CN105611853A - Nail molding device and nail molding method - Google Patents
Nail molding device and nail molding method Download PDFInfo
- Publication number
- CN105611853A CN105611853A CN201480055632.6A CN201480055632A CN105611853A CN 105611853 A CN105611853 A CN 105611853A CN 201480055632 A CN201480055632 A CN 201480055632A CN 105611853 A CN105611853 A CN 105611853A
- Authority
- CN
- China
- Prior art keywords
- nail
- light source
- light
- building mortion
- described light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D29/00—Manicuring or pedicuring implements
-
- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D31/00—Artificial nails
-
- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D29/00—Manicuring or pedicuring implements
- A45D2029/005—Printing or stamping devices for applying images or ornaments to nails
Landscapes
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
Abstract
Provided is a nail molding device that forms a drawing pattern on the surface of a nail (or an artificial nail) using a photocurable resin. The nail molding device is characterized by the provision of: a light source; a light drawing unit that partially cures a photocurable resin using light that is emitted from the light source; and a control unit that controls the light source and the light drawing unit. This nail molding device makes it possible to easily form a drawing pattern.
Description
Technical field
The present invention relates to a kind of enforcement is described on nail or false nail nail building mortion and nail manufacturing process.
Background technology
Conventionally, user please manicure personnel describe desirable design in manicure salon, completes thus the surface at nailThe manicure (nailart) that upper enforcement is described. As nail material, the gel nails (Gel using light-cured resin as materialNail) popularized. And, being accompanied by the universal of gel nails, the demander of manicure increases day by day.
Recently, easy and simple to handle due to gel nails, the people that therefore user oneself implements manicure is on the increase. And,Carry out the commodity of manicure as this support user oneself, sell and have using gel and resin solidification lamp as a set of door pocket that entersDress.
For example, in patent documentation 1,2, disclose and a kind of the finger (nail) that coats resin has been inserted into resin solidification lampPeristome and to the method that is inserted into the finger WBR resin solidification lamp in peristome. In patent documentation 3, considerThe impact that the UV light that resin solidification is used causes human body and disclose the resin solidification of the pen type that a kind of irradiation area of light is littleThe structure of lamp. In patent documentation 4, a kind of kind according to light-cured resin disclosed had the structure of two kinds of wavelength light sourcesMake.
Formerly technical literature
Patent documentation
Patent documentation 1: No. 3151698 communique of Japanese Utility Model login
Patent documentation 2: No. 3183499 communique of Japanese Utility Model login
Patent documentation 3: No. 3179777 communique of Japanese Utility Model login
Patent documentation 4: TOHKEMY 2011-98073 communique
Summary of the invention
As nail building mortion, a mode of the present invention is to use the table of light-cured resin at nail or false nailOn face, form the nail building mortion of describing pattern, this nail building mortion possesses: light source; Light drawing section, it utilizes from light sourceThe light penetrating makes light-cured resin local solidification; And control part, it controls light source and light drawing section.
In addition, as nail manufacturing process, a mode of the present invention is to use light-cured resin to refer at nail or vacationOn the surface of first, form the nail manufacturing process of describing pattern. And this nail manufacturing process possesses: at nail or false nailThe resin applying step of coating light-cured resin on surface; Make the curing schedule of light-cured resin local solidification; And goRemove the removal step of the uncured portion of light-cured resin. And this nail manufacturing process is characterised in that, at curing scheduleIn, use nail building mortion to make light-cured resin local solidification, this nail building mortion has: light source; Light drawing section, itsUtilize the light penetrating from light source to make light-cured resin local solidification; And control part, it controls light source and light drawing section.
According to said structure, can on the surface of nail or false nail, easily form and describe pattern.
Brief description of the drawings
Fig. 1 is the schematic diagram that the nail building mortion in embodiments of the present invention is shown.
Fig. 2 is the stereogram that forms the speculum of the nail building mortion in embodiments of the present invention.
Fig. 3 illustrates the figure that describes pattern.
Fig. 4 is the schematic diagram that the irradiating state of the light of the nail building mortion in embodiments of the present invention is shown.
Fig. 5 is the signal that the nail manufacturing process that has used the nail building mortion in embodiments of the present invention is shownFigure.
Detailed description of the invention
Before explanation embodiment, the problem of existing manicure is described.
