CN106587652B - Method for repairing laser cutting damage on glass surface - Google Patents

Method for repairing laser cutting damage on glass surface Download PDF

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Publication number
CN106587652B
CN106587652B CN201611117282.9A CN201611117282A CN106587652B CN 106587652 B CN106587652 B CN 106587652B CN 201611117282 A CN201611117282 A CN 201611117282A CN 106587652 B CN106587652 B CN 106587652B
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sio
layer
sol
laser
glass
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CN106587652A (en
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张�杰
欧志龙
马明鸿
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Innovo Laser Polytron Technologies Inc
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Innovo Laser Polytron Technologies Inc
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Priority to PCT/CN2017/084440 priority patent/WO2018103270A1/en
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Glass Compositions (AREA)

Abstract

The invention discloses a method for repairing glass surface laser cutting damage, which comprises the following steps: a. providing a piece of glass after laser cutting; b. at least in sections including laser cuttingOne surface coated with SiO2Sol; c. drying the SiO coated in step b2A sol layer; d. sintering of SiO on laser-cut cross-sectional surfaces2Sol layer, forming SiO2A layer; e. to SiO2The layer is annealed. Firstly, coating a layer of SiO on the surface of glass containing a cutting section2Sol layer, then mixing SiO2Sintering the sol into SiO2Layer of SiO formed on the surface of the cut section2The protective layer is used for repairing the defects of the section, avoiding the cracks or edge breakage expansion caused by the thermal bending generated in the subsequent heat treatment process, and finally strengthening the SiO through annealing treatment2The strength of the repair layer and its penetration strength into the defect. The method repairs the defects generated by laser cutting, obviously improves the surface flatness, effectively prevents cracks from expanding in subsequent heat treatment, and ensures the yield of post-treatment.

