CN106092514A - Optical heterogeneity measurement apparatus and method based on dual wavelength fizeau interferometer - Google Patents
Optical heterogeneity measurement apparatus and method based on dual wavelength fizeau interferometer Download PDFInfo
- Publication number
- CN106092514A CN106092514A CN201510209977.9A CN201510209977A CN106092514A CN 106092514 A CN106092514 A CN 106092514A CN 201510209977 A CN201510209977 A CN 201510209977A CN 106092514 A CN106092514 A CN 106092514A
- Authority
- CN
- China
- Prior art keywords
- mirror
- measured
- level crossing
- wavelength
- reference planes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Testing Of Optical Devices Or Fibers (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention discloses a kind of optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer and method, by in dual wavelength Fizeau interference instrument apparatus, successively gather the interference pattern of reference light wave and the reflecting light of level crossing front surface to be measured, obtain wavelength X by first step phase shift measurement1And λ2Corresponding wavefront aberration data Δ W11(x, y), Δ W21(x, y);Gather the interference pattern of reference light wave and the light wave through level crossing to be measured and by level crossing rear surface to be measured reflection, obtain wavelength X by phase shift measurement1And λ2Corresponding wavefront aberration data Δ W12(x, y), Δ W22(x, y).Seek difference by the corresponding wavelength wavefront aberration data that two pacings measure, it is thus achieved that level crossing optical heterogeneity to be measured.The present invention does not needs to introduce standard reflection mirror, completely eliminates the impact on measurement result of the face shape of standard reflection mirror, and measuring process is simple, compensate for tradition absolute method of measurement complex steps, easily by the shortcoming of air agitation.
Description
Technical field
The invention belongs to field of optical measuring technologies, particularly a kind of optical heterogeneity based on dual wavelength fizeau interferometer
Measurement apparatus and method.
Background technology
Optical transmission material is the important component part of optical material, and whole optical system is had important by its optical property
Effect.Generally evaluate the index of optical transmission material property have dispersion, surface face shape, optical heterogeneity, radius of curvature,
Stress birfringence, striped and bubble etc..Wherein, optical heterogeneity reflection is same optical material inner refractive index
Inconsistency.If optical material inner refractive index is inconsistent, it will cause the change of transmission wavefront, change optical system
The wave aberration of system, and then affect the performance of optical system.The optical heterogeneity of magnitude, can bring the ripple of wavelength magnitude
Aberration, thus the high-precision detection of optical heterogeneity to optical material, be very urgent and necessary.
The optical heterogeneity of optical material can directly result in the change of transmission wavefront, thus can be by measurement transmitted wave prewave
The knots modification of aberration, obtains the optical heterogeneity distribution of optical material.In current detection means, interferometric method conduct
Contactless high precision test means, have a wide range of applications.Currently, measuring the heteropical method of optical element has
A variety of.2003, Guo Peiji et al. proposed three kinds in absolute measurement techniques one literary composition of optical glass optical homogeneity
For measuring the heteropical absolute method of measurement of optical glass, and have developed a high-precision optical glass material optics
Nonuniform measurement instrument, achieves high-acruracy survey, but instrument price is expensive to optical glass heterogeneity, it is impossible to real
Now extensively apply.2008, Wang Jun et al. was in optical homogeneity one literary composition with short-coherence light source measurement parallel plate glass
Propose a kind of new method, utilize the coherence of short-coherence light source, it is achieved that be high to the optical heterogeneity of parallel flat
The detection of precision, but due to the short coherence of short-coherence light source, it is necessary to make reference light and test light be in zero optical path difference
Position, adjusts to experiment light path and brings very big difficulty.
Content of the invention
It is an object of the invention to provide a kind of optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer and method,
Solve tradition absolute method of measurement complex steps, the easy problem by air agitation.
The technical solution realizing the object of the invention is: a kind of optical heterogeneity based on dual wavelength fizeau interferometer is surveyed
Amount device include the first laser instrument, second laser, refluxing reflection mirror, switched mirror, beam expanding lens, Amici prism,
Refluxing reflection mirror, collimator objective, reference planes mirror, aperture diaphragm, imaging lens group, ccd detector, to be measured flat
Face mirror;Common optical axis sets gradually refluxing reflection mirror, collimator objective, reference planes mirror, level crossing to be measured, and above-mentioned parts
Residing optical axis is primary optic axis;Common optical axis sets gradually Amici prism, aperture diaphragm, imaging lens group, CCD spy
Surveying device, and the optical axis residing for above-mentioned parts being the second optical axis, primary optic axis is parallel with the second optical axis;Common optical axis sets gradually
Refluxing reflection mirror, switched mirror, beam expanding lens, Amici prism, refluxing reflection mirror, and the optical axis residing for above-mentioned parts is
3rd optical axis, the 3rd optical axis is vertical with primary optic axis, and switched mirror edge is parallel to primary optic axis direction and moves;All light
Learn element coaxially contour relative to substrate, i.e. coaxially contour relative to optical table or instrument base.
Wherein, refluxing reflection mirror, collimator objective, reference planes mirror, level crossing to be measured set gradually along optical path direction, structure
Become optical system for testing;Refluxing reflection mirror, collimator objective, reference planes mirror set gradually along optical path direction, constitute reference path;
The wavelength of the first laser instrument is λ1, the wavelength of second laser is λ2。
Switched mirror is removed the 3rd optical axis, and the laser of the first laser emitting, through refluxing reflection mirror, reflexes to expand
Mirror, it is achieved expanding of light beam, after Amici prism transmission, then reflexes to collimator objective through refluxing reflection mirror, and one-tenth is as the criterion
Straight angle pencil of ray, part collimated light beam becomes reference beam after reflecting through the rear surface of reference planes mirror, and another part is through reference
Level crossing is transmitted into level crossing to be measured, is reflected as test beams through level crossing to be measured, and reflexes to reference planes mirror;
Reference beam and test beams close bundle in reference planes mirror rear surface, return refluxing reflection mirror along light path, through refluxing reflection mirror
Reflex to Amici prism, focus at aperture diaphragm through Amici prism reflection, then through imaging lens group, be imaged on CCD
On the target surface of detector, it is thus achieved that wavelength X1Corresponding interference image.
Switched mirror is moved into the 3rd optical axis, and the laser of second laser outgoing, through switched mirror, reflexes to expand
Mirror, it is achieved expanding of light beam, after Amici prism transmission, then reflexes to collimator objective through refluxing reflection mirror, and one-tenth is as the criterion
Straight angle pencil of ray, part collimated light beam becomes reference beam after reflecting through the rear surface of reference planes mirror, and another part is through reference
Level crossing is transmitted into level crossing to be measured, is reflected as test beams through level crossing to be measured, and reflexes to reference planes mirror;
Reference beam and test beams close bundle in reference planes mirror rear surface, return refluxing reflection mirror along light path, through refluxing reflection mirror
Reflex to Amici prism, focus at aperture diaphragm through Amici prism reflection, then through imaging lens group, be imaged on CCD
On the target surface of detector, obtain wavelength X2Corresponding interference image.
The described optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer, reference planes mirror is connected with PZT,
Realize that phase shift is measured.
The described optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer, the centre wavelength of the first laser instrument is
λ1, the centre wavelength of second laser is λ2, and λ1≠λ2。。
The measuring method of the described optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer, step is as follows:
Step 1, build the optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer:
Based on the optical heterogeneity measurement apparatus of dual wavelength fizeau interferometer, including the first laser instrument, second laser,
Refluxing reflection mirror, switched mirror, beam expanding lens, Amici prism, refluxing reflection mirror, collimator objective, reference planes mirror,
Aperture diaphragm, imaging lens group, ccd detector, level crossing to be measured;Common optical axis sets gradually refluxing reflection mirror, standard
Straight object lens, reference planes mirror, level crossing to be measured, and the optical axis residing for above-mentioned parts is primary optic axis;Common optical axis sets successively
Put Amici prism, aperture diaphragm, imaging lens group, ccd detector, and the optical axis residing for above-mentioned parts is the second light
Axle, primary optic axis is parallel with the second optical axis;Common optical axis sets gradually refluxing reflection mirror, switched mirror, beam expanding lens, divides
Light prism, refluxing reflection mirror, and the optical axis residing for above-mentioned parts is the 3rd optical axis, the 3rd optical axis is vertical with primary optic axis,
Switched mirror edge is parallel to primary optic axis direction and moves;All optical elements are coaxially contour relative to substrate, i.e. relative to
Optical table or instrument base are coaxially contour.