The considerable influence of describing technical ability of describing to be subject to user of the manicure that in the past, user oneself carried out. In addition,Just describe technical ability high, in the case of user's oneself nail is described, the nail to strong hand describe and rightIn the describing of the nail of the hand contrary with strong hand, be also difficult to make to describe precision identical.
In addition, even if in the situation that manicure personnel describe in manicure salon, describing also existence limitation in technical abilityProperty. But, seek more high-precision describing.
(embodiment)
Below, with reference to Fig. 1～Fig. 5, embodiments of the present invention are described.
The structure of<nail building mortion 2>
Fig. 1 is illustrated in the schematic diagram of describing the nail building mortion 2 of manicure (pattern is described in formation) on nail 1. NailBuilding mortion 2 is on the surface of nail 1 (or false nail), to form to have used the nail of describing pattern of light-cured resin 3 to becomeShape device 2, it possesses: light source 4; Utilize the light that penetrates from light source 4 and make the light drawing section of light-cured resin 3 local solidifications5; And the control part 6 of control light source 4 and light drawing section 5.
In the present embodiment, use the light-cured resin 3 of ultraviolet hardening.
Light source 4 penetrates the light that makes the curing wavelength of light-cured resin 3. For current commercially available most of gel is referred toFirst (light-cured resin 3) is solidified, the wavelength of scope that need to about 365nm～410nm. So, in the present embodiment, useNear 405nm, there is the semiconductor laser of wavelength peak as light source 4. In addition, use and control sweeping of angle of reflection by control part 6Retouch the speculum 7 of type as light drawing section 5.
As the speculum 7 of sweep type, use the known speculums such as polygon prism, current mirror.
The structure of<speculum 7>
Next, with reference to Fig. 2, the detailed structure of speculum 7 is described.
Speculum 7 is made up of actuator 8 and mirror portion 12. Actuator 8 is Two axle drive structures, is to have used Si substrate and pressureMEMS (the MicroElectroMechanicalSystems of electrolemma; MEMS) equipment. By being formed by actuator 8Light drawing section 5, can make 2 miniaturizations of nail building mortion.
Actuator 8 has: the supporting frame 9 of rectangle, in the movable frame 10 of the rectangle of the inner side of supporting frame 9 configuration, movablyMovable part 11, the first vibration section 14 and second vibration section 16 of the rectangle of the inner side configuration of frame 10. Movable frame 10 is via firstVibration section 14 and being connected with supporting frame 9. The torsion that carry out taking the first turning cylinder 13 as center of rotation a pair of the first vibration section 14 is movedDo. Movable part 11 is connected with movable frame 10 via the second vibration section 16. The second vibration section 16 carry out with the first turning cylinder 13The twisting action that the second orthogonal turning cylinder 15 is center of rotation. It should be noted that, on the first vibration section 14, be provided with firstDrive division 17. The first drive division 17 is connected with control part 6. The first drive division 17 is according to controlling from the control signal of control part 6Twisting action processed. Although not shown, the first drive division 17 be between the upper/lower electrode being formed by Ti, Au etc. sandwiched by PZTThe lit-par-lit structure forming Deng the piezoelectric body layer forming. And, by giving current potential between the upper/lower electrode at the first drive division 17Poor, the first vibration section 14 is excited to the twisting action around the first turning cylinder 13.
With the first vibration section 14 in the same manner, on the second vibration section 16, be provided with the second drive division 18. The second drive division 18 withControl part 6 connects. The second drive division 18 excites the twisting action around the second turning cylinder 15 to the second vibration section 16.
On the surface of movable part 11 of the actuator 8 forming as described above, dispose mirror portion 12, speculum 7 can edgeBiaxially oriented scans the light penetrating from light source 4.
The action of<nail building mortion 2>
Then, with reference to Fig. 1, the action of nail building mortion 2 is described.
Control part 6 is controlled light source 4 and light drawing section 5. Control part 6 is controlled exposure, the irradiation of the light penetrating from light source 4Time and be arranged on reflection angle of the mirror portion 12 on actuator 8 etc. And light scanning applies on the surface of nail 1The surface of light-cured resin 3, thereby light-cured resin 3 local solidifications. Form and describe pattern in this way.
It should be noted that, in the time that pattern is described in formation, as shown in Figure 3, in the situation that describing there is density in pattern,Describe the closeer region of pattern easy generation pattern deformation compared with thinner region. Think the reason of this pattern deformation be shineThe light of penetrating is in the diffusion inside of light-cured resin 3 and the infiltration causing. Therefore, if form closeer while describing pattern withWhen what formation was dredged describes pattern, carry out same control, produce following problem. Be suitable for the closeer pattern of describing if setThe condition of describing form the pattern of describing of dredging, under-exposed, cannot successfully form the pattern of describing of dredging.
