CN106082692A - Self-cleaning surface structure of Nanometer dustproof and preparation method thereof - Google Patents
Self-cleaning surface structure of Nanometer dustproof and preparation method thereof Download PDFInfo
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- CN106082692A CN106082692A CN201610425153.XA CN201610425153A CN106082692A CN 106082692 A CN106082692 A CN 106082692A CN 201610425153 A CN201610425153 A CN 201610425153A CN 106082692 A CN106082692 A CN 106082692A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 62
- 238000002360 preparation method Methods 0.000 title claims description 17
- 239000011521 glass Substances 0.000 claims abstract description 49
- 239000000428 dust Substances 0.000 claims abstract description 29
- 239000000084 colloidal system Substances 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 24
- 239000008187 granular material Substances 0.000 claims abstract description 23
- 239000002245 particle Substances 0.000 claims abstract description 20
- 238000000151 deposition Methods 0.000 claims abstract description 13
- 230000008021 deposition Effects 0.000 claims abstract description 12
- 239000002105 nanoparticle Substances 0.000 claims abstract description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 37
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 36
- 230000003075 superhydrophobic effect Effects 0.000 claims description 29
- 239000011248 coating agent Substances 0.000 claims description 21
- 238000000576 coating method Methods 0.000 claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 18
- 230000000694 effects Effects 0.000 claims description 15
- 238000003756 stirring Methods 0.000 claims description 15
- 230000003068 static effect Effects 0.000 claims description 13
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 10
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 9
- 229910021529 ammonia Inorganic materials 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- 238000003618 dip coating Methods 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 238000005507 spraying Methods 0.000 claims description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 6
- 238000001020 plasma etching Methods 0.000 claims description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 5
- 238000007711 solidification Methods 0.000 claims description 5
- 230000008023 solidification Effects 0.000 claims description 5
- 239000000243 solution Substances 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 4
- 239000007767 bonding agent Substances 0.000 claims description 4
- -1 epoxide silicon Alkane Chemical class 0.000 claims description 4
- 239000002086 nanomaterial Substances 0.000 claims description 4
- 239000003921 oil Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 3
- 230000001133 acceleration Effects 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 239000002585 base Substances 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052681 coesite Inorganic materials 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052906 cristobalite Inorganic materials 0.000 claims description 3
- 238000010790 dilution Methods 0.000 claims description 3
- 239000012895 dilution Substances 0.000 claims description 3
- 239000006185 dispersion Substances 0.000 claims description 3
- 230000005484 gravity Effects 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 235000006408 oxalic acid Nutrition 0.000 claims description 3
- 230000000284 resting effect Effects 0.000 claims description 3
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical class CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 claims description 3
- 239000005361 soda-lime glass Substances 0.000 claims description 3
- 229910052682 stishovite Inorganic materials 0.000 claims description 3
- 239000001117 sulphuric acid Substances 0.000 claims description 3
- 235000011149 sulphuric acid Nutrition 0.000 claims description 3
- 229910052905 tridymite Inorganic materials 0.000 claims description 3
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 2
- 240000007594 Oryza sativa Species 0.000 claims 1
- 235000007164 Oryza sativa Nutrition 0.000 claims 1
- 235000013339 cereals Nutrition 0.000 claims 1
- 235000009566 rice Nutrition 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 abstract description 9
- 238000005530 etching Methods 0.000 abstract description 8
- 238000001259 photo etching Methods 0.000 abstract description 5
- 238000002834 transmittance Methods 0.000 abstract description 5
- 230000009467 reduction Effects 0.000 abstract description 4
- 230000002209 hydrophobic effect Effects 0.000 abstract description 3
- 239000004576 sand Substances 0.000 abstract description 3
- 230000007423 decrease Effects 0.000 abstract description 2
- 238000013461 design Methods 0.000 abstract description 2
- 238000010894 electron beam technology Methods 0.000 abstract description 2
- 239000000839 emulsion Substances 0.000 abstract description 2
- 238000012876 topography Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 17
- 238000005516 engineering process Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 4
- 238000005253 cladding Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000002103 nanocoating Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 235000013399 edible fruits Nutrition 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000002164 ion-beam lithography Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000003921 particle size analysis Methods 0.000 description 2
- 230000001699 photocatalysis Effects 0.000 description 2
- 238000007146 photocatalysis Methods 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920005479 Lucite® Polymers 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 241000276425 Xiphophorus maculatus Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004969 ion scattering spectroscopy Methods 0.000 description 1
- 239000006193 liquid solution Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000001127 nanoimprint lithography Methods 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229950000845 politef Drugs 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses the self-cleaning surface structure of Nanometer dustproof, be the design structure utilizing surface topography in nanometer or submicron-scale, produce and produce nanostructured porous layer, reach: dust-proof, anti-reflection, self-cleaning purpose.Utilize nano-sized hydrophobic or hydrophilic particle so that it is become colloid emulsion, it is possible to compare and be uniformly dispersed in glass surface, constitute more uniform nanostructured.Masterplate method photoetching or energy particle bundle (photon beam, electron beam or ion beam) etching can also be utilized to construct the cutting-edge structure surface of nanoscale, the surface being constructed such that has good surface tip so that the contact area of the big granule and surface that are deposited on surface is obviously reduced.The reduction of contact area, it is possible to reduce the active force of contactant and surface, reach the purpose of dust protection.Especially because sand and dust etc. are in the deposition on its surface, cause the decline of glass surface light transmittance, and then cause the reduction of solar energy power generating plate generating capacity.