Adjusting mirror position to be measured, the front surface making level crossing to be measured is vertical with primary optic axis, it is achieved before level crossing to be measured
Surface reflection ripple and the interference of reference planes mirror reflecting light.
Step 2, respectively acquisition wavelength X1And λ2Corresponding first time phase-shift interference image:
Switched mirror is removed the 3rd optical axis, and the laser of the first laser emitting, through refluxing reflection mirror, reflexes to expand
Mirror, it is achieved expanding of light beam, after Amici prism transmission, then reflexes to collimator objective through refluxing reflection mirror, and one-tenth is as the criterion
Straight angle pencil of ray, part collimated light beam becomes reference beam after reflecting through the rear surface of reference planes mirror, and another part is through reference
Level crossing is transmitted into level crossing to be measured, becomes test beams through level crossing front surface reflection to be measured, and it is flat to reflex to reference
Face mirror;Reference beam and test beams close bundle in reference planes mirror rear surface, return refluxing reflection mirror along light path, through turning back
Speculum reflexes to Amici prism, focuses at aperture diaphragm through Amici prism reflection, then through imaging lens group, imaging
On the target surface of ccd detector, it is thus achieved that wavelength X1Corresponding interference image, PZT drives reference planes mirror to carry out phase shift,
Obtain wavelength X1Under level crossing front surface to be measured and reference planes mirror rear surface interfere the phase-shift interference being formed.
Switched mirror is moved into the 3rd optical axis, and the laser of second laser outgoing, through switched mirror, reflexes to expand
Mirror, it is achieved expanding of light beam, after Amici prism transmission, then reflexes to collimator objective through refluxing reflection mirror, and one-tenth is as the criterion
Straight angle pencil of ray, part collimated light beam becomes reference beam after reflecting through the rear surface of reference planes mirror, and another part is through reference
Level crossing is transmitted into level crossing to be measured, becomes test beams through level crossing front surface reflection to be measured, and it is flat to reflex to reference
Face mirror;Reference beam and test beams close bundle in reference planes mirror rear surface, return refluxing reflection mirror along light path, through turning back
Speculum reflexes to Amici prism, focuses at aperture diaphragm through Amici prism reflection, then through imaging lens group, imaging
On the target surface of ccd detector, obtain wavelength X2Corresponding interference image, PZT drives reference planes mirror to carry out phase shift,
Obtain wavelength X2Under level crossing front surface to be measured and reference planes mirror rear surface interfere the phase-shift interference being formed.
Step 3, according to wavelength X1And λ2Corresponding first time phase shifting interference5Use corresponding Phase-shifting algorithm, obtain ripple
Long λ1And λ2Respectively corresponding phase information, and the constant term that carries out to the phase information under two wavelength disappearing, disappear inclination item process,
Obtain wavelength X1And λ2Wave front aberration at corresponding level crossing front surface any point to be measured
ΔW11(x, y)=2naA (x, y)+2S (x, y)
ΔW21(x, y)=2naA (x, y)+2S (x, y)
Δ W in formula11(x, y) for measurement wavelength X for the first time1Corresponding wave front aberration, Δ W21(x, y) for measurement ripple for the first time
Long λ2(x, y) be the surface form deviation of level crossing front surface to be measured, (x y) is interferometer measuration system to S for corresponding wave front aberration, A
Systematic error, naFor air refraction.
Step 4, respectively acquisition wavelength X1And λ2Corresponding second time phase-shift interference image:
Adjusting pitching and the inclination of level crossing to be measured, the rear surface making level crossing to be measured is vertical with primary optic axis, it is achieved pass through
Level crossing to be measured the light wave by level crossing rear surface to be measured reflection are interferenceed with reference planes mirror reflecting light;
Switched mirror is removed the 3rd optical axis, and the laser of the first laser emitting, through refluxing reflection mirror, reflexes to expand
Mirror, it is achieved expanding of light beam, after Amici prism transmission, then reflexes to collimator objective through refluxing reflection mirror, and one-tenth is as the criterion
Straight angle pencil of ray, part collimated light beam becomes reference beam after reflecting through the rear surface of reference planes mirror, and another part is through reference
Level crossing is transmitted into level crossing to be measured, is reflected as test beams through level crossing rear surface to be measured, and it is flat to reflex to reference
Face mirror;Reference beam and test beams close bundle in reference planes mirror rear surface, return refluxing reflection mirror along light path, through turning back
Speculum reflexes to Amici prism, focuses at aperture diaphragm through Amici prism reflection, then through imaging lens group, imaging
On the target surface of ccd detector, it is thus achieved that wavelength X1Corresponding interference image, PZT drives reference planes mirror to carry out phase shift,
Obtain wavelength X1Under level crossing rear surface to be measured and reference planes mirror rear surface interfere the phase-shift interference being formed.
Switched mirror is moved into the 3rd optical axis, and the laser of second laser outgoing, through switched mirror, reflexes to expand
Mirror, it is achieved expanding of light beam, after Amici prism transmission, then reflexes to collimator objective through refluxing reflection mirror, and one-tenth is as the criterion
Straight angle pencil of ray, part collimated light beam becomes reference beam after reflecting through the rear surface of reference planes mirror, and another part is through reference
Plane transmission enters level crossing to be measured, is reflected as test beams through level crossing rear surface to be measured, and reflexes to reference planes
Mirror;Reference beam and test beams close bundle in reference planes mirror rear surface, return refluxing reflection mirror along light path, anti-through turning back
Penetrate mirror and reflex to Amici prism, focus at aperture diaphragm through Amici prism reflection, then through imaging lens group, be imaged on
On the target surface of ccd detector, obtain wavelength X2Corresponding interference image, PZT drives reference planes mirror to carry out phase shift,
Obtain wavelength X2Under level crossing rear surface to be measured and reference planes mirror rear surface interfere the phase-shift interference being formed.
Step 5, according to wavelength X1And λ2Corresponding second time phase shifting interference, uses corresponding Phase-shifting algorithm, obtains ripple
Long λ1And λ2Respectively corresponding phase information, and the phase information to two wavelength carry out disappearing constant term, disappear inclination item process,
Obtain wavelength X1Wave front aberration Δ W at corresponding level crossing front surface any point to be measured12(x, y),
And λ2Wave front aberration Δ W at corresponding level crossing front surface any point to be measured22(x, y):
ΔW12(x, y)=2 (na-n10) A (x, y)+2n10B (x, y)+2 Δs (x, y)+2S (x, y)
ΔW22(x, y)=2 (na-n20) A (x, y)+2n20B (x, y)+2 Δs (x, y)+2S (x, y)
In formula, Δ W12(x y) is second step measurement wavelength X1Corresponding wave front aberration, Δ W22(x y) is second step measurement wavelength X2
Corresponding wave front aberration, (x y) is the surface form deviation of level crossing rear surface to be measured, n to B10And n20It is respectively level crossing to be measured
In wavelength X1And λ2Under mean refractive index, (x, y) for due to the introduced wavefront of the optical heterogeneity of level crossing to be measured for Δ
Deviation.
Wherein,
Δ (x, y)=d0Δ n (x, y)
In formula, d0For the average thickness of level crossing to be measured, (x, y) for optical heterogeneity to be measured for Δ n.
Step 6, the optical heterogeneity distribution obtaining level crossing to be measured
6-1) solve and measure wavelength X with second time for the first time1Corresponding wave front aberration difference DELTA W1(x, y)
6-2) solve and measure wavelength X with second time for the first time2Corresponding wave front aberration difference DELTA W2(x, y)
Wherein,
Δ d (x, y)=B (x, y)-A (x, y)
The thickness d of level crossing to be measured (x, y) is represented by:
D (x, y)=d0+ Δ d (x, y)
In formula, d0For the average thickness of level crossing to be measured, Δ d (x, y) thickness for being caused by flat mirror deformation to be measured
Variable quantity.
Level crossing to be measured is for wavelength X1Refractive index n1(x, y) with for wavelength X2Refractive index n2(x y) can represent
For:
n1(x, y)=n10+Δn1(x, y)=n10+ Δ n (x, y)
n2(x, y)=n20+Δn2(x, y)=n20+ Δ n (x, y)
In formula, Δ n1(x y) represents level crossing to be measured in wavelength X1Under optical heterogeneity, Δ n2(x, y) level crossing to be measured
In wavelength X2Under optical heterogeneity.
