CN107300838A - Developer solution dilution system - Google Patents
Developer solution dilution system Download PDFInfo
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- CN107300838A CN107300838A CN201710670198.8A CN201710670198A CN107300838A CN 107300838 A CN107300838 A CN 107300838A CN 201710670198 A CN201710670198 A CN 201710670198A CN 107300838 A CN107300838 A CN 107300838A
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- developer solution
- preparation vessel
- densimeter
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
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- Accessories For Mixers (AREA)
Abstract
A kind of developer solution dilution system that the present invention is provided, feeding pipe supplies stoste and pure water to the first preparation vessel, obtain the first developer solution of preliminarily diluted, first developer solution is flowed into the second preparation vessel by the first pipeline, first densimeter and the second densimeter measure the concentration value of the first developer solution and the second developer solution respectively, and it is input to control assembly, the stoste and/or pure water flow of feeding pipe the first preparation vessel of inflow and the second preparation vessel are controlled by control assembly, the second developer solution of further exact dilution is obtained, flowing to developing apparatus by the second pipeline uses.A kind of developer solution dilution system that the present invention is provided, the dilution of developer solution is divided into preliminarily diluted and the step of exact dilution two in the second preparation vessel in the first preparation vessel, wherein the second preparation vessel can use developer solution storage container of the prior art, save container cost, Automated condtrol is carried out by flow control system, production efficiency can be greatly improved, the concentration control of developer solution is more convenient.
Description
Technical field
The invention belongs to developer solution technical field, more particularly to a kind of developer solution dilution system.
Background technology
The manufacturer of electronic-circuit device commonly uses what is used in photo-mask process, photo-mask process during retrofit
Other substrate materials are commonly used by exposing soluble positive photo glue, and conventional positive photo glue material is 2.38% concentration
TMAH (TMAH) aqueous solution, the TMAH aqueous solution is used in developing apparatus by substantial amounts of.
In recent years, electronic circuit printing, the densification of composition, it is desirable to which composition width is fine, and this is just in developing procedure
Quality to the developer solution of photoresist proposes high request, in order to obtain high-resolution, the definition of composition (keenness), steady
Qualitative and high qualification rate, it is necessary to the composition and concentration of strict management developer solution, for example, in the case of the TMAH aqueous solution,
It is required that within ± the 1/2000 of normal concentration.
At present, electronic circuit manufacturer, which will obtain the developer solution of above-mentioned normal concentration, mainly two kinds of channels, one kind be to
The developer solution supplier of specialty purchases the developer solution of deployed concentration, and usual extension rate is 8-40 times or so, for large quantities of
Substantial amounts of developer solution needed for the production of amount is held, it is necessary to prepare large-scale container, and cost of transportation is also very high；Another is
Defined concentration oneself is formulated to after to supplier's buying developer solution stoste, this mode is the mode of current main flow, is saved
Container, cost of transportation, still, this mode allocate obtained developer solution to reach normal concentration, and developer solution dilution is carried
High request is gone out, current way is first by the concentration dilution of developer solution to a provisional value in a preparation vessel, then herein
On the basis of carry out intense adjustment, the developer solution that normal concentration is met after intense adjustment is stored to containers for future use, is diluted
Journey needs high-precision control and efficient output meets the developer solution of normal concentration, and current technology is difficult to reach that this will
Ask.
The content of the invention
It is an object of the invention to provide a kind of developer solution dilution system, by the dilution of developer solution be divided into preliminarily diluted and
The step of exact dilution two, carries out Automated condtrol by flow control system, can greatly improve production efficiency, the concentration of developer solution
Control is more convenient.
To realize the purpose of the present invention, the invention provides following technical scheme：
In a first aspect, the invention provides a kind of developer solution dilution system, including stoste and pure water feeding pipe；Accommodate and
Dilute the first preparation vessel and the second preparation vessel of the stoste and the pure water, first preparation vessel and second preparation vessel
Between by the first pipeline connect, flowed to so as to dilute the first obtained developer solution in first preparation vessel by the first pipeline
Second preparation vessel；The first densimeter for measuring first solution level, for measuring second preparation vessel
Middle the second densimeter for diluting the second obtained solution level；Control assembly for controlling flow, the control assembly is used
The feeding pipe is controlled to flow into described first in the concentration value exported by first densimeter and second densimeter
The stoste and/or pure water flow of preparation vessel and second preparation vessel, second preparation vessel and developing apparatus pass through the
Two pipelines are connected, so that second developer solution flows to the developing apparatus.