Description
Technical field
The invention belongs to the dust-proof and self-cleaning technical field of glass surface, more particularly to the self-cleaning surface structure of Nanometer dustproof and
Preparation method.
Background technology
Surface is dust-proof and self-cleaning is building, cladding glass, automobile and solar energy photovoltaic glass and optical lens and electronics
The applications such as display very one of concern.It is presently mainly to be processed by photocatalyst and surface hydrophobicity and is derived from
Clean purpose (lotus leaf effect).For photovoltaic glass, most of water short of rain or area without rainwater, a week
The generating capacity loss of uncleanly PV glass panel can reach 10%, and the dust of month pollutes the generating capacity caused
Loss reaches 20%.Therefore, photovoltaic glass dust-proof and self-cleaning be in the generating operation of photovoltaic solar later stage the most concern it
One.
The present invention is mainly photovoltaic solar power generation plate and the dust-proof self-cleaning offer technology of cladding glass and method for designing.Also
May be used for the dust-proof self-cleaning of photovoltaic heat energy transfer surface.
Chinese patent CN 201020547731(utility model) report and a kind of surpass in solar energy photovoltaic glass surface-coated
Hydrophilic silicas and the coating of interpolation nano-titanium oxide.The photic decomposition (photocatalysis) mainly utilizing titanium oxide reaches to decompose absorption
In glass surface Organic substance.Document [Nakajima, Akira, Kazuhito Hashimoto, Toshiya Watanabe,
Kennichi Takai, Goro Yamauchi, and Akira Fujishima. "Transparent
superhydrophobic thin films with self-cleaning properties." Langmuir 16, no.
17 (2000): 7044-7047] function utilizing the photocatalysis of nano-titanium oxide to cause clean surfaces is reported.Chinese patent
CN103617847A then reports one and utilizes evaporating deposition technique by glass fibre element, silicon element polymer and fluorine element polymer peace
Dress and glass insulation sub-surface, have good insulating properties, simultaneously at wind and rain weather, it is possible to there is certain self-cleaning ability, rises
To dustproof effect.The dust-proof and self-cleaning of cladding glass may all suffer from same problem.Vacuum moulding machine TiO2Though membrane process has one
Fixed effect, but cost is the highest, is difficult to use.
Glass is self-cleaning at present, including being used in photovoltaic and the multiplex vacuum of cladding glass or sol-gal process deposition one
Layer titanium deoxid film, utilizes the organic adsorption on its light-catalysed action breaks surface, utilizes its hydrophilicity to reach self-cleaning
Purpose.Additionally, also utilize water-repelling agent (such as perfluor silane or 16 alkyl 3 methyl TMOSs etc.) modification of surfaces, pass through water
Drip the purpose that the effect that can differ from surface contact properties reaches self-cleaning.
For there being the region of substantial amounts of rainwater, or by washing with water, these surfaces truly have good self-cleaning action, but
For small rain droplets, self-cleaning action is the most weak, or surface adsorption thing can be pooled to local, it appears dirtier.And these process base
Originally there is no dust-proof effect.
It is reported, NORTHWEST CHINA most area and Middle East thereof, although solar radiation is extremely strong, but hydropenia, dust storm
Greatly, the deposition of solar energy photovoltaic panel glass surface dust, cause solar panels power generation loss to be up to 10-50%.Cause greatly
Energy waste.To this end, dust-proof and self-cleaning effect is extremely important.It addition, photovoltaic glass surface causes greatly due to accumulated snow, frosting etc.
The loss of the generated energy of amount.
Nanometer microlithography includes that nano imprint lithography, ion beam etching are applied primarily to electron trade.
Ion beam etching reaches to etch the technology of purpose with ion beam for etch tool, and its resolution is limited to particle and enters
Substrate and ion energy exhaust the path domain of process.Ion beam minimum diameter about 10nm, the structure of ion beam etching is minimum
May will not be less than 10nm.The beam spot of focused-ion-beam lithography is up to below 100nm at present, and minimum reaches 10nm, it is thus achieved that
The processing result of little live width 12nm.Comparing electronics and solid to interact, ion scattering effect in solids is less, and can be with
Direct write speed carries out the etching less than 50nm faster, so focused-ion-beam lithography is a kind of Perfected process of nanometer processing.
In addition another advantage of focused ion beam technology be under the control of the computer without mask inject, even Nonvisualization etching, directly
Manufacture various nanodevice structural.
Glass material has good micro Process performance, utilizes the Fluohydric acid. corrosiveness to glass, to glass accurate, complicated
Glass component surface carries out the processing such as chemical etching, chemical polishing, and the most not only precision is high, also can avoid producing manufacturing deficiency, with
Time, processing is not limited by device surface configuration, working (machining) efficiency is higher.
Along with Nano-technology Development, people can make chemically to prepare porous nano coating, nanoparticle paint, energy
Control its surface microstructure relatively accurately, produce porous nano super hydrophobic coating and the super hydrophilic coating of porous nano.
Summary of the invention
It is an object of the invention to as solving drought area, dust storm is big, sinking of solar energy photovoltaic panel glass surface dust
Long-pending, the problem causing solar panels power generation loss, and a kind of self-cleaning surface structure of Nanometer dustproof and processing method thereof are provided.
