CN108015496A - The preparation method of vacuum chamber and vacuum chamber - Google Patents
The preparation method of vacuum chamber and vacuum chamber Download PDFInfo
- Publication number
- CN108015496A CN108015496A CN201711251569.5A CN201711251569A CN108015496A CN 108015496 A CN108015496 A CN 108015496A CN 201711251569 A CN201711251569 A CN 201711251569A CN 108015496 A CN108015496 A CN 108015496A
- Authority
- CN
- China
- Prior art keywords
- vacuum chamber
- supporting item
- threaded hole
- clean area
- chamber wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 238000000034 method Methods 0.000 claims description 9
- 230000003749 cleanliness Effects 0.000 abstract description 3
- 238000012545 processing Methods 0.000 description 9
- 238000003466 welding Methods 0.000 description 6
- 239000012535 impurity Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 239000002173 cutting fluid Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004807 localization Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
- B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Pressure Vessels And Lids Thereof (AREA)
Abstract
The invention discloses the preparation method of a kind of vacuum chamber and vacuum chamber, wherein vacuum chamber has supporting item and chamber wall, wherein, formed with positioning surface on the chamber wall；It is located on the bottom surface of the supporting item formed with concave clean area, the bottom surface on the positioning surface, also, the supporting item is tightly connected with the chamber wall；Penetrated through on the top surface of the supporting item formed with the first threaded hole, first threaded hole to the clean area.In the vacuum chamber of the present invention, bottom surface is tightly connected with positioning surface, without side seam, will not be sheltered evil people and countenance evil practices, and there is clean area on bottom surface, there is the first threaded hole with clean area perforation on top surface, can smoothly deflate, will not nest gas of gas reservoir, at the same time, directly clear area can be cleaned by the first threaded hole, so as to improve the cleanliness factor in vacuum chamber on the whole, avoid the pollution of part.
Description
Technical field
The present invention relates to the preparation method of a kind of vacuum chamber and vacuum chamber.
Background technology
At present, in vacuum industry vacuum system equipment according to product demand and workplace to the clean of equipment key part
Cleanliness requires different.Vacuum chamber is the supporting body of various execution units, while it is also carried as a critical component in equipment
A kind of vacuum clean environment is supplied.
Existing vacuum chamber supporting item is mainly made of the part of cylinder, cuboid or combined shaped, they
Be directly welded on chamber wall, have a larger contact area with chamber wall, and the requirement in view of deflating, these parts with
Welding between chamber wall is all intermittently welded.Such frame mode makes to form narrow hemi-closure space between the two, holds very much
Easily shelter evil people and countenance evil practices and not easy-clear, be also unfavorable for deflating well.This makes in the not high equipment of general vacuum or purity requirements
With being possible, but for solar film plating equipment, can cause it is local hide gas, hide impurity be difficult to clean off, impurity everywhere
The problem of drifting, can also impact quality of forming film.
The content of the invention
The object of the present invention is to provide the preparation method of a kind of vacuum chamber and vacuum chamber, solve support parts locally hide it is dirty,
The problem of hiding gas, and it is easy to clean, other parts will not be polluted.
The vacuum chamber of the present invention, has supporting item and chamber wall, wherein, formed with positioning surface on the chamber wall；It is described
Formed with concave clean area on the bottom surface of supporting item, the bottom surface is located on the positioning surface, also, the supporting item and institute
State chamber wall sealed connection；Penetrated through on the top surface of the supporting item formed with the first threaded hole, first threaded hole to institute
State clean area.
Vacuum chamber as described above, wherein, the supporting item is connected with the chamber wall full weld.
Vacuum chamber as described above, wherein, first threaded hole at least has two.
Vacuum chamber as described above, wherein, be additionally provided with the second threaded hole on the top surface, second threaded hole with
Blocked between the clean area.
Vacuum chamber as described above, wherein, on the supporting item institute is penetrated through formed with deflation through hole, the deflation through hole
Supporting item is stated, and is communicated with the second threaded hole bottom.