Obtain Lorentz-Lorenz equations according to the dispersive model of Lorentz:
In formula, n is Refractive Index of Material;N is material internal molecule or atomicity density;α is Mean static polarizabilities, it with enter
The angular frequency penetrating light wave is relevant.
Above formula can be obtained the relation between Refractive Index of Material n and heterogeneity Δ n and N thereof with analysis and arrangement:
Can obtain after derivation:
Arrange further and can obtain:
So:
Thus can obtain, the difference of the optical heterogeneity in a wavelength range is much smaller than optical heterogeneity itself, one
Can be approximately considered during the optical heterogeneity using the light wave measurement optical material of different wave length or element in wavelength range
Δ n=Δ n1=Δ n2。
So Δ n (x y) is the optical heterogeneity of level crossing to be measured to be measured.
6-3) determine level crossing to be measured optical heterogeneity Δ n (x, y):
Compared with prior art, it is an advantage of the current invention that: (1) uses dual wavelength phase-shifting interferometer two pacing amount
The optical heterogeneity of method detection level crossing to be measured, it is not necessary to introduce standard reflection mirror, completely eliminate standard anti-
Penetrate the impact on measurement result of the face shape of mirror;(2) measuring process is simple, compensate for tradition absolute method of measurement step
Suddenly loaded down with trivial details, easily by the shortcoming of air agitation;The advantage also simultaneously with traditional absolute measurement, thus reduce right
Tested level crossing to be measured and the required precision of interferometer system face shape.
Brief description
Fig. 1 is the optical heterogeneity measurement apparatus schematic diagram based on dual wavelength fizeau interferometer.
Fig. 2 is the measuring method flow chart of the optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer.
Fig. 3 is corresponding wavefront picture under two wavelength of level crossing front surface to be measured recording in the embodiment of the present invention
Difference figure, wherein (a) is wavelength X1Under the wave front aberration figure of corresponding level crossing front surface to be measured, (b) is ripple
Long λ2Under the wave front aberration figure of corresponding level crossing front surface to be measured.
Fig. 4 is corresponding wavefront picture under two, the level crossing rear surface to be measured wavelength recording in the embodiment of the present invention
Difference figure, wherein (a) is wavelength X1Under the wave front aberration figure of corresponding level crossing rear surface to be measured, (b) is ripple
Long λ2Under the wave front aberration figure of corresponding level crossing rear surface to be measured.
Fig. 5 is the optical heterogeneity distribution of the level crossing to be measured recording in the embodiment of the present invention.
Fig. 6 is that the optical heterogeneity that in the embodiment of the present invention, level crossing to be measured uses ZYGO interferometer to record is divided
Cloth.
Detailed description of the invention
Below in conjunction with the accompanying drawings the present invention is described in further detail.
In conjunction with Fig. 1, a kind of optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer includes that first swashs
Light device the 1st, second laser the 2nd, refluxing reflection mirror the 3rd, switched mirror the 4th, beam expanding lens the 5th, Amici prism is the 6th,
Refluxing reflection mirror the 7th, collimator objective the 8th, reference planes mirror the 9th, aperture diaphragm the 10th, imaging lens group the 11st, CCD
Detector the 12nd, level crossing 13 to be measured;It is flat that common optical axis sets gradually the 8th, the reference of refluxing reflection mirror the 7th, collimator objective
Face mirror the 9th, level crossing 13 to be measured, and the optical axis residing for above-mentioned parts is primary optic axis;Common optical axis sets gradually point
Light prism the 6th, aperture diaphragm the 10th, imaging lens group the 11st, ccd detector 12, and the light residing for above-mentioned parts
Axle is the second optical axis, and primary optic axis is parallel with the second optical axis;Common optical axis sets gradually refluxing reflection mirror and the 3rd, switches
Speculum the 4th, beam expanding lens the 5th, Amici prism the 6th, refluxing reflection mirror 7, and the optical axis residing for above-mentioned parts is the 3rd
Optical axis, the 3rd optical axis is vertical with primary optic axis, and switched mirror 4 moves along being parallel to primary optic axis direction;Institute
There is optical element coaxially contour relative to substrate, i.e. coaxially contour relative to optical table or instrument base.
Wherein, refluxing reflection mirror the 7th, collimator objective the 8th, reference planes mirror the 9th, level crossing to be measured 13 is along light path side
To setting gradually, constitute optical system for testing;Refluxing reflection mirror the 7th, collimator objective the 8th, reference planes mirror 9 is along light path
Direction sets gradually, and constitutes reference path;The wavelength of the first laser instrument 1 is λ1, the wavelength of second laser 2
For λ2。
Switched mirror 4 is removed the 3rd optical axis, the laser of the first laser instrument 1 outgoing through refluxing reflection mirror 3,
Reflex to beam expanding lens 5, it is achieved expanding of light beam, after Amici prism 6 transmission, then through refluxing reflection mirror 7
Reflexing to collimator objective 8, becoming collimation angle pencil of ray, part collimated light beam is anti-through the rear surface of reference planes mirror 9
Becoming reference beam after penetrating, another part is transmitted into level crossing 13 to be measured through reference planes mirror 9, through to be measured
Level crossing 13 is reflected as test beams, and reflexes to reference planes mirror 9;Reference beam and test beams exist
Bundle is closed in reference planes mirror 9 rear surface, returns refluxing reflection mirror 7 along light path, reflexes to point through refluxing reflection mirror 7
Light prism 6, focuses at aperture diaphragm 10 through Amici prism 6 reflection, then through imaging lens group 11, becomes
As on the target surface of ccd detector 12, it is thus achieved that wavelength X1Corresponding interference image.
Switched mirror 4 is moved into the 3rd optical axis, the laser of second laser 2 outgoing through switched mirror 4,
Reflex to beam expanding lens 5, it is achieved expanding of light beam, after Amici prism 6 transmission, then through refluxing reflection mirror 7
Reflexing to collimator objective 8, becoming collimation angle pencil of ray, part collimated light beam is anti-through the rear surface of reference planes mirror 9
Becoming reference beam after penetrating, another part is transmitted into level crossing 13 to be measured through reference planes mirror 9, through to be measured
Level crossing 13 is reflected as test beams, and reflexes to reference planes mirror 9;Reference beam and test beams exist
Bundle is closed in reference planes mirror 9 rear surface, returns refluxing reflection mirror 7 along light path, reflexes to point through refluxing reflection mirror 7
Light prism 6, focuses at aperture diaphragm 10 through Amici prism 6 reflection, then through imaging lens group 11, becomes
As, on the target surface of ccd detector 12, obtaining wavelength X2Corresponding interference image.
Based on the optical heterogeneity measurement apparatus of dual wavelength fizeau interferometer, reference planes mirror 9 is with PZT even
Connect, it is achieved phase shift is measured.
