CN105935842B - 器件芯片的制造方法 - Google Patents
器件芯片的制造方法 Download PDFInfo
- Publication number
- CN105935842B CN105935842B CN201610110135.2A CN201610110135A CN105935842B CN 105935842 B CN105935842 B CN 105935842B CN 201610110135 A CN201610110135 A CN 201610110135A CN 105935842 B CN105935842 B CN 105935842B
- Authority
- CN
- China
- Prior art keywords
- modification layer
- chip
- device wafer
- modification
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 230000004048 modification Effects 0.000 claims abstract description 66
- 238000012986 modification Methods 0.000 claims abstract description 66
- 230000011218 segmentation Effects 0.000 claims abstract description 41
- 230000035699 permeability Effects 0.000 claims abstract description 4
- 238000005286 illumination Methods 0.000 claims abstract description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 38
- 125000004122 cyclic group Chemical group 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910017502 Nd:YVO4 Inorganic materials 0.000 description 1
- 208000037656 Respiratory Sounds Diseases 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Dicing (AREA)
- High Energy & Nuclear Physics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015-043601 | 2015-03-05 | ||
JP2015043601A JP6494334B2 (ja) | 2015-03-05 | 2015-03-05 | デバイスチップの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105935842A CN105935842A (zh) | 2016-09-14 |
CN105935842B true CN105935842B (zh) | 2019-08-16 |
Family
ID=56847355
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610110135.2A Active CN105935842B (zh) | 2015-03-05 | 2016-02-29 | 器件芯片的制造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6494334B2 (ja) |
KR (1) | KR102379114B1 (ja) |
CN (1) | CN105935842B (ja) |
TW (1) | TWI700735B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6745165B2 (ja) * | 2016-08-09 | 2020-08-26 | 株式会社ディスコ | ウェーハの加工方法 |
CN106328778B (zh) * | 2016-09-14 | 2019-03-08 | 中国科学院半导体研究所 | 隐形切割制备正、倒和倒梯形台状衬底的led芯片的方法 |
DE102016224978B4 (de) * | 2016-12-14 | 2022-12-29 | Disco Corporation | Substratbearbeitungsverfahren |
DE102017200631B4 (de) * | 2017-01-17 | 2022-12-29 | Disco Corporation | Verfahren zum Bearbeiten eines Substrats |
JP6821261B2 (ja) * | 2017-04-21 | 2021-01-27 | 株式会社ディスコ | 被加工物の加工方法 |
JP7007052B2 (ja) * | 2017-09-19 | 2022-01-24 | 株式会社ディスコ | ウェーハの加工方法 |
JP7148816B2 (ja) * | 2019-09-30 | 2022-10-06 | 日亜化学工業株式会社 | 発光素子の製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006245043A (ja) * | 2005-02-28 | 2006-09-14 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体素子の製造方法及び発光素子 |
CN101807647A (zh) * | 2010-03-19 | 2010-08-18 | 厦门市三安光电科技有限公司 | 具有倾斜侧面的铝镓铟磷系发光二极管的制作工艺 |
JP2013089714A (ja) * | 2011-10-17 | 2013-05-13 | Disco Abrasive Syst Ltd | チップ形成方法 |
CN103545409A (zh) * | 2012-07-11 | 2014-01-29 | 株式会社迪思科 | 光器件以及光器件的加工方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4408361B2 (ja) * | 2003-09-26 | 2010-02-03 | 株式会社ディスコ | ウエーハの分割方法 |
JP4385746B2 (ja) | 2003-11-28 | 2009-12-16 | 三菱化学株式会社 | 窒化物系半導体素子の製造方法 |
JP2007273743A (ja) | 2006-03-31 | 2007-10-18 | Kyocera Corp | 半導体基板のダイシング方法及び半導体基板 |
JP2009124077A (ja) * | 2007-11-19 | 2009-06-04 | Denso Corp | 半導体チップ及びその製造方法 |
JP2010073821A (ja) | 2008-09-17 | 2010-04-02 | Disco Abrasive Syst Ltd | ウェーハ分割方法 |
EP2402984B1 (en) * | 2009-02-25 | 2018-01-10 | Nichia Corporation | Method of manufacturing a semiconductor element, and corresponding semicondutor element |
JP5446325B2 (ja) * | 2009-03-03 | 2014-03-19 | 豊田合成株式会社 | レーザ加工方法および化合物半導体発光素子の製造方法 |
JP5361916B2 (ja) | 2011-02-04 | 2013-12-04 | 三星ダイヤモンド工業株式会社 | レーザスクライブ方法 |
TW201301557A (zh) * | 2011-06-17 | 2013-01-01 | Univ Nat Cheng Kung | 發光元件結構及其製造方法 |
-
2015
- 2015-03-05 JP JP2015043601A patent/JP6494334B2/ja active Active
-
2016
- 2016-02-02 TW TW105103299A patent/TWI700735B/zh active
- 2016-02-29 CN CN201610110135.2A patent/CN105935842B/zh active Active
- 2016-03-02 KR KR1020160025128A patent/KR102379114B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006245043A (ja) * | 2005-02-28 | 2006-09-14 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体素子の製造方法及び発光素子 |
CN101807647A (zh) * | 2010-03-19 | 2010-08-18 | 厦门市三安光电科技有限公司 | 具有倾斜侧面的铝镓铟磷系发光二极管的制作工艺 |
JP2013089714A (ja) * | 2011-10-17 | 2013-05-13 | Disco Abrasive Syst Ltd | チップ形成方法 |
CN103545409A (zh) * | 2012-07-11 | 2014-01-29 | 株式会社迪思科 | 光器件以及光器件的加工方法 |
Also Published As
Publication number | Publication date |
---|---|
TW201709290A (zh) | 2017-03-01 |
JP2016163016A (ja) | 2016-09-05 |
KR102379114B1 (ko) | 2022-03-25 |
TWI700735B (zh) | 2020-08-01 |
KR20160108183A (ko) | 2016-09-19 |
JP6494334B2 (ja) | 2019-04-03 |
CN105935842A (zh) | 2016-09-14 |
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