CN106521430A - Production technology of tantalum aluminum target - Google Patents
Production technology of tantalum aluminum target Download PDFInfo
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- CN106521430A CN106521430A CN201510569380.5A CN201510569380A CN106521430A CN 106521430 A CN106521430 A CN 106521430A CN 201510569380 A CN201510569380 A CN 201510569380A CN 106521430 A CN106521430 A CN 106521430A
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- jacket
- tantalum
- target
- aluminium
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Abstract
The invention provides a production technology of a tantalum aluminum target. The production technology comprises following steps: A, a tantalum target and an aluminum back plate are stacked and then placed in a bag; B, the bag obtained in the step A is subject to vacuumizing, and the tantalum target and the aluminum back plate in the bag are welded; C, the bag is subject to heat treatment, the bag is removed, and the tantalum aluminum target is obtained; in the process of producing the tantalum aluminum target, the tantalum aluminum target is subject to welding and heat treatment in sequence in the bag space, under vacuum protection of the bag, oxidization of the surface of the tantalum target in the solid-solution aging treatment process of the tantalum aluminum target can be effectively prevented, and the improvement of the hardness of the aluminum back plate is not affected.
Description
Technical field
A kind of the present invention relates to tantalum aluminium target technology field, more particularly to production technology of tantalum aluminium target.
Background technology
Tantalum aluminium target is that a kind of backboard is aluminium alloy, is applied to the included a tantalum target of semiconductor applications.Tantalum aluminium target
Aluminum alloy back plate raw material hardness it is relatively low, and the hardness needed during semiconductor sputtering machine table use
It is higher, therefore appropriate process need to be carried out to tantalum aluminium target backboard so that its backboard hardness reaches requirement.
In traditional handicraft, included a tantalum target is obtained by welding by tantalum aluminium target with aluminium backboard, tantalum aluminium target
Hot isostatic press welding temperature at 400～550 DEG C, aluminum alloy back plate solution heat treatment temperature is
450～550 DEG C, aging strengthening model temperature is 150～220 DEG C.In order that the aluminium backboard of tantalum aluminium target is hard
Degree reaches customer requirement, if aluminium backboard is first passed through after solid solution aging hardness is improved carrying out heat etc. again
Static pressure is welded, and after welding, aluminium backboard hardness can still be reduced.Therefore need first by included a tantalum target and aluminium alloy
Solid solution aging is carried out again after backboard welding, to reach the hardness that backboard is finally required.
Aluminum alloy back plate solution heat treatment temperature is 450～550 DEG C, if tantalum enters in being exposed to air
Row heat treatment, more than 300 DEG C of heat treatment condition just easily make tantalum surface generate oxide layer, this oxidation
Layer hardness is higher, and follow-up tantalum surface processes and is difficult to remove, and tantalum material belongs to precious metal, oxidation
The turning of layer can cause the waste on cost.Therefore, this application provides a kind of life of tantalum aluminium target
Production. art, so that there is no oxidation in the tantalum surface of the tantalum aluminium target for preparing.
The content of the invention
Present invention solves the technical problem that being to provide a kind of production technology of tantalum aluminium target, the application
There is no oxidation in the included a tantalum target surface of the tantalum aluminium target of production, and the hardness of aluminium backboard is higher.
In view of this, this application provides a kind of production technology of tantalum aluminium target, comprises the following steps：
A), it is positioned in jacket after included a tantalum target and the superposition of aluminium backboard being placed；
B), by step A) jacket that obtains vacuumizes, then carries on the back the included a tantalum target in jacket and aluminium
Plate is welded；
C), the jacket for obtaining is heat-treated, removes jacket, obtain tantalum aluminium target.
Preferably, the vacuum for vacuumizing is 10-2More than Pa.
Preferably, the welding is specially：
Jacket after vacuumizing is placed in hot isostatic press carries out hot isostatic press welding.
Preferably, also include before the heat treatment：
Steel plate is placed in the jacket bottom for obtaining.
Preferably, the heat treatment is specially：
The jacket for obtaining first is carried out solution heat treatment, then carries out aging strengthening model.
Preferably, the temperature of the solution heat treatment is 400～550 DEG C, the aging strengthening model
Temperature be 150～200 DEG C.
Preferably, the temperature of welding is 400～550 DEG C.
Preferably, the jacket is aluminium jacket.
