CN106009024A - Back film for silicon solar panel - Google Patents

Back film for silicon solar panel Download PDF

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CN106009024A
CN106009024A CN201610420054.2A CN201610420054A CN106009024A CN 106009024 A CN106009024 A CN 106009024A CN 201610420054 A CN201610420054 A CN 201610420054A CN 106009024 A CN106009024 A CN 106009024A
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graphene
back film
cellulose
solar energy
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傅兴琴
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Abstract

The invention provides a back film for a silicon solar panel. The back film is prepared from graphene, ammonium phosphate, sodium tetraborate, zinc oxide, silicon carbide, soybean lecithin, plant oil, titanium dioxide, glycerin, stearic acid, hydroxyl terminated polybutadiene, dimethylolpropionic acid, polyvinylidene fluoride, polymethyl methacrylate, tert-butoxystyrene, hexafluoropropylene, pentaerythritol stearate, maleic acid monomethyl ester, cellulose and a solvent. A preparation method includes the step that graphene is modified and then mixed with a composite system to prepare the back film. By adding the modified graphene into the back film composite system, mechanical properties, weather resistance and adhesion performance of the back film material can be improved.

Description

A kind of notacoria of silicon solar cell plate
Technical field
The invention belongs to technical field of solar, be specifically related to the notacoria of a kind of silicon solar cell plate.
Background technology
Solar cell backboard is to apply one of crucial encapsulating material on photovoltaic module, mainly by fluorine material and excellent the constituting of electric insulating quality of excellent in weather.Photovoltaic products uses in all conglomeraties because of advantages such as energy-saving and environmental protection, length in service life, it can be ensured that using 25 years, photoelectric conversion rate is not less than 80%, and wherein notacoria is to ensure that the key that component system photoelectric conversion rate is decayed.Solar battery back film is positioned at the outer layer of photovoltaic module, nucleus cell piece is made to accomplish that vacuum seals for intercepting air after cohering with EVA, and the top priority sealed is to accomplish that water resistance every, air barrier and electrically isolates, therefore high-quality solar cell notacoria should possess high electric insulating quality, high-weatherability, high-adhesion, low moisture permeability.
The solar cell of Ground Application works in an atmosphere, high humidity, corrosion-vulnerable, it is likely that damaged by the natural disaster such as dust storm, hail, and solar spectrum composition and irradiation intensity change greatly.Because particular/special requirement, notacoria needs good mechanical strength, electrology characteristic, good weatherability and uvioresistant performance.
Polyvinyl fluoride composite membrane commonly used by the backboard being currently used for solar module encapsulation; general conventional three-decker (PVF/PET/PVF); outer protective layer has good environment resistant erosiveness; intermediate layer is that mylar has good insulating properties, and internal layer needs surface treated and has good adhesive property.And compared with PVF, PVDF many fluorine atoms on molecular structure, its fluorinated volume is 59% much larger than the 41% of PVF, shows barrier finer and close than PVF, more preferable and more resistant to the feature waited.But PVDF processing difficulties, is difficult to obtain smooth surface, homogeneous thin film, poor and expensive with the adhesive property of other materials, have impact on the PVDF extensive application at thin film materials art.
Summary of the invention
It is an object of the invention to overcome the deficiencies in the prior art to provide notacoria of a kind of silicon solar cell plate and preparation method thereof, gained back membrane material has good mechanical property, weatherability and adhesive property.
A kind of notacoria of silicon solar cell plate, raw material includes in parts by weight: Graphene 5~10 parts, ammonium phosphate 0.8~3.2 parts, sodium tetraborate 0.2~1.5 parts, zinc oxide 0.5~2.3 parts, carborundum 0.4~1.5 parts, soybean lecithin 1~3 parts, vegetable oil 2~5 parts, titanium dioxide 4~9 parts, glycerol 3~7 parts, stearic acid 2~5 parts, polybutadiene diol 1~6 parts, dihydromethyl propionic acid 3~6 parts, Kynoar 10~20 parts, polymethyl methacrylate 10~20 parts, t-butyl styrene 1~5 parts, hexafluoropropene 0.4~2.5 parts, pentaerythritol stearate 0.1~0.8 part, monomethyl cis-butenedioic acid 0.4~1.5 parts, cellulose 2~4 parts, solvent 5~10 parts.
Further, described cellulose is hydroxypropyl methyl cellulose or hydroxyethyl cellulose.
Further, described solvent is N,N-DMAA.
The preparation method of the solar energy back film of described doped graphene, comprises the following steps:
Step 1, taking Graphene, ammonium phosphate, sodium tetraborate, zinc oxide, carborundum, soybean lecithin, vegetable oil mixing, mixture is at 1200~1250 DEG C of meltings 45~60 min, and melts puts into quenching-in water, again the block that quenching produces is pulverized, obtain modified graphene;
