CN105630215B - Touch panel - Google Patents

Touch panel Download PDF

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Publication number
CN105630215B
CN105630215B CN201410561990.6A CN201410561990A CN105630215B CN 105630215 B CN105630215 B CN 105630215B CN 201410561990 A CN201410561990 A CN 201410561990A CN 105630215 B CN105630215 B CN 105630215B
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China
Prior art keywords
layer
transparency
visible area
induction electrode
transparency conducting
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CN201410561990.6A
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CN105630215A (en
Inventor
陈永山
肖铁飞
何宽鑫
罗丽
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CHANGHONG OPTOELECTRONICS (XIAMEN) Co Ltd
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CHANGHONG OPTOELECTRONICS (XIAMEN) Co Ltd
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Abstract

The present invention is a kind of touch panel, the structure of the touch panel includes a substrate and two induction electrode layers, it is to complete two induction electrode layers in the fitting of the substrate through simple laminating type, and each induction electrode layer only needs a yellow light micro-photographing process to complete wiring;Photosensitive resin layer of each induction electrode layer again, can be mounted directly on the substrate or another induction electrode layer, save manufacture material requested and reduce process, therefore can reach the purpose for reducing manufacturing cost and promoting manufacture efficiency.

Description

Touch panel
Technical field
The present disclosure generally relates to a kind of touch panel, espespecially a kind of simplification structure for being applicable in the frivolous touch panel of large scale and its Production method.
Background technique
With the development of touch technology, existing touch panel develops towards large scale and frivolous direction, at present state Nei great factory is with single-glass technology (One Glass Solution;OGS) touch-control module is mainstream.But with touch panel by Gradually towards enlargement development, either GG framework (such as: DITO, SITO), GF framework (such as: GF, GF2), GFF framework or OGS/ The touch panel of TOL framework, when production, all need a large amount of transparent optical cement, to paste glass, PET film or induction electrode Layer is in the transparent optical film adhesive tape OCA (Optical Clear Adhesive) and liquid of substrate, the especially prior art Transparent optical glue LOCA (Liquid Optical Clear Adhesive), so that the manufacturing cost of touch panel is difficult to drop It is low;And be the production in response to enlarged touch panel, required ITO sputter when the generally induction electrode layer of production touch panel Processing procedure and multiple tracks yellow light micro-photographing process need bigger more expensive vacuum-pumping equipment and chamber, and more time-consuming vacuum It is evacuated process, so that the manufacturing cost of large touch panel is difficult to decrease with required working hour, and the induced electricity of ITO sputter process It is even more a great problem that how pole layer, which maintains preferable uniformity in large touch panel,.Therefore, it is necessary to be directed to large touch The structure and processing procedure of panel further improve.
Summary of the invention
In view of this, main purpose system of the present invention provides the structure-improved and method of a kind of touch panel wiring, Neng Goujian Chemical industry sequence reduces working hour and manufacturing cost.
To reach above-mentioned creation purpose, technical way system of the present invention enables the touch panel include:
One substrate is to be divided into a visible area and a non-visible area, which is arranged around the visible area;Wherein should Non-visible area includes a bonding land;
One light shield layer is the first surface for being formed in the substrate, to cover the non-visible area;
One first induction electrode layer is to be formed in the first surface of the substrate and cover the visible area, and includes one One first photosensitive resin layer and one first transparency conducting layer being electrically insulated, first photosensitive resin layer first transparent are led between this Between electric layer and the substrate;
One second induction electrode layer includes one second photosensitive resin layer and one second transparency conducting layer being electrically insulated, Second photosensitive resin layer is between first transparency conducting layer and second transparency conducting layer;And
One line layer, be formed in the non-visible area and the light shield layer on, and have complex lead, each conducting wire it Corresponding first and second induction electrode layer connection in one end, and the other end of each conducting wire is then concentrated to the bonding land.
It is an advantage of the current invention that each induction electrode layer can preforming, and wherein the photosensitive resin layer can be straight It connects and fits on the transparency conducting layer of the substrate or another induction electrode layer, save comprising vacuum suction, sputter and yellow light lithographic Etc. multiple tracks processing procedure, reduce manufacturing cost and working hour and be easier to realize frivolous;Again since the two induction electrodes layer has all-transparent Structure, can make that there is in the visible area preferable aperture opening ratio.
To reach above-mentioned creation purpose, technical way system of the present invention enables the touch panel preparation method include There are the following steps:
Prepare a substrate and first and second transparent electrode film;Wherein the substrate include a visible area and one around The non-visible area of the visible area;
It pressurizes and heats first transparency electrode film, which is fitted on the first surface of the substrate, And it is covered by the visible area and part non-visible area;
It exposes, develop the first transparency electrode film to form one first induction electrode layer;
In being formed with plurality of first conductive lines in the first surface of the substrate and the corresponding non-visible area, wherein each first conducting wire One end coincide in the part that the first induction electrode layer is covered by the non-visible area;
It pressurizes and heats second transparency electrode film, which is fitted in this and is coincided in one first induction On electrode layer, to be covered by the visible area and part non-visible area;
It exposes, develop the second transparency electrode film to form one second induction electrode layer;And
In being formed with plurality of second conductive lines in the first surface of the substrate and the corresponding non-visible area, wherein each second conducting wire One end coincide in the part that the second induction electrode layer is covered by the non-visible area.
It is an advantage of the current invention that first and the can be completed under antivacuum processing environment, with simple laminating type The storehouse of two induction electrode layers and fixation, and each induction electrode layer only needs a yellow light micro-photographing process to complete wiring, because This, which can simplify process, reduces working hour, reduces manufacturing cost;Each induction electrode layer has uniform thickness again, makes it have More stable electrical performance.
Detailed description of the invention
Fig. 1: for the top view of touch panel of the present invention.
Fig. 2: for the sectional view of touch panel of the present invention.
Fig. 3 A to 3K: for the semi-finished product top view of each step in the first preferred embodiment of touch panel preparation method of the present invention.
Fig. 4 A to 4K: the sectional view of corresponding diagram 3A to 3K.
Fig. 5 A to 5F: for the semi-finished product section of the second preferred embodiment partial step of touch panel preparation method of the present invention Figure.
Fig. 6: for the opaque bridging structure of the induction electrode layer of prior art touch panel.
Specific embodiment
Cooperate schema and the preferred embodiments of the invention below, the present invention is further explained is taken to reach creation purpose Technological means.
It as shown in Figs.1 and 2, is the preferred embodiment of one of touch panel wire structures of the present invention, it includes a bases Plate 10, a light shield layer 13, line layer 14, one first induction electrode layer 20a, one second induction electrode layer 20b and a protective layer 30.
Substrate 10 is located at the non-visible area 12 of 11 side of visible area with a visible area 11 and at least one, in a particular implementation It is predetermined visible area 11 in 10 center of substrate in example, and is predetermined non-visible area 12 around visible area 11, but visible area 11 position can be different according to design requirement with number, for example, can according to line layer position and change.Substrate 10 For example, see-through hardened glass substrate or plastic base or other any suitable substrates.This 10 system of substrate is as touch surface The protection outer cover (cover lens) of plate, substrate 10 can provide the function of protection and bearing assembly in itself.In addition, can also be in substrate The functional layers such as some functional layers, such as anti-glare, anti-fingerprint, antireflection are set on 10.
One light shield layer 13 and a line layer 14 correspond to the position of non-visible area 12 and are arranged, and 13 system of light shield layer is formed in The first surface of the substrate 10, to cover the non-visible area 12.In the present embodiment, which is set to non-visible area Between 12 and line layer 14, which for black photoresist, black printed ink, black resin or other any can be suitble to it Light screening material and color, light shield layer 13 can cover line layer 14 or other are unsuitable for the circuit unit being seen by a user, and make touch-control Panel has the effect of beauty.14 system of line layer is formed in the non-visible area 12 and on the light shield layer 13, and has plural number and lead Line, the first corresponding induction electrode layer 20a of one end of each conducting wire or the second induction electrode layer 20b connection, and it is each The other end of the conducting wire is then concentrated to the bonding land 121 on substrate 10.The material of the line layer 14 can be made by metal material, The metal material includes: molybdenum, gold, silver, copper and aluminium are wherein any, and but not limited thereto.In addition, also may include nanometer Metal material, metal grill (metal mesh), transparent conductive material etc., nanometer metal material such as nanometer silver wire, nanometer copper Line, carbon nanotube etc., transparent conductive material such as tin indium oxide (indium tin oxide;ITO) etc..
