CN107966276A - A kind of method and device of large-area wide grating belt diffraction efficiency measurement - Google Patents
A kind of method and device of large-area wide grating belt diffraction efficiency measurement Download PDFInfo
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- CN107966276A CN107966276A CN201711205141.7A CN201711205141A CN107966276A CN 107966276 A CN107966276 A CN 107966276A CN 201711205141 A CN201711205141 A CN 201711205141A CN 107966276 A CN107966276 A CN 107966276A
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- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
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Abstract
The invention discloses a kind of measuring method and device of large-area wide grating belt diffraction efficiency, including semiconductor laser, chopper, detection photosystem, with reference to photosystem and Electro-Optical Sensor Set；The device employs double photo paths and chopper and the semiconductor laser light resource of multiple wavelength is incided broadband grating surface, 1 order diffraction light of detection light system acquisition, and pass through two-dimensional scan large-area wide grating belt, complete the measurement of the diffraction efficiency on whole large-area wide grating belt surface to be measured, suppress laser power drift and the interference of environmental background light, while substantially increase detection efficiency.
Description
Technical field
The present invention relates to a kind of measuring method and device of spectroscopy element, and in particular to large-area wide grating belt diffraction
The e measurement technology of efficiency.
Background technology
Large-area wide grating belt is widely used in strong laser system, surpasses in the high power based on chirped pulse amplification
Play a key effect in short-pulse laser.Large-area wide grating belt carries superelevation laser power in pulse compression process,
In order to reduce raster unit area laser power, it is necessary to increase the area of grating and the bandwidth of increase grating, usually require that broadband
The whole clear aperture of grating diffraction efficiency in bandwidth range is all higher than 90%.
The patent No. 201710271676.8 provides a kind of diffraction efficiency measuring method of broadband grating, using super continuous spectrums
Laser and acousto-optic filter combination provide wavelength continuously adjustable monochromatic source, and use two pacing amounts, are not added with grating to be measured
When elder generation measuring environment bias light, plus grating to be measured when measures -1 order diffraction light of grating.This scheme is used to measure large area
Exist during the diffraction efficiency measurement of broadband grating and measure the problem of time-consuming, be to reduce light source stability after being grown due to time of measuring
The measurement error brought into, it is desirable to keep stablizing the light source of output, and long-time inner light source stable state in a long time
What kind of brings influence to have no way of finding out about it at all on testing result.
The content of the invention
It is an object of the invention to provide a kind of test method and device of large-area wide grating belt diffraction efficiency, solves existing
When having a large-area wide grating belt diffraction efficiency of technology measurement time-consuming it is high to light source stability requirement the problem of.
The committed step of specific technical solution of the present invention is as follows successively：
A kind of measuring method of large-area wide grating belt diffraction efficiency, includes the following steps：
1) the step of building multi-wavelength testing light source：In the bandwidth range of large-area wide grating belt to be measured, by several
The semiconductor laser light resource of different wave length is installed on rotatable light source bracket；Rotatable light source bracket is by transmission mechanism and driving
Motor is connected；
2) the step of building light path：The transparent surface of chopper, spectroscope, wherein chopper is set gradually in light path
Product and the area equation that is in the light, incident light after spectroscope transmitted light as flashlight with incidence angle θcIncide large area to be measured
On the grating surface of broadband, -1 order diffraction angular is θiInto the window that enters of first integral ball, the window that goes out of first integral ball is put
The first photodetector is put, for incident light by spectroscope back reflection light as light is referred to, be directly entered second integral ball enters window
Mouthful, second integral ball goes out the second photodetector of placement at window, wherein large-area wide grating belt to be measured is placed on two dimension and sweeps
Retouch on translation stage；
3) two-dimensional scan measuring process：Adjustment rotation light source bracket, by the semiconductor laser light resource of some different wave lengths
A light source incidence to chopper, the thang-kng frequency for setting chopper is f, the first photodetector and the second electric explorer
Sample frequency is all 2f；During chopper printing opacity, the first photodetector is surveyed and the second photodetector is carried out at the same time measurement, and first
Photodetector test result is denoted as Vis+Vib, the second photodetector test result is denoted as Vic+Vibc, when chopper is in the light, the
One photodetector is surveyed and the second photodetector is still carried out at the same time measurement, and the first photodetector test result is signal at this time
The bias light of light is denoted as Vib, the second photodetector test result is that the bias light of reference light is denoted as Vibc, by controlling two dimension to sweep
Translation stage point by point scanning on large-area wide grating belt surface is retouched, until all sampled points in large-area wide grating belt bore to be measured
All scanned record；
Spectroscopical reflectivity is denoted as R, VisTo reject the letter light intensity after signal background light, VicReferred to reject
Reference light light intensity after light bias light,
Vis=(Vis+Vib)-Vib；Vic=(Vic+Vibc)-Vibc；
Then the diffraction efficiency of any point is on large-area wide grating belt surface to be measured：
4) drive motor to control rotatable light source bracket rotation, switch the semiconductor laser light resource of different wave length, weight successively
On multiple
The two-dimensional scan measuring process stated, completes the large-area wide grating belt under the semiconductor laser light source of different wave length
Diffraction
The measurement of efficiency.
