CN106048512B - 一种离子渗氮及电弧离子镀制备dlc一体化复合方法 - Google Patents

一种离子渗氮及电弧离子镀制备dlc一体化复合方法 Download PDF

Info

Publication number
CN106048512B
CN106048512B CN201610521966.9A CN201610521966A CN106048512B CN 106048512 B CN106048512 B CN 106048512B CN 201610521966 A CN201610521966 A CN 201610521966A CN 106048512 B CN106048512 B CN 106048512B
Authority
CN
China
Prior art keywords
nitriding
coating
workpiece
ion plating
arc ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201610521966.9A
Other languages
English (en)
Other versions
CN106048512A (zh
Inventor
卢国英
石昌仑
石武昌
兰睿
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changzhou Quark Coating Technology Co Ltd
Original Assignee
Changzhou Quark Coating Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changzhou Quark Coating Technology Co Ltd filed Critical Changzhou Quark Coating Technology Co Ltd
Priority to CN201610521966.9A priority Critical patent/CN106048512B/zh
Publication of CN106048512A publication Critical patent/CN106048512A/zh
Application granted granted Critical
Publication of CN106048512B publication Critical patent/CN106048512B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C23C14/0611—Diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

本发明公开了一种离子渗氮及电弧离子镀制备DLC一体化复合方法。包括以下步骤：步骤S100：用多弧离子镀设备进行离子增强渗氮，渗氮时，气体压力选择0.5‑5pa，氮气流量20‑200sccm，灯丝电流为40‑60A，灯丝电源电压为20V‑100V,灯丝电源电流为10A‑50A，工件偏压为300‑1000V，根据渗氮层深度的需求，渗氮时间0.5‑5小时，渗氮深度为10‑50微米，显微硬度约为hv1000；步骤S200：渗氮结束后，直接在工件涂层，涂层时弧流30‑80A，工件偏压为0‑100V，根据厚度需求，涂层时间为20min‑100min,涂层厚度为0.5‑3微米。

