CN106770335B - A kind of position phase defect detecting system and method based on reflection type point diffraction interferometer - Google Patents
A kind of position phase defect detecting system and method based on reflection type point diffraction interferometer Download PDFInfo
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- CN106770335B CN106770335B CN201710123331.8A CN201710123331A CN106770335B CN 106770335 B CN106770335 B CN 106770335B CN 201710123331 A CN201710123331 A CN 201710123331A CN 106770335 B CN106770335 B CN 106770335B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
- G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
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Abstract
The invention discloses a kind of position phase defect detecting system and method based on reflection type point diffraction interferometer.The system includes: point light source, phase acquisition component and image-forming assembly；Method are as follows: use optical fiber laser to generate a standard spherical wave as point light source first, which forms plane wave by collimation lens, then obtains its phase defect information through optical element to be measured using the parallel wave；Imaging len is placed according to the conjugate relation of element under test and CCD target surface behind optical element to be measured, in one diffractive plate of focal point slant setting of the lens, then its transmitted light beam converges on reflection type point diffraction plate by imaging len, it is superimposed on CCD target surface by a reference light for diffractive plate reflection with test light, generate the interference pattern of high density linear carrier frequency, this interference pattern is demodulated in conjunction with no mirror imaging technique, can be obtained accurate position phase defect information.The judgement of the high-precision quick Scanning Detction and defect type of defect may be implemented in the present invention.
Description
Technical field
The invention belongs to optical interferometry Instrument technology field, especially a kind of position based on reflection type point diffraction interferometer
Phase defect detecting system and method.
Background technique
The defect of material visually for can be divided into two major classes, i.e., naked eyes it can be seen that and naked eyes it is not detectable
(refractive index inhomogeneity and thickness of such as transparent material are inconsistent).The defect that naked eyes can see, referred to as amplitude type defect；Meat
The not detectable defect of eye is known as position phase defect, and position phase defective material is accurate by figure in any case when being processed into optical element
Processing, all can't be qualified products.
It include many optical elements of large caliber in high-power optical system device, phase-type defect and amplitude type defect are all
Common defect in system.Wherein, phase-type defect amplitude transmittance is uniform, can be modulated to the phase of light, can not be passed
System optical element detects.The difference very little that phase-type defect and amplitude type defect are shown in traditional optical detection system,
It is difficult to be distinguished.And position phase defect, just as a lens, its presence more likely will cause convergence of rays, in big function
Damage from laser is caused in rate laser system.Damage from laser not only will affect beam quality, but also introduced light field once being formed
Modulation is likely to result in the damage of subsequent optical element.Damage increasing can occur under Irradiation of High for damage from laser region simultaneously
It is long, the service life of optical element is reduced, the paralysis of entire optical system is even resulted in, brings huge economic losses.Therefore,
The relation technological researching of optical element position phase defect is most important.
The device of existing check bit phase defect can only all detect the defect of nanometer scale, and can result in damage from laser
Defect size size is then between 0.05mm to 5mm.In recent years, the research of position phase defect had been achieved for much being in progress.
Ravizza et al. constructs a kind of defect detecting system based on line scanning phase difference imaging, and this system passes through large area
Dark field imaging technique can quickly scan to obtain the specific location of defect, but disadvantage is that resolution ratio is lower, can not obtain defect
Specifying information；Machael Johnson et al. has then invented a kind of detection side based on double optical fiber phase shift point-diffraction interferometers
Method can obtain higher resolution ratio, obtain the specifying information of defect, but disadvantage is to be difficult handle to the distance between double optical fiber
It holds, it is complicated for operation.
Summary of the invention
The purpose of the present invention is to provide it is a kind of it is easy to operate, precision is high, Yi Shixian is interfered based on reflection type point diffraction
The position phase defect detecting system and method for instrument, enable measurement result clearly to reflect the size and location information of defect.
The technical solution for realizing the aim of the invention is as follows: a kind of position phase defect inspection based on reflection type point diffraction interferometer
Examining system, the system include point light source, phase acquisition component and image-forming assembly, and the spherical wave issued first by point light source is through phase
Acquisition component obtains the defect phase information of measured piece, and then imaged lens enter main interferometer, finally obtain on CCD
High density linear carrier frequency interference pattern, in which:
The point light source, for generating standard spherical wave；
The phase acquisition component, for spherical wave to be become plane wave, and the phase of defect is believed on extracting measured piece
The post-concentration of breath；
The image-forming assembly is assembled light for receiving, is imaged on CCD target surface after main interferometer, obtains high density
Linear carrier frequency interference pattern.
