CN106653530A - Novel broadband ion beam adjusting lens - Google Patents

Novel broadband ion beam adjusting lens Download PDF

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Publication number
CN106653530A
CN106653530A CN201510741688.3A CN201510741688A CN106653530A CN 106653530 A CN106653530 A CN 106653530A CN 201510741688 A CN201510741688 A CN 201510741688A CN 106653530 A CN106653530 A CN 106653530A
Authority
CN
China
Prior art keywords
lens
ion beam
coil
electromagnet
cooling water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510741688.3A
Other languages
Chinese (zh)
Inventor
许海皎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Zhongkexin Electronic Equipment Co Ltd
Original Assignee
Beijing Zhongkexin Electronic Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Zhongkexin Electronic Equipment Co Ltd filed Critical Beijing Zhongkexin Electronic Equipment Co Ltd
Priority to CN201510741688.3A priority Critical patent/CN106653530A/en
Publication of CN106653530A publication Critical patent/CN106653530A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/14Lenses magnetic
    • H01J37/141Electromagnetic lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/21Means for adjusting the focus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002Cooling arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/049Focusing means
    • H01J2237/0492Lens systems
    • H01J2237/04922Lens systems electromagnetic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a magnetic quadrupole lens applied to a broadband ion beam ion implantation machine. The magnetic quadrupole lens comprises four electromagnet units, an ion beam channel, four supporting plates and a base plate. Each electromagnet unit is formed by a coil, a cylindrical magnet yoke, a cooling water pipeline and a fixing plate, wherein the coil winds around the magnet yoke, the cooling water pipeline spirally winds around the coil, and the fixing plate positions and fixes the two ends of the magnet yoke. Exciting currents of the electromagnets can be adjusted individually, and generated magnetic fields enable adjacent two electrodes of every two adjacent electromagnets to have the same polarity. The novel broadband ion beam adjusting lens is great in magnetic induction intensity linear distribution. A contact area between each cooling water pipelines and the corresponding coil is large, and the heat dissipation efficiency is high. The lens has a simple structure, the vacuum channel is arranged inside the lens, and the lens is quite convenient to install and maintain.

Description

Wideband ion beam adjusts lens
Technical field
The present invention relates to a kind of magnetic focusing lens of ion implantation apparatus, ion implantation apparatus is semiconductor manufacturing ion Key equipment in injection technology, therefore the invention belongs to field of manufacturing semiconductor devices.
Background technology
With the high speed development of IC industry, higher wanting it is also proposed to the performance of semiconductor devices Ask.Ion implantation apparatus is the key equipment in semiconductor ion injection technology, is had to the performance of semi-conducting material Important impact.
Ion gun is the ion generating apparatus of ion implantation apparatus, is affected by its ion generation method, and it is produced Raw ion often contains many other impurity, and the depth of parallelism and uniformity are also poor.In order to filter out Need ion, the depth of parallelism of adjustment line and uniformity, enable line to be injected into semi-conducting material at a certain angle In, ion beam has to the transmission through certain distance, and it is adjusted with leaving space.But due to sky Between charge effect presence, ion beam can dissipate in transmitting procedure, lose can a big chunk ion beam Fall, this is quite unfavorable to ion implantation process.Broadband ion beam is a kind of reasonable ion beam, it The scanning process of spot beam is eliminated, directly be can be injected in semi-conducting material, but equally, in transmission During it as diverging and produce loss.In order to solve this problem, it is necessary to design a kind of device To make ion beam focusing.
Magnetic quadrupole lens is a kind of relatively common focusing arrangement, and it is gathered using magnetic field to ion beam Jiao, will not change the energy of ion beam, only change the deflection angle of ion beam.This Wideband ion beam is adjusted Section lens are exactly a kind of such novel magnetic quadrupole lens.
The content of the invention
The transmission performance good in order to ensure broadband ion beam, the present invention devises a kind of Wideband ion beam Adjust lens.Its magnetic induction intensity linear distribution is good, can be not to the depth of parallelism and uniformity of ion beam Ion beam is set substantially to focus in the case of producing considerable influence;Due to increasing connecing for cooling water pipeline and coil Contacting surface is accumulated, and its radiating efficiency is also very high;Its ion beam path is designed in lens interior, very convenient peace Dress and maintenance.
Specific technical scheme of the invention is as follows:
Wideband ion beam adjusts lens by four electromagnet units, ion beam path, four supports Plate and base plate composition, electromagnet unit is distributed along surrounding, and ion beam path is located at lens interior, four Gripper shoe is located at four angles of lens and electromagnet unit is play a part of fixed and positioned, and base plate is located at lens bottom Support whole lens combination.
Electromagnet unit includes coil, cylindricality yoke, cooling water pipeline and fixed plate, and coil is wrapped in yoke On, cooling water pipeline dish type is wrapped between coil, and fixed plate plays positioning and fixed coil at yoke two ends.
The exciting current that Wideband ion beam adjusts lens each electromagnet is independently adjustable, and the magnetic field of generation makes The two neighboring pole polarity of two neighboring electromagnet is identical.
It is a kind of strong lens that this Wideband ion beam adjusts lens, when pole polarity is with shown in Fig. 2, Its vertical direction will be focused when the ion beam of positively charged is projected from paper to outside paper, horizontal direction will Can be defocused, but focus level is greater than defocusing degree.
Compared with prior art, the advantage of this Wideband ion beam regulation lens is:
1st, magnetic induction intensity linear distribution is good, there is good focussing force to broadband ion beam;
2nd, cooling water pipeline and coil contact area are big, and the radiating efficiency of coil is high;
3rd, lens arrangement is simple and ion beam path internally, make dismounting and keep in repair all very convenient.
Description of the drawings
Fig. 1 is the structure chart that this Wideband ion beam adjusts lens;
Fig. 2 is the front view of Fig. 1;
Description of reference numerals:
1- ion beam paths;2- cylindricality yokes;3- gripper shoes;4- base plates;5- fixed plates;6- coils;7 is cold But waterpipe.
Specific embodiment
The present invention is described further below in conjunction with the accompanying drawings, probably the key point of the explanation present invention.
As illustrated in fig. 1 and 2, cylindricality yoke 2, coil 6, cooling water pipeline 7 and fixed plate 5 are constituted One electromagnet unit, is wrapped in cylindricality yoke 2 in this unit coil 6, the disk of cooling water pipeline 7 Shape is wound between coil, and fixed plate 5 is arranged on yoke two ends to limit the position of coil.3 liang of gripper shoe End connects respectively two electromagnet units, and they are played a part of to support and are positioned.Below lens Two gripper shoes 3 have also been fixed on base plate 4, to support whole lens.Ion beam path 1 is installed on four The centre of individual electromagnet unit, its Cross section Design rectangularity is conducive to the transmission of broadband ion beam.
The coolant of whole lens combination uses deionized water.
This Wideband ion beam adjusts lens and is installed on before the post analysis light bar of analyzer, is produced by it Specific magnetic fields adjusting the height and width of broadband beam.
Cylindricality yoke 2 has certain thickness, and this thickness determines operating distance of the magnetic field to ion beam. In all of electromagnet unit, coil 6 is all together in series, and their added senses of current should make phase The two neighboring pole polarity of adjacent two electromagnet is identical.Under normal circumstances, this lens role is vertical poly- Burnt horizontal defocus, but if all reversal connections of all coils electric current, then lens vertically level of defocus will gather It is burnt.Depending on the visible working state ion beam conditions of concrete lens.Ion beam path 1 is vacuum pipe, its Processing and installation should meet vacuum requirement.

