CN107272329B

CN107272329B - Mask plate cleaning device

Info

Publication number: CN107272329B
Application number: CN201710662008.8A
Authority: CN
Inventors: 裴龙
Original assignee: Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
Current assignee: Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
Priority date: 2017-08-04
Filing date: 2017-08-04
Publication date: 2020-12-25
Anticipated expiration: 2037-08-04
Also published as: CN107272329A

Abstract

The invention discloses a mask plate cleaning device which comprises an adsorption cylinder, wherein a suction nozzle is arranged at the first end of the adsorption cylinder, the adsorption cylinder is communicated with a suction device through a gas pipe, a rotating motor and a blade are arranged in the adsorption cylinder, the blade is connected to a rotating shaft of the rotating motor, and the blade is positioned in the adsorption cylinder and is adjacent to the suction nozzle. The mask plate cleaning device is used for sucking the main body of the wool-like foreign matter into the suction nozzle of the adsorption cylinder body through adsorption action aiming at the wool-like foreign matter adhered to the mask plate, cutting the wool-like foreign matter from the mask plate through the rotation cutting of the blade, and finally adsorbing and removing the cut foreign matter, so that the wool-like foreign matter such as hair, cotton, wool, fiber and the like adhered to the mask plate can be effectively removed.

Description

Mask plate cleaning device

Technical Field

The invention relates to the technical field of OLED display manufacturing, in particular to a mask cleaning device.

Background

OLED display devices may be classified into PM-OLEDs (passive OLEDs) and AM-OLEDs (active OLEDs) according to driving types; the following mainly resolves the AM-OLED process; the AM-OLED process can be divided into three major processes, wherein the first section is the process of the array substrate, and the second section is the OLED evaporation packaging process; the third section is the display module process of bonding aging. The OLED evaporation packaging process comprises an evaporation process for aligning a plurality of substrates and a mask plate, and a plurality of organic layers and inorganic layers of the OLED are manufactured through evaporation respectively.

In the process of aligning the substrate and the mask, attention must be paid to whether the opening of the mask is hollow, and if foreign matters exist in the opening of the mask, the manufactured OLED has poor pixels and causes poor results. Most foreign impurities on the mask can be removed by cleaning and laser repair, but the wool-like foreign matters on the mask and the mask have high viscosity, and the absorption to the laser is low, so that the foreign matters are difficult to remove;

the foreign matters of the wool-like impurities on the mask plate usually comprise micro dust particles, hair, cotton threads, wool, fibers and other wool-like foreign matters, the micro dust particles can be cleaned and removed by using a blowing or suction device, and the traditional blowing or suction device has poor clear effect and is easy to be attached to different positions again. Aiming at the wool-like foreign matters, a needle suction pipe is used for adsorption and removal in the prior art, but the adsorption force of the needle suction pipe is difficult to control, if the suction force of the needle is too weak, the adsorption capacity is low, and the effective adsorption effect of the wool-like foreign matters cannot be achieved; if the suction force of the needle is too strong, the mask may be deformed. Moreover, the wool-like foreign bodies are not simply attached to the mask but adhered to the mask, a large adhesive force may exist between the wool-like foreign bodies and the mask, and the wool-like foreign bodies are strongly absorbed by the needle suction tube, so that the mask is easily stressed, the mask is deformed, and the mask is damaged.

Disclosure of Invention

In view of the defects in the prior art, the invention provides a mask cleaning device which can effectively remove hair, cotton threads, wool, fibers and other wool foreign matters adhered on the mask, avoid the mask from deforming and effectively protect the mask in the cleaning process.

In order to achieve the purpose, the invention adopts the following technical scheme:

the utility model provides a mask version cleaning device, includes the absorption barrel, the first end of absorption barrel is provided with the suction nozzle, the absorption barrel passes through trachea and getter device fluid intercommunication, wherein, be provided with rotating electrical machines and blade in the absorption barrel, the blade is connected on rotating electrical machines's the rotation axis, the blade is located in the absorption barrel and be close to in the suction nozzle.

Specifically, the perpendicular distance between the blade and the end face where the suction nozzle is located is 0-2 mm.

Specifically, the number of the blades is multiple, and the blades are circumferentially and symmetrically connected to the rotating shaft.

In particular, the number of blades is 2 or 3.

Specifically, the adsorption cylinder is of a cylindrical structure, and the diameter of the adsorption cylinder is 5-10 mm.

In particular, the getter device is a vacuum pump.

Specifically, the mask plate cleaning device further comprises a fixed base and a support frame which is relatively positioned above the fixed base, the fixed base is used for bearing the mask plate to be cleaned, and the adsorption cylinder is connected to the support frame through a limiting mechanism; the limiting mechanism is used for driving the adsorption cylinder to move above the fixed base along the height direction and limiting the movement stroke, so that the distance between the suction nozzle and the mask is not less than the preset safety distance.

Specifically, the safe distance is 1-2 mm.

