CN106526946A - Black matrix manufacturing method - Google Patents
Black matrix manufacturing method Download PDFInfo
- Publication number
- CN106526946A CN106526946A CN201510585243.0A CN201510585243A CN106526946A CN 106526946 A CN106526946 A CN 106526946A CN 201510585243 A CN201510585243 A CN 201510585243A CN 106526946 A CN106526946 A CN 106526946A
- Authority
- CN
- China
- Prior art keywords
- black matrix
- coating
- ito electrode
- black
- glass substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Abstract
The invention discloses a black matrix manufacturing method. The black matrix manufacturing method comprises the steps of washing an ITO electrode and a glass substrate, coating the ITO electrode with PR, and forming a PR film layer after drying; placing a mask plate on the PR film layer, after ultraviolet exposure, adopting a diluted alkaline solution to conducting developing, and forming a PR graph; forming a black coating on the ITO electrode formed with the PR graph, and drying the black coating; illuminating ultraviolet ray from the direction of the glass substrate, and activating the PR graph; washing and separating the PR graph and the black coating on the PR graph, and finally obtaining the black matrix. The black matrix manufacturing method is simple in working procedure, and can manufacture the black matrix graph with high quality demands.
Description
Technical field
The invention belongs to black matrix manufacture method technical field, and in particular to a kind of simple black matrix manufacture method of operation.
Background technology
In general, full-color in order to show, flat-panel display device LCD and FED form trichroism in ITO nesa coating
Pigment or three fluorescence volume graphic.Black matrix is formed between such trichroism pigment or three fluorescence volume graphic, its effect is to carry
The contrast and excitation of high display device picture.
Traditional FED is to absorb the outer light for radiating out from negative electrode point.And LCD is the full-color employing color filter film of display,
Trichroism pigment figure is formed, and between figure, there is black matrix, so as to improve contrast, and thin film transistor (TFT) can be cut off
Exterior light.
In traditional flat-panel display device, the method for forming black matrix on the glass substrate is more.Such as：On negative glue and negative glue
The method simultaneously peeled off of black coating, electrochemical deposition method, light neutralisation etc..But it is low to there is quality, and manufacturing process is multiple
Miscellaneous problem.
The content of the invention
Present invention aim to address the problems referred to above, there is provided a kind of black matrix manufacture method for preparing high-quality black matrix.
For solving above-mentioned technical problem, the technical scheme is that：A kind of black matrix manufacture method, comprises the following steps：
Step one, cleaning ITO electrode and glass substrate, are coated with PR in ITO electrode, form PR film layers after being dried；
Step 2, place mask plate in PR film layers, after ultraviolet exposure, developed using the alkaline solution of dilution, shape
Into PR figures；
Step 3, black coating is formed being formed with the ITO electrode of PR figures, and be dried black coating；
Step 4, from glass substrate direction irradiation ultraviolet radiation, activation PR figures；
Step 5, the black coating on PR figures and PR figures is cleaned and peeled off, finally give black matrix.
In step one, using ultrasonic washer ITO electrode and glass substrate.
In step 3, black coating is formed in ITO electrode using spin-coating method.
Preferably, the black coating is carbon graphite material.
The present invention is had the advantages that compared to prior art：
The black matrix manufacture method operation of the present invention is simple, can produce the black matrix figure of high-quality requirement.
Description of the drawings
Fig. 1 is the schematic flow sheet of black matrix manufacture method of the present invention.
Description of reference numerals：2nd, glass substrate；4th, ITO electrode；6th, PR film layers；6a, PR figure；8th, black coating；
8a, black matrix；10th, mask plate.
Specific embodiment
The present invention is described further with specific embodiment below in conjunction with the accompanying drawings：
As shown in figure 1, the present invention provides a kind of black matrix manufacture method, comprise the following steps：
Step one, ITO electrode 4 and glass substrate 2 are cleaned using ultrasonic washer, PR is coated with ITO electrode 4, is done
PR film layers 6 are formed after dry；
Step 2, in PR film layers 6 place mask plate 10, after ultraviolet exposure, using dilution alkaline solution shown
Shadow, forms PR figure 6a；
Step 3, using spin-coating method being formed with the ITO electrode 4 of PR figure 6a formation black coating 8, and drying is black
Color coating 8；Black coating 8 is carbon graphite material；
Step 4, from 2 direction irradiation ultraviolet radiation of glass substrate, activation PR figure 6a, and be placed in alkaline solution,
Alkaline solution percentage by weight is 0.01%-10%, can be inorganic base substance, or the ammonia such as calcium hydroxide, ammonia
The organic basic material such as network species；
Step 5, the black coating 8 on PR figure 6a and PR figure 6a is cleaned and peeled off, finally give black matrix 8a.