The self-cleaning surface structure of Nanometer dustproof, its top layer is porous nanometer structure layer, and thickness is less than 200 nanometers, described hole
Granule for arranging by spacing d is constituted, and dust particle diameter is set to D, and meets following condition:
Or substrate is s with the contact area of granule:
Here p is pi constant, can define effective contact surface and be, apparent contact area is, it has anti-
The primary condition of dirt is:
Described spacing d is 5-100 nanometer；
Described granule is spheroid, column, bullet or latticed；
The thickness of the self-cleaning surface structure of described Nanometer dustproof is less than 100 nanometers；
The self-cleaning surface structure of described Nanometer dustproof is super hydrophobic surface, and its static contact angle is more than 150 degree, and roll angle is less than 10
Degree or ultra-hydrophilic surface, its static contact angle is less than 10 degree；
The self-cleaning surface structure of described Nanometer dustproof, the coefficient of friction in the case of the existence ignoring surface liquid, between them
For m, the then dust particle of landingiIt must is fulfilled for condition:
Wherein, m is the quality of particle, and g is acceleration of gravity.Because the effect of granule and contact surface is direct with effective contact area
Relevant, or
Here it is proportionality coefficient, so under given inclination angle, minimum dust-proof contact surface:
Due to generally, coefficient of friction m is less than 1, so minimum effectively contact area is proportional to for given material
The weight (quality) of grain, inclination angle.
Dust-proof efficiency h can be write as:
Wherein, N0It is the total number of deposited granule,It it is the number of particles resting on surface.
Preparation method based on the organic silicon nano porous dust-proof super-hydrophobic coat self-cleaning surface structure of Nanometer dustproof, its bag
Include:
(A) colloid of nanoporous coating is prepared: water intaking 4-6 part, ammonia 5-7 part, oxalic acid solution 8-12 part of 1 mole, ethanol
Or methanol 80-120 part stirs mixing, and it is heated to 40-70 degree Celsius, adds 6-10 part methyl trimethoxy base epoxide silicon
Alkane and tetraethyl orthosilicate 1-3 part, stir, and keep 40-70 degree Celsius stand 3-5 days, after naturally cool to room temperature；
(B) dispersion colloid: take out above-mentioned product 1 part, adds 3-6 part methanol, ethanol or isopropanol, and ultrasonic disperser disperses
10-40 minute；
(C) application: by scattered nanometer colloid, spraying or dip-coating after glass surface, natural drying in 100-300 degree temperature
Degree lower solidification 0.2-2 hour, takes out after cooling.
The preparation method of the nanoporous dust-proof super-hydrophobic coat self-cleaning surface structure of Nanometer dustproof with resin as bonding agent,
It includes:
(A) take 30 parts of ethanol, methanol or isopropanol, add 20 parts of butyl acetates, after stirring, be separately added into 6-10 part methyl
Trimethyl TMOS and 3-5 part tetraethyl orthosilicate, add ammonia 2-3 part of 1 mol/L, stir and keep 3-5 hour,
Add 2-7 part fluorocarbon resin and ammonia 10-15 part stirs, standing and reacting 2-7 days under 50 degree Celsius, obtain faint yellow
Gel；
(B) remove gel, add the ethanol dilution of 5-11 times, obtain super-hydrophobic colloid；
(C) application: can be sprayed by colloid, dip-coating or czochralski method form thin film at glass surface；At room temperature solidification 48 hours or
Person, 100-250 degree internal heating curing 30 minutes, obtains the porous super hydrophobic dust-proof coating self-cleaning surface structure of Nanometer dustproof.
The preparation method of the dust-proof super-hydrophilic coating self-cleaning surface structure of Nanometer dustproof based on nanoparticle, it includes:
(A) by 5-20 nano-titanium oxide 1 part and 5-20 nano tin dioxide 2 parts, ultrasonic disperser is utilized, according to 0.2-0.8wt%
Concentration be dispersed in methanol or ethanol, formed colloid solution；
(B) utilize brush or dip-coating, or spraying method by nanometer colloid even application in its surface.
(C) drying at room temperature 1-2 processes 10 to 30 minutes under individual hour or 100 degrees Celsius.
The preparation method of the self-cleaning surface structure of columnar nanometer porous surface structure Nanometer dustproof, it includes:
(1) select containing soda-lime glass；
(2) surface organic solvent cleans；
(3) on its surface with the SiO2 layer of meteorological chemical reaction method one layer of 0.5-2 micron of deposition；
(4) then pass to CF4 gas, under the operating pressure of 1-3x10-4 torr, add 500 to the back bias voltage of 600 volts to substrate, enter
Row vacuum glow discharge, after reactive ion etching 10-60 minute, surface forms nanostructured；
(5) surface etched hydrolyzes in water vapour removes the fluoride that surface is formed, and obtains super hydrophilic nanometer column
Structure, or modify by low-surface energy substance, it is thus achieved that super hydrophobic surface.
The preparation method of the dust-proof self-cleaning surface structure of the dust-proof self-cleaning surface of cone-shaped nano structure glass, it includes:
(1) select suitable glass and clean clean；
(2) vacuum evaporation deposition Ni, Cr or Cu metal 40-70 nano thickness；
(3) 200-400 degree Celsius of sample of heating 10-30 minute in a vacuum；
(4) CF4 plasma etching is utilized: at 1-5x10-2Under the vacuum of torr, under the back bias voltage of 400-500 volt, discharge 5-40
Minute；
(5) acid (nitric acid, sulphuric acid, hydrochloric acid etc.) is utilized to erode the metal fluoride on surface；
(6) obtain taper ultra-hydrophilic surface, or its surface is carried out low-surface energy substance modify obtain super hydrophobic surface.