Further, the phase acquisition component includes the collimator objective, measured piece and be imaged saturating that sequentially common optical axis is placed
Mirror；Light obtains directional light after collimator objective, which carries the phase information of measured piece after measured piece,
Place imaging len in measured piece rear；Imaging len and measured piece are apart l, and imaging len focal length is f '.
Further, the image-forming assembly includes main interferometer and CCD；Main interferometer is reflection type point diffraction interferometer,
Reference wave and standard wave are generated by diffractive plate, and superposition generates interference pattern on CCD target surface；Point diffractive plate surface-slit with
CCD target surface distance is x '.
Further, imaging relations on the CCD target surface are as follows:
L '=f '+F#×y′ (1)
Wherein, l is imaging len at a distance from measured piece, and f ' is the focal length of imaging len, and x ' is that main interferometer midpoint is spread out
Penetrate plate surface slit and CCD target surface distance, F#For the constant determined by diffractive plate, y ' is image space, and l ' is image distance.
A kind of position phase defect inspection method based on reflection type point diffraction interferometer, comprising the following steps:
Step 1, point of adjustment diffraction Board position obtain background interference figure, obtain cavity measurement result and are used for systematic error mark
It is fixed；
Measured piece is placed between collimator objective and imaging len by step 2, so that measured piece front surface and CCD target surface are total
Yoke restores the wavefront at collected CCD target surface at this time with Fourier algorithm, is denoted as U；
Step 3 analyzes the variation of the phase and amplitude data of defect on airspace using no mirror imaging method, sentences
Phase bit type；
Step 4 handles the defect for meeting judgement requirement, and Fourier algorithm is used to carry out wavefront restroration.
Further, use described in step 3 without mirror imaging method to the phase and amplitude data of defect on airspace
Variation is analyzed, and determines phase type, specific as follows:
It is virtual lens of the aperture to CCD target surface distance that a focal length is placed before CCD, is passed by angular spectrum process simulation
Imaging position is broadcast, the precise information of defect is obtained；The wavefront U ' (x, y) obtained after propagation are as follows:
U ' (x, y)=FFT-1{FFT[U(x,y)·Uf(x,y)]H(ξ,η)} (3)
Wherein:
In above formula, U ' (x, y) is the wavefront complex amplitude after virtual lens propagation distance d, and U (x, y) is at CCD target surface
Wavefront complex amplitude, FFT-1For inversefouriertransform, FFT is Fourier transformation, Uf(x, y) is the transmission function of virtual lens, H
(ξ, η) is the transmission function of optical system, and j is imaginary unit, and λ is wavelength, and k is wave number and is equal to 2 π/λ, d be virtual lens with
The distance between image planes, ξ and η are coefficient, wherein-M/2≤ξ≤M/2 ,-N/2≤η≤N/2, M*N are the pixel number of CCD, δ is
Pixel Dimensions, z are the focal length of virtual lens.
Further, judgement phase type described in step 3 refers to: the phase and amplitude for determining defect are in imaging position
Variation, wherein the amplitude of phase-type defect can increase to positive and negative two different directions respectively in blur-free imaging position or so, be formed
Propagation distance is imaged with no mirror after wave crest and gradually becomes smaller；Phase is then in Gaussian Profile in the neighborhood of blur-free imaging position.
Compared with prior art, the present invention its remarkable advantage is: (1) the accurate of position phase defect size and position can be achieved
Measurement；(2) structure is simple, cost is relatively low, and test process is simple and easy to adjust；(3) Common-path method is used, antidetonation is anti-interference
Performance is good.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of midpoint diffractive plate of the present invention, wherein (a) is the main view of the diffractive plate plane of incidence, (b) is
Scheme the cross-sectional view in (a) along A-A ', (c) is aperture partial enlarged view.
Fig. 2 is the structural schematic diagram of the position phase defect detecting system the present invention is based on reflection type point diffraction interferometer.
Fig. 3 is the schematic diagram that defect phase and amplitude data are sought using no mirror imaging method.
