CN106153212A - A kind of surface acoustic wave sensor manufacture method based on nano-imprint process - Google Patents
A kind of surface acoustic wave sensor manufacture method based on nano-imprint process Download PDFInfo
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- CN106153212A CN106153212A CN201510184216.2A CN201510184216A CN106153212A CN 106153212 A CN106153212 A CN 106153212A CN 201510184216 A CN201510184216 A CN 201510184216A CN 106153212 A CN106153212 A CN 106153212A
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- acoustic wave
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- surface acoustic
- impression block
- wave sensor
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Abstract
The invention discloses a kind of surface acoustic wave sensor manufacture method based on nano-imprint process, including: generate and be carved with interdigital transducer and be positioned at the impression block of distribution patterns of reflecting grating of interdigital transducer arranged on left and right sides；Use an impression block to use Step-and-repeat method for stamping to print continuously on substrate, this substrate is made as has the secondary impression block that multiple and on an impression block pattern is identical；Secondary impression formboard impressing is used to make surface acoustic wave sensor.The surface acoustic wave sensor manufacture method based on nano-imprint process of the present invention, can accurately control the generation of interdigital transducer, thus realize high certainty of measurement and concordance, the insertion loss of high-frequency sound surface wave device can be reduced by reducing the interdigital resistance of transducer, stable lifting sensor quality factor Q value, there is high practicality, and interdigital transducer cost of manufacture can be reduced, pollution-free.
Description
Technical field
The present invention relates to nanometer embossing field, particularly relate to a kind of sound table based on nano-imprint process
Wave sensor manufacture method.
Background technology
Surface acoustic wave is a kind of elastic wave propagated along body surface.Owing to piezoquartz itself is that transducing is situated between
, there is coupling between electroacoustic, therefore can make electroacoustic at the piezoelectric crystal surface propagating surface acoustic wave in matter
Transducer, makes electric energy and acoustic energy change mutually, as shown in Figure 1A.Transducer on piezoquartz substrate
After the wireless signal of input being transformed into acoustical signal by inverse piezoelectric effect, by two, left and right periodically grizzly bar
Reflecting to form resonance, the resonant frequency of this resonator is relevant with temperature, and the change of its resonant frequency is with temperature
The change of degree is the most linear, as shown in Figure 1B.Utilize this linear relationship the most permissible
Accurate dut temperature is obtained by the frequency obtaining surface acoustic wave.
By surface acoustic wave (SAW) sensor and read write line, (temperature obtains single wireless and passive temperature temp measuring system
Unit) composition.SAW sensor obtains the change of temperature by its material behavior, and the change of temperature is turned
It is changed to the change of resonant frequency.Read write line is made up of digital control part and RF transceiver, it is achieved frequently
The frequency sweep of rate and the detection of faint response signal.Read write line produces radiofrequency signal and sends through antenna,
SAW temperature sensor receives radiofrequency signal through antenna and the radiofrequency signal of temperature influence is reflected
Come, then the signal reflected by read write line reception processes reading temperature through amplification, ADC sampling and FPGA
Degree, thus realize wireless temperature data acquisition.Passive and wireless temperature monitoring system is as shown in Figure 2.
Interdigital transducer (IDT) is the core component of SAW device, is that a kind of electrode is interlaced
, sound-electric, the electro-acoustic transducer that can excite and detect surface acoustic wave.IDT excites surface acoustic wave
Principle is the most similar with the excitation principle of electromagnetic wave.The general structure of IDT is as it is shown on figure 3,31 is interdigital
Bar, 32 is busbar, and its geometrical structure parameter mainly has interdigital cycle P, electrode width a, and (30 is micro-
Rice), electrode gap b (30 microns), thickness of electrode h (2 microns), (2.5 is micro-for interdigital aperture W
Rice), interdigital logarithm N (24) etc..Interdigital transducer and left and right reflecting grating are the core of surface acoustic wave sensor
The heart, directly affects sensor quality factor (Q-value), and its traditional handicraft is lithography corrosion technology, this technology
There is the weak points such as frequency response range is narrow, insertion loss is too high, precision concordance is difficult to control to.
Summary of the invention
In view of this, it is an object of the invention to propose a kind of surface acoustic wave based on nano-imprint process pass
Sensor manufacture method, makes surface acoustic wave sensor by secondary impression formboard impressing.
