CN106770335A - A kind of position phase defect detecting system and method based on reflection type point diffraction interferometer - Google Patents
A kind of position phase defect detecting system and method based on reflection type point diffraction interferometer Download PDFInfo
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- CN106770335A CN106770335A CN201710123331.8A CN201710123331A CN106770335A CN 106770335 A CN106770335 A CN 106770335A CN 201710123331 A CN201710123331 A CN 201710123331A CN 106770335 A CN106770335 A CN 106770335A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
- G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
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Abstract
The invention discloses a kind of position phase defect detecting system based on reflection type point diffraction interferometer and method.The system includes：Spot light, phase acquisition component and image-forming assembly；Method is：A standard spherical wave, the spherical wave is produced to form plane wave by collimation lens, then obtain its phase defect information through optical element to be measured using the parallel wave as spot light with optical fiber laser first；Behind optical element to be measured imaging len is placed according to element under test with the conjugate relation of CCD target surfaces, in one diffractive plate of focal point slant setting of the lens, then its transmitted light beam is converged on reflection type point diffraction plate by imaging len, the reference light reflected by a diffractive plate is superimposed with test light on CCD target surfaces, produce the interference pattern of high density linear carrier frequency, this interference pattern is demodulated with reference to without mirror imaging technique, you can obtain accurate position phase defect information.The present invention can realize the judgement of the quick Scanning Detction of the high accuracy of defect and defect type.
Description
Technical field
The invention belongs to optical interferometry Instrument technology field, particularly a kind of position based on reflection type point diffraction interferometer
Phase defect detecting system and method.
Background technology
The defect of material visually for can be divided into two major classes, i.e., naked eyes it can be seen that and naked eyes it is not detectable
(such as the refractive index inhomogeneity of transparent material and variable thickness are caused).The defect that naked eyes can see, referred to as amplitude type defect；Meat
The not detectable defect of eye is referred to as a phase defect, and position phase defective material is accurate by figure in any case when optical element is processed into
Processing, can not all turn into qualified products.
Many optical elements of large caliber are included in high-power optical system device, phase-type defect and amplitude type defect are all
Common defect in system.Wherein, phase-type defect amplitude transmittance is uniform, the phase of light can be modulated, it is impossible to passed
System optical element is detected.The difference very little that phase-type defect shows with amplitude type defect in traditional optical detecting system,
It is difficult to be distinguished.And position phase defect, just as a lens, its presence can more likely cause convergence of rays, in big work(
Damage from laser is caused in rate laser system.Damage from laser can not only influence beam quality, and introduced light field once being formed
Modulation is likely to result in the damage of subsequent optical element.Damage from laser region can occur to damage under Irradiation of High and increase simultaneously
It is long, the service life of optical element is reduced, the paralysis of whole optical system is even resulted in, bring huge economic losses.Therefore,
The relation technological researching of optical element position phase defect is most important.
The device of existing detecting position phase defect can only all detect the defect of nanometer scale, and can result in damage from laser
Defect size size is then between 0.05mm to 5mm.In recent years, the research of position phase defect has been achieved for many progress.
Ravizza et al. constructs a kind of defect detecting system based on line scanning phase difference imaging, and this system passes through large area
Dark field imaging technique can quickly scan the particular location for obtaining defect, but shortcoming is relatively low resolution ratio, it is impossible to obtain defect
Specifying information；Machael Johnson et al. have then invented a kind of detection side based on double optical fiber phase shift point-diffraction interferometers
Method, can obtain resolution ratio higher, obtain the specifying information of defect, but shortcoming is to be difficult handle to the distance between double optical fiber
Hold, complex operation.
The content of the invention
It is an object of the invention to provide a kind of simple to operate, high precision, easily realize based on reflection type point diffraction interference
The position phase defect detecting system and method for instrument, enable measurement result clearly to reflect the size and positional information of defect.
The technical solution for realizing the object of the invention is：A kind of position phase defect inspection based on reflection type point diffraction interferometer
Examining system, the system includes spot light, phase acquisition component and image-forming assembly, and the spherical wave for being sent by spot light first is through phase
Acquisition component, obtains the defect phase information of measured piece, and then imaged lens enter main interferometer, is finally obtained on CCD
High density linear carrier frequency interference pattern, wherein：
The spot light, for producing standard spherical wave；
The phase acquisition component, for spherical wave to be changed into plane wave, and the phase of defect is believed on measured piece is extracted
The post-concentration of breath；
The image-forming assembly, light is assembled for receiving, and is imaged on CCD target surfaces after main interferometer, obtains high density
Linear carrier frequency interference pattern.
