CN106801217B - A kind of insulation and thermal insulation and sealing structure of superconduction high field magnetic control sputtering cathode - Google Patents
A kind of insulation and thermal insulation and sealing structure of superconduction high field magnetic control sputtering cathode Download PDFInfo
- Publication number
- CN106801217B CN106801217B CN201710073591.9A CN201710073591A CN106801217B CN 106801217 B CN106801217 B CN 106801217B CN 201710073591 A CN201710073591 A CN 201710073591A CN 106801217 B CN106801217 B CN 106801217B
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- washer
- dewar
- yoke
- tetrafluoro
- pedestal
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- 238000004544 sputter deposition Methods 0.000 title claims abstract description 33
- 238000009413 insulation Methods 0.000 title claims abstract description 30
- 238000007789 sealing Methods 0.000 title claims abstract description 25
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 30
- 239000010935 stainless steel Substances 0.000 claims abstract description 30
- 239000011152 fibreglass Substances 0.000 claims abstract description 13
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 12
- 239000011521 glass Substances 0.000 claims abstract description 12
- 239000010959 steel Substances 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 229920002430 Fibre-reinforced plastic Polymers 0.000 claims abstract description 4
- 239000006261 foam material Substances 0.000 claims abstract description 4
- 239000003365 glass fiber Substances 0.000 claims abstract description 4
- 239000011229 interlayer Substances 0.000 claims abstract description 4
- 239000004020 conductor Substances 0.000 claims description 10
- 238000009434 installation Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 230000002964 excitative effect Effects 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16J—PISTONS; CYLINDERS; SEALINGS
- F16J15/00—Sealings
- F16J15/02—Sealings between relatively-stationary surfaces
- F16J15/06—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces
- F16J15/10—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with non-metallic packing
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
- F16L59/00—Thermal insulation in general
- F16L59/06—Arrangements using an air layer or vacuum
- F16L59/065—Arrangements using an air layer or vacuum using vacuum
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Containers, Films, And Cooling For Superconductive Devices (AREA)
- Physical Vapour Deposition (AREA)
Abstract
A kind of insulation and thermal insulation and sealing structure of superconduction high field magnetic control sputtering cathode, including superconducting coil (1), yoke, glass steel plate washer (5,6), Dewar, glass reinforced plastic sleeve (10), big tetrafluoro washer (11), stainless steel washer (12), small tetrafluoro washer (13) and cathode bracket (14)；It is supported and is insulated with glass steel plate washer (5,6) between superconducting coil (1) and Dewar end cap (7) and bottom yoke (4), Dewar pedestal (8) uses vacuum interlayer structure or filling-foam material to reduce thermal losses；It seals and insulate using big tetrafluoro washer (11) fitted seal circle between Dewar pedestal (8) and stainless steel washer (12), using fiberglass bolt or the fastening of the metal bolts with glass fibre reinforced plastic insulating casing between big tetrafluoro washer (11), stainless steel washer (12), small tetrafluoro washer (13) and Dewar pedestal (8)；It is sealed using sealing ring between stainless steel washer (12) and cathode bracket (14) and common metal bolt is used to fasten.
Description
Technical field
The present invention relates to a kind of magnetic control sputtering cathode, more particularly to a kind of insulation and thermal insulation of superconduction high field magnetic control sputtering cathode
And sealing structure.
Background technology
Magnetron sputtering is widely used in material film plating field, in order to explore optimal coating process, in Past 30 Years, and exploitation
Various magnetic control sputtering devices.High-intensity magnetic field magnetic control sputtering device is integrated in High-quality transparent conductive film and submicron order
There is apparent advantage compared to conventional magnetron sputter equipment in the manufacturing process of circuit.