Specific embodiment
In conjunction with Fig. 1, for used diffractive plate in the present invention, the substrate of the diffractive plate uses the optics glass of refractive index homogeneity
Glass, and the optical glass is the parallel plate structure with a thickness of h, wherein h is shown below:
Wherein, N is detector horizontal pixel number, and λ is the central wavelength of incident light, and F is the F number of convergent beam, and n is that point spreads out
The refractive index of plate substrate is penetrated, θ is the operating angle of point diffractive plate, i.e. the optical axis of convergent beam and point diffractive plate plane of incidence normal
Angle.
As shown in Fig. 1 (a), (b), plane of incidence top, the lower part of substrate are coated with photomask, and middle slit is coated with anti-reflection film,
The reflecting surface top of substrate is coated with high-reflecting film, lower part is coated with anti-reflection film, wherein t1Size depend on aperture in point diffractive plate
Short axle is long, it is therefore intended that keeps the reference light through front surface reflection and the reference light energy through pinhole difiration close, to be contrasted
Spend preferable interference pattern.
As shown in Fig. 1 (c), an elliptical aperture, long axis and short axle are equipped in the deielectric-coating of the plane of incidence lower half portion
The ratio between beAnd the long b of short axle of elliptical aperture meets following formula:
1.22 λ F (7) of b <
The distance d of the center of the elliptical aperture to plane of incidence top half anti-reflection film meets following formula:
In conjunction with Fig. 1 (b), the deielectric-coating of the high-reflecting film on substrate reflecting surface the top projection on the plane of incidence and plane of incidence lower part
It partly overlaps, it is therefore intended that keep the high-reflecting film of reflecting surface top half only that the reflection of generation incident light is primary, it is concordant with small hole center to locate
It is a selectable position.
In conjunction with Fig. 2, the present invention is based on the position phase defect detecting system of reflection type point diffraction interferometer, which includes point light
Source, phase acquisition component and image-forming assembly, the spherical wave issued first by point light source obtain measured piece through phase acquisition component
Defect phase information, then imaged lens enter main interferometer, and high density linear carrier frequency interference pattern is finally obtained on CCD,
Wherein:
The point light source, for generating standard spherical wave；
The phase acquisition component, for spherical wave to be become plane wave, and the phase of defect is believed on extracting measured piece
The post-concentration of breath；
The image-forming assembly is assembled light for receiving, is imaged on CCD target surface after main interferometer, obtains high density
Linear carrier frequency interference pattern.
Further, the phase acquisition component includes the collimator objective, measured piece and be imaged saturating that sequentially common optical axis is placed
Mirror；Light obtains directional light after collimator objective, which carries the phase information of measured piece after measured piece,
Place imaging len in measured piece rear；Imaging len and measured piece are apart l, and imaging len focal length is f '.
Further, the image-forming assembly includes main interferometer and CCD；Main interferometer is reflection type point diffraction interferometer,
Reference wave and standard wave are generated by diffractive plate, and superposition generates interference pattern on CCD target surface；Point diffractive plate surface-slit with
CCD target surface distance is x '.Imaging relations on the CCD target surface are as follows:
L '=f '+F#×y′
Wherein, l is imaging len at a distance from measured piece, and f ' is the focal length of imaging len, and x ' is that main interferometer midpoint is spread out
Penetrate plate surface slit and CCD target surface distance, F#For the constant determined by diffractive plate, y ' is image space, and l ' is image distance.
The present invention is based on the position phase defect inspection methods of reflection type point diffraction interferometer, comprising the following steps:
Step 1, point of adjustment diffraction Board position obtain background interference figure, obtain cavity measurement result and are used for systematic error mark
It is fixed；
Measured piece is placed between collimator objective and imaging len by step 2, so that measured piece front surface and CCD target surface are total
Yoke restores the wavefront at collected CCD target surface at this time with Fourier algorithm, is denoted as U.
Step 3 analyzes the variation of the phase and amplitude data of defect on airspace using no mirror imaging method, sentences
Phase bit type, specific as follows:
It is virtual lens of the aperture to CCD target surface distance that a focal length is placed before CCD, is passed by angular spectrum process simulation
Imaging position is broadcast, the precise information of defect is obtained；The wavefront U ' (x, y) obtained after propagation are as follows:
U ' (x, y)=FFT-1{FFT[U(x,y)·Uf(x,y)]H(ξ,η)}
Wherein:
In above formula, U ' (x, y) is the wavefront complex amplitude after virtual lens propagation distance d, and U (x, y) is at CCD target surface
Wavefront complex amplitude, FFT-1For inversefouriertransform, FFT is Fourier transformation, Uf(x, y) is the transmission function of virtual lens, H
(ξ, η) is the transmission function of optical system, and j is imaginary unit, and λ is wavelength, and k is wave number and is equal to 2 π/λ, d be virtual lens with
The distance between image planes, ξ and η are coefficient, wherein-M/2≤ξ≤M/2 ,-N/2≤η≤N/2, M*N are the pixel number of CCD, δ is
Pixel Dimensions, z are the focal length of virtual lens.
