CN105800548A - Device for fixed-point transferring of single-layer two-dimensional material - Google Patents
Device for fixed-point transferring of single-layer two-dimensional material Download PDFInfo
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- CN105800548A CN105800548A CN201610287837.8A CN201610287837A CN105800548A CN 105800548 A CN105800548 A CN 105800548A CN 201610287837 A CN201610287837 A CN 201610287837A CN 105800548 A CN105800548 A CN 105800548A
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- dimensional material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C3/00—Assembling of devices or systems from individually processed components
- B81C3/001—Bonding of two components
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Abstract
The invention discloses a device for fixed-point transferring of a single-layer two-dimensional material. Traditional flat glass is replaced with curved glass with a rectangular through hole in the middle; an anti-skid fixed handle with sawteeth is added to one end of the curved glass; and the middle hole in the curved glass is used for dipping the single-layer two-dimensional material. A polymer layer thin film is flat and is in effective contact with the single-layer two-dimensional material without a buffer, so that the fixed-point transferring of the single-layer two-dimensional material is achieved.
Description
Technical field
The present invention relates to the operation of the monolayer two-dimensional material to micron order size, be related specifically to the device that the monolayer two-dimensional material of the mechanical stripping to micron order size shifts.In order to realize the transfer of monolayer two-dimensional material, and devise this device.
Background technology
Two-dimensional material includes Graphene, black phosphorus, molybdenum bisuphide, two selenizing molybdenums, tungsten disulfide, BN etc..They, due to the space structure of its uniqueness and electric property and thermal property, get the attention in industrial circle.At present, the main preparation methods of monolayer two-dimensional material has: mechanical stripping method, chemical stripping method, chemical vapor deposition (CVD) method etc..Although CVD growth monolayer two-dimensional material is achieving very big breakthrough in recent years and be very promising synthetic method, but, preparing high-quality monolayer two-dimensional material is the development in two-dimensional material synthesis and progress, making two-dimensional material really have breakthrough in application, the transfer techniques of monolayer two-dimensional material is indispensable process means.
Transfer method conventional at present has basic etching method and absolutely dry fixed point print process.
Basic etching method is generally used for the transfer of CVD large-area monolayer two-dimensional material, for the micron-sized monolayer two-dimensional material of mechanical stripping inapplicable.Its basic skills is first polymethyl methacrylate (PMMA) in spin coating in the metallic substrates that grown monolayer two-dimensional material, then etches away metallic substrates with dilute hydrochloric acid, is then transferred in target substrate, finally removes PMMA with acetone.There is a small amount of crack and crackle in the monolayer two-dimensional material so obtained, and the PMMA of material surface is very difficult to remove, and the performance that the device of follow-up preparation obtains can be influenced by impact.
Absolutely dry fixed point print process is applicable to the small monolayer two-dimensional material of mechanical stripping.Its basic skills is to adhere on polymeric layer by monolayer two-dimensional material under the microscope, then polymer is placed in the substrate of arbitrarily needs, and can comparatively be accurately controlled the position of monolayer two-dimensional material under the microscope, then with solvent, polymeric layer be washed away.The method operation is complex, but can be suitably used for the fixed point transfer of the monolayer two-dimensional material of micron order size.But in transfer process, due to polymeric layer can not be enough smooth, have no idea effectively to allow Polymer layer contact not interfere with and operate accurately under the microscope when first time adheres to, so the transfer mortality of absolutely dry fixed point print process is significantly high.So for the success rate improving transfer, it is necessary to a kind of device energy this polymeric layer open and flat of invention, do not affect again precise manipulation under the microscope.
Summary of the invention
The present invention is to solve the problem existing for absolutely dry fixed point print process, devise a kind of device that can be conveniently used for fixed point transfer monolayer two-dimensional material.The thin film that transparency is higher owing to the polymeric layer in transfer process is sacrifice layer and must be able to again operate under microscopic visualization, so can only be used.And need a supporter to support polymeric layer thin film in whole transfer process, in order to adjust easily or this polymeric layer thin film mobile is to be directed at sample.In order to imaging clearly, supporter generally selects the slide of enough transmittances.And in order to enable, polymeric layer is effective contacts adhesion with monolayer two-dimensional material, and conventional usual way is to be added with certain elastic and that transparency is higher cushion between supporter and polymeric layer thin film.But could observe clear under mechanical stripping monolayer two-dimensional material needs 50 times and above object lens, under this enlargement ratio, there is presently no and find suitable, sufficiently transparent cushion to meet the requirement observing monolayer two-dimensional material under the microscope through cushion and polymeric layer thin film.In order to solve these problems, the present invention devises a kind of device pinpointing transfer monolayer two-dimensional material, it is possible to makes when not using cushion polymeric layer thin film smooth and effectively touches monolayer two-dimensional material, and the fixed point to realize monolayer two-dimensional material shifts.