Based on the optical heterogeneity measurement apparatus of dual wavelength fizeau interferometer, the centre wavelength of the first laser instrument 1
For λ1, the centre wavelength of second laser 2 is λ2, and λ1≠λ2。
A kind of measuring method of the optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer, step is as follows:
Step 1, build the optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer:
Based on the optical heterogeneity measurement apparatus of dual wavelength fizeau interferometer, including the first laser instrument the 1st, second
Laser instrument the 2nd, refluxing reflection mirror the 3rd, switched mirror the 4th, beam expanding lens the 5th, Amici prism the 6th, refluxing reflection mirror is the 7th,
The 12nd, collimator objective the 8th, reference planes mirror the 9th, aperture diaphragm the 10th, imaging lens group the 11st, ccd detector is treated
Survey level crossing 13;Common optical axis sets gradually refluxing reflection mirror 7), collimator objective the 8th, reference planes mirror the 9th, to be measured
Level crossing 13, and the optical axis residing for above-mentioned parts is primary optic axis;Common optical axis sets gradually Amici prism the 6th, hole
Footpath diaphragm the 10th, imaging lens group the 11st, ccd detector 12, and the optical axis residing for above-mentioned parts is the second optical axis,
Primary optic axis is parallel with the second optical axis;Common optical axis sets gradually refluxing reflection mirror the 3rd, switched mirror and the 4th, expands
Mirror the 5th, Amici prism the 6th, refluxing reflection mirror 7, and the optical axis residing for above-mentioned parts is the 3rd optical axis, the 3rd light
Axle is vertical with primary optic axis, and switched mirror 4 moves along being parallel to primary optic axis direction;All optical element phases
Coaxially contour for substrate, i.e. coaxially contour relative to optical table or instrument base;
Adjusting level crossing 13 position to be measured, the front surface making level crossing 13 to be measured is vertical with primary optic axis, it is achieved
Level crossing 13 front surface reflection light wave to be measured and the interference of reference planes mirror 9 reflecting light;
Step 2, respectively acquisition wavelength X1And λ2Corresponding first time phase-shift interference image:
Switched mirror 4 is removed the 3rd optical axis, the laser of the first laser instrument 1 outgoing through refluxing reflection mirror 3,
Reflex to beam expanding lens 5, it is achieved expanding of light beam, after Amici prism 6 transmission, then through refluxing reflection mirror 7
Reflexing to collimator objective 8, becoming collimation angle pencil of ray, part collimated light beam is anti-through the rear surface of reference planes mirror 9
Becoming reference beam after penetrating, another part is transmitted into level crossing 13 to be measured through reference planes mirror 9, through to be measured
Level crossing 13 front surface reflection becomes test beams, and reflexes to reference planes mirror 9;Reference beam and test
Light beam closes bundle in reference planes mirror 9 rear surface, returns refluxing reflection mirror 7 along light path, anti-through refluxing reflection mirror 7
It is mapped to Amici prism 6, focus at aperture diaphragm 10 through Amici prism 6 reflection, then through imaging lens group
11, it is imaged on the target surface of ccd detector 12, it is thus achieved that wavelength X1Corresponding interference image, PZT drives
Reference planes mirror 9 carries out phase shift, it is thus achieved that wavelength X1Under after level crossing 13 front surface to be measured and reference planes mirror 9
The phase-shift interference that Surface Interference is formed;
Switched mirror 4 is moved into the 3rd optical axis, the laser of second laser 2 outgoing through switched mirror 4,
Reflex to beam expanding lens 5, it is achieved expanding of light beam, after Amici prism 6 transmission, then through refluxing reflection mirror 7
Reflexing to collimator objective 8, becoming collimation angle pencil of ray, part collimated light beam is anti-through the rear surface of reference planes mirror 9
Becoming reference beam after penetrating, another part is transmitted into level crossing 13 to be measured through reference planes mirror 9, through to be measured
Level crossing 13 front surface reflection becomes test beams, and reflexes to reference planes mirror 9;Reference beam and test
Light beam closes bundle in reference planes mirror 9 rear surface, returns refluxing reflection mirror 7 along light path, anti-through refluxing reflection mirror 7
It is mapped to Amici prism 6, focus at aperture diaphragm 10 through Amici prism 6 reflection, then through imaging lens group
11, it is imaged on the target surface of ccd detector 12, obtain wavelength X2Corresponding interference image, PZT drives
Reference planes mirror 9 carries out phase shift, it is thus achieved that wavelength X2Under after level crossing 13 front surface to be measured and reference planes mirror 9
The phase-shift interference that Surface Interference is formed;
Step 3, according to wavelength X1And λ2Corresponding first time phase shifting interference, uses corresponding Phase-shifting algorithm,
Obtain wavelength X1And λ2Respectively corresponding phase information, and the constant term that carries out to the phase information under two wavelength disappearing,
Disappear inclination item process, obtains wavelength X1And λ2Wavefront at corresponding level crossing to be measured 13 front surface any point
Aberration
ΔW11(x, y)=2naA (x, y)+2S (x, y)
ΔW21(x, y)=2naA (x, y)+2S (x, y)
Δ W in formula11(x, y) for measurement wavelength X for the first time1Corresponding wave front aberration, Δ W21(x, y) for for the first time
Measurement wavelength X2Corresponding wave front aberration, A (x, y) be the surface form deviation of level crossing 13 front surface to be measured, S (x, y)
Systematic error, n for interferometer measuration systemaFor air refraction;
Step 4, respectively acquisition wavelength X1And λ2Corresponding second time phase-shift interference image:
Adjusting the angle of level crossing 13 to be measured, the rear surface making level crossing 13 to be measured is vertical with primary optic axis, real
Now pass through level crossing 13 to be measured and the light wave by level crossing 13 rear surface to be measured reflection reflects with reference planes mirror 9
Light wave interference;
Switched mirror 4 is removed the 3rd optical axis, the laser of the first laser instrument 1 outgoing through refluxing reflection mirror 3,
Reflex to beam expanding lens 5, it is achieved expanding of light beam, after Amici prism 6 transmission, then through refluxing reflection mirror 7
Reflexing to collimator objective 8, becoming collimation angle pencil of ray, part collimated light beam is anti-through the rear surface of reference planes mirror 9
Becoming reference beam after penetrating, another part is transmitted into level crossing 13 to be measured through reference planes mirror 9, through to be measured
Level crossing 13 rear surface is reflected as test beams, and reflexes to reference planes mirror 9;Reference beam and test
Light beam closes bundle in reference planes mirror 9 rear surface, returns refluxing reflection mirror 7 along light path, anti-through refluxing reflection mirror 7
It is mapped to Amici prism 6, focus at aperture diaphragm 10 through Amici prism 6 reflection, then through imaging lens group
11, it is imaged on the target surface of ccd detector 12, it is thus achieved that wavelength X1Corresponding interference image, PZT drives
Reference planes mirror 9 carries out phase shift, it is thus achieved that wavelength X1Under after level crossing 13 rear surface to be measured and reference planes mirror 9
The phase-shift interference that Surface Interference is formed;
Switched mirror 4 is moved into the 3rd optical axis, the laser of second laser 2 outgoing through switched mirror 4,
Reflex to beam expanding lens 5, it is achieved expanding of light beam, after Amici prism 6 transmission, then through refluxing reflection mirror 7
Reflexing to collimator objective 8, becoming collimation angle pencil of ray, part collimated light beam is anti-through the rear surface of reference planes mirror 9
Becoming reference beam after penetrating, another part is transmitted into level crossing 13 to be measured through reference planes mirror 9, through to be measured
Level crossing 13 rear surface is reflected as test beams, and reflexes to reference planes mirror 9;Reference beam and test
Light beam closes bundle in reference planes mirror 9 rear surface, returns refluxing reflection mirror 7 along light path, anti-through refluxing reflection mirror 7
It is mapped to Amici prism 6, focus at aperture diaphragm 10 through Amici prism 6 reflection, then through imaging lens group
11, it is imaged on the target surface of ccd detector 12, obtain wavelength X2Corresponding interference image, PZT drives
Reference planes mirror 9 carries out phase shift, it is thus achieved that wavelength X2Under after level crossing 13 rear surface to be measured and reference planes mirror 9
The phase-shift interference that Surface Interference is formed;
Step 5, according to wavelength X1And λ2Corresponding second time phase shifting interference, uses corresponding Phase-shifting algorithm,
Obtain wavelength X1And λ2Respectively corresponding phase information, and the phase information to two wavelength carry out disappearing constant term, disappear
Tilt item process, obtain wavelength X1And λ2Wavefront picture at corresponding level crossing to be measured 13 front surface any point
Difference:
ΔW12(x, y)=2 (na-n10) A (x, y)+2n10B (x, y)+2 Δs (x, y)+2S (x, y)
ΔW22(x, y)=2 (na-n20) A (x, y)+2n20B (x, y)+2 Δs (x, y)+2S (x, y)
In formula, Δ W12(x y) is second step measurement wavelength X1Corresponding wave front aberration, Δ W22(x y) is the second pacing
Amount wavelength X2Corresponding wave front aberration, (x y) is the surface form deviation of level crossing 13 rear surface to be measured, n to B10And n20
It is respectively level crossing to be measured 13 in wavelength X1And λ2Under mean refractive index, (x, y) for due to level crossing to be measured for Δ
The introduced wavefront deviation of the optical heterogeneity of 13.
Wherein,
Δ (x, y)=d0Δ n (x, y)
In formula, d0For the average thickness of level crossing 13 to be measured, (x, y) for optical heterogeneity to be measured for Δ n.
Step 6, the optical heterogeneity distribution obtaining level crossing 13 to be measured:
6-1) solve and measure wavelength X with second time for the first time1Corresponding wave front aberration difference DELTA W1(x, y)
6-2) solve and measure wavelength X with second time for the first time2Corresponding wave front aberration difference DELTA W2(x, y)
Wherein,
Δ d (x, y)=B (x, y)-A (x, y)
The thickness d of level crossing 13 to be measured (x, y) is represented by:
D (x, y)=d0+ Δ d (x, y)
In formula, d0For the average thickness of level crossing 13 to be measured, (x, y) for by level crossing 13 face deformation to be measured for Δ d
Change the amounts of thickness variation causing.