It is illustrated by the following examples the manufacture method of the present invention：
Embodiment 1
Step one, ITO electrode 4 and glass substrate 2 is cleaned using ultrasonic washer, the spin coating PR in ITO electrode 4 turns
Speed is 5000rpm, is finally dried 5 minutes in baking oven, and temperature is 100 DEG C, forms PR film layers 6；
Step 2, in PR film layers 6 place mask plate 10, ultraviolet exposure 15 seconds, using dilution alkaline solution carry out
Development 30 seconds, forms PR figure 6a；
Step 3, using spin-coating method being formed with the ITO electrode 4 of PR figure 6a formation black coating 8, rotating speed it is
700rpm；
Step 4, from 2 direction irradiation ultraviolet radiation of glass substrate, activation PR figure 6a, and be placed on percentage by weight and be
75 seconds in 1.5% aqua calcises；
Step 5, cleaned with distilled water and peel off the black coating 8 on PR figure 6a and PR figure 6a, finally given black
Matrix 8a.
Embodiment 2
Step one, ITO electrode 4 and glass substrate 2 is cleaned using ultrasonic washer, the spin coating PR in ITO electrode 4 turns
Speed is 3000rpm, is finally dried 7 minutes in baking oven, and temperature is 90 DEG C, forms PR film layers 6；
Step 2, in PR film layers 6 place mask plate 10, ultraviolet exposure 11 seconds, using dilution alkaline solution carry out
Development 50 seconds, forms PR figure 6a；
Step 3, using spin-coating method being formed with the ITO electrode 4 of PR figure 6a formation black coating 8, rotating speed it is
300rpm；
Step 4, from 2 direction irradiation ultraviolet radiation of glass substrate, activation PR figure 6a, and be placed on percentage by weight and be
10 seconds in 9.3% ammonia；
Step 5, injection distilled water clean and peel off the black coating 8 on PR figure 6a and PR figure 6a, finally give
Black matrix 8a.
The black matrix manufacture method of the present invention, operation are simple, can produce the black matrix figure of high-quality requirement.
One of ordinary skill in the art will be appreciated that embodiment described here is to aid in reader and understands the present invention's
Principle, it should be understood that protection scope of the present invention is not limited to such especially statement and embodiment.This area it is common
It is various concrete that technical staff can make various other without departing from essence of the invention according to these technologies enlightenment disclosed by the invention
Deformation and combination, these deform and combine still within the scope of the present invention.
Claims (4)
1. a kind of black matrix manufacture method, it is characterised in that comprise the following steps：
Step one, cleaning ITO electrode (4) and glass substrate (2), are coated with PR in ITO electrode (4), shape after being dried
Into PR film layers (6)；
Step 2, placement mask plate (10) in PR film layers (6), after ultraviolet exposure, are entered using the alkaline solution of dilution
Row development, forms PR figures (6a)；
Step 3, black coating (8) is formed in the ITO electrode (4) for being formed with PR figures (6a), and be dried black
Coating (8)；
Step 4, from glass substrate (2) direction irradiation ultraviolet radiation, activation PR figures (6a)；
Step 5, the black coating (8) on PR figures (6a) and PR figures (6a) is cleaned and peeled off, finally give black
Matrix (8a).
2. manufacture method according to claim 1, it is characterised in that：In step one, using ultrasonic washer ITO
Electrode (4) and glass substrate (2).
3. manufacture method according to claim 1, it is characterised in that：It is in step 3, electric in ITO using spin-coating method
Black coating (8) is formed on pole (4).
4. manufacture method according to claim 1, it is characterised in that：Described black coating (8) are carbon graphite material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510585243.0A CN106526946A (en) | 2015-09-14 | 2015-09-14 | Black matrix manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510585243.0A CN106526946A (en) | 2015-09-14 | 2015-09-14 | Black matrix manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106526946A true CN106526946A (en) | 2017-03-22 |
Family
ID=58348584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510585243.0A Pending CN106526946A (en) | 2015-09-14 | 2015-09-14 | Black matrix manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106526946A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107942572A (en) * | 2017-11-17 | 2018-04-20 | 深圳市华星光电技术有限公司 | A kind of preparation method of color membrane substrates and black-matrix material |
| CN113885246A (en) * | 2020-07-03 | 2022-01-04 | 京东方科技集团股份有限公司 | Black matrix structure, manufacturing method thereof, display substrate and display device |
-
2015
- 2015-09-14 CN CN201510585243.0A patent/CN106526946A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107942572A (en) * | 2017-11-17 | 2018-04-20 | 深圳市华星光电技术有限公司 | A kind of preparation method of color membrane substrates and black-matrix material |
| CN113885246A (en) * | 2020-07-03 | 2022-01-04 | 京东方科技集团股份有限公司 | Black matrix structure, manufacturing method thereof, display substrate and display device |
| US11960164B2 (en) | 2020-07-03 | 2024-04-16 | Ordos Yuansheng Optoelectronics Co., Ltd. | Black matrix structure and manufacturing method therefor, display substrate, and display device |
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| C06 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20170322 |