A kind of surface acoustic wave sensor manufacture based on nano-imprint process is provided based on the above-mentioned purpose present invention
Method, including: generate and be carved with interdigital transducer and be positioned at the anti-of described interdigital transducer arranged on left and right sides
Penetrate an impression block of the distribution patterns of grid；A described impression block is used to use Step-and-repeat impressing
Method is printed on substrate continuously, be made as this substrate having multiple with on a described impression block
The secondary impression block that pattern is identical；Described secondary impression formboard impressing is used to make surface acoustic wave sensing
Device.
According to one embodiment of present invention, further, in described employing Step-and-repeat method for stamping
Method for stamping includes: thermal marking method, ultra-violet curing method for stamping, Microcontact printing method.
According to one embodiment of present invention, further, in described employing Step-and-repeat method for stamping
Method for stamping is thermal marking method, specifically includes: step 1, on the substrate one layer of heat of even spread
Plastic macromolecule photoresist, and described photoresist is heated to more than glass transition temperature；Step 2, executes
Plus-pressure, is pressed into a described impression block in the photoresist of hot mastication, and maintain high temperature,
High pressure conditions；After default holding time, make thermal plastic high polymer photoresist be filled into described in once
In the nanostructured of impression block；Step 3, after described photoresist cools and solidifies, discharges pressure, will
A described impression block departs from described substrate；Step 4, translates a described impression block, repeats step
Rapid 2 and 3, described photoresist repeats the figure of an impression block described in imprinting and copying；Step
Rapid 5, the photoresist with coining pattern of described substrate surface is carried out reactive ion etching removal residual
Primer.
According to one embodiment of present invention, further, after completing step 5, step 6 is carried out,
Surface sputtering a thin layer metal film with the described substrate of photoetching offset plate figure；Step 7, uses and peels off work
Skill removes photoresist and its metal film covered above of described substrate surface, retains described substrate surface
The metal film covered at unglazed photoresist, generates described secondary impression block.
According to one embodiment of present invention, further, described secondary impression block surface is used alkane
Base silane processes, at described secondary impression block Surface Creation passivation layer；Described alkyl silane bag
Include: CF3 (CF2) 6 (CH2) 2SiCl3 etc..
According to one embodiment of present invention, further, retain with described secondary impression block surface
The metal film come carries out reactive ion etching as mask, makes described substrate have the figure of phase shifting type distribution
Case.
According to one embodiment of present invention, further, described secondary impression formboard impressing is used to make
Described interdigital transducer and be positioned at the reflecting grating of described interdigital transducer arranged on left and right sides, printed material is adopted
With wire netting so that the busbar of described interdigital transducer is that the latticed of 50% metal coverage rate is confluxed
Bar.
According to one embodiment of present invention, further, the substrate material of described secondary impression formboard is
Quartz wafer；The electrode material of described interdigital transducer is aluminum, gold or copper.
According to one embodiment of present invention, further, in interdigital bar, the remittance of described interdigital transducer
Silicon dioxide protective film is laid on the surface of stream bar.
According to one embodiment of present invention, further, utilize direct electronic beam writing technology a template
The upper reflecting grating making 50-500 interdigital transducer and being positioned at described interdigital transducer arranged on left and right sides
Pattern, generates a described impression block.
The surface acoustic wave sensor manufacture method based on nano-imprint process of the present invention, utilizes nano impression
Technique prints the method making surface acoustic wave sensing of interdigital transducer and left and right reflecting grating on a quartz substrate
Device, printed material uses the netted busbar of 50% metal coverage rate, can be accurately controlled interdigital transducing
Device bar width and insertion loss, and then improve surface acoustic wave sensor concordance and quality factor, have high
Practicality, cost of manufacture is low, pollution-free.