Claims (3)

1. Wideband ion beam adjust lens, it is characterised in that it by four electromagnet units, one from Beamlet passage, four gripper shoes and a base plate composition, magnet unit is distributed along surrounding, ion beam path position In lens interior, gripper shoe positions the position of each electromagnet unit, the whole lens combination of backplanes support.
2. Wideband ion beam according to claim 1 adjusts lens, it is characterized in that, its electricity Magnet unit includes coil, cylindricality yoke, cooling water pipeline and fixed plate, and coil is wrapped in yoke, cold But waterpipe dish-type is wrapped between coil, and fixed plate plays positioning and fixed effect at yoke two ends.
3. the Wideband ion beam as described in claim 1 and 2 adjusts lens, it is characterised in that each The exciting current of individual electromagnet is independently adjustable, and the magnetic field of generation makes the two neighboring pole polarity of two neighboring electromagnet It is identical.
CN201510741688.3A 2015-11-04 2015-11-04 Novel broadband ion beam adjusting lens Pending CN106653530A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510741688.3A CN106653530A (en) 2015-11-04 2015-11-04 Novel broadband ion beam adjusting lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510741688.3A CN106653530A (en) 2015-11-04 2015-11-04 Novel broadband ion beam adjusting lens

Publications (1)

Publication Number Publication Date
CN106653530A true CN106653530A (en) 2017-05-10

Family

ID=58851013

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510741688.3A Pending CN106653530A (en) 2015-11-04 2015-11-04 Novel broadband ion beam adjusting lens

Country Status (1)

Country Link
CN (1) CN106653530A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111192807A (en) * 2018-11-15 2020-05-22 北京中科信电子装备有限公司 Novel middle beam parallel lens magnet
CN111261477A (en) * 2018-12-03 2020-06-09 北京中科信电子装备有限公司 Double-outlet parallel lens

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111192807A (en) * 2018-11-15 2020-05-22 北京中科信电子装备有限公司 Novel middle beam parallel lens magnet
CN111261477A (en) * 2018-12-03 2020-06-09 北京中科信电子装备有限公司 Double-outlet parallel lens
CN111261477B (en) * 2018-12-03 2022-08-02 北京中科信电子装备有限公司 Double-outlet parallel lens

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PB01 Publication
WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20170510