Vacuum chamber as described above, wherein, the positioning surface is the concave face being formed on the chamber wall.
Vacuum chamber as described above, wherein, the concave depth of positioning surface is 1mm-2mm.
Vacuum chamber as described above, wherein, the concave depth of clean area is 2mm-5mm；The clean area is tapered
Uncovered structure.
The preparation method of vacuum chamber of the present invention, is included on chamber wall and forms positioning surface；Formed on the bottom surface of supporting item
Concave clean area, forms perforation to the first threaded hole of the clean area on the top surface of the supporting item；By the bottom surface
It is positioned on the positioning surface, and the supporting item and chamber wall is tightly connected；Use screw and the first threaded hole spiral shell
After connecing, top surface described in attrition process.
The preparation method of vacuum chamber as described above, wherein, the supporting item is welded with the chamber wall full weld, and/or,
Gasket is provided between the screw and first threaded hole.
In the vacuum chamber of the present invention, bottom surface is tightly connected with positioning surface, without side seam, will not be sheltered evil people and countenance evil practices, and bottom surface
It is upper that there is clean area, there is the first threaded hole penetrated through with clean area on top surface, can smoothly deflate, will not nest gas of gas reservoir,
Meanwhile directly clear area can be cleaned by the first threaded hole, so that the cleanliness factor in vacuum chamber is improved on the whole,
Avoid the pollution of part.
Brief description of the drawings
Fig. 1 is the schematic diagram of supporting item part in vacuum chamber of the present invention；
Fig. 2 is the schematic diagram of vacuum chamber lumen chamber wall portion of the present invention；
Fig. 3 is the sectional view of vacuum chamber of the present invention；
Fig. 4 is the sectional view after Fig. 3 mounting screws.
Reference numeral：
Supporting item 1；Chamber wall 2；Top surface 3；Bottom surface 4；Clean area 5；First threaded hole 6；Second threaded hole 7；Deflation through hole
8；Positioning surface 9；Screw 10；Gasket 11.
Embodiment
The embodiment of the present invention is described below in detail, the example of the embodiment is shown in the drawings, wherein from beginning to end
Same or similar label represents same or similar element or has the function of same or like element.Below with reference to attached
The embodiment of figure description is exemplary, and is only used for explaining the present invention, and is not construed as limiting the claims.
The present invention discloses a kind of vacuum chamber, it has：Supporting item 1 and chamber wall 2.Supporting item 1, should in the vacuum chamber
Supporting item 1 plays fixed support or positioning supporting role for the assembling of miscellaneous part, this needs supporting item 1 to have certain morpheme public affairs
Difference.
It is located on chamber wall 2 formed with positioning surface 9, the bottom surface 4 of supporting member 1 on positioning surface 9, supporting item 1 and chamber wall 2 are close
Envelope connection, the mode of sealed connection can be that the side wall of supporting item 1 is welded with the part that chamber wall 2 contacts.Meanwhile support
It is also formed with concave clean area 5 on the bottom surface 4 of part 1, clean area 5 is towards positioning surface 9, that is to say, that clean area 5 is opens wide
Structure, opening are buckled on positioning surface 9, and such clean area 5 is formed a hollow structure.In certain embodiments, bottom surface 4
It the mode such as can also be brazed between positioning surface 9 to be tightly connected.Formed with the first threaded hole on the top surface 3 of supporting item 1
6, the first threaded hole 6 is penetrated through to clean area 5, is deflated for clean area 5.
Preferably, supporting item 1 is connected with 2 full weld of chamber wall.Usually it is according at chamber interior positioning in mechanical processing
Reason, the process route of part preprocessing-welding-heat treatment-finishing perform.