Level crossing to be measured 13 is for wavelength X1Refractive index n1(x, y) with for wavelength X2Refractive index n2(x, y)
It is expressed as:
n1(x, y)=n10+Δn1(x, y)=n10+ Δ n (x, y)
n2(x, y)=n20+Δn2(x, y)=n20+ Δ n (x, y)
In formula, Δ n1(x y) represents level crossing to be measured 13 in wavelength X1Under optical heterogeneity, Δ n2(x y) treats
Survey level crossing 13 in wavelength X2Under optical heterogeneity.
Obtain Lorentz-Lorenz equations according to the dispersive model of Lorentz:
In formula, n is Refractive Index of Material;N is material internal molecule or atomicity density;α is Mean static polarizabilities,
It is relevant with the angular frequency of incident light wave;
Above formula can be obtained the relation between Refractive Index of Material n and heterogeneity Δ n and N thereof with analysis and arrangement:
Can obtain after derivation:
Arrange further and can obtain:
So:
Thus can obtain, the difference of the optical heterogeneity in a wavelength range is much smaller than optical heterogeneity itself,
When using the optical heterogeneity of the light wave measurement optical material of different wave length or element in a wavelength range
Δ n=Δ n can be approximately considered1=Δ n2;So Δ n (x y) is the optics of level crossing to be measured 13 to be measured
Heterogeneity.
6-3) determine level crossing 13 to be measured optical heterogeneity Δ n (x, y):
Embodiment one
A kind of optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer, uses the first laser instrument 1
Centre wavelength be λ1The frequency stabilization polarization He-Ne laser of=632.8nm, power output 1.5mw, output facula
Bore is φ 1mm;The centre wavelength of second laser 2 is λ2=532nm frequency stabilization polarizes semiconductor laser,
Power 1.5mw, output facula bore is φ 1mm.Level crossing 13 to be measured is quartz crystal, the mouth of quartz crystal
Footpath is D=110mm, thickness d=21.70mm, the angle of wedge be 11 ' 49 ' '.This level crossing to be measured 13 is at wavelength
λ1Refractive index under=632.8nm is n1=1.4570, in wavelength X2Refractive index under=532nm is
n2=1.4607.Light beam is through the reflection of refluxing reflection mirror 3, and after laser beam expanding lens 5, hot spot bore is φ 8mm,
Reflection through refluxing reflection mirror 7 again, forms a branch of directional light after collimator objective 8 collimation, flat through reference
Face mirror 9 reflection obtains reference planes wavefront;Reference light wave is respectively by surface before and after test level crossing 13 to be measured
Reflection obtains test wavefront data.After reference beam and test beams interfere, through refluxing reflection mirror 7
Again semi-transparent semi-reflecting lens 6 reflection is converged at pin hole 10 after reflection, be imaged on CCD via image-forming objective lens 11
On detector 12, obtain interference pattern.
Common optical axis sets gradually refluxing reflection mirror the 7th, collimator objective the 8th, reference planes mirror the 9th, level crossing 13 to be measured,
And the optical axis residing for above-mentioned parts is primary optic axis;The 10th, common optical axis sets gradually Amici prism the 6th, aperture diaphragm
Imaging lens group the 11st, ccd detector 12, and the optical axis residing for above-mentioned parts is the second optical axis, primary optic axis
Parallel with the second optical axis;Common optical axis sets gradually refluxing reflection mirror the 3rd, switched mirror the 4th, beam expanding lens and the 5th, divides
Light prism the 6th, refluxing reflection mirror 7, and the optical axis residing for above-mentioned parts is the 3rd optical axis, the 3rd optical axis and first
Optical axis is vertical, and switched mirror 4 moves along being parallel to primary optic axis direction;All optical elements are relative to substrate
Coaxially contour, i.e. coaxially contour relative to optical table or instrument base.
Wherein, refluxing reflection mirror the 7th, collimator objective the 8th, reference planes mirror the 9th, level crossing to be measured 13 is along light path side
To setting gradually, constitute optical system for testing;Refluxing reflection mirror the 7th, collimator objective the 8th, reference planes mirror 9 is along light path
Direction sets gradually, and constitutes reference path;The wavelength of the first laser instrument 1 is λ1, the wavelength of second laser 2
For λ2。
In conjunction with Fig. 2, the measuring method of a kind of optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer,
Step is as follows:
Step 1, build the optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer.
Step 2, respectively acquisition wavelength X1And λ2Corresponding first time phase-shift interference image:
Put into level crossing 13 to be measured, adjust level crossing 13 to be measured, make the front surface and first of level crossing 13 to be measured
Optical axis is vertical, it is achieved the interference of level crossing 13 front surface reflection light wave to be measured and reference planes reflecting light.Will
Switched mirror 4 moves into the 3rd optical axis, drives reference planes displacement to realize eight step phase shift measurements by control PZT,
Record wavelength X2The corresponding phase shifting interference of=532nm;Switched mirror 4 is removed the 3rd optical axis, passes through
Control PZT drives reference planes displacement to realize eight step phase shift measurements, records wavelength X1The corresponding shifting of=632.8nm
Interference figure.
Step 3, take eight step Phase-shifting algorithm and phase unwrapping technology, and the constant term that carries out to phase information disappearing,
Disappear inclination item process, thus obtains wavelength X1Corresponding corrugated information Δ W11(x, y) and wavelength X2Corresponding corrugated
Information Δ W21(x, y).Face shape information and system that this corrugated information comprises level crossing 13 front surface to be measured are missed
Difference.Wherein λ1Corresponding corrugated information Δ W11(x, y), λ2Corresponding corrugated information Δ W21(x, y) such as figure
Shown in 3.
Step 4, respectively acquisition wavelength X1And λ2Corresponding second time phase-shift interference image:
Adjusting level crossing 13 to be measured, the rear surface making level crossing 13 to be measured is vertical with primary optic axis, it is achieved to be measured
Level crossing 13 rear surface reflecting light and the interference of reference planes reflecting light.Switched mirror 4 is moved into
Three optical axises, drive reference planes displacement to realize eight step phase shift measurements by control PZT, record wavelength
λ2The corresponding phase shifting interference of=532nm;Switched mirror 4 is removed the 3rd optical axis, by control PZT
Drive reference planes displacement to realize eight step phase shift measurements, record wavelength X1The corresponding phase shifting interference of=632.8nm.
Step 5, take eight step Phase-shifting algorithm and phase unwrapping technology, and the constant term that carries out to phase information disappearing,
Disappear inclination item process, thus obtains wavelength X1Corresponding corrugated information Δ W12(x, y) and wavelength X2Corresponding corrugated
Information Δ W22(x, y).This corrugated information comprises the face shape information of level crossing 13 rear surface to be measured, and inside is non-all
The distribution of even property and systematic error.Wherein λ1Corresponding corrugated information Δ W12(x, y), λ2Corresponding corrugated
Information Δ W22(x, y) as shown in Figure 4.
Step 6: the optical heterogeneity obtaining level crossing to be measured is distributed:
6-1) by measurement for the first time and second time measurement wavelength X1Corresponding wave front aberration asks difference to obtain:
ΔW1(x, y)=(Δ W12(x, y)-Δ W11(x, y)) ÷ 2
=n10[B (and x, y)-A (x, y)]+d0Δ n (x, y)
=n10Δ d (x, y)+d0Δ n (x, y)
6-2) by measurement for the first time and second time measurement wavelength X2Corresponding wave front aberration asks difference to obtain:
Wherein,
Δ d (x, y)=B (x, y)-A (x, y)
Then level crossing 13 to be measured thickness d (x, y) is represented by:
D (x, y)=d0+ Δ d (x, y)
In formula, d0For the average thickness of level crossing 13 to be measured, (x, y) for by level crossing 13 face deformation to be measured for Δ d
The thickness change causing.
Obtain Lorentz-Lorenz equations according to the dispersive model of Lorentz:
In formula, n is Refractive Index of Material;N is material internal molecule or atomicity density;α is Mean static polarizabilities,
It is relevant with the angular frequency of incident light wave;
Above formula can be obtained the relation between Refractive Index of Material n and heterogeneity Δ n and N thereof with analysis and arrangement:
Can obtain after derivation:
Arrange further and can obtain:
So:
Thus can obtain, the difference of the optical heterogeneity in a wavelength range is much smaller than optical heterogeneity itself,
When using the optical heterogeneity of the light wave measurement optical material of different wave length or element in a wavelength range
Δ n=Δ n can be approximately considered1=Δ n2;So Δ n (x y) is the optics of level crossing to be measured 13 to be measured
Heterogeneity.