Description

一种离子渗氮及电弧离子镀制备DLC一体化复合方法
技术领域
本发明涉及镀膜技术领域，尤其涉及一种离子渗氮及电弧离子镀制备DLC一体化复合方法。
背景技术
类金刚石薄膜(DLC)是一种介于石墨和金刚石之间的物质，兼具力金刚石和石墨的优良特性，其中金刚石的碳碳是以sp3键形式结合，而石墨的碳碳是以sp2键形式结合。sp3键含量越高，硬度越硬，越有力切削加工，但sp3含量越高，脆性越大，涂层结合力越差。电弧离子镀DLC涂层可以获得sp3含量很高的DLC，但结合力差是目前面临的主要问题。
发明内容
为了克服现有技术的结合力差的问题，本发明提供了一种离子渗氮及电弧离子镀制备DLC一体化复合方法。
为了达到上述目的，本发明提供的一种离子渗氮及电弧离子镀制备DLC一体化复合方法，包括以下步骤：步骤S100：用多弧离子镀设备进行离子增强渗氮，渗氮时，气体压力选择0.5-5Pa，氮气流量20-200sccm，灯丝电流为40-60A，灯丝电源电压为20V-100V,灯丝电源电流为10A-50A，工件偏压为300-1000V，根据渗氮层深度的需求，渗氮时间0.5-5小时，渗氮深度为10-50微米，显微硬度约为hv1000；步骤S200：渗氮结束后，直接在工件涂层，涂层时弧流30-80A，工件偏压为0-100V，根据厚度需求，涂层时间为20min-100min,涂层厚度为0.5-3微米，使处理过的工件硬度为hv4000，结合力为1级。
优选的，所述步骤100：用多弧离子镀设备进行离子增强渗氮，渗氮时，气体压力选择0.5、1或3Pa，氮气流量50sccm，氢气流量50sccm，灯丝电流为50A，灯丝电源电压为60V,灯丝电源电流为30A，工件偏压为400V，根据渗氮层深度的需求，渗氮时间4小时，渗氮深度为40微米，显微硬度为hv1000。
优选的，步骤S200：渗氮结束后，直接在工件涂层，涂层时弧流50A，工件偏压为20V，根据厚度需求，涂层时间为50min,涂层厚度为1微米，使处理过的工件硬度为hv4000，结合力为1级。
有益效果：采用此工艺后，涂层结合力有极大地提高；一体化处理方式可以节省整个工艺的流程时间。
附图说明
图1是涂层结合力标准(洛氏硬度计150Kg压力)。
图2是本实施例的涂层结合力检测结果。
具体实施方式
为使本发明解决的技术问题、采用的技术方案和达到的技术效果更加清楚，下面结合实施例对本发明作进一步的详细说明。可以理解的是，此处所描述的具体实施例仅仅用于解释本发明，而非对本发明的限定。另外还需要说明的是，为了便于描述，附图中仅示出了与本发明相关的部分而非全部内容。
本实施例的离子渗氮及电弧离子镀制备DLC一体化复合方法，步骤100：用多弧离子镀设备进行离子增强渗氮，渗氮时，气体压力选择0.5-5Pa，氮气流量20-200sccm，氢气流量20-200sccm，灯丝电流为40-60A，灯丝电源电压为20V-100V,灯丝电源电流为10A-50A，工件偏压为300-1000V，根据渗氮层深度的需求，渗氮时间0.5-5小时，渗氮深度为10-50微米，显微硬度约为hv1000；气体压力过高，灯丝电源电流波动会比较大，过低，又不容易激发出电子，同样氮气流量和氢气流量合适的配比和流量，更有利于渗氮的效果；而灯丝电源电压值和电流值选择60V、30A，能够激发出合适的电子量；我们认为气体压力2Pa，氮气流量为50sccm，氢气流量为50sccm,灯丝电流为50A，灯丝电源电压为60V，灯丝电源电流为30A，工件偏压为400V，渗氮时间4个小时，40微米的厚度，更有利于获得支撑DLC涂层的渗氮层。
步骤S200：渗氮结束后，直接在工件涂层，涂层时弧流30-80A，工件偏压为0-100V，根据厚度需求，涂层时间为20min-100min,涂层厚度为0.5-3微米，使处理过的工件硬度为hv4000，结合力为1级。参数的选择，最终的目的是选择合适的参数来保证结合力的情况下尽可能地提高涂层的厚度，从而延长工件的使用寿命。如果弧流过小，离子能量不够，而弧流过大，涂层表面的粗糙度会有所增加；偏压过低，离子能量不够，结合力较差，但偏压过高，涂层应力会随之增加，结合力也会下降；涂层时间决定涂层厚度，厚度过低，耐磨性不够，厚度过高，应力增大，结合力下降。所以我们认为，较为合理的参数选择应该为：其中弧流为50A，工件偏压为20V，时间为50min，厚度为1微米。
图1是涂层结合力标准，从左至右依次为：良好、较好、较差、很差。图2为本实施例的涂层结合力检测结果，可以看到为良好。
最后应说明的是：以上各实施例仅用以说明本发明的技术方案，而非对其限制；尽管参照前述各实施例对本发明进行了详细的说明，本领域的普通技术人员应当理解：其对前述各实施例所记载的技术方案进行修改，或者对其中部分或者全部技术特征进行等同替换，并不使相应技术方案的本质脱离本发明各实施例技术方案的范围。

Claims (3)

1.一种离子渗氮及电弧离子镀制备DLC一体化复合方法，包括以下步骤：
步骤S100：用多弧离子镀设备进行离子增强渗氮，渗氮时，气体压力选择0.5-5Pa，氮气流量20-200sccm，氢气流量20-200sccm，灯丝电流为40-60A，灯丝电源电压为20V-100V,灯丝电源电流为10A-50A，工件偏压为300-1000V，根据渗氮层深度的需求，渗氮时间0.5-5小时，渗氮深度为10-50微米，显微硬度为hv1000；
步骤S200：渗氮结束后，直接在工件涂层，涂层时弧流30-80A，工件偏压为0-100V，根据厚度需求，涂层时间为20min-100min,涂层厚度为0.5-3微米，使处理过的工件硬度为hv4000，结合力为1级。
2.根据权利要求1所述的一种离子渗氮及电弧离子镀制备DLC一体化复合方法，其特征在于，所述步骤S100：用多弧离子镀设备进行离子增强渗氮，渗氮时，气体压力选择0.5、1或3Pa，氮气流量50sccm，氢气流量50sccm，灯丝电流为50A，灯丝电源电压为60V,灯丝电源电流为30A，工件偏压为400V，根据渗氮层深度的需求，渗氮时间4小时，渗氮深度为40微米，显微硬度为hv1000。
3.根据权利要求1所述的一种离子渗氮及电弧离子镀制备DLC一体化复合方法，其特征在于，步骤S200：渗氮结束后，直接在工件涂层，涂层时弧流50A，工件偏压为20V，根据厚度需求，涂层时间为50min,涂层厚度为1微米，使处理过的工件硬度为hv4000，结合力为1级。
CN201610521966.9A 2016-07-05 2016-07-05 一种离子渗氮及电弧离子镀制备dlc一体化复合方法 Active CN106048512B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610521966.9A CN106048512B (zh) 2016-07-05 2016-07-05 一种离子渗氮及电弧离子镀制备dlc一体化复合方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610521966.9A CN106048512B (zh) 2016-07-05 2016-07-05 一种离子渗氮及电弧离子镀制备dlc一体化复合方法

