CN105870155A - OLED display panel and making method thereof - Google Patents
OLED display panel and making method thereof Download PDFInfo
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- CN105870155A CN105870155A CN201610297017.7A CN201610297017A CN105870155A CN 105870155 A CN105870155 A CN 105870155A CN 201610297017 A CN201610297017 A CN 201610297017A CN 105870155 A CN105870155 A CN 105870155A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
- H10K59/1315—Interconnections, e.g. wiring lines or terminals comprising structures specially adapted for lowering the resistance
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Abstract
The invention provides an OLED display panel. The OLED display panel comprises a substrate, a metal grid conducting layer composited on the substrate, an anode layer composited on the metal grid conducting layer, a hole injection layer composited on the anode layer, a hole transporting layer composited on the hole injection layer, an organic light emitting layer composited on the hole transporting layer, an electron transporting layer composited on the organic light emitting layer and a cathode layer composited on the electron transporting layer. According to the OLED display panel, the metal grid conducting layer is introduced into the portion between the substrate and the anode layer, the conductivity between the metal grid conducting layer and the anode layer is increased, resistance distribution is more uniform, and light emission is more uniform. It is indicated through experimental results that, by adopting a point-by-point calculation method, light emission uniformity can reach 0.87 or above, and the uniformity of an ordinary OLED is only about 0.8. The invention further provides a making method of the OLED display panel.
Description
Technical field
The invention belongs to optics Display Technique field, particularly relate to a kind of OLED display panel and preparation side thereof
Method.
Background technology
In touch screen display panel, OLED (Organic Light Emitting Diode, Organic Light-Emitting
Diode, OLED)) as a kind of brand-new Display Technique, production cost only has common display technology TFT
About three to four one-tenth of LCD, and after being energized will oneself is luminous, the weighing body of fluorescent tube can be saved
Long-pending and the power consumption half of whole LCD screen (the fluorescent tube power consumption almost account for), not only allows product thickness only
Surplus two cm, operate lower to 2 to 10 volts of voltage, add the reaction time (less than 10ms) of OLED
And color is all outstanding than TFT LCD, OLED more has flexible characteristic, makes its range of application the widest.
But, for current large-area OLEDs display floater, owing to vertical-horizontal distribution of resistance is uneven,
Therefore apply central area and the fringe region difference of OLED display panel during electric current, cause existing
There is the defect of obvious non-uniform light in OLED display panel.
Summary of the invention
It is an object of the invention to provide a kind of OLED display panel, the OLED display panel in the present invention
Luminous uniform.
The present invention provides a kind of OLED display panel, including substrate；
Compound metal grill conductive layer on the substrate；
It is compounded in the anode layer on described metal grill conductive layer；
It is compounded in the hole injection layer on described anode layer；
It is compounded in the hole transmission layer on described hole injection layer；
Compound organic luminous layer on the hole transport layer；
It is compounded in the electron transfer layer on described organic luminous layer；
With compound cathode layer on the electron transport layer.
Preferably, described metal grill conductive layer is made up of the component including following parts by weight:
Epoxy acrylate: 50～85 parts；Diluent: 5～15 parts；Curing agent: 1～8 part；Light trigger:
3～20 parts, nano metal: 55～80 parts.
Preferably, described diluent includes expoxy propane；
Described curing agent includes triethanolamine；
Described light trigger includes 2,4,6 (trimethylbenzoyl) diphenyl phosphine oxide；
Described nano metal includes nano metal line or nano-metal particles.
Preferably, the thickness of described metal grill conductive layer is 0.1～50 μm.
Preferably, in described metal grill conductive layer mesh shape be square, rectangle, rhombus, three
Dihedral or hexagon.
Preferably, in described metal grill conductive layer, the area of grid is (1.6 × 103～40 × 103)nm2。
The present invention provides the preparation method of a kind of OLED display panel, comprises the following steps:
A) nano metal slurry it is coated on substrate surface and solidifies, obtaining being compounded with metal grill conductive layer
Substrate；
B) it is sequentially prepared anode layer, hole injection layer, hole transport at described metal grill conductive layer surface
Layer, organic luminous layer, electron transfer layer and cathode layer, obtain OLED display panel.