Further, the phase acquisition component includes the collimator objective, measured piece and be imaged saturating that sequentially common optical axis is placed
Mirror；Light by obtaining directional light after collimator objective, the directional light through the phase information that measured piece is carried after measured piece,
Place imaging len in measured piece rear；With measured piece at a distance of being l, imaging len focal length is f ' to imaging len.
Further, the image-forming assembly includes main interferometer and CCD；Main interferometer is reflection type point diffraction interferometer,
Reference wave and standard ripple are produced by a diffractive plate, and generation interference pattern is superimposed on CCD target surfaces；Point diffractive plate surface-slit with
CCD target surfaces distance is x '.
Further, imaging relations are on the CCD target surfaces：
L '=f '+F#×y′ (1)
Wherein, l is the distance of imaging len and measured piece, and f ' is the focal length of imaging len, and x ' spreads out for main interferometer midpoint
Penetrate plate surface slit and CCD target surface distances, F#It is the constant determined by a diffractive plate, y ' is image space, and l ' is image distance.
A kind of position phase defect inspection method based on reflection type point diffraction interferometer, comprises the following steps：
Step 1, point of adjustment diffraction Board position obtain background interference figure, and obtaining cavity measurement result is used for systematic error mark
It is fixed；
Step 2, measured piece is placed between collimator objective and imaging len so that the preceding surface of measured piece is total to CCD target surfaces
Yoke, the wavefront at the CCD target surfaces that now collect is recovered with Fourier algorithm, is designated as U；
Step 3, it is analyzed using the change without mirror imaging method to the phase and amplitude data of defect on spatial domain, is sentenced
Phase bit type；
Step 4, the defect required meeting judgement are processed, and wavefront restroration is carried out using Fourier algorithm.
Further, the use described in step 3 without mirror imaging method to the phase of defect with amplitude data on spatial domain
Change is analyzed, and judges phase type, specific as follows：
It is virtual lens of the aperture to CCD target surface distances that a focal length is placed before CCD, is passed by angular spectrum process simulation
Image space is broadcast, the precise information of defect is obtained；Wavefront U ' (x, y) obtained after propagation is：
U ' (x, y)=FFT-1{FFT[U(x,y)·Uf(x,y)]H(ξ,η)} (3)
Wherein：
In above formula, U ' (x, y) is that, by the wavefront complex amplitude after virtual lens propagation distance d, U (x, y) is at CCD target surfaces
Wavefront complex amplitude, FFT-1It is inversefouriertransform, FFT is Fourier transformation, Uf(x, y) is the transmission function of virtual lens, H
(ξ, η) is the transmission function of optical system, and j is imaginary unit, and λ is wavelength, and k is wave number and equal to 2 π/λ, d be virtual lens with
The distance between image planes, ξ and η is coefficient, wherein-M/2≤ξ≤M/2 ,-N/2≤η≤N/2, M*N are the pixel count of CCD, δ is
Pixel Dimensions, z is the focal length of virtual lens.
Further, the judgement phase type described in step 3 refers to：Judge the phase and amplitude of defect in image space
Change, the wherein amplitude of phase-type defect can increase to positive and negative two different directions respectively in blur-free imaging position or so, be formed
Tapered into without mirror imaging propagation distance after crest；Phase is in then Gaussian Profile in the neighborhood of blur-free imaging position.
Compared with prior art, its remarkable advantage is the present invention：(1) it is capable of achieving position phase defect size accurate with position
Measurement；(2) simple structure, cost are relatively low, and test process is simple and easy to adjust；(3) Common-path method is used, antidetonation is anti-interference
Performance is good.
Brief description of the drawings
Fig. 1 is the structural representation of midpoint diffractive plate of the present invention, wherein the front view of (a) for the diffractive plate plane of incidence, (b) is
Along the sectional view of A-A ' in figure (a), (c) is aperture partial enlarged drawing.
Fig. 2 is the structural representation of position phase defect detecting system of the present invention based on reflection type point diffraction interferometer.
Fig. 3 is to use the schematic diagram for asking for without mirror imaging method defect phase and amplitude data.
Specific embodiment
It is used diffractive plate in the present invention with reference to Fig. 1, the substrate of the diffractive plate uses the optics glass of refractive index homogeneity
Glass, and the optical glass is that thickness is the parallel plate structure of h, wherein h is shown below：
Wherein, N is detector horizontal pixel number, and λ is the centre wavelength of incident light, and F is the F numbers of convergent beam, and n spreads out for point
The refractive index of plate substrate is penetrated, θ is the optical axis and point diffractive plate plane of incidence normal of the operating angle of a diffractive plate, i.e. convergent beam
Angle.