This application provides included a tantalum target and aluminium backboard are superimposed by a kind of production technology of tantalum aluminium target first
Be positioned over after placement in jacket, tantalum aluminium target is made in the closed environment of jacket, then jacket is taken out very
Sky, surface oxidation during preventing tantalum aluminium target to be heat-treated, then by the included a tantalum target in jacket and aluminium backboard
Welded, weld together included a tantalum target and aluminium backboard, finally carrying out heat treatment again is made aluminium backboard
Hardness be improved., during production tantalum aluminium target, whole production technology is in bag for the application
Carry out in the confined space of set, efficiently avoid the oxygen of tantalum aluminium target included a tantalum target in heat treatment process
Change problem, and make the hardness of aluminium sheet higher.
Description of the drawings
Fig. 1 is tantalum aluminium target technological process of production schematic diagram of the present invention.
Specific embodiment
For a further understanding of the present invention, with reference to embodiment to the preferred embodiment of the invention
It is described, but it is to be understood that these descriptions are simply the feature for further illustrating the present invention
And advantage, rather than limiting to the claimed invention.
The embodiment of the invention discloses a kind of production technology of tantalum aluminium target, comprises the following steps：
A), it is positioned in jacket after included a tantalum target and the superposition of aluminium backboard being placed；
B), by step A) jacket that obtains vacuumizes, then carries on the back the included a tantalum target in jacket and aluminium
Plate is welded；
C), the jacket for obtaining is heat-treated, removes jacket, obtain tantalum aluminium target.
In the production process of tantalum aluminium target, tantalum aluminium target is positioned over the application the confined space of jacket
In, problem of oxidation of the included a tantalum target in tantalum aluminium target in heat treatment process is effectively prevent, and is improved
The hardness of aluminium backboard.
As shown in figure 1, Fig. 1 is tantalum aluminium target technological process of production schematic diagram of the present invention, in Fig. 1
Be arranged at top for aluminium backboard, be arranged at bottom for included a tantalum target.According to the present invention, first will
Included a tantalum target and the superposition of aluminium backboard are positioned in jacket after placing again, make tantalum aluminium target in the closed loop of jacket
In border.Herein described jacket is a kind of closed container, and which is used for placing product.Above-mentioned included a tantalum target
The particular location relation placed in jacket with aluminium backboard, it should with tantalum aluminium target in actual applications
Position relationship it is corresponding.The application is not limited to the shape of the jacket；As preferred side
Case, the jacket are close to the shape of tantalum aluminium target, i.e. the shape of tantalum aluminium target is cylinder, then wrap
Set is preferably hollow cylinder, if the shape of tantalum aluminium sheet is cuboid, jacket is preferably sky
The cuboid of the heart.The herein described jacket gap monolateral with the included a tantalum target, aluminium backboard is preferably
0.5～1.5mm, is beneficial to the contraction of the jacket in welding process.
Then the jacket that inside is placed with included a tantalum target and aluminium backboard is vacuumized by the application, in case
Only during tantalum aluminium target solid solution aging high temperature included a tantalum target surface oxidation.The application is preferably logical using molecular pump
Cross deaeration pipe to vacuumize jacket, the herein described vacuum for vacuumizing is preferably greater than
10-2Pa。
According to the present invention, then the jacket under vacuum state is welded, welding herein is
The included a tantalum target not being closely joined together is welded by finger with aluminium backboard.Herein described welding tool
Body is：
Jacket under vacuum state is put in hot isostatic press and is welded, make included a tantalum target and the aluminium back of the body
Plate weld is together.
Above-mentioned welding manner can also be by the way of Diffusion Welding, such as hydraulic press welding；This Shen
Hot isostatic press welding, the hot isostatic press welding is please preferably adopted to adopt
Body respectively to pressure is applied simultaneously, makes the effect of target welding preferable target.Herein described heat
The temperature of isostatic pressed welding is preferably 400 DEG C～550 DEG C.
Then jacket is heat-treated by the application.Due to outer after jacket welding after welding terminates
Side tilts, and the application preferably arranges a steel plate in the bottom surface of jacket before heat treatment, to prevent
During heat treatment, jacket bottom surface vacantly causes the deformation of aluminium backboard larger.For the size of the steel plate,
Which is preferably corresponding with the size of jacket.If jacket is hollow cylinder, the size of steel plate with
The diameter of jacket is suitable.
Jacket is finally heat-treated by the application, is removed jacket, that is, is obtained tantalum aluminium target.This Shen
It is that the tantalum aluminium target that will be welded in jacket carries out solution heat treatment successively with timeliness heat that described please be heat-treated
Process.The solution treatment refers to that alloy is heated to high temperature monophase field constant temperature keeps, and makes superfluous phase
Rear quick cooling in solid solution is dissolved into fully, to obtain the Technology for Heating Processing of supersaturated solid solution.
