CN106354294B - 触控显示设备 - Google Patents

触控显示设备 Download PDF

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CN106354294B
CN106354294B CN201610080200.1A CN201610080200A CN106354294B CN 106354294 B CN106354294 B CN 106354294B CN 201610080200 A CN201610080200 A CN 201610080200A CN 106354294 B CN106354294 B CN 106354294B
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layer
touch control
insulating layer
display device
touching signals
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CN106354294A (zh
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蔡嘉豪
彭仁杰
张志豪
陈柏锋
刘同凯
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Innolux Corp
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Innolux Display Corp
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    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • GPHYSICS
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    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • GPHYSICS
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    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
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    • GPHYSICS
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    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
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    • G06F3/0412Digitisers structurally integrated in a display
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416Control or interface arrangements specially adapted for digitisers
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/047Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using sets of wires, e.g. crossed wires
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/14Digital output to display device ; Cooperation and interconnection of the display device with other functional units
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
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    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

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  • Condensed Matter Physics & Semiconductors (AREA)
  • Position Input By Displaying (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal Display Device Control (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)

Abstract

本发明提供了一种触控显示设备,其包括:一基板;一薄膜晶体管元件,设于该基板上;一第一绝缘层,设于该薄膜晶体管元件上;一触控信号线层,设于该第一绝缘层上;一第二绝缘层,设于该触控信号线层上;一第一透明导电层,设于该第二绝缘层上;一第三绝缘层,设于该第一透明导电层上;以及一第二透明导电层,设于该第三绝缘层上。