6-3) by measurement for the first time and second time measurement wavelength X1、λ2Corresponding wave front aberration difference can calculate to be asked
Level crossing 13 to be measured optical heterogeneity Δ n (x, y) be:
The optical heterogeneity of the level crossing to be measured 13 recovering is distributed such as Fig. 5.
What the result of the optical heterogeneity of this quartz crystal that the method records and ZYGO interferometer recovered should
Optical heterogeneity result (such as Fig. 6) contrast of quartz crystal, optical heterogeneity distribution is basically identical, tests
Correctness and the feasibility of algorithm are demonstrate,proved.
The present invention uses the optical heterogeneity of dual wavelength phase-shifting interferometer two step mensuration detection level crossing to be measured,
Do not need to introduce standard reflection mirror, completely eliminate the impact on measurement result of the face shape of standard reflection mirror;Measurement
Step is simple, compensate for tradition absolute method of measurement complex steps, easily by the shortcoming of air agitation;Also have simultaneously
The advantage having traditional absolute measurement, thus reduce the precision to tested level crossing to be measured and interferometer system face shape
Require.
Claims (4)
1. the optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer, it is characterised in that bag
Include the first laser instrument (1), second laser (2), refluxing reflection mirror (3), switched mirror (4), expand
Mirror (5), Amici prism (6), refluxing reflection mirror (7), collimator objective (8), reference planes mirror (9), hole
Footpath diaphragm (10), imaging lens group (11), ccd detector (12) and level crossing to be measured (13);Light altogether
Axle sets gradually refluxing reflection mirror (7), collimator objective (8), reference planes mirror (9), level crossing to be measured (13),
Optical axis residing for above-mentioned parts is primary optic axis;Common optical axis set gradually Amici prism (6), aperture diaphragm (10),
Imaging lens group (11), ccd detector (12), the optical axis residing for above-mentioned parts is the second optical axis, first
Optical axis is parallel with the second optical axis;Common optical axis sets gradually refluxing reflection mirror (3), switched mirror (4), expands
Mirror (5), Amici prism (6), refluxing reflection mirror (7), the optical axis residing for above-mentioned parts is the 3rd optical axis, the
Three optical axises are vertical with primary optic axis, and switched mirror (4) edge is parallel to primary optic axis direction and moves;All light
Learn element coaxially contour relative to substrate, i.e. coaxially contour relative to optical table or instrument base;
Wherein, refluxing reflection mirror (7), collimator objective (8), reference planes mirror (9), level crossing to be measured (13)
Set gradually along optical path direction, constitute optical system for testing;Refluxing reflection mirror (7), collimator objective (8), reference are flat
Face mirror (9) sets gradually along optical path direction, constitutes reference path;
Switched mirror (4) is removed the 3rd optical axis, and the laser of the first laser instrument (1) outgoing is anti-through turning back
Penetrate mirror (3), reflex to beam expanding lens (5), it is achieved expanding of light beam, after Amici prism (6) transmission, then
Reflex to collimator objective (8) through refluxing reflection mirror (7), become collimation angle pencil of ray, part collimated light beam warp
Becoming reference beam after the rear surface reflection of reference planes mirror (9), another part is saturating through reference planes mirror (9)
Inject level crossing to be measured (13), be reflected as test beams through level crossing to be measured (13), and reflex to ginseng
Examine level crossing (9);Reference beam and test beams close bundle in reference planes mirror (9) rear surface, return along light path
Return refluxing reflection mirror (7), reflex to Amici prism (6) through refluxing reflection mirror (7), through Amici prism (6)
Reflection focuses on aperture diaphragm (10) place, then through imaging lens group (11), is imaged on ccd detector (12)
Target surface on, it is thus achieved that wavelength X1Corresponding interference image;
Switched mirror (4) is moved into the 3rd optical axis, and the laser of second laser (2) outgoing is anti-through switching
Penetrate mirror (4), reflex to beam expanding lens (5), it is achieved expanding of light beam, after Amici prism (6) transmission, then
Reflex to collimator objective (8) through refluxing reflection mirror (7), become collimation angle pencil of ray, part collimated light beam warp
Becoming reference beam after the rear surface reflection of reference planes mirror (9), another part is saturating through reference planes mirror (9)
Inject level crossing to be measured (13), be reflected as test beams through level crossing to be measured (13), and reflex to ginseng
Examine level crossing (9);Reference beam and test beams close bundle in reference planes mirror (9) rear surface, return along light path
Return refluxing reflection mirror (7), reflex to Amici prism (6) through refluxing reflection mirror (7), through Amici prism (6)
Reflection focuses on aperture diaphragm (10) place, then through imaging lens group (11), is imaged on ccd detector (12)
Target surface on, obtain wavelength X2Corresponding interference image.
2. the optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer according to claim 1,
It is characterized in that: above-mentioned reference planes mirror (9) is connected with PZT, it is achieved phase shift is measured.
3. according to the optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer described in claim 1,
It is characterized in that: the centre wavelength of the first laser instrument (1) is λ1, the centre wavelength of second laser (2) is
λ2, and λ1≠λ2。
4. based on the optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer described in claim 1
Measuring method, it is characterised in that step is as follows:
Step 1, build the optical heterogeneity measurement apparatus based on dual wavelength fizeau interferometer:
Based on the optical heterogeneity measurement apparatus of dual wavelength fizeau interferometer, including the first laser instrument (1),
Dual-laser device (2), refluxing reflection mirror (3), switched mirror (4), beam expanding lens (5), Amici prism (6),
Refluxing reflection mirror (7), collimator objective (8), reference planes mirror (9), aperture diaphragm (10), imaging len
Group (11), ccd detector (12), level crossing to be measured (13);Common optical axis set gradually refluxing reflection mirror (7),
Collimator objective (8), reference planes mirror (9), level crossing to be measured (13), the optical axis residing for above-mentioned parts is
One optical axis;Common optical axis set gradually Amici prism (6), aperture diaphragm (10), imaging lens group (11),
Ccd detector (12), the optical axis residing for above-mentioned parts is the second optical axis, and primary optic axis is parallel with the second optical axis;
Common optical axis set gradually refluxing reflection mirror (3), switched mirror (4), beam expanding lens (5), Amici prism (6),
Refluxing reflection mirror (7), the optical axis residing for above-mentioned parts is the 3rd optical axis, and the 3rd optical axis is vertical with primary optic axis,
Switched mirror (4) edge is parallel to primary optic axis direction and moves;All optical elements are coaxial relative to substrate
Height, i.e. coaxially contour relative to optical table or instrument base;
Adjusting level crossing to be measured (13) position, the front surface making level crossing to be measured (13) is vertical with primary optic axis,
Realize the interference of level crossing to be measured (13) front surface reflection light wave and reference planes mirror (9) reflecting light;
Step 2, respectively acquisition wavelength X1And λ2Corresponding first time phase-shift interference image:
Switched mirror (4) is removed the 3rd optical axis, and the laser of the first laser instrument (1) outgoing is anti-through turning back
Penetrate mirror (3), reflex to beam expanding lens (5), it is achieved expanding of light beam, after Amici prism (6) transmission, then
Reflex to collimator objective (8) through refluxing reflection mirror (7), become collimation angle pencil of ray, part collimated light beam warp
Becoming reference beam after the rear surface reflection of reference planes mirror (9), another part is saturating through reference planes mirror (9)
Inject level crossing to be measured (13), become test beams through level crossing to be measured (13) front surface reflection, and instead
It is mapped to reference planes mirror (9);Reference beam and test beams close bundle, edge in reference planes mirror (9) rear surface