Description

Method for repairing laser cutting damage on glass surface
Technical Field
The invention belongs to the technical field of laser cutting, and particularly relates to a method for repairing slight damage to the surface of a glass material after laser cutting.
Background
The laser cutting is to irradiate the surface of a material to be cut by using a high-power-density laser beam, so that the material to be cut is heated to a vaporization temperature and evaporated to form a hole, and the hole continuously forms a cutting seam with a narrow width along with the movement of the laser beam, namely the material is cut. Because the laser spot is small, the energy density is high, the cutting speed is fast, better cutting quality can be obtained, and the laser cutting process is widely applied to various fields and can be used for processing various materials such as glass, metal, cloth, wood, plastics and the like.
At normal temperature, glass is a brittle material with non-malleability, and has been cut with a diamond cutter: firstly, the glass surface is scribed, and then the glass is broken off by a manual method, the material utilization rate is low, and the subsequent treatment of the section is needed after cutting. With the gradual maturity of laser technology, a series of methods for cutting glass by laser have been developed, the existing methods for cutting glass by laser have low cost and are easy to control cutting speed, but the glass material cut by laser inevitably generates some tiny damages such as cracks/broken edges, and the rejection rate of glass products is greatly increased in the subsequent thermal processing process. Therefore, the method is of great importance for treating and eliminating the tiny damage on the surface of the glass material, and can lay a foundation for ensuring the yield of subsequent products.
Disclosure of Invention
Therefore, the technical problem to be solved by the invention is that the traditional method for cutting glass by laser is easy to generate tiny damage on a cutting surface, and the yield of the post-processing of a glass product is influenced, so that the method for repairing the laser cutting damage on the surface of the glass is provided.
In order to solve the technical problems, the technical scheme of the invention is as follows:
the invention provides a method for repairing glass surface laser cutting damage, which comprises the following steps:
a. providing a piece of glass after laser cutting;
b. coating at least one surface of the glass with SiO2Sol, coated SiO2The surface of the sol comprises a laser cutting section;
c. drying the SiO coated in step b2A sol layer;
d. sintering the SiO on the surface of the laser-cut section2Sol layer, forming SiO2A layer;
e. for SiO on the surface of the laser cutting section2The layer is annealed.
Preferably, the step d is followed by removing SiO on the surface of the non-laser-cut section by using a solvent2And (5) sol layer.
Preferably, the SiO2The sol is organic compound gel containing Si element, and the compound is decomposed into SiO at the temperature of 300-500 DEG C2。
Preferably, the SiO2The thickness of the sol layer is 1-20 microns.
Preferably, in the step c, the drying temperature is 60-120 ℃, and the drying time is 0.1-0.5 h.
Preferably, in the step d, the SiO on the surface of the section is cut by adopting ultraviolet laser sintering laser2A sol layer.
Preferably, the power of the ultraviolet laser is 0.5-30W.
Preferably, the annealing temperature of the annealing treatment in the step e is 200-400 ℃, and the annealing time is 0.5-2.0 h.
Preferably, the laser used for cutting the glass in the step a is an ultrafast laser with a wavelength of 1064nm or 532nm, and the power of the ultrafast laser is 0.5-30W.
Preferably, the SiO2The sol also contains potassium element and/or sodium element.
Compared with the prior art, the technical scheme of the invention has the following advantages:
the invention relates to a method for repairing glass surface laser cutting damage, which comprises the following steps: a. providing a piece of glass after laser cutting; b. coating at least one surface of the glass with SiO2Sol, coated SiO2The surface of the sol comprises a laser cutting section; c. drying the SiO coated in step b2A sol layer; d. sintering the SiO on the surface of the laser-cut section2Sol layer, forming SiO2A layer; e. for SiO on the surface of the laser cutting section2The layer is annealed. Firstly, coating a layer of SiO on the surface of glass containing a cutting section2Sol layer, then mixing SiO2Sintering the sol into SiO2Layer of SiO formed on the surface of the cut section2The protective layer is used for repairing the defects of the section, avoiding the cracks or edge breakage expansion caused by the thermal bending generated in the subsequent heat treatment process, and finally strengthening the SiO through annealing treatment2The strength of the repair layer and its penetration strength into the defect. The method repairs the defects generated by laser cutting, obviously improves the surface flatness, effectively prevents cracks from expanding in subsequent heat treatment, and ensures the yield of post-treatment.
Drawings
In order that the present disclosure may be more readily and clearly understood, reference is now made to the following detailed description of the embodiments of the present disclosure taken in conjunction with the accompanying drawings, in which
FIG. 1 is a flow chart of a method for repairing a laser cutting damage on a glass surface according to example 1 of the present invention;
fig. 2 is a flowchart of a method for repairing a laser cutting damage on a glass surface according to embodiment 2 of the present invention.
Detailed Description
Example 1
The embodiment provides a method for repairing laser cutting damage on a glass surface, which comprises the following steps:
a. providing a piece of glass subjected to laser cutting, and cutting a piece of glass with a larger size by adopting ultrafast laser, wherein the wavelength of the ultrafast laser can be 1064nm, 1030nm, 532nm or 515nm, and the power is 10W;
b. selectively coating a layer of SiO on the surface of the laser cutting section of the glass obtained in the step a2Sol layer of said SiO2SiO adopted by sol layer2The Sol is an organic compound (Sol-gel) containing Si element, which can be decomposed to form SiO when heated to 300-500 deg.C2In addition, other elements such as potassium element and/or sodium element may be added depending on the glass composition, and in this embodiment, SiO is coated2The thickness of the sol layer is 1 micron;
c. coating the cross section with SiO2Drying the glass of the sol layer in an oven at 60 ℃ for 0.5h to obtain dry SiO2A sol layer;
d. sintering the SiO on the surface of the laser cutting section by adopting ultraviolet laser with the power of 5W2Sol layer of SiO2Conversion of sol layer to SiO2A layer;
e. finally, SiO on the surface of the laser cutting section2And carrying out low-temperature annealing treatment on the layer, wherein the annealing temperature is 200 ℃, and the annealing time is 1 h.
Example 2
The embodiment provides a method for repairing laser cutting damage on a glass surface, which comprises the following steps:
a. providing a piece of glass subjected to laser cutting, and cutting a piece of glass with a larger size by adopting ultrafast laser, wherein the wavelength of the ultrafast laser can be 1064nm, 1030nm, 532nm or 515nm, and the power is 30W;
b. coating a layer of SiO on the outer surface of the glass obtained in the step a2Sol layer of said SiO2SiO adopted by sol layer2The Sol in the Sol is an organic compound (Sol-gel) containing Si element, and the compound can be decomposed to form SiO when being heated to 300-500 DEG C2Further, potassium element and/or sodium element may be added depending on the glass composition, and in this example, SiO is coated2The thickness of the sol layer is 20 microns;
c. coating the cross section with SiO2Drying the glass of the sol layer in an oven at 120 ℃ for 0.1h to obtain dry SiO2A sol layer;
d. sintering SiO on the surface of the laser cutting section by adopting ultraviolet laser with the power of 15W2Sol layer of SiO2Conversion of sol layer to SiO2A layer; subsequent removal of SiO from the laser unsintered region with a solvent2A sol layer.
e. Finally, SiO on the surface of the laser cutting section2And carrying out low-temperature annealing treatment on the layer, wherein the annealing temperature is 400 ℃, and the annealing time is 0.5 h.
Example 3
The embodiment provides a method for repairing laser cutting damage on a glass surface, which comprises the following steps:
a. providing a piece of glass subjected to laser cutting, and cutting a piece of glass with a larger size by adopting ultrafast laser, wherein the wavelength of the ultrafast laser can be 1064nm, 1030nm, 532nm or 515nm, and the power is 15W;
b. coating a layer of SiO on the outer surface of the glass obtained in the step a2Sol layer of said SiO2SiO adopted by sol layer2The Sol in the Sol is an organic compound (Sol-gel) containing Si element, and the compound can be decomposed to form SiO when being heated to 300-500 DEG C2Further, potassium element, sodium element or the like may be added depending on the glass composition, and in this example, SiO is coated2The thickness of the sol layer is 20 microns;
c. coating the cross section with SiO2Drying the glass of the sol layer in an oven at 80 deg.C for 0For 3h, obtaining dry SiO2A sol layer;
d. sintering SiO on the surface of the laser cutting section by adopting ultraviolet laser with the power of 20W2Sol layer of SiO2Conversion of sol layer to SiO2A layer; subsequent removal of SiO from the laser unsintered region with a solvent2A sol layer.
e. Finally, SiO on the surface of the laser cutting section2And carrying out low-temperature annealing treatment on the layer, wherein the annealing temperature is 300 ℃, and the annealing time is 1.5 h.
Example 4
The embodiment provides a method for repairing laser cutting damage on a glass surface, which comprises the following steps:
a. providing a piece of glass subjected to laser cutting, and cutting a piece of glass with a larger size by adopting ultrafast laser, wherein the wavelength of the ultrafast laser can be 1064nm, 1030nm, 532nm or 515nm, and the power is 0.5W;
b. coating a layer of SiO on the outer surface of the glass obtained in the step a2Sol layer of said SiO2SiO adopted by sol layer2The Sol in the Sol is an organic compound (Sol-gel) containing Si element, and the compound can be decomposed to form SiO when being heated to 300-500 DEG C2Further, potassium element, sodium element and the like may be added depending on the glass composition, and in this example, SiO is coated2The thickness of the sol layer is 15 microns;
c. coating the cross section with SiO2Drying the glass of the sol layer in an oven at 75 ℃ for 0.25h to obtain dry SiO2A sol layer;
d. sintering the SiO on the surface of the laser cutting section by adopting ultraviolet laser with the power of 0.5W2Sol layer of SiO2Conversion of sol layer to SiO2A layer; subsequent removal of SiO from the laser unsintered region with a solvent2A sol layer.
e. Finally, SiO on the surface of the laser cutting section2And carrying out low-temperature annealing treatment on the layer, wherein the annealing temperature is 350 ℃, and the annealing time is 2 h.
It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications therefrom are within the scope of the invention.