Description

触控显示设备
技术领域
本发明是关于一种触控显示设备,尤指一种内嵌式触控的触控显示设备。
背景技术
近年来,随着操作人性化、简洁化的发展趋势,带有触控面板的触控显示设备被越来越广泛地应用于生活中。由于用户可以通过直接用手或者其他物体接触触控面板的方式输入信号,从而减少甚至消除用户对其他输入设备(如键盘、鼠标、遥控器等)的依赖,使用户操作的便利性大幅提升。
触控面板技术可由信号产生原理、感测技术、屏幕组装方式等三大面向区分不同种类。依据信号产生原理不同,可区分为数字式及模拟式:数字式触控信号是采用透明ITO(Indium Tin Oxide;铟锡氧化物)导电薄膜,在透明导电玻璃上依X、Y轴方向分布导线,在线路交错处形成开关,按压时就感应触碰信号;而模拟式触控原理与数字式的差别在于上下层间设有隔球(dot spacer),碰触后上下层电极接通而产生电位差的信号,再通过电路把信号传给控制器,以处理和计算触碰点的坐标位置。再者,触控面板技术若依感测技术、制作技术及工艺技术不同可区分为电信号(包含电阻式、电容式、电磁式等)、光信号(包含红外线式等)、及声信号(包含表面声波式、声波导式、色散信号式、声脉冲式等)。
然而,无论是前述何种形式的触控面板技术,若触控信号线断线,均会造成触控感应不良,而降低触控品质。有鉴于此,发展一种触控显示设备,其可减少触控信号线断线的风险,进而提升触控合格率是目前业界研发方向之一。
发明内容
本发明的主要目的是提供一种触控显示设备,其除了可避免触控信号线断线外,更可同时兼顾像素电极与共电极间的储存电容。
本发明的触控显示设备包括:一基板;一薄膜晶体管元件,设于该基板上;一第一绝缘层,设于该薄膜晶体管元件上;一触控信号线层,设于该第一绝缘层上;一第二绝缘层,设于该触控信号线层上;一第一透明导电层,设于该第二绝缘层上;一第三绝缘层,设于该第一透明导电层上;以及一第二透明导电层,设于该第三绝缘层上。
于本发明的一实施方面中,该薄膜晶体管元件包括一源极漏极层,且该第一透明导电层可通过一像素电极用接触孔与该源极漏极层电性连接。同时,该第二透明导电层可包括一触控电极及一共电极,且该触控电极可通过一触控电极用接触孔与该触控信号线层电性连接。此时,可提供一共电极在上而像素电极在下的触控显示设备。
于本发明的另一实施方面中,该薄膜晶体管元件包括一源极漏极层,且该第二透明导电层可通过一像素电极用接触孔与该源极漏极层电性连接。同时,该第一透明导电层可包括一触控电极及一共电极,且该触控电极可通过一触控电极用接触孔与该触控信号线层电性连接。此时,可提供一像素电极在上而共电极在下的触控显示设备。
于本发明所提供的显示面板中,无论是前述共电极在上而像素电极在下的触控显示面板或是像素电极在上而共电极在下的触控显示面板,由于触控信号线层上方层叠有第二绝缘层及第三绝缘层,即便在工艺上有微粒附着在触控信号线层的触控信号线上,也不至于导致触控信号线有断线的情形发生。此外,于本发明所提供得显示面板中,无论第一透明导电层与第二透明导电层何者作为像素电极及共电极,由于两透明导电层间仅设有一第三绝缘层,故两者之间的储存电容不会因设置多层绝缘层而降低,而可维持两透明导电层间的储存电容及彼此之间的电性。
附图说明
图1为本发明的触控显示设备的上视示意图。
图2为本发明的一实施例的触控显示设备的剖面示意图。
图3为本发明的一比较例的触控显示设备的剖面示意图。
图4为本发明的另一实施例的触控显示设备的剖面示意图。
图5为本发明的另一比较例的触控显示设备的剖面示意图。
图6为施加于本发明的触控显示设备的信号的时序图。
图7为显示实际触控信号线与相连接的触控电极上的信号的波形。
图8为显示当碰触特定触控电极时触控信号线与相连接的触控电极上的信号的波形。
【符号说明】
11 基板 12 薄膜晶体管元件
121 栅极金属层 122 栅极绝缘层
123 半导体层 124 源极漏极层
13 第一绝缘层 131 绝缘层
132 平坦层 133 绝缘层
14 触控信号线 15 第二绝缘层
16 像素电极 161 接触孔
17 第三绝缘层 18 第二透明导电层
181 触控电极图案 1811 触控电极用接触孔
19 第一透明导电层 1911 触控电极用接触孔
20 像素电极 201 像素电极用接触孔
t1 厚度 t2 厚度
S1~Sn 触控电极 T1~Tn 信号
具体实施方式
以下通过特定的具体实施例说明本发明的实施方式,本领域普通技术人员可由本说明书所揭示的内容轻易地了解本发明的其他优点与功效。本发明亦可通过其他不同的具体实施例加以施行或应用,本说明书中的各项细节亦可针对不同观点与应用,在不背离本发明的精神下进行各种修饰与变更。
再者,说明书与权利要求中所使用的序数例如”第一”、”第二”、”第三”等的用词,以修饰权利要求的元件,其本身并不包含及代表该请求元件有任何之前的序数,也不代表某一请求元件与另一请求元件的顺序、或是制造方法上的顺序,该些序数的使用仅用来使具有某命名的一请求元件得以和另一具有相同命名的请求元件能做出清楚区分。
图1为本发明的触控显示设备的上视示意图。本发明的触控显示设备为一自容式内嵌式触控装置,包括:多个触控电极图案181及触控信号线14,其中,每一触控电极图案181通过触控电极用接触孔1811以与触控信号线14电性连接。信号T1、T2至Tn由触控信号线14通过触控电极用接触孔1811传送至触控电极图案181,而一使用者碰触触控电极图案181以提供触控信号给触控电极图案181并再通过触控电极用接触孔1811连接至触控信号线14;通过比较使用者碰触前后的信号变化,而可判断使用者碰触的位置。