First induction electrode layer 20a at least corresponds to visible area 11 with the second induction electrode layer 20b and is arranged.First induction Electrode layer 20a system is formed in the first surface of the substrate 10 and covers the visible area, in the present embodiment, first induced electricity Pole layer 20a system is formed in side by side on one of the substrate 10 surface with Y-direction, and second induction electrode layer 20b system is arranged side by side with X-direction It is formed on the first induction electrode layer 20a, the first induction electrode layer 20a and the second induction electrode layer 20b are electrically connected The line layer 14, and it respectively includes a photosensitive resin layer 21 being electrically insulated and a transparency conducting layer 22, the respectively transparency conducting layer 22 are formed on the respectively photosensitive resin layer 21.The photosensitive resin layer 21 of first induction electrode layer 20a is between first induced electricity Between the transparency conducting layer 22 and substrate 10 of pole layer 20a.The photosensitive resin layer 21 of second induction electrode layer 20b between this first Between the transparency conducting layer 22 of induction electrode layer 20a and the transparency conducting layer 22 of the second induction electrode layer 20b.The electrically conducting transparent Layer 22 can be organic conductive material, which can be selected from the polymer of thiophene derivant, and it includes have poly- hexyl thiophene Pheno, poly- Ethylenedioxy Thiophene etc..
Protective layer 30 be a flood be covered in the visible area, further include and be covered with substrate 10, light shield layer 13, line layer 14, the first induction electrode layer 20a and the second induction electrode layer 20b.Protective layer 30 can be single layer structure, can also be multilayered structure. In one of present invention embodiment, which is that transparent material is made and is single layer structure.Protective layer material may include inorganic Material, for example, silicon nitride (silicon nitride), silica (silicon oxide) and silicon oxynitride (silicon It oxynitride), can also be organic material, for example, the other suitable material such as acrylic resin (acrylic resin), It can also be the combination of above-mentioned material, but the present invention is not limited thereto.
It please refers to shown in Fig. 3 A to 3K and Fig. 4 A to 4K, is the preferred embodiment of one of touch panel preparation method of the present invention.
Prepare a substrate 10 and a first transparency electrode film 200a and a second transparency electrode film 200b first.In detail and Speech, first transparency electrode film 200a sequentially coincide comprising photosensitive resin layer 21, transparency conducting layer 22, film support 23 (or Release film), second transparency electrode film 200b sequentially coincides comprising photosensitive resin layer 21, transparency conducting layer 22, film support 23, Wherein the substrate 10 include a visible area 11 and one around the visible area 11 non-visible area 12.In certain embodiments, The surface of the photosensitive resin layer 21 of first transparency electrode film 200a and second transparency electrode film 200b all has film support respectively Body, to protect photosensitive resin layer 21.
It is at the beginning laminating process, please refers to shown in Fig. 3 A and Fig. 4 A, first by the photosensitive of first transparency electrode film 200a Resin layer 21, which fits in the substrate 10, to be had on the first surface of light shield layer 13, and the first transparency electrode film 200a is made to cover base The visible area 11 of plate 10, and wherein side is covered in non-visible area 12.In certain embodiments, then it needs photosensitive resin layer 21 first On film support separation, then by the photosensitive resin layer 21 of first transparency electrode film 200a fit in the substrate 10 have hide On the first surface of photosphere 13.Since the photosensitive resin layer 21 of this exposure can produce stickiness in the environment of high temperature and pressure, Can further substrate 10 or the first transparency electrode film 200a be pressurizeed and be heated during fitting, so that first transparency electrode film The photosensitive resin layer 21 of 200a generates stickiness, is to substrate 10 or the first transparency electrode film 200a optimum condition to pressurize 3.5MPa is 70 to 140 degree Celsius to substrate 10 or the first transparency electrode film 200a optimum condition heated.In addition, as being intended to Stacking adaptation is further increased, further substrate 10 and the first transparency electrode film 200a can be heated simultaneously.
Then it is exposed process, is please referred to shown in Fig. 3 B and Fig. 4 B.Due to the photosensitive resin layer 21 of this exposure and transparent Conductive layer 22 has suppression oxygen photo-curing characteristic, is had using ultraviolet light (UV) through one with the light shield of Y-direction pattern arranged side by side Single exposure is carried out to the above-mentioned first transparency electrode film 200a, the optimal wavelength of ultraviolet light is 365nm.Due to photosensitive resin Layer 21 between substrate 10 and transparency conducting layer 22, transparency conducting layer 22 between photosensitive resin layer 21 and film support 23 it Between, therefore photosensitive resin layer 21 and transparency conducting layer 22 are now under the situation of anoxic, photosensitive resin layer 21 and electrically conducting transparent The part that layer 22 is irradiated to ultraviolet light under the situation of anoxic generates curing reaction.This above-mentioned is cured as its material internal molecule Bond is more strengthened, and it is made to be not easy to be etched liquid and corroded.
After exposure process, the film support that above-mentioned transparent electrode film 200 is first removed shown in Fig. 3 C and Fig. 4 C is please referred to Body 23.
Then developing procedure is carried out, please refers to shown in Fig. 3 D and Fig. 4 D, removes above-mentioned first transparency electrode using developer solution Uncured sensing optical activity resin 21 and its transparency conducting layer 22 of correspondence in film 200a, the optimum condition of developer solution are concentration 1% Na2Co3 solution.Retain the cured portion of the transparency conducting layer 22 of first transparency electrode film 200a, and removes first The uncured portion of the transparency conducting layer of transparent electrode film 200a.
It please refers to shown in Fig. 3 E and Fig. 4 E, the portion that above-mentioned first transparency electrode film 200a solidifies and do not removed by the developer solution Point, that is, one is formed with pattern arranged side by side along the Y direction, is the first induction electrode layer 20a of above-mentioned touch panel.Then, then with Screen painting mode is in formation line layer 14, one end system of each complex lead 14 and above-mentioned corresponding first in non-visible area 12 20a, the induction electrode layer parts in non-visible area connect, and the other end of each complex lead 14 is then concentrated to the engagement Area 121, and can corresponding with one contact 15 connect, that is, complete the production of the first induction electrode layer 20a.
Then the production for carrying out the second induction electrode layer 20b please refers to shown in Fig. 3 F and Fig. 4 F, production process with it is above-mentioned The production process of first induction electrode layer 20a is roughly the same, only when carrying out laminating process, by a second transparency electrode film 200b It fits on the first induction electrode layer 20a.In certain embodiments, then it needs the film support on photosensitive resin layer 21 first Separation, then the photosensitive resin layer 21 of first transparency electrode film 200b is fitted on the first induction electrode layer 20a.It is exposed It when light process, please refers to shown in Fig. 3 G and Fig. 4 G, has using one with the light shield of X-direction pattern arranged side by side to the second transparent electricity Pole film 200b is exposed;It when carrying out developing procedure, please refers to shown in Fig. 3 J and Fig. 4 J, second transparency electrode film 200b solidification And the part not removed by the developer solution, that is, a pattern arranged side by side with X-direction is formed, is the second induced electricity of above-mentioned touch panel Pole layer 20b, the i.e. cured portion of the transparency conducting layer 22 of reservation second transparency electrode film 200b, and remove second transparency electrode The uncured portion of the transparency conducting layer of film 200b, to form the second induction electrode layer 20b.Due to the first induction electrode layer 20a It is cured, therefore the developing procedure of the second induction electrode layer 20b will not damage the first induction electrode layer 20a.
After the production for completing above-mentioned two induction electrodes layer 20, please refer to shown in Fig. 3 K and Fig. 4 K, in the second induction electrode The protective layer 30 that a transparent insulation is formed on 20, to protect the second induction electrode layer 20b and the first induction electrode layer 20a completes the production of touch panel.
It please refers to shown in Fig. 5, is the another preferred embodiment of touch panel preparation method of the present invention, in above-described embodiment the The production process of one induction electrode layer 20a is roughly the same, i.e. Fig. 5 A~5C corresponds respectively to Fig. 3 A~3C and (or corresponds respectively to figure 4A~4C), Fig. 5 E~5F corresponds respectively to Fig. 3 D~3E (or corresponding respectively to Fig. 4 D~4E) or Fig. 5 A~5C is respectively corresponded In Fig. 3 F~3H (or corresponding respectively to Fig. 4 F~4H), Fig. 5 E~5F corresponds respectively to Fig. 3 I~3J and (or corresponds respectively to Fig. 4 I ~4J), only exposure process removes light shield and to sense after removing film support 23, and before not carrying out developing procedure Photopolymer resin layer 21 and transparency conducting layer 22 carry out re-expose, make the photosensitive resin layer 21 in single exposure (such as Fig. 3 B and Fig. 4 B) unexposed portion solidified.Therefore when developing procedure, since photosensitive resin layer 21 is all cured, The corresponding photosensitive resin layer 21 of unexposed portion can retain more thickness (about 4.2 μm to 4.6 μm) in Fig. 3 B and 4B.By When aforementioned re-expose, film support 23 has been removed, which has been not in anaerobic condition environment, therefore in Generated figure when single exposure can't be destroyed when re-expose.
Whereby, the display panel of the present invention uses easy wiring method and structure, and then can reach simplified process, reduction Working hour and manufacturing cost, and make large touch panel that there is preferable uniformity and aperture opening ratio.
The above is only presently preferred embodiments of the present invention, not does limitation in any form to the present invention, though So the present invention has been disclosed as a preferred embodiment, and however, it is not intended to limit the invention, has in any technical field Usual skill, in the range of not departing from technical solution of the present invention, when the technology contents using the disclosure above make it is a little The equivalent embodiment of equivalent variations, but anything that does not depart from the technical scheme of the invention content are changed or are modified to, according to the present invention Technical spirit any simple modification, equivalent change and modification made to the above embodiment, still fall within the technology of the present invention side In the range of case.