The preparation method of the super hydrophilic dust-proof self-cleaning surface structure of nanometer paper-like porous surface on glass, it includes:
(1) cleaning surface, removes oil stain and spot；
(2) glass being positioned over alkaline aqueous solution, the concentration of its alkali liquor controls in 0.5-4.0 mol/L, and temperature is taken the photograph at 70-110
Family name's degree, the time is standing in 0.5-4 hour；
(3) naturally cool to room temperature, take out glass, wash with water；
(4) it is dried surface.
The invention provides the design structure utilizing surface topography in nanometer or submicron-scale, produce and produce nanometer
Structural porous layer, reaches: 1) dust-proof；2) anti-reflection (antireflective)；3) self-cleaning purpose.Such as utilize nano-sized hydrophobic or hydrophilic
Particle so that it is become colloid emulsion, it is possible to compare and be uniformly dispersed in glass surface, constitutes more uniform nanostructured. and permissible
It is spraying, brushes or be immersed in.Masterplate method photoetching or energy particle bundle (photon beam, electron beam or ion can also be utilized
Bundle) etch the cutting-edge structure surface constructing nanoscale, the surface being constructed such that has good surface tip so that deposition
It is obviously reduced with the contact area on surface at the big granule on surface.The reduction of contact area, it is possible to reduce contactant and surface
Active force (usually van der Waals interaction power), reach the purpose of dust protection.Especially because sand and dust etc. are on its surface
Deposition, causes the decline of glass surface light transmittance, and then causes the reduction of solar energy power generating plate generating capacity.
Based on considerations above, applicant devises at least four face coat as shown in Figure 1,2,3, 4 or modification
Structure；Wherein the ratio of void pitch and granule (dust) size is extremely important: as long as the particle diameter of granule is more much larger than spacing,
Just can be effectively accomplished dust-proof purpose.As fruit granule has certain size distribution, it is necessary for considering to reduce to go to space as far as possible
Spacing.And prevent granule embedding between space.If the average diameter of fruit granule is D (or mean size), substrate surface
The spacing of granule is d (or substrate is column, intercolumniation), and the most dust-proof primary condition is:
Or substrate is s with the contact area of granule:
Here p is pi constant (3.14156 ...). can define effective contact surface is, apparent contact area is
It has dust-proof primary condition:
Wherein, the size of ratio a determines the ratio of effective contact area and apparent contact area.If plus contact surface with
The contact of grain is smooth, and the active force between contact is van der Waals interaction power (mechanics analysis is shown in Fig. 5), is ignoring table
The existence (now without capillary force) of face liquid, the coefficient of friction between them is m, then the particle of landingiIt must is fulfilled for bar
Part:
Wherein, m is the quality of particle, and g is acceleration of gravity.Because the effect of granule and contact surface is direct with effective contact area
Relevant, or
Here it is proportionality coefficient, so under given inclination angle, minimum dust-proof contact surface
Due to generally, coefficient of friction m is less than 1, so minimum effectively contact area is proportional to for given material
The weight (quality) of grain, inclination angle.
Dust-proof efficiency h can be write as:
Wherein, N0It is the total number of deposited granule,It it is the number of particles resting on surface.It will be apparent that dust-proof efficiency h
Relevant with the inclination angle (q) of effective contact area and plate face.Under given inclination angle (q), reduce effective contact area and connect with apparent
The ratio that contacting surface is amassed is maximally effective dust-control method.This purpose can be reached by structured surface structure.
Under given inclination angle, dust-proof maximum effectively contact area SmDetermine landing or deposit in its surface
The number of dust.Obviously, the shapes and sizes of dust particle directly determine dust-proof effect.If antifouling (liquid or
Semi liquid state shape), then require that surface is super-hydrophobic best.Because hydrophilic meeting causes the appearance of capillary force, a resistance can be increased
The active force of sliding stop, causes dust-proof inefficacy or weakens.
If it is considered that the optical transmittance of its glass surface, then to consider antireflective simultaneously.Its antireflecting condition is: thin
The thickness of layerWherein,n l It it is the effective refractive index (air is 1.0, and glass is 1.5) of structure sheaf.It is exactly it in simple terms
Within 100 nanometers of THICKNESS CONTROL.The effective refractive index of its porous layer is progressively transitioned into 1.5. so slowly by the 1.0 of air
Optimal antireflecting purpose can be reached.For Zong He, Fig. 4 is optimum selection, and it is comprehensive that other structure to see that its concrete emphasis is come
Consider, but the production cost reaching Fig. 4 is also the highest.
Wherein Fig. 1 can be by by dispersed for nanoparticle (single dispersing), and Fig. 2 is column or bar-shaped, permissible
Photoetching or oriented growth (seed) obtain, and Fig. 3 is thin porous layer, can use accomplished in many ways, including resin-nanoparticle
Monodisperse colloid is immersed in or spin coating or brushing etc., it is also possible to prepare with phase detachment technique scale;Fig. 4 is taper, permissible
Obtain with photoetching or ion beam etching.