图2为本发明的一实施例的触控显示设备的剖面示意图。如图2所示,于本实施例的触控显示设备的制作方法中,首先,提供一基板11。而后,于基板上形成一经图案化的栅极金属层121;于栅极金属层121及基板11上形成一栅极绝缘层122;于栅极绝缘层122上形成一经图案化的半导体层123,其中半导体层123与栅极金属层121对应设置;于半导体层123上形成一图案化的源极漏极层124;如此,则完成本实施例的基板11上的薄膜晶体管元件12制作。
而后,于薄膜晶体管元件12上层叠一第一绝缘层13薄膜晶体管元件。于本实施例中,第一绝缘层13具有三层结构,包括依序叠置的绝缘层131、平坦层132、及另一绝缘层133。然而,于本发明的其他实施例中,第一绝缘层13并不限于包括如图2所示的三层结构。
接着,于第一绝缘层13上形成一包括触控信号线14的触控信号线层,再于第一绝缘层13及触控信号线14上形成一第二绝缘层15。而后,于第二绝缘层15形成一包括像素电极16的第一透明导电层,其通过一接触孔161以与源极漏极层124电性连接,接触孔161是通过图案化第一绝缘层13与第二绝缘层15而成。接着,在第一透明导电层上形成一第三绝缘层17。最后,于第三绝缘层17上形成一作为触控电极及共电极的第二透明导电层18,第二透明导电层18通过一触控电极用接触孔1811与触控信号线14电性连接,其中,触控电极用接触孔1811是通过图案化第二绝缘层15与第三绝缘层17而成。
于本实施例中,基板11其可使用例如玻璃、塑料、可挠性材质等基材材料所制成。栅极绝缘层122、绝缘层131、平坦层132、绝缘层133、第二绝缘层15及第三绝缘层17可使用如氧化物、氮化物或氮氧化物等绝缘层材料制作。栅极金属层121、源极漏极层124及触控信号线14可使用导电材料,如金属、合金、金属氧化物、金属氮氧化物、或其他电极材料所制成。半导体层123可使用非晶硅、低温多晶硅、IGZO、或其他具有半导体性质的材料。像素电极16及第二透明导电层18则可使用如ITO、IZO或ITZO等透明导电电极材料所制成。然而,于本发明的其他实施例中,前述元件的材料并不仅限于此。
经由上述工艺,则完成本实施例的共电极在上而像素电极在下的触控显示设备,其包括:一基板11;一薄膜晶体管元件12,设于基板11上;一第一绝缘层13,设于薄膜晶体管元件12上;一包括触控信号线14的触控信号线层,设于第一绝缘层13;一第二绝缘层15,设于触控信号线层上;一包括像素电极16的第一透明导电层,设于第二绝缘层15上;一第三绝缘层17,设于第一透明导电层上;以及一作为触控电极及共电极的第二透明导电层18,设于第三绝缘层17上。其中,第二绝缘层15的厚度t1及第三绝缘层17的厚度t2可分别介于10nm至1000nm之间。
于本实施例中,薄膜晶体管元件12的源极漏极层124与像素电极16通过一像素电极用接触孔161电性连接。此外,第二透明导电层18则通过一触控电极用接触孔1811与触控信号线14电性连接。再者,触控信号线层的触控信号线14,与源极漏极层124的源极或漏极对应设置;更具体而言,触控信号线14与源极或漏极重叠,借此,可避免因触控信号线14而牺牲像素单元的穿透率。
图3为本发明的一比较例的触控显示设备的剖面示意图。本比较例的触控显示设备的制作方式与结构与图2所示的实施例相似,除了下述不同点。
如图2及图3所示,于图3比较例的触控显示设备中,第一绝缘层13具有双层结构,包括依序叠置的绝缘层131及平坦层132;而此双层结构也可应用于图2实施例的第一绝缘层13上。
此外,于图3比较例的触控显示设备中,于形成第一绝缘层13后,先形成包括像素电极16的第一透明导电层,而后再依序形成第二绝缘层15、包括触控信号线14的触控信号线层、第三绝缘层17、及作为触控电极及共电极的第二透明导电层18;然而,于图2实施例的触控显示设备中,则是于形成第一绝缘层13后,先形成包括触控信号线14的触控信号线层,而后再依序形成第二绝缘层15、包括像素电极16的第一透明导电层、第三绝缘层17、及第二透明导电层18。
于图3比较例的触控显示设备中,为了避免触控信号线14因附着在上方的微粒导致触控信号线14刮伤而有断线的风险产生,需增加第三绝缘层17的厚度t1以保护触控信号线14。然而,此第三绝缘层17的厚度t1增加,却会导致像素电极16与第二透明导电层18间的电场降低及储存电容下降,而降低显示设备的亮度及flicker水平;而为了提升亮度,势必得增加像素电极16与第二透明导电层18间的电压差,造成耗电量增加。
然而,于图2实施例的触控显示设备中,由于先形成触控信号线14,而后才形成像素电极16(第一透明导电层)与共电极182(第二透明导电层),故触控信号线14上方层叠有第二绝缘层15及第三绝缘层17,使得触控信号线14上方绝缘层总厚度为t1加上t2;如此,不必特别增加第三绝缘层17的厚度t1,即可达到保护触控信号线14的目的,避免触控信号线14断线的问题。
此外,于图2实施例的触控显示设备中,像素电极16与第二透明导电层18间仅相隔一第三绝缘层17,厚度为t2;但于图3比较例的触控显示设备中,像素电极16与第二透明导电层18间却相隔了第二绝缘层15及第三绝缘层17,厚度为t1加上t2。因此,相比于图3比较例的触控显示设备,图2实施例的触控显示设备中像素电极16与第二透明导电层18间绝缘层总厚度较小,故像素电极16与第二透明导电层18间的储存电容较高,而无需特别提高两者之间的电压差,即可达到预定的显示亮度。
