CN107102518A - The flexible platform that high accuracy applied to near-field scan photoetching is passively aligned - Google Patents
The flexible platform that high accuracy applied to near-field scan photoetching is passively aligned Download PDFInfo
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- CN107102518A CN107102518A CN201710495565.5A CN201710495565A CN107102518A CN 107102518 A CN107102518 A CN 107102518A CN 201710495565 A CN201710495565 A CN 201710495565A CN 107102518 A CN107102518 A CN 107102518A
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- Prior art keywords
- table top
- end table
- substrate
- flexible
- mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7038—Alignment for proximity or contact printer
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Prostheses (AREA)
Abstract
The invention discloses the flexible platform that a kind of high accuracy applied to near-field scan photoetching is passively aligned, including upper end table top, lower end table top, substrate, connected between upper end table top and lower end table top by biorthogonal flexible hinge, mask is adsorbed on the table top of lower end by vacuum suction chamber, then is placed in substrate.Biorthogonal flexible hinge includes two orthogonal positive round flexible hinges.In running, certain normal pressure is provided from mask plate, substrate contact on face, through the scattered transmission of each hinge in part, so that being fixed on the mask of lower end table top and the substrate of bottom realizes dynamic, passive close contact, it is effectively improved the alignment efficiency of lithographic equipment, due in the absence of excessive photoelectric sensor, most can quickly realize passive alignment under conditions of alignment precision is not lost.
Description
Technical field
It is applied to closely the present invention relates to mask and the alignment device of substrate in a kind of near-field scan photoetching, more particularly to one kind
The flexible platform that the high accuracy of field scan photoetching is passively aligned.
Background technology
In the alignment methods of prior art, it is generally adopted by aiding in some photoelectricities or dynamics on mask plate
Sensor, the information transmitted in real time by sensor obtains the alignment case of mask and substrate, and passes through what these fed back
The calibration mask or substrate of information active again are more satisfactory to alignment request to reach.This is cumbersome therebetween, and cost is higher, and
Secondary interference is possible to, is unfavorable for efficient, real-time calibration.Furthermore, it is contemplated that applying the requirement in near-field scan photoetching, have
Necessity provides a kind of improved automatic technique of alignment for lithographic equipment.
In scanning photoetching, the effective working distance of scanning antenna could not temporarily break through 50nm, therefore in a photolithographic process
Need to ensure closely contact；The figure line width only 20-50nm of photoetching is scanned, it is necessary to require that photoetching head can not in scanning process
There is obvious displacement；The substrate of scanning lithographic equipment is still photoresist, it is necessary to which what is produced as far as possible after reduction contact is relative
Friction, reduces the damage that friction is brought to photoresist surface, influences the final mass of photoetching.
The content of the invention
It is an object of the invention to provide the flexible platform that a kind of high accuracy applied to near-field scan photoetching is passively aligned.
The purpose of the present invention is achieved through the following technical solutions：
The flexible platform being passively aligned applied to the high accuracy of near-field scan photoetching of the present invention, including upper end table top, lower end
Table top, substrate, are connected, mask passes through vacuum suction chamber between the upper end table top and lower end table top by biorthogonal flexible hinge
Absorption is on the lower end table top, then places on the substrate.
As seen from the above technical solution provided by the invention, it is provided in an embodiment of the present invention to be applied to near-field scan light
In the flexible platform that the high accuracy at quarter is passively aligned, running, certain normal pressure is from mask plate with being given on substrate contact face
Go out, through the scattered transmission of each hinge in part so that be fixed on the mask of lower end table top and the substrate of bottom realize it is dynamic
State, passive close contact, is effectively improved the alignment efficiency of lithographic equipment, due in the absence of excessive photoelectric sensing
Device, most can quickly realize passive alignment under conditions of alignment precision is not lost.
Brief description of the drawings
Fig. 1 a and Fig. 1 b be respectively realized by compliant member in the embodiment of the present invention before the alignment of passive alignment function and
Schematic diagram after alignment；
Fig. 2 is positive round flexible hinge schematic diagram in the embodiment of the present invention；
Fig. 3 is the biorthogonal flexible hinge schematic diagram in the embodiment of the present invention；
Fig. 4 shows for the entirety of the flexible platform being passively aligned applied to the high accuracy of near-field scan photoetching of the embodiment of the present invention
It is intended to；
Fig. 5 a are the compliant member platform and vacuum suction block (unit of gridding in the embodiment of the present invention：mm)；
Fig. 5 b are that the triaxiality deformation of compliant member when external force puts on platform block edge in the embodiment of the present invention is (single
Position：nm)；
Fig. 5 c are the displacement (unit of lower end table top in X direction in the embodiment of the present invention：nm)；
Fig. 5 d are the displacement (unit in the embodiment of the present invention along Z-direction：nm).
In figure：
Upper end table top 1., biorthogonal flexible hinge 2., lower end table top 3., vacuum suction chamber 4., mask 5., substrate 6..
Embodiment
With reference to the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Ground is described, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.Based on this
The embodiment of invention, the every other implementation that those of ordinary skill in the art are obtained under the premise of creative work is not made
Example, belongs to protection scope of the present invention.
The flexible platform being passively aligned applied to the high accuracy of near-field scan photoetching of the present invention, its preferably specific embodiment party
Formula is：
Including upper end table top, lower end table top, substrate, biorthogonal flexible hinge is passed through between the upper end table top and lower end table top
Chain is connected, and mask is adsorbed on the lower end table top by vacuum suction chamber, then is placed on the substrate.
The biorthogonal flexible hinge includes two orthogonal positive round flexible hinges.
Pass through biorthogonal flexible hinge and part Dan Yuan respectively between four corners of the upper end table top and lower end table top
Post hinge connection.
In existing scanning photoetching technique, it is ensured that the alignment of mask plate and substrate is the most important thing.Light need to be ensured during design
The center that head pivot point is constantly in mask plate is carved, prevents that the position of mask plate is produced with substrate in passive alignment procedures
Relative displacement.
As shown in Figure 1 a, 1 b, the flexible platform being passively aligned applied to the high accuracy of near-field scan photoetching of the invention, leads to
Cross that part is less to reverse firm power, it is allowed to which mask can be finely tuned voluntarily after less normal direction pressure, realize mask plate and substrate
Automatic alignment and close contact；By the lateral rigidity that part is larger, mask stablizing relatively in whole alignment procedures is realized.
Design requirement in present invention specific implementation：
(1) photoetching head should try one's best in scanning process avoids lateral displacement, is particularly due to displacement caused by alignment procedures.
The Line-width precision being previously mentioned in scanning photoetching process can reach tens nanometer scales, therefore any deflection can all cause photoetching
Head and then have impact on photoresist surface quality in the friction of substrate.If photoetching head is designed to a rigid solid structure, then
Photoetching head is deflecting 0.0005 radian (away from center 10mm), will also cause 5um offset, this will have a strong impact on photoetching matter
Amount.
(2) in scanning process, the device can realize passive alignment function.Due to the effective working distance of photoetched antenna
Less than 50nm, therefore need in contact the non-aligned ability of certain compensation.When being rotated in this programme using structure
The deformation of generation, effectively compensate for this non-aligned misalignment rate.
The main hinge by upper end table top, lower end table top and centre of the invention, which is connected, to be constituted, and each hinge fraction is again by two
Individual orthogonal positive round flexible hinge composition.In running, certain normal pressure is provided from mask plate, substrate contact on face,
Through the scattered transmission of each hinge in part, so that being fixed on the mask of lower end table top and the substrate realization dynamic of bottom
, passive close contact.
Because each circular hinges have an one degree of freedom, the circular hinges of two orthogonal linkings can be to cause whole table top to exist
Plane passive alignment is done (respectively along two hinge axis) in one plane, to remain secured to the tight of lower surface mask and substrate
Contiguity is touched；And in the direction perpendicular to two hinge axis, due to the lateral rigidity that hinge is larger, then lower surface mask can be kept
Larger relative displacement will not be produced because hinge member is reversed between substrate, realize that mask is steady in whole scanning process
It is fixed.
The present invention has following significant advantage relative to the general Mechanical Contact part near field photolithography：
(1) it is less in hinge to reverse firm power, it is allowed to which that mask is finely tuned under less normal pressure, facilitates mask plate and base
The close contact and alignment at bottom；
(2) larger lateral rigidity in hinge, keeps stabilization of the mask in whole scanning process, will not be with contacting between substrate
Produce too big relative displacement.
2 points of the above ensure that compliant member of the present invention to being in close contact and the feasibility calibrated automatically, also, its quilt
Dynamic calibrating mode also allows it to have outstanding anti-external disturbance ability.
Compared with existing other technologies, the present invention is effectively improved the alignment efficiency of lithographic equipment, due in the absence of
Excessive photoelectric sensor, most can quickly realize passive alignment under conditions of alignment precision is not lost.
As shown in Fig. 2 there is the less firm power of torsion about the z axis, in hinge；And then have greatly side in Y-axis, hinge
To rigidity.
Fig. 2 characterizes the elastic stiffness coefficient k=M for determining hinge2/α2, the torque that Mz signs are produced around z-axis, α2It is rotation
Angle.
To ensure the necessary displacement produced under normal load, this torsional rigidity should be as small as possible.
As shown in figure 3, the width b of this two layers of circular hinges is respectively 22mm and 42mm.
Stiffness coefficient can be provided by empirical equation (Schotborgh ' s formula)：
In Fig. 3, circular hinges radius R and thickness t difference values 1.5mm and 0.4mm.
Under external force f effects, the rotation at each link is by formulaDetermine, wherein doff is to cover
Film contacts the lateral displacement produced with substrate tilt.
As shown in figure 4, should be to be in close contact during for each component working, for visual effect, that is specially drawn divides
From；During work, 4. 3. compliant member lower surface be fixed as one with vacuum suction chamber, and with mask 5. then by vacuumize with
Vacuum suction chamber 4. fix by lower end.
It is that compliant member passively closely show by calibration finite element method (FEA) simulation as shown in Fig. 5 a, Fig. 5 b, Fig. 5 c, Fig. 5 d
It is intended to.
The displacement that mask plate is produced during for simulating the non-ideal coincidence under external force effect.
Specific embodiment：
Fig. 3 is double-strand chain modular construction improved, suitable for lithography alignment, public by the Schotborgh ' s of experience
Formula can choose suitable circle row hinge width b, curvature R and thickness t, to meet rigidity requirement.
In the embodiment shown in fig. 4, whole compliant member by upper end table top 1., biorthogonal flexible hinge 2., lower end table top
3. and other connecting rods constitute, when there is load pressure 3. to apply from lower end table top, via each improved flexible hinge 2. and
Connecting rod is transmitted, disperseed on 3.；Mask 5. by vacuum suction chamber 4. adsorb compliant member lower end table top 3. on.
In Fig. 1 a illustrated embodiments, when placing at the beginning, mask 5. with substrate 6. between and not up to preferably closely connect
Touch；When external loading pressure by whole compliant member to transmission inside compliant member, scattered, finally realize mask 5. with substrate
6. the close contact between, as shown in Figure 1 b.
In Fig. 5 a to Fig. 5 d illustrated embodiments, in order to simulate the non-ideal coincidence under initial misalignment situation, Fig. 5 a mono-
The external force of 4N sizes is used for the edge of mask plate, and with the deformation (Fig. 5 b) under finite element method simulated strain, as a result shows
Show in the x and z directions, the displacement that mask plate is produced is both less than 5nm, and as shown in Fig. 5 c, Fig. 5 d, this can meet near field light
Carve the requirement being closely aligned with.In related near field photolithography experiment, whole system also works well, demonstrates the correctness of emulation,
It also demonstrate that the feasibility of whole part design.
The foregoing is only a preferred embodiment of the present invention, but protection scope of the present invention be not limited thereto,
Any one skilled in the art is in the technical scope of present disclosure, the change or replacement that can be readily occurred in,
It should all be included within the scope of the present invention.Therefore, protection scope of the present invention should be with the protection model of claims
Enclose and be defined.
Claims (3)
1. the flexible platform that a kind of high accuracy applied to near-field scan photoetching is passively aligned, it is characterised in that including upper end table top,
Lower end table top, substrate, are connected, mask is inhaled by vacuum between the upper end table top and lower end table top by biorthogonal flexible hinge
Attached chamber absorption is on the lower end table top, then places on the substrate.