For the higher supporting item 1 of positioning requirements, positioning surface 9 is concave to be formed in concave face on chamber wall 2
Depth determines for the basic size and tolerance of 1mm-2mm positioning surfaces 9 according to the appearance and size of supporting item 1.For positioning requirements not
For high supporting item 1, positioning surface 9 can not be recessed, such as can be according to the appearance and size of supporting item 1 in 2 left-hand seat of chamber wall
It is dynamic to mark the contour line of main positioning surface 9, and it is directed at welding.The contour line can be macroscopic, actual lines,
Can also be that program on process equipment limits out, by programme-control process equipment by the bottom surface of supporting item 1 and contour line
Alignment, and place, then carry out the operation such as follow-up welding.
Generally, in the preparation, by 1 pre-processed portion size of supporting item, and leave in the height direction certain
Allowance, prepares for later finishing.Process support part 1 is illustrated how below, and the knot of the supporting item 1 processed
Structure.
Clean area 5 is processed on bottom surface 4, clean area 5, which is processed into the conical surface, maximizes contact area, that is, the opening of taper
Structure, the outside diameter of open-mouth is larger, and the diameter of the depression bottom surface after depression is smaller.It is directed toward in top surface 3 on the direction of bottom surface 4, it is clean
The diameter in net area 5 gradually increases.Clean area 5 forms a hollow space.The 5 concave depth of clean area is preferably 2mm-
5mm。
Certainly, above-mentioned clean area 5 is processed into the conical surface only as a preferred embodiment, being not limited to this Shen
Please, it can also be used for the application with other shapes, such as can be processed into cylindrical surface etc..
At least two first threaded holes 6 being machined with top surface 3, preferably countersunk head threaded hole, it is penetrated through with clean area 5,
Clean area 5 is thus set to become open space.The space of certain opening, can be sealed by screw 10, screw 10 and the
One threaded hole 6 is spirally connected, and the first threaded hole 6 is blocked, in order to improve the effect that closure seals in other words, in 10 and first spiral shell of screw
Gasket 11 is provided between pit 6.Corresponding above-mentioned first threaded hole 6 is countersunk head threaded hole, and screw 10 can be countersunk head herein
Screw.It is to be understood that the use of screw 10 is usually what is used when processing vacuum chamber, such as need to supporting item 1
Highly it is adjusted, the processing of mode such as is ground, cut, processing waste material is entered clean by the first threaded hole 6 in order to prevent
Net area 5, therefore the first threaded hole 6 is screwed to using screw 10, to play sealing function.
Certainly, after the completion of vacuum chamber use, screw 10 can also be screwed to the first threaded hole 6, avoid dust from entering.
Further, also blocked with the second threaded hole 7 between second threaded hole 7 and clean area 5；Formed on supporting item 1
There is deflation through hole 8, the deflation through hole penetrates through the supporting item, and is communicated with 7 bottom of the second threaded hole.The deflation through hole
8 preferably on any side wall of supporting item 1, and deflation through hole 8 can be pre-machined out, certainly or in multiple sides
The deflation through hole 8 is all set on wall.Be spirally connected in the second threaded hole 7 bolt or screw when, bolt or screw and the second screw thread
Air between hole 7 in gap, can discharge via deflation through hole 8.
Illustrate the preparation method of vacuum chamber below：Positioning surface 9 is formed on chamber wall 2；The shape on the bottom surface 4 of supporting item 1
Into concave clean area 5, perforation is formed on the top surface 3 of supporting item 1 to the first threaded hole 6 of clean area 5；Bottom surface 4 is placed
In on positioning surface 9, and supporting item 1 and chamber wall 2 are tightly connected；After being spirally connected using screw and first threaded hole 6, grinding
Process the top surface 3.State and be provided with gasket 11 between screw 10 and first threaded hole 6；Supporting item 1 and the chamber wall
2 full welds weld.
In simple terms, it can be understood as by the supporting item 1 processed, (supporting member 1 processed can be understood as：Process
5 and first threaded hole of clear area, 6 isostructural supporting member 1, naturally it is also possible to including above-mentioned second threaded hole 7 and deflation through hole 8,
Here only as explanation, each structure is not enumerated) localization region is placed into, according to welding process requirement in welding branch
Full weld processing is carried out between support member 1 and chamber wall 2.Localization region refers to the contour line of positioning surface 9 or positioning surface 9, and purpose is exactly to be
Positioning during welding.