Step 2, by modified graphene, titanium dioxide, glycerol, stearic acid, polybutadiene diol, dihydromethyl propionic acid, Kynoar, polymethyl methacrylate mixing, ball milling, mixture is sent into twin-screw extrusion casting film-forming, is obtained base film;
Step 3, by t-butyl styrene, hexafluoropropene, pentaerythritol stearate, monomethyl cis-butenedioic acid, cellulose, dispersant, solvent mixing, ultrasonic disperse, obtains suspension;
Step 4, is heated to 90~110 DEG C by base film, keeps 15~30 min, the most at such a temperature, is applied on base film by suspension, is warming up to 120~140 DEG C, keeps 30~60 min, lets cool,.
Further, in step 1, the granularity of modified graphene is 400~800 μm.
Further, in step 2, the condition of twin-screw extrusion is 180~200 DEG C, 170~190rpm.
Further, in step 3, ultrasonic disperse condition is 30~50KHz, 20~30min.
Further, the coating layer thickness that in step 4, suspension is applied on base film is 2~4 μm.
The present invention, by adding modified graphene in notacoria compound system, can improve the mechanical property of back membrane material, weatherability, adhesive property.
Detailed description of the invention
Embodiment 1
A kind of notacoria of silicon solar cell plate, raw material includes in parts by weight: Graphene 5 parts, 0.8 part of ammonium phosphate, sodium tetraborate 0.2 part, zinc oxide 0.5 part, carborundum 0.4 part, soybean lecithin 1 part, vegetable oil 2 parts, titanium dioxide 4 parts, glycerol 3 parts, stearic acid 2 parts, polybutadiene diol 1 part, dihydromethyl propionic acid 3 parts, Kynoar 10 parts, polymethyl methacrylate 10 parts, t-butyl styrene 1 part, hexafluoropropene 0.4 part, pentaerythritol stearate 0.1 part, monomethyl cis-butenedioic acid 0.4 part, cellulose 2 parts, solvent 5 parts.
Wherein, described cellulose is hydroxypropyl methyl cellulose, and solvent is N,N-DMAA.
The preparation method of the solar energy back film of described doped graphene, comprises the following steps:
Step 1, takes Graphene, ammonium phosphate, sodium tetraborate, zinc oxide, carborundum, soybean lecithin, vegetable oil mixing, and mixture is at 1200 DEG C of melting 60 min, and melts puts into quenching-in water, then block quenching produced is pulverized, and obtains modified graphene;
Step 2, by modified graphene, titanium dioxide, glycerol, stearic acid, polybutadiene diol, dihydromethyl propionic acid, Kynoar, polymethyl methacrylate mixing, ball milling, mixture is sent into twin-screw extrusion casting film-forming, is obtained base film;
Step 3, by t-butyl styrene, hexafluoropropene, pentaerythritol stearate, monomethyl cis-butenedioic acid, cellulose, dispersant, solvent mixing, ultrasonic disperse, obtains suspension;
Step 4, is heated to 90 DEG C by base film, keeps 30min, the most at such a temperature, is applied on base film by suspension, is warming up to 120 DEG C, keep 60 min, let cool,.
Wherein, in step 1, the granularity of modified graphene is 400 μm;In step 2, the condition of twin-screw extrusion is 180 DEG C, 190rpm;In step 3, ultrasonic disperse condition is 30KHz, 30min;The coating layer thickness that in step 4, suspension is applied on base film is 2 μm.
Embodiment 2
A kind of notacoria of silicon solar cell plate, raw material includes in parts by weight: Graphene 8 parts, 1.4 parts of ammonium phosphate, sodium tetraborate 0.7 part, zinc oxide 0.9 part, carborundum 0.6 part, soybean lecithin 2 parts, vegetable oil 4 parts, titanium dioxide 8 parts, glycerol 5 parts, stearic acid 4 parts, polybutadiene diol 5 parts, dihydromethyl propionic acid 4 parts, Kynoar 13 parts, polymethyl methacrylate 18 parts, t-butyl styrene 4 parts, hexafluoropropene 0.9 part, pentaerythritol stearate 0.5 part, monomethyl cis-butenedioic acid 0.8 part, cellulose 3 parts, solvent 8 parts.
Wherein, described cellulose is hydroxypropyl methyl cellulose, and solvent is N,N-DMAA.
The preparation method of the solar energy back film of described doped graphene, comprises the following steps:
Step 1, takes Graphene, ammonium phosphate, sodium tetraborate, zinc oxide, carborundum, soybean lecithin, vegetable oil mixing, and mixture is at 1250 DEG C of melting 45 min, and melts puts into quenching-in water, then block quenching produced is pulverized, and obtains modified graphene;
Step 2, by modified graphene, titanium dioxide, glycerol, stearic acid, polybutadiene diol, dihydromethyl propionic acid, Kynoar, polymethyl methacrylate mixing, ball milling, mixture is sent into twin-screw extrusion casting film-forming, is obtained base film;
Step 3, by t-butyl styrene, hexafluoropropene, pentaerythritol stearate, monomethyl cis-butenedioic acid, cellulose, dispersant, solvent mixing, ultrasonic disperse, obtains suspension;
Step 4, is heated to 100 DEG C by base film, keeps 20min, the most at such a temperature, is applied on base film by suspension, is warming up to 130 DEG C, keeps 40min, lets cool,.
Wherein, in step 1, the granularity of modified graphene is 600 μm;In step 2, the condition of twin-screw extrusion is 190 DEG C, 180rpm;In step 3, ultrasonic disperse condition is 40KHz, 20min;The coating layer thickness that in step 4, suspension is applied on base film is 3 μm.
