CN105911624A - Rectangular linear variable optical filter manufacturing method and device - Google Patents
Rectangular linear variable optical filter manufacturing method and device Download PDFInfo
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- CN105911624A CN105911624A CN201610450260.8A CN201610450260A CN105911624A CN 105911624 A CN105911624 A CN 105911624A CN 201610450260 A CN201610450260 A CN 201610450260A CN 105911624 A CN105911624 A CN 105911624A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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Abstract
The invention relates to a rectangular linear variable optical filter manufacturing method and device. According to the rectangular linear variable optical filter manufacturing method and device, a glass base material used for making an optical filter is fixed on a lower surface of a round plate-shaped work piece disc that can rotate around a central shaft of the work piece disc, a plating face of the glass base material faces downwards, an evaporation source base plate and an evaporation source positioned on an upper surface of the evaporation source base plate are arranged below the work piece disc, and the plating face of the glass base material is subjected to plating operation with a membrane material evaporated via the evaporation source when the work piece disc drives the glass base material to rotate. The rectangular linear variable optical filter manufacturing method and device can help overcome defects of complicated production processes and low precision and poor quality of manufactured rectangular linear variable optical filters in conventional rectangular linear variable optical filter manufacturing processes because a corrected piece which is adjusted via manual work for many times is adopted. The rectangular linear variable optical filter manufacturing method and device are advantaged by greatly reduction of membrane thickness correcting processes, saved trial-plating time, and improved precision and quality stability of the rectangular linear variable optical filter.
Description
Technical field
The present invention relates to a kind of method producing rectangle linear variable filter and process units thereof.
Background technology
At present, to be applied to spectral measurement, remote sensing technology, fluorescence analysis, laser countermeasure (s) etc. many for optical film filter
Individual field.Along with the development of optics industry, the requirement to optical filter is more and more higher, occurs in that some special optical filters, and
Linear variable filter is exactly the developing direction that one of them is new.
Linear variable filter is a kind of special optical filter, and on this optical filter, centre wavelength or the light intensity of diverse location are
Different.Its effect is to make the transmitance of light meet specific function relation, is used for improving image quality, rectification aberration, carrying
For illuminance compensation etc..The device of optical film changed with optical filter surface location as a kind of spectral characteristic, this gradual filter
Having the advantages such as little, lightweight, the good stability of volume, therefore, it is at portable quick light splitting, spectrogrph linearity correction, light
The aspects such as grid two grades time light separation/cut-off have a wide range of applications, and have been successfully applied to miniature spectrometer and imaging spectral
Instrument.Wherein, the feature of rectangle linear variable filter is linearly to change along its transmitance of direction of rectangle substrate length.
The manufacturing process of traditional linear variable filter is coated with multiple coating materials, uses same trim tab to film
Thickness is once revised, and described trim tab needs empirically repeatedly to be manually adjusted its size by operator.Cause
This, the different evaporation angle difference of coating materials, repeatedly manual operation error, once correction step all result in production cost height, life
Produce the problem that efficiency linear variable filter low, produced precision is the highest, linear dispersion rate is difficult to ensure that and quality is unstable.Separately
Outward, mostly what existing linear variable filter used is prepared by metal film such as silver, chromium, nickel etc., and metal film also exists self
The shortcomings such as absorption and poor adhesive force, oxidizable, service life is short, the process thickness of being coated with is difficult to control to, bring to batch production
The biggest frustration.
Therefore, flow process is succinct, production cost is low and efficiency is high, be greatly improved rectangle the most gradually to the invention provides one
Oneself becomes and works as to become the precision of optical filter and the method producing rectangle linear variable filter of quality stability and process units thereof
Business urgently.
Summary of the invention
In order to overcome in existing rectangle linear variable filter preparation process owing to using through the adjustment of repeatedly artificial experience
One piece of trim tab and production process rectangle numerous and diverse, the made linear variable filter precision that causes is the best, quality is unstable lacks
Point, the present invention provides a kind of method producing rectangle linear variable filter and process units thereof, and it has and can be greatly simplified
Thickness correction operation, saving examination plating time, the precision improving rectangle linear variable filter and the advantage of quality stability.
Technical scheme is as follows:
A kind of method producing rectangle linear variable filter, it is will to be fixed on for making the glass baseplate of optical filter
On circular plate and the lower surface of workpiece plate that can rotate around its central axis, make the coated surface of glass baseplate down, in work
Arranging evaporation source base plate below part dish and be positioned at the evaporation source of evaporation source plate upper surface, workpiece plate drives glass baseplate to rotate through
Cheng Zhong, the coating materials evaporated by evaporation source carries out plated film to the coated surface of glass baseplate；
1. described glass baseplate is rectangular glass base material；
2. before plated film, Film Design is first carried out: according to the centre wavelength of required optical filter, transmitance and along glass
The transmitance abbe number of glass base material long side direction uses plated film software to carry out Film Design, determines coating layers, needed for every layer
Coating Materials, every layer of institute's film plating layer are along the film thickness distribution situation of glass baseplate length direction；
3., in coating process, the diametric(al) of the long edge workpiece plate of glass baseplate coated surface is made to place；According to being plated
Film layer selects one group of corresponding trim tab a and trim tab b, by symmetrically placed in workpiece plate for described trim tab a and trim tab b
Mandrel radially opposite sides between glass baseplate and evaporation source；When workpiece plate drives glass baseplate to rotate, when glass baseplate warp
When crossing trim tab a position, by trim tab a, the partial occlusion of evaporation source evaporation coating materials is adjusted the coating materials on this layer of coated surface
Distribution, it is achieved thicknesses of layers correction for the first time, makes coated surface plate the film layer that a layer thickness is consistent, then passes through when glass baseplate
During trim tab b position, the coating materials adjusted the partial occlusion of evaporation source evaporation coating materials on this layer of coated surface by trim tab b is divided
Cloth, it is achieved thicknesses of layers correction for the second time, is modified along the thickness distribution situation of glass baseplate length direction institute's film plating layer,
So circulation is repeatedly to completing being coated with of corresponding tunic layer；One group of new corresponding repairing is selected afterwards according to next layer of institute's film plating layer
Positive a and trim tab b repeats above-mentioned coating process, until the rectangle linear variable filter needed for Huo get ing；
The inner terminal of corresponding glass baseplate coated surface on trim tab a, just neutralize place, outermost end position workpiece plate lower surface
The circular arc arc length of circumferential position uses a respectivelyM、ao、amRepresent, the corresponding inner terminal of glass baseplate coated surface, center on trim tab b
B is used respectively with the circular arc arc length of place, outermost end position workpiece plate lower surface circumferential positionM、bo、bmRepresent；
Described trim tab a and trim tab b is prepared from accordance with the following methods:
I, first calculate the dimensional parameters of theoretical trim tab a and produce theoretical correction sheet a:
Set amTheoretical value, thismValue is the 5-10% of workpiece plate radius size, calculates theoretical correction by below equation
The a of sheet aMAnd aoTheoretical value, and produce this theoretical correction sheet a according to the size of above-mentioned theory trim tab a:
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is the workpiece plate center of circle vertical height to evaporation source base plate, and L is that evaporation source is evaporating with the workpiece plate center of circle
Vertical dimension between the upright projection point of source base plate, r is the deposition test that the workpiece plate center of circle is deposited on workpiece plate to coating materials
The radius of some A, tsFor the thickness of deposition test point A that coating materials is deposited on workpiece plate, tosRepresent that coating materials is deposited in workpiece plate
The thickness of the heart, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、tsmIt is respectively coating materials and is deposited on glass base
The inner terminal of material coated surface, just neutralize the thickness of these 3 points of outermost end position；rM、ro、rmRepresent that the workpiece plate center of circle is to film respectively
Material is deposited on the inner terminal of glass baseplate coated surface, just neutralizes the radius of outermost end position；
II, the size acquisition trim tab a of examination plated film revised theory trim tab a:
Along diametric(al) fixed placement glass baseplate on workpiece plate lower surface of workpiece plate, first that theoretical correction sheet a is solid
It is scheduled on the lower section of workpiece plate, with this theoretical correction sheet a, glass baseplate is blocked, the coated surface of glass baseplate plates one
Layer thickness is the corresponding film plating layer material requested film layer of 250-300nm, tailing edge workpiece plate diametric(al) measure each plated film sink
The size of theoretical correction sheet a is modified by the transmitance of long-pending test point, it is thus achieved that a of trim tab am、aMAnd aoActual value, make
Plated film complete after on glass baseplate coated surface along the transmitance numerical value of the diametric each plated film point of workpiece plate consistent so that
The coating film thickness obtaining this film plating layer is consistent, i.e. completes the making of the trim tab a for this kind of Coating Materials；
III, the making of trim tab b: by formula
WithCalculate bM、bm、bo
Value and produce the trim tab b for this kind of Coating Materials；Wherein, aM、am、aoUse the trim tab a's of step II acquisition
Actual value, λM、λo、λmIt is respectively the corresponding glass baseplate inner terminal that Film Design requires, the transmitance just neutralizing outermost end position
Corresponding wavelength.
Being different from the conventionally employed way manually adjusting trim tab, the application is for producing rectangle linear variable filter
Trim tab uses the calculating of accurate formula that the size of trim tab has carried out accurate restriction, first obtains size theoretical correction accurately
Sheet a size, then according to plated deielectric-coating material glass baseplate plated film transmitance measuring (plated film transmitance experiment i.e. along work
The diametric(al) of part dish is fixed placement glass baseplate (coated surface length and the trim tab when glass baseplate on workpiece plate lower surface
Can be selected for a piece of glass baseplate when length difference is few, and when the coated surface length of glass baseplate is shorter, multiple pieces of glass can be used
Base material is end to end to be arranged in a row.), first use theoretical correction sheet a to glass base in being coated with certain dielectric material membrane process
Material carries out blocking correction coating film thickness, tailing edge workpiece plate diametric(al) measure the transmitance of each plated film point) result is to theory
Size (the i.e. a of trim tab aM、amAnd aoSize) be finely adjusted, it is ensured that the transmitance numerical value of each plated film point is consistent, thus
To the trim tab a corresponding to this kind of deielectric-coating material.This process substantially reduces the examination plating time, improves the steady quality of product
Property.And make thickness consistent by using trim tab a to carry out thickness correction for the first time, then trim tab b carries out second time thickness
Revise, realize passing through along glass baseplate direction by plating the film of linear change thickness along glass baseplate coated surface length direction
The linear gradient of rate, substantially increases the linear dispersion of gradual filter.Wherein, amThe width of setting and glass baseplate
Relation is little, mainly can not too carefully otherwise be easily deformed, and can not arrange too big simultaneously, otherwise block coating materials too many, can lead
Cause coating materials waste and the plated film time lengthens.
During calculating, first according to point source film thickness distribution formulaCalculate
Workpiece plate correspondence glass baseplate both ends and center position film thickness distribution ts；Reset am, by formula tsm×(2πrm-am)=tso×
(2πro-ao)=tsM×(2πrM-aM), calculate to obtain aoAnd aMTheoretical value (the i.e. a of theoretical correction sheet aoAnd aMValue).Pass through glass baseplate
Plated film transmitance determination experiment size (the i.e. a to theoretical correction sheet am、aoAnd aMValue) it is modified.Again by revised am、aoWith
aMThe actual value of value substitutes into formulaWith
It is calculated bM、bm、bo, obtain the size of trim tab b.When Coating Materials is multiple, repeat step 3) can produce for
The trim tab a and trim tab b of this multiple coating films material.Trim tab a and correction to multiple different Coating Materials design specialized
Sheet b, overcomes the difference of different Coating Materials evaporation angle, improves the precision of prepared rectangle linear variable filter.Examination
The thickness of film plating layer uses 250-300nm's to reason is that under generally this thickness, the transmitance of test has comparison many
Interference peaks, calculates error the least；The thinnest then interference peaks of film layer is few, and bad analysis is the thickest the most inaccurate.It addition, this thickness
It is that industry uses the most (thickness of conventional plated film is at 100-300nm).
The coated surface institute film plating layer of described glass baseplate is media coating.Deielectric-coating is used to substitute original metal film, not only
Performance is promoted, and service life also can extend.
Described media coating is the film layer overlapped by high refractive index layer and low-index film.Can be according to different need
Ask and design the film layer structure that multilamellar is overlapping, a group of trim tab a, b corresponding to every kind of coating materials employing, and in the mistake of alternate plating
Journey is replaced use to trim tab a, b.
Described high index film material is Ta2O5、Nb2O5、ZrO2Or TiO2, described low-refraction coating materials is SiO2Or MgF2。
Described glass baseplate is K9 glass, BK7 glass or fused quartz FS.
The process units that a kind of method of described production rectangle linear variable filter is used, including workpiece plate, glass
Base material, evaporation source and evaporation source base plate；Described workpiece plate is circular plate and can rotate around its central axis；During plated film, glass
Glass base material is fixed on the lower surface of this workpiece plate, and the coated surface of glass baseplate down, be located at below workpiece plate by evaporation source base plate,
Evaporation source is positioned on the upper surface of this evaporation source base plate.
1. described glass baseplate is rectangular glass base material；
The most described process units also includes least one set trim tab a and trim tab b, according to the different choice pair of institute's film plating layer
The trim tab a that should organize and trim tab b, described often group trim tab a and trim tab b are symmetrically placed in the central shaft radial direction two of workpiece plate
Side between glass baseplate and evaporation source；When workpiece plate drives glass baseplate to rotate, when glass baseplate is respectively through correction
When sheet a and trim tab b position, evaporation source evaporation coating materials partial occlusion can be existed by trim tab a and trim tab b to adjust this film plating layer
Coating materials distribution on coated surface；
Described trim tab a is to be revised by theoretical correction sheet a and obtain；
The inner terminal of corresponding glass baseplate coated surface on trim tab a, just neutralize place, outermost end position workpiece plate lower surface
The circular arc arc length of circumferential position uses a respectivelyM、ao、amRepresent；Set amValue, thismValue is the 5-10% of workpiece plate radius size, institute
State a of theoretical correction sheet aMAnd aoTheoretical value is calculated by below equation and obtains:
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is the workpiece plate center of circle vertical height to evaporation source base plate, and L is that evaporation source is evaporating with the workpiece plate center of circle
Vertical dimension between the upright projection point of source base plate, r is the deposition test that the workpiece plate center of circle is deposited on workpiece plate to coating materials
The radius of some A, tsFor the thickness of deposition test point A that coating materials is deposited on workpiece plate, tosRepresent that coating materials is deposited in workpiece plate
The thickness of the heart, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、tsmIt is respectively coating materials and is deposited on glass base
The inner terminal of material coated surface, just neutralize the thickness of these 3 points of outermost end position；rM、ro、rmRepresent that the workpiece plate center of circle is to film respectively
Material is deposited on the inner terminal of glass baseplate coated surface, just neutralizes the radius of outermost end position；
The a of trim tab aM、aoAnd amActual value be by examination on glass baseplate coated surface, to plate a layer thickness be 250-
The plated material membrane of 300nm also comes theory according to the transmitance measuring each coated film deposition test point along workpiece plate diametric(al)
The a of trim tab aM、aoAnd amTheoretical value is modified and obtains, and the trim tab a revising gained can make the thickness one of institute's film plating layer
Cause；
The inner terminal of corresponding glass baseplate coated surface on described trim tab b, just neutralize under the workpiece plate of place, outermost end position
The circular arc arc length of surface perimeter position is respectively bM、bo、bm, this bM、bm、boBy formula
WithIt is calculated；Wherein,
aM、am、aoUse the actual value of trim tab a, λM、λo、λmIt is respectively corresponding glass baseplate inner terminal, center that Film Design requires
The wavelength corresponding with the transmitance of outermost end position.
The coated surface institute film plating layer of described glass baseplate is media coating.
Described media coating is high refractive index layer, low-index film or by high refractive index layer and low-index film
Film layer alternately.
Described high index film material is Ta2O5、Nb2O5、ZrO2Or TiO2, described low-refraction coating materials is SiO2Or MgF2。
Described glass baseplate is K9 glass, BK7 glass or fused quartz FS.
Compared with prior art, the present patent application has the advantage that
1) use the application to produce the method for rectangle linear variable filter and rectangle that process units is produced is linear
Gradual filter, the direction transmitance along rectangle substrate length linearly changes, and the transmitance at its fade rates and two ends is
Big value and minima can be obtained by the shape of the design of film system and second-order correction sheet, are greatly improved stability and the device of preparation
The precision of part；
2) clear film system is converted into by substrate of glass length direction by formula for the transmitance gradual change of wavelength
Transmitance linear gradient, carried out the calculating of thicknesses of layers theoretically, changed the production mould the most simply based on experience
Formula, reduces examination plating stove number, reduces production cost；
3) by selecting trim tab a, b of inverted triangle, can effectively change film thickness distribution, improve coating materials as far as possible and utilize
Rate.By the thickness correction of secondary, improve the linear rate of dispersion of gradual change sheet；
4) use deielectric-coating to replace original metal film and be greatly improved the service life of film layer, reduce stress in thin film and improve
Adhesive force, media coating thickness control accuracy is high, and repeatability and stability are improved；
5) can be according to customer demand design different glass size of foundation base, different transmitance, the filter of different linear dispersion
Light film.
Accompanying drawing explanation
Fig. 1 is the section components position view of the process units of rectangle linear variable filter；
Fig. 2 is workpiece plate, trim tab and the glass baseplate of rectangle linear variable filter process units of the present invention
Position view；
Fig. 3 is design curve and the substrate of glass transmitance scattergram of rectangle linear variable filter of the present invention；
Fig. 4 is the filter coating spectrogram using the rectangle linear variable filter design described in the embodiment of the present invention.
Label declaration: workpiece plate 1, trim tab a 21, trim tab b 22, glass baseplate 3, evaporation source base plate 4, evaporation source 5.
Detailed description of the invention
Below in conjunction with Figure of description 1-4, technical scheme is described in detail.
As Figure 1-4, a kind of method producing rectangle linear variable filter of the present invention, it is by for making
Make the glass baseplate 3 of optical filter to be fixed on circular plate and the lower surface of workpiece plate 1 that can rotate around its central axis, make
The coated surface of glass baseplate 3 down, arranges evaporation source base plate 4 below workpiece plate 1 and is positioned at the steaming of evaporation source base plate 4 upper surface
Rising 5, workpiece plate 1 drives in glass baseplate 3 rotary course, and the coating materials evaporated by evaporation source carrys out the plated film to glass baseplate 3
Face carries out plated film；
1. described glass baseplate 3 is rectangular glass base material；
2. before plated film, Film Design is first carried out: according to the centre wavelength of required optical filter, transmitance and along glass
The transmitance abbe number of glass base material 3 long side direction uses plated film software to carry out Film Design, determines coating layers, needed for every layer
Coating Materials, every layer of institute's film plating layer are along the film thickness distribution situation of glass baseplate length direction；
3., in coating process, the diametric(al) of the long edge workpiece plate 1 of glass baseplate 3 coated surface is made to place；According to institute
Film plating layer selects one group of corresponding trim tab a21 and trim tab b22, by symmetrically placed for described trim tab a21 and trim tab b22 in
The central shaft radially opposite sides of workpiece plate 1 between glass baseplate 3 and evaporation source 5；Workpiece plate 1 drives glass baseplate 3 to rotate
Time, when glass baseplate 3 is through trim tab a21 position, by trim tab a21, evaporation source 5 is evaporated the partial occlusion of coating materials
Adjust the coating materials distribution on this layer of coated surface, it is achieved thicknesses of layers correction for the first time, make coated surface plate a layer thickness consistent
Film layer, then when glass baseplate 3 is through trim tab b22 position, evaporates the part of coating materials by trim tab b22 to evaporation source 5
Block the coating materials distribution adjusted on this layer of coated surface, it is achieved thicknesses of layers correction for the second time, to institute's film plating layer along glass baseplate
The thickness distribution situation of length direction is modified, and so circulation is repeatedly to completing being coated with of corresponding tunic layer；Afterwards under basis
One layer of institute's film plating layer selects one group of new corresponding trim tab a21 and trim tab b22 to repeat above-mentioned coating process, until obtaining institute
The rectangle linear variable filter needed；
The inner terminal of corresponding glass baseplate 3 coated surface on trim tab a21, just neutralize place, outermost end position workpiece plate 1 time
The circular arc arc length of surface perimeter position uses a respectivelyM、ao、amRepresenting, on trim tab b22, corresponding glass baseplate 3 coated surface is interior
The circular arc arc length holding, just neutralizing place, outermost end position workpiece plate 1 lower surface circumferential position uses b respectivelyM、bo、bmRepresent；
Described trim tab a21 and trim tab b22 is prepared from accordance with the following methods:
I, first calculate the dimensional parameters of theoretical trim tab a and produce theoretical correction sheet a:
Set amTheoretical value, thismValue is the 5-10% of workpiece plate 1 radius size, calculates theory by below equation and repaiies
The a of positive aMAnd aoTheoretical value, and produce this theoretical correction sheet a according to the size of above-mentioned theory trim tab a:
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is workpiece plate 1 center of circle vertical height to evaporation source base plate 4, and L is that evaporation source 5 exists with workpiece plate 1 center of circle
Vertical dimension between the upright projection point of evaporation source base plate 4, r is that workpiece plate 1 center of circle is to sinking that coating materials is deposited on workpiece plate 1
The radius of long-pending test point A, tsFor the thickness of deposition test point A that coating materials is deposited on workpiece plate 1, tosRepresent that coating materials is deposited on work
The thickness at part dish 1 center, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、tsmIt is respectively coating materials deposition
Glass baseplate 3 coated surface inner terminal, just neutralize the thickness of these 3 points of outermost end position；rM、ro、rmRepresent workpiece plate respectively
1 center of circle is deposited on the inner terminal of glass baseplate 3 coated surface to coating materials, just neutralizes the radius of outermost end position；
II, the size acquisition trim tab a21 of examination plated film revised theory trim tab a:
Along diametric(al) fixed placement glass baseplate 3 on workpiece plate lower surface of workpiece plate 1, first by theoretical correction sheet a
It is fixed on the lower section of workpiece plate 1, glass baseplate 3 is blocked, on the coated surface of glass baseplate 3 with this theoretical correction sheet a
Plate the corresponding film plating layer material requested film layer that a layer thickness is 250-300nm, tailing edge workpiece plate 1 diametric(al) measure each
The size of theoretical correction sheet a is modified by the transmitance of coated film deposition test point, it is thus achieved that a of trim tab a21m、aMAnd aoReality
Actual value so that plated film complete after on glass baseplate 3 coated surface along the transmitance numerical value of the diametric each plated film point of workpiece plate
Consistent so that the coating film thickness of this film plating layer is consistent, i.e. complete the making of the trim tab a21 for this kind of Coating Materials；
III, the making of trim tab b: by formula
WithCalculate bM、bm、bo's
Value also produces the trim tab b for this kind of Coating Materials；Wherein, aM、am、aoUse the reality of the trim tab a21 of step II acquisition
Actual value, λM、λo、λmIt is respectively corresponding glass baseplate 3 inner terminal that Film Design requires, the transmitance just neutralizing outermost end position
Corresponding wavelength.
It is media coating that the coated surface of described glass baseplate 3 is plated each film layer.Described media coating is by high refractive index film
The film layer that layer overlaps with low-index film.Described high index film material is Ta2O5、Nb2O5、ZrO2Or TiO2, described low
Refractive index coating materials is SiO2Or MgF2.Described glass baseplate 3 is K9 glass, BK7 glass or fused quartz FS.
The process units that the method for described production rectangle linear variable filter is used, including workpiece plate 1, glass baseplate
3, evaporation source 5 and evaporation source base plate 4；Described workpiece plate 1 is circular plate and can rotate around its central axis；During plated film, glass
Glass base material 3 is fixed on the lower surface of this workpiece plate 1, and down, evaporation source base plate 4 is located at workpiece plate 1 to the coated surface of glass baseplate 3
Lower section, evaporation source 5 is positioned on the upper surface of this evaporation source base plate 4；
1. described glass baseplate 3 is rectangular glass base material；
The most described process units also includes least one set trim tab a21 and trim tab b22, according to the different choosings of institute's film plating layer
Selecting the trim tab a21 and trim tab b22 of corresponding group, described often group trim tab a21 and trim tab b22 is symmetrically placed in workpiece plate 1
Central shaft radially opposite sides and between glass baseplate 3 and evaporation source 5；When workpiece plate 1 drives glass baseplate 3 to rotate, work as glass
When glass base material 3 is respectively through trim tab a21 and trim tab b22 position, evaporation source 5 can be evaporated by trim tab a21 and trim tab b22
Coating materials partial occlusion is to adjust the coating materials distribution on coated surface of this film plating layer；
Described trim tab a21 is to be revised by theoretical correction sheet a and obtain；
The inner terminal of corresponding glass baseplate 3 coated surface on trim tab a21, just neutralize place, outermost end position workpiece plate 1 time
The circular arc arc length of surface perimeter position uses a respectivelyM、ao、amRepresent；Set amValue, thismValue is the 5-of workpiece plate 1 radius size
10%, a of described theoretical correction sheet aMAnd aoTheoretical value is calculated by below equation and obtains:
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is workpiece plate 1 center of circle vertical height to evaporation source base plate 4, and L is that evaporation source 5 exists with workpiece plate 1 center of circle
Vertical dimension between the upright projection point of evaporation source base plate 4, r is that workpiece plate 1 center of circle is to sinking that coating materials is deposited on workpiece plate 1
The radius of long-pending test point A, tsFor the thickness of deposition test point A that coating materials is deposited on workpiece plate 1, tosRepresent that coating materials is deposited on work
The thickness at part dish 1 center, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、tsmIt is respectively coating materials deposition
Glass baseplate 3 coated surface inner terminal, just neutralize the thickness of these 3 points of outermost end position；rM、ro、rmRepresent workpiece plate respectively
1 center of circle is deposited on the inner terminal of glass baseplate 3 coated surface to coating materials, just neutralizes the radius of outermost end position；
The a of trim tab a21M、aoAnd amActual value be to plate a layer thickness and be by examination on glass baseplate 3 coated surface
It is right that the plated material membrane of 250-300nm also comes according to the transmitance measuring each coated film deposition test point along workpiece plate diametric(al)
The a of theoretical correction sheet aM、aoAnd amTheoretical value is modified and obtains, and the trim tab a21 revising gained can make institute's film plating layer
Consistency of thickness；
The inner terminal of corresponding glass baseplate 3 coated surface on described trim tab b, just neutralize place, outermost end position workpiece plate 1
The circular arc arc length of lower surface circumferential position is respectively bM、bo、bm, this bM、bm、boBy formula
WithIt is calculated；Wherein,
aM、am、aoUse the actual value of trim tab a21, λM、λo、λmBe respectively Film Design require corresponding glass baseplate 3 inner terminal,
Just neutralizing the wavelength that the transmitance of outermost end position is corresponding.
The media coating that the coated surface institute film plating layer of described glass baseplate 3 is.Described media coating be high refractive index layer,
Low-index film or by high refractive index layer and low-index film film layer alternately.Described high index film material is
Ta2O5、Nb2O5、ZrO2Or TiO2, described low-refraction coating materials is SiO2Or MgF2.Described glass baseplate 3 is K9 glass, BK7 glass
Glass or fused quartz FS.
Embodiment 1
Target rectangle linear variable filter basic parameter: gradual change leaf length L=50mm, angle of incidence AOI=0 degree, center
Wavelength is 550nm, is incremented to 80% along gradual change leaf length direction transmitance from 20%, linearly changes.
(1) select K9 glass or fused quartz FS as glass baseplate, a length of 50mm of coated surface, coated surface and relatively
Face is polishing；
(2) select the DMD-450 coater that Beijing instrument plant produces, as it is shown in figure 1, workpiece plate be planar rondure around in
Heart rolling clamp, its a diameter of 400mm.Evaporation source is 150mm to vertical dimension L in the workpiece plate center of circle, and the workpiece plate center of circle is to steaming
Vertical height h of base plate of rising is 380mm, and workpiece plate is rotated with edge bearing, and rotating speed is 20r/min；
(3) Film Design: use plated film software TFCalc design linear filter coating, the number of plies of graded films by transmitance with
The steepness of wavelength change confirms, the biggest the used film number of plies of steepness is the most.High-index material is selected in the present embodiment design
TiO2With low-index material SiO2Alternately it is coated on the coated surface of rectangular glass base material, as shown in Figure 3,4, takes during design
550nm falls in the middle of substrate of glass as centre wavelength, transmitance 50%；Maximum of TMFall in the one of substrate of glass
End, the design wavelength of its correspondence is 600nm, and transmitance is 80%；Minima TmFall at the other end of substrate of glass, its correspondence
Design wavelength is 500nm, and transmitance is 20%；Linear dispersion is 2nm/mm.Designed graded films is by 14 layers of film layer group
Become, each film layer according to distance glass baseplate coated surface from being closely followed successively by remote order: the 1st layer-thickness is the TiO of 119.7nm2
Film layer；2nd layer-thickness is the SiO of 83.3nm2Film layer；3rd layer-thickness is the TiO of 50.6nm2Film layer；4th layer-thickness is
94.2nm SiO2Film layer；5th layer-thickness is the TiO of 22.7nm2Film layer；6th layer-thickness is the SiO of 94.2nm2Film layer；7th
Layer-thickness is the TiO of 51.4nm2Film layer；8th layer-thickness is the SiO of 87.5nm2Film layer；9th layer-thickness is 59.8nm's
TiO2Film layer；10th layer-thickness is the SiO of 28.9nm2Film layer；11th layer-thickness is the TiO of 34.8nm2Film layer；12nd layer-thick
Degree is the SiO of 90.6nm2Film layer；13rd layer-thickness is the TiO of 22.7nm2Film layer；14th layer-thickness is the SiO of 127.9nm2
Film layer；
(4) dimensional parameters of theoretical trim tab a is calculated: glass baseplate is placed on workpiece its both ends and center institute
Corresponding interior middle outer radius is respectively 100mm, 125mm, 150mm.By point source film thickness distribution formula
Above formula calculate in workpiece plate correspondence glass baseplate China and foreign countries' film thickness distribution be
0.929tos、0.892tos、0.845tos.Set outer arc length a of trim tab amFor 30mm, according to 0.845tos×(2πrm-am)=
0.892tos×(2πro-ao)=0.929tos×(2πrM-aM), calculate theoretical correction sheet a interior middle arc length aMAnd ao(i.e. aM
And aoTheoretical value) be respectively 76mm and 65mm；
(5) examination plating: adjust the size of trim tab a after trying plating with the size of theoretical correction sheet a, specific as follows: to use glass
Base material plating monofilm test film thickness distribution experiment, i.e. along diametric(al) fixed placement one row on workpiece plate lower surface of workpiece plate
Glass baseplate, is first fixed on the underface of workpiece plate by theoretical correction sheet a, is coated with thickness in monolayer and is on glass baseplate coated surface
The TiO of 250-300nm2Film, tailing edge workpiece plate diametric(al) measure each plated film point transmitance to theoretical correction sheet a size
(i.e. to aM、aoAnd amTheoretical value be modified) be modified so that diametric along workpiece plate on glass baseplate coated surface
The thicknesses of layers of each plated film point is consistent, i.e. completes the making of trim tab a.Can obtain according to the method and be applicable to every kind of different institute
The trim tab a of plating deielectric-coating material, for low-index material SiO2Trim tab a manufacture method ibid.The present embodiment institute
High-index material TiO used2Corresponding this arc length of 3 of trim tab a is respectively 68mm, 60mm, 30mm, low-refraction
Material SiO2Corresponding this arc length of 3 of trim tab a is respectively 81mm, 67mm, 30mm.Trim tab a is del, such as Fig. 2
Shown in；
(6) making of trim tab b: by gained high-index material TiO2With low-index material SiO2Corresponding trim tab
The a of aM、am、aoSubstitute into formulaWith
Calculate to obtain TiO respectively23 b in China and foreign countries in trim tab correspondence substrate of glassM、bo、bmArc length is respectively 104mm, 75mm, 20mm, SiO2
In trim tab, the arc length of 3, China and foreign countries is respectively 87mm, 74mm, 20mm；
(7) trim tab a, b is used to be coated with: trim tab a, b are fixed on the underface of workpiece plate, trim tab a, b's
Down, and trim tab a and trim tab b opposite piece dish is substantially symmetrical about its central axis for block surface.During being coated with, the placement of glass baseplate
Having strict demand, down, coated surface long side direction need to be along the diametric(al) of flat board round piece dish, its this glass for its coated surface
On the trim tab a that the two-end-point of base material is corresponding with it, arc length is am、aMCircular arc and trim tab b on arc length be bm、bMCircle
Arc is on same circumference.Starting evaporation source, workpiece plate drive glass baseplate is with the rotational speed of 20r/min, when glass baseplate 3 warp
Cross trim tab a21 position to be corrected sheet a21 and blocked and carry out for the first time thickness correction, repaiied through trim tab b22 position afterwards
Positive b22 is blocked carries out second time thickness correction, is the most repeatedly modified thickness, i.e. prepares required rectangle linear gradually
Become optical filter.
Method and the device thereof of production rectangle linear variable filter of the present invention are not only limited only to above-mentioned
Embodiment, every any improvement according to the principle of the invention or replacement, all should be within protection scope of the present invention.
Claims (10)
1. the method producing rectangle linear variable filter, it is to be fixed by the glass baseplate (3) for making optical filter
On circular plate and the lower surface of workpiece plate (1) that can rotate around its central axis, make the coated surface court of glass baseplate (3)
Under, evaporation source base plate (4) is set in workpiece plate (1) lower section and is positioned at the evaporation source (5) of evaporation source base plate (4) upper surface, workpiece
Dish (1) drives in glass baseplate (3) rotary course, and the coated surface of glass baseplate (3) is entered by the coating materials evaporated by evaporation source
Row plated film；It is characterized in that:
1. described glass baseplate (3) is rectangular glass base material；
2. before plated film, Film Design is first carried out: according to the centre wavelength of required optical filter, transmitance and along glass base
The transmitance abbe number of material (3) long side direction uses plated film software to carry out Film Design, determines coating layers, plates needed for every layer
Membrane material, every layer of institute's film plating layer are along the film thickness distribution situation of glass baseplate length direction；
3., in coating process, the diametric(al) at long edge workpiece plate (1) of glass baseplate (3) coated surface is made to place；According to institute
Film plating layer selects one group of corresponding trim tab a (21) and trim tab b (22), by right to described trim tab a (21) and trim tab b (22)
Claim be positioned over the central shaft radially opposite sides of workpiece plate (1) and be positioned between glass baseplate (3) and evaporation source (5)；Workpiece plate (1) carries
When dynamic glass baseplate (3) rotates, when glass baseplate (3) is through trim tab a (21) position, by trim tab a (21) to evaporation
The partial occlusion of source (5) evaporation coating materials adjusts the coating materials distribution on this layer of coated surface, it is achieved thicknesses of layers correction for the first time, makes
Coated surface plates the film layer that a layer thickness is consistent, then when glass baseplate (3) is through trim tab b (22) position, by revising
Sheet b (22) adjusts the coating materials distribution on this layer of coated surface to the partial occlusion of evaporation source (5) evaporation coating materials, it is achieved film for the second time
Layer thickness correction, is modified along the thickness distribution situation of glass baseplate length direction institute's film plating layer, and so circulation is the most extremely
Complete being coated with of corresponding tunic layer；Select one group of new corresponding trim tab a (21) according to next layer of institute's film plating layer and repair afterwards
Positive b (22) repeats above-mentioned coating process, until the rectangle linear variable filter needed for Huo get ing；
The inner terminal of upper corresponding glass baseplate (3) coated surface of trim tab a (21), just neutralize place, outermost end position workpiece plate (1)
The circular arc arc length of lower surface circumferential position uses a respectivelyM、ao、amRepresent, upper corresponding glass baseplate (3) coated surface of trim tab b (22)
Inner terminal, the circular arc arc length that just neutralizes place, outermost end position workpiece plate (1) lower surface circumferential position use b respectivelyM、bo、bmGeneration
Table；
Described trim tab a (21) and trim tab b (22) are prepared from accordance with the following methods:
I, first calculate the dimensional parameters of theoretical trim tab a and produce theoretical correction sheet a:
Set amTheoretical value, thismValue is the 5-10% of workpiece plate (1) radius size, calculates theoretical correction by below equation
The a of sheet aMAnd aoTheoretical value, and produce this theoretical correction sheet a according to the size of above-mentioned theory trim tab a:
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is workpiece plate (1) center of circle vertical height to evaporation source base plate (4), and L is evaporation source (5) and workpiece plate (1) circle
Heart vertical dimension between the upright projection point of evaporation source base plate (4), r is that workpiece plate (1) center of circle is deposited on workpiece to coating materials
The radius of deposition test point A on dish (1), tsFor the thickness of deposition test point A that coating materials is deposited on workpiece plate (1), tosTable
Show that coating materials is deposited on the thickness at workpiece plate (1) center, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、
tsmIt is respectively coating materials to be deposited on the inner terminal of glass baseplate (3) coated surface, just neutralize the thickness of these 3 points of outermost end position；rM、
ro、rmRepresent that workpiece plate (1) center of circle is deposited on the inner terminal of glass baseplate (3) coated surface to coating materials, just neutralizes outermost end position respectively
The radius put；
II, size acquisition trim tab a (21) of examination plated film revised theory trim tab a:
Along diametric(al) fixed placement glass baseplate (3) on workpiece plate lower surface of workpiece plate (1), first by theoretical correction sheet a
It is fixed on the lower section of workpiece plate (1), glass baseplate (3) is blocked, in the plating of glass baseplate (3) with this theoretical correction sheet a
Plate the corresponding film plating layer material requested film layer that a layer thickness is 250-300nm on face, tailing edge workpiece plate (1) diametric(al)
The size of theoretical correction sheet a is modified by the transmitance measuring each coated film deposition test point, it is thus achieved that trim tab a's (21)
am、aMAnd aoActual value so that plated film complete after on glass baseplate (3) coated surface along the diametric each plated film of workpiece plate
The transmitance numerical value of point is consistent so that the coating film thickness of this film plating layer is consistent, i.e. completes the trim tab for this kind of Coating Materials
The making of a (21)；
III, the making of trim tab b: by formula
With
Calculate bM、bm、boValue and produce the trim tab b for this kind of Coating Materials；Wherein, aM、am、aoEmploying step II obtains
The actual value of trim tab a (21), λM、λo、λmIt is respectively corresponding glass baseplate (3) inner terminal of Film Design requirement, just neutralizes
The wavelength that the transmitance of outermost end position is corresponding.
The method of production rectangle linear variable filter the most according to claim 1, it is characterised in that: described glass baseplate
(3) it is media coating that coated surface is plated each film layer.
The method of production rectangle linear variable filter the most according to claim 2, it is characterised in that: described media coating
For the film layer overlapped by high refractive index layer and low-index film.
The method of production rectangle linear variable filter the most according to claim 3, it is characterised in that: described high index of refraction
Coating materials is Ta2O5、Nb2O5、ZrO2Or TiO2, described low-refraction coating materials is SiO2Or MgF2。
The method of production rectangle linear variable filter the most according to claim 1, it is characterised in that: described glass baseplate
(3) it is K9 glass, BK7 glass or fused quartz FS.
6. the production dress used according to the method producing rectangle linear variable filter described in any one of claim 1-5
Put, including workpiece plate (1), glass baseplate (3), evaporation source (5) and evaporation source base plate (4)；Described workpiece plate (1) is circular flat board
Shape and rotating around its central axis；During plated film, glass baseplate (3) is fixed on the lower surface of this workpiece plate (1), glass baseplate
(3) down, evaporation source base plate (4) is located at workpiece plate (1) lower section to coated surface, and evaporation source (5) is positioned at this evaporation source base plate (4)
On upper surface；It is characterized in that:
1. described glass baseplate (3) is rectangular glass base material；
The most described process units also includes least one set trim tab a (21) and trim tab b (22), according to the different choosings of institute's film plating layer
Select the trim tab a (21) and trim tab b (22) of corresponding group, described often organize trim tab a (21) and trim tab b (22) symmetrically placed in
The central shaft radially opposite sides of workpiece plate (1) are also positioned between glass baseplate (3) and evaporation source (5)；Workpiece plate (1) drives glass base
Material (3) rotate time, when glass baseplate (3) is respectively through trim tab a (21) and trim tab b (22) position, trim tab a (21) and
Trim tab b (22) can be to evaporation source (5) evaporation coating materials partial occlusion to adjust the coating materials distribution on coated surface of this film plating layer；
Described trim tab a (21) is to be revised by theoretical correction sheet a and obtain；
The inner terminal of upper corresponding glass baseplate (3) coated surface of trim tab a (21), just neutralize place, outermost end position workpiece plate (1)
The circular arc arc length of lower surface circumferential position uses a respectivelyM、ao、amRepresent；Set amValue, thismValue is workpiece plate (1) radius size
5-10%, a of described theoretical correction sheet aMAnd aoTheoretical value is calculated by below equation and obtains:
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is workpiece plate (1) center of circle vertical height to evaporation source base plate (4), and L is evaporation source (5) and workpiece plate (1) circle
Heart vertical dimension between the upright projection point of evaporation source base plate (4), r is that workpiece plate (1) center of circle is deposited on workpiece to coating materials
The radius of deposition test point A on dish (1), tsFor the thickness of deposition test point A that coating materials is deposited on workpiece plate (1), tosTable
Show that coating materials is deposited on the thickness at workpiece plate (1) center, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、
tsmIt is respectively coating materials to be deposited on the inner terminal of glass baseplate (3) coated surface, just neutralize the thickness of these 3 points of outermost end position；rM、
ro、rmRepresent that workpiece plate (1) center of circle is deposited on the inner terminal of glass baseplate (3) coated surface to coating materials, just neutralizes outermost end position respectively
The radius put；
The a of trim tab a (21)M、aoAnd amActual value be to plate a layer thickness and be by examination on glass baseplate (3) coated surface
It is right that the plated material membrane of 250-300nm also comes according to the transmitance measuring each coated film deposition test point along workpiece plate diametric(al)
The a of theoretical correction sheet aM、aoAnd amTheoretical value is modified and obtains, and the trim tab a (21) revising gained can make institute's film plating layer
Consistency of thickness；
The inner terminal of corresponding glass baseplate (3) coated surface on described trim tab b, just neutralize place, outermost end position workpiece plate (1)
The circular arc arc length of lower surface circumferential position is respectively bM、bo、bm, this bM、bm、boBy formula
WithIt is calculated；Wherein,
aM、am、aoUse the actual value of trim tab a (21), λM、λo、λmThe corresponding glass baseplate (3) being respectively Film Design requirement is interior
Hold, just neutralize the wavelength that the transmitance of outermost end position is corresponding.
Process units the most according to claim 6, it is characterised in that: the coated surface institute film plating layer of described glass baseplate (3)
For media coating.
Process units the most according to claim 7, it is characterised in that: described media coating is high refractive index layer, low folding
Penetrate rate film layer or by high refractive index layer and low-index film film layer alternately.
Process units the most according to claim 8, it is characterised in that: described high index film material is Ta2O5、Nb2O5、ZrO2
Or TiO2, described low-refraction coating materials is SiO2Or MgF2。
Process units the most according to claim 6, it is characterised in that: described glass baseplate (3) is K9 glass, BK7 glass
Or fused quartz FS.
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| CN117721421A (en) * | 2024-02-07 | 2024-03-19 | 成都国泰真空设备有限公司 | Device and method for eliminating layering phenomenon of film-forming spectroscopic curve at low temperature |
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