The Ageing Treatment refers to metal Jing solution treatment, from high temperature quench or through it is a certain degree of it is cold plus
After work deformation, place in higher temperature or room temperature keeps its performance, shape, size are with the time
And the Technology for Heating Processing for changing.Generally speaking, through Ageing Treatment, the hardness of metal material and
Intensity increased, and plasticity toughness and internal stress then decrease.Herein described solution heat treatment
The temperature of reason is preferably 450 DEG C～550 DEG C, and the type of cooling is water-cooled；The aging heat treatment
Temperature is preferably 150～200 DEG C.According to the present invention, jacket is then removed after being heat-treated,
After removing jacket, tantalum surface will not be aoxidized due to the vacuum protection tantalum surface of jacket, and jacket bottom surface has
Steel plate is supported and can ensure surface planarity after product heat treatment.
Included a tantalum target and aluminium backboard are positioned over jacket during production tantalum aluminium target by the application first
In, target is made in this closed environment of jacket, then jacket is evacuated to into certain vacuum
Degree, is then put into the jacket under vacuum state in hot isostatic press and is welded, by included a tantalum target and
Aluminium backboard welds together；After welding is welded due to jacket after terminating, outside tilts, in heat treatment
The front steel plate needed in one size of jacket bottom surface pad as jacket diameter, when preventing heat treatment
Jacket bottom surface vacantly causes the deformation of aluminium backboard larger；Jacket is removed again after aging strengthening model cooling, is gone
After jacket, tantalum surface will not be aoxidized due to jacket vacuum protection tantalum surface, and there is steel plate jacket bottom surface
Support can ensure surface planarity after product heat treatment.
For a further understanding of the present invention, with reference to the tantalum aluminium target that embodiment is provided to the present invention
Production technology be described in detail, protection scope of the present invention is not limited by the following examples.
Embodiment 1
Included a tantalum target is superimposed into placement with aluminium backboard, and included a tantalum target arranges the bottom with aluminium backboard, by included a tantalum target
Be positioned in jacket with aluminium backboard material, and welded, target is made in this closed loop of jacket
In border, then jacket is evacuated to into 1.5 × 10 with molecular pump by deaeration pipe-2Pa；
Jacket under vacuum conditions is put in hot isostatic press and is welded at 450 DEG C, will
Included a tantalum target and aluminium backboard weld together；After welding is welded due to jacket after terminating, outside tilts,
The steel plate as jacket diameter in one size of jacket bottom surface pad is needed before heat treatment, prevents heat
During process, jacket bottom surface vacantly causes the deformation of aluminium backboard larger；To finally be wrapped in is carried out at solid solution
Reason, the temperature of solution treatment is 450 DEG C, and the type of cooling is water-cooled, then the timeliness at 200 DEG C
Heat treatment, removes jacket again, obtains tantalum aluminium target after cooling.Tantalum aluminium target is using after jacket solid solution aging
Tantalum surface is not aoxidized, and aluminium backboard hardness is 120～140HV；Photo shows, the tantalum of tantalum aluminium target
Target surface is dark color.
Embodiment 2
Included a tantalum target is superimposed into placement with aluminium backboard, and included a tantalum target arranges the bottom with aluminium backboard, by included a tantalum target
Be positioned in jacket with aluminium backboard material, and welded, target is made in this closed loop of jacket
In border, then jacket is evacuated to into 1.8 × 10 with molecular pump by deaeration pipe-2Pa；
Jacket under vacuum conditions is put in hot isostatic press and is welded at 550 DEG C, will
Included a tantalum target and aluminium backboard weld together；After welding is welded due to jacket after terminating, outside tilts,
The steel plate as jacket diameter in one size of jacket bottom surface pad is needed before heat treatment, prevents heat
During process, jacket bottom surface vacantly causes the deformation of aluminium backboard larger；Jacket is carried out into solution treatment finally,
The temperature of solution treatment is 480 DEG C, and the type of cooling is water-cooled, then at timeliness heat at 180 DEG C
Reason, removes jacket again, obtains tantalum aluminium target after cooling.Tantalum aluminium target is using tantalum table after jacket solid solution aging
Face does not aoxidize, and aluminium backboard hardness is 150～160HV；Photo shows, the included a tantalum target table of tantalum aluminium target
Face is dark color.