Ishibashi has studied permanent magnetic strong magnetic field magnetic control sputtering device in nineteen ninety first, which can be lower
It discharges under cathode voltage, to obtain low-resistivity tin indium oxide (ITO) film.The reason of film resiativity reduces under high-intensity magnetic field
Being considered as high-intensity magnetic field can inhibit anion to bombard the high energy of deposition film.2003, Japan Nagoya university
Mizutani first proposed using the excitatory high-intensity magnetic field magnetic control sputtering device of superconduction block material, in low pressure, high voltage and long target
In the case of substrate spacing, magnetic charging is realized.2004, Hazama was had studied with the excitatory magnetron sputtering apparatus of superconducting block
The Cu thin film preparation processes of 200nm ranks are found in low air pressure, the target base spacing plasma heat radiation of length to the shadow of substrate
Very little is rung, the film for preparing high quality is conducive to.2007, Yamaguchi was prepared for the magnetic control sputtering device that superconducting block swashs
Optical mirror slip of the reflectivity up to 70%.2008, Ikuta heated in the case of system using superconduction magnetic control sputtering device in no substrate
ZnO transparent electrode thin films are adulterated for Ga, film resiativity is 4.7 × 10-4Ω cm, approached can practical application resistivity water
It is flat.2009, Chinese patent 200910093159.1 disclosed a kind of based on round and excitatory track type superconducting coil strong magnetic
Field planar megnetron sputtering device, 2014, Chinese patent 201410766299.1 disclosed superconducting intense magnetic field magnetic control sputtering cathode
Low-temperature cooling system.Above-mentioned patent proposes master-plan and the low-temperature cooling system of superconduction high field magnetic control sputtering cathode, to the greatest extent
Pipe in this way, due to superconduction magnetic control sputtering cathode particularity, the sealing problem under low-temperature insulation, thermal insulation and low temperature, relatively often
The magnetic control sputtering cathode for advising permanent magnetism and electromagnetic type is increasingly complex.Since cooled cryostat is directly connected to cathode power, voltage is usual
For minus hundreds of to negative upper kilovolt, but cathode bracket needs to be grounded, voltage zero, and superconducting magnet needs to connect power supply for magnet coils, electricity
Pressure is 0-10V, needs to carry out low temperature electric insulation and sealing, while low temperature between superconducting magnet, current feed and cooled cryostat
Also need to carry out low-temperature insulation and sealing between Dewar and cathode bracket, at the same realize low-temperature insulation and low temperature seal be one very
Complicated problem.In addition, since cooled cryostat temperature is very low, and cathode bracket is mounted on vacuum chamber, temperature is room temperature, is
Reduction heat loss by exhaust, it is also desirable to solve the problems, such as the adiabatic of cooled cryostat and cathode bracket.
Invention content
Present invention aim to address the superconducting magnet of superconduction high field magnetic control sputtering cathode, cooled cryostat and cathode bracket it
Between insulate, adiabatic and sealing problem, it is proposed that the insulating of a kind of superconduction magnetic control sputtering cathode, adiabatic and sealing structure.This hair
The bright superconducting intense magnetic field magnetic control sputtering device that can be used for circular flat and rectangle plane.
The technical solution adopted by the present invention is as follows：
A kind of insulation and thermal insulation and sealing structure of superconduction high field magnetic control sputtering cathode, by superconducting coil, inner yoke, outer magnetic
Yoke, bottom yoke, glass steel plate washer, Dewar end cap, Dewar pedestal, electrical conductor, glass reinforced plastic sleeve, big tetrafluoro washer, stainless steel
Washer, small tetrafluoro washer, cathode bracket are constituted.Outer yoke is located at the outside of inner yoke, and bottom yoke is located at the bottom of interior outer yoke,
Superconducting coil is installed between interior magnet yoke, outer yoke and bottom yoke；Dewar pedestal is located at the lower section of Dewar end cap, superconducting coil,
Inner yoke, outer yoke and bottom yoke are mounted in the space that Dewar end cap and Dewar pedestal surround；Big tetrafluoro washer is located at Dewar
The lower section of pedestal, stainless steel washer are located at the lower section of big tetrafluoro washer, and small tetrafluoro washer is mounted on the lower section of stainless steel washer, cloudy
Pole bracket is used to support magnetic control sputtering cathode mounted on the lower section of stainless steel washer, the outside of small tetrafluoro washer.
Since Dewar end cap is negative high potential, superconducting coil is low potential, therefore between superconducting coil and Dewar end cap,
And fiberglass pad support and insulation are respectively adopted between superconducting coil and bottom yoke, electrical conductor is drawn by Dewar pedestal,
Glass reinforced plastic sleeve is sleeved on outside electrical conductor, is insulated using glass reinforced plastic sleeve between electrical conductor and Dewar pedestal.Du
Watt pedestal uses vacuum interlayer structure or the structure of filling-foam material to reduce thermal losses, in order to use room temperature sealing structure
Carry out vacuum sealing.Since Dewar pedestal is negative high potential, stainless steel washer is zero potential, and big tetrafluoro washer is installed on Du
Watt between pedestal and stainless steel washer, big tetrafluoro washer upper and lower surface is provided with seal groove, and fitted seal circle is sealed and insulate,
Big tetrafluoro washer, stainless steel washer, the stacking of small tetrafluoro gasket layer put, and are provided with screw hole, big tetrafluoro washer, stainless steel washer, small
It is fastened using fiberglass bolt or the metal bolts with glass fibre reinforced plastic insulating casing between tetrafluoro washer and Dewar pedestal.Due to
Stainless steel washer and the same current potential of cathode bracket are sealed and common gold between stainless steel washer and cathode bracket using sealing ring
Belong to bolt fastening.