Preferably, described step A) particularly as follows:
The cylinder being attached with nano metal slurry is rolled on substrate, obtains being coated with grid-shaped metal slurry
The substrate of material, the substrate being coated with grid-shaped metal slurry carries out ultraviolet light polymerization, obtains being compounded with gold
Belong to the substrate of grid conducting layer.
Preferably, the exposure intensity of described ultraviolet light polymerization is 800～1200W/cm2；
The time of described ultraviolet light polymerization is 5～20s.
Preferably, described step A) and step B) between further comprising the steps of:
Being toasted by the substrate being compounded with metal grill conductive layer, the temperature of described baking is
100～150 DEG C；
The time of described baking is 1～20s.
The invention provides a kind of OLED display panel, including substrate；Compound gold on the substrate
Belong to grid conducting layer；It is compounded in the anode layer on described metal grill conductive layer；It is compounded in described anode layer
On hole injection layer；It is compounded in the hole transmission layer on described hole injection layer；It is compounded in described hole
Organic luminous layer in transport layer；It is compounded in the electron transfer layer on described organic luminous layer；Be compounded in
Cathode layer on described electron transfer layer.The present invention introduces metal grill between substrate and anode layer and leads
Electric layer, adds the electric conductivity between anode so that evenly, luminescence is the most equal for its distribution of resistance
Even.Test result indicate that, using point-by-point method, Luminescence Uniformity can reach more than 0.87, commonly
The OLED uniformity only has about 0.8.
Accompanying drawing explanation
In order to be illustrated more clearly that the embodiment of the present invention or technical scheme of the prior art, below will be to reality
Execute the required accompanying drawing used in example or description of the prior art to be briefly described, it should be apparent that below,
Accompanying drawing in description is only embodiments of the invention, for those of ordinary skill in the art, not
On the premise of paying creative work, it is also possible to obtain other accompanying drawing according to the accompanying drawing provided.
Fig. 1 is the structural representation of OLED display panel in the present invention；
Fig. 2 is the structural representation of the structure cylinder used in the embodiment of the present invention 1；
Fig. 3 is the metal grill conductive coating structure schematic diagram that the embodiment of the present invention 1 obtains.
Detailed description of the invention
The invention provides a kind of OLED luminescent panel, including substrate；
Compound metal grill conductive layer on the substrate；
It is compounded in the anode layer on described metal grill conductive layer；
It is compounded in the hole injection layer on described anode layer；
It is compounded in the hole transmission layer on described hole injection layer；
Compound organic luminous layer on the hole transport layer；
It is compounded in the electron transfer layer on described organic luminous layer；
With compound cathode layer on the electron transport layer.
The OLED display panel luminescence that the present invention provides is evenly.
Seeing Fig. 1, Fig. 1 is the structural representation of OLED display panel in the present invention.In the present invention,
Described substrate is preferably glass substrate, uses the glass substrate of material commonly used in the art, the present invention couple
This does not has special restriction.
In the present invention, the thickness of described metal grill conductive layer is preferably 0.1～50 μm, more preferably
1～45 μm, most preferably 5～40 μm, concrete, in an embodiment of the present invention, can be 15 μ
M or 20 μm；In described metal grill conductive layer, grid is preferably shaped to square, rectangle, water chestnut
Shape, triangle or hexagon, the area of described grid is preferably (1.6 × 103～40 × 103)nm2, more excellent
Elect (5.0 × 10 as3～35 × 103)nm2, most preferably (10.0 × 103～30 × 103)nm2, concrete,
In embodiments of the invention, can be 14.4 × 103nm2、22.5×103nm2Or 10 × 103nm2；As,
When mesh shape is square, the length of side of grid is preferably 40～200nm, more preferably 50～180nm,
Most preferably 80～150nm.Concrete, in an embodiment of the present invention, the square length of side can be 100nm,
120nm or 150nm.Traditional OLED anode is the ITO material with transparent semiconductor feature,
In the case of energising, plane overall potential is variant, after plus conducting metal grid, owing to having preferably
Electric conductivity, the electromotive force between plane each several part is more uniform, thus obtains uniform illumination effect.