In the first possible implementation of first aspect, the original liquid concentration scope is 20% to 100%, control
Component controls the concentration range of first developer solution to be 2.38% ± 0.005%, and the concentration range of second developer solution is
2.38% ± 0.003%.
With reference to the first possible implementation of first aspect and first aspect, second in first aspect is possible
In implementation, the original liquid concentration is 25%.
In the third possible implementation of first aspect, in first preparation vessel and second preparation vessel also
Agitating device for strengthening the developer solution dilution is installed.
In the 4th kind of possible implementation of first aspect, in addition to for accelerating first developer solution to described
First liquid pump of the second preparation vessel flowing, for the second liquid pump for accelerating second developer solution to be flowed to the developing apparatus,
First liquid pump and the second liquid pump are located on corresponding first pipeline and second pipeline.
In the 5th kind of possible implementation of first aspect, first densimeter located at first pipeline and
On row pipeline, second densimeter is on the parallel pipeline of second pipeline.
With reference to first aspect and first aspect the first to the 5th kind of possible implementation, the 6th of first aspect the
Plant in possible implementation, first densimeter and second concentration are calculated as ultrasonic wave densimeter.
With reference to first aspect and first aspect the first to the 5th kind of possible implementation, the 7th of first aspect the
Plant in possible implementation, also include level gauging device in first preparation vessel and second preparation vessel.
Second aspect, the invention provides a kind of developer solution dilution process, comprises the following steps：
Stoste and pure water feeding pipe supply the stoste and pure water to the first preparation vessel；
The stoste and the pure water mixed diluting in first preparation vessel, obtain the first developer solution；
First developer solution flows to the second preparation vessel by the first pipeline；
First densimeter and the second densimeter measurement obtain first developer solution and the second of second preparation vessel and shown
The concentration value of shadow liquid；
First developer solution exported according to first densimeter and second densimeter and second development
The concentration value of liquid, control assembly adjusts the developer solution that the feeding pipe flows to first preparation vessel and second preparation vessel
And/or pure water flow, obtain first developer solution and second developer solution of predetermined concentration.
In the first possible implementation of second aspect, the control assembly controls the dense of first developer solution
The deviation value of degree is more than the deviation value of second solution level.
Beneficial effects of the present invention：
A kind of developer solution dilution system that the present invention is provided, stoste and pure water feeding pipe supply stoste to the first preparation vessel
And pure water, the first developer solution of preliminarily diluted is obtained, the first developer solution the second preparation vessel is flowed into by the first pipeline, first is dense
Degree meter and the second densimeter measure the concentration value of the first developer solution and the second developer solution respectively, and are input to control assembly, by controlling
Component control feeding pipe processed flows into the stoste and/or pure water flow of the first preparation vessel and the second preparation vessel, obtains into one
The second developer solution of exact dilution is walked, developing apparatus is flowed to by the second pipeline and used.A kind of developer solution that the present invention is provided is dilute
Release system, is divided into preliminarily diluted and the exact dilution two in the second preparation vessel in the first preparation vessel by the dilution of developer solution
Step, wherein the second preparation vessel can use developer solution storage container of the prior art, saves container cost, passes through flow control
System carries out Automated condtrol, can greatly improve production efficiency, and the concentration control of developer solution is more convenient.
Brief description of the drawings
, below will be to embodiment in order to illustrate more clearly of embodiment of the present invention or technical scheme of the prior art
Or the accompanying drawing used required in description of the prior art is briefly described, it should be apparent that, drawings in the following description are only
It is some embodiments of the present invention, for those of ordinary skill in the art, on the premise of not paying creative work,
Other accompanying drawings can also be obtained according to these accompanying drawings.
Fig. 1 is the structural representation of one embodiment of the present invention；
Embodiment
Below in conjunction with the accompanying drawing in embodiment of the present invention, the technical scheme in embodiment of the present invention is carried out clear
Chu, it is fully described by, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole realities
Apply mode.Based on the embodiment in the present invention, those of ordinary skill in the art institute under the premise of creative work is not made
The every other embodiment obtained, belongs to the scope of protection of the invention.