Preferred solution：Diaphragm is placed between chopper and spectroscope in above-mentioned technical proposal step 2).After placing diaphragm
The size of laser facula can be controlled, prevents the sampled point that diffraction efficiency measures from having the overlapping of hot spot, causes measurement result to be not allowed
Really.
Spectroscope in above-mentioned technical proposal step 2) is polarization splitting prism, in the polarization splitting prism and big face to be measured
Half-wave plate is also placed between product broadband grating.Place after polarization spectroscope with the polarization state of laser can be modulated after half-wave plate,
Broadband grating corresponding diffraction efficiency under two kinds of polarization states of TE and TM can be measured.
First integral ball and the first photodetector in above-mentioned technical proposal step 2) are placed on automatically controlled angle turntable
On, control electronic angle turntable so that when switching the semiconductor laser light resource of different wave length, meet dsin θ all the timec-dsinθi
=m λi, wherein d be grating cycle, m=-1, λiFor semiconductor laser light resource wavelength.Automatically controlled angle turntable can be adjusted conveniently
The posture of whole first integral ball so that the window that enters of first integral ball can face diffraction light during switching light sources with different wavelengths.
By controlling two-dimensional scan translation stage on large-area wide grating belt surface in step 3) described in above-mentioned technical proposal
During point by point scanning, first horizontal sweep, after having swept a line, continues to scan on, until large area broadband light to be measured after vertical direction line feed
The all scanned record of all sampled points in grid bore, when horizontal sweep, ensure each to reach 2f using the sample frequency of point.
Based on above-mentioned measuring method, a kind of measuring device of large-area wide grating belt diffraction efficiency is also provided.Concrete scheme
It is as follows：A kind of measuring device of large-area wide grating belt diffraction efficiency, including two-dimensional scan translation stage, rotatable light source bracket,
Drive motor, the semiconductor laser light resource of several different wave lengths, chopper, spectroscope, first integral ball, the first photodetection
Device, second integral ball, the second photodetector；
The semiconductor laser light resource of several the wherein described different wave lengths is installed on the rotatable light source bracket,
Rotatable light source bracket is connected by transmission mechanism with the driving motor, and the copped wave is set gradually in light path
Device, spectroscope, wherein the glazed area of the chopper and the area equation that is in the light, incident light transmitted light after the spectroscope
As flashlight with incidence angle θcIncide on large-area wide grating belt surface to be measured, -1 order diffraction angular is θiInto first
Integrating sphere enters window, and the window that goes out of first integral ball places the first photodetector, and incident light passes through spectroscope back reflection light
As with reference to light, into the window that enters of second integral ball, second integral ball goes out the second photodetector of placement at window, wherein
Large-area wide grating belt to be measured is placed on the two-dimensional scan translation stage.
Preferred solution：In above-mentioned technical proposal diaphragm is placed between chopper and the spectroscope.
Spectroscope described in above-mentioned technical proposal is polarization splitting prism, in the polarization splitting prism and large-area wide to be measured
Half-wave plate is also placed between grating belt.
First integral ball and the first photodetector are placed on automatically controlled angle turntable in above-mentioned technical proposal, different ripples
During long semiconductor laser light resource, meet dsin θ all the timec-dsinθi=m λi, wherein d be grating cycle, m=-1, λiFor half
Conductor Laser optical source wavelength.