As shown in Fig. 1 (a), (b), the plane of incidence top of substrate, bottom are coated with photomask, and middle slit is coated with anti-reflection film,
The reflecting surface top of substrate is coated with high-reflecting film, bottom and is coated with anti-reflection film, wherein t1Size depend on aperture in point diffractive plate
Short axle is long, it is therefore intended that the reference light through front surface reflection is approached with the reference light energy through pinhole difiration, to be contrasted
Spend preferable interference pattern.
As shown in Fig. 1 (c), an elliptical aperture, its major axis and short axle are provided with the deielectric-coating of the plane of incidence the latter half
The ratio between beAnd the short axle b long of elliptical aperture meets following formula：
The λ F (7) of b ＜ 1.22
The center of the elliptical aperture meets following formula to plane of incidence top half anti-reflection film apart from d：
With reference to Fig. 1 (b), the deielectric-coating of the projection of the high-reflecting film on substrate reflecting surface top on the plane of incidence and plane of incidence bottom
Partly overlap, it is therefore intended that the high-reflecting film of reflecting surface top half is only reflected once incident light, it is concordant with small hole center to locate
It is a selectable position.
With reference to Fig. 2, position phase defect detecting system of the present invention based on reflection type point diffraction interferometer, the system includes point light
Source, phase acquisition component and image-forming assembly, the spherical wave for being sent by spot light first obtain measured piece through phase acquisition component
Defect phase information, then imaged lens enter main interferometer, finally on CCD obtain high density linear carrier frequency interference pattern,
Wherein：
The spot light, for producing standard spherical wave；
The phase acquisition component, for spherical wave to be changed into plane wave, and the phase of defect is believed on measured piece is extracted
The post-concentration of breath；
The image-forming assembly, light is assembled for receiving, and is imaged on CCD target surfaces after main interferometer, obtains high density
Linear carrier frequency interference pattern.
Further, the phase acquisition component includes the collimator objective, measured piece and be imaged saturating that sequentially common optical axis is placed
Mirror；Light by obtaining directional light after collimator objective, the directional light through the phase information that measured piece is carried after measured piece,
Place imaging len in measured piece rear；With measured piece at a distance of being l, imaging len focal length is f ' to imaging len.
Further, the image-forming assembly includes main interferometer and CCD；Main interferometer is reflection type point diffraction interferometer,
Reference wave and standard ripple are produced by a diffractive plate, and generation interference pattern is superimposed on CCD target surfaces；Point diffractive plate surface-slit with
CCD target surfaces distance is x '.Imaging relations are on the CCD target surfaces：
L '=f '+F#×y′
Wherein, l is the distance of imaging len and measured piece, and f ' is the focal length of imaging len, and x ' spreads out for main interferometer midpoint
Penetrate plate surface slit and CCD target surface distances, F#It is the constant determined by a diffractive plate, y ' is image space, and l ' is image distance.
Position phase defect inspection method of the present invention based on reflection type point diffraction interferometer, comprises the following steps：
Step 1, point of adjustment diffraction Board position obtain background interference figure, and obtaining cavity measurement result is used for systematic error mark
It is fixed；
Step 2, measured piece is placed between collimator objective and imaging len so that the preceding surface of measured piece is total to CCD target surfaces
Yoke, the wavefront at the CCD target surfaces that now collect is recovered with Fourier algorithm, is designated as U.
Step 3, it is analyzed using the change without mirror imaging method to the phase and amplitude data of defect on spatial domain, is sentenced
Phase bit type, it is specific as follows：
It is virtual lens of the aperture to CCD target surface distances that a focal length is placed before CCD, is passed by angular spectrum process simulation
Image space is broadcast, the precise information of defect is obtained；Wavefront U ' (x, y) obtained after propagation is：
U ' (x, y)=FFT-1{FFT[U(x,y)·Uf(x,y)]H(ξ,η)}
Wherein：
In above formula, U ' (x, y) is that, by the wavefront complex amplitude after virtual lens propagation distance d, U (x, y) is at CCD target surfaces
Wavefront complex amplitude, FFT-1It is inversefouriertransform, FFT is Fourier transformation, Uf(x, y) is the transmission function of virtual lens, H
(ξ, η) is the transmission function of optical system, and j is imaginary unit, and λ is wavelength, and k is wave number and equal to 2 π/λ, d be virtual lens with
The distance between image planes, ξ and η is coefficient, wherein-M/2≤ξ≤M/2 ,-N/2≤η≤N/2, M*N are the pixel count of CCD, δ is
Pixel Dimensions, z is the focal length of virtual lens.