Further, the judgement phase type refers to: phase and amplitude of the judgement based on defect are in imaging position
Variation, wherein the amplitude of phase-type defect can increase to positive and negative two different directions respectively in blur-free imaging position or so, be formed
Propagation distance is imaged with no mirror after wave crest and gradually becomes smaller；Phase is then in Gaussian Profile in the neighborhood of blur-free imaging position.Such as
Shown in Fig. 3, measured object is located at U0When, image in U0' place.Measured object is moved to U1Or U2When, image planes then travel to U1' or U2′.With
The variation of the phase of defect and amplitude data on airspace is analyzed afterwards, determines phase type, the amplitude of phase-type defect
Can blur-free imaging position or so respectively to positive and negative two different directions increase, formed wave crest after with no mirror be imaged propagation distance and
It gradually becomes smaller, phase is then in Gaussian Profile in the neighborhood of blur-free imaging position.
Step 4 handles the defect for meeting judgement requirement, and Fourier algorithm is used to carry out wavefront restroration.
Embodiment 1
The present invention is based on the position phase defect detecting systems of reflection type point diffraction interferometer, and light channel structure is as shown in Fig. 2, include
Point light source, phase acquisition component and image-forming assembly, the spherical wave issued first by point light source are tested through phase acquisition component
The defect phase information of part, then imaged lens enter main interferometer, and the interference of high density linear carrier frequency is finally obtained on CCD
Figure, in which:
The point light source is for generating standard spherical wave；
The phase acquisition component is used to spherical wave becoming plane wave, and on extracting measured piece defect phase information
Post-concentration；
The image-forming assembly assembles light for receiving, and generates after main interferometer and interferes and be imaged on CCD target surface, obtains
Take high density linear carrier frequency interference pattern.
Further, the phase acquisition component includes the collimator objective, measured piece and be imaged saturating that sequentially common optical axis is placed
Mirror.Light obtains directional light after collimation lens, and directional light carries the phase information of determinand after object under test,
Place imaging len in determinand rear.In conjunction with Fig. 2, collimation lens focal length is F, and y ' is image space, and x ' is main interferometer midpoint
Diffractive plate surface-slit and CCD target surface distance, imaging len and further determinand are apart l, and imaging len focal length is f '.
Further, the image-forming assembly includes main interferometer and CCD.Main interferometer is reflection type point diffraction interferometer,
Reference wave and standard wave are generated by diffractive plate, and superposition generates interference pattern on CCD target surface.Point diffractive plate surface-slit with
CCD target surface distance is x '.Above step meets imaging relations:
L '=f '+F#×y′
Wherein F#For the constant determined by diffractive plate.
The step of position phase defectoscopy method of the reflection type point diffraction interferometer are as follows:
1) point of adjustment diffraction Board position obtains the preferable background interference figure of contrast, obtains cavity measurement result for being
System error calibration；
2) measured piece is placed among collimator objective and imaging len, so that its front surface and CCD target surface are conjugated, in Fu
Leaf algorithm restores the wavefront at collected CCD target surface at this time, is denoted as U；
3) phase and amplitude data of defect are sought using no mirror imaging method.As shown in figure 3, measured object is located at U0When,
Image in U0' place.Measured object is moved to U1Or U2When, image planes then travel to U1' or U2′.Then to the phase of defect and amplitude number
It is analyzed according to the variation on airspace, determines phase type, the amplitude of phase-type defect can be in blur-free imaging position or so point
Do not increase to positive and negative two different directions, propagation distance is imaged with no mirror and gradually becomes smaller after forming wave crest, phase is then clear
It is in Gaussian Profile in the neighborhood of imaging position；
4) defect for meeting judgement requirement is carried out going deep into processing, Fourier algorithm is used to carry out wavefront restroration.
To sum up, the judgement of the high-precision quick Scanning Detction and defect type of defect may be implemented in the present invention.