Accompanying drawing explanation
Figure 1A is surface acoustic wave temperature-measurement principle figure in prior art；Wherein, 1-reflecting grating, 2-piezoelectricity base
Sheet, 3-transducer, 4-antenna, 5-surface acoustic wave, 6-reflecting grating；Figure 1B is chip resonant frequency and temperature
Degree variation relation schematic diagram；
Fig. 2 is that passive and wireless temperature monitoring system of the prior art constitutes schematic diagram；Wherein, 21-read-write
Device, 22,23,24-SAW temperature sensors；
Fig. 3 is the structural representation of interdigital transducer；
Fig. 4 is of the surface acoustic wave sensor manufacture method based on nano-imprint process according to the present invention
The flow chart of individual embodiment；
Fig. 5 A to Fig. 5 E is the surface acoustic wave sensor manufacture based on nano-imprint process according to the present invention
The making schematic diagram of the secondary template of method；Wherein, Fig. 5 A is that impression block, Fig. 5 B are for once
Impression block is by being distributed the secondary impression block of multi-impression generation, Fig. 5 C for enter secondary impression block
Row splash-proofing sputtering metal processes, Fig. 5 D is final for generating for secondary impression block carries out lift-off processing, Fig. 5 E
Secondary template；
Fig. 6 is the system of the surface acoustic wave sensor manufacture method based on nano-imprint process according to the present invention
Make schematic diagram；Wherein, impression block of 51-, bis-impression blocks of 52-；
Fig. 7 is the SAW device schematic diagram of the netted busbar using 50% metal coverage rate.
Detailed description of the invention
For making the object, technical solutions and advantages of the present invention clearer, below in conjunction with being embodied as
Example, and referring to the drawings, the present invention is described in more detail.
Nanometer embossing is the emerging interleaving techniques that nano material combines with printing technology, utilizes up-to-date
Nano functional sensing material, by nano printing method, and use the evaporation work such as spin coating Temperature Treatment
Skill, printed electronic circuit and device in the substrates such as pottery, plastics and rubber, it is not necessary to complicated etching work
Skill, has technique feature simple, free of contamination.
It is first in nineteen ninety-five that this technology is taught Zhou Yu (Stephen Chou) by the Princeton university foreign citizen of Chinese origin
Secondary proposition.By nanostructure template is placed on polymer film surface, at certain temperature, pressure etc.
Under the conditions of, make polymer gradually be filled in nano-form cavity, after thing solidifying and setting to be polymerized, by mould
Plate is peeled off with polymer, thus realizes a kind of method of nanostructured transfer.With conventional lithography principle not
With, nano impression is a kind of method utilizing nano-imprint stamp to carry out structure transfer, shifts in structure
Cheng Zhong, physical dimension is determined by template size, is not affected by optical wavelength, the most not by optics ripple
The restriction to construction structure of the long diffraction limit, thus it is shown that ultrahigh resolution, high yield, low cost etc.
It is suitable for the particular advantages of industrial applications.Nanometer embossing is due to its wide application prospect, from being born
From, just cause the great attention of academia and industrial circle.
The "left", "right" of the present invention, " on ", D score etc., be described for orientation based on accompanying drawing,
Not other special implication.
Fig. 4 is of the surface acoustic wave sensor manufacture method based on nano-imprint process according to the present invention
The flow chart of individual embodiment, as shown in Figure 4:
Step 101, generates and is carved with interdigital transducer and is positioned at the reflection of interdigital transducer arranged on left and right sides
Impression block of the distribution patterns of grid.
Step 102, uses an impression block to use Step-and-repeat method for stamping to print continuously on substrate
System, is made as having the secondary making ide that multiple and on an impression block pattern is identical by this substrate
Plate.
Step 103, uses secondary impression formboard impressing to make surface acoustic wave sensor.Use secondary imprints
Masterplate impressing make surface acoustic wave sensor use nanometer embossing, including coining pattern transfer, follow-up
The operation such as etching structure transfer.
Making the most frequently used material of template is quartz and silicon, can be in silicon template with direct electronic beam writing technology
Obtain 10nm live width, quartz template can obtain 20nm live width.And quartz is can ultraviolet passing
With visible ray, and silicon cannot ultraviolet passing and visible ray.Owing to multiple step format to be applied molds exposure
(stepandflashimprintlithography, SFIL) S-FIL technology, therefore use the quartz work of printing opacity
For mould material.An embodiment, direct electronic beam writing technology is utilized to make 50-500 in a template
Individual interdigital transducer and be positioned at the pattern of reflecting grating of interdigital transducer arranged on left and right sides, generates and once presses
Die plate.
The method for stamping in Step-and-repeat method for stamping is used to include: thermal marking method, ultra-violet curing imprint
Method, Microcontact printing method etc..Such as, as shown in Fig. 5 A to 5B, use Step-and-repeat impressing side
Method for stamping in method is thermal marking method, specifically includes:
Step 1, one layer of thermal plastic high polymer photoresist of even spread on substrate, and photoresist is heated
More than glass transition temperature, for example, 135 degree.