Heat treatment release stress can be done after having welded, when finishing can finish each parts, such as support
The height of part 1, can do machining, usually carry out on the top surface 3, during finishing on the first above-mentioned threaded hole 6, meeting
Gasket 11 and screw 10 are installed successively, prevent cutting fluid from flowing into clean area and polluting.
Second threaded hole 7 and deflation through hole 8 can also be in supporting items 1 and the post-processing of 2 sealed connection of chamber wall.Need to manage
Solution, under this processing sequence, when processing the second threaded hole 7 and deflation through hole 8, should also install gasket 11 and screw successively
10, prevent from polluting clean area 5 during processing.
During cleaning, the outside of supporting item 1 is easy to wiped clean, and inside only needs to be rinsed by the first threaded hole 6
.
In addition, after the completion of the finishing of supporting item 1, other necessary operation workpiece can be also set on supporting item 1, should
It is that vacuum chamber uses in subsequent applications to operate workpiece, then this is not repeated.
The vacuum chamber of the present invention, the pollution of cutting fluid in processing, and profit can be reduced or avoided during manufacture by screw 10
In secondary cleaning.The connection mode of full weld, can reduce hiding for various impurity.First threaded hole 6 and clean area 5 form opening
Region, facilitate the later stage to clean.
The structure, feature and effect of the present invention, above institute are described in detail based on the embodiments shown in the drawings
Only presently preferred embodiments of the present invention is stated, but the present invention is not to limit practical range shown in drawing, it is every according to structure of the invention
Want made change, or be revised as the equivalent embodiment of equivalent variations, when not going beyond the spirit of the description and the drawings,
Should all be within the scope of the present invention.
Claims (10)
1. a kind of vacuum chamber, it is characterised in that have：
Supporting item (1) and chamber wall (2), wherein,
Formed with positioning surface (9) on the chamber wall (2)；
It is located at the positioning surface formed with concave clean area (5), the bottom surface (4) on the bottom surface (4) of the supporting item (1)
(9) on, also, the supporting item (1) is tightly connected with the chamber wall (2)；
Penetrated through on the top surface (3) of the supporting item (1) formed with the first threaded hole (6), first threaded hole (6) to described
Clean area (5).
2. vacuum chamber according to claim 1, it is characterised in that
The supporting item (1) is connected with the chamber wall (2) full weld.
3. vacuum chamber according to claim 1, it is characterised in that
First threaded hole (6) at least has two.
4. vacuum chamber according to claim 1, it is characterised in that
The second threaded hole (7) is additionally provided with the top surface (3), between second threaded hole (7) and the clean area (5)
Block.
5. vacuum chamber according to claim 4, it is characterised in that
Formed with deflation through hole (8) on the supporting item (1), the deflation through hole penetrates through the supporting item, and with described the
Two threaded holes (7) bottom communicates.
6. vacuum chamber according to claim 1, it is characterised in that
The positioning surface (9) is the concave face being formed on the chamber wall (2).
7. vacuum chamber according to claim 6, it is characterised in that
The concave depth of the positioning surface (9) is 1mm-2mm.
8. vacuum chamber according to claim 1, it is characterised in that
The concave depth of the clean area (5) is 2mm-5mm；
The tapered uncovered structure of the clean area (5).
A kind of 9. preparation method of vacuum chamber, it is characterised in that
Positioning surface (9) is formed on chamber wall (2)；
Concave clean area (5) is formed on the bottom surface of supporting item (1) (4), is formed on the top surface (3) of the supporting item (1)
Penetrate through to the first threaded hole (6) of the clean area (5)；
The bottom surface (4) are positioned on the positioning surface (9), and the supporting item (1) and chamber wall (2) are tightly connected；
After being spirally connected using screw and first threaded hole (6), top surface described in attrition process (3).