In the present invention, described metal grill conductive layer is preferably made up of the component including following parts by weight,
Epoxy acrylate: 50～85 parts；Diluent: 5～15 parts；Curing agent: 1～8 part；Light trigger: 3～20
Part, nano metal: 55～80 parts.
In the present invention, the parts by weight of described epoxy acrylate are preferably 55～80 parts, more preferably
60～75 parts, most preferably 65～70 parts；The number-average molecular weight of described epoxy acrylate is preferably
5000～20000, more preferably 6000～18000, most preferably 8000～15000；Described epoxy acrylic
The viscosity of fat is preferably 3000～5000cps, more preferably 3500～4500cps.Described diluent preferably wraps
Include expoxy propane；The parts by weight of described diluent are preferably 7～14 parts, more preferably 8～13 parts,
It is preferably 9～12 parts；Described curing agent preferably includes triethanolamine；The parts by weight of described curing agent are preferred
It is 2～7 parts, more preferably 3～6 parts, most preferably 4～5 parts；Described light trigger preferably includes 2,4,6 (three
Methyl benzoyl) diphenyl phosphine oxide；The parts by weight of described light trigger are preferably 5～18 parts, more excellent
Elect 7～16 parts as, most preferably 8～15 parts；Described nano metal preferably includes nano metal line or nanometer
Metal particle, more preferably includes the one in nano-silver thread, NANO CRYSTAL COPPER WIRE, copper nanoparticle and nano-silver powder
Or several, the diameter of described nano metal line is preferably 20～50nm, more preferably 25～45nm, optimum
Elect 30～40nm as；The particle diameter of described nano-metal particles is preferably 20～50nm, more preferably 25～45nm,
Most preferably 30～40nm.
In the present invention, the material of described anode layer preferably includes tin indium oxide；The thickness of described anode layer
It is preferably 10～200 μm, more preferably 20～180 μm, most preferably 50～150 μm.Described hole
The material of implanted layer is preferably fluorescent dye compound, more preferably includes Alq (hydroxyquinoline aluminum), Znq
(hydroxyquinoline zinc)；The thickness of described hole injection layer is preferably 10～200 μm, more preferably 20～180
μm, most preferably 50～150 μm.The material of described hole transmission layer is preferably aromatic amine fluorescent compounds,
More preferably include TPD and/or TDATA；The thickness of described hole transmission layer is preferably 10～200 μm,
More preferably 20～180 μm, most preferably 50～150 μm.The material of described organic luminous layer is preferably wrapped
Include DPVBi；The thickness of described organic luminous layer is preferably 10～200 μm, more preferably 20～180 μm,
Most preferably 50～150 μm.The material of described electron transfer layer preferably includes OXD and/or BND；Institute
The thickness stating electron transfer layer is preferably 10～200 μm, more preferably 20～180 μm, is most preferably
50～150 μm.The material of described cathode layer preferably includes silver and/or magnesium；The thickness of described cathode layer is preferred
It is 10～200 μm, more preferably 20～180 μm, most preferably 50～150 μm.
Present invention also offers the preparation method of a kind of OLED display panel, comprise the following steps；
A) nano metal slurry it is coated on substrate surface and solidifies, obtaining being compounded with metal grill conductive layer
Substrate；
B) it is sequentially prepared anode layer, hole injection layer, hole transport at described metal grill conductive layer surface
Layer, organic luminous layer, electron transfer layer and cathode layer, obtain OLED display panel.
The cylinder being attached with nano metal slurry is preferably rolled on substrate by the present invention, obtains being coated with net
The substrate of trellis metal paste, the substrate being coated with grid-shaped metal slurry carries out ultraviolet light polymerization,
To the substrate being compounded with metal grill conductive layer.