The technical solution adopted for the present invention to solve the technical problems is: cause the impact of the planarization of thin film in order to avoid atmospheric pressure, uses centre to have the globoidal glass of through hole to substitute traditional flat glass, and the position of interstitial hole is used for picking monolayer two-dimensional material.
Accompanying drawing illustrates:
Below in conjunction with accompanying drawing, the present invention is further described: 1, globoidal glass；2, the through hole on globoidal glass；3, anti-skidding fixed handle；
Fig. 1 is device top view；
Fig. 2 is device left side view；
Fig. 3 is device front view；
Detailed description of the invention:
Adopting glass material, globoidal glass 1 radius is at 4-8 centimetre, and radian is less than 20 degree, and thickness is at 1 to 4 millimeters.Interstitial hole 2 size is at 5-10 millimeter.Install one in one end of globoidal glass 1 additional and be with serrate anti-skidding fixed handle 3, for securing the device on four-dimensional translation stage.
Embodiment:
Silicon wafer-based bill kept on file layer graphene is transferred on silicon chip substrate layer two selenizing molybdenum:
1, PDMS is placed in the middle of the through hole 2 of this device, takes PC membrane cover and live in PDMS and be bonded on globoidal glass 1.
2, by fixing on the heaters with at the bottom of the silicon wafer-based of single-layer graphene, heater is warming up to 80 DEG C, and brings to focus under the microscope, and find Graphene to take pictures.
3, this device is fixed on four-dimensional translation stage by fixed handle 3, and by regulating position and position, angle, the PC film will enclosed in this device through hole 2 of translation stage, is pressed on the single-layer graphene found.
4, heater is warming up to 120 DEG C, lifts this device.Whether the Graphene observed on silicon chip also exists, if also repeating the 3rd step.If not illustrating that Graphene has been bonded on PC film, taking off silicon chip.
5, selenizing molybdenum monolayer at the bottom of silicon wafer-based is placed on the heaters, bring to focus under the microscope and find selenizing molybdenum monolayer.The selenizing molybdenum monolayer found is moved to being stained with below the PC film of Graphene, adjusts microscope and make the single-layer graphene alignment monolayer selenizing molybdenum on the attached PC film of this device, and finely tune microscope height so that PC film be fully contacted with the silicon chip of monolayer two selenizing molybdenum.
6, it is warming up to 170 DEG C, lifts this device, observe whether selenizing molybdenum monolayer at the bottom of silicon wafer-based has Graphene.If without, pressing this device under repeating and suitably heighten heter temperature, if having, illustrating to shift successfully.
7, the sample silicon chip shifted being immersed in 4-5min in chromatographically pure chloroformic solution, then the short time (≤1min) is immersed in chromatographically pure acetone, aqueous isopropanol and cleans respectively again, finally air-dry.
Claims (4)
1. one kind for pinpointing the device of transfer monolayer two-dimensional material, it is characterised in that uses and installs the globoidal glass of anti-skidding fixed handle additional, and in glass between open slot.
2. a kind of device for pinpointing transfer monolayer two-dimensional material according to claim 1, is characterized in that the cambered surface radius of globoidal glass is at 4 to 8 centimetres, and radian is less than 20 degree, and thickness is at 1 to 4 millimeters.
3. a kind of device for pinpointing transfer monolayer two-dimensional material according to claim 1, is characterized in that having installed the serrate anti-skidding fixed handle of band additional in one end of globoidal glass.
4. a kind of device for pinpointing transfer monolayer two-dimensional material according to claim 1, is characterized in that the size in hole is at 5 to 10 millimeters on globoidal glass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610287837.8A CN105800548A (en) | 2016-05-04 | 2016-05-04 | Device for fixed-point transferring of single-layer two-dimensional material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610287837.8A CN105800548A (en) | 2016-05-04 | 2016-05-04 | Device for fixed-point transferring of single-layer two-dimensional material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105800548A true CN105800548A (en) | 2016-07-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610287837.8A Pending CN105800548A (en) | 2016-05-04 | 2016-05-04 | Device for fixed-point transferring of single-layer two-dimensional material |
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| CN (1) | CN105800548A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106430084A (en) * | 2016-11-18 | 2017-02-22 | 北京大学 | Single micro/nano structure transferring device and single micro/nano structure transferring method |
-
2016
- 2016-05-04 CN CN201610287837.8A patent/CN105800548A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106430084A (en) * | 2016-11-18 | 2017-02-22 | 北京大学 | Single micro/nano structure transferring device and single micro/nano structure transferring method |
| CN106430084B (en) * | 2016-11-18 | 2017-12-01 | 北京大学 | A kind of single micro nano structure transfer device and its transfer method |
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| PB01 | Publication | ||
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20160727 |