But in the nail building mortion 2 of the speculum 7 of above-mentioned use sweep type, control part 6 can be controlled light source4 and light drawing section 5 and make light-cured resin 3 local solidifications. The exposure of photomask is different from utilizing, the nail of present embodimentBuilding mortion 2 can be according to setup control condition is carried out in the unit interval after description region sectionalization. Thus, even if in depictionIn case, exist in the situation of density, also can form the closeer description region of describing pattern and form the pattern of describing of dredgingDescription region in make controlled condition difference. , control part 6 is controlled light source 4 according to the density of describing pattern and light is describedPortion 5, can form the best pattern of describing thus. Can lead to the formation of the corresponding best depiction pattern of the density of describing patternCrossing following mode realizes.
The irradiation time of the light penetrating to the description region that forms depiction case from light source 4 is controlled by control part 6. AndAnd, the unit interval of the description region of irradiation time after according to sectionalization and determining.
The output size of the light penetrating to the description region that forms depiction case from light source 4 in addition, is controlled by control part 6System. And the output size of light is determined according to the unit interval of description region.
The combination of the controlled condition by the irradiation time of light and the output size of light, can be according to after sectionalizationBest control is realized in unit interval.
In addition, as mentioned above, in the situation that controlling according to unit interval, be necessary to make control part 6 identifications to describePattern. So, preferably in nail building mortion 2, arrange and obtain the Department of Communication Force 19 of describing pattern from outside. Can use USB etc.The wireless communication parts such as wire communication portion, WLAN, Bluetooth (registration mark) are as Department of Communication Force 19. It should be noted that,In the present embodiment, use WLAN as Department of Communication Force 19.
It should be noted that, for describing pattern, be used as the WLAN of Department of Communication Force 19, will for example use intelligenceMobile phone, computer and the pattern of describing selected is in advance sent to control part 6. By describing from outside to 2 inputs of nail building mortionPattern, even if design is upgraded continually, also can easily obtain up-to-date design. Thereby, can from more design, selectSelect and describe pattern. Difference according to circumstances, forms group (community) under the state that also can contact each other user.
The detailed structure of<nail building mortion 2>
Preferably nail building mortion 2 has definite location division 20 is carried out in the position of described nail 1. In this enforcementIn mode, record the guiding piece that limits the insertion of finger the position of fixing nail 1 by the front end in contact of nail 1.As long as realize the object of the position of fixing nail 1, be not limited to said method. By location division 20, Neng Gougu are setThe position of definiteness first 1, therefore can implement meticulous describing.
As shown in Figure 4, the curved shape that the surface of nail 1 is convex. Therefore, the irradiation distance of self-reflection mirror 7 is at nail 1End 1a different from central portion 1b. But, in nail building mortion 2, use the straightline propagation of light irradiation higher halfConductor Laser is as light source 4, and employing makes this straightline propagation irradiate to nail 1 via speculum 7 compared with high lightStructure, therefore, the variation of the beam spot diameter, causing from the range difference of light source 4 is little, has suppressed to describe the bad of precision in flexure planeChange. Therefore, can carry out more accurate describing.
In addition, light with respect to the incidence angle θ 1 of the section 1c of the end 1a of bending nail 1 than the central portion of nailThe incidence angle θ 2 of the section 1d of 1b is little, and therefore, the irradiated area of light is larger than central portion 1b at end 1a. Therefore, end 1aCompared with central portion 1b, diminish with respect to the light income of the per unit area of light. Therefore, preferably defeated to the end 1a of nail 1The light going out is stronger than the light of the central portion 1b output to nail 1. Except the method adjusted of light intensity with output withOutward, also can be by making to the irradiation time of the end 1a irradiation light of nail 1 than the central portion 1b irradiation light to nail 1Irradiation time length is adjusted.
It should be noted that, the adjusting of irradiation time can be controlled by the velocity of displacement of the angle of reflection of adjustment speculum 7System. But be difficult to carry out the precision control of angle of reflection. So, control the side of irradiation time as not carrying out the control of angle of reflectionMethod, has the light emitting control of light source. Photocontrol is that the number of times of lighting of the light source in the time of light scanning per unit area is enteredRow is controlled. If use semiconductor laser, is used for the clock signal of the light emitting control of carrying out semiconductor laser by control, canNumber of times is lighted in control. By using semiconductor laser as light source, easily carry out the adjusting of irradiation time.