Further, described judgement phase type refers to：Judge the phase based on defect with amplitude in image space
Change, the wherein amplitude of phase-type defect can increase to positive and negative two different directions respectively in blur-free imaging position or so, be formed
Tapered into without mirror imaging propagation distance after crest；Phase is in then Gaussian Profile in the neighborhood of blur-free imaging position.Such as
Shown in Fig. 3, measured object is located at U0When, image in U0' place.Measured object moves to U1Or U2When, image planes then travel to U1' or U2′.With
Change to the phase of defect with amplitude data on spatial domain afterwards is analyzed, and judges phase type, the amplitude of phase-type defect
Can increase to positive and negative two different directions respectively in blur-free imaging position or so, with without mirror imaging propagation distance after formation crest
Taper into, phase is in then Gaussian Profile in the neighborhood of blur-free imaging position.
Step 4, the defect required meeting judgement are processed, and wavefront restroration is carried out using Fourier algorithm.
Embodiment 1
The present invention based on reflection type point diffraction interferometer position phase defect detecting system, light channel structure as shown in Fig. 2 including
Spot light, phase acquisition component and image-forming assembly, the spherical wave for being sent by spot light first are tested through phase acquisition component
The defect phase information of part, then imaged lens enter main interferometer, the interference of high density linear carrier frequency is finally obtained on CCD
Figure, wherein：
The spot light is used to produce standard spherical wave；
The phase acquisition component is used to for spherical wave to be changed into plane wave, and on measured piece is extracted defect phase information
Post-concentration；
The image-forming assembly is used to receive assembles light, interference is produced after main interferometer and is imaged on CCD target surfaces, obtains
Take high density linear carrier frequency interference pattern.
Further, the phase acquisition component includes that collimator objective, measured piece that sequentially common optical axis is placed are saturating with imaging
Mirror.Light by obtaining directional light after collimation lens, directional light through the phase information that determinand is carried after object under test,
Place imaging len in determinand rear.With reference to Fig. 2, collimation lens focal length is F, and y ' is image space, and x ' is main interferometer midpoint
Diffractive plate surface-slit and CCD target surface distances, with further determinand at a distance of being l, imaging len focal length is f ' to imaging len.
Further, the image-forming assembly includes main interferometer and CCD.Main interferometer is reflection type point diffraction interferometer,
Reference wave and standard ripple are produced by a diffractive plate, and generation interference pattern is superimposed on CCD target surfaces.Point diffractive plate surface-slit with
CCD target surfaces distance is x '.Above step meets imaging relations：
L '=f '+F#×y′
Wherein F#It is the constant determined by a diffractive plate.
The step of position phase defectoscopy method of described reflection type point diffraction interferometer is：
1) point of adjustment diffraction Board position, obtains the preferable background interference figure of contrast, obtains cavity measurement result for being
System error calibration；
2) measured piece is placed in the middle of collimator objective and imaging len so that its preceding surface is conjugated with CCD target surfaces, with Fu
The wavefront at CCD target surfaces that the recovery of leaf algorithm is now collected, is designated as U；
3) phase and amplitude data that defect is asked for without mirror imaging method are used.As shown in figure 3, measured object is located at U0When,
Image in U0' place.Measured object moves to U1Or U2When, image planes then travel to U1' or U2′.Then to the phase and amplitude number of defect
It is analyzed according to the change on spatial domain, judges phase type, the amplitude of phase-type defect can be in blur-free imaging position or so point
Do not increase to positive and negative two different directions, tapered into without mirror imaging propagation distance after forming crest, phase is then clear
It is in Gaussian Profile in the neighborhood of image space；
4) deep treatment is carried out to meeting the defect for judging to require, wavefront restroration is carried out using Fourier algorithm.
To sum up, the present invention can realize the quick Scanning Detction of high accuracy and the judgement of defect type of defect.
Claims (7)
1. a kind of position phase defect detecting system based on reflection type point diffraction interferometer, it is characterised in that the system includes point light
Source, phase acquisition component and image-forming assembly, the spherical wave for being sent by spot light first obtain measured piece through phase acquisition component
Defect phase information, then imaged lens enter main interferometer, finally on CCD obtain high density linear carrier frequency interference pattern,
Wherein：
The spot light, for producing standard spherical wave；
The phase acquisition component, for spherical wave to be changed into plane wave, and on measured piece is extracted defect phase information it
Post-concentration；
The image-forming assembly, light is assembled for receiving, and is imaged on CCD target surfaces after main interferometer, obtains high density linear
Carrier frequency interference pattern.