Fig. 6-10 respectively monodisperse colloid granule acquisition nano coating, photoetching column-shaped porous coating, nano-particle are many
Hole coating, taper (ion beam etching) loose structure and paper-like nano-porous structure.These nanostructureds all can effectively subtract
Little reflection reaches 1-5%,
If reaching self-cleaning usefulness, its surface must be that super-hydrophobic (static contact angle is more than 150 degree, and roll angle is less than 10 degree.
Note: after roll angle is more than 10 degree, its self-cleaning effect can reduce) or super hydrophilic (static contact angle is less than 10 degree).
Accompanying drawing explanation
Fig. 1 graininess Nanometer dustproof coating surface structure schematic diagram；
Fig. 2 columnar nanometer dust-proof surface texture schematic diagram；
Fig. 3 paper-like Nanometer dustproof surface texture schematic diagram；
Fig. 4 taper Nanometer dustproof surface texture schematic diagram；
Fig. 5 nano-porous surface and dust effect schematic diagram；
Fig. 6 nano-porous surface electron micrograph, the upper left corner is water contact photo (5 microlitre)；
The electromicroscopic photograph on Fig. 7 columnar nano-structure surface；
Fig. 8 taper Nanometer dustproof surface electromicroscopic photograph；
Fig. 9 paper-like nano-porous surface electromicroscopic photograph；
Figure 10 tests the electromicroscopic photograph of sand and dust used；
The laser particle size analysis result figure of Figure 11 sandy environment；
Figure 12 Nanometer dustproof self-cleaning surface structure light transmittance figure；
The schematic diagram of fabrication technology of a kind of dust-proof super-hydrophobic coating material based on organosilicon of Figure 13；
The micro structure electromicroscopic photograph of the super-hydrophobic dust-proof self-cleaning coat of Figure 14 organic silicon nano；
The schematic diagram of fabrication technology of a kind of Nanometer dustproof super-hydrophilic coating material based on fluorocarbon resin of Figure 15；
The Figure 16 super-hydrophobic dust-proof self-cleaning coat electromicroscopic photograph with fluorocarbon resin as bonding agent；
The manufacture method of the super hydrophilic dust-proof nano-coating material of Figure 17；
The direct bonding nanoparticle of Figure 18 forms the nanometer particle film with dust-proof effect at glass surface, and surface is super hydrophilic
State (Static water contact angles is less than 3 degree, sees that the water droplet in the figure upper left corner is entirely flat).
Detailed description of the invention
Embodiment 1: nanoporous coating and technique thereof
Referring to accompanying drawing 1-6,13,14,15, the self-cleaning top layer of Nanometer dustproof, its surface has micropore, and micropore size is 5-50nm；
Hole wall is 10-50nm；
The thickness on this top layer is 100-200nm；Total cross section of porousFor the average diameter in space, apparent
Space number under area) and apparent cross section (=) ratio between 0.05-0.9.Concrete preparation method:
(1) a kind of based on the dust-proof super-hydrophobic coat of organic silicon nano porous
(A) colloid of nanoporous coating is prepared: water intaking 4-6 part, ammonia 5-7 part (bright limited public affairs of chemical reagent as red in Jiangsu
Department), oxalic acid solution 8-12 part of 1 mole, ethanol (or methanol) 80-120 part stirs mixing, and is heated to 40-70 and takes the photograph
Family name's degree, then by 6-10 part methyl trimethoxy silane (such as Nanjing Luo En silicon materials company limited) and tetraethyl orthosilicate 1-3 part
Add above-mentioned mixed liquor, stir, and keep under 40-70 degree celsius temperature stand 3-5 days, after naturally cool to room temperature.Tool
Body construction technique is as shown in Figure 13.
(B) dispersion colloid: take out above-mentioned product 1 part, adds 3-6 part methanol (ethanol or isopropanol), uses ultrasonic wavelength-division
Dissipate device (such as Shanghai Sheng Xi ultrasonic instrument company limited FS-450, power 500-1200 watt) 10-40 minute (2-3 liter).
(C) application: by scattered nanometer colloid, spraying (non-atomized) or dip-coating in its surface, after natural drying
0.2-2 hour is solidified at a temperature of 100-300 degree.Take out after cooling.(Electronic Speculum is shone to obtain micro-structure diagram as shown in figure 14
Sheet, Hitachi S4800).
(D) performance: the surface after application will be nanoporous, the super-hydrophobic dust-proof antireflective of about 100-200 nanometer thickness
Coating.Specific targets are: static contact angle is more than 150 degree, and roll angle is less than 10 degree；Visible ray light (400-800 nanometer) passes through
Rate increases by 0.5 to 2.0%.The concrete data of anti-dust performance are shown in Tables 1 and 2.
A kind of dust-proof super-hydrophobic coat of the nanoporous with resin as bonding agent:
(A) take 30 parts of ethanol (or methanol, or isopropanol), add 20 parts of butyl acetates, after stirring, be separately added into 6-
10 parts of methyl trimethoxy silanes (such as Nanjing Luo En silicon materials company limited) and 3-5 part tetraethyl orthosilicate, add 1 and rub
You/liter ammonia 2-3 part, stir and keep 3-5 hour, be eventually adding 2-7 part fluorocarbon resin (such as: CC1=4, east, Shanghai fluorination
Work company limited, or F534 Guangzhou Fu Yuangui Science and Technology Ltd.) and ammonia 10-15 part stir, at 50 degree Celsius
Lower standing and reacting 2-7 days, obtains flaxen gel.Concrete synthesis technique is as shown in figure 15.