Claims (8)

1. a kind of touch panel, which is characterized in that be to include:
One substrate is to be divided into a visible area and a non-visible area, which is arranged around the visible area;Wherein this it is non-can Vision area includes a bonding land;
One light shield layer is the first surface for being formed in the substrate, to cover the non-visible area;
One first induction electrode layer, be formed in the first surface of the substrate and cover the visible area, and include one electrically One first photosensitive resin layer and one first transparency conducting layer of insulation, first photosensitive resin layer is between first transparency conducting layer Between the substrate;
One second induction electrode layer includes one second photosensitive resin layer and one second transparency conducting layer being electrically insulated, this Two photosensitive resin layers are between first transparency conducting layer and second transparency conducting layer;And
One line layer is to be formed in the non-visible area and on the light shield layer, and have complex lead, one end of each conducting wire Corresponding first and second induction electrode layer connection, and the other end of each conducting wire is then concentrated to the bonding land.
2. touch panel as described in claim 1, which is characterized in that be to further include a protective layer, be to be formed in this On second induction electrode layer, and cover the visible area.
3. touch panel as claimed in claim 2, which is characterized in that it is organic conductive that this, which waits the first and second transparency conducting layers, Material, the organic conductive material are selected from the polymer of thiophene derivant.
4. touch panel as claimed in claim 3, which is characterized in that be to further include plural number contact arranged side by side, be correspondence It to bonding land and is formed on the light shield layer, and the conducting wire connection that each contact is corresponding.
5. a kind of touch panel preparation method, which is characterized in that be to comprise the steps of
Prepare a substrate and first and second transparent electrode film;Wherein the substrate include a visible area and one can around this The non-visible area of vision area;
It pressurizes and heats first transparency electrode film, which is fitted on the first surface of the substrate, and contains It is placed on the visible area and part non-visible area;
It exposes, develop the first transparency electrode film to form one first induction electrode layer;Wherein, which includes One first photosensitive resin layer and one first transparency conducting layer;
In being formed with plurality of first conductive lines in the first surface of the substrate and the corresponding non-visible area, wherein the one of each first conducting wire End coincides in the part that the first induction electrode layer is covered by the non-visible area;
It pressurizes and heats second transparency electrode film, which is fitted in this and is coincided in one first induction electrode On layer, to be covered by the visible area and part non-visible area;
It exposes, develop the second transparency electrode film to form one second induction electrode layer;Wherein, which includes One second photosensitive resin layer and one second transparency conducting layer;And
In being formed with plurality of second conductive lines in the first surface of the substrate and the corresponding non-visible area, wherein the one of each second conducting wire End coincides in the part that the second induction electrode layer is covered by the non-visible area.
6. touch panel preparation method as claimed in claim 5, which is characterized in that the first transparency electrode membrane system, which sequentially coincides, includes There are first photosensitive resin layer, first transparency conducting layer and a first film supporter, the second transparency electrode membrane system is sequentially Coincide includes second photosensitive resin layer, second transparency conducting layer and one second film support, wherein
In the exposure, develop the first transparency electrode film the step of further include:
Prepare the light shield of a pattern with the first induction electrode layer, and is directed at the first transparency electrode film;
Single exposure is so that the first transparency conducting layer exposed portion solidifies;
Remove the first film supporter;And
Retain the cured portion of the first transparency conducting layer, and removes the uncured portion of first transparency conducting layer to form this First induction electrode layer;
In the exposure, develop the second transparency electrode film the step of further include:
Prepare the light shield of a pattern with the second induction electrode layer, and is directed at the second transparency electrode film;
Single exposure is so that the second transparency conducting layer exposed portion solidifies;
Remove second film support;And
Retain the cured portion of the second transparency conducting layer, and removes the uncured portion of second transparency conducting layer to form this Second induction electrode layer.
7. touch panel preparation method as claimed in claim 5, which is characterized in that the first transparency electrode membrane system, which sequentially coincides, includes There are one first photosensitive resin layer, one first transparency conducting layer and a first film supporter, the second transparency electrode membrane system is sequentially Coincide includes one second photosensitive resin layer, one second transparency conducting layer and one second film support, wherein
The step of above-mentioned exposure, development first transparency electrode film, further includes:
Prepare the light shield of a pattern with the first induction electrode layer, and is directed at the first transparency electrode film;
Single exposure is so that the first transparency conducting layer exposed portion solidifies;
Remove the first film supporter;
Light shield is removed and re-expose so that the first photosensitive resin layer unexposed portion solidifies;And retain the first transparency conducting layer Cured portion, and remove the uncured portion of first transparency conducting layer to form the first induction electrode layer;
It is further includeed in the step of above-mentioned exposure, development second transparency electrode film:
Prepare the light shield of a pattern with the second induction electrode layer, and is directed at the second transparency electrode film;
Single exposure is so that the second transparency electrode layer exposed portion solidifies;
Remove second film support;
Light shield is removed and re-expose so that the second photosensitive resin layer unexposed portion solidifies;And
Retain the cured portion of the second transparency conducting layer, and removes the uncured portion of second transparency conducting layer to form this Second induction electrode layer.
8. touch panel preparation method as claimed in claims 6 or 7, which is characterized in that should in the first surface and correspondence of the substrate After the step of being formed with plurality of second conductive lines in non-visible area, the protective layer of a transparent insulation is formed in the second induction electrode layer On.
CN201410561990.6A 2014-08-16 2014-10-01 Touch panel Active CN105630215B (en)