Embodiment 3
A kind of notacoria of silicon solar cell plate, raw material includes in parts by weight: Graphene 9 parts, 2 parts of ammonium phosphate, sodium tetraborate 1 part, zinc oxide 1.5 parts, carborundum 1.2 parts, soybean lecithin 2 parts, vegetable oil 3 parts, titanium dioxide 5 parts, glycerol 4 parts, stearic acid 4 parts, polybutadiene diol 5 parts, dihydromethyl propionic acid 4 parts, Kynoar 18 parts, polymethyl methacrylate 12 parts, t-butyl styrene 4 parts, hexafluoropropene 1.5 parts, pentaerythritol stearate 0.7 part, monomethyl cis-butenedioic acid 0.9 part, cellulose 3 parts, solvent 8 parts.
Wherein, described cellulose is hydroxypropyl methyl cellulose, and solvent is N,N-DMAA.
The preparation method of the solar energy back film of described doped graphene, comprises the following steps:
Step 1, takes Graphene, ammonium phosphate, sodium tetraborate, zinc oxide, carborundum, soybean lecithin, vegetable oil mixing, and mixture is at 1200 DEG C of melting 60 min, and melts puts into quenching-in water, then block quenching produced is pulverized, and obtains modified graphene;
Step 2, by modified graphene, titanium dioxide, glycerol, stearic acid, polybutadiene diol, dihydromethyl propionic acid, Kynoar, polymethyl methacrylate mixing, ball milling, mixture is sent into twin-screw extrusion casting film-forming, is obtained base film;
Step 3, by t-butyl styrene, hexafluoropropene, pentaerythritol stearate, monomethyl cis-butenedioic acid, cellulose, dispersant, solvent mixing, ultrasonic disperse, obtains suspension;
Step 4, is heated to 90 DEG C by base film, keeps 30min, the most at such a temperature, is applied on base film by suspension, is warming up to 120 DEG C, keep 60 min, let cool,.
Wherein, in step 1, the granularity of modified graphene is 400 μm;In step 2, the condition of twin-screw extrusion is 180 DEG C, 190rpm;In step 3, ultrasonic disperse condition is 30KHz, 30min;The coating layer thickness that in step 4, suspension is applied on base film is 2 μm.
Embodiment 4
A kind of notacoria of silicon solar cell plate, raw material includes in parts by weight: Graphene 10 parts, 3.2 parts of ammonium phosphate, sodium tetraborate 1.5 parts, zinc oxide 2.3 parts, carborundum 1.5 parts, soybean lecithin 3 parts, vegetable oil 5 parts, titanium dioxide 9 parts, glycerol 7 parts, stearic acid 5 parts, polybutadiene diol 6 parts, dihydromethyl propionic acid 6 parts, Kynoar 20 parts, polymethyl methacrylate 20 parts, t-butyl styrene 5 parts, hexafluoropropene 2.5 parts, pentaerythritol stearate 0.8 part, monomethyl cis-butenedioic acid 1.5 parts, cellulose 4 parts, solvent 10 parts.
Wherein, described cellulose is hydroxypropyl methyl cellulose, and solvent is N,N-DMAA.
The preparation method of the solar energy back film of described doped graphene, comprises the following steps:
Step 1, takes Graphene, ammonium phosphate, sodium tetraborate, zinc oxide, carborundum, soybean lecithin, vegetable oil mixing, and mixture is at 1250 DEG C of melting 45 min, and melts puts into quenching-in water, then block quenching produced is pulverized, and obtains modified graphene;
Step 2, by modified graphene, titanium dioxide, glycerol, stearic acid, polybutadiene diol, dihydromethyl propionic acid, Kynoar, polymethyl methacrylate mixing, ball milling, mixture is sent into twin-screw extrusion casting film-forming, is obtained base film;
Step 3, by t-butyl styrene, hexafluoropropene, pentaerythritol stearate, monomethyl cis-butenedioic acid, cellulose, dispersant, solvent mixing, ultrasonic disperse, obtains suspension;
Step 4, is heated to 110 DEG C by base film, keeps 15min, the most at such a temperature, is applied on base film by suspension, is warming up to 140 DEG C, keep 30 min, let cool,.
Wherein, in step 1, the granularity of modified graphene is 800 μm;In step 2, the condition of twin-screw extrusion is 200 DEG C, 170rpm;In step 3, ultrasonic disperse condition is 50KHz, 20min;The coating layer thickness that in step 4, suspension is applied on base film is 4 μm.
Embodiment 5
The present embodiment is with the difference of embodiment 2: notacoria raw material does not include zinc oxide.
Embodiment 6
The present embodiment is with the difference of embodiment 5: notacoria does not the most include cellulose.
Embodiment 1 to 6 gained notacoria is carried out performance test, and result is as follows:
As seen from the above table, the present invention, by adding modified graphene in notacoria compound system, can improve the mechanical property of back membrane material, weatherability, adhesive property.Knowable to embodiment 5, the addition of zinc oxide can improve the mechanical property of back membrane material, this is possibly due to zinc oxide can improve the dispersibility of Graphene, it is to avoid compound system produces defect;In embodiment 6, the membership that adds of cellulose affects the adhesion strength of back membrane material, and this surface group being possibly due to cellulose can make titanium dioxide uniformly dispersing in compound system, thus improves adhesive property.