Claims (4)

1. A method for repairing glass surface laser cutting damage is characterized by comprising the following steps: a. providing a piece of glass after laser cutting;
b. coating at least one surface of the glass with SiO2Sol, coated SiO2The surface of the sol comprises a laser cutting section; the SiO2The sol also contains potassium element and/or sodium element;
c. drying the SiO coated in step b2A sol layer;
d. sintering SiO on the surface of the laser cutting section by adopting ultraviolet laser with the power of 0.5-30W2Sol layer, forming SiO2A layer;
e. for SiO on the surface of the laser cutting section2Annealing the layer;
removing SiO on the surface of the non-laser-cut section by using a solvent after the step d2A sol layer step;
the SiO2The sol is organic compound gel containing Si element, and the compound is decomposed into SiO at the temperature of 300-500 DEG C2；
The SiO2The thickness of the sol layer is 1-20 microns.
2. The method for repairing glass surface laser cutting damage according to claim 1, wherein in the step c, the drying temperature is 60-120 ℃ and the drying time is 0.1-0.5 h.
3. The method for repairing glass surface laser cutting damage according to claim 2, wherein the annealing temperature of the annealing treatment in the step e is 200-400 ℃, and the annealing time is 0.5-2.0 h.
4. The method for repairing glass surface laser cutting damage according to claim 3, wherein the laser used for cutting the glass in the step a is a 1064nm or 532nm ultrafast laser with a power of 0.5-30W.
CN201611117282.9A 2016-12-07 2016-12-07 Method for repairing laser cutting damage on glass surface Active CN106587652B (en)

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PCT/CN2017/084440 WO2018103270A1 (en) 2016-12-07 2017-05-16 Method for repairing laser cutting damage on glass surface

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CN106587652B (en) * 2016-12-07 2020-01-21 英诺激光科技股份有限公司 Method for repairing laser cutting damage on glass surface
CN107473570A (en) * 2017-08-11 2017-12-15 西安工业大学 Colloidal sol prepares device of optical element and preparation method thereof
CN109534683B (en) * 2017-09-21 2021-12-31 航天科工惯性技术有限公司 Method for eliminating defects of quartz glass subsurface layer
CN108388036B (en) * 2018-03-05 2021-04-30 京东方科技集团股份有限公司 Material for repairing glass substrate, method for repairing glass substrate and manufacturing method of array substrate
CN109111123A (en) * 2018-09-07 2019-01-01 中国工程物理研究院激光聚变研究中心 Surface defect processing method and laser curing processing system
CN114394764A (en) * 2021-12-31 2022-04-26 中建材蚌埠玻璃工业设计研究院有限公司 Repairing method for repairing edge of flexible glass

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CN1175318C (en) * 2001-12-28 2004-11-10 西安理工大学 Photoinduction SiO2 gel preparation and microfine pattern making method thereof
JP4524249B2 (en) * 2005-12-28 2010-08-11 日本板硝子株式会社 WINDOW GLASS AND MANUFACTURING METHOD THEREOF
CN106587652B (en) * 2016-12-07 2020-01-21 英诺激光科技股份有限公司 Method for repairing laser cutting damage on glass surface

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