10. the preparation method of vacuum chamber according to claim 9, it is characterised in that
The supporting item (1) is welded with the chamber wall (2) full weld；
And/or
Gasket (11) is provided between the screw (10) and first threaded hole (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711251569.5A CN108015496B (en) | 2017-12-01 | 2017-12-01 | The preparation method of vacuum chamber and vacuum chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711251569.5A CN108015496B (en) | 2017-12-01 | 2017-12-01 | The preparation method of vacuum chamber and vacuum chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108015496A true CN108015496A (en) | 2018-05-11 |
| CN108015496B CN108015496B (en) | 2019-05-28 |
Family
ID=62078184
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711251569.5A Active CN108015496B (en) | 2017-12-01 | 2017-12-01 | The preparation method of vacuum chamber and vacuum chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108015496B (en) |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60238473A (en) * | 1984-05-10 | 1985-11-27 | Ulvac Corp | Manufacturing device of thin bellows |
| JP2000237574A (en) * | 1999-02-18 | 2000-09-05 | Nissin Electric Co Ltd | Airtight locking device |
| WO2005024965A1 (en) * | 2003-09-11 | 2005-03-17 | Edison S.P.A. | A method and apparatus for making a layer of coating material on a tape substrate, in particular for making superconductive tapes |
| CN1941597A (en) * | 2005-09-28 | 2007-04-04 | 北京太阳河技术发展有限责任公司 | Vacuum receiver with solar electrothermal symbiont |
| CN101062499A (en) * | 2005-12-21 | 2007-10-31 | 国家科技发展机构 | Solar battery manufacturing mechanism with high performance and low cost |
| CN101615571A (en) * | 2008-06-24 | 2009-12-30 | 周星工程股份有限公司 | The vacuum chamber that treatment substrate is used and comprise the equipment of this vacuum chamber |
| CN103797420A (en) * | 2011-09-12 | 2014-05-14 | 迈普尔平版印刷Ip有限公司 | Vacuum chamber with base plate |
| CN104094375A (en) * | 2012-02-06 | 2014-10-08 | 株式会社日立高新技术 | Charged particle beam device and wiring method |
| CN105502965A (en) * | 2015-12-28 | 2016-04-20 | 太仓耀华玻璃有限公司 | Automatic vacuum glass laser sealing device |
-
2017
- 2017-12-01 CN CN201711251569.5A patent/CN108015496B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60238473A (en) * | 1984-05-10 | 1985-11-27 | Ulvac Corp | Manufacturing device of thin bellows |
| JP2000237574A (en) * | 1999-02-18 | 2000-09-05 | Nissin Electric Co Ltd | Airtight locking device |
| WO2005024965A1 (en) * | 2003-09-11 | 2005-03-17 | Edison S.P.A. | A method and apparatus for making a layer of coating material on a tape substrate, in particular for making superconductive tapes |
| CN1941597A (en) * | 2005-09-28 | 2007-04-04 | 北京太阳河技术发展有限责任公司 | Vacuum receiver with solar electrothermal symbiont |
| CN101062499A (en) * | 2005-12-21 | 2007-10-31 | 国家科技发展机构 | Solar battery manufacturing mechanism with high performance and low cost |
| CN101615571A (en) * | 2008-06-24 | 2009-12-30 | 周星工程股份有限公司 | The vacuum chamber that treatment substrate is used and comprise the equipment of this vacuum chamber |
| CN103797420A (en) * | 2011-09-12 | 2014-05-14 | 迈普尔平版印刷Ip有限公司 | Vacuum chamber with base plate |
| CN104094375A (en) * | 2012-02-06 | 2014-10-08 | 株式会社日立高新技术 | Charged particle beam device and wiring method |
| CN105502965A (en) * | 2015-12-28 | 2016-04-20 | 太仓耀华玻璃有限公司 | Automatic vacuum glass laser sealing device |
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| Publication number | Publication date |
|---|---|
| CN108015496B (en) | 2019-05-28 |
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