Claims (8)

1. the notacoria of a silicon solar cell plate, it is characterized in that: raw material includes in parts by weight: Graphene 5~10 parts, ammonium phosphate 0.8~3.2 parts, sodium tetraborate 0.2~1.5 parts, zinc oxide 0.5~2.3 parts, carborundum 0.4~1.5 parts, soybean lecithin 1~3 parts, vegetable oil 2~5 parts, titanium dioxide 4~9 parts, glycerol 3~7 parts, stearic acid 2~5 parts, polybutadiene diol 1~6 parts, dihydromethyl propionic acid 3~6 parts, Kynoar 10~20 parts, polymethyl methacrylate 10~20 parts, t-butyl styrene 1~5 parts, hexafluoropropene 0.4~2.5 parts, pentaerythritol stearate 0.1~0.8 part, monomethyl cis-butenedioic acid 0.4~1.5 parts, cellulose 2~4 parts, solvent 5~10 parts.
The solar energy back film of doped graphene the most according to claim 1, it is characterised in that: described cellulose is hydroxypropyl methyl cellulose or hydroxyethyl cellulose.
The solar energy back film of doped graphene the most according to claim 1, it is characterised in that: described solvent is N,N-DMAA.
4. the preparation method of the solar energy back film of the doped graphene described in claim 1, it is characterised in that: comprise the following steps:
Step 1, taking Graphene, ammonium phosphate, sodium tetraborate, zinc oxide, carborundum, soybean lecithin, vegetable oil mixing, mixture is at 1200~1250 DEG C of meltings 45~60 min, and melts puts into quenching-in water, again the block that quenching produces is pulverized, obtain modified graphene;
Step 2, by modified graphene, titanium dioxide, glycerol, stearic acid, polybutadiene diol, dihydromethyl propionic acid, Kynoar, polymethyl methacrylate mixing, ball milling, mixture is sent into twin-screw extrusion casting film-forming, is obtained base film;
Step 3, by t-butyl styrene, hexafluoropropene, pentaerythritol stearate, monomethyl cis-butenedioic acid, cellulose, dispersant, solvent mixing, ultrasonic disperse, obtains suspension;
Step 4, is heated to 90~110 DEG C by base film, keeps 15~30 min, the most at such a temperature, is applied on base film by suspension, is warming up to 120~140 DEG C, keeps 30~60 min, lets cool,.
The preparation method of the solar energy back film of doped graphene the most according to claim 4, it is characterised in that: in step 1, the granularity of modified graphene is 400~800 μm.
The preparation method of the solar energy back film of doped graphene the most according to claim 4, it is characterised in that: in step 2, the condition of twin-screw extrusion is 180~200 DEG C, 170~190rpm.
The preparation method of the solar energy back film of doped graphene the most according to claim 4, it is characterised in that: in step 3, ultrasonic disperse condition is 30~50KHz, 20~30min.
The preparation method of the solar energy back film of doped graphene the most according to claim 4, it is characterised in that: the coating layer thickness that in step 4, suspension is applied on base film is 2~4 μm.
CN201610420054.2A 2016-06-15 2016-06-15 Back film for silicon solar panel Pending CN106009024A (en)

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