In the present invention, the composition of described nano metal slurry and metal grill conduction in technique scheme
Layer to prepare raw material consistent, do not repeat them here.Described cylinder preferably has the rolling of grid bulge-structure
Cylinder, it is also possible to be the cylinder with striped bulge-structure, such as the cylinder with horizontal stripe bulge-structure, is rolling
After moving substrate one time, substrate forms the metal paste of horizontal stripe structure, after solidification, substrate is rotated
90 °, then roll one time, i.e. form the metal paste of square grids structures, then solidify, to obtain final product
Metal grill conductive layer to square grids structures.
In the present invention, the speed of described employing cylinder coating nano metal slurry is preferably 0.5～2m/min,
More preferably 1m/min；Gap between described nano metal slurry is preferably 1mm.
The present invention preferably being coated with the substrate of grid-shaped metal slurry after levelling is smooth, utilizes UV
Lamp (ultraviolet lamp) carries out photocuring, and the exposure intensity of described ultraviolet light is preferably 800～1200W/cm2,
More preferably 900～1100W/cm2, most preferably 1000W/cm2；The time of described photocuring is preferably
5～20s, more preferably 8～15s, most preferably 10～12s.
After completing the solidification of nano metal slurry, the present invention is preferably coated with nano metal grid slurry
Substrate toasts, and obtains being compounded with the substrate of metal grill conductive layer, and the time of described baking is preferably
1～20s, more preferably 5～15s, most preferably 10～12s；The temperature of described baking is preferably 100～150 DEG C,
More preferably 120～140 DEG C.
Present invention preferably employs chemical gaseous phase deposition or the mode of evaporation, smooth on metal grill conductive layer
Deposition anode material, form anode layer, the material of described anode material and technique scheme Anodic layer
Material is consistent, does not repeats them here.In the present invention, the basic pressure of described evaporation is preferably 1～10Pa,
More preferably 2～8Pa, most preferably 3～7Pa；The operating pressure of described evaporation is preferably 5～20pa, more excellent
Elect 10～15Pa as；The heating-up temperature of described evaporation is preferably 1000～1200 DEG C, more preferably
1050～1150 DEG C；The time of described evaporation is preferably 20～35min, most preferably 25～30min.
The method that present invention preferably employs evaporation is sequentially prepared hole injection layer, hole transport on the anode layer
Layer, organic luminous layer, electron transfer layer and cathode layer, described hole injection layer, hole transmission layer,
The raw material of preparing of organic luminous layer, electron transfer layer and cathode layer injects with hole in technique scheme
Layer, hole transmission layer, organic luminous layer, the material of electron transfer layer and cathode layer is consistent, at this not
Repeat again.In the present invention, the basic pressure of described evaporation is preferably 1～10Pa, more preferably 2～8Pa,
Most preferably 3～7Pa；The operating pressure of described evaporation is preferably 5～20pa, more preferably 10～15Pa；Institute
The heating-up temperature stating evaporation is preferably 300～500 DEG C, more preferably 350～450 DEG C；The time of described evaporation
It is preferably 20～40min, most preferably 25～35min.
The present invention tests the uniformity of luminance of OLED display panel in the present invention according to point-by-point method,
Result shows, the Luminescence Uniformity of the OLED display panel in the present invention reaches more than 0.87.
The invention provides a kind of OLED display panel, including substrate；Compound gold on the substrate
Belong to grid conducting layer；It is compounded in the anode layer on described metal grill conductive layer；It is compounded in described anode layer
On hole injection layer；It is compounded in the hole transmission layer on described hole injection layer；It is compounded in described hole
Organic luminous layer in transport layer；It is compounded in the electron transfer layer on described organic luminous layer；Be compounded in
Cathode layer on described electron transfer layer.The present invention introduces metal grill between substrate and anode layer and leads
Electric layer, adds the electric conductivity between anode so that evenly, luminescence is the most equal for its distribution of resistance
Even.Test result indicate that, using point-by-point method, Luminescence Uniformity can reach more than 0.87, commonly
The OLED uniformity only has about 0.8.