Step 2, applies pressure, is pressed in the photoresist of hot mastication by an impression block, and
Maintain high temperature, high pressure conditions；After default holding time, for example, 5-10 minute, make thermoplasticity
Polymeric photoresist is filled in the nanostructured of an impression block.
Step 3, after photoresist cools and solidifies, discharges pressure, and an impression block is departed from substrate.
Step 4, translates an impression block, repeats step 2 and 3, repeats impressing on a photoresist
Replicate the figure of an impression block.
Step 5, carries out reactive ion etching and removes residual the photoresist with coining pattern of substrate surface
The primer stayed.
Step 6, sputters a thin layer metal film on the surface of the substrate with photoetching offset plate figure.
Step 7, uses stripping technology to remove photoresist and its metal covered above of substrate surface
Film, retains the metal film covered at the unglazed photoresist of substrate surface, generates secondary impression block.Repeat above-mentioned
Step, can generate multiple secondary impression block, as shown in Figure 6.
The surface acoustic wave sensor manufacture method based on nano-imprint process that above-described embodiment provides, is taking
After must being carved with a masterplate of a small amount of figure, obtain secondary by the method for Step-and-repeat hot padding and stripping convex
Pattern version, then uses secondary convex impression formboard to imprint making interdigital transducer.
In one embodiment, alkyl silane is used to process, at secondary on secondary impression block surface
Impression block Surface Creation passivation layer, alkyl silane includes: CF3 (CF2) 6 (CH2) 2SiCl3 etc..Solidification
The polymer of molding can the completely demoulding, depend on template and the free energy of polymer surfaces.To template table
Face processes, and except conventional cleaning, is also performed to silanization process, i.e. uses alkyl silane to carry out
Process (such as CF3 (CF2) 6 (CH2) 2SiCl3 etc.), make passivation layer at template surface, make the demoulding easy
And reduce surface smut.
In one embodiment, the metal film remained using secondary impression block surface is carried out as mask
Reactive ion etching, makes substrate have the pattern of phase shifting type distribution.Secondary impression formboard impressing is used to make
Interdigital transducer and be positioned at the reflecting grating of interdigital transducer arranged on left and right sides, printed material uses metal
Net, makes the latticed busbar that busbar is 50% metal coverage rate of interdigital transducer, interdigital transducer
The reflecting grating of arranged on left and right sides can also be the grid-shaped metal bar of 50% metal coverage rate.
Nano impression depends on the deformation of polymeric layer, and the degree of size difference polymeric layer deformation is also
Different, and the finger of the structures shape of SAW device interdigital transducer submicron order and hundreds of micro-
The busbar of rice coexists, and causes the interdigital transducer making 100% metal coverage rate to be easy to produce
Imprint unsuccessfully.For eliminating size difference, propose to use the netted busbar design side of 50% metal coverage rate
Case, as shown with 7.
In one embodiment, the substrate material of secondary impression formboard is quartz wafer.Interdigital transducer
Electrode material is aluminum, gold or copper etc..Dioxy is laid on interdigital bar, the surface of busbar of interdigital transducer
SiClx protecting film, can use electron beam evaporation, and thickness can be arranged as required to, it is possible to increase
The reliability of work, extends working life.
The surface acoustic wave sensor manufacture method based on nano-imprint process that above-described embodiment provides, utilizes
Nano-imprint process prints the method making sound surface of interdigital transducer and left and right reflecting grating on a quartz substrate
Wave sensor, after obtaining and being carved with a masterplate of a small amount of figure, with Step-and-repeat hot padding and stripping
Method obtains secondary convex masterplate, then uses secondary convex impression formboard to imprint making interdigital transducer
With left and right reflecting grating, printed material uses the netted busbar of 50% metal coverage rate, can control accurately
Interdigital transducer bar width processed and insertion loss, so improve surface acoustic wave sensor concordance and quality because of
Element.
The surface acoustic wave sensor manufacture method based on nano-imprint process that above-described embodiment provides, has
At least one advantages below:
What 1, interdigital transducer bar width can be controlled by employing nano-imprint process is the most accurate, thus realizes high
Certainty of measurement and concordance, it is also possible to by reduce the interdigital resistance of transducer reduce high-frequency sound surface wave
The insertion loss of device, lifting sensor Q-value (non-laboratory character) that can be stable, have high
Practicality.
2, nano-imprint process is used can to reduce interdigital transducer cost of manufacture, pollution-free.