再者,于图2实施例的触控显示设备中,触控信号线14与第二透明导电层18间相隔了第二绝缘层15及第三绝缘层17,厚度为t1加上t2;但于图3比较例的触控显示设备中,触控信号线14与第二透明导电层18间仅相隔一第三绝缘层17,厚度为t1。因此,相比于图3比较例的触控显示设备,图2实施例的触控显示设备中因触控信号线14与第二透明导电层18间距离较远,在其他未设有触控电极用接触孔1811的区域(请参考图1),可降低触控信号线14与第二透明导电层18间的寄生电容。
图4为本发明的另一实施例的触控显示设备的剖面示意图。本实施例的触控显示设备的制作方式与结构与图2所示的实施例相似,除了下述不同点。
于图2实施例的触控显示设备为一共电极在上而像素电极在下的触控显示设备,其中,第一透明导电层包括像素电极16,而第二透明导电层作为触控电极及共电极;但于图4实施例的触控显示设备为一像素电极在上而共电极在下的触控显示设备,其中,第一透明导电层19作为触控电极及共电极,而第二透明导电层包括像素电极20。因此,于图4实施例的触控显示设备中,第二透明导电层的像素电极20通过一像素电极用接触孔201与源极漏极层124电性连接。此外,第一透明导电层19通过一触控电极用接触孔1911与触控信号线14电性连接。
图5为本发明的另一比较例的触控显示设备的剖面示意图。本比较例的触控显示设备的制作方式与结构与图4所示的实施例相似,除了下述不同点。
如图4及图5所示,于图5比较例的触控显示设备中,第一绝缘层13具有双层结构,包括依序叠置的绝缘层131及平坦层132;而此双层结构也可应用于图4实施例的第一绝缘层13上。
此外,于图5比较例的触控显示设备中,于形成第一绝缘层13后,先形成作为触控电极及共电极的第一透明导电层19,而后再依序形成第二绝缘层15、包括触控信号线14的触控信号线层、第三绝缘层17、及包括像素电极20的第二透明导电层;然而,于图4实施例的触控显示设备中,于形成第一绝缘层13后,先形成包括触控信号线14的触控信号线层,而后再依序形成第二绝缘层15、第一透明导电层19、第三绝缘层17、及包括像素电极20的第二透明导电层。
于图5比较例的触控显示设备中,为了避免触控信号线14因附着在上方的微粒导致触控信号线14刮伤而有断线的风险产生,需增加第三绝缘层17的厚度t1以保护触控信号线14。然而,此第三绝缘层17的厚度t1增加,却会导致像素电极20与第一透明导电层19的距离增加,也就是说像素电极与共电极间的电场也会减弱而降低显示设备的亮度;而为了提升亮度,势必得增加像素电极20与第一透明导电层19间的电压差,造成耗电量增加。
然而,于图4实施例的触控显示设备中,由于先形成触控信号线14,而后才形成共电极(第一透明导电层19)与像素电极20(第二透明导电层),故触控信号线14上方层叠有第二绝缘层15及第三绝缘层17,使得触控信号线14上方绝缘层总厚度为t1加上t2;如此,不必特别增加第三绝缘层17的厚度t1,即可达到保护触控信号线14的目的,避免触控信号线14断线的问题。
此外,于图4实施例的触控显示设备中,像素电极20与共电极(第一透明导电层19)间仅相隔一第三绝缘层17,厚度为t1;但于图5比较例的触控显示设备中,像素电极20与共电极(第一透明导电层19)间却相隔了第二绝缘层15及第三绝缘层17,厚度为t1加上t2。因此,相比于图5比较例的触控显示设备,图4实施例的触控显示设备中像素电极20与共电极(第一透明导电层19)间绝缘层总厚度较小,故像素电极20与共电极(第一透明导电层19)间的储存电容较高,而无需特别提高两者之间的电压差,即可达到预定地显示亮度。
图6为施加于本发明的触控显示设备的信号的时序图。为方便说明,图中是以S1~Sn代表多数个以行列排列的触控电极图案181,并以T1~Tn表示经由触控信号线14电性连接至触控电极S1~Sn的信号,且其中S1,S2,S3,S4...是表示第1行(column)的触控电极图案181,如图6所示,施加于触控电极图案181的信号例如为一方波驱动信号,对于同一行的触控电极图案181(例如S1,S2,S3,S4...)所连接的触控信号线14的信号(例如T1,T2,T3,T4...),相邻的两个触控电极图案181(S1及S2、S2及S3、S3及S4...)所连接的触控信号线14(T1及T2、T2及T3、T3及T4...)的信号是反相的。也就是,信号T1及T2是同步一起改变,但当信号T1为高电位至低电位时,信号T2则为低电位至高电位;同样地,信号T2及T3是同步一起改变,但当信号T2为高电位至低电位时,信号T3则为低电位至高电位;信号T3及T4是同步一起改变,但当信号T3为高电位至低电位时,信号T4则为低电位至高电位。而此反相的信号由于RC负载信号会造成衰减(distortion),因此实际触控信号线14与相连接的触控电极图案181上的信号如图7所示。而当碰触特定触控电极图案181(82或S3)时造成对应区域的电容/电荷/信号改变,进而影响其所连接的触控信号线14上的信号,而由于相邻于触控电极图案181的两个触控电极图案181所连接的触控信号线14的信号是反相的,可使多个的触控电极图案181在被碰触后,其连接的触控信号线14对未相连接的触控电极图案181产生的电容耦合具可抵消的功效,据以降低未被碰触的触控电极图案181(例如S1及S4)其所连接的触控信号线14上信号(T1及T4)的变化,如图8所示,让碰触与未碰触的触控信号线14上的信号有较为显著的差异,避免垂直串扰所造成的碰触位置判断错误。
本发明前述实施例所制得的触控显示设备,可应用于本技术领域已知的任何需要显示屏幕的电子装置上,如显示器、手机、笔记本电脑、摄影机、照相机、音乐播放器、移动导航装置、电视等需要显示影像的电子装置上。
上述实施例仅是为了方便说明而举例而已,本发明所主张的权利范围自应以权利要求所述为准,而非仅限于上述实施例。