The thang-kng frequency of chopper described in above-mentioned technical proposal is f, the first photodetector and the second photodetector
It is connected on same switch, and the sample frequency of the first photodetector and the second electric explorer is all 2f., the first photoelectricity herein
Detector and the second photodetector are connected on same switch, conveniently realize synchronized sampling, set the first photodetector and
Second photodetector sample frequency is that the thang-kng frequency of chopper is 2 times of f, exactly needs to rotate a cycle in chopper
It is middle completion to being in the light when with printing opacity when data sampling.
Since above-mentioned preparation facilities uses, the present invention has following advantages compared with prior art：Partly led using multi-wavelength
Body laser replaces wideband light source, and measuring device is cheap；Using chopper light and dark measurement in real time, the survey of half is saved
The time is measured, the requirement to light source long-time stability is reduced, improves the measurement efficiency of large-area wide grating belt diffraction efficiency.
Brief description of the drawings
Fig. 1：The device of large-area wide grating belt diffraction efficiency measurement；
Wherein 1：Driving motor, 2:Rotatable light source bracket, 3:Chopper, 4:Spectroscope, 5:First integral ball,
6:First photodetector, 7:Second integral ball, 8:Second photodetector, 9:Large-area wide grating belt to be measured.
Embodiment
In order to illustrate more clearly of the technical solution of invention, it is further described with reference to the accompanying drawings and embodiments
Embodiment one：
A kind of measuring method of large-area wide grating belt diffraction efficiency, as shown in Figure 1,1) building multi-wavelength testing light source
Step：In the bandwidth range of large-area wide grating belt, by power be 100mw-1000mw and wavelength is respectively 730nm,
760nm,
The semiconductor laser light resource of 785nm, 808nm, 830nm, 880nm are installed on rotatable light source bracket 2, rotatable
Light source bracket 2 is connected by transmission mechanism with driving motor 1；
2) the step of building light path：Chopper 3, the printing opacity of spectroscope 4, wherein chopper are set gradually in light path
Area and be in the light area equation, incident light after spectroscope transmitted light as flashlight with incidence angle θcIncide big face to be measured
On product broadband grating surface 9, -1 order diffraction angular is θiInto the window that enters of first integral ball 5, the exit window of first integral ball
Mouth places the first photodetector 6, and incident light, as light is referred to, is directly entered second integral ball 7 by spectroscope back reflection light
Enter window, second integral ball goes out the second photodetector 8 of placement at window, wherein large-area wide grating belt to be measured is placed on
On two-dimensional scan translation stage；
3) two-dimensional scan measuring process：Adjustment rotation light source bracket, by the semiconductor laser light resource of some different wave lengths
A light source incidence to chopper, the thang-kng frequency for setting chopper is f, wherein f=50~100Hz, the first photodetection
The sample frequency of device and the second electric explorer is all 2f；During chopper printing opacity, the first photodetector is surveyed and the second photodetection
Device is carried out at the same time luminous intensity measurement, and the first photodetector test result is denoted as Vis+Vib, the second photodetector test result note
For Vic+Vibc；Copped wave；When device is in the light, the first photodetector is surveyed and the second photodetector is still carried out at the same time luminous intensity measurement, this
When the first photodetector test result be that the bias light hypermnesia of flashlight is Vib, the second photodetector test result is reference
The bias light hypermnesia of light is Vibc, by controlling the point by point scanning on large-area wide grating belt surface of two-dimensional scan translation stage, until
The all scanned record of all sampled points in large-area wide grating belt bore to be measured；Spectroscopical reflectivity is denoted as R, VisTo pick
Except the letter light intensity after signal background light, VicTo reject the reference light light intensity after reference light bias light,
Vis=(Vis+Vib)-Vib；Vic=(Vic+Vibc)-Vibc；
Then the diffraction efficiency of any point is on large-area wide grating belt surface to be measured：
4) drive motor to control rotatable light source bracket rotation, switch the semiconductor laser light resource of different wave length, weight successively
Multiple above-mentioned two-dimensional scan measuring process, completes the large-area wide grating belt diffraction under the semiconductor laser light source of different wave length
The measurement of efficiency.
Embodiment two：
On the basis of embodiment one, spectroscope is polarization splitting prism, and transmitted light is TM polarised lights, chopper with it is described
Diaphragm is placed between polarization splitting prism, half is also placed between the polarization splitting prism and large-area wide grating belt to be measured
Wave plate, TM light waves are converted into TE ripples by half-wave plate.Device can be used for detection TE type large-area wide grating belt diffraction efficiencies at this time.