Referring to Fig. 1, the first better embodiment of the invention provides a kind of developer solution dilution system, including stoste supply pipe
Road 101, pure water feeding pipe 102, it is preferred that be cost-effective, stoste uses TMAH water common on the market
Solution, pure water selection deionized water；General, present embodiment can allow original liquid concentration scope to be 20% to 100%, preferably
, original liquid concentration is 25%；Accommodate and dilute the stoste and the first preparation vessel 11 and the second preparation vessel 12 of the pure water, institute
State between the first preparation vessel 11 and second preparation vessel 12 and to be connected by the first pipeline 402, so that first preparation vessel 11
Middle obtained the first developer solution (not shown) that dilutes flows to second preparation vessel 12 by the first pipeline 402；For measuring
The first densimeter 111 of the first solution level is stated, the obtain second development is diluted in second preparation vessel 12 for measuring
Second densimeter 121 of liquid (not shown) concentration, in one embodiment, the first densimeter 111 are located at the first preparation vessel 11
The first developer solution lead on the parallel pipeline 401 of the pipeline 402 of the second preparation vessel 12, the second densimeter 121 located at second modulation
Second developer solution of groove 12 leads on the parallel pipeline 501 of developing apparatus pipeline 502.It is preferred that, the first densimeter 111 and second
Densimeter 121 is ultrasonic wave densimeter；Control assembly (not shown) for controlling flow, the control assembly is used to pass through institute
Stating the concentration value of the first densimeter 111 and second densimeter 121 output, to control the feeding pipe 101/102 to flow into described
The stoste and/or pure water flow of first preparation vessel 11 and second preparation vessel 121, second preparation vessel 12 and development
Device (not shown) is connected by the second pipeline 502, so that second developer solution flows to the developing apparatus.In one kind implementation
In mode, control assembly controls the concentration range of the developer solution of the first preparation vessel 11 first to be 2.38% ± 0.005%, the second modulation
The concentration range of the developer solution of groove 12 second is 2.38% ± 0.003%, is met the second development of developing apparatus work requirements
Liquid.
In one embodiment, it is also equipped with being used for forcing liquid in the first preparation vessel 11 and the second preparation vessel 12 dilute
The agitating device (not shown) released.
In one embodiment, in addition to for the developer solution after the dilution of the first preparation vessel 11 of acceleration modulated to second
The first liquid pump 110 that groove 12 flows, the developer solution after dilution for accelerating the second preparation vessel 12 flowed to developing apparatus the
Two liquid pumps 120.
In one embodiment, level gauging device is also included in the first preparation vessel 11 and the second preparation vessel 12
(not shown).
Illustrate the dilution process and the course of work of one embodiment of the present invention with reference to Fig. 1：
Stoste 101 is delivered to triple valve and is divided into two-way by the road, 201 is delivered to the first preparation vessel 11 by the road all the way, separately
301 it is delivered to the second preparation vessel 12 by the road all the way；Pure water 102 is delivered to triple valve and is also classified into two-way by the road, all the way through pipe
Road 202 is delivered to the first preparation vessel 11, and another road 302 is delivered to the second preparation vessel 12 by the road；By the road 201 conveying stoste
Flow into after the first preparation vessel 11 and mix with the pure water that pipeline 202 is conveyed, the first developer solution after being diluted, the first developer solution warp
First pipeline 402 enters the second preparation vessel 12, and the first modulation is obtained by the first densimeter 111 and the measurement of the second densimeter 121
The concentration of second developer solution obtains concentration value in first developer solution and the second preparation vessel 12 in groove 11, and concentration value is inputted into control group
Part, control assembly controls the deviation value of the first solution level in the first preparation vessel 11 to be more than the second development in the second preparation vessel 12
The deviation value of liquid concentration, for example, the deviation value for controlling the solution level of the first preparation vessel 11 dilution is ± 0.005%, control
The deviation value of the solution level of second preparation vessel 12 dilution is ± 0.003%, i.e. concentration of the first preparation vessel 11 to developer solution
Preliminarily diluted is carried out, the developer solution of the preliminary modulation of the second 12 pair first of preparation vessel preparation vessel 11 supply is finely diluted, controlled
The method of system can be that adjustment flows into the stoste feeding pipe 201 of the first preparation vessel 11 and/or the stream of pure water feeding pipe 202
Amount, adjustment flows into the stoste 301 of the second preparation vessel 12 and/or the flow of pure water 302.Due to the measurement request to concentration very
Height, the first densimeter 111 and the second densimeter 121 of selection are ultrasonic wave densimeter, to reach measurement of the presently claimed invention
Precision.In order to not influence the fast supply of development flow quantity, accelerate efficiency, the first densimeter 111 and the second densimeter 121 are located at
On the branch road of main conduit line, i.e. the first densimeter 111 is in the tie point 401 arranged side by side with the first pipeline 402, the second concentration
Meter is located on the second branch road 501 arranged side by side with the second pipeline 502, after dilution system starts, and what is diluted in the first preparation vessel 11 is aobvious
Shadow liquid enters tie point 401, and the concentration of first 111 pair of first developer solution of densimeter is measured, if reached default dense
Scope is spent, then opens the switch of pipeline 402, now, the first developer solution of the pipeline 402 of tie point 401 and first is at threeway
The second preparation vessel 12 is delivered to by the 3rd pipeline 403 after mixing；It is tentatively dilute that second preparation vessel 12 receives the first preparation vessel 11
Further diluted after the first developer solution after releasing, the measurement of the second densimeter 121 obtains the second developer solution in the second preparation vessel 12
Concentration value, control assembly adjustment flow into the second preparation vessel 12 stoste and/or pure water flow, that is, control feeding pipe 301 and/or
302 flow into the flow of the second preparation vessel 12, and the concentration to the second developer solution in the second preparation vessel 12 is finely diluted, obtained
Second developer solution of predetermined concentration.Developer solution after the completion of dilution is by the second Pipeline transport to developing apparatus, in one kind implementation
In mode, the second developer solution is delivered to threeway by the second pipeline 502 and the second bypass line 501 and converged for the 4th pipeline 503,
4th pipeline 503 is delivered to developing apparatus, in one embodiment, and developer solution can supply 6 developing apparatus (figure simultaneously
Middle #1~#6 pipelines are flowed to as developing apparatus).