2. the flexible platform that the high accuracy according to claim 1 applied to near-field scan photoetching is passively aligned, its feature exists
In the biorthogonal flexible hinge includes two orthogonal positive round flexible hinges.
3. the flexible platform that the high accuracy according to claim 1 or 2 applied to near-field scan photoetching is passively aligned, its feature
It is, the biorthogonal flexible hinge and part Dan Yuan is passed through respectively between four corners of the upper end table top and lower end table top
The combination connection of post hinge.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710495565.5A CN107102518B (en) | 2017-06-26 | 2017-06-26 | The flexible platform that high-precision applied to near-field scan photoetching is passively aligned |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710495565.5A CN107102518B (en) | 2017-06-26 | 2017-06-26 | The flexible platform that high-precision applied to near-field scan photoetching is passively aligned |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107102518A true CN107102518A (en) | 2017-08-29 |
| CN107102518B CN107102518B (en) | 2018-11-13 |
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| CN201710495565.5A Active CN107102518B (en) | 2017-06-26 | 2017-06-26 | The flexible platform that high-precision applied to near-field scan photoetching is passively aligned |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107664925A (en) * | 2017-11-15 | 2018-02-06 | 电子科技大学 | A kind of double-strand chain clamp structure to contact photolithography probe |
| CN108037638A (en) * | 2017-12-12 | 2018-05-15 | 中国科学院光电技术研究所 | Super resolution lithography method and device based on flexible hinge structure |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4746800A (en) * | 1986-03-27 | 1988-05-24 | Asm Lithography B.V. | Positioning device comprising a z-manipulator and a θ-manipulator |
| CN201017175Y (en) * | 2007-02-16 | 2008-02-06 | 上海微电子装备有限公司 | Large damping precision flexible supporting mechanism |
| CN102012642A (en) * | 2010-12-27 | 2011-04-13 | 中国科学院光电技术研究所 | Mask aligner vacuum exposure device |
| CN103062307A (en) * | 2012-12-19 | 2013-04-24 | 哈尔滨工业大学 | Eddy-current damping vibration isolator with coplace air flotation orthogonal decoupling and two-dimensional flexible hinge angle decoupling |
| CN104423171A (en) * | 2013-08-27 | 2015-03-18 | 上海微电子装备有限公司 | Flexible sucker |
| CN104570622A (en) * | 2015-02-10 | 2015-04-29 | 中国科学院光电技术研究所 | Proximity-type interval exposure workpiece table of photoetching machine |
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2017
- 2017-06-26 CN CN201710495565.5A patent/CN107102518B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4746800A (en) * | 1986-03-27 | 1988-05-24 | Asm Lithography B.V. | Positioning device comprising a z-manipulator and a θ-manipulator |
| CN201017175Y (en) * | 2007-02-16 | 2008-02-06 | 上海微电子装备有限公司 | Large damping precision flexible supporting mechanism |
| CN102012642A (en) * | 2010-12-27 | 2011-04-13 | 中国科学院光电技术研究所 | Mask aligner vacuum exposure device |
| CN103062307A (en) * | 2012-12-19 | 2013-04-24 | 哈尔滨工业大学 | Eddy-current damping vibration isolator with coplace air flotation orthogonal decoupling and two-dimensional flexible hinge angle decoupling |
| CN104423171A (en) * | 2013-08-27 | 2015-03-18 | 上海微电子装备有限公司 | Flexible sucker |
| CN104570622A (en) * | 2015-02-10 | 2015-04-29 | 中国科学院光电技术研究所 | Proximity-type interval exposure workpiece table of photoetching machine |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107664925A (en) * | 2017-11-15 | 2018-02-06 | 电子科技大学 | A kind of double-strand chain clamp structure to contact photolithography probe |
| CN108037638A (en) * | 2017-12-12 | 2018-05-15 | 中国科学院光电技术研究所 | Super resolution lithography method and device based on flexible hinge structure |
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| Publication number | Publication date |
|---|---|
| CN107102518B (en) | 2018-11-13 |
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