Those of ordinary skill in the field it is understood that these are only the present invention specific embodiment and
, be not limited to the present invention, all within the spirit and principles in the present invention, that is done any repaiies
Change, equivalent, improvement etc., should be included within the scope of the present invention.
Claims (10)
1. a surface acoustic wave sensor manufacture method based on nano-imprint process, it is characterised in that bag
Include:
Generate be carved with interdigital transducer and be positioned at described interdigital transducer arranged on left and right sides reflecting grating point
Impression block of cloth pattern；
A described impression block is used to use Step-and-repeat method for stamping to print continuously on substrate, should
Substrate is made as having the secondary impression block that the pattern on a multiple and described impression block is identical；
Described secondary impression formboard impressing is used to make surface acoustic wave sensor.
Surface acoustic wave sensor manufacturer based on nano-imprint process the most according to claim 1
Method, it is characterised in that:
Method for stamping in described employing Step-and-repeat method for stamping includes: thermal marking method, ultra-violet curing
Method for stamping, Microcontact printing method.
Surface acoustic wave sensor manufacturer based on nano-imprint process the most according to claim 2
Method, it is characterised in that:
Method for stamping in described employing Step-and-repeat method for stamping is thermal marking method, specifically includes:
Step 1, on the substrate one layer of thermal plastic high polymer photoresist of even spread, and by described light
Photoresist is heated to more than glass transition temperature；
Step 2, applies pressure, a described impression block is pressed into the photoresist of hot mastication
In, and maintain high temperature, high pressure conditions；After default holding time, make thermal plastic high polymer photoetching
Glue is filled in the nanostructured of a described impression block；
Step 3, after described photoresist cools and solidifies, discharges pressure, is taken off by a described impression block
From described substrate；
Step 4, translates a described impression block, repeats step 2 and 3, repeats on described photoresist
Carry out the figure of an impression block described in imprinting and copying；
Step 5, carries out reactive ion etching to the photoresist with coining pattern of described substrate surface
Primer except residual.
Surface acoustic wave sensor manufacturer based on nano-imprint process the most according to claim 3
Method, it is characterised in that:
After completing step 5, carry out step 6, sputter on the surface of the described substrate with photoetching offset plate figure
A thin layer metal film；
Step 7, uses stripping technology to remove photoresist and its gold covered above of described substrate surface
Belong to film, retain the metal film covered at the unglazed photoresist of described substrate surface, generate described secondary making ide
Plate.
Surface acoustic wave sensor manufacturer based on nano-imprint process the most according to claim 4
Method, it is characterised in that:
Alkyl silane is used to process, at described secondary impression block on described secondary impression block surface
Surface Creation passivation layer；Described alkyl silane includes: CF3 (CF2) 6 (CH2) 2SiCl3.
Surface acoustic wave sensor manufacturer based on nano-imprint process the most according to claim 4
Method, it is characterised in that:
The metal film remained using described secondary impression block surface carries out reactive ion quarter as mask
Erosion, makes described substrate have the pattern of phase shifting type distribution.
Surface acoustic wave sensor manufacturer based on nano-imprint process the most according to claim 5
Method, it is characterised in that:
Described secondary impression formboard impressing is used to make described interdigital transducer and be positioned at described interdigital transducing
The reflecting grating of device arranged on left and right sides, printed material uses wire netting so that confluxing of described interdigital transducer
Bar is the latticed busbar of 50% metal coverage rate.
Surface acoustic wave sensor manufacturer based on nano-imprint process the most according to claim 7
Method, it is characterised in that:
The substrate material of described secondary impression formboard is quartz wafer；
The electrode material of described interdigital transducer is aluminum, gold or copper.
The manufacture method of interdigital transducer based on nano-imprint process the most according to claim 7,
It is characterized in that:
Silicon dioxide protective film is laid on interdigital bar, the surface of busbar of described interdigital transducer.
Surface acoustic wave sensor manufacturer based on nano-imprint process the most according to claim 1
Method, it is characterised in that:
Direct electronic beam writing technology is utilized to make 50-500 interdigital transducer in a template and be positioned at institute
State the pattern of the reflecting grating of interdigital transducer arranged on left and right sides, generate a described impression block.
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| CN110455033A (en) * | 2019-09-16 | 2019-11-15 | 长虹美菱股份有限公司 | A kind of decoration type ducting assembly of nano impression multichannel texture |
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Application publication date: 20161123 |