The mask plate cleaning device comprises an adsorption cylinder, a suction nozzle, a mask plate cleaning device and a control module, wherein the adsorption cylinder is used for sucking the mask plate, the mask plate cleaning device comprises a suction nozzle, a mask plate cleaning device and a control module, the control module is used for controlling the suction nozzle to clean the mask plate, and the height sensor is connected to the first end of the adsorption cylinder and used for detecting the distance between the suction nozzle and the mask plate in real; if the distance detected in real time is smaller than the safe distance, the control module respectively sends control signals to the air suction device and the rotating motor to control the air suction device to stop sucking air and control the rotating motor to stop rotating.

Specifically, the number of the height sensors is two, and the two height sensors are located on two opposite sides of the suction nozzle.

According to the mask cleaning device provided by the embodiment of the invention, the blade is arranged in the adsorption cylinder, and aiming at the wool-like foreign matters adhered on the mask, the main body of the wool-like foreign matters is firstly absorbed into the suction nozzle of the adsorption cylinder through the adsorption effect, then the wool-like foreign matters are cut off from the mask through the rotary cutting of the blade, and finally the cut foreign matters are adsorbed and removed, so that the wool-like foreign matters such as hair, cotton, wool, fibers and the like adhered on the mask can be effectively removed, the mask can be prevented from deforming in the cleaning process, and the mask is effectively protected.

Drawings

FIG. 1 is a schematic structural diagram of a reticle cleaning apparatus provided in an embodiment of the present invention;

fig. 2 is an enlarged schematic view of a portion a in fig. 1.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention are described in detail below with reference to the accompanying drawings. Examples of these preferred embodiments are illustrated in the accompanying drawings. The embodiments of the invention shown in the drawings and described in accordance with the drawings are exemplary only, and the invention is not limited to these embodiments.

It should be noted that, in order to avoid obscuring the present invention with unnecessary details, only the structures and/or processing steps closely related to the scheme according to the present invention are shown in the drawings, and other details not so relevant to the present invention are omitted.

The embodiment provides a mask cleaning device, as shown in fig. 1 and 2, the mask cleaning device includes a fixed base 1, a support frame 2 located above the fixed base 1 relatively, and an adsorption cylinder 3. The fixed base 1 is used for bearing a mask 4 to be cleaned, the adsorption cylinder 3 is connected to the support frame 2, and the support frame 2 supports the adsorption cylinder 3 above the fixed base 1.

Wherein, the first end towards the mask 4 of the absorption cylinder 3 is provided with a suction nozzle 31, and the absorption cylinder 3 is communicated with the suction device 5 through a gas pipe 51. When foreign matters are attached to the mask 4, the suction nozzle 31 of the adsorption cylinder 3 is aligned to the foreign matters, then the suction device 5 is controlled to suck air, and at the moment, if the foreign matters are simply attached (non-adhered) to the mask 4, the foreign matters are sucked into the adsorption cylinder 3, so that the effect of cleaning the mask 4 is achieved. In the present embodiment, the suction device 5 is a vacuum pump.

Further, a rotary motor 6 and a blade 7 are arranged in the adsorption cylinder 3, the blade 7 is connected to a rotary shaft 61 of the rotary motor 6, and the blade 7 is located in the adsorption cylinder 3 and adjacent to the suction nozzle 31. For the wool-like foreign matter adhered on the mask plate 4, for example, the wool-like foreign matter such as hair, cotton, wool, fiber and the like, firstly, the main body of the wool-like foreign matter is sucked into the suction nozzle 31 of the suction cylinder 3 by the suction action of the suction device 5, then the wool-like foreign matter is cut off from the mask plate 4 by the rotary cutting of the blade 7, and finally, the cut foreign matter is removed by the suction action of the suction device 5.

For the wool-like foreign matter adhered on the mask 4, the mask cleaning device provided by the above embodiment, instead of providing strong adsorption and detachment through the air suction device 5, selects to use a smaller adsorption force so that the free part (non-adhesion part) of the wool-like foreign matter extends into the suction nozzle 31 of the adsorption cylinder 3, and then cuts and detaches the wool-like foreign matter extending into the suction nozzle 31 from the mask 4 through the blade 7. Therefore, the wool-like foreign bodies adhered to the mask plate 4 can be effectively removed, the mask plate 4 is prevented from deforming due to strong adsorption and separation in the cleaning process, and the mask plate 4 is effectively protected.

In the present embodiment, the suction cylinder 3 has a cylindrical structure, thereby more conveniently assembling the rotating electric machine 6 and the blade 7. Specifically, the diameter of the adsorption cylinder 3 can be set within the range of 5-10 mm, and the size of the blade 7 can be selected according to the diameter of the adsorption cylinder 3.

The number of the blades 7 may be plural, and the plural blades 7 are circumferentially symmetrically connected to the rotating shaft 61. Specifically, in the present embodiment, the number of the blades 7 is 2, and in another preferred embodiment, the number of the blades 7 may also be set to 3.