(B) remove gel, add the ethanol dilution of 5-11 times, obtain its super-hydrophobic colloid.
(C) application: colloid can be sprayed, or be immersed in, czochralski method its surface formed thin film.At room temperature solidification 48 is little
Time or 100-250 degree internal heating curing 30 minutes, obtain the dust-proof coating of porous super hydrophobic.The electromicroscopic photograph of micro structure such as figure
Shown in 15.
(D) dust-proof and hydrophobic performance: coating surface is to the static contact angle of water more than 150 degree, and roll angle is less than 10 degree；Can
See that light transmission rate increases by 0.5 to 2.0%.The results are shown in Table shown in one of its anti-dust performance.
A kind of dust-proof super-hydrophilic coating based on nanoparticle
(A) by nano-titanium oxide (5-20 nanometer) 1 part and nano tin dioxide (5-20 nanometer) 2 parts, utilize ultrasonic disperser (on
Hai Shengxi ultrasonic instrument company limited FS-450), it is dispersed in methanol or ethanol according to the concentration of 0.2-0.8wt%, forms glue
Liquid solution.
(B) surface cleaning the holding that will construct are dried.
(C) utilize brush or dip-coating, or spraying method by nanometer colloid even application in its surface.
(D) drying at room temperature 1-2 processes 10 to 30 minutes under individual hour or 100 degrees Celsius.Obtain the electromicroscopic photograph of Figure 15.
Explanation is to have preferable scattered nanoparticle.
(E) coating key property: water static contact angle is less than 5 degree.Visible light transmittance rate (visible ray increases by more than 0.5%).
(F) anti-dust performance: be shown in Table shown in.
Embodiment 2 columnar nanometer porous surface structure dustproof glass
The self-cleaning top layer of Nanometer dustproof, its surface has micropore, and micropore size is 5-50nm, and described micropore is column (Fig. 7)
Or the gap that bullet (Fig. 8) arrangement is formed, or latticed hole (Fig. 9), the top of described column, bullet or grid is
Yardstick (diameter) is 5-30nm.The height of column or taper or platy layer is 80-11 nanometer.
Described top layer is the transparent material such as glass, lucite.Surface and its dust contact surface due to these structures
Amass and be obviously reduced, cause good dust-proof effect.
If the surface of these structures is modified through polymer or low-surface energy substance, such as CF3-CF2-CF2-..-R or
Person CH3-CH2-..R(R is functional group siloxanes Si-O-CH3 ,-OH or silane or COOH), then its surface is the most super-hydrophobic,
There is self-cleaning function.
Due to the porous of surface layer, the effective refractive index of its this layer, between 1. 2-1.3, has antireflecting function.
The specific practice of this structure is:
(1) select suitably containing soda-lime glass.
(2) surface organic solvent cleaner oil stain.
(3) the SiO2 layer at its surface one layer of 0.5-2 micron of deposition (deposits, as at 1-3x10 with meteorological chemical reaction method-5
Under the vacuum of torr, it is passed through N2O and SiH4 mixed gas and (is specifically shown in: Landheer, D. et al. Formation of
high-quality nitrided silicon dioxide films using electron-cyclotron
resonance chemical vapor deposition with nitrous oxide and silane. J.
Electrochem. Soc. 143, 1681–1684 (1996)。
(4) then pass to CF4 gas, under the operating pressure of 1-3x10-4 torr, add 500 to the negative bias of 600 volts to substrate
Pressure, carries out vacuum glow discharge, and reactive ion etching 10-60 minute rear surface forms nanostructured.
(5) surface etched hydrolyzes in water vapour removes the fluoride that surface is formed, and obtains super hydrophilic nanometer
Column structure, as shown in Figure 7.If modified (such as vacuum radio frequency magnetron sputtering deposition 50-200 nanometer thickness by low-surface energy substance
The politef of degree), super hydrophobic surface will be obtained.
(6) characterize: Static water contact angles: 156 degree, roll angle, 4 degree, it is seen that light transmission rate is increase by 1.5%.
(7) anti-dust performance: as shown in table 1.
The preparation of the dust-proof self-cleaning surface of embodiment 3 cone-shaped nano structure glass and performance thereof
(1) select suitable glass and clean clean.
(2) vacuum evaporation deposition Ni, Cr or Cu metal 40-70 nano thickness.
(3) 200-400 degree Celsius of sample of heating 10-30 minute in a vacuum.
(4) CF4 plasma etching is utilized: at 1-5x10-2Under the vacuum of torr, under the back bias voltage of 400-500 volt, discharge 5-
40 minutes.
(5) acid (nitric acid, sulphuric acid, hydrochloric acid etc.) is utilized to erode the metal fluoride on surface.
(6) obtain taper ultra-hydrophilic surface as shown in Figure 8, if its surface is carried out low-surface energy substance modification (as
The polytetrafluoroethylene film of vacuum radio frequency magnetron sputtering 20-70 nano thickness, or in the perfluor silane liquid of 1%, soak 10-
50 minutes) obtain super hydrophobic surface.The Static water contact angles on surface 155 degree, roll angle 3 degree；Visible light transmissivity increases by 1.2%
(averagely).
(7) anti-dust performance, is shown in Table 1.
Super hydrophilic nanometer paper-like porous surface and anti-dust performance thereof on example 4 glass
(1) cleaning surface, removes oil stain and spot, if by atmospheric plasma processes (such as: the SF-P-of generation peak, Nanjing science and technology
60L) better.