Publications (2)

Publication Number Publication Date
CN106048512A CN106048512A (zh) 2016-10-26
CN106048512B true CN106048512B (zh) 2019-04-12

Family

ID=57200985

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610521966.9A Active CN106048512B (zh) 2016-07-05 2016-07-05 一种离子渗氮及电弧离子镀制备dlc一体化复合方法

Country Status (1)

Country Link
CN (1) CN106048512B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108165950A (zh) * 2017-05-09 2018-06-15 中国科学院兰州化学物理研究所 一种增强类富勒烯碳薄膜与钢基底结合力的方法
JP6533818B2 (ja) * 2017-10-20 2019-06-19 株式会社リケン 摺動部材およびピストンリング
CN111850483A (zh) * 2020-07-22 2020-10-30 常州夸克涂层科技有限公司 一种多层梯度硬质涂层及其制备工艺
CN113430485B (zh) * 2021-06-28 2022-09-20 哈尔滨工业大学 一种基于等离子体复合热扩渗制备减摩自润滑复合层的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1043961A (zh) * 1989-08-21 1990-07-18 机械电子工业部北京机械工业自动化研究所 磁控电弧离子镀膜法
CN104561909A (zh) * 2015-01-27 2015-04-29 大连理工常州研究院有限公司 一种离子渗氮及电弧离子镀膜的表面复合改性设备及方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4334723B2 (ja) * 2000-03-21 2009-09-30 新明和工業株式会社 イオンプレーティング成膜装置、及びイオンプレーティング成膜方法。

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1043961A (zh) * 1989-08-21 1990-07-18 机械电子工业部北京机械工业自动化研究所 磁控电弧离子镀膜法
CN104561909A (zh) * 2015-01-27 2015-04-29 大连理工常州研究院有限公司 一种离子渗氮及电弧离子镀膜的表面复合改性设备及方法

Also Published As

Publication number Publication date
CN106048512A (zh) 2016-10-26

Similar Documents

Publication Publication Date Title
CN106048512B (zh) 一种离子渗氮及电弧离子镀制备dlc一体化复合方法
CN103233219B (zh) 一种制备金属TiN陶瓷涂层的工艺方法
JP5476328B2 (ja) 燃料電池用金属分離板の製造方法
CN104561909A (zh) 一种离子渗氮及电弧离子镀膜的表面复合改性设备及方法
CN104561910A (zh) 一种等离子体增强制备精密涂层的电弧离子镀设备及方法
CN101787521A (zh) 一种金属硫化物类金刚石复合薄膜的制备方法
US10458548B2 (en) Piston ring and method for manufacturing same
JP4558549B2 (ja) 被覆部材の製造方法
JP2012504192A (ja) 合金被覆装置及びメタライディング方法
CN105349944A (zh) 氮化钛铬涂层及其双层辉光等离子渗制备方法
JPS596388A (ja) 炭化タングステンにより活性化された電極を造るための方法およびこの方法で造つた電極
CN102719788B (zh) 一种等离子全方位离子沉积设备
US20060112648A1 (en) Boron-doped diamond coating and diamond-coated tool
CN106978593A (zh) 一种顶面为钛掺杂类金刚石多层隔热厚膜的活塞及其制备方法和应用
JP5198114B2 (ja) アモルファス炭素成膜方法
CN102230208B (zh) 一种细长管件内腔镀铬专用阳极及其镀铬方法
CN204434722U (zh) 一种等离子体增强制备精密涂层的电弧离子镀设备
CN101768011A (zh) 抗腐蚀类金刚石薄膜的制备方法
CN106906443B (zh) 一种适用于钟表零件的透明耐磨膜制备方法
JP2011122226A (ja) 厚膜ｄｌｃ被覆部材およびその製造方法
CN109440057A (zh) 脉冲等离子体硼氮共渗工艺及设备
CN112281129B (zh) 一种烧结NdFeB磁体表面Ni-Cr耐蚀合金涂层的制备工艺
CN112901086A (zh) 一种耐冲蚀的复合铝合金钻杆及其制造工艺
CN101445906A (zh) 一种在钛及其合金表面制备铂涂层方法
CN109504996B (zh) 一种用于钢铁表面dlc复合氧化膜制备的阴极微弧氧化溶液和方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant