CN105911816A - Curable composition comprising quantum dot color, filter manufactured using thereof and image display device having the same - Google Patents

Curable composition comprising quantum dot color, filter manufactured using thereof and image display device having the same Download PDF

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Publication number
CN105911816A
CN105911816A CN201610102538.2A CN201610102538A CN105911816A CN 105911816 A CN105911816 A CN 105911816A CN 201610102538 A CN201610102538 A CN 201610102538A CN 105911816 A CN105911816 A CN 105911816A
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methyl
quantum dot
acid
compound
group
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王贤正
权凤壹
金胄皓
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F216/36—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by a ketonic radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

The objective of the invention is to provide a curable composition comprising quantum dot color, the quantum dot particles are uniformly distributed and has no the problems of reduced optical efficiency and bad sensitization feature in the making process of a color filter so as to make a good color filter. Besides, the objective of the invention is to provide a filter manufactured using thereof and an image display device having the same.

Description

The solidification compound comprising quantum dot, the color filter utilizing it to manufacture and image are aobvious Showing device
Technical field
The present invention relates to the solidification compound comprising quantum dot, the color filter utilizing it to manufacture and image display device.
Background technology
Color filter is can to extract 3 kinds of colors red, green, blue from white light and form fine pixel cell Thin film membranous type optics, the size of a pixel is tens of to hundreds of microns.Such color filter has: in order to by each Boundary member shading between pixel and the black matrix layer that formed by predetermined pattern on the transparent substrate and in order to form each pixel And the pixel portion configured in a predefined order by multiple colors (usually red (R), green (G) and blue (B)) 3 primary colors is successively The structure of stacking.It is said that in general, color filter can pass through staining, electrodeposition process, print process, pigment dispersion method etc. by 3 kinds with Upper color is coated on transparency carrier and manufactures, and recently, utilizes the pigment dispersion method of the photoresist of pigment-dispersing type to become Main flow.
It is by being repeated below a series of process and shape as a kind of pigment dispersion method in the method realizing color filter The method becoming coloured film: coloring agent will be comprised and comprise alkali soluble resins, photo polymerization monomer, Photoepolymerizationinitiater initiater, asphalt mixtures modified by epoxy resin Fat, solvent, the photosensitive polymer combination of other additives are coated on the transparent base being provided with black matrix", will be formed Form pattern exposure after, with solvent non-exposed position removed and carry out heat cure, its be applied to actively to manufacture mobile phone, The LCD of notebook computer, monitor, television set etc..In recent years, practical situation is for make use of the pigment with various advantage The color filter photosensitive polymer combination of dispersion method, does not require nothing more than the pattern properties of excellence, and requires high color reproduction rate And the performance that high brightness and high-contrast etc. further increase.
But, color reproduction is to realize from the light transmission color filter of light source irradiation, in this process, and a part for light Being colored device to absorb, therefore light efficiency reduces, additionally, due to as the pigment characteristics of color filter, thus Shortcomings is to reproduce The perfect such essence of color limits.
Additionally, Korean Patent Publication publication the 10-2013-0000506th discloses a kind of display device, it includes light source The display floater incident with the light from above-mentioned light source outgoing, above-mentioned display floater comprises multiple colour switching portion, above-mentioned color Multiple wavelength conversion particles that transformation component comprises the wavelength conversion making above-mentioned light and absorb predetermined wavelength band in above-mentioned light Multiple color filter particles of light.
But, although above-mentioned conventional art is similar in terms of comprising quantum dot, but contains for photosensitive polymer combination Amount does not illustrate, and only discloses and has high color reproduction rate and the display device of brightness, it is therefore necessary to photonasty tree Oil/fat composition carries out adding exploitation.
Prior art literature
Patent documentation
Patent documentation 1: Korean Patent Publication No. 10-2013-0000506 publication
Summary of the invention
Invent problem to be solved
It is an object of the invention to, it is provided that a kind of solidification compound comprising quantum dot, it makes quantum dot particles uniform Ground dispersion, and do not have light efficiency to reduce the problems such as bad with photobehavior in color filter manufacturing process such that it is able to manufacture Excellent color filter.
It is further an object that, it is provided that the colour filter manufactured by such solidification compound comprising quantum dot Device and the image display device comprising it.
For the method solving problem
To achieve these goals, the solidification compound comprising quantum dot of embodiments of the invention comprise binding agent and Quantum dot, above-mentioned binding agent comprises more than one in following chemical formula 1, chemical formula 2 and combinations thereof.
[chemical formula 1]
(in above-mentioned chemical formula 1,
R1Represent hydrogen or C1～C6 alkyl,
R2Represent oxygen ,-NH-orBase,
R3Represent C1～C30 alkylidene, C1～C30 alkylidene epoxide or C1～C30 ethyloxycarbonyl amino-ethyl,
R4Represent the group containing unsaturated double-bond.)
[chemical formula 2]
(in above-mentioned chemical formula 2,
R5～R6It is same to each other or different to each other independently of one another, and represents hydrogen or C1～C6 alkyl,
R7Represent oxygen ,-NH-orBase,
R8Represent C1～C30 alkylidene, C1～C30 alkylidene epoxide or C1～C30 ethyloxycarbonyl amino-ethyl,
R9Represent the group containing unsaturated double-bond,
X represents the value of 0 ＜ X ＜ 100.)
Invention effect
As it has been described above, the solidification compound comprising quantum dot of the present invention comprises the binding agent of specific compound, thus There is the effect of the high-quality color filter that can provide colorrendering quality and light characteristic excellence.
Additionally, the present invention has can provide the color filter and bag manufactured by the above-mentioned solidification compound comprising quantum dot Effect containing its image display device.
Detailed description of the invention
The solidification compound comprising quantum dot of the present invention comprises binding agent and quantum dot, and the feature of above-mentioned binding agent exists In following chemical formula 1 or chemical formula 2.
Additionally, about the solidification compound comprising quantum dot of the present invention, in addition to above-mentioned binding agent and quantum dot, In the case of being constituted with eurymeric, it is possible to contain adjacent naphthalene quinone di-azido compound, in the case of being constituted with minus, energy further Enough contain monomer or the oligomer with more than 1 ethylene unsaturated group further.As required, it is also possible to contain further Crosslinking dose of other compositions such as grade.Additionally, in the case of being constituted with above-mentioned eurymeric, it is possible to contain above-mentioned monomer, oligomeric further Thing or Photoepolymerizationinitiater initiater.
First, the solidification compound comprising quantum dot of the present invention can comprise the binding agent of chemical formula 1, and vitrification turns Temperature can be-20～250 DEG C.Now, binding agent is the copolymer with polymerism side chain.
[chemical formula 1]
In above-mentioned chemical formula 1,
R1Represent hydrogen or C1～C6 alkyl.It is highly preferred that R1It can be considered that it is film strength, elastic modelling quantity, viscoelasticity, heat-resisting Property, the glass transition temperature (Tg) of developability, polymer, dissolubility, synthesis fitness etc. and unrestricted choice.
R2Represent oxygen ,-NH-orBase.It is highly preferred that R2It can be considered that it is film strength, elastic modelling quantity, viscoelasticity, heat-resisting Property, developability, synthesis fitness, the glass transition temperature (Tg) of polymer, dissolubility etc. and unrestricted choice.
R3Represent C1～C30 alkylidene, C1～C30 alkylidene epoxide or C1～C30 ethyloxycarbonyl amino-ethyl.R3 It is preferably C1～C25 alkylidene, C1～C25 alkylidene epoxide or C1～C25 ethyloxycarbonyl amino-ethyl, further preferably For C1～C20 alkylidene, C1～C20 alkyl oxy or C1～C20 ethyloxycarbonyl amino-ethyl, particularly preferably methylene Base, ethylidene, propylidene, butylidene, ethyleneoxy group, diethylidene epoxide, triethylene epoxide, ethyloxycarbonyl amino Ethyl.These groups can have substituent group.Now, as above-mentioned R3Substituent group, preferably C1～C20 alkyl, wherein, more It is preferably C1～C15 alkyl, more preferably C1～C10 alkyl, particularly preferably C1～C7 alkyl.As above-mentioned replacement Base, specifically, it is contemplated that raw material and synthesis fitness etc., most preferably the propyl group of methyl, ethyl, side chain or straight chain, butyl, Amyl group, hexyl.Wherein, glass transition temperature (Tg) is made to reduce, therefore from preferred example sometimes due to alcohol system hydroxyl Get rid of.
R4Represent the group containing unsaturated double-bond.Specifically, preferably vinyl epoxide, pi-allyl epoxide, (first Base) acryloyl group epoxide, 4-ethenylphenyl epoxide, 4-vinyl phenylmethyl epoxide, vinyl ester group etc..Wherein, as R4, more preferably vinyl epoxide, pi-allyl epoxide, (methyl) acryloyl group epoxide, 4-vinyl phenylmethyl epoxide, ethylene Base ester group, particularly preferably pi-allyl epoxide, (methyl) acryloyl group epoxide, 4-vinyl phenylmethyl epoxide.
The glass transition temperature (Tg) of the binding agent of the present invention containing the construction unit represented by chemical formula 1 can profit Adjust with the molecular weight of binding agent self, molecular structure, hydrogen bond interaction etc., it may be considered that the glass of binding agent Glass transition temperature (Tg) and binding agent and the overall viscoelasticity etc. of the affinity of other compositions, system determine.Viscous In the case of the glass transition temperature (Tg) of mixture is too low, the thermostability of the pattern formed reduces, and produces heat flow so Problem.Additionally, the cementability also producing coated film increases, the problem such as workability reduction.Thus, the most preferably contain in binding agent There is alcohol system hydroxyl.Additionally, due to the hydrogen bond of alcohol system hydroxyl interacts more weak, the most from this viewpoint, in most cases Bigger effect cannot be played.
The glass transition temperature (Tg) of the binding agent of the present invention is preferably in the scope of-20～250 DEG C, further preferably It is in the scope of-15～250 DEG C, is particularly preferably in the scope of-10～250 DEG C.Additionally, the binding agent of the present invention can be with it His binding agent is also used.Additionally, carry out aftermentioned for binding agent other than the above.
The molecular weight of the binding agent of the present invention is weight average molecular weight, preferably 500～10,000,000Da (dalton (dalton): the unit of molecular weight), more preferably 1,000～5,000,000Da, particularly preferably 2,000～5,000, 000Da。
Composition as the binding agent together constituting with the present invention with the construction unit represented by chemical formula 1 (that is, is copolymerized into Point), as long as can (more than 2 yuan) copolymerization just be not particularly limited.
As above-mentioned copolymer composition, can enumerate such as Japanese Laid-Open Patent Publication 59-44615, Japanese Patent Publication 54-34327, Japanese Patent Publication 58-12577, Japanese Patent Publication 54-25957, Japanese Laid-Open Patent Publication 59-53836, Japanese Laid-Open Patent Publication 59- Methacrylic acid copolymer as described in the description of No. 71048 publications, acrylic copolymer, itaconic acid copolymerization Thing, crotonic acid-copolymers, maleic acid (acid anhydride) copolymer, partial esterification maleic acid, partial amides maleic acid The monomer of middle use, (methyl) esters of acrylic acid, (methyl) acrylic amide, there is the aromatic series hydrocarbon ring class of vinyl, have The heteroaromatic ring class of vinyl, maleic anhydride, itaconic acid esters .beta.-methylacrylic acid esters, (methyl) acrylonitrile, (methyl) Fructus Crotonis Nitrile, various phenylethylene, various vinyl benzoate esters, various vinyl acetate esters, VCz class, ethenyl pyrrolidone Ketone etc..
Among them, as above-mentioned copolymer composition, it is preferably (methyl) acrylic acid, C1～C25 (ring) alkyl (methyl) third Olefin(e) acid ester, C1～C25 have (methyl) acrylate of dicyclo, C1～C25 aralkyl (methyl) acrylate, C1～C25 virtue Base (methyl) acrylate, (methyl) acrylamide, C1～C25 be secondary or uncle's (ring) alkyl (methyl) acrylamide, C1～C25 tool There are (methyl) acrylamide of secondary or tertiary dicyclo, C1～C25 secondary or tertiary aralkyl (methyl) acrylamide, C1～C25 secondary or uncle Aryl (methyl) acrylamide, C1～C25 (methyl) acryloyl morpholine, have vinyl substituted or unsubstituted C1～ C25 aromatic series hydrocarbon ring, the substituted or unsubstituted carbon C1 with vinyl～C25 heteroaromatic ring, maleic anhydride, replacement or not Substituted C1～C25 (Alpha-Methyl-) styrene, vinyl imidazole, vinyl triazole, maleic anhydride, substituted or unsubstituted C1 ～C25 partial esterification maleic acid, substituted or unsubstituted C1～C25 partial amides maleic acid, (-)-methyl cis-2-pent-2'-enyl-3-oxocyclopentylacetate (Methyl Jasmonate), itaconic acid, C1～C25 itaconic acid (ring) Arrcostab, C1～C25 have dicyclo itaconate, C1～C25 itaconic acid aralkyl ester, C1～C25 itaconic acid aryl ester .beta.-methylacrylic acid, C1～C25 .beta.-methylacrylic acid (ring) Arrcostab, C1～ C25 has the crotonates of dicyclo, C1～C25 .beta.-methylacrylic acid aralkyl ester, C1～C25 .beta.-methylacrylic acid aryl ester, C1～C25 benzoic acid Vinyl esters, C1～C25 vinyl acetate esters, (methyl) acrylonitrile, (methyl) crotonic nitrile, C1～C25 VCz, ethylene Base ketopyrrolidine.
Among them, more preferably (methyl) acrylic acid, C1～C20 (ring) alkyl (methyl) acrylate, C1～C20 tool Have (methyl) acrylate of dicyclo, C1～C20 aralkyl (methyl) acrylate, C1～C20 aryl (methyl) acrylate, (methyl) acrylamide, C1～C20 be secondary or uncle's (ring) alkyl (methyl) acrylamide, C1～C20 have the (first of secondary or tertiary dicyclo Base) acrylamide, C1～C20 secondary or tertiary aralkyl (methyl) acrylamide, C1～C20 secondary or tertiary aryl (methyl) acryloyl Amine；C1～C20 (methyl) acryloyl morpholine, there is substituted or unsubstituted C1～the C20 aromatic series hydrocarbon ring of vinyl, have Substituted or unsubstituted C1～the C20 heteroaromatic ring of vinyl, maleic anhydride, substituted or unsubstituted C1～C20 part ester Change maleic acid, substituted or unsubstituted C1～C20 partial amides maleic acid, substituted or unsubstituted C1～C20 (α- Methyl-) phenylethylene, (-)-methyl cis-2-pent-2'-enyl-3-oxocyclopentylacetate, itaconic acid, C1～C20 itaconic acid (ring) Arrcostab, C1～C20 have the clothing of dicyclo Health acid esters, C1～C20 itaconic acid aralkyl ester, C1～C20 itaconic acid aryl ester .beta.-methylacrylic acid, C1～C20 .beta.-methylacrylic acid (ring) alkyl Ester, C1～C20 have the crotonates of dicyclo, C1～C20 .beta.-methylacrylic acid aralkyl ester, C1～C20 .beta.-methylacrylic acid aryl ester, C1～ C20 vinyl benzoate esters, C1～C20 vinyl acetate esters, C1～C20 VCz, vinyl pyrrolidone；(methyl) Acrylonitrile, (methyl) crotonic nitrile.
Additionally, among them, particularly preferably (methyl) acrylic acid, methyl (methyl) acrylate, ethyl (methyl) third Olefin(e) acid ester, propyl group (methyl) acrylate of straight or branched, butyl (methyl) acrylate of straight or branched, straight chain or Amyl group (methyl) acrylate of chain, n-hexyl (methyl) acrylate, cyclohexyl (methyl) acrylate, n-heptyl (methyl) Acrylate, 2-ethylhexyl (methyl) acrylate, n-octyl (methyl) acrylate, positive decyl (methyl) acrylate, Dodecyl (methyl) acrylate, adamantyl (methyl) acrylate, isobornyl (methyl) acrylate, isoborneol Alkane methyl (methyl) acrylate, norborene methyl (methyl) acrylate；Benzyl (methyl) acrylate, naphthyl methyl (methyl) acrylate, anthracene methyl (methyl) acrylate, phenylethyl (methyl) acrylate；Phenyl (methyl) acrylic acid Ester, naphthyl (methyl) acrylate, (methyl) acrylamide, (two) methyl (methyl) acrylamide, (two) ethyl (methyl) third Acrylamide, (two) propyl group (methyl) acrylamide of straight or branched, (two) butyl (methyl) acrylamide of straight or branched, (2) amyl group (methyl) acrylamide of straight or branched, (two) n-hexyl (methyl) acrylamide, (two) cyclohexyl (methyl) Acrylamide, (two-) 2-ethylhexyl (methyl) acrylamide；Adamantyl (methyl) acrylamide, positive adamantyl (first Base) acrylamide；Benzyl (methyl) acrylamide, naphtylethyl group (methyl) acrylamide, phenylethyl (methyl) acrylamide； (2) phenyl (methyl) acrylamide, naphthyl (methyl) acrylamide, (methyl) acryloyl morpholine, piperidyl acrylamide, Pyrrolidinyl acrylamide, (Alpha-Methyl) styrene, vinylpyridine, vinyl imidazole, vinyl triazole, maleic anhydride, jasmine Jasmine acid methyl ester；Itaconic acid；.beta.-methylacrylic acid, methyl crotonic acid esters, ethyl crotonic acid esters, the propyl group crotonates of straight or branched, straight The butyl crotonates of chain or side chain, the amyl group crotonates of straight or branched, n-hexyl crotonates, cyclohexyl .beta.-methylacrylic acid Ester, n-heptyl crotonates, 2-ethylhexyl crotonates, n-octyl crotonates, positive decyl crotonates, dodecyl Crotonates；Adamantyl crotonates, isobornyl crotonates, isoborneol alkane methyl crotonic acid esters, norborene methyl Crotonates；Benzyl crotonates, naphthyl methyl crotonates, anthracene methyl crotonic acid esters, phenylethyl crotonates；Phenyl bar Bean acid esters, naphthyl crotonates, vinyl benzoate, vinyl acetate, VCz, vinyl pyrrolidone etc..
Additionally, above-mentioned carboxyl may be from slaine.
As above-mentioned substituent group, preferably C1～C20 alkyl, C1～C20 alkoxyl, C1～C20 aralkyl, C1～C20 Aryl, C1～C20 acyloxy, C1～C20 acyl group, C1～C20 alkoxy carbonyl, C1～C20 aryl carbonyl, C1～C20 bis- Alkyl amino, C1～C20 alkyl amino, halogen atom, cyano group, furyl, furfuryl group, tetrahydrofuran base, tetrahydrofurfuryl, alkane sulfur Base, trimethyl silyl, trifluoromethyl, carboxyl, thienyl, morpholino base, morpholino base carbonyl etc..
Among them, as above-mentioned substituent group, more preferably C1～C15 alkyl, C1～C15 alkoxyl, C1～C15 aralkyl Base, C1～C15 aryl, C1～C15 acyloxy, C1～C15 acyl group, C1～C15 alkoxy carbonyl, C1～C15 aryl carbonyl, C1～C15 dialkyl amido, C1～C15 alkyl amino, halogen atom, cyano group, furyl, furfuryl group, tetrahydrofuran base, tetrahydrochysene bran Base, alkylthio group, trimethyl silyl, trifluoromethyl, carboxyl, thienyl, morpholino base, morpholino base carbonyl etc..
Additionally, as above-mentioned substituent group, particularly preferably methyl, ethyl, the propyl group of straight or branched, straight or branched Butyl, the amyl group of straight or branched, n-hexyl, cyclohexyl, n-heptyl, 2-ethylhexyl, n-octyl, positive decyl, n-dodecane Base, methyl epoxide, ethyl epoxide, the propyl group epoxide of straight or branched, the butyl epoxide of straight or branched, the penta of straight or branched Base epoxide, n-hexyl epoxide, cyclohexyl epoxide, n-heptyl epoxide, 2-ethylhexyl epoxide, n-octyl epoxide, positive decyl epoxide, Dodecyl epoxide, benzyl, phenethyl, naphthyl methyl, naphtylethyl group, phenyl, naphthyl, methyl carbonyl epoxide, ethylcarbonyl group Epoxide, the propyl group carbonyl epoxide of straight or branched, the butyl carbonyl epoxide of straight or branched, the pentylcarbonyl oxygen of straight or branched Base, n-hexylcarbonyl epoxide, cyclohexyl-carbonyl epoxide, n-heptyl carbonyl epoxide, 2-ethylhexyl carbonyl epoxide, n-octyl carbonyl Epoxide, positive decyl carbonyl epoxide, dodecyl carbonyl epoxide, methyl carbonyl (acetyl group), ethylcarbonyl group, straight or branched Propyl group carbonyl, the butyl carbonyl of straight or branched, the pentylcarbonyl of straight or branched, n-hexylcarbonyl, cyclohexyl-carbonyl, positive heptan Base carbonyl, 2-ethylhexyl carbonyl, n-octyl carbonyl, positive decyl carbonyl, dodecyl carbonyl, methyloxycarbonyl, ethyl Epoxide carbonyl, the propyloxycarbonyl group of straight or branched, the butyl epoxide carbonyl of straight or branched, the amyl group oxygen of straight or branched Base carbonyl, n-hexyl epoxide carbonyl, cyclohexyl epoxide carbonyl, n-heptyl epoxide carbonyl, 2-ethylhexyl epoxide carbonyl, n-octyl Epoxide carbonyl, positive decyloxycarbonyl, dodecyl epoxide carbonyl, benzoyl, naphthyl carbonyl；(2) methylamino, (2) ethylamino, (two) propylcarbamic of straight or branched, (two) butylamino of straight or branched, straight or branched (2) pentyl amino, (two) n-hexyl amino, (two) Cyclohexylamino, (two) n-heptyl amino, (two) 2-ethylhexylamino； Fluorine atom, chlorine atom, bromine atoms；Cyano group, furyl, furfuryl group, tetrahydrofuran base, tetrahydrofurfuryl, alkylthio group, trimethyl silyl Base, trifluoromethyl, carboxyl, thienyl, morpholino base, morpholino base carbonyl etc..
Additionally, these substituent groups can be further substituted with by above-mentioned substituent group.Wherein, glass is made sometimes due to alcohol system hydroxyl Change transition temperature (Tg) to reduce, therefore get rid of from the example of preferred substituent group.
Additionally, (methyl) acrylonitrile, (methyl) crotonic nitrile can be as the examples of particularly preferred copolymer composition (comonomer) Son and enumerate.
As above-mentioned copolymer composition, as other, there is hydrophilic monomer, containing phosphoric acid, phosphate ester, quaternary ammonium salt, sub-second The monomer etc. of base epoxide chain, propylidene epoxide chain, sulfonic acid and salt, morpholino base ethyl etc. is useful.
Above-mentioned sulfonic group, carboxylic acid group may be from slaine.
In the adhesive of this invention, the kind of the monomer of copolymerization, quantity are not particularly limited, preferably 1～12 kind, more It is preferably 1～8 kind, particularly preferably 1～5 kind.
Hereinafter, binding agent concrete of the form of the chemical formula 1 of the present invention is represented with chemical formula 1-1～chemical formula 1-24 Example, but the invention is not restricted to this.
[chemical formula 1-1]
Glass transition temperature (Tg)=120 DEG C
[chemical formula 1-2]
Glass transition temperature (Tg)=130 DEG C
[chemical formula 1-3]
Glass transition temperature (Tg)=160 DEG C
[chemical formula 1-4]
Glass transition temperature (Tg)=160 DEG C
[chemical formula 1-5]
Glass transition temperature (Tg)=135 DEG C
[chemical formula 1-6]
Glass transition temperature (Tg)=150 DEG C
[chemical formula 1-7]
Glass transition temperature (Tg)=-1.3 DEG C
[chemical formula 1-8]
Glass transition temperature (Tg)=-19.3 DEG C
[chemical formula 1-9]
Glass transition temperature (Tg)=120 DEG C
[chemical formula 1-10]
Glass transition temperature (Tg)=130 DEG C
[chemical formula 1-11]
Glass transition temperature (Tg)=140 DEG C
[chemical formula 1-12]
Glass transition temperature (Tg)=140 DEG C
[chemical formula 1-13]
Glass transition temperature (Tg)=160 DEG C
[chemical formula 1-14]
Glass transition temperature (Tg)=130 DEG C
[chemical formula 1-15]
Glass transition temperature (Tg)=140 DEG C
[chemical formula 1-16]
Glass transition temperature (Tg)=140 DEG C
[chemical formula 1-17]
Glass transition temperature (Tg)=150 DEG C
[chemical formula 1-18]
Glass transition temperature (Tg)=140 DEG C
[chemical formula 1-19]
Glass transition temperature (Tg)=130 DEG C
[chemical formula 1-20]
Glass transition temperature (Tg)=120 DEG C
[chemical formula 1-21]
Glass transition temperature (Tg)=120 DEG C
[chemical formula 1-22]
Glass transition temperature (Tg)=130 DEG C
[chemical formula 1-23]
Glass transition temperature (Tg)=160 DEG C
[chemical formula 1-24]
Glass transition temperature (Tg)=120 DEG C
It follows that the solidification compound comprising quantum dot of the present invention can comprise the binding agent of chemical formula 2, vitrification Transition temperature can be-20～250 DEG C.
By containing the compound represented by chemical formula 2, it is possible to increase curable when light (ray) irradiates, it is possible to formed The pattern that curing degree is high.Therefore, it is high-resolution, and by producing in playing from POB operation on the surface of quantum dot The effect of blocking group of impact of free radical, it is possible to the light characteristic that performance is excellent.
[chemical formula 2]
In chemical formula 2, R5And R6It is same to each other or different to each other independently of one another, and represents hydrogen or C1-C6 alkyl.
R7Represent oxygen ,-NH-orBase.
R8Represent C1-C30 alkylidene, C1-C30 alkylidene epoxide or C1-C30 ethyloxycarbonyl amino-ethyl.
Above-mentioned R8Among represented alkylidene, alkylidene epoxide and ethyloxycarbonyl amino-ethyl, it is preferably all C1 ～the group of the group of C25, more preferably C1～C20, particularly preferred methylene, ethylidene, propylidene, butylidene, ethylidene Epoxide, diethylidene epoxide, triethylene epoxide, ethyloxycarbonyl amino-ethyl.These groups can have substituent group.Make For above-mentioned R8Substituent group, preferably C1～C20 alkyl or OH base, wherein, more preferably C1～C15 alkyl or OH base, enter one Step is preferably C1～C10 alkyl or OH base, particularly preferably C1～C7 alkyl or OH base.Wherein, it is contemplated that raw material and synthesis are suitable Conjunction property etc., the most preferably propyl group of methyl, ethyl, side chain or straight chain, butyl, amyl group, hexyl, OH base.
R9Represent the group containing unsaturated double-bond.
Above-mentioned R9Represent the group containing unsaturated double-bond, be preferably selected from by vinyl epoxide, pi-allyl epoxide, (first Base) acryloyl group epoxide, 4-ethenylphenyl epoxide, 4-vinyl phenylmethyl epoxide, styryl, vinyl ester group and second Group in the group that thiazolinyl ether is formed.Wherein, more preferably vinyl epoxide, pi-allyl epoxide, (methyl) acryloyl group Epoxide, 4-vinyl phenylmethyl epoxide, vinyl ester group, particularly preferably pi-allyl epoxide, (methyl) acryloyl group epoxide, 4-vinyl phenylmethyl epoxide.
Above-mentioned X represents the value of 0 ＜ X ＜ 100.It is highly preferred that X is it can be considered that film strength, elastic modelling quantity, viscoelasticity, resistance to Hot, synthesis fitness, the glass transition temperature (Tg) of polymer, dissolubility, developability, synthesis fitness, the development of film Property, the interaction strength of concentration and quantum dot and other compositions etc. of developer solution and suitably select.Wherein, X be preferably 5～ The value of 95, the value of more preferably 10～90, the value of particularly preferably 15～85.
As the molecular weight of the compound represented by above-mentioned chemical formula 2, with Weight-average molecular gauge, preferably 500～10, 000,000Da (dalton: molecular weight unit), more preferably 100～5,000,000Da, particularly preferably 2,000～5,000, 000Da。
Above-mentioned binding agent is especially preferably water solublity or alkali solubility.Here, alkali solubility refers to, dissolve in following alkalescence chemical combination The aqueous solution of thing or there is aqueous solution molten of blended any organic solvent and this alkali compounds with water Liquid.
Hereinafter, enumerate the concrete example of compound represented by above-mentioned chemical formula 2, but the invention is not restricted to this.
Comprise the binding agent of compound represented by above-mentioned chemical formula 1 or chemical formula 2 relative to the solidification comprising quantum dot Property compositions all solids composition (quality) be preferably 10～90 mass %, more preferably 15～80 mass %.
If the content of above-mentioned binding agent is less than above-mentioned scope, the then raising of the curing degree caused by the irradiation of light (ray) Effect is insufficient, makes the effect such as the developability fall in the residual film ratio of thermostability, resolution and solidified portion, uncured portion sometimes Low.Additionally, if it exceeds above-mentioned scope, then the content of other compositions excessively reduces, developability, coloring etc. is made to be subject to sometimes Damage.
The hardening resin composition of the present invention comprises luminescence generated by light quantum dot particles.
So-called quantum dot is the semiconductor substance of nano-scale.Atom forms molecule, the such little molecule of molecular composition bunch Aggregation and form nanoparticle.When such nanoparticle is particular with characteristic of semiconductor, it is referred to as quantum dot.When When quantum dot obtains energy from outside and becomes excited state, the energy meeting corresponding energy bandgaps can be discharged voluntarily.
The solidification compound of the present invention comprises such luminescence generated by light quantum dot particles, and the color filter being produced from can The luminescence (luminescence generated by light) by the irradiation of light.In the normal image display device including color filter, white light passes through colour filter Device and apparent color, in this process, a part for light is colored device and absorbs, thus light efficiency reduces.But, comprising by this In the case of the color filter that the solidification compound of invention manufactures, color filter is self-luminescence by the light of light source, it is thus possible to The light efficiency that performance is excellent.Additionally, due to release has coloured light, therefore colorrendering quality is excellent, and owing to passing through light Photoluminescence discharges light to whole directions, therefore can also improve visual angle.
As long as the quantum dot particles of the present invention can by the stimulation of light the quantum dot particles of luminescence, just not especially Limit, it is possible to choosing freely such as II-VI group semiconducting compound；III-V semiconductor compound；Group IV-VI quasiconductor chemical combination Thing；IV race element or comprise its compound；The group formed with combinations thereof.They can be used alone or mix 2 kinds Used above.Above-mentioned II-VI group semiconducting compound can select the group that freely following material is formed: select free CdS, CdSe, Was Used compound in the group that CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe and their mixture are formed, Select free CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, In the group that CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe and their mixture are formed three Element compound, and select free CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, Four element compounds in the group that HgZnSeTe, HgZnSTe and their mixture are formed；Above-mentioned Group III-V semiconductor Compound can select the group that freely following material is formed: select free GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, Was Used compound in the group that InN, InP, InAs, InSb and their mixture are formed, select free GaNP, GaNAs, GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、 Three element compounds in the group that GaAlNP and their mixture are formed, and select free GaAlNAs, GaAlNSb, GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、 Four element compounds in the group that InAlNSb, InAlPAs, InAlPSb and their mixture are formed；Above-mentioned group IV-VI half Conductor compound can select the group that freely following material is formed: select free SnS, SnSe, SnTe, PbS, PbSe, PbTe and it The group that formed of mixture in Was Used compound, select free SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, Three element compounds in the group that PbSTe, SnPbS, SnPbSe, SnPbTe and their mixture are formed, and choosing is freely Four element compounds in the group that SnPbSSe, SnPbSeTe, SnPbSTe and their mixture are formed；Above-mentioned IV race element Or the compound comprising it can select the group that following material is formed: select free Si, Ge and their mixture to be formed Group in element compound, and select the Was Used compound in the group that free SiC, SiGe and their mixture formed.
Quantum dot particles can be homogenizing (homogeneous) single structure, nucleocapsid (core-shell), gradient (gradient) dual structure such as structure, or their mixed structure.In nucleocapsid (core-shell) dual structure, formed each The material of individual core (core) and shell (shell) can be formed by the above-mentioned semiconducting compound different from each other mentioned.Such as, on State nuclear energy enough comprise choosing free CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS and ZnO formed Group in more than one materials, but be not limited to this.Above-mentioned shell can comprise choosing free CdSe, ZnSe, ZnS, ZnTe, CdTe, More than one materials in the group that PbS, TiO, SrSe and HgSe are formed, but it is not limited to this.It is generally used for what color filter manufactured Photosensitive composition, for apparent color, can comprise redness, green, blue colorant, identical with this, photic Light quanta point particle can also be divided into red quantum point particle, green quantum dot particles and blue quantum dot particles, the present invention's Quantum dot particles can be red quantum point particle, green quantum dot particles or blue quantum dot particles.
Quantum dot particles can pass through wet chemical processes (wet chemical process), organometallic chemistry deposition Technique or molecular beam epitaxial process synthesis.Wet chemical processes is to add precursor substance to organic solvent and make the side of particle growth Method.When crystalline growth, organic solvent is coordinated in the surface of quantum dot crystallization naturally to play the effect of dispersant, thus adjusts The growth that nodule is brilliant, therefore deposits (MOCVD, metal organic chemical vapor with organometallic chemistry Deposition), the vapour deposition process such as molecular beam epitaxy (MBE, molecular beam epitaxy) is compared, it is possible to by more Add easy and cheap technique to control the growth of nanoparticle.
The content of the quantum dot particles of the present invention is not particularly limited, such as at the solid constituent of photosensitive polymer combination Gross weight in, preferably comprise with 3～80 weight %, more preferably comprise with 5～70 weight %.If above-mentioned quantum dot particles Content is less than above-mentioned scope, then luminous efficiency is the most weak, if it exceeds above-mentioned scope, then there is the content of other compositions the most not The problem being difficult to enough form pattern of pixels.
The solidification compound comprising quantum dot of the present invention can comprise further can be with above-mentioned chemical formula 1 or chemistry Other binding agents of compound represented by formula 2.
As other binding agents, as long as being just not particularly limited for alkali solubility, preferably from thermostability, developability, acquired Etc. aspect select.
As above-mentioned alkali-soluble binder, preferably line style organic high molecular polymer, is solvable the most in organic solvent Property, it is possible to the material of development in weak base aqueous solution.As such line style organic high molecular polymer, it is possible to use side chain has There are the polymer of carboxylic acid, such as Japanese Laid-Open Patent Publication 59-44615, Japanese Patent Publication 54-34327, Japanese Patent Publication 58- No. 12577, Japanese Patent Publication 54-25957, Japanese Laid-Open Patent Publication 59-53836, in Japanese Laid-Open Patent Publication 59-71048 publication The methacrylic acid copolymer of record, acrylic copolymer, itaconic acid copolymer, crotonic acid-copolymers, maleic acid, portion Divide esterification maleic acid etc.；Side chain has the acid cellulose derivant of carboxylic acid.
In addition, anhydride is made and the material etc. of the polymer addition with hydroxyl, polycarboxylated styrene system resin, poly-silicon Oxygen methane series resin, poly-(2-hydroxyethyl (methyl) acrylate), polyvinyl pyrrolidone, poly(ethylene oxide), polyvinyl alcohol Deng the most useful.
Additionally, in the 1st mode, can usefully use by the construction unit represented by above-mentioned chemical formula 1 and constitute this The binding agent that the composition (that is, copolymer composition) of the binding agent of invention is formed.
In addition it is also possible to be the material by having hydrophilic monomer copolymerization, such as alkoxyalkyl (first can be enumerated Base) acrylate, hydroxy alkyl (methyl) acrylate, glycerol (methyl) acrylate, (methyl) acrylamide, N-methylol Acrylamide, secondary or tertiary alkyl acrylamide, dialkyl aminoalkyl (methyl) acrylate, morpholine (methyl) acrylate, NVP, N-caprolactam, vinyl imidazole, vinyl triazole, methyl (methyl) acrylate, second Butyl (methyl) acrylic acid of propyl group (methyl) acrylate, side chain or the straight chain of base (methyl) acrylate, side chain or straight chain Ester, phenoxy group hydroxypropyl (methyl) acrylate etc., other contain tetrahydrofurfuryl, phosphoric acid, phosphate ester, quaternary ammonium salt, ethyl oxygen Base chain, propylidene epoxide chain, sulfonic acid and the monomer etc. of salt, morpholino base ethyl etc. thereof.
In the 1st mode, glass transition temperature (Tg) place of the material containing the construction unit represented by chemical formula 1 In the scope of-20～250 DEG C, with other binding agents of the binding agent of the present invention can be with desired scope maintenance system Viscoelasticity, glass transition temperature (Tg) time can also contain alcohol system hydroxyl.
Additionally, in the present invention, from the viewpoint of improving cross-linking efficiency, can have polymerizable group at side chain, It is also useful that side chain has the polymer etc. of pi-allyl, (methyl) acrylic, pi-allyl epoxide alkyl etc..As at side chain There is the example of the polymer of polymerizable group, KS RESIST-106 (Osaka Organic Chemical Industry Co., Ltd.'s system can be enumerated Product), CYCLOMER P series (DAICEL chemical industry Co., Ltd. goods) etc..
Additionally, from improve further solidification by film strength from the viewpoint of, alcohol soluble nylon, 2,2-is double-(4-hydroxy benzenes Base) polyethers etc. of-propane and chloropropylene oxide is also useful.
Among these various binding agents, from the viewpoint of thermostability, preferably polycarboxylated styrene system resin, Polysiloxane series resin, acrylic resin, acrylamide resin, acrylic acid/acrylamide copolymer resin, aobvious from controlling From the viewpoint of shadow, preferably acrylic resin, acrylamide resin, acrylic acid/acrylamide copolymer resin.This Outward, in the case of used along with the binding agent of the 1st viewpoint, it is preferably by the construction unit represented by chemical formula 1 and structure The composition (that is, copolymer composition) becoming macromolecular compound forms binding agent.
It is resin as aforesaid propylene acid, is preferably by selected from benzyl (methyl) acrylate, (methyl) acrylic acid, hydroxyl (Osaka has for the copolymer of the monomer formation of ethyl (methyl) acrylate, (methyl) acrylamide etc. and KS RESIST-106 Chemical machine Industrial Co., Ltd goods), CYCLOMER P series etc..
Additionally, alkali solubility phenolic resin is also useful.As above-mentioned alkali solubility phenolic resin, such as phenolic aldehyde can be enumerated clear Coating resins or polyvinyl etc..
As above-mentioned novolac resin, can enumerate obtained by such as phenols and aldehydes be condensed in the presence of acid catalyst Material.As phenols, such as phenol, cresol, ethyl-phenol, butylphenol, xylenols, phenylphenol, adjacent benzene two can be enumerated Phenol, resorcinol, pyrogallol, naphthols, bisphenol-A etc..These phenols can be used alone or be condensed two or more and use.As Aldehydes, can enumerate such as formaldehyde, paraformaldehyde, acetaldehyde, propionic aldehyde, benzaldehyde etc..
As the concrete example of above-mentioned novolac resin, metacresol, paracresol or their mixture and Fu Er can be enumerated The condensation product of Malin.These novolac resins can use the methods such as separation to carry out the distribution of Molecular regulator amount.In addition, it is possible to Mix with above-mentioned novolac resin bisphenol-c or bisphenol-A etc. being had the low molecular weight compositions of phenolic hydroxyl group.
As other binding agents above-mentioned weight average molecular weight (with GPC method measure polystyrene conversion value), preferably 500 ～10,000,000Da (dalton: molecular weight unit), more preferably 1,000～5,000,000Da, particularly preferably 2,000 ～5,000,000Da.
Additionally, other binding agents above-mentioned be can with the binding agent of the present invention and with and the material that uses, only using this In the case of the binding agent of invention just can give full play to performance, it is also possible to do not use.
Additionally, in the situation by the binding agent represented by the chemical formula 1 of the present invention or chemical formula 2 with other binding agents Under, other binding agents above-mentioned usage amount in the solidification compound comprising quantum dot of the present invention is relative in compositions All solids composition is preferably 0～90 mass %, more preferably 0～80 mass %, particularly preferably 0～70 mass %.
The solidification compound comprising quantum dot of the present invention can comprise cross-linking agent further, so as to more Gao Ling Sensitivity obtains the film of solidification.
As the cross-linking agent that can use in the present invention, just do not have as long as carry out the material of film solidification by cross-linking reaction Limit especially, be such as selected from epoxy resin (a), methylol (b), alkoxy methyl and acyloxy methyl can be enumerated Plant the substituted melamine compound of above substituent group, guanidine amines, glycoluril compounds or carbamide compound, be selected from methylol More than the a kind substituted oxybenzene compound of substituent group, naphthol compound or hydroxyl in (c), alkoxy methyl and acyloxy methyl Base anthracene compound.Wherein, preferably polyfunctional epoxy resin.
As above-mentioned cross-linking agent (a), there is epoxy radicals and there is the material of bridging property, for example, it is possible to be bisphenol-A Diglycidyl ether, Ethylene glycol diglycidyl ether, butanediol diglycidyl ether, hexanediol diglycidyl ether, dihydroxy Xenyl diglycidyl ether, o-phthalic acid diglycidyl ester, N, N-diglycidylaniline etc. is sweet containing 2 yuan of shrinks The low molecular compound of oil base, shrinks sweet with trihydroxymethylpropanyltri diglycidyl ether, tri hydroxy methyl phenol three under same mode The low molecular compound containing 3 yuan of glycidyls that oil ether, TrisP-PA triglycidyl ether etc. are representative, under same mode With tetramethylolmethane four glycidyl ether, tetra methylol bisphenol-A four glycidyl ether etc. as representative containing 4 yuan of glycidyls Low molecular compound, under same mode, dipentaerythritol five glycidyl ether, dipentaerythritol six glycidyl ether etc. contain The low molecular compound of polynary glycidyl, with poly epihydric alcohol base (methyl) acrylate, 2, double (the hydroxymethyl)-1-of 2- The producing high-molecular containing glycidyl that 1,2-epoxy-4-(2-Oxyranyle) the hexamethylene addition product of butanol etc. are representative Compound etc..
As the methylol contained by above-mentioned cross-linking agent (b), alkoxy methyl, the replacement quantity of acyloxy methyl, In the case of melamine compound, be 2～6, in the case of glycoluril compounds, guanidine amines, carbamide compound, be 2～ 4, in the case of melamine compound, preferably 5～6, in glycoluril compounds, guanidine amines, the situation of carbamide compound Under, preferably 3～4.
Hereinafter, the melamine compound of above-mentioned cross-linking agent (b), guanidine amines, glycoluril compounds and carbamide compound one As be referred to as (containing methylol, alkoxy methyl or the acyloxy methyl) compound about cross-linking agent (b).
The above-mentioned compound containing methylol about cross-linking agent (b) can by will about cross-linking agent (b) containing alkane The compound of epoxide methyl heats in alcohol, in the presence of the acid catalysts such as hydrochloric acid, sulphuric acid, nitric acid, Loprazolam and obtains. The above-mentioned compound containing acyloxy methyl about cross-linking agent (b) can by will about cross-linking agent (b) containing hydroxyl first The compound of base obtains with acid chloride mix and blend in the presence of base catalyst.
Hereinafter, the concrete example of the compound about cross-linking agent (b) with above-mentioned substituent group is enumerated.
As above-mentioned melamine compound, such as hexakis(hydroxymethyl)melamine, hexamethoxy methyl melamine can be enumerated Amine, hexakis(hydroxymethyl)melamine methylol in 1～5 by methoxymethylated compound or its mixture, hexakis-methoxy Base ethyl tripolycyanamide, six acyloxy methyl melamines, hexakis(hydroxymethyl)melamine methylol in 1～5 by acyl The methylated compound of base epoxide or its mixture etc..
As above-mentioned guanidine amines, such as tetra methylol guanamines, tetramethoxymethyl guanamines, tetra methylol guanidine can be enumerated 1～3 methylol of amine is by methoxymethylated compound or its mixture, tetramethoxy ethyl guanamines, four acyloxy Methyl guanamines, tetra methylol guanamines 1～3 methylol by the methylated compound of acyloxy or its mixture etc..
As above-mentioned glycoluril compounds, such as tetramethylol glycoluril, tetramethoxymethylglycoluril, tetra methylol can be enumerated sweet In the methylol of urea 1～3 by methoxymethylated compound or its mixture, tetramethylol glycoluril methylol in 1～3 by the methylated compound of acyloxy or its mixture etc..
As above-mentioned carbamide compound, can enumerate such as tatramethylol urea, tetramethoxymethyl urea, the 1 of tatramethylol urea～3 Individual methylol is by methoxymethylated compound or its mixture, tetramethoxy ethyl carbamide etc..
These may be used alone, can also be used in combination about the compound of cross-linking agent (b).Above-mentioned cross-linking agent (c) is i.e. The substituted oxybenzene compound of more than one groups that is selected from methylol, alkoxy methyl and acyloxy methyl, naphthols Compound or hydroxyl anthracene compound are identical with the situation of above-mentioned cross-linking agent (b) is that suppression is cladded with by heat cross-linking (overcoat) mixing (intermixing) of photoresist, and improve the material of film-strength further.Hereinafter, have Time by these compounds be commonly referred to as about cross-linking agent (c) containing methylol, alkoxy methyl or the change of acyloxy methyl Compound.
As the methylol contained by above-mentioned cross-linking agent (c), acyloxy methyl or the quantity of alkoxy methyl, every 1 point Son minimum needs 2, from the viewpoint of heat cross-linking and storage stability, preferably as 2 of oxybenzene compound of skeleton, 4 compounds being all replaced.Additionally, as skeleton naphthol compound, hydroxyl anthracene compound it is also preferred that the ortho position of OH base, The compound that para-position is all replaced.3 of above-mentioned oxybenzene compound or 5 can be unsubstituted, it is possible to have substituent group. In above-mentioned naphthol compound, in addition to the ortho position of OH base, it can be unsubstituted, it is possible to have substituent group.
The above-mentioned compound containing methylol about cross-linking agent (c) can be by being hydrogen by 2 of phenol OH base or 4 The compound of atom is used as raw material, and makes it urge in alkalescence such as sodium hydroxide, potassium hydroxide, ammonia, tetra-alkyl ammonium hydroxides React with formalin in the presence of agent and obtain.
The above-mentioned compound containing alkoxy methyl about cross-linking agent (c) can pass through will containing about cross-linking agent (c) The compound having methylol heats in alcohol, in the presence of the acid catalysts such as hydrochloric acid, sulphuric acid, nitric acid, Loprazolam and obtains.
The above-mentioned compound containing acyloxy methyl about cross-linking agent (c) can pass through will be about cross-linking agent (c) Compound containing methylol reacts with acid chloride in the presence of base catalyst and obtains.
As the framework compound in cross-linking agent (c), ortho position or the para-position that can enumerate phenol OH base are unsubstituted phenol Compound, naphthols, hydroxyl anthracene compound etc., it is, for example possible to use the Isomers of phenol, cresol, 2,3-xylenols, 2,5- Xylenols, DMP, 3, the bisphenols such as 5-xylenols, bisphenol-A, 4,4 '-bis-xenols, TrisPPA (Honshu Chemical industry Co., Ltd. goods), naphthols, dihydroxy naphthlene, 2,7-dihydroxy-anthracene etc..
As the concrete example of above-mentioned cross-linking agent (c), as oxybenzene compound, for example, it is possible to be tri hydroxy methyl phenol, three (methoxy) phenol, tri hydroxy methyl phenol 1～2 methylol by methoxymethylated compound, trihydroxy methyl-3- Cresol, three (methoxy)-3-cresol, trihydroxy methyl-3-cresol 1～2 methylol by methoxymethylated chemical combination Dihydroxymethyl cresol, tetra methylol bisphenol-A, tetramethoxymethyl bisphenol-A, the tetra methylols such as thing, 2,6-dihydroxymethyl-4-cresol 1～3 methylol of bisphenol-A is by methoxymethylated compound, tetra methylol-4,4 '-bis-xenols, tetramethoxy first Base-4,4 '-bis-xenols, the hexamethylol body of TrisP-PA, the hexamethoxy methyl body of TrisP-PA, the six of TrisP-PA 1～5 methylol of methylol body is by methoxymethylated compound, double hydroxymethyl naphthalene glycol etc..
Additionally, as hydroxyl anthracene compound, can enumerate such as 1,6-bishydroxymethyl-2,7-dihydroxy-anthracene etc., as containing There is the compound of acyloxy methyl, part or all of methylol of the most above-mentioned compound containing methylol can be enumerated By the methylated compound of acyloxy etc..
As the preferred compound in these compounds, can be tri hydroxy methyl phenol, double hydroxymethyl paracresol, four hydroxyls The hexamethylol body of methyl bisphenol A, TrisP-PA (Honshu Chemical Ind's goods) or their methylol are by alcoxyl The substituted oxybenzene compound of both ylmethyl and methylol and alkoxy methyl.
These may be used alone, can also be used in combination about the compound of cross-linking agent (c).
In the present invention, it is not necessary to certain containing above-mentioned cross-linking agent.Containing sometimes, cross-linking agent (a)～(c) are comprising quantum dot Solidification compound in whole content different because of the difference of material, relative to the solid constituent of above-mentioned solidification compound (quality), preferably 0～70 weight %, more preferably 0～50 weight %, most preferably 0～30 weight %.
The solidification compound comprising quantum dot of the present invention can comprise that to have more than 1 ethylene unsaturated further The monomer of group or oligomer.
As monomer or the oligomer with more than 1 ethylene unsaturated group, it is however preferred to have more than 1 can add Compound that become the ethylene double bond being polymerized, that there are under normal pressure more than 100 DEG C boiling points.By with Photoepolymerizationinitiater initiater described later Contain Deng together, it is possible to constituted the solidification compound comprising quantum dot of the present invention with minus, additionally, solid from improving further From the viewpoint of the property changed, can contain in the solidification compound comprising eurymeric quantum dot.
As its example, polyethyleneglycol (methyl) acrylate, polypropylene glycol list (methyl) acrylate, benzene can be enumerated The acrylate of simple function, the methacrylates such as epoxide ethyl (methyl) acrylate；Polyethylene Glycol two (methyl) acrylic acid Ester, trimethylolethane trimethacrylate (methyl) acrylate, neopentyl glycol two (methyl) acrylate, tetramethylolmethane three (methyl) propylene Acid esters, tetramethylolmethane four (methyl) acrylate, dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) third Olefin(e) acid ester, hexanediol (methyl) acrylate, trimethylolpropane tris (acryloyl group epoxide propyl group) ether, three (acryloyl group oxygen Base ethyl) isocyanuric acid ester, glycerol, trimethylolethane etc. make (first after oxirane, expoxy propane and polyfunctional alcohol's addition Base) material of acroleic acid esterification, Japanese Patent Publication 48-41708, Japanese Patent Publication 50-6034, Japanese Laid-Open Patent Publication 51- Urethane acrylate class described in No. 37193 each publications, Japanese Laid-Open Patent Publication 48-64183, Japanese Patent Publication 49- No. 43191, polyester acrylic esters described in No. 52-30490 each publication of Japanese Patent Publication, as epoxy resin and (methyl) Polyfunctional acrylic ester, methacrylate and their mixing such as the Epoxy Acrylates of acrylic acid reaction product Thing.Additionally, Japan's then association's will Vol.20 can be enumerated, in page 300～308 of No.7 as photo-curable monomer and oligomer And the material introduced.
The solidification compound comprising quantum dot of the present invention can comprise Photoepolymerizationinitiater initiater further.
About Photoepolymerizationinitiater initiater, in the case of the solidification compound containing dyestuff being constituted the present invention with minus, Together can contain with above-mentioned monomer etc., additionally, in the case of being constituted with eurymeric, can contain as required.Gather as light Close initiator, as long as the material of above-mentioned monomer or oligomer polymerization can be made just to be not particularly limited, preferably from characteristic, initiation The viewpoints such as efficiency, absorbing wavelength, acquired, expense are set out and are selected.
As above-mentioned Photoepolymerizationinitiater initiater, it is selected from halogenated methylDiazole compounds and halogenated methyl s-triazine More than one active halogen compounds, 3-aryl-substituted coumarin compound in compound, cough up fen dimer, benzophenone Compound, acetophenone compound and derivant thereof, cyclopentadiene-benzene-iron complex and salt, oxime compound etc..
As halogenated methylThe active halogen compound of diazole compounds, remembers for Japanese Patent Publication 57-6096 publication 2-halogenated methyl-5-vinyl-the 1,3,4-carriedDiazole compounds etc., 2-trichloromethyl-5-styryl-1,3,4- Diazole, 2-trichloromethyl-5-(to cyano styrene base)-1,3,4-Diazole, 2-trichloromethyl-5-are (to methoxy styrene Base)-1,3,4-Diazole etc..
As the active halogen compound of halogenated methyl s-triazine based compound, for Japanese Patent Publication 59-1281 publication Described in vinyl halogenated methyl s-triazine, 2-(naphthalene-1-described in Japanese Laid-Open Patent Publication 53-133428 publication Base)-4,6-double halogenated methyl s-triazine and 4-(p-aminophenyl)-2,6-dihalomethyl s-triazine etc..
Specifically, have 2, double (the trichloromethyl)-6-of 4-to methoxyl-styrene s-triazine, 2, double (three chloromethanes of 6- Base)-4-(3,4-methylenedioxyphenyl base)-1,3,5-triazine, double (the trichloromethyl)-4-(4-methoxyphenyl)-1 of 2,6-, 3,5-triazine, 2,4-double (trichloromethyl)-6-(1-is to dimethylaminophenyl-1,3-butadienyl) s-triazine, 2-tri-chloromethane Base-4-amino 6-is to methoxyl-styrene s-triazine, 2-(naphthalene-1-base)-4,6-pair-trichloromethyl s-triazine, 2-(4-methoxy Base-naphthalene-1-base)-4,6-is double-and trichloromethyl s-triazine, 2-(4-ethyoxyl-naphthalene-1-base)-4,6-be double-trichloromethyl s-triazine, 2-(4-butoxy-naphthalene-1-base)-4,6-couple-trichloromethyl s-triazine, 2-(4-(2-methoxy ethyl)-naphthalene-1-base)-4,6- Double-trichloromethyl s-triazine, 2-(4-(2-ethoxyethyl group)-naphthalene-1-base)-4,6-couple-trichloromethyl s-triazine, 2-(4-(2- Butoxyethyl group)-naphthalene-1-base)-4,6-pair-trichloromethyl s-triazine, double-three chloromethanes of 2-(2-methoxyl group-naphthalene-1-base)-4,6- Base s-triazine, 2-(6-methoxyl group-5-methyl-naphthalene-2-base)-4,6-couple-trichloromethyl s-triazine, 2-(6-methoxynaphthalene-2- Base)-4,6-couple-trichloromethyl s-triazine, 2-(5-methoxyl group-naphthalene-1-base)-4,6-couple-trichloromethyl s-triazine, 2-(4,7- Dimethoxy-naphthalene-1-base)-4,6-pair-trichloromethyl s-triazine, 2-(6-ethyoxyl-naphthalene-2-base)-4,6-pair-trichloromethyl S-triazine, 2-(4,5-dimethoxy-naphthalene-1-base)-4,6-be double-and trichloromethyl s-triazine, 4-is (to N, N-bis-(ethoxy carbonyl Methyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-(adjacent methyl-to N, N-bis-(ethoxy carbonyl methyl) amino Phenyl)-2,6-two (trichloromethyl) s-triazine, 4-(to N, N-bis-(chloroethyl) aminophenyl)-2,6-two (trichloromethyl) be equal Triazine, 4-(adjacent methyl-to N, N-bis-(chloroethyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-are (to N-chloroethyl Aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-(to N-ethoxycarbonylmethylamino phenyl)-2,6-two (three chloromethanes Base) s-triazine, 4-(to N, N-bis-(phenyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-is (to N-chloroethyl carbonyl Aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-(to N-(p-methoxyphenyl) carbonylamino phenyl)-2,6-two (three Chloromethyl) s-triazine, 4-(N, N-bis-(ethoxy carbonyl methyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4- (bromo-to N, N-bis-(ethoxy carbonyl methyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-are (chloro-to N, N- Two (ethoxy carbonyl methyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-be (fluoro-to N, N-bis-(ethyoxyl carbonyl Ylmethyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-be (adjacent bromo-to N, N-bis-(ethoxy carbonyl methyl) amino Phenyl)-2,6-two (trichloromethyl) s-triazine, 4-(adjacent chloro-to N, N-bis-(ethoxy carbonyl methyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-(adjacent fluoro-to N, N-bis-(ethoxy carbonyl methyl) aminophenyl)-2,6-two (trichloromethyl) are equal Triazine, 4-(adjacent bromo-to N, N-bis-(chloroethyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-are (adjacent chloro-to N, N- Two (chloroethyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-(adjacent fluoro-to N, N-bis-(chloroethyl) aminophenyl)- 2,6-bis-(trichloromethyl) s-triazine, 4-(bromo-to N, N-bis-(chloroethyl) aminophenyl)-2,6-two (trichloromethyl) equal three Piperazine, 4-(chloro-to N, N-bis-(chloroethyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-are (fluoro-to N-bis-(chlorine Ethyl) aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-(bromo-to N-ethoxycarbonylmethylamino phenyl)-2, 6-bis-(trichloromethyl) s-triazine, 4-(chloro-to N-ethoxycarbonylmethylamino phenyl)-2,6-two (trichloromethyl) equal three Piperazine, 4-(fluoro-to N-ethoxycarbonylmethylamino phenyl)-2,6-two (trichloromethyl) s-triazine, 4-are (adjacent bromo-to N-second Epoxide carbonvlmethyl aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-be (adjacent chloro-to N-ethoxycarbonylmethylamino benzene Base)-2,6-two (trichloromethyl) s-triazine, 4-(adjacent fluoro-to N-ethoxycarbonylmethylamino phenyl)-2,6-two (three chloromethanes Base) s-triazine, 4-(bromo-to N-chloroethyl amino phenyl)-2,6-two (trichloromethyl) s-triazine, 4-be (chloro-to N-chloroethene Base aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-(fluoro-to N-chloroethyl amino phenyl)-2,6-two (three chloromethanes Base) s-triazine, 4-(adjacent bromo-to N-chloroethyl amino phenyl)-2,6-two (trichloromethyl) s-triazine, 4-be (adjacent chloro-to N-chloroethene Base aminophenyl)-2,6-two (trichloromethyl) s-triazine, 4-(adjacent fluoro-to N-chloroethyl amino phenyl)-2,6-two (three chloromethanes Base) s-triazine etc..
In addition, it is possible to usefully use Midori KCC TAZ series (such as, TAZ-107, TAZ-110, TAZ-104, TAZ-109, TAZ-140, TAZ-204, TAZ-113, TAZ-123), the T of PANCHIM company series (such as, T-OMS, T-BMP, T-R, T-B), Ciba-Geigy company IRGACURE series (such as, IRGACURE651, IRGACURE184、IRGACURE500、IRGACURE1000、IRGACURE149、IRGACURE819、IRGACURE261)、 Darocur series (such as, Darocur1173), 4,4 '-bis-(diethylamino)-benzophenone, 2-(o-benzoyl base oxime)- 1-[4-(phenylsulfartyl) phenyl]-1,2-acetyl caproyl, 2-benzyl-2-dimethylamino-4-morpholino base butyrophenone, 2,2-diformazan Epoxide-2-phenyl acetophenone, 2-(Chloro-O-Phenyl)-4,5-diphenyl-imidazole base dimer, 2-(adjacent fluorophenyl)-4,5-diphenyl Imidazole radicals dimer, 2-(o-methoxyphenyl)-4,5-diphenyl-imidazole base dimer, 2-(p-methoxyphenyl)-4,5-two Phenylimidazole base dimer, 2-(paradimethoxybenzene base)-4,5-diphenyl-imidazole base dimer, 2-(2,4-dimethoxy benzene Base)-4,5-diphenyl-imidazole base dimer, 2-(to methyl mercapto phenyl)-4,5-diphenyl-imidazole base dimer, benzoin be different Propyl ether etc..
In these Photoepolymerizationinitiater initiaters, it is possible to and with sensitizer, light stabilizer.
As its concrete example, benzoin, benzoin methylether, 9-Fluorenone, the chloro-9-Fluorenone of 2-, 2-methyl-9-fluorenes can be enumerated Ketone, 9-anthrone, 2-bromo-9-anthrone, 2-ethyl-9-anthrone, 9,10-anthraquinone, 2-ethyl-9,10-anthraquinone, the 2-tert-butyl group-9,10- Anthraquinone, 2,6-bis-chloro-9,10-anthraquinone, xanthone (xanthone), 2-methyl xanthone, 2-methoxyl group xanthone, 2- Ethyoxyl xanthone, sulfur for xanthone, 2,4-diethyl sulfide for xanthone, acridone, 10-butyl-2-chloro-acridine ketone, Diphenylthanedione, two benzylideneacetones, to (dimethylamino) styryl phenyl base ketone, to (dimethylamino) phenyl-to first Base Styryl Ketone, benzophenone, to (dimethylamino) benzophenone (or Michler's keton), to (diethylamino) hexichol first Benzothiazole based compound described in ketone, benzanthrone etc., Japanese Patent Publication 51-48516 publication etc., TINUVIN1130, TINUVIN400 etc..
In the solidification compound comprising quantum dot of the present invention, can be used it in addition to foregoing photo-polymerization initiator Initiator known in him.
Specifically, U.S. Patent No. 2 can be enumerated, the vicinal polyacetals ketone group disclosed in 367, No. 660 description (vicinal polyketaldonyl) compound, U.S. Patent No. 2,367,661 and U.S. Patent No. 2,367,670 are said Acyloin ether disclosed in alpha-carbonyl compound disclosed in bright book, No. 2,448,828 description of U.S. Patent No., U.S. Patent No. The aromatic series acyloin com replaced by α-hydrocarbon disclosed in No. 2,722,512 description, U.S. Patent No. 3,046,127 and In multinuclear naphtoquinone compounds disclosed in No. 2,951,758 description of U.S. Patent No., No. 3,549,367 description of U.S. Patent No. Disclosed in disclosed the triallyl imidazole dimer/combination of p-aminophenyl ketone, Japanese Patent Publication 51-48516 publication Benzothiazole based compound/trihalomethyl group s-triazine based compound etc..
Above-mentioned Photoepolymerizationinitiater initiater is relative to the solid constituent in the solidification compound comprising quantum dot of the present invention Overall weight is preferably 0.01～50 weight %, more preferably 1～30 weight %, particularly preferably 1～20 weight %.Gather at light Close initiator less than in the case of above-mentioned scope, it is difficult to be polymerized, if it exceeds above-mentioned scope, although then aggregate rate becomes big, But molecular weight step-down, film-strength dies down sometimes.
The solidification compound comprising quantum dot of the present invention can comprise thermal polymerization inhibitor further.Such as there is hydrogen Quinone, p methoxy phenol, di-t-butyl-paracresol, pyrogallol, tert-butyl catechol, benzoquinone, 4,4 '-thiobis (3- Methyl-6-tert-butylphenol), 2,2 '-di-2-ethylhexylphosphine oxide (4-methyl-6-tert-butylphenol), 2-mercaptobenzimidazole etc..
About the solidification compound comprising quantum dot of the present invention, constituted the curable group comprising quantum dot with eurymeric In the case of compound, it is possible to comprise naphthoquinone diazido compound further.As naphthoquinone diazido compound, such as, there is neighbour Naphthoquinone diazido-5-sulphonic acid ester or sulfonamide or adjacent naphthoquinone diazido-4-sulphonic acid ester or sulfonamide etc..These esters or amide Can use in such as Japanese Unexamined Patent Publication 2-84650 publication and Japanese Unexamined Patent Publication 3-49437 publication with chemical formula 1 record Oxybenzene compounds etc. are also manufactured by known method.
The total quality that above-mentioned alkali solubility phenolic resin and cross-linking agent are commonly angled relative in solvent is respectively with 2～50 weight % Ratio solvent with 2～30 weight % degree.Additionally, above-mentioned naphthoquinone diazido compound and dyestuff are commonly angled relative to containing upper The solution stating alkali soluble resins and cross-linking agent adds with the ratio of 2～30 weight % and 2～50 weight % degree respectively.Additionally, In color filter anti-corrosion agent composition, it is possible to add further such as providing the smooth agent of uniform applicability etc. such The various additives of application in above-mentioned technical field.
The solidification compound comprising quantum dot of the present invention can comprise solvent, and above-mentioned solvent is not particularly limited, especially It preferably considers that quantum dot, the dissolubility of binding agent, coating, safety select.
As above-mentioned solvent, preferably esters, such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, Isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl isobutyrate, ethyl n-butyrate., butyl butyrate, alkyl esters, lactic acid first Ester, ethyl lactate, ethoxyacetic acid methyl ester, ethoxyacetic acid ethyl ester, ethoxyacetic acid butyl ester, methoxy menthyl acetate, 2-Methoxyacetic acid Ethyl ester, 2-Methoxyacetic acid butyl ester, ethoxy acetate, ethoxy ethyl acetate etc.；3-epoxide methyl propionate, 3-epoxide propanoic acid The 3-epoxide alkyl propionates classes such as ethyl ester, such as 3-methoxy methyl propionate, 3-methoxypropionate, 3-ethoxy-propionic acid first Ester, 3-ethoxyl ethyl propionate etc.；The 2-epoxides third such as 2-epoxide methyl propionate, 2-epoxide ethyl propionate, 2-epoxide propyl propionate Dialkylaminobenzoic acid esters, such as 2-methoxy methyl propionate, 2-methoxypropionate, 2-methoxy propyl propyl propionate, 2-ethoxy-c Acid methyl ester, 2-ethoxyl ethyl propionate, 2-epoxide-2 Methylpropionic acid methyl ester, 2-epoxide-2 Methylpropionic acid ethyl ester, 2-methoxyl group- 2 Methylpropionic acid methyl ester, 2-ethyoxyl-2 Methylpropionic acid ethyl ester etc.；Methyl pyruvate, ethyl pyruvate, Propyl 2-oxopropionate, second Methyl acetoacetate, ethyl acetoacetate, 2-Oxobutyric acid methyl ester, 2-Oxobutyric acid ethyl ester etc.；Ethers, such as diethylene glycol diformazan Ether, oxolane, glycol monoethyl ether, ethylene glycol monoethyl ether, methylcellosolve acetate, ethyl cellosolve acetate, diethyl Glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol methyl ether acetate, propylene glycol second Ether acetic acid ester, propylene glycol propyl ether acetas etc.；Ketone, such as butanone, Ketohexamethylene, 2-heptanone, 3-heptanone etc.；Aromatic hydrocarbon Class, such as toluene, dimethylbenzene etc..
Among them, more preferably 3-ethoxypropanoate, 3-ethoxyl ethyl propionate, ethyl cellosolve acetate, Ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, 3-methoxy methyl propionate, 2-heptanone, Ketohexamethylene, ethyl carbitol second Acid esters, acetate of butyl carbitol, propylene glycol monomethyl ether, propylene glycol methyl ether acetate etc..
The solidification compound comprising quantum dot of the present invention can comprise various additive further, such as filler, Macromolecular compound other than the above, surfactant, closely sealed accelerator, antioxidant, UV absorbent, anticoagulant etc..
As the concrete example of above-mentioned various additives, the filler such as glass, aluminium oxide can be enumerated；Polyvinyl alcohol, polypropylene Macromolecular compound beyond the adhering resin such as acid, polyalkylene glycol monoalkyl ether, poly-fluoroalkyl；Nonionic system, sun The surfactant of ionization series, anion system etc.；Vinyltrimethoxy silane, VTES, vinyl three (2-methoxy ethoxy) silane, N-(2-amino-ethyl)-3-amino propyl methyl dimethoxysilane, N-(2-amino second Base)-3-TSL 8330, APTES, 3-glycidoxypropyl group trimethoxy silicon Alkane, 3-glycidoxypropyl dimethoxysilane, 2-(3,4-epoxycyclohexyl) ethyl trimethoxy silane, 3-chlorine third Ylmethyl dimethoxysilane, 3-r-chloropropyl trimethoxyl silane, 3-methacryloxypropyl trimethoxy silane, 3-mercapto The closely sealed accelerator such as base propyl trimethoxy silicane；2,2-thiobis (4-methyl-6-tert-butylphenol), 2,6-di-t-butyl The antioxidants such as phenol；The purples such as 2-(the 3-tert-butyl group-5-methyl-2-hydroxy phenyl)-5-chlorobenzotriazole, alkoxy benzophenone Ultraviolet absorbers；With anticoagulants such as sodium polyacrylate.
Additionally, at the alkali-solubility in order to promote non-image portion, improve the curable containing dyestuff of the present invention further In the case of the developability of compositions, for above-mentioned composition, it is possible to carry out organic carboxyl acid, be preferably molecular weight less than 1000 The interpolation of low-molecular-weight organic carboxyl acid.
Specifically, such as formic acid, acetic acid, propanoic acid, butanoic acid, valeric acid, pivalic acid, caproic acid, diethacetic acid, heptan can be enumerated The aliphatic monocarboxylic acid such as sour, sad；Oxalic acid, malonic acid, succinic acid, 1,3-propanedicarboxylic acid, adipic acid, 1,5-pentanedicarboxylic acid., suberic acid, Azelaic Acid, Decanedioic acid, brassylic acid, Isosuccinic acid, ethyl malonic acid, dimethyl malonic acid, methylsuccinic acid, tetramethyl succinic acid, lemon The aliphatic dicarboxylic acids such as health acid；The third three aliphatic tricarboxylic acids such as acid, equisetic acid, camphoronic acid；Benzoic acid, phenylacetic acid, cumic acid, The aromatic monocarboxylate such as mesitylenic acid, mesityl oxide；Phthalic acid, M-phthalic acid, p-phthalic acid, trimellitic acid, The aromatic multi-carboxy acids such as trimesic acid, mellophanic acid, PMA；Phenylacetic acid, hydratropic acid, hydrocinnamic acid, bitter Fructus Pruni Core acid, phenylsuccinic acid, atropic acid, cinnamic acid, methyl cinnamate, benzyl cinnamate, Cortex Cinnamomi fork acetic acid, coumaric acid, umbellic acid Deng other carboxylic acids.
The present invention provides the color filter manufactured by the above-mentioned solidification compound comprising quantum dot.
The color filter of the present invention, in the case of being applied to image display device, is sent out by the light of display device light source Light, it is thus possible to realize excellent light efficiency.Additionally, due to release carries coloured light, thus colorrendering quality is excellent, and Owing to discharge light to whole directions by luminescence generated by light, visual angle therefore can also be improved.
Color filter comprises substrate and the patterned layer formed on the top of aforesaid substrate.
About substrate, color filter itself can be substrate, or can also be the middle portions residing for color filter such as display device Position, is not particularly limited.Aforesaid substrate can be glass substrate, silicon (Si) substrate, Si oxide (SiOx) substrate or macromolecule Substrate, above-mentioned polymeric substrate can be polyether sulfone (polyethersulfone, PES) or Merlon (polycarbonate, PC) etc..
Patterned layer is the layer of the solidification compound comprising quantum dot containing the present invention, can be to be coated with the above-mentioned amount of comprising The solidification compound of son point, exposes in a predetermined pattern, develops and heat cure and the layer that formed.
The patterned layer formed by the above-mentioned solidification compound comprising quantum dot can possess containing red quantum point particle Red pattern layer, the green pattern layer containing green quantum dot particles and the blue color patterns layer containing blue quantum dot particles. When light irradiates, red pattern layer release red light, green pattern layer release green light, blue color patterns layer release blue light.
When being applied to image display device with such situation, the release light of light source is not particularly limited, from excellence From the standpoint of colorrendering quality, it is possible to use the light source of release blue light.
According to another embodiment of the present invention, above-mentioned patterned layer can also only possess red pattern layer, green pattern layer Patterned layer with 2 kinds of colors in blue color patterns layer.In this case, above-mentioned patterned layer is further equipped with not containing quantum The transparent pattern layer of some particle.
In the case of the patterned layer only possessing 2 kinds of colors, it is possible to use free list reveals the residue color that do not comprises The light source of the light of wavelength.Such as, in the case of comprising red pattern layer and green pattern layer, it is possible to use release blue light Light source.In this case, red quantum point particle release red light, green quantum dot particles release green light, transparent print Pattern layer is directed through blue light and shows blueness.
The above-mentioned color filter comprising substrate and patterned layer can be further contained in the dividing plate formed between each pattern, it is possible to To comprise black matrix further.Further, it is also possible to comprise the protecting film on the top of the patterned layer being formed at color filter further.
Additionally, the present invention provides the image display device including above-mentioned color filter.
The color filter of the present invention can not only be applied to the liquid crystal indicator of routine, additionally it is possible to is applied to electroluminescent and shows The various image display devices such as showing device, plasm display device, field-emission display device.
The image display device of the present invention can possess color filter, and described color filter comprises containing red quantum point particle Red pattern layer, the green pattern layer containing green quantum dot particles and the blue color patterns layer containing blue quantum dot particles.? Under such circumstances, when being applied to image display device, the release light of light source is not particularly limited, from excellent color reproduction From the standpoint of property, preferably can use the light source of release blue light.
According to another embodiment of the present invention, the image display device of the present invention can possess and only comprises red pattern The color filter of the patterned layer of 2 kinds of colors in layer, green pattern layer and blue color patterns layer.In this case, above-mentioned colour filter Device is further equipped with not containing the transparent pattern layer of quantum dot particles.
In the case of the patterned layer only possessing 2 kinds of colors, it is possible to use free list reveals the residue color that do not comprises The light source of the light of wavelength.Such as, in the case of comprising red pattern layer and green pattern layer, it is possible to use release blue light Light source.In this case, red quantum point particle release red light, green quantum dot particles release green light, transparent print Pattern layer is directed through blue light and shows blueness.
The light efficiency of the image display device of the present invention is excellent, shows high brightness, and colorrendering quality is excellent, has width and regards Angle.
Hereinafter, in order to contribute to the understanding of the present invention, it is provided that preferred embodiment, but these embodiments only illustrate this Bright, be not intended to claim, those skilled in the art it will be appreciated that in the range of scope of the invention and technological thought, The numerous variations for embodiment and amendment, such change and amendment can be carried out also ought to include in the claims.
Manufacture the synthesis of the luminescence generated by light green quantum dot particles A of example 1.CdSe (core)/ZnS (shell) structure
By CdO (0.4mmol), zinc acetate (Zinc acetate) (4mmol) and oleic acid (Oleic acid) (5.5mL) with 1-octadecylene (1-Octadecene) (20mL) together adds reactor, is heated to 150 DEG C and makes it react.Afterwards, in order to remove The acetic acid (acetic acid) generating zinc displacement oleic acid, places 20 points by above-mentioned reactant under the vacuum of 100mTorr Clock.Then, apply the heat of 310 DEG C and after obtaining transparent mixture, after it being maintained 20 minutes at 310 DEG C, 0.4mmol will be made Se powder and the S powder of 2.3mmol be dissolved in Se and S solution obtained by the tri octyl phosphine (trioctylphosphine) of 3mL It is rapidly injected equipped with Cd (OA)2With ZN (OA)2The reactor of solution.After making thus obtained mixture grow 5 minutes at 310 DEG C, Ice bath (ice bath) is utilized to make growth interruption.Then, make it precipitate with ethanol, utilize centrifugal separator separation quantum dot, and Utilize chloroform (chloroform) and the unnecessary impurity of washing with alcohol, thus obtain by oleic acid stabilisation, karyosome footpath is distributed Quantum dot particles A with CdSe (core)/ZnS (shell) structure of the particle that thickness of the shell sum is 3～5nm.
Manufacture the synthesis of example 2-1. alkali soluble resins (D-1)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 182g, by the atmosphere in flask after air fills into nitrogen, is warming up to 100 DEG C, then puts into metering system Acid 68.8g, cyclohexyl methacrylate 36.4g and propylene glycol methyl ether acetate 136g, will with the addition of tert-butyl hydroperoxide- The solution of 2-ethylhexyl carbonate 3.2g instilled flask from Dropping funnel through 2 hours, carried out further 5 hours stirring at 100 DEG C Mix.Then, the atmosphere in flask is replaced as air from nitrogen, by glycidyl methacrylate 71g, three (dimethyl Amino methyl) phenol 0.9g and hydroquinone 0.145g put in flask, and continue reaction 6 hours at 110 DEG C, obtain the acid of solid constituent Value is the resin D-1 of 100mgKOH/g.The weight average molecular weight utilizing the polystyrene conversion that GPC measures is 17000, and molecular weight divides Cloth (Mw/Mn) is 2.2.Measuring glass transition temperature with differential scanning calorimetry (DSC), result is 120 DEG C.
Manufacture the synthesis of example 2-2. alkali soluble resins (D-2)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 182g, by the atmosphere in flask after air fills into nitrogen, is warming up to 100 DEG C, then puts into metering system Acid 68.8g, monomethacrylates (Hitachi's chemical conversion (strain) the manufactures FA-513M) 44.0g of tricyclodecane skeleton and propylene glycol list Methyl ether acetate 136g, by little through 2 from Dropping funnel for the solution that with the addition of tert-butyl hydroperoxide-2-ethylhexyl carbonate 3.2g Time instill flask, 100 DEG C carry out further 5 hours stirring.Then, the atmosphere in flask is replaced as air from nitrogen, will Glycidyl methacrylate 71g, three (dimethylaminomethyl) phenol 0.9g and hydroquinone 0.145g put in flask, 110 DEG C are continued reaction 6 hours, obtain the resin D-2 that acid number is 110mgKOH/g of solid constituent.Utilize the polyphenyl that GPC measures The weight average molecular weight of ethylene conversion is 15300, and molecular weight distribution (Mw/Mn) is 2.3.Vitrification is measured with differential scanning calorimetry (DSC) Transition temperature, result is 130 DEG C.
Manufacture the synthesis of example 2-3. alkali soluble resins (D-3)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 182g, by the atmosphere in flask after air fills into nitrogen, is warming up to 100 DEG C, then puts into metering system Acid 47.3g, 1-acryloyl group epoxide-3-hydroxyadamantane (aldrich (strain)) 99.9g and propylene glycol methyl ether acetate 300g, instilled burning from Dropping funnel through 2 hours by the solution that with the addition of tert-butyl hydroperoxide-2-ethylhexyl carbonate 3.2g Bottle, carries out stirring in 5 hours further at 100 DEG C.Then, the atmosphere in flask is replaced as air from nitrogen, by (+)-2,3-Epoxy-1-propanol Methyl acrylate 35.5g, three (dimethylaminomethyl) phenol 0.9g and hydroquinone 0.145g put in flask, at 110 DEG C Continue reaction 6 hours, obtain the resin D-3 that acid number is 95mgKOH/g of solid constituent.The polystyrene utilizing GPC to measure changes The weight average molecular weight calculated is 18300, and molecular weight distribution (Mw/Mn) is 2.3.Glass transition temperature is measured with differential scanning calorimetry (DSC) Degree, result is 160 DEG C.
Manufacture the synthesis of example 2-4. alkali soluble resins (D-4)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 250g, by the atmosphere in flask after air fills into nitrogen, is warming up to 100 DEG C, then puts into metering system Acid 25.8g, 1-acryloyl group epoxide-3-hydroxyadamantane (aldrich (strain)) 50.4g, acrylophenone 56.7g and propylene glycol Methyl ether acetate 110g, instilled flask from Dropping funnel through 2 hours by the solution that with the addition of azodiisobutyronitrile 3.6g, 100 DEG C carry out stirring in 5 hours further, obtain the resin D-4 that acid number is 115mgKOH/g of solid constituent.GPC is utilized to measure The weight average molecular weight of polystyrene conversion be 19000, molecular weight distribution (Mw/Mn) is 2.3.Measure with differential scanning calorimetry (DSC) Glass transition temperature, result is 160 DEG C.
Manufacture the synthesis of example 2-5. alkali soluble resins (D-5)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 250g, by the atmosphere in flask after air fills into nitrogen, is warming up to 100 DEG C, then puts into metering system Acid 25.8g, 1-acryloyl group epoxide-3-hydroxyadamantane (aldrich (strain)) 44.4g, acrylophenone 44.8g, methyl Acrylic acid 10.0g and propylene glycol methyl ether acetate 110g, will with the addition of the solution of azodiisobutyronitrile 3.6g from Dropping funnel Instilled flask through 2 hours, carry out stirring in 5 hours further at 100 DEG C, obtain the tree that acid number is 115mgKOH/g of solid constituent Fat D-5.The weight average molecular weight utilizing the polystyrene conversion that GPC measures is 19000, and molecular weight distribution (Mw/Mn) is 2.2.With Differential scanning calorimetry (DSC) measures glass transition temperature, and result is 135 DEG C.
Manufacture the synthesis of example 2-6. alkali soluble resins (D-6)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 250g, by the atmosphere in flask after air fills into nitrogen, is warming up to 100 DEG C, then puts into metering system Acid 25.8g, 2-norborene 18.8g, acrylophenone 44.8g, methylmethacrylic acid 10.0g and propylene glycol methyl ether acetate 110g, instilled flask from Dropping funnel through 2 hours by the solution that with the addition of azodiisobutyronitrile 3.6g, enters further at 100 DEG C Row stirring in 5 hours, obtains the resin D-6 that acid number is 105mgKOH/g of solid constituent.Utilize the polystyrene conversion that GPC measures Weight average molecular weight be 16300, molecular weight distribution (Mw/Mn) is 2.4.Glass transition temperature is measured with differential scanning calorimetry (DSC) Degree, result is 150 DEG C.
Manufacture the synthesis of example 2-7. alkali soluble resins (D-7)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 180g, by the atmosphere in flask after air fills into nitrogen, is warming up to 80 DEG C, then puts into methyl third Olefin(e) acid 20.0g, n-butyl acrylate 55.2g, glycidyl methacrylate 30g and propylene glycol methyl ether acetate 71g, instilled flask from Dropping funnel through 2 hours by the solution that with the addition of tert-butyl hydroperoxide-2-ethylhexyl carbonate 3.2g, Stirring in 5 hours is carried out further at 100 DEG C.Then, the atmosphere in flask is replaced into air from nitrogen, by methacrylic acid 36.0g, three (dimethylaminomethyl) phenol 0.9g and hydroquinone 0.145g put in flask, react 6 hours at 100 DEG C.Afterwards, The temperature of reactant liquor being down to room temperature, puts into succinic anhydrides 4.5 parts, react 6 hours at 80 DEG C, the acid number obtaining solid constituent is The resin D-7 of 80mgKOH/g.The weight average molecular weight utilizing the polystyrene conversion that GPC measures is 15200, molecular weight distribution (Mw/Mn) it is 2.1.Measuring glass transition temperature with differential scanning calorimetry (DSC), result is-1.3 DEG C.
Manufacture the synthesis of example 2-8. alkali soluble resins (D-8)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 180g, by the atmosphere in flask after air fills into nitrogen, is warming up to 80 DEG C, then puts into methyl third Olefin(e) acid 20.0g, 2-ethylhexyl acrylate 55.2g, glycidyl methacrylate 30g and propylene glycol monomethyl ether acetic acid Ester 71g, instilled burning from Dropping funnel through 2 hours by the solution that with the addition of tert-butyl hydroperoxide-2-ethylhexyl carbonate 3.2g Bottle, carries out stirring in 5 hours further at 100 DEG C.Then, the atmosphere in flask is replaced as air from nitrogen, by metering system Acid 36.0g, three (dimethylaminomethyl) phenol 0.9g and hydroquinone 0.145g puts in flask, reacts 6 hours at 100 DEG C.It After, the temperature of reactant liquor is down to room temperature, puts into succinic anhydrides 4.5 parts, react 6 hours at 80 DEG C, obtain the acid of solid constituent Value is the resin D-8 of 45mgKOH/g.The weight average molecular weight utilizing the polystyrene conversion that GPC measures is 7500, molecular weight distribution (Mw/Mn) it is 2.1.Measuring glass transition temperature with differential scanning calorimetry (DSC), result is-19.3 DEG C.
Manufacture the synthesis of example 2-9. alkali soluble resins (D-9)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 182g, by the atmosphere in flask after air fills into nitrogen, is warming up to 100 DEG C, then puts into benzyl methyl Acrylate 105.7g, methacrylic acid 17.2g, 2-hydroxy ethyl methyl acrylic acid 26.0g and propylene glycol methyl ether acetate 136g, instilled flask from Dropping funnel through 2 hours by the solution that with the addition of azodiisobutyronitrile 3.6g, enters further at 100 DEG C Row stirring in 3 hours, obtains the resin D-9 that acid number is 60mgKOH/g of solid constituent.Utilize the polystyrene conversion that GPC measures Weight average molecular weight be 18000, molecular weight distribution (Mw/Mn) is 2.2.Glass transition temperature is measured with differential scanning calorimetry (DSC) Degree, result is 80 DEG C.
Manufacture the synthesis of example 2-10. alkali soluble resins (D-10)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 182g, by the atmosphere in flask after air fills into nitrogen, is warming up to 100 DEG C, then puts into benzyl methyl Acrylate 105.7g, methacrylic acid 34.4g and propylene glycol methyl ether acetate 136g, will with the addition of azodiisobutyronitrile The solution of 3.6g instilled flask from Dropping funnel through 2 hours, carries out stirring in 3 hours further at 100 DEG C, obtains solid constituent Acid number is the resin D-10 of 130mgKOH/g.The weight average molecular weight utilizing the polystyrene conversion that GPC measures is 17000, molecule Amount distribution (Mw/Mn) is 2.2.Measuring glass transition temperature with differential scanning calorimetry (DSC), result is 100 DEG C.
Manufacture the synthesis of example 2-11. alkali soluble resins (D-11)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 182g, by the atmosphere in flask after air fills into nitrogen, is warming up to 100 DEG C, then puts into normal-butyl first Base acrylate 76.8g, methacrylic acid 17.2g, 2-hydroxy ethyl methyl acrylic acid 26.0g and propylene glycol methyl ether acetate 136g, instilled flask from Dropping funnel through 2 hours by the solution that with the addition of azodiisobutyronitrile 3.6g, enters further at 100 DEG C Row stirring in 3 hours, obtains the resin D-11 that acid number is 62mgKOH/g of solid constituent.Utilize the polystyrene conversion that GPC measures Weight average molecular weight be 15500, molecular weight distribution (Mw/Mn) is 2.2.Glass transition temperature is measured with differential scanning calorimetry (DSC) Degree, result is-20 DEG C.
Manufacture the synthesis of example 2-12. alkali soluble resins (D-12)
Propylene glycol list is added to the flask possessing agitator, thermometer, reflux condensing tube, Dropping funnel and nitrogen ingress pipe Methyl ether acetate 100g, by the atmosphere in flask after air fills into nitrogen, is warming up to 80 DEG C, then puts into 2-ethylhexyl Acrylate 10.2g, 4-methyl styrene 0.7g, glycidyl methacrylate 76g, n-dodecyl mercaptan 3g and third Glycol monomethyl ether 100g, instilled flask from Dropping funnel through 2 hours by the solution that with the addition of azodiisobutyronitrile 5g, enters at 80 DEG C One step carries out stirring in 4 hours.Then, the atmosphere in flask is replaced into air from nitrogen, by triethylamine 0.2g, 4-methoxybenzene Phenol 0.1g, acrylic acid 10.4g put in flask, react 6 hours at 100 DEG C.Afterwards, the temperature of reactant liquor is down to room temperature, throws Enter succinic anhydrides 2.7g, react 6 hours at 80 DEG C, obtain the resin D-12 that acid number is 16.45mgKOH/g of solid constituent.Profit Being 5450 by the weight average molecular weight of the polystyrene conversion of GPC mensuration, molecular weight distribution (Mw/Mn) is 2.1.Use differential scanning amount Heat meter measures glass transition temperature, and result is-28.4 DEG C.
Embodiment 1～8 and comparative example 1～4: the manufacture of emissive type photosensitive polymer combination
As described in following Tables 1 and 2, after each composition is mixed, dilute with propylene glycol methyl ether acetate, so that entirely Portion's solid constituent is 20 weight %, is then sufficiently stirred for, and obtains emissive type photosensitive polymer combination.
[table 1]
[table 2]
The manufacture example of color filter (glass (Glass) substrate)
Utilize by above-described embodiment 1～8 and the emissive type photosensitive polymer combination manufacture filter that manufactures of comparative example 1～4 Color device.That is, each emissive type photosensitive polymer combination spin-coating method above-mentioned is coated on glass substrate, be then placed into In heating plate, maintain 3 minutes with the temperature of 100 DEG C, form thin film.Then, placement has length × wide 20mm on the above-mentioned films The square of × 20mm through the test photomask of the line/space pattern of pattern and 1 μm～100 μm, with test photomask It is spaced apart 100 μm irradiation ultraviolet radiations.
Now, ultraviolet light source utilizes the extra-high-pressure mercury vapour lamp (trade name USH-250D) that USHIO motor (strain) makes, greatly With 200mJ/cm under gas atmosphere2Light exposure (365nm) carry out light irradiation, do not use special optical filter.By above-mentioned Irradiate the thin film of ultraviolet and immerse KOH aqueous development solution 80 seconds that pH is 10.5 with development.By the glass with this thin film After glass plate uses distilled water wash, blow nitrogen and be dried, heat 10 minutes in the heated oven of 150 DEG C, thus manufacture Color filter pattern.The film thickness of the coloured pattern of self-luminous of above-mentioned manufacture is 3.0 μm.
The mensuration of fine pattern
Obtain across the line/space pattern mask of 100 μm for being formed among the color filter of above-mentioned self-luminous pixel The size of pattern, measure pattern dimension by OM equipment (ECLIPSE LV100POL, NIKON manufactures).
Fine pattern (Δ μm)=(line/space pattern mask size, 100 μm)-(the pattern of pixels size of mensuration)
If the value of fine pattern is more than 10 μm, being then difficult to fine pixel, if having negative value, then can cause work Sequence is bad.
The mensuration of luminous intensity (Intensity)
For being formed with the figure formed among the color filter of above-mentioned self-luminous pixel by the square pattern of 20mm × 20mm Case (Pattern) portion, measures the district of light change by 365nm cast 4W UV irradiator (VL-4LC, VILBER LOURMAT) Territory, utilizes spectroscope (Spectrum meter) (Ocean Optics company system) to measure embodiment 1～8 and comparative example 1～4 The luminous intensity (Intensity) in 550nm region.May determine that, the luminous intensity (Intensity) measured is the highest, all the more Waving the self-luminous characteristic of excellence, the measurement result of luminous intensity (Intensity) is shown in Table 3 below.Additionally, carry out with 230 DEG C Baking (hard bake) firmly in 60 minutes, measures the luminous intensity (Intensity) before hard baking and the luminous intensity after hard baking (Intensity), confirm to maintain the level of luminous efficiency, represent with luminous intensity sustainment rate in table 3.
[table 3]
As shown in table 3, the present invention is by the binding agent used in the embodiment 1 comprising offer～embodiment 8, luminous intensity Increase with luminous intensity sustainment rate, it is possible to make fine pattern, it is possible to obtain making the excellence of high-resolution color filter Photosensitive polymer combination.
With reference to comparative example 1～3 and embodiment 1～8, use end have double bond, have crosslinking ability and quantum dot and In the case of the part of quantum dot surface has the binding agent of intermiscibility, it is possible to confirm following effect: play at quantum dot surface The effect of blocking group, thus there is in operation the luminous intensity of excellence, delustring amplitude is few.Additionally, with reference to comparative example 4 and reality Execute example 7～8, it is possible to even if confirming that luminous intensity is high, can not be formed when glass transition temperature (Tg) is for less than-20 DEG C High-resolution fine pattern, is unable to application.

Claims (7)

1. the solidification compound comprising quantum dot, it is characterised in that comprise binding agent and quantum dot,
Described binding agent comprises more than a kind in following chemical formula 1, chemical formula 2 and combinations thereof:
In described chemical formula 1,
R1Represent hydrogen or C1～C6 alkyl,
R2Represent oxygen ,-NH-orBase,
R3Represent C1～C30 alkylidene, C1～C30 alkylidene epoxide or C1～C30 ethyloxycarbonyl amino-ethyl,
R4Represent the group containing unsaturated double-bond,
In described chemical formula 2,
R5～R6It is same to each other or different to each other independently of one another, and represents hydrogen or C1～C6 alkyl,
R7Represent oxygen ,-NH-orBase,
R8Represent C1～C30 alkylidene, C1～C30 alkylidene epoxide or C1～C30 ethyloxycarbonyl amino-ethyl,
R9Represent the group containing unsaturated double-bond,
X represents the value of 0 ＜ X ＜ 100.
The solidification compound comprising quantum dot the most according to claim 1, it is characterised in that the glass of described binding agent Changing transition temperature is-20～250 DEG C.
The solidification compound comprising quantum dot the most according to claim 1, it is characterised in that relative to the described amount of comprising In the solidification compound of son point, overall weight part of solid constituent, comprises described binding agent 10～90 weight % and described quantum Point 3～80 weight %, as remainder, comprises photopolymerization compounds and Photoepolymerizationinitiater initiater.
The solidification compound comprising quantum dot the most according to claim 1, it is characterised in that described quantum dot is red Quantum dot, green quantum dot or blue quantum dot.
The solidification compound comprising quantum dot the most according to claim 1, it is characterised in that the core bag of described quantum dot Containing select free CdSe, CdS, ZnS, ZnSe, ZnTe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, HgS, HgSe, HgTe, More than one materials in the group that GaN, GaP, GaAs, InP, InAs and ZnO are formed, shell comprise choosing free CdSe, ZnSe, More than one materials in the group that ZnS, ZnTe, CdTe, PbS, TiO, SrSe and HgSe are formed.
6. a color filter, it is characterised in that by the curable group comprising quantum dot according to any one of Claims 1 to 5 Compound manufactures.
7. an image display device, it is characterised in that comprise the color filter described in claim 6.
CN201610102538.2A 2015-02-25 2016-02-24 Curable composition comprising quantum dot color, filter manufactured using thereof and image display device having the same Pending CN105911816A (en)

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Application publication date: 20160831