Embodiment 3
Included a tantalum target is superimposed into placement with aluminium backboard, and included a tantalum target arranges the bottom with aluminium backboard, by included a tantalum target
Be positioned in jacket with aluminium backboard material, and welded, target is made in this closed loop of jacket
In border, then jacket is evacuated to into 2.0 × 10 with molecular pump by deaeration pipe-2Pa；
Jacket under vacuum conditions is put in hot isostatic press and is welded at 480 DEG C, will
Included a tantalum target and aluminium backboard weld together；After welding is welded due to jacket after terminating, outside tilts,
The steel plate as jacket diameter in one size of jacket bottom surface pad is needed before heat treatment, prevents heat
During process, jacket bottom surface vacantly causes the deformation of aluminium backboard larger；Jacket is carried out into solution treatment finally,
The temperature of solution treatment is 500 DEG C, and the type of cooling is water-cooled, then at timeliness heat at 160 DEG C
Reason, removes jacket again, obtains tantalum aluminium target after cooling.Tantalum aluminium target is using tantalum table after jacket solid solution aging
Face does not aoxidize, and aluminium backboard hardness is 100～120HV；Photo shows, the included a tantalum target table of tantalum aluminium target
Face is dark color.
The explanation of above example is only intended to help and understands that the method for the present invention and its core are thought
Think.It should be pointed out that for those skilled in the art, without departing from this
On the premise of bright principle, some improvement and modification can also be carried out to the present invention, these improve and
Modification is also fallen in the protection domain of the claims in the present invention.
The foregoing description of the disclosed embodiments, enables professional and technical personnel in the field to realize
Or using the present invention.Various modifications to these embodiments come to those skilled in the art
Say and will be apparent, generic principles defined herein can be without departing from the present invention's
In the case of spirit or scope, realize in other embodiments.Therefore, the present invention will not be by
It is limited to the embodiments shown herein, and is to fit to and principles disclosed herein and new
The consistent most wide scope of clever feature.
Claims (8)
1. a kind of production technology of tantalum aluminium target, comprises the following steps：
A), it is positioned in jacket after included a tantalum target and the superposition of aluminium backboard being placed；
B), by step A) jacket that obtains vacuumizes, then carries on the back the included a tantalum target in jacket and aluminium
Plate is welded；
C), the jacket for obtaining is heat-treated, removes jacket, obtain tantalum aluminium target.
2. production technology according to claim 1, it is characterised in that described to vacuumize
Vacuum be 10-2More than Pa.
3. production technology according to claim 1, it is characterised in that the welding tool
Body is：
Jacket after vacuumizing is placed in hot isostatic press carries out hot isostatic press welding.
4. production technology according to claim 1, it is characterised in that in heat treatment
It is front also to include：
Steel plate is placed in the jacket bottom for obtaining.
5. production technology according to claim 1, it is characterised in that the heat treatment
Specially：
The jacket for obtaining first is carried out solution heat treatment, then carries out aging strengthening model.
6. production technology according to claim 5, it is characterised in that the solid solution heat
The temperature of process is 400～550 DEG C, and the aging heat treatment temperature is 150～200 DEG C.
7. production technology according to claim 1, it is characterised in that the temperature of welding
For 400～550 DEG C.
8. the production technology according to any one of claim 1～7, it is characterised in that institute
Jacket is stated for aluminium jacket.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510569380.5A CN106521430A (en) | 2015-09-09 | 2015-09-09 | Production technology of tantalum aluminum target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510569380.5A CN106521430A (en) | 2015-09-09 | 2015-09-09 | Production technology of tantalum aluminum target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106521430A true CN106521430A (en) | 2017-03-22 |
Family
ID=58346823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510569380.5A Pending CN106521430A (en) | 2015-09-09 | 2015-09-09 | Production technology of tantalum aluminum target |
Country Status (1)
| Country | Link |
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| CN (1) | CN106521430A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101543937A (en) * | 2009-03-12 | 2009-09-30 | 宁波江丰电子材料有限公司 | Method for welding target material and back board |
| CN101564793A (en) * | 2009-04-17 | 2009-10-28 | 宁波江丰电子材料有限公司 | Welding method of aluminum target blank and aluminum alloy backboard |
| CN102534518A (en) * | 2011-12-29 | 2012-07-04 | 宁波江丰电子材料有限公司 | Backboard fabricating method |
| CN103071791A (en) * | 2013-01-18 | 2013-05-01 | 航天材料及工艺研究所 | Forming method of TiAl pipe target material in large length-diameter ratio |
-
2015
- 2015-09-09 CN CN201510569380.5A patent/CN106521430A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101543937A (en) * | 2009-03-12 | 2009-09-30 | 宁波江丰电子材料有限公司 | Method for welding target material and back board |
| CN101564793A (en) * | 2009-04-17 | 2009-10-28 | 宁波江丰电子材料有限公司 | Welding method of aluminum target blank and aluminum alloy backboard |
| CN102534518A (en) * | 2011-12-29 | 2012-07-04 | 宁波江丰电子材料有限公司 | Backboard fabricating method |
| CN103071791A (en) * | 2013-01-18 | 2013-05-01 | 航天材料及工艺研究所 | Forming method of TiAl pipe target material in large length-diameter ratio |
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Application publication date: 20170322 |