Claims (7)
1. a kind of position phase defect detecting system based on reflection type point diffraction interferometer, which is characterized in that the system includes point light
Source, phase acquisition component and image-forming assembly, the spherical wave issued first by point light source obtain measured piece through phase acquisition component
Defect phase information, then imaged lens enter main interferometer, and high density linear carrier frequency interference pattern is finally obtained on CCD,
Wherein:
The point light source, for generating standard spherical wave；
The phase acquisition component, for spherical wave to be become plane wave, and on extracting measured piece defect phase information it
Post-concentration；
The image-forming assembly is assembled light for receiving, is imaged on CCD target surface after main interferometer, it is linear to obtain high density
Carrier frequency interference pattern.
2. the position phase defect detecting system according to claim 1 based on reflection type point diffraction interferometer, which is characterized in that
The phase acquisition component includes collimator objective, measured piece and the imaging len that sequentially common optical axis is placed；Light passes through collimation object
Directional light is obtained after mirror, which carries the phase information of measured piece after measured piece, is positioned at measured piece rear
As lens；Imaging len and measured piece image distance are l, and imaging len focal length is f '.
3. the position phase defect detecting system according to claim 1 based on reflection type point diffraction interferometer, which is characterized in that
The image-forming assembly includes main interferometer and CCD；Main interferometer is reflection type point diffraction interferometer, generates reference by diffractive plate
Wave and standard wave, and superposition generates interference pattern on CCD target surface；Point diffractive plate surface-slit and CCD target surface distance are x '.
4. the position phase defect detecting system according to claim 1 based on reflection type point diffraction interferometer, which is characterized in that
Imaging relations on the CCD target surface are as follows:
L '=f '+F#×y′ (1)
Wherein, l is imaging len at a distance from measured piece, and f ' is the focal length of imaging len, and x ' is main interferometer midpoint diffractive plate
Surface-slit and CCD target surface distance, F#For the constant determined by diffractive plate, y ' is image space, and l ' is image distance.
5. a kind of position phase defect inspection method based on reflection type point diffraction interferometer, which comprises the following steps:
Step 1, point of adjustment diffraction Board position obtain background interference figure, obtain cavity measurement result and demarcate for systematic error；
Measured piece is placed between collimator objective and imaging len by step 2, so that measured piece front surface and CCD target surface are conjugated, is used
Fourier algorithm restores the wavefront at collected CCD target surface at this time, is denoted as U；
Step 3 analyzes the variation of the phase and amplitude data of defect on airspace using no mirror imaging method, determines phase
Position type；
Step 4 handles the defect for meeting judgement requirement, and Fourier algorithm is used to carry out wavefront restroration.
6. the position phase defect inspection method according to claim 5 based on reflection type point diffraction interferometer, it is characterised in that:
Use described in step 3 analyzes the variation of the phase and amplitude data of defect on airspace without mirror imaging method, determines
Phase type, specific as follows:
It is the virtual lens that aperture arrives CCD target surface distance that focal length is placed before CCD, by the propagation of angular spectrum process simulation at
Image position obtains the precise information of defect；The wavefront U ' (x, y) obtained after propagation are as follows:
U ' (x, y)=FFT-1{FFT[U(x,y)·Uf(x,y)]H(ξ,η)} (3)
Wherein:
In above formula, U ' (x, y) is the wavefront complex amplitude after virtual lens propagation distance d, and U (x, y) is the wave at CCD target surface
Preceding complex amplitude, FFT-1For inversefouriertransform, FFT is Fourier transformation, Uf(x, y) be virtual lens transmission function, H (ξ,
It is η) transmission function of optical system, j is imaginary unit, and λ is wavelength, and k is wave number and is equal to 2 π/λ, and d is virtual lens and picture
The distance between face, ξ and η are coefficient, wherein-M/2≤ξ≤M/2 ,-N/2≤η≤N/2, M*N are the pixel number of CCD, δ is picture
Plain size, z are the focal length of virtual lens.
7. the position phase defect inspection method according to claim 5 based on reflection type point diffraction interferometer, it is characterised in that:
Judgement phase type described in step 3 refers to: the phase and amplitude for determining defect are in the variation of imaging position, and wherein phase-type lacks
Sunken amplitude can increase to positive and negative two different directions respectively in blur-free imaging position or so, formed after wave crest and biography is imaged with no mirror
It broadcasts distance and gradually becomes smaller；Phase is then in Gaussian Profile in the neighborhood of blur-free imaging position.
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