(2) glass being positioned over alkaline aqueous solution (NaOH, NH4OH, KOH), the concentration of its alkali liquor controls at 0.5-4.0
Mol/L, temperature is at 70-110 degree Celsius, and the time stood in 0.5 to 4 hours.
(3) naturally cool to room temperature, take out glass, wash with water.
(4) it is dried (room temperature or baking) surface, obtains the porous surface of flaky nanometer structure as shown in Figure 9, wherein,
The thickness of paper about 10-30 nanometer, empty size 5-70 nanometer.
(5) performance: it is average that the transmitance of the light of glass surface increases 4.0-7.0%(, two-sided corrosion)；Water static contact angle:
0 degree.
(6) anti-dust performance: be shown in Table 1.
Note: the surface angle amount of dust that dust quality is initial dispenser when zero degree.The weighing precision of it chessboard is 0.01
Gram.The non-particle mean size of dust 16 microns (D50) used, the Electronic Speculum pattern photo of concrete granule is shown in Figure 10, its granular size
Laser particle size analysis figure is shown in Figure 11.
Claims (12)
1. the self-cleaning surface structure of Nanometer dustproof, its top layer is porous nanometer structure layer, and thickness is less than 200 nanometers, and described hole is
Constituting by the granule of spacing d arrangement, dust particle diameter is set to D, and meets following condition:
Or substrate is s with the contact area of granule:
Here (being pi constant, can define effective contact surface is, apparent contact area isIt has dust-proof
Primary condition be:
(3).
The self-cleaning surface structure of Nanometer dustproof the most according to claim 1, it is characterised in that: described spacing d is that 5-100 receives
Rice.
The self-cleaning surface structure of Nanometer dustproof the most according to claim 1 and 2, it is characterised in that: described granule is spherical
Body, column, bullet or latticed.
The self-cleaning surface structure of Nanometer dustproof the most according to claim 3, it is characterised in that: the self-cleaning table of described Nanometer dustproof
The thickness of Rotating fields is less than 100 nanometers.
The self-cleaning surface structure of Nanometer dustproof the most according to claim 4, it is characterised in that: the self-cleaning table of described Nanometer dustproof
Rotating fields is super hydrophobic surface, and its static contact angle is more than 150 degree, and roll angle is less than 10 degree or ultra-hydrophilic surface, and it is static
Contact angle is less than 10 degree.
The self-cleaning surface structure of Nanometer dustproof the most according to claim 1 or 5, it is characterised in that: described Nanometer dustproof is certainly
Clean surface structure, in the case of the existence ignoring surface liquid, the coefficient of friction between them is m, then the dust particle of landingi
It must is fulfilled for condition:
Wherein, m is the quality of particle, and g is acceleration of gravity；
Because the effect of granule and contact surface is directly related with effective contact area, or
Here it is proportionality coefficient, so under given inclination angle, minimum dust-proof contact surface:
Due to generally, coefficient of friction m is less than 1, so minimum effectively contact area is proportional to for given material
The quality of grain, inclination angle；
Dust-proof efficiency h can be write as:
Wherein, N0It is the total number of deposited granule,It it is the number of particles resting on surface.
7. preparation method based on the organic silicon nano porous dust-proof super-hydrophobic coat self-cleaning surface structure of Nanometer dustproof, it includes:
(A) colloid of nanoporous coating is prepared: water intaking 4-6 part, ammonia 5-7 part, oxalic acid solution 8-12 part of 1 mole, ethanol
Or methanol 80-120 part stirs mixing, and it is heated to 40-70 degree Celsius, adds 6-10 part methyl trimethoxy base epoxide silicon
Alkane and tetraethyl orthosilicate 1-3 part, stir, and keep 40-70 degree Celsius stand 3-5 days, after naturally cool to room temperature；
(B) dispersion colloid: take out above-mentioned product 1 part, adds 3-6 part methanol, ethanol or isopropanol, and ultrasonic disperser disperses
10-40 minute；
(C) application: by scattered nanometer colloid, spraying or dip-coating after glass surface, natural drying in 100-300 degree temperature
Degree lower solidification 0.2-2 hour, takes out after cooling.
8. the preparation method of the nanoporous dust-proof super-hydrophobic coat self-cleaning surface structure of Nanometer dustproof with resin as bonding agent, it
Including:
(A) take 30 parts of ethanol, methanol or isopropanol, add 20 parts of butyl acetates, after stirring, be separately added into 6-10 part methyl
Trimethyl TMOS and 3-5 part tetraethyl orthosilicate, add ammonia 2-3 part of 1 mol/L, stir and keep 3-5 hour,
Add 2-7 part fluorocarbon resin and ammonia 10-15 part stirs, standing and reacting 2-7 days under 50 degree Celsius, obtain faint yellow
Gel；
(B) remove gel, add the ethanol dilution of 5-11 times, obtain super-hydrophobic colloid；
(C) application: can be sprayed by colloid, dip-coating or czochralski method form thin film at glass surface；At room temperature solidification 48 hours or
Person, 100-250 degree internal heating curing 30 minutes, obtains the porous super hydrophobic dust-proof coating self-cleaning surface structure of Nanometer dustproof.
