CN108034913A - 柔性oled封装用金属掩膜版的绝缘处理方法 - Google Patents
柔性oled封装用金属掩膜版的绝缘处理方法 Download PDFInfo
- Publication number
- CN108034913A CN108034913A CN201711330542.5A CN201711330542A CN108034913A CN 108034913 A CN108034913 A CN 108034913A CN 201711330542 A CN201711330542 A CN 201711330542A CN 108034913 A CN108034913 A CN 108034913A
- Authority
- CN
- China
- Prior art keywords
- metal mask
- mask version
- version
- alumina layer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 151
- 239000002184 metal Substances 0.000 title claims abstract description 151
- 238000000034 method Methods 0.000 title claims abstract description 36
- 238000005538 encapsulation Methods 0.000 title claims abstract description 31
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 48
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 48
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 41
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 16
- 238000004140 cleaning Methods 0.000 claims description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 12
- 239000004411 aluminium Substances 0.000 claims description 12
- 238000003475 lamination Methods 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 10
- 238000001704 evaporation Methods 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 230000003647 oxidation Effects 0.000 claims description 8
- 238000007254 oxidation reaction Methods 0.000 claims description 8
- 238000007738 vacuum evaporation Methods 0.000 claims description 8
- 238000007654 immersion Methods 0.000 claims description 7
- 229910052786 argon Inorganic materials 0.000 claims description 6
- 230000002378 acidificating effect Effects 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 4
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 claims description 3
- 239000010405 anode material Substances 0.000 claims description 3
- 238000007743 anodising Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 3
- 238000010849 ion bombardment Methods 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 239000010408 film Substances 0.000 description 33
- 239000000243 solution Substances 0.000 description 13
- 238000005516 engineering process Methods 0.000 description 10
- 239000007769 metal material Substances 0.000 description 7
- 238000009413 insulation Methods 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- -1 alkali metal salt Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 159000000013 aluminium salts Chemical class 0.000 description 1
- 229910000329 aluminium sulfate Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000003502 gasoline Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000012785 packaging film Substances 0.000 description 1
- 229920006280 packaging film Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229960002415 trichloroethylene Drugs 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
- C23C2/12—Aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711330542.5A CN108034913B (zh) | 2017-12-13 | 2017-12-13 | 柔性oled封装用金属掩膜版的绝缘处理方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711330542.5A CN108034913B (zh) | 2017-12-13 | 2017-12-13 | 柔性oled封装用金属掩膜版的绝缘处理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108034913A true CN108034913A (zh) | 2018-05-15 |
CN108034913B CN108034913B (zh) | 2020-04-14 |
Family
ID=62102690
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711330542.5A Active CN108034913B (zh) | 2017-12-13 | 2017-12-13 | 柔性oled封装用金属掩膜版的绝缘处理方法 |