Claims (6)

1.一种触控显示设备,其特征在于,包括:
一基板;
一薄膜晶体管元件,设于该基板上;
一第一绝缘层,设于该薄膜晶体管元件上;
一触控信号线层,设于该第一绝缘层上;
一第二绝缘层,设于该触控信号线层上;
一第一透明导电层,设于该第二绝缘层上;
一第三绝缘层,设于该第一透明导电层上;以及
一第二透明导电层,设于该第三绝缘层上;
其中该薄膜晶体管元件包括一源极漏极层,且该第二透明导电层通过一像素电极用接触孔与该源极漏极层电性连接。
2.根据权利要求1所述的触控显示设备,其中该触控信号线与该源极或该漏极重叠。
3.根据权利要求1所述的触控显示设备,其中该第一透明导电层包括多个触控电极图案,且每一触控电极图案通过一触控电极用接触孔与该触控信号线层电性连接。
4.根据权利要求1所述的触控显示设备,其中该源极漏极层包括一源极及一漏极,该触控信号线层包括一触控信号线,且该触控信号线与该源极或该漏极对应设置。
5.根据权利要求1所述的触控显示设备,其中该第二绝缘层的厚度介于10nm至1000nm之间。
6.根据权利要求1所述的触控显示设备,其中该第三绝缘层的厚度介于10nm至1000nm之间。
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