Present invention also offers the preparation method of a kind of OLED display panel, the preparation method in the present invention
Have employed wet coating technique, forming method is simple, and efficiency is high.
In order to further illustrate the present invention, a kind of OLED provided the present invention below in conjunction with embodiment shows
Show that panel and preparation method thereof is described in detail, but can not be understood as scope
Limit.
Embodiment 1
According to following weight preparation of nano metal paste:
Epoxy acrylate: 80 parts；Expoxy propane: 10 parts；Triethanolamine: 1.5 parts；2,4,6 (front threes
Base benzoyl) diphenyl phosphine oxide: 10 parts, nano-silver thread: 70 parts.
S1, using glass substrate as coated face, utilizes running roller to drive and carries out planar movement, and translational speed is
1m/min；
S2, it is same that running roller drives glass substrate to utilize surface to carry out with the cylinder that travers are protruding after moving
Step rolls (seeing the structural representation that Fig. 2, Fig. 2 are the structure cylinder used in the embodiment of the present invention 1),
Be applied to laterally homogeneous for nano metal slurry on glass substrate, wherein, between nano metal slurry between
Gap is 1mm；
S3, nano metal slurry is coated with on the glass substrate after levelling is smooth, utilizes UV lamp to carry out
Photocuring, the illumination of the face light of UV lamp is 1000W/cm2, hardening time is 10 seconds；
S4, by above-mentioned the most coated and cured after glass substrate half-twist after again driven again by running roller
Secondary through carrying out the most coated and cured with the cylinder of surface texture, the illumination of the face light of UV lamp is
1000W/cm2, hardening time is 10 seconds；
S5, by above-mentioned complete to be coated with in length and breadth after formed square-shaped metal grid glass substrate be delivered into baking oven
Inside carrying out toasting 10s, baking temperature is 120 DEG C, obtains using wet coating technique to plate on the glass substrate
On one layer of nano metal grid conducting layer, conductive layer thickness 20 μm；Net cross-section is shaped as pros
Shape, square length of side 100nm.As it is shown on figure 3, Fig. 3 is the wire netting that the embodiment of the present invention 1 obtains
Lattice conductive coating structure schematic diagram.
S6, utilizes the mode that chemical gaseous phase deposits, smooth deposition anode material on metal grill conductive layer,
Selected materials is tin indium oxide；Chemical vapor deposition conditions: basic pressure 5Pa, operating pressure 15Pa,
Heating-up temperature 1200 DEG C, sedimentation time 30min.
S7, is finally sequentially prepared hole injection layer on anode material, hole transmission layer, organic luminous layer,
Electron transfer layer and negative electrode, this OLED display panel has i.e. manufactured.Hole injection layer uses Alq,
Thickness is 15 μm；The material of hole transmission layer is TPD, and thickness is 15 μm；Light emitting layer material
For DPVBi, thickness is 20 μm；Electron transport layer materials is OXD, and thickness is 10 μm；Hole is noted
Enter layer, hole transmission layer, organic luminous layer and electron transfer layer and all use the mode plated film of evaporation, negative electrode
Layer material is silver, and thickness is 5 μm.Evaporation condition: basic pressure 7Pa, operating pressure 10Pa, heating
Temperature 400 DEG C, is deposited with time 30min.
After tested, in the present embodiment, the uniformity of luminance of OLED display panel is 0.9.
Embodiment 2
According to following weight preparation of nano metal paste:
Epoxy acrylate: 80 parts；Expoxy propane: 10 parts；Triethanolamine: 2 parts；2,4,6 (trimethyls
Benzoyl) diphenyl phosphine oxide: 10 parts, nano-silver thread: 60 parts.