In order to accelerate the mixing velocity of stoste and pure water, strengthen dilution effect, can be adjusted in the first preparation vessel 11 and second
Agitating device is installed in groove 12 processed.In addition, in order to accelerate flowing velocity of the developer solution in pipeline, the first liquid pump can be used
110 and second liquid pump 120 developer solution in pipeline is pressurizeed.In order to determine in the first preparation vessel 11 and the second preparation vessel 12
Developer solution volume, to determine whether to flow into stoste and pure water, set in the first preparation vessel 11 and the second preparation vessel 12
Level gauging device, when liquid level is less than predetermined value, can flow into stoste and pure water, when liquid level is higher than predetermined
During value, inflow stoste and pure water can be suspended.
A kind of developer solution dilution system that embodiments of the present invention are provided, the dilution of developer solution is divided into preliminary dilute
Release with the step of exact dilution two, the second preparation vessel for being originally served only for storing for future use developer solution is improved to what developer solution was accurately adjusted
Second preparation vessel, saves container cost, carries out Automated condtrol by control assembly, can greatly improve production efficiency, develops
The concentration control of liquid is more convenient.
Above disclosed is only several embodiments of the present invention, can not limit the right of the present invention with this certainly
Scope, one of ordinary skill in the art will appreciate that all or part of flow of above-mentioned embodiment is realized, and according to present invention power
Profit requires made equivalent variations, still falls within and invents covered scope.
Claims (10)
1. a kind of developer solution dilution system, it is characterised in that including stoste and pure water feeding pipe；Accommodate and dilute the stoste
With the first preparation vessel and the second preparation vessel of the pure water, first is passed through between first preparation vessel and second preparation vessel
Pipeline is connected, so that the first obtained developer solution is diluted in first preparation vessel flows to second modulation by the first pipeline
Groove；The first densimeter for measuring first solution level, is obtained for measuring dilution in second preparation vessel
Second densimeter of the second solution level；Control assembly for controlling flow, the control assembly is used for by described the
One densimeter and the concentration value of second densimeter output control the feeding pipe to flow into first preparation vessel and described
The stoste and/or pure water flow of second preparation vessel, second preparation vessel are connected with developing apparatus by the second pipeline, with
Second developer solution is set to flow to the developing apparatus.
2. developer solution dilution system as claimed in claim 1, it is characterised in that the original liquid concentration scope is 20% to 100%, control
Component processed controls the concentration range of first developer solution to be 2.38% ± 0.005%, the concentration range of second developer solution
For 2.38% ± 0.003%.
3. developer solution dilution system as claimed in claim 2, it is characterised in that the original liquid concentration is 25%.
4. developer solution dilution system as claimed in claim 1, it is characterised in that in first preparation vessel and second preparation vessel
It is also equipped with the agitating device for strengthening the developer solution dilution.
5. developer solution dilution system as claimed in claim 1, it is characterised in that also including for accelerating first developer solution to institute
The first liquid pump of the second preparation vessel flowing is stated, for the second liquid for accelerating second developer solution to be flowed to the developing apparatus
Pump, first liquid pump and the second liquid pump are located on corresponding first pipeline and second pipeline.
6. developer solution dilution system as claimed in claim 1, it is characterised in that first densimeter is located at first pipeline
On parallel pipeline, second densimeter is on the parallel pipeline of second pipeline.