The insulation and thermal insulation and sealing structure for the superconduction high field magnetic control sputtering cathode that the present invention designs, can effectively solve superconduction
The sealing problem under low-temperature insulation, thermal insulation and low temperature between magnet, cooled cryostat and cathode bracket, to solve superconduction high field magnetic
The assembly of control sputter cathode and vacuum cavity provides key technology support.
Description of the drawings
Fig. 1 is the schematic diagram of superconduction high field magnetic control sputtering cathode；
Attachment structure schematic diagrams of the Fig. 2 between superconduction high field magnetic control sputtering cathode and cathode bracket.
Specific implementation mode
Below in conjunction with the drawings and specific embodiments, the invention will be further described.
Fig. 1 is superconduction high field magnetic control sputtering cathode schematic diagram of the present invention.As shown in Figure 1, superconduction high field magnetic control sputtering cathode
By superconducting coil 1, inner yoke 2, outer yoke 3, bottom yoke 4, the first glass steel plate washer 5, the second glass steel plate washer 6, Dewar end cap
7, Dewar pedestal 8, electrical conductor 9, glass reinforced plastic sleeve 10, big tetrafluoro washer 11, stainless steel washer 12, small tetrafluoro washer 13 and the moon
Pole bracket 14 is constituted.Outer yoke 3 is located at the outside of inner yoke 2, and bottom yoke 4 is located at the bottom of inner yoke 2 and outer yoke 3, superconduction
Coil 1 is installed between interior magnet yoke 2, outer yoke 3 and bottom yoke 4；Superconducting coil 1, inner yoke 2, outer yoke 3 and the bottom magnetic
Yoke 4 is mounted in the space that Dewar end cap 7 and Dewar pedestal 8 surround.
Attachment structure schematic diagrams of the Fig. 2 between superconduction high field magnetic control sputtering cathode and cathode bracket.As shown in Fig. 2, big
Tetrafluoro washer 11 is located at the lower section of Dewar pedestal 8, and stainless steel washer 12 is located at the lower section of big tetrafluoro washer 11, small tetrafluoro washer 13
Mounted on the lower section of stainless steel washer 12, cathode bracket 14 be mounted on the lower section of stainless steel washer 12, small tetrafluoro washer 13 it is outer
Portion is used to support magnetic control sputtering cathode.
Since Dewar end cap 7 is negative high potential, superconducting coil 1 is low potential, therefore superconducting coil 1 and Dewar end cap 7
Between using the first glass steel plate washer 5 support and insulate, between superconducting coil 1 and bottom yoke 4 use the second glass steel plate washer 6
Support and insulation.Electrical conductor 9 is drawn by Dewar pedestal 8, and glass reinforced plastic sleeve 10 is sleeved on the outside of electrical conductor 9, electrical conductor 9
It is insulated using glass reinforced plastic sleeve 10 between Dewar pedestal 8.Dewar pedestal 8 uses vacuum interlayer structure or filling-foam material
The structure of material is to reduce thermal losses, to carry out vacuum sealing using room temperature sealing structure.Since Dewar pedestal 8 is negative height electricity
Position, stainless steel washer 12 are zero potential, and big tetrafluoro washer 11 is mounted between Dewar pedestal 8 and stainless steel washer 12, big by four
11 upper and lower surface of fluorine washer is provided with seal groove, and fitted seal circle is sealed and insulate.Big tetrafluoro washer 11, stainless steel washer
12, small tetrafluoro washer 13 stacks layer by layer, and is provided with screw hole, big tetrafluoro washer 11, stainless steel washer 12, small tetrafluoro washer 13 and Du
It is fastened using fiberglass bolt or the metal bolts with glass fibre reinforced plastic insulating casing between watt pedestal 8.Due to stainless steel washer
12 with 14 same current potential of cathode bracket, be sealed using sealing ring and use general between stainless steel washer 12 and cathode bracket 14
Logical metal bolts fastening.