2. the position phase defect detecting system based on reflection type point diffraction interferometer according to claim 1, it is characterised in that
The phase acquisition component includes collimator objective, measured piece and the imaging len that sequentially common optical axis is placed；Light is by collimation object
Directional light is obtained after mirror, the directional light is positioned to through the phase information that measured piece is carried after measured piece at measured piece rear
As lens；Imaging len is l with measured piece image distance, and imaging len focal length is f '.
3. the position phase defect detecting system based on reflection type point diffraction interferometer according to claim 1, it is characterised in that
The image-forming assembly includes main interferometer and CCD；Main interferometer is reflection type point diffraction interferometer, and reference is produced by a diffractive plate
Ripple and standard ripple, and generation interference pattern is superimposed on CCD target surfaces；Point diffractive plate surface-slit is x ' with CCD target surfaces distance.
4. the position phase defect detecting system based on reflection type point diffraction interferometer according to claim 1, it is characterised in that
Imaging relations are on the CCD target surfaces：
L '=f '+F#×y′ (1)
Wherein, l is the distance of imaging len and measured piece, and f ' is the focal length of imaging len, and x ' is main interferometer midpoint diffractive plate
Surface-slit and CCD target surface distances, F#It is the constant determined by a diffractive plate, y ' is image space, and l ' is image distance.
5. a kind of position phase defect inspection method based on reflection type point diffraction interferometer, it is characterised in that comprise the following steps：
Step 1, point of adjustment diffraction Board position obtain background interference figure, obtain cavity measurement result and are demarcated for systematic error；
Step 2, measured piece is placed between collimator objective and imaging len so that the preceding surface of measured piece is conjugated with CCD target surfaces, used
The wavefront at CCD target surfaces that Fourier algorithm recovery is now collected, is designated as U；
Step 3, it is analyzed using the change without mirror imaging method to the phase and amplitude data of defect on spatial domain, judges phase
Position type；
Step 4, the defect required meeting judgement are processed, and wavefront restroration is carried out using Fourier algorithm.
6. the position phase defect inspection method based on reflection type point diffraction interferometer according to claim 5, it is characterised in that：
The change of use described in step 3 without mirror imaging method to the phase of defect with amplitude data on spatial domain is analyzed, and judges
Phase type, it is specific as follows：
Placed before CCD focal length be aperture to the virtual lens of CCD target surface distances, propagated into by angular spectrum process simulation
Image position, obtains the precise information of defect；Wavefront U ' (x, y) obtained after propagation is：
U ' (x, y)=FFT-1{FFT[U(x,y)·Uf(x,y)]H(ξ,η)} (3)
Wherein：
In above formula, U ' (x, y) is that, by the wavefront complex amplitude after virtual lens propagation distance d, U (x, y) is the ripple at CCD target surfaces
Preceding complex amplitude, FFT-1It is inversefouriertransform, FFT is Fourier transformation, Uf(x, y) for virtual lens transmission function, H (ξ,
η) it is the transmission function of optical system, j is imaginary unit, and λ is wavelength, and for wave number and equal to 2 π/λ, d is virtual lens and picture to k
The distance between face, ξ and η is coefficient, wherein the pixel count of-M/2≤ξ≤M/2 ,-N/2≤η≤N/2, M*N for CCD, δ is picture
Plain size, z is the focal length of virtual lens.
7. the position phase defect inspection method based on reflection type point diffraction interferometer according to claim 5, it is characterised in that：
Judgement phase type described in step 3 refers to：Judge the change of phase and amplitude in image space of defect, wherein phase-type lacks
Sunken amplitude can increase to positive and negative two different directions respectively in blur-free imaging position or so, and biography is imaged with without mirror after forming crest
Broadcast distance and taper into；Phase is in then Gaussian Profile in the neighborhood of blur-free imaging position.
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| CN108802056A (en) * | 2018-08-23 | 2018-11-13 | 中国工程物理研究院激光聚变研究中心 | Optical element phase-type defectoscopy device and detection method |
| CN108802056B (en) * | 2018-08-23 | 2024-02-06 | 中国工程物理研究院激光聚变研究中心 | Optical element phase type defect measuring device and detecting method |
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