate, the 3rd bottom plate, the 4th bottom plate Full weld realizes the perforation between each puff prot on main air inlet and coldplate, forms jet pipe passage；
5th, the pipe fitting 6 and ferrule fitting 7 of 5 take over of water inlet pipe 4 and return pipe of each subregion are welded.
Multiple parallel circuits of coldplate of the embodiment of the present invention are processed respectively in coldplate bottom part body point multiple regions Bottom plate sealing water channel is welded from independent cyclic water channel and passing through.The each water channel of coldplate of the embodiment of the present invention into, return water road Parallel, the whole plate temperature uniformity caused by water inlet, backwater temperature difference is improved, water channel section uses pectinate texture, adds water Heat transfer area improves heat transfer efficiency；The respective independent water cycle of multiple regions, in a disguised form increases whole plate totality water flowing flow, Enhance the heat-exchange capacity of coldplate, improve the cooling velocity to substrate.Meanwhile stomata is arranged on coldplate, lead to coolant It blows simultaneously from bottom to top, effectively takes away heat, enhance the heat-exchange capacity between coldplate and substrate.
The present embodiment coldplate simultaneously, can increase thermocouple temperature measurement on the cooling plate, uniform so as to detect coldplate Property；Can also supply water in coldplate periphery increases flow-controllable water circulating pump, in addition the thermocouple installed on coldplate, so as to real The temperature automatically controlled function of existing cold plate surface cooling temperature.Meanwhile using in groove set water pipe formed water inlet, return water it is parallel Mode no longer using bottom plate sealing form and the present invention a feasible scheme.
In the above-mentioned embodiment illustrated, intake method is not limited to provided in embodiment four gas-distributing pipes and connects respectively Connect an air inlet pipe or four gas-distributing pipes be connected in same root main air inlet pipe and realize air inlet, that is, a master into Tracheae is connected with multiple gas-distributing pipes.Meanwhile the setting of gas-distributing pipe is also not necessarily limited to the above-mentioned form set on the diagonal provided, It may also be, and directly arrange a main air inlet pipe for being located at center, and more gas-distributing pipes are connected to main tracheae from different position The form of both sides, for example, stomata is arranged in the position for the cyclic water channel that staggers in substantially " king " font, correspondingly, more gas-distributing pipes The both sides for being connected to main air inlet pipe also form substantially " king " font.
In conclusion coldplate of the embodiment of the present invention enhances cooling effect, improve coldplate and the cooling of substrate is imitated Rate reduces influence of the cooling time to equipment integrated artistic beat；And the temperature uniformity of the present embodiment coldplate entirety compared with It is good；And the integral structure of welding is employed, convenient for later maintenance.
Finally it should be noted that：The above embodiments are merely illustrative of the technical solutions of the present invention, rather than its limitations；Although The present invention is described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that：It still may be used To modify to the technical solution recorded in foregoing embodiments or carry out equivalent substitution to which part technical characteristic； And these modification or replace, do not make appropriate technical solution essence depart from various embodiments of the present invention technical solution spirit and Scope.

Claims (11)

1. a kind of coldplate, it is characterised in that：Including coldplate body, cyclic water channel is provided in the coldplate body, institute It is into the parallel water channel of, backwater channel to state cyclic water channel.
2. coldplate according to claim 1, it is characterised in that：The coldplate body is divided into multiple points of integral structure Portion is each correspondingly arranged a set of independent cyclic water channel in the branch.
3. coldplate according to claim 2, it is characterised in that：Each branch of the coldplate body is adjacent The groove of branch's share common sidewalls, each cyclic water channel are arranged in the corresponding groove.
4. coldplate according to claim 3, it is characterised in that：The cyclic water channel is included in the groove surfaces The sink parallel into, return water that milling quarter forms and/or, the water pipe parallel into, return water.
5. coldplate according to claim 4, it is characterised in that：Bottom plate is additionally provided on the coldplate body, it is described Coldplate body is divided into 4 rectangular recess using its two center lines as baseline, is inlaid with and the groove on each groove The bottom plate of sealed connection.
6. coldplate according to claim 5, it is characterised in that：Stagger on the coldplate position of the cyclic water channel On be provided with multiple boss, the boss is corresponded on the bottom plate and is provided with accommodating hole, the boss is arranged on the accommodating hole It is interior and be connected with the bottom plate.
7. coldplate according to claim 6, it is characterised in that：Gas-distributing pipe, the coldplate are provided on the bottom plate Stagger on body the cyclic water channel position on be additionally provided with perforative stomata, be provided on the bottom plate opposite with the stomata The venthole answered is provided with the fumarole connected with the stomata, venthole on the gas-distributing pipe.
8. coldplate according to claim 7, it is characterised in that：One institute is set respectively on the diagonal of each bottom plate Gas-distributing pipe is stated, air inlet pipe is correspondingly arranged on each gas-distributing pipe.
9. coldplate according to claim 8, it is characterised in that：Set that there are one main air inlet pipes and multiple on the bottom plate The gas-distributing pipe, the gas-distributing pipe are connected with the main air inlet pipe.
10. according to claim 1-9 any one of them coldplates, it is characterised in that：Movement of the cyclic water channel along current Direction is provided with strip projected parts.
11. coldplate according to claim 1, it is characterised in that：Detection coldplate is provided on the coldplate body The thermocouple of temperature uniformity and/or the water circulating pump of flow-controllable.
CN201711297818.4A 2017-12-08 2017-12-08 A kind of coldplate Pending CN108118296A (en)

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CN201711297818.4A CN108118296A (en) 2017-12-08 2017-12-08 A kind of coldplate
PCT/CN2018/092236 WO2019109626A1 (en) 2017-12-08 2018-06-21 Cooling plate
JP2018152954A JP2019104984A (en) 2017-12-08 2018-08-15 Cooling plate
KR1020180095583A KR20190068407A (en) 2017-12-08 2018-08-16 Cooling plate
US15/998,844 US20190178582A1 (en) 2017-12-08 2018-08-17 Cooling plate

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