Embodiment three：
On the basis of embodiment one, first integral ball and the first photodetector are placed on automatically controlled angle turntable,
During the semiconductor laser light resource of different wave length, meet dsin θ all the timec-dsinθi=m λi, wherein flashlight incidence angle θc=53 °,
D be grating cycle, m=-1, λiFor semiconductor laser light resource wavelength.Flashlight incidence angle θc=53 ° are to enter through Littrow angle
Penetrate, diffraction efficiency at this time is higher, and flashlight and diffraction light separation will not be in the light.
Example IV：
A kind of measuring device of large-area wide grating belt diffraction efficiency, including two-dimensional scan translation stage, rotatable light source branch
Frame 2, driving motor 1, the semiconductor laser light resource of several different wave lengths, chopper 3, spectroscope 4, first integral ball 5, first
Photodetector 6, second integral ball 7, the second photodetector 8；
The semiconductor laser light resource of several the wherein described different wave lengths is installed on the rotatable light source bracket,
Rotatable light source bracket 2 is connected by transmission mechanism with the driving motor 1, and the copped wave is set gradually in light path
Device, spectroscope, wherein the glazed area of the chopper and the area equation that is in the light, incident light transmitted light after the spectroscope
As test light with incidence angle θcIncide on large-area wide grating belt surface to be measured, -1 order diffraction angular is θiInto first
Integrating sphere enters window, and the window that goes out of first integral ball places the first photodetector, and incident light passes through spectroscope back reflection light
As with reference to light, into the window that enters of second integral ball, second integral ball goes out the second photodetector of placement at window, wherein
Large-area wide grating belt to be measured is placed on the two-dimensional scan translation stage.
Embodiment five：
On the basis of example IV, spectroscope is polarization splitting prism, between chopper and the polarization splitting prism
Diaphragm is placed with, half-wave plate is also placed between the polarization splitting prism and large-area wide grating belt to be measured.
Embodiment six：
On the basis of example IV, first integral ball and the first photodetector are placed on automatically controlled angle turntable,
During the semiconductor laser light resource of different wave length, meet dsin θ all the timec-dsinθi=m λi, wherein d be grating cycle, m=-1,
λiFor semiconductor laser light resource wavelength.
Embodiment seven：
The thang-kng frequency of the chopper described in example IV is f, and the sample frequency of the first photodetector is 2f, second
The sample frequency of electric explorer is 2f.
Claims (10)
1. a kind of measuring method of large-area wide grating belt diffraction efficiency, includes the following steps：
1) the step of building multi-wavelength testing light source：The semiconductor laser light resource of several different wave lengths is installed on rotatable light
On the stent of source, rotatable light source bracket is connected by transmission mechanism with driving motor；
2) the step of building light path：Set gradually chopper, spectroscope in light path, wherein the glazed area of chopper and
Be in the light area equation, and incident light transmitted light after spectroscope incides large-area wide grating belt surface to be measured as flashlight
On, -1 order diffraction light enters the window that enters of first integral ball, and the window that goes out of first integral ball places the first photodetector, incident
Light, as light is referred to, is directly entered the window that enters of second integral ball, second integral ball goes out window by spectroscope back reflection light
The second photodetector is placed at place, wherein large-area wide grating belt to be measured is placed on two-dimensional scan translation stage；
3) two-dimensional scan measuring process：Adjustment rotation light source bracket, by one in the semiconductor laser light resource of some different wave lengths
A light source incidence is to chopper, and the thang-kng frequency for setting chopper is f, the sampling of the first photodetector and the second electric explorer
Frequency is all 2f；During chopper printing opacity, the first photodetector survey and the second photodetector at the same time to position light intensity into
Row measurement, when chopper is in the light, the first photodetector is surveyed and the second photodetector at the same time surveys position light intensity
Amount, is surveyed and the test in chopper printing opacity and when chopper is in the light respectively of the second photodetector by the first photodetector
As a result the diffraction efficiency of any point on large-area wide grating belt surface to be measured is obtained；By adjusting two-dimensional scan translation stage, big
Point by point scanning on the grating surface of area broadband, until all scanned note of all sampled points in large-area wide grating belt bore to be measured
Record；
4) drive motor to control rotatable light source bracket rotation, switch the semiconductor laser light resource of different wave length successively, repeat to walk
It is rapid 3), complete the measurement of the large-area wide grating belt diffraction efficiency under the semiconductor laser light source of different wave length.