The insulation and thermal insulation and sealing structure of superconduction high field magnetic control sputtering cathode of the present invention are suitable for circular flat magnetron sputtering
Cathode and rectangle plane magnetron sputtering cathode.
Claims (2)
1. a kind of insulation and thermal insulation and sealing structure of superconduction high field magnetic control sputtering cathode, it is characterised in that：The superconduction high field
The insulation and thermal insulation of magnetic control sputtering cathode and sealing structure by superconducting coil (1), inner yoke (2), outer yoke (3), bottom yoke (4),
First glass steel plate washer (5), the second glass steel plate washer (6), Dewar end cap (7), Dewar pedestal (8), electrical conductor (9), glass
Steel sleeve (10), big tetrafluoro washer (11), stainless steel washer (12), small tetrafluoro washer (13) and cathode bracket (14) are constituted；
Outer yoke (3) is located at the outside of inner yoke (2), and bottom yoke (4) is located at the bottom of inner yoke (2) and outer yoke (3), superconducting coil
(1) between installation interior magnet yoke (2), outer yoke (3) and bottom yoke (4)；The superconducting coil (1), inner yoke (2), outer magnetic
Yoke (3) and bottom yoke (4) are mounted in the space that Dewar end cap (7) and Dewar pedestal (8) surround；Big tetrafluoro washer (11) is located at
The lower section of Dewar pedestal (8), stainless steel washer (12) are located at the lower section of big tetrafluoro washer (11), and small tetrafluoro washer (13) is mounted on
The lower section of Dewar pedestal (8)；Cathode bracket (14) be mounted on the lower section of stainless steel washer (12), small tetrafluoro washer (13) it is outer
Portion is used to support magnetic control sputtering cathode；It is supported using the first glass steel plate washer (5) between superconducting coil (1) and Dewar end cap (7)
And insulation, superconducting coil (1) and between bottom yoke (4) using the second glass steel plate washer (6) support and insulate, electrical conductor
(9) it is insulated using glass reinforced plastic sleeve (10) between Dewar pedestal (8)；Dewar pedestal (8) using vacuum interlayer structure or
Filling-foam material, to reduce thermal losses, convenient for carrying out vacuum sealing using room temperature sealing structure.
2. the insulation and thermal insulation and sealing structure of superconduction high field magnetic control sputtering cathode as described in claim 1, it is characterised in that：Institute
It is sealed and absolutely using big tetrafluoro washer (11) fitted seal circle between the Dewar pedestal (8) stated and stainless steel washer (12)
Edge uses fiberglass spiral shell between big tetrafluoro washer (11), stainless steel washer (12), small tetrafluoro washer (13) and Dewar pedestal (8)
Bolt or metal bolts with glass fibre reinforced plastic insulating casing are fastened；Using close between stainless steel washer (12) and cathode bracket (14)
Seal is sealed and common metal bolt is used to fasten.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710073591.9A CN106801217B (en) | 2017-02-10 | 2017-02-10 | A kind of insulation and thermal insulation and sealing structure of superconduction high field magnetic control sputtering cathode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710073591.9A CN106801217B (en) | 2017-02-10 | 2017-02-10 | A kind of insulation and thermal insulation and sealing structure of superconduction high field magnetic control sputtering cathode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106801217A CN106801217A (en) | 2017-06-06 |
| CN106801217B true CN106801217B (en) | 2018-11-13 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710073591.9A Expired - Fee Related CN106801217B (en) | 2017-02-10 | 2017-02-10 | A kind of insulation and thermal insulation and sealing structure of superconduction high field magnetic control sputtering cathode |
Country Status (1)
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| CN (1) | CN106801217B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108149209B (en) * | 2017-12-26 | 2019-12-20 | 中国科学院电工研究所 | Combined type magnetron sputtering cathode |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1184880A (en) * | 1982-11-18 | 1985-04-02 | Kovilvila Ramachandran | Sputtering apparatus and method |
| JPH04143269A (en) * | 1990-10-04 | 1992-05-18 | Fujitsu Ltd | Target |
| CN1245534C (en) * | 2002-04-16 | 2006-03-15 | 北京科技大学 | Non-magentic shielding type ferromagnetic target as sputter cathode |
| CN101719457B (en) * | 2009-09-25 | 2012-05-30 | 中国科学院电工研究所 | Superconducting coil-based high-intensity magnetic field magnetic control sputtering cathode |
| CN102420091B (en) * | 2011-11-24 | 2014-07-30 | 中国科学院电工研究所 | Composite magnetic control sputtering cathode |
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Granted publication date: 20181113 |