In order to avoid the blade 7 from contacting the mask 4 to scratch the mask 4, the blade 7 may not extend from the suction nozzle 31, and the blade 7 may be flush with the end surface where the suction nozzle 31 is located or may be accommodated in the suction nozzle 31, but the blade 7 is prevented from being too far away from the end surface where the suction nozzle 31 is located. As shown in fig. 2, it is preferable that a vertical distance H between the blade 7 and an end surface where the suction nozzle 31 is located is set to be 0 to 2mm, and when H is 0, the blade 7 is flush with the end surface where the suction nozzle 31 is located.

In the present embodiment, referring to fig. 1 and 2, the adsorption cylinder 3 is connected to the support frame 2 through a limiting mechanism 8. The limiting mechanism 8 is used for driving the adsorption cylinder 3 to move above the fixed base 1 along the height direction and limiting the movement stroke of the adsorption cylinder, so that the distance L between the suction nozzle 31 and the mask 4 is not less than a preset safety distance. Wherein, safe distance can set up to 1 ~ 2 mm.

Further, referring to fig. 1 and 2, the reticle cleaning apparatus in this embodiment further includes a control module 9 and a height sensor 10, the height sensor 10 is connected to the first end of the adsorption cylinder 3, and the height sensor 10 is configured to detect a distance L between the suction nozzle 31 and the reticle 4 in real time and feed back a detected value to the control module 9. The control module 9 is further in signal connection with the air suction device 5 and the rotating motor 6, and if the distance L of real-time detection fed back from the height sensor 10 is smaller than the safety distance, the control module 10 sends control signals to the air suction device 5 and the rotating motor 6 respectively to control the air suction device 5 to stop sucking air and control the rotating motor 6 to stop rotating. Thereby preventing damage to the reticle 4 caused by the suction action and the rotary cutting action when the distance L between the suction nozzle 31 and the reticle 4 is smaller than a safety distance. After the spacing L is adjusted by the limiting mechanism 8 to be restored to the safe distance, the suction device 5 and the rotating motor 6 are controlled again to start corresponding actions.

Specifically, in the present embodiment, as shown in fig. 1, the number of the height sensors 10 is two, and two of the height sensors 10 are located on opposite sides of the suction nozzle 31.

The mask plate cleaning device provided by the embodiment is characterized in that the adsorption cylinder is internally provided with the blade, and aiming at the wool-like foreign matters adhered to the mask plate, the main body of the wool-like foreign matters is firstly sucked into the suction nozzle of the adsorption cylinder through adsorption, then the wool-like foreign matters are cut off from the mask plate through the rotation cutting of the blade, and finally the cut foreign matters are adsorbed and removed, so that the wool-like foreign matters such as hair, cotton, wool, fiber and the like adhered to the mask plate can be effectively removed, and in the cleaning process, the mask plate can be prevented from deforming, and the mask plate is effectively protected.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.

The foregoing is directed to embodiments of the present application and it is noted that numerous modifications and adaptations may be made by those skilled in the art without departing from the principles of the present application and are intended to be within the scope of the present application.

Claims

1. A mask plate cleaning device comprises an adsorption cylinder body, wherein a first end of the adsorption cylinder body is provided with a suction nozzle, and the adsorption cylinder body is communicated with a suction device through a gas pipe;

the mask plate cleaning device further comprises a fixed base and a support frame which is relatively positioned above the fixed base, the fixed base is used for bearing the mask plate to be cleaned, and the adsorption cylinder body is connected to the support frame through a limiting mechanism; the limiting mechanism is used for driving the adsorption cylinder to move above the fixed base along the height direction and limiting the movement stroke, so that the distance between the suction nozzle and the mask is not less than the preset safety distance.

2. The mask cleaning device according to claim 1, wherein the blade is perpendicular to the end surface of the suction nozzle by 0-2 mm.

3. The reticle cleaning device of claim 1, wherein the number of the blades is plural, and the plural blades are circumferentially symmetrically connected to the rotating shaft.

4. The reticle cleaning apparatus of claim 3, wherein the number of blades is 3.

5. The mask plate cleaning device according to claim 1, wherein the adsorption cylinder is of a cylindrical structure, and the diameter of the adsorption cylinder is 5-10 mm.

6. The reticle cleaning apparatus of claim 1, wherein the suction device is a vacuum pump.

7. The reticle cleaning device of claim 6, wherein the safety distance is 1-2 mm.

8. The mask cleaning device according to claim 6, further comprising a control module and a height sensor, wherein the height sensor is connected to the first end of the adsorption cylinder, and is used for detecting the distance between the suction nozzle and the mask in real time and feeding a detection value back to the control module; if the distance detected in real time is smaller than the safe distance, the control module respectively sends control signals to the air suction device and the rotating motor to control the air suction device to stop sucking air and control the rotating motor to stop rotating.

9. The reticle cleaning device of claim 8, wherein the number of height sensors is two, two of the height sensors being located on opposite sides of the suction nozzle.