9. the preparation method of the dust-proof super-hydrophilic coating self-cleaning surface structure of Nanometer dustproof based on nanoparticle, it includes:
(A) by 5-20 nano-titanium oxide 1 part and 5-20 nano tin dioxide 2 parts, ultrasonic disperser is utilized, according to 0.2-0.8wt%
Concentration be dispersed in methanol or ethanol, formed colloid solution；
(B) utilize brush or dip-coating, or spraying method by nanometer colloid even application in its surface；
(C) drying at room temperature 1-2 processes 10 to 30 minutes under individual hour or 100 degrees Celsius.
10. the preparation method of the self-cleaning surface structure of columnar nanometer porous surface structure Nanometer dustproof, it includes:
(1) select containing soda-lime glass；
(2) surface organic solvent cleans；
(3) on its surface with the SiO2 layer of meteorological chemical reaction method one layer of 0.5-2 micron of deposition；
(4) then pass to CF4 gas, under the operating pressure of 1-3x10-4 torr, add 500 to the back bias voltage of 600 volts to substrate, enter
Row vacuum glow discharge, after reactive ion etching 10-60 minute, surface forms nanostructured；
(5) surface etched hydrolyzes in water vapour removes the fluoride that surface is formed, and obtains super hydrophilic nanometer column
Structure, or modify by low-surface energy substance, it is thus achieved that super hydrophobic surface.
The preparation method of the 11. dust-proof self-cleaning surface structures of the dust-proof self-cleaning surface of cone-shaped nano structure glass, it includes:
(1) select suitable glass and clean clean；
(2) vacuum evaporation deposition Ni, Cr or Cu metal 40-70 nano thickness；
(3) 200-400 degree Celsius of sample of heating 10-30 minute in a vacuum；
(4) CF4 plasma etching is utilized: at 1-5x10-2Under the vacuum of torr, under the back bias voltage of 400-500 volt, electric discharge 5-40 divides
Clock；
(5) acid (nitric acid, sulphuric acid, hydrochloric acid etc.) is utilized to erode the metal fluoride on surface；
(6) obtain taper ultra-hydrophilic surface, or its surface is carried out low-surface energy substance modify obtain super hydrophobic surface.
The preparation method of the super hydrophilic dust-proof self-cleaning surface structure of nanometer paper-like porous surface on 12. glass, it includes:
(1) cleaning surface, removes oil stain and spot；
(2) glass being positioned over alkaline aqueous solution, the concentration of its alkali liquor controls in 0.5-4.0 mol/L, and temperature is taken the photograph at 70-110
Family name's degree, the time is standing in 0.5-4 hour；
(3) naturally cool to room temperature, take out glass, wash with water；
(4) it is dried surface.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108947265A (en) * | 2018-06-28 | 2018-12-07 | 广东南亮艺术玻璃科技股份有限公司 | A kind of self-cleaning liquid of glass and glass with clean and preparation method thereof |
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| WO2019205551A1 (en) * | 2018-04-23 | 2019-10-31 | Liu Feng | Self-cleaning coating, self-cleaning fiber, self-cleaning carpet and uses thereof |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102603051A (en) * | 2011-01-20 | 2012-07-25 | 唐世茂 | Method for photocatalysis of water by adopting nanometer porous titanium oxide film |
| CN103059617A (en) * | 2013-01-05 | 2013-04-24 | 江西安源光伏玻璃有限责任公司 | Preparation method for nanometer anti-reflection self-cleaning coating solution |
| CN104467648A (en) * | 2014-12-19 | 2015-03-25 | 江苏宇昊新能源科技有限公司 | Self-cleaning device of photovoltaic module |
-
2016
- 2016-06-16 CN CN201610425153.XA patent/CN106082692A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102603051A (en) * | 2011-01-20 | 2012-07-25 | 唐世茂 | Method for photocatalysis of water by adopting nanometer porous titanium oxide film |
| CN103059617A (en) * | 2013-01-05 | 2013-04-24 | 江西安源光伏玻璃有限责任公司 | Preparation method for nanometer anti-reflection self-cleaning coating solution |
| CN104467648A (en) * | 2014-12-19 | 2015-03-25 | 江苏宇昊新能源科技有限公司 | Self-cleaning device of photovoltaic module |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019205551A1 (en) * | 2018-04-23 | 2019-10-31 | Liu Feng | Self-cleaning coating, self-cleaning fiber, self-cleaning carpet and uses thereof |
| CN108947265A (en) * | 2018-06-28 | 2018-12-07 | 广东南亮艺术玻璃科技股份有限公司 | A kind of self-cleaning liquid of glass and glass with clean and preparation method thereof |
| CN108947265B (en) * | 2018-06-28 | 2021-06-01 | 广东南亮艺术玻璃科技股份有限公司 | Glass self-cleaning liquid, self-cleaning glass and preparation method thereof |
| CN110131202A (en) * | 2018-08-22 | 2019-08-16 | 广东美的制冷设备有限公司 | Wind wheel and air conditioner |
| CN109574510A (en) * | 2018-12-27 | 2019-04-05 | 河南豫科玻璃技术股份有限公司 | A kind of anti-dazzle (AG glass) nanoscale frosting powder particles etch process |
| CN113572417A (en) * | 2021-06-24 | 2021-10-29 | 东南大学 | Self-cleaning anti-icing composite surface device |
| CN114075042A (en) * | 2021-10-28 | 2022-02-22 | 中国民用航空飞行学院 | Method for constructing density-controllable bactericidal nano blade on glass surface |
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