2. the measuring method of large-area wide grating belt diffraction efficiency according to claim 1, it is characterised in that the step
2) diaphragm is placed between the chopper and spectroscope in.
3. the measuring method of large-area wide grating belt diffraction efficiency according to claim 1, it is characterised in that the step
2) spectroscope in is polarization splitting prism, and half is also placed between the polarization splitting prism and large-area wide grating belt to be measured
Wave plate.
4. the measuring method of the large-area wide grating belt diffraction efficiency according to one of claims 1 to 3, it is characterised in that institute
State the first integral ball in step 2) and the first photodetector is placed on automatically controlled angle turntable, switch the half of different wave length
During conductor Laser light source, meet dsin θ all the timec-dsinθi=m λi, wherein d be grating cycle, θcIt is incident to and treats for flashlight
Survey the incident angle on large-area wide grating belt surface, θiFor -1 order diffraction angular m=-1, λiFor semiconductor laser light resource wavelength.
5. the measuring method of the large-area wide grating belt diffraction efficiency according to one of claims 1 to 3, it is characterised in that institute
When stating chopper printing opacity in step 3)：First photodetector test result is denoted as Vis+Vib, the second photodetector test knot
Fruit is denoted as Vic+Vibc；When chopper is in the light：First photodetector test result is denoted as V for the bias light of flashlightib, second
Photodetector test result is denoted as V for the bias light of reference lightibc；Spectroscopical reflectivity is denoted as R, VisBelieve to reject
Letter light intensity after number bias light, VicTo reject the reference light light intensity after reference light bias light,
Vis=(Vis+Vib)-Vib；Vic=(Vic+Vibc)-Vibc；
Then the diffraction efficiency of any point is on large-area wide grating belt surface to be measured：
6. a kind of measuring device of large-area wide grating belt diffraction efficiency, including two-dimensional scan translation stage, rotatable light source bracket,
Drive motor, the semiconductor laser light resource of several different wave lengths, chopper, spectroscope, first integral ball, the first photodetection
Device, second integral ball, the second photodetector；
The semiconductor laser light resource of several the wherein described different wave lengths is installed on the rotatable light source bracket, can be revolved
Turn light source bracket by transmission mechanism with the driving motor to be connected, the chopper is set gradually in light path, is divided
Light microscopic, wherein the glazed area of the chopper and the area equation that is in the light, incident light transmitted light conduct after the spectroscope
Flashlight is incided on large-area wide grating belt surface to be measured, and -1 order diffraction light enters the window that enters of first integral ball, the first product
The window that goes out of bulb separation places the first photodetector, and incident light, as light is referred to, is accumulated by spectroscope back reflection light into second
Bulb separation enters window, and second integral ball goes out the second photodetector of placement at window, wherein large-area wide grating belt to be measured is put
Put on the two-dimensional scan translation stage.
7. the measuring device of large-area wide grating belt diffraction efficiency according to claim 6, it is characterised in that the copped wave
Diaphragm is placed between device and the spectroscope.
8. the measuring device of large-area wide grating belt diffraction efficiency according to claim 6, it is characterised in that the light splitting
Mirror is polarization splitting prism, and half-wave plate is also placed between the polarization splitting prism and large-area wide grating belt to be measured.
9. the measuring device of the large-area wide grating belt diffraction efficiency according to one of claim 6~8, it is characterised in that the
One integrating sphere and the first photodetector are placed on automatically controlled angle turntable, switch the semiconductor laser light resource of different wave length
When, meet dsin θ all the timec-dsinθi=m λi, wherein d be grating cycle, θcLarge-area wide band to be measured is incident to for flashlight
The incident angle of grating surface, θiFor -1 order diffraction angular m=-1, λiFor semiconductor laser light resource wavelength.
10. the measuring device of the large-area wide grating belt diffraction efficiency according to one of claim 6~8, it is characterised in that
The thang-kng frequency of the chopper is f, and the sample frequency of the first photodetector is 2f, and the sample frequency of the second electric explorer is
2f。
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN116499586A (en) * | 2023-06-28 | 2023-07-28 | 成都量芯集成科技有限公司 | Laser power measuring device and measuring method thereof |
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| CN116499586B (en) * | 2023-06-28 | 2023-09-15 | 成都量芯集成科技有限公司 | Laser power measuring device and measuring method thereof |
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