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Publication number Priority date Publication date Assignee Title
CN105630215B (en) * 2014-08-16 2019-02-12 长鸿光电(厦门)有限公司 Touch panel
CN107992238A (en) * 2017-11-28 2018-05-04 业成科技(成都)有限公司 Contact panel module
CN110221718B (en) * 2018-03-02 2023-07-04 宸鸿光电科技股份有限公司 Direct patterning method of touch panel and touch panel thereof
CN110221731B (en) * 2018-03-02 2023-03-28 宸鸿光电科技股份有限公司 Direct patterning method of touch panel and touch panel thereof

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CN102750025A (en) * 2011-04-22 2012-10-24 扬升照明股份有限公司 Manufacturing method of touch device
CN103576977A (en) * 2012-08-09 2014-02-12 纬创资通股份有限公司 Touch panel and manufacturing method thereof
CN104020882A (en) * 2014-05-30 2014-09-03 南昌欧菲光科技有限公司 Touch screen
CN204256699U (en) * 2014-08-16 2015-04-08 长鸿光电(厦门)有限公司 Contact panel

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Publication number Priority date Publication date Assignee Title
CN102750025A (en) * 2011-04-22 2012-10-24 扬升照明股份有限公司 Manufacturing method of touch device
CN103576977A (en) * 2012-08-09 2014-02-12 纬创资通股份有限公司 Touch panel and manufacturing method thereof
CN104020882A (en) * 2014-05-30 2014-09-03 南昌欧菲光科技有限公司 Touch screen
CN204256699U (en) * 2014-08-16 2015-04-08 长鸿光电(厦门)有限公司 Contact panel

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TW201608428A (en) 2016-03-01

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