In addition, use semiconductor laser that linear propagation of light is higher as light source 4 for above-mentioned nail building mortion 2Situation be illustrated, but also can use ultraviolet lamp that irradiant diversity is larger, semiconductor light-emitting elements to doFor light source 4. In the situation that using ultraviolet lamp, semiconductor light-emitting elements, by making collimation lens (not shown) be folded in lightBetween source 4 and speculum 7, can obtain irradiant linear propagation of light. If can obtain irradiant smooth straight-line transmittingThe property broadcast, can obtain the effect identical with the situation that uses semiconductor laser.
In addition, also can not use the speculum 7 of sweep type as described above as describing mechanism, and use digital micro-mirrorThe such projector equipment of device, liquid crystal apparatus is as sweep mechanism.
In addition, if storage part 21 is set in control part 6, and in storage part 21 pre-stored representational depictionCase, can describe by the pattern of describing based on kept. If be provided with storage part 21 in control part 6, do not use communicationPattern just can be selected to describe by portion 19, can shorten the delivery time of describing pattern.
In addition, in order to determine controlled condition with respect to the curved shape of nail 1, nail building mortion 2 also has detectionThe nail test section 22 of the three-dimensional shape of nail 1, control part 6 is controlled light according to the first information being detected by nail test section 22At least either party in source 4 and speculum 7.
By at any time the information being detected by nail test section 22 (first information) being inputed to control part 6, can carry outFEEDBACK CONTROL. Therefore, can in nail building mortion 2, carry out the correction of the irradiation opportunity of angle of reflection, the light source 4 of speculum 7Control. It should be noted that, as nail test section 22, can use camera etc. utilize image equipment, utilize light reflection etc.The whole bag of tricks such as the equipment of optical means. By using nail test section 22 to carry out FEEDBACK CONTROL, even if at the finger of rendered objectIn the situation that first 1 moves, also can carry out accurate describing.
In addition it is defeated that, nail building mortion 2 also has the light source that the output size of the light to penetrating from light source 4 measuresGo out determination part 23, control part 6 is controlled in light source 4 and speculum 7 according to the second information of being measured by light source output determination part 23At least either party.
By the information (the second information) being determined by light source output determination part 23 is carried out to FEEDBACK CONTROL, nail is shaped and fillsPutting 2 can describe with higher precision.
It should be noted that, as an example of light source output determination part 23, can be by the beam splitter 23a arranging in light pathForm with photo detector 23b.
<nail manufacturing process>
With reference to Fig. 5, the nail manufacturing process that uses the above nail building mortion 2 having illustrated is described.
First, user applies the photo-curable as nail material on the surface of nail 1 that oneself will implement manicureResin 3 (resin applying step S1). In this resin applying step, without forming and describe pattern by light-cured resin 3, only rightThe coating of nail entirety.
Then, select to describe pattern, and big or small according to three-dimensional shape, the output of describing pattern, nail 1 by control part 6Carry out the irradiation position of light, the control of irradiation time Deng feedback information, make the light-cured resin part of description region 3aSolidify (curing schedule S2). It should be noted that, in this curing schedule, use the nail being illustrated with reference to Fig. 1 to be shapedDevice 2, control part 6 is controlled at least either party in light source 4 and speculum 7 according to the density of describing pattern. Become about nailThe control of the irradiation time of shape device 2, the output size of light etc., identical with above-mentioned explanation, therefore, in this description will be omitted.
Next, remove irradiation light not and the light-cured resin 3 of the uncured region 3b that do not solidify (is removed stepS3). Like this, through a series of flow processs of resin applying step S1, curing schedule S2, removal step S3, can form thus instituteThat wishes describes pattern.
In addition, if repeatedly carry out above-mentioned resin applying step S1, curing schedule S2, removal step S3, can formThe three-dimensional pattern of describing being formed by lit-par-lit structure. In addition, by using color different gel nails to every layer, can also shapeBecome the colorful pattern of describing.
It should be noted that, due to curing wavelength, according to the kind of light-cured resin 3, therefore difference, preferably hasThe different multiple light sources 4 of wavelength are as light source 4. In the time that light source 4 is controlled by control part 6, preferably controlled condition is according to each differenceWavy and different.
In addition, in the above-described embodiment, enumerate the example of implementing manicure on the surface of nail 1 and be illustrated,But implementing manicure on false nail, the nail building mortion 2 that utilizes present embodiment also can obtain identical effect.
In addition, in the present embodiment, illustrated that user uses the nail 1 of nail building mortion 2 to user oneselfImplement the example of manicure, but also can nail building mortion 2 be set in manicure salon, by manicure librarian use present embodimentNail building mortion 2. In the time of the nail building mortion 2 of manicure librarian use present embodiment, can prevent from depending on manicure peopleThe deviation of describing precision that member's technical ability causes, and can shorten the manicure time.
Industrial utilizability
Nail building mortion of the present invention can easily form and describe pattern on nail or false nail. Exist userOn user's oneself nail, form in the situation of describing pattern particularly effective.
Description of reference numerals
1 nail
2 nail building mortions
3 light-cured resins
3a description region
The uncured region of 3b
4 light sources
5 smooth drawing sections
6 control parts
7 speculums
8 actuators
9 supporting frames
10 movable frame
11 movable parts
12 mirror portions
13 first turning cylinders
14 first vibration sections
15 second turning cylinders
16 second vibration sections
19 Department of Communication Forces
20 location divisions
21 storage parts
22 nail test sections
23 light source output determination parts
23a beam splitter
23b photo detector
Claims (12)
1. a nail building mortion, it uses light-cured resin to form and describe pattern on the surface of nail or false nail,It is characterized in that possessing:
Light source;
Light drawing section, it utilizes the light penetrating from described light source to make described light-cured resin local solidification; And
Control part, it controls described light source and described smooth drawing section.
2. nail building mortion according to claim 1, is characterized in that,
Described in described control part basis, describe the density of pattern and control described light source and described smooth drawing section.
3. nail building mortion according to claim 2, is characterized in that,
The irradiation time of the described light penetrating to the description region of describing pattern described in formation from described light source is by described controlPortion controls,
Described irradiation time is determined according to the unit interval of described description region.
4. nail building mortion according to claim 2, is characterized in that,
The output size of the described light penetrating to the description region of describing pattern described in formation from described light source is by described controlPortion controls,
The output size of described light is determined according to the unit interval of described description region.
5. nail building mortion according to claim 2, is characterized in that,
Described nail building mortion also possesses nail test section, and this nail test section detects the solid figure of described nail or false nailShape,
Described control part is controlled described light source and described speculum according to the first information being detected by described nail test sectionIn at least either party.
6. nail building mortion according to claim 5, is characterized in that,
Described nail building mortion also possesses light source output determination part, and the output that this light source output determination part is measured described light source is largeIt is little,
Described control part is controlled described light source and described anti-according to the second information being determined by described light source output determination partPenetrate at least either party in mirror.
7. nail building mortion according to claim 1, is characterized in that,
Described light source has the different multiple light sources of wavelength.
8. nail building mortion according to claim 1, is characterized in that,
Described light source is made up of semiconductor laser,
Described smooth drawing section is made up of speculum.
9. a nail manufacturing process, uses light-cured resin to form and describe pattern on the surface of nail or false nail, itsBe characterised in that to possess following steps:
Resin applying step applies described light-cured resin on the surface of described nail or described false nail;
Curing schedule, makes described light-cured resin local solidification; And
Remove step, remove the uncured portion of described light-cured resin,
In described curing schedule, make described light-cured resin local solidification with nail building mortion,
Described nail building mortion possesses:
Light source;
Light drawing section, it utilizes the light penetrating from described light source to make described light-cured resin local solidification; And
Control part, it controls described light source and described smooth drawing section.
10. nail manufacturing process according to claim 9, is characterized in that,
Described in described control part basis, describe the density of pattern and control described light source and described smooth drawing section.
11. nail manufacturing process according to claim 10, is characterized in that,
The irradiation time of the described light penetrating to the description region of describing pattern described in formation from described light source is by described controlPortion controls,
Described irradiation time is determined according to the unit interval of described description region.