Light path returns refluxing reflection mirror (7), reflexes to Amici prism (6) through refluxing reflection mirror (7), through light splitting rib
Mirror (6) reflection focuses on aperture diaphragm (10) place, then through imaging lens group (11), is imaged on CCD
On the target surface of detector (12), it is thus achieved that wavelength X1Corresponding interference image, PZT drives reference planes mirror (9)
Carry out phase shift, it is thus achieved that wavelength X1Under level crossing to be measured (13) front surface and reference planes mirror (9) rear surface do
Relate to the phase-shift interference of formation;
Switched mirror (4) is moved into the 3rd optical axis, and the laser of second laser (2) outgoing is anti-through switching
Penetrate mirror (4), reflex to beam expanding lens (5), it is achieved expanding of light beam, after Amici prism (6) transmission, then
Reflex to collimator objective (8) through refluxing reflection mirror (7), become collimation angle pencil of ray, part collimated light beam warp
Becoming reference beam after the rear surface reflection of reference planes mirror (9), another part is saturating through reference planes mirror (9)
Inject level crossing to be measured (13), become test beams through level crossing to be measured (13) front surface reflection, and instead
It is mapped to reference planes mirror (9);Reference beam and test beams close bundle, edge in reference planes mirror (9) rear surface
Light path returns refluxing reflection mirror (7), reflexes to Amici prism (6) through refluxing reflection mirror (7), through light splitting rib
Mirror (6) reflection focuses on aperture diaphragm (10) place, then through imaging lens group (11), is imaged on CCD
On the target surface of detector (12), obtain wavelength X2Corresponding interference image, PZT drives reference planes mirror (9)
Carry out phase shift, it is thus achieved that wavelength X2Under level crossing to be measured (13) front surface and reference planes mirror (9) rear surface do
Relate to the phase-shift interference of formation;
Step 3, according to wavelength X1And λ2Corresponding first time phase shifting interference, uses corresponding Phase-shifting algorithm,
Obtain wavelength X1And λ2Corresponding phase information, and the constant that carries out disappearing respectively to the phase information under two wavelength respectively
, disappear inclination item process, obtain wavelength X1And λ2At corresponding level crossing to be measured (13) front surface any point
Wave front aberration
ΔW11(x, y)=2naA(x,y)+2S(x,y)
ΔW21(x, y)=2naA(x,y)+2S(x,y)
Δ W in formula11(x, y) for measurement wavelength X for the first time1Corresponding wave front aberration, Δ W21(x, y) for for the first time
Measurement wavelength X2Corresponding wave front aberration, A (x, y) is the surface form deviation of level crossing to be measured (13) front surface,
(x y) is systematic error, the n of interferometer measuration system to SaFor air refraction, (x y) is level crossing to be measured (13)
The coordinate of front surface any point;
Step 4, respectively acquisition wavelength X1And λ2Corresponding second time phase-shift interference image:
Adjust the angle of level crossing to be measured (13), make the rear surface of level crossing to be measured (13) and primary optic axis hang down
Directly, it is achieved pass through level crossing to be measured (13) the light wave being reflected by level crossing to be measured (13) rear surface and reference
Level crossing (9) reflecting light interference;
Switched mirror (4) is removed the 3rd optical axis, and the laser of the first laser instrument (1) outgoing is anti-through turning back
Penetrate mirror (3), reflex to beam expanding lens (5), it is achieved expanding of light beam, after Amici prism (6) transmission, then
Reflex to collimator objective (8) through refluxing reflection mirror (7), become collimation angle pencil of ray, part collimated light beam warp
Becoming reference beam after the rear surface reflection of reference planes mirror (9), another part is saturating through reference planes mirror (9)
Inject level crossing to be measured (13), be reflected as test beams through level crossing to be measured (13) rear surface, and instead
It is mapped to reference planes mirror (9);Reference beam and test beams close bundle, edge in reference planes mirror (9) rear surface
Light path returns refluxing reflection mirror (7), reflexes to Amici prism (6) through refluxing reflection mirror (7), through light splitting rib
Mirror (6) reflection focuses on aperture diaphragm (10) place, then through imaging lens group (11), is imaged on CCD
On the target surface of detector (12), it is thus achieved that wavelength X1Corresponding interference image, PZT drives reference planes mirror (9)
Carry out phase shift, it is thus achieved that wavelength X1Under level crossing to be measured (13) rear surface and reference planes mirror (9) rear surface do
Relate to the phase-shift interference of formation;
Switched mirror (4) is moved into the 3rd optical axis, and the laser of second laser (2) outgoing is anti-through switching
Penetrate mirror (4), reflex to beam expanding lens (5), it is achieved expanding of light beam, after Amici prism (6) transmission, then
Reflex to collimator objective (8) through refluxing reflection mirror (7), become collimation angle pencil of ray, part collimated light beam warp
Becoming reference beam after the rear surface reflection of reference planes mirror (9), another part is saturating through reference planes mirror (9)
Inject level crossing to be measured (13), be reflected as test beams through level crossing to be measured (13) rear surface, and instead
It is mapped to reference planes mirror (9);Reference beam and test beams close bundle, edge in reference planes mirror (9) rear surface
Light path returns refluxing reflection mirror (7), reflexes to Amici prism (6) through refluxing reflection mirror (7), through light splitting rib
Mirror (6) reflection focuses on aperture diaphragm (10) place, then through imaging lens group (11), is imaged on CCD
On the target surface of detector (12), obtain wavelength X2Corresponding interference image, PZT drives reference planes mirror (9)
Carry out phase shift, it is thus achieved that wavelength X2Under level crossing to be measured (13) rear surface and reference planes mirror (9) rear surface do
Relate to the phase-shift interference of formation;
Step 5, according to wavelength X1And λ2Corresponding second time phase shifting interference, uses corresponding Phase-shifting algorithm,
Obtain wavelength X1And λ2Respectively corresponding phase information, and the phase information to two wavelength carry out disappearing constant term, disappear
Tilt item process, obtain wavelength X1And λ2Wavefront at corresponding level crossing to be measured (13) front surface any point
Aberration:
ΔW12(x, y)=2 (na-n10)A(x,y)+2n10B(x,y)+2Δ(x,y)+2S(x,y)
ΔW22(x, y)=2 (na-n20)A(x,y)+2n20B(x,y)+2Δ(x,y)+2S(x,y)
In formula, Δ W12(x y) is second step measurement wavelength X1Corresponding wave front aberration, Δ W22(x is y) second
Pacing amount wavelength X2Corresponding wave front aberration, B (x, y) is the surface form deviation of level crossing to be measured (13) rear surface,
n10For level crossing to be measured (13) in wavelength X1Under mean refractive index, n20For level crossing to be measured (13) at ripple
Long λ2Under mean refractive index, Δ (x, y) for due to the optical heterogeneity of level crossing to be measured (13) introduced
Wavefront deviation;
Wherein,
Δ (x, y)=d0·Δn(x,y)
In formula, d0For the average thickness of level crossing to be measured (13), and Δ n (x, y) non-all for optics to be measured
Even property;
Step 6, the optical heterogeneity distribution obtaining level crossing to be measured (13):
6-1) determine and measure wavelength X with second time for the first time1Corresponding wave front aberration difference DELTA W1(x,y)
6-2) determine and measure wavelength X with second time for the first time2Corresponding wave front aberration difference DELTA W2(x,y)
Wherein,
Δ d (x, y)=B (x, y)-A (x, y)
△ d (x, y) amounts of thickness variation for being caused by flat mirror to be measured (13) deformation;
6-3) determine level crossing to be measured (13) optical heterogeneity Δ n (x, y):
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510209977.9A CN106092514B (en) | 2015-04-28 | 2015-04-28 | Optical heterogeneity measuring device and method based on dual wavelength fizeau interferometer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510209977.9A CN106092514B (en) | 2015-04-28 | 2015-04-28 | Optical heterogeneity measuring device and method based on dual wavelength fizeau interferometer |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106092514A true CN106092514A (en) | 2016-11-09 |
CN106092514B CN106092514B (en) | 2018-10-02 |
Family
ID=57216227