S1, using glass substrate as coated face, utilizes running roller to drive and carries out planar movement, and translational speed is
1m/min；
S2, it is same that running roller drives glass substrate to utilize surface to carry out with the cylinder that travers are protruding after moving
Step rolls, and is applied to laterally homogeneous for nano metal slurry on glass substrate, wherein, and nano metal slurry
Between gap be 1mm；
S3, nano metal slurry is coated with on the glass substrate after levelling is smooth, utilizes UV lamp to carry out
Photocuring, the illumination of the face light of UV lamp is 1000W/cm2, hardening time is 10 seconds；
S4, by above-mentioned the most coated and cured after glass substrate half-twist after again driven again by running roller
Secondary through carrying out the most coated and cured with the cylinder of surface texture, the illumination of the face light of UV lamp is
1000W/cm2, hardening time is 10 seconds；
S5, by above-mentioned complete to be coated with in length and breadth after formed square-shaped metal grid glass substrate be delivered into baking oven
Inside carrying out toasting 10s, baking temperature is 120 DEG C, obtains using wet coating technique to plate on the glass substrate
On one layer of nano metal grid conducting layer, conductive layer thickness 15 μm；Net cross-section is shaped as pros
Shape, square length of side 150nm..
S6, utilizes the mode that chemical gaseous phase deposits, smooth deposition anode material on metal grill conductive layer,
Selected materials is tin indium oxide；Chemical vapor deposition conditions: basic pressure 2Pa, operating pressure 5Pa, adds
Hot temperature 1000 DEG C, sedimentation time 35min.
S7, is finally sequentially prepared hole injection layer on anode material, hole transmission layer, organic luminous layer,
Electron transfer layer and negative electrode, this OLED display panel has i.e. manufactured.Hole injection layer uses Alq,
Thickness is 15 μm；The material of hole transmission layer is TPD, and thickness is 15 μm；Light emitting layer material
For DPVBi, thickness is 20 μm；Electron transport layer materials is OXD, and thickness is 10 μm；Hole is noted
Enter layer, hole transmission layer, organic luminous layer and electron transfer layer and all use the mode plated film of evaporation, negative electrode
Layer material is silver, and thickness is 5 μm.Evaporation condition: basic pressure 2Pa, operating pressure 5Pa, heating
Temperature 300 DEG C, is deposited with time 40min.
After tested, in the present embodiment, the uniformity of luminance of OLED display panel is 0.87.
Embodiment 3
According to following weight preparation of nano metal paste:
Epoxy acrylate: 80 parts；Expoxy propane: 10 parts；Triethanolamine: 1.5 parts；2,4,6 (front threes
Base benzoyl) diphenyl phosphine oxide: 10 parts, nano-silver thread: 70 parts.
S1, using glass substrate as coated face, utilizes running roller to drive and carries out planar movement, and translational speed is
1m/min；
S2, it is same that running roller drives glass substrate to utilize surface to carry out with the cylinder that travers are protruding after moving
Step rolls, and is applied to laterally homogeneous for nano metal slurry on glass substrate, wherein, and nano metal slurry
Between gap be 1mm；
S3, nano metal slurry is coated with on the glass substrate after levelling is smooth, utilizes UV lamp to carry out
Photocuring, the illumination of the face light of UV lamp is 1000W/cm2, hardening time is 10 seconds；
S4, by above-mentioned the most coated and cured after glass substrate half-twist after again driven again by running roller
Secondary through carrying out the most coated and cured with the cylinder of surface texture, the illumination of the face light of UV lamp is
1000W/cm2, hardening time is 10 seconds；
S5, by above-mentioned complete to be coated with in length and breadth after formed square-shaped metal grid glass substrate be delivered into baking oven
Inside carrying out toasting 10s, baking temperature is 120 DEG C, obtains using wet coating technique to plate on the glass substrate
On one layer of nano metal grid conducting layer, conductive layer thickness 20 μm；Net cross-section is shaped as pros
Shape, square length of side 120nm.
S6, utilizes the mode that chemical gaseous phase deposits, smooth deposition anode material on metal grill conductive layer,
Selected materials is tin indium oxide；Chemical vapor deposition conditions: basic pressure 10Pa, operating pressure 20Pa,
Heating-up temperature 1100 DEG C, sedimentation time 20min.