7. the developer solution dilution system as described in claim 1 to 6 is any, it is characterised in that first densimeter and described
Second concentration is calculated as ultrasonic wave densimeter.
8. the developer solution dilution system as described in claim 1 to 6 is any, it is characterised in that first preparation vessel and described
Also include level gauging device in second preparation vessel.
9. a kind of developer solution dilution process, it is characterised in that comprise the following steps：
Stoste and pure water feeding pipe supply the stoste and pure water to the first preparation vessel；
The stoste and the pure water mixed diluting in first preparation vessel, obtain the first developer solution；
First developer solution flows to the second preparation vessel by the first pipeline；
First densimeter and the second densimeter measurement obtain the second developer solution of first developer solution and second preparation vessel
Concentration value；
According to first developer solution and second developer solution of first densimeter and second densimeter output
Concentration value, control assembly adjust the feeding pipe flow to first preparation vessel and second preparation vessel developer solution and/
Or pure water flow, obtain first developer solution and second developer solution of predetermined concentration.
10. developer solution dilution process as claimed in claim 9, the control assembly controls the concentration of first developer solution
Deviation value is more than the deviation value of second solution level.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710670198.8A CN107300838A (en) | 2017-08-08 | 2017-08-08 | Developer solution dilution system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710670198.8A CN107300838A (en) | 2017-08-08 | 2017-08-08 | Developer solution dilution system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107300838A true CN107300838A (en) | 2017-10-27 |
Family
ID=60133466
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710670198.8A Pending CN107300838A (en) | 2017-08-08 | 2017-08-08 | Developer solution dilution system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107300838A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109632571A (en) * | 2019-01-29 | 2019-04-16 | 深圳市华星光电半导体显示技术有限公司 | Solution level measuring device and method |
| CN109922640A (en) * | 2019-01-31 | 2019-06-21 | 武汉船用机械有限责任公司 | Circulating cooling system and electronic equipment |
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| CN1090522A (en) * | 1992-12-28 | 1994-08-10 | 住友化学工业株式会社 | The device for formulating of developer solution and method |
| CN1379285A (en) * | 2001-02-06 | 2002-11-13 | 株式会社平间理化研究所 | Manufacturing device and method of refined developing liquid |
| CN1441321A (en) * | 2002-02-27 | 2003-09-10 | 三菱化学工程株式会社 | Development liquid supply device |
| CN1928720A (en) * | 2005-09-06 | 2007-03-14 | 东京应化工业株式会社 | Photoresist liquid feeding device and modified set using same |
| CN102109776A (en) * | 2011-03-18 | 2011-06-29 | 常州瑞择微电子科技有限公司 | Process for developing photoresist, and device thereof |
| CN202052476U (en) * | 2011-03-25 | 2011-11-30 | 上海松下等离子显示器有限公司 | Automatic preparation and delivery device for developing mother solution |
| CN106371295A (en) * | 2015-07-22 | 2017-02-01 | 株式会社平间理化研究所 | Developing solution managing method and apparatus |
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2017
- 2017-08-08 CN CN201710670198.8A patent/CN107300838A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1090522A (en) * | 1992-12-28 | 1994-08-10 | 住友化学工业株式会社 | The device for formulating of developer solution and method |
| CN1379285A (en) * | 2001-02-06 | 2002-11-13 | 株式会社平间理化研究所 | Manufacturing device and method of refined developing liquid |
| CN1441321A (en) * | 2002-02-27 | 2003-09-10 | 三菱化学工程株式会社 | Development liquid supply device |
| CN1928720A (en) * | 2005-09-06 | 2007-03-14 | 东京应化工业株式会社 | Photoresist liquid feeding device and modified set using same |
| CN102109776A (en) * | 2011-03-18 | 2011-06-29 | 常州瑞择微电子科技有限公司 | Process for developing photoresist, and device thereof |
| CN202052476U (en) * | 2011-03-25 | 2011-11-30 | 上海松下等离子显示器有限公司 | Automatic preparation and delivery device for developing mother solution |
| CN106371295A (en) * | 2015-07-22 | 2017-02-01 | 株式会社平间理化研究所 | Developing solution managing method and apparatus |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109632571A (en) * | 2019-01-29 | 2019-04-16 | 深圳市华星光电半导体显示技术有限公司 | Solution level measuring device and method |
| CN109922640A (en) * | 2019-01-31 | 2019-06-21 | 武汉船用机械有限责任公司 | Circulating cooling system and electronic equipment |
| CN109922640B (en) * | 2019-01-31 | 2020-06-16 | 武汉船用机械有限责任公司 | Circulation cooling system and electronic equipment |
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