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510209977.9A Expired - Fee Related CN106092514B (en) | 2015-04-28 | 2015-04-28 | Optical heterogeneity measuring device and method based on dual wavelength fizeau interferometer |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106092514B (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107655405A (en) * | 2017-08-29 | 2018-02-02 | 南京理工大学 | The method that axial range error between object and CCD is eliminated using self-focusing iterative algorithm |
CN108132026A (en) * | 2018-01-24 | 2018-06-08 | 赵智亮 | Infrared visible ray dual wavelength transmission-type interference testing device in semiconductor |
CN109029244A (en) * | 2018-07-10 | 2018-12-18 | 中国科学院上海光学精密机械研究所 | Multiwavelength laser interferometer |
CN109253707A (en) * | 2018-10-19 | 2019-01-22 | 成都太科光电技术有限责任公司 | Hundred microns of range transmission-type interference testing devices |
CN109406107A (en) * | 2018-10-19 | 2019-03-01 | 中国兵器工业标准化研究所 | The control method of the sample face shape error of infrared optical material uniformity test |
CN111412852A (en) * | 2020-04-13 | 2020-07-14 | 中国科学院上海光学精密机械研究所 | Dual-wavelength dual-mode dynamic digital speckle interferometry device and method |
CN111998790A (en) * | 2020-08-03 | 2020-11-27 | 中国科学院光电技术研究所 | Ultrahigh-precision surface shape measurement method based on dual-wavelength interference |
CN112525071A (en) * | 2020-11-27 | 2021-03-19 | 南京理工大学 | Method for inhibiting non-uniformity influence of optical material in large-aperture interferometer |
CN113587844A (en) * | 2021-07-27 | 2021-11-02 | 中国科学院长春光学精密机械与物理研究所 | Phase-shifting interferometry system and method |
CN114397092A (en) * | 2022-01-14 | 2022-04-26 | 深圳迈塔兰斯科技有限公司 | Method and system for measuring super-surface phase |
CN114812889A (en) * | 2022-05-06 | 2022-07-29 | 南京理工大学 | Large-caliber optical element stress detection device and detection method thereof |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0027763A1 (en) * | 1979-10-17 | 1981-04-29 | ANVAR Agence Nationale de Valorisation de la Recherche | Process and apparatus for measuring distance by laser interferometry with two wavelengths |
CN101788263A (en) * | 2010-03-09 | 2010-07-28 | 北京理工大学 | Coaxial Fizeau synchronous phase shifting interferometer capable of adjusting extended light illumination |
US7777895B2 (en) * | 2003-08-28 | 2010-08-17 | 4D Technology Corporation | Linear-carrier phase-mask interferometer |
CN102252823A (en) * | 2011-04-07 | 2011-11-23 | 山东大学 | Dual-wavelength phase-shift interference-based method for measuring optical heterogeneity |
-
2015
- 2015-04-28 CN CN201510209977.9A patent/CN106092514B/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0027763A1 (en) * | 1979-10-17 | 1981-04-29 | ANVAR Agence Nationale de Valorisation de la Recherche | Process and apparatus for measuring distance by laser interferometry with two wavelengths |
US7777895B2 (en) * | 2003-08-28 | 2010-08-17 | 4D Technology Corporation | Linear-carrier phase-mask interferometer |
CN101788263A (en) * | 2010-03-09 | 2010-07-28 | 北京理工大学 | Coaxial Fizeau synchronous phase shifting interferometer capable of adjusting extended light illumination |
CN102252823A (en) * | 2011-04-07 | 2011-11-23 | 山东大学 | Dual-wavelength phase-shift interference-based method for measuring optical heterogeneity |
Non-Patent Citations (1)
Title |
---|
ZHISHAN GAO ET AL.: "Refractive index measurement based on the wavefront difference method by a Fizeau interferometer", 《JOURNAL OF OPTICS》 * |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107655405B (en) * | 2017-08-29 | 2020-01-24 | 南京理工大学 | Method for eliminating axial distance error between object and CCD by using self-focusing iterative algorithm |
CN107655405A (en) * | 2017-08-29 | 2018-02-02 | 南京理工大学 | The method that axial range error between object and CCD is eliminated using self-focusing iterative algorithm |
CN108132026B (en) * | 2018-01-24 | 2024-02-27 | 赵智亮 | Infrared and visible light dual-wavelength transmission type interference testing device in semiconductor |
CN108132026A (en) * | 2018-01-24 | 2018-06-08 | 赵智亮 | Infrared visible ray dual wavelength transmission-type interference testing device in semiconductor |
CN109029244A (en) * | 2018-07-10 | 2018-12-18 | 中国科学院上海光学精密机械研究所 | Multiwavelength laser interferometer |
CN109029244B (en) * | 2018-07-10 | 2020-08-28 | 中国科学院上海光学精密机械研究所 | Multi-wavelength laser interferometer |
CN109253707A (en) * | 2018-10-19 | 2019-01-22 | 成都太科光电技术有限责任公司 | Hundred microns of range transmission-type interference testing devices |
CN109406107A (en) * | 2018-10-19 | 2019-03-01 | 中国兵器工业标准化研究所 | The control method of the sample face shape error of infrared optical material uniformity test |
CN109253707B (en) * | 2018-10-19 | 2024-02-27 | 成都太科光电技术有限责任公司 | Hundred-micrometer range transmission type interference testing device |
CN111412852A (en) * | 2020-04-13 | 2020-07-14 | 中国科学院上海光学精密机械研究所 | Dual-wavelength dual-mode dynamic digital speckle interferometry device and method |
CN111412852B (en) * | 2020-04-13 | 2021-09-07 | 中国科学院上海光学精密机械研究所 | Dual-wavelength dual-mode dynamic digital speckle interferometry device and method |
CN111998790A (en) * | 2020-08-03 | 2020-11-27 | 中国科学院光电技术研究所 | Ultrahigh-precision surface shape measurement method based on dual-wavelength interference |
CN112525071A (en) * | 2020-11-27 | 2021-03-19 | 南京理工大学 | Method for inhibiting non-uniformity influence of optical material in large-aperture interferometer |
CN113587844B (en) * | 2021-07-27 | 2022-05-27 | 中国科学院长春光学精密机械与物理研究所 | Phase-shifting interferometry system and method |
CN113587844A (en) * | 2021-07-27 | 2021-11-02 | 中国科学院长春光学精密机械与物理研究所 | Phase-shifting interferometry system and method |
CN114397092A (en) * | 2022-01-14 | 2022-04-26 | 深圳迈塔兰斯科技有限公司 | Method and system for measuring super-surface phase |
CN114397092B (en) * | 2022-01-14 | 2024-01-30 | 深圳迈塔兰斯科技有限公司 | Method and system for measuring super-surface phase |
CN114812889A (en) * | 2022-05-06 | 2022-07-29 | 南京理工大学 | Large-caliber optical element stress detection device and detection method thereof |
Also Published As
Publication number | Publication date |
---|---|
CN106092514B (en) | 2018-10-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106092514A (en) | Optical heterogeneity measurement apparatus and method based on dual wavelength fizeau interferometer | |
JP4951189B2 (en) | Frequency conversion phase shift interferometry | |
US6879402B2 (en) | Scanning interferometer for aspheric surfaces and wavefronts | |
US6271924B1 (en) | Noncontact acoustic optic scanning laser vibrometer for determining the difference between an object and a reference surface | |
CN101865670B (en) | Plane surface shape measurement method of optical fiber point-diffraction phase-shifting interferometer | |
CN101251497B (en) | Optical glass uniformity testing device and testing method thereof | |
US6894788B2 (en) | Interferometric system for automated radius of curvature measurements | |
CN111121644A (en) | Micro-displacement measurement method and device based on vortex rotation and spherical wave interference | |
CN108061639A (en) | Large dynamic range and high precision phase difference method wavefront measuring instrument combined with adaptive optics technology | |
CN204479018U (en) | Based on the aspheric surface interference checking device of stitching interferometry and calculation holographic method | |
CN108562241A (en) | The apparatus and method of digital hologram flexible measuring based on fiber optic bundle | |
US20210239452A1 (en) | Method and Apparatus for Detecting Changes in Direction of a Light Beam | |
CN205538736U (en) | Optical element surface defect detecting device of transmission dual wavelength synthetic aperture holography | |
US8576408B2 (en) | Surface figure test method for large convex optical surfaces | |
US6449049B1 (en) | Profiling of aspheric surfaces using liquid crystal compensatory interferometry | |
CN105737758A (en) | Long trace profile | |
Ramirez et al. | Estimation of the degree of asphericity of a glass sphere using a vectorial shearing interferometer | |
Xi et al. | Intensity response model and measurement error compensation method for chromatic confocal probe considering the incident angle | |
Rasouli et al. | Use of a two-channel moiré wavefront sensor for measuring topological charge sign of the vortex beam and investigation of its change due to an odd number of reflections | |
JP2831428B2 (en) | Aspherical shape measuring machine | |
Burke et al. | Null test of an off-axis parabolic mirror. I. Configuration with spherical reference wave and flat return surface | |
Hines et al. | Micro-arcsecond metrology (MAM) testbed overview | |
Vannoni et al. | Joint interferometric measurement of planarity and parallelism | |
CN205562427U (en) | Optical element surface defect detecting device of reflection -type synthetic aperture digital holographic art | |
CN108663192A (en) | The detection device and method of Wavefront sensor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20181002 Termination date: 20210428 |
|
CF01 | Termination of patent right due to non-payment of annual fee |