12. nail manufacturing process according to claim 10, is characterized in that,
The output size of the described light penetrating to the description region of describing pattern described in formation from described light source is by described controlPortion controls,
The output size of described light is determined according to the unit interval of described description region.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013211539 | 2013-10-09 | ||
| JP2013-211539 | 2013-10-09 | ||
| PCT/JP2014/004811 WO2015052877A1 (en) | 2013-10-09 | 2014-09-18 | Nail molding device and nail molding method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105611853A true CN105611853A (en) | 2016-05-25 |
Family
ID=52812713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480055632.6A Pending CN105611853A (en) | 2013-10-09 | 2014-09-18 | Nail molding device and nail molding method |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20160227900A1 (en) |
| JP (1) | JPWO2015052877A1 (en) |
| CN (1) | CN105611853A (en) |
| WO (1) | WO2015052877A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107028324A (en) * | 2017-04-14 | 2017-08-11 | 徐校竹 | A kind of nail repairing type and health detector |
| CN109414101A (en) * | 2016-06-30 | 2019-03-01 | 莱雅公司 | Reversible thermochromic/photochromic cosmetics activator |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6428415B2 (en) * | 2015-03-20 | 2018-11-28 | カシオ計算機株式会社 | Drawing apparatus and nail shape detection method |
| US10684547B2 (en) * | 2017-01-10 | 2020-06-16 | L'oréal | Devices and methods for non-planar photolithography of nail polish |
| JP2021520974A (en) * | 2018-04-13 | 2021-08-26 | コーラル・ラボラトリーズ・インコーポレイテッドＣｏｒａｌ Ｌａｂｓ， Ｉｎｃ． | Systems and methods for accurate application and curing of nail polish |
| IL292623B2 (en) | 2019-10-29 | 2023-11-01 | Nailpro Inc | Automated total nail care systems, devices and methods |
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| US5028939A (en) * | 1988-08-23 | 1991-07-02 | Texas Instruments Incorporated | Spatial light modulator system |
| US6286517B1 (en) * | 1998-12-22 | 2001-09-11 | Pearl Technology Holdings, Llc | Fingernail and toenail decoration using ink jets |
| US5931166A (en) * | 1998-12-22 | 1999-08-03 | Weber; Paul J. | Fingernail decorating |
| US6485301B1 (en) * | 2000-01-24 | 2002-11-26 | Air Techniques, Inc. | Photo-curing light assembly having calibratable light intensity control |
| JP2002316363A (en) * | 2001-02-16 | 2002-10-29 | Fuji Photo Film Co Ltd | Optical shaping device and exposure unit |
| US20070038270A1 (en) * | 2005-07-05 | 2007-02-15 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Multi step photopatterning of skin |
| FR2942405A1 (en) * | 2009-02-23 | 2010-08-27 | Oreal | PROGRESSIVE PHOTOMAQUILING METHOD |
| JP5732916B2 (en) * | 2011-03-03 | 2015-06-10 | カシオ計算機株式会社 | Nail printing apparatus and printing control method |
| US20130161531A1 (en) * | 2011-12-22 | 2013-06-27 | Danny Lee Haile | Devices and methods for curing nail gels |
| US9841233B2 (en) * | 2012-03-30 | 2017-12-12 | Creative Nail Design Inc. | Nail lamp |
| JP2014008359A (en) * | 2012-07-03 | 2014-01-20 | Panasonic Corp | Resin hardening device |
| JP5831441B2 (en) * | 2012-12-17 | 2015-12-09 | カシオ計算機株式会社 | Nail printing apparatus and printing method for nail printing apparatus |
| EP2979686A1 (en) * | 2013-03-29 | 2016-02-03 | FUJIFILM Corporation | Artificial nail composition, artificial nail, method for forming artificial nail, method for removing artificial nail, and nail art kit |
| US9232843B2 (en) * | 2013-05-17 | 2016-01-12 | Beauty Bela Cosme Corp. | Nail polish curing device |
-
2014
- 2014-09-18 CN CN201480055632.6A patent/CN105611853A/en active Pending
- 2014-09-18 US US15/022,203 patent/US20160227900A1/en not_active Abandoned
- 2014-09-18 WO PCT/JP2014/004811 patent/WO2015052877A1/en active Application Filing
- 2014-09-18 JP JP2015541426A patent/JPWO2015052877A1/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109414101A (en) * | 2016-06-30 | 2019-03-01 | 莱雅公司 | Reversible thermochromic/photochromic cosmetics activator |
| CN107028324A (en) * | 2017-04-14 | 2017-08-11 | 徐校竹 | A kind of nail repairing type and health detector |
Also Published As
| Publication number | Publication date |
|---|---|
| US20160227900A1 (en) | 2016-08-11 |
| WO2015052877A1 (en) | 2015-04-16 |
| JPWO2015052877A1 (en) | 2017-03-09 |
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