S7, is finally sequentially prepared hole injection layer on anode material, hole transmission layer, organic luminous layer,
Electron transfer layer and negative electrode, this OLED display panel has i.e. manufactured.Hole injection layer uses Alq,
Thickness is 15 μm；The material of hole transmission layer is TPD, and thickness is 15 μm；Light emitting layer material
For DPVBi, thickness is 20 μm；Electron transport layer materials is OXD, and thickness is 10 μm；Hole is noted
Enter layer, hole transmission layer, organic luminous layer and electron transfer layer and all use the mode plated film of evaporation, negative electrode
Layer material is silver, and thickness is 5 μm.Evaporation condition: basic pressure 10Pa, operating pressure 20Pa, adds
Hot temperature 500 DEG C, is deposited with time 20min.
After tested, in the present embodiment, the uniformity of luminance of OLED display panel is 0.89.
The above is only the preferred embodiment of the present invention, it is noted that general for the art
For logical technical staff, under the premise without departing from the principles of the invention, it is also possible to make some improvement and profit
Decorations, these improvements and modifications also should be regarded as protection scope of the present invention.
Claims (10)
1. an OLED display panel, including substrate；
Compound metal grill conductive layer on the substrate；
It is compounded in the anode layer on described metal grill conductive layer；
It is compounded in the hole injection layer on described anode layer；
It is compounded in the hole transmission layer on described hole injection layer；
Compound organic luminous layer on the hole transport layer；
It is compounded in the electron transfer layer on described organic luminous layer；
With compound cathode layer on the electron transport layer.
OLED display panel the most according to claim 1, it is characterised in that described metal grill
Conductive layer is made up of the component including following parts by weight:
Epoxy acrylate: 50～85 parts；Diluent: 5～15 parts；Curing agent: 1～8 part；Light trigger:
3～20 parts, nano metal: 55～80 parts.
OLED display panel the most according to claim 2, it is characterised in that described diluent bag
Include expoxy propane；
Described curing agent includes triethanolamine；
Described light trigger includes 2,4,6 (trimethylbenzoyl) diphenyl phosphine oxide；
Described nano metal includes nano metal line or nano-metal particles.
OLED display panel the most according to claim 1, it is characterised in that described metal grill
The thickness of conductive layer is 0.1～50 μm.
OLED display panel the most according to claim 1, it is characterised in that described metal grill
In conductive layer, mesh shape is square, rectangle, rhombus, triangle or hexagon.
OLED display panel the most according to claim 5, it is characterised in that described metal grill
In conductive layer, the area of grid is (1.6 × 103～40 × 103)nm2。
7. a preparation method for OLED display panel, comprises the following steps:
A) nano metal slurry it is coated on substrate surface and solidifies, obtaining being compounded with metal grill conductive layer
Substrate；
B) it is sequentially prepared anode layer, hole injection layer, hole transport at described metal grill conductive layer surface
Layer, organic luminous layer, electron transfer layer and cathode layer, obtain OLED display panel.
Preparation method the most according to claim 7, it is characterised in that described step A) particularly as follows:
The cylinder being attached with nano metal slurry is rolled on substrate, obtains being coated with grid-shaped metal slurry
The substrate of material, the substrate being coated with grid-shaped metal slurry carries out ultraviolet light polymerization, obtains being compounded with gold
Belong to the substrate of grid conducting layer.
Preparation method the most according to claim 8, it is characterised in that the photograph of described ultraviolet light polymerization
Penetrating intensity is 800～1200W/cm2；
The time of described ultraviolet light polymerization is 5～20s.
Preparation method the most according to claim 7, it is characterised in that described step A) and step
Rapid B) between further comprising the steps of:
Being toasted by the substrate being compounded with metal grill conductive layer, the temperature of described baking is
100～150 DEG C；
The time of described baking is 1～20s.
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| CN201610297017.7A CN105870155A (en) | 2016-05-05 | 2016-05-05 | OLED display panel and making method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110034155A (en) * | 2017-11-29 | 2019-07-19 | 乐金显示有限公司 | Oled panel and its manufacturing method for lighting device |
Citations (4)
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