Country Status (1)
Country | Link |
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CN (1) | CN108034913B (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110863175A (zh) * | 2019-12-04 | 2020-03-06 | 深圳市腾深显示技术有限公司 | 金属掩膜板的表面处理方法 |
CN111041422A (zh) * | 2018-10-11 | 2020-04-21 | 深圳拓扑精膜科技有限公司 | 全面积均匀多孔氧化铝薄膜的制备方法、装置及其产品 |
CN111705287A (zh) * | 2020-07-10 | 2020-09-25 | 武汉大学 | 一种电气绝缘设备金属表面处理防止c4f7n腐蚀的方法 |
CN111763898A (zh) * | 2020-06-01 | 2020-10-13 | 武汉大学 | 一种电气绝缘设备金属表面处理防止c5f10o气体腐蚀的方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3961962A (en) * | 1973-11-29 | 1976-06-08 | Fuji Photo Film Co., Ltd. | Photomask material and method for producing same |
CN104183683A (zh) * | 2013-05-24 | 2014-12-03 | 上海航天测控通信研究所 | 一种基于铝基复合材料基板的多芯片led封装方法 |
CN105449126A (zh) * | 2015-12-22 | 2016-03-30 | 上海天马有机发光显示技术有限公司 | 一种蒸镀掩模板及其制作方法 |
CN106920898A (zh) * | 2015-12-28 | 2017-07-04 | 昆山国显光电有限公司 | 掩模板及其制造方法、oled器件蒸镀方法 |
CN107385390A (zh) * | 2016-04-22 | 2017-11-24 | 普因特工程有限公司 | 掩模和掩模组件 |
-
2017
- 2017-12-13 CN CN201711330542.5A patent/CN108034913B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3961962A (en) * | 1973-11-29 | 1976-06-08 | Fuji Photo Film Co., Ltd. | Photomask material and method for producing same |
CN104183683A (zh) * | 2013-05-24 | 2014-12-03 | 上海航天测控通信研究所 | 一种基于铝基复合材料基板的多芯片led封装方法 |
CN105449126A (zh) * | 2015-12-22 | 2016-03-30 | 上海天马有机发光显示技术有限公司 | 一种蒸镀掩模板及其制作方法 |
CN106920898A (zh) * | 2015-12-28 | 2017-07-04 | 昆山国显光电有限公司 | 掩模板及其制造方法、oled器件蒸镀方法 |
CN107385390A (zh) * | 2016-04-22 | 2017-11-24 | 普因特工程有限公司 | 掩模和掩模组件 |
Non-Patent Citations (1)
Title |
---|
郑志军等: "《机械制造工程训练教程》", 31 July 2015, 华南理工大学出版社 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111041422A (zh) * | 2018-10-11 | 2020-04-21 | 深圳拓扑精膜科技有限公司 | 全面积均匀多孔氧化铝薄膜的制备方法、装置及其产品 |
CN110863175A (zh) * | 2019-12-04 | 2020-03-06 | 深圳市腾深显示技术有限公司 | 金属掩膜板的表面处理方法 |
CN111763898A (zh) * | 2020-06-01 | 2020-10-13 | 武汉大学 | 一种电气绝缘设备金属表面处理防止c5f10o气体腐蚀的方法 |
CN111763898B (zh) * | 2020-06-01 | 2021-10-01 | 武汉大学 | 一种电气绝缘设备金属表面处理防止c5f10o气体腐蚀的方法 |
CN111705287A (zh) * | 2020-07-10 | 2020-09-25 | 武汉大学 | 一种电气绝缘设备金属表面处理防止c4f7n腐蚀的方法 |
CN111705287B (zh) * | 2020-07-10 | 2021-07-30 | 武汉大学 | 一种电气绝缘设备金属表面处理防止c4f7n腐蚀的方法 |
Also Published As
Publication number | Publication date |
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CN108034913B (zh) | 2020-04-14 |
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Effective date of registration: 20181226 Address after: 518000 Shahu Community, Biling Street, Pingshan District, Shenzhen City, Guangdong Province, No. 2-10 South Jinlong Avenue, 1 Building, 3 Floors, 2 Buildings, 2 Floors Applicant after: Shenzhen Junyi Technology Co., Ltd. Address before: 518000 Shenzhen, Guangdong, Pingshan New District, Jinlong Road, Ma Luan Chuang 1 Building 3 and 2 2 buildings. Applicant before: Tang Jun |
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Effective date of registration: 20200619 Address after: 236000 building 6-7, comprehensive industrial park, Yingshang Economic Development Zone, Shencheng Town, Yingshang County, Fuyang City, Anhui Province Patentee after: Anhui Junying photoelectric Co., Ltd Address before: 518000 Shahu Community, Biling Street, Pingshan District, Shenzhen City, Guangdong Province, No. 2-10 South Jinlong Avenue, 1 Building, 3 Floors, 2 Buildings, 2 Floors Patentee before: Shenzhen Junyi Technology Co.,Ltd. |