CN105593013A - 气体阻隔性膜的制造方法 - Google Patents
气体阻隔性膜的制造方法 Download PDFInfo
- Publication number
- CN105593013A CN105593013A CN201480055052.7A CN201480055052A CN105593013A CN 105593013 A CN105593013 A CN 105593013A CN 201480055052 A CN201480055052 A CN 201480055052A CN 105593013 A CN105593013 A CN 105593013A
- Authority
- CN
- China
- Prior art keywords
- film
- barrier layer
- layer
- gas
- barrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/62—Nitrogen atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013-213132 | 2013-10-10 | ||
JP2013213132 | 2013-10-10 | ||
PCT/JP2014/077268 WO2015053405A1 (ja) | 2013-10-10 | 2014-10-10 | ガスバリア性フィルムの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN105593013A true CN105593013A (zh) | 2016-05-18 |
Family
ID=52813218
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201480055052.7A Pending CN105593013A (zh) | 2013-10-10 | 2014-10-10 | 气体阻隔性膜的制造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6319316B2 (ja) |
CN (1) | CN105593013A (ja) |
WO (1) | WO2015053405A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109296870A (zh) * | 2017-07-24 | 2019-02-01 | 中国科学院化学研究所 | 一种真空绝热板用阻隔膜及其制备方法和用途 |
CN109477202A (zh) * | 2016-07-28 | 2019-03-15 | 柯尼卡美能达株式会社 | 气体阻隔性膜、使用它的气体阻隔性膜材和使用它们的电子设备、以及气体阻隔性膜的制造方法 |
CN111373840A (zh) * | 2017-11-10 | 2020-07-03 | 柯尼卡美能达株式会社 | 电子器件的制造方法 |
CN113286701A (zh) * | 2018-11-09 | 2021-08-20 | 索弗雷什公司 | 吹塑膜材料及其制造方法和用途 |
CN113337214A (zh) * | 2020-03-03 | 2021-09-03 | 中国科学院化学研究所 | 一种氧阻隔涂层及其制备方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102016002011A1 (de) * | 2016-02-20 | 2017-08-24 | Universität Kassel | Verfahren zur Haftverbesserung von Silikon auf einer thermoplastischen Oberfläche |
CN107482131B (zh) * | 2017-08-14 | 2019-05-10 | 宁波安特弗新材料科技有限公司 | 一种阻隔膜 |
KR102141632B1 (ko) * | 2017-11-28 | 2020-08-06 | 주식회사 엘지화학 | 배리어 필름 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06299118A (ja) * | 1993-04-20 | 1994-10-25 | Tonen Corp | コーティング用組成物及びコーティング方法 |
JPH06306329A (ja) * | 1993-02-24 | 1994-11-01 | Tonen Corp | コーティング用組成物及びコーティング方法 |
WO2012067186A1 (ja) * | 2010-11-19 | 2012-05-24 | コニカミノルタホールディングス株式会社 | ガスバリア性フィルムの製造方法、及びガスバリア性フィルム |
WO2012067230A1 (ja) * | 2010-11-19 | 2012-05-24 | コニカミノルタホールディングス株式会社 | ガスバリア性フィルム、ガスバリア性フィルムの製造方法及び電子デバイス |
JP2013122965A (ja) * | 2011-12-09 | 2013-06-20 | Asahi Kasei E-Materials Corp | ポリシロキサン縮合物を含有する絶縁材料及び該絶縁材料を用いた硬化膜の製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5734675B2 (ja) * | 2011-01-17 | 2015-06-17 | 三井化学株式会社 | 積層体およびその製造方法 |
WO2014119754A1 (ja) * | 2013-01-31 | 2014-08-07 | コニカミノルタ株式会社 | ガスバリア性フィルムおよびその製造方法、ならびにこれを用いた電子デバイス |
-
2014
- 2014-10-10 WO PCT/JP2014/077268 patent/WO2015053405A1/ja active Application Filing
- 2014-10-10 CN CN201480055052.7A patent/CN105593013A/zh active Pending
- 2014-10-10 JP JP2015541660A patent/JP6319316B2/ja not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06306329A (ja) * | 1993-02-24 | 1994-11-01 | Tonen Corp | コーティング用組成物及びコーティング方法 |
JPH06299118A (ja) * | 1993-04-20 | 1994-10-25 | Tonen Corp | コーティング用組成物及びコーティング方法 |
WO2012067186A1 (ja) * | 2010-11-19 | 2012-05-24 | コニカミノルタホールディングス株式会社 | ガスバリア性フィルムの製造方法、及びガスバリア性フィルム |
WO2012067230A1 (ja) * | 2010-11-19 | 2012-05-24 | コニカミノルタホールディングス株式会社 | ガスバリア性フィルム、ガスバリア性フィルムの製造方法及び電子デバイス |
JP2013122965A (ja) * | 2011-12-09 | 2013-06-20 | Asahi Kasei E-Materials Corp | ポリシロキサン縮合物を含有する絶縁材料及び該絶縁材料を用いた硬化膜の製造方法 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109477202A (zh) * | 2016-07-28 | 2019-03-15 | 柯尼卡美能达株式会社 | 气体阻隔性膜、使用它的气体阻隔性膜材和使用它们的电子设备、以及气体阻隔性膜的制造方法 |
CN109296870A (zh) * | 2017-07-24 | 2019-02-01 | 中国科学院化学研究所 | 一种真空绝热板用阻隔膜及其制备方法和用途 |
CN111373840A (zh) * | 2017-11-10 | 2020-07-03 | 柯尼卡美能达株式会社 | 电子器件的制造方法 |
CN111373840B (zh) * | 2017-11-10 | 2022-12-20 | 柯尼卡美能达株式会社 | 电子器件的制造方法 |
CN113286701A (zh) * | 2018-11-09 | 2021-08-20 | 索弗雷什公司 | 吹塑膜材料及其制造方法和用途 |
CN113286701B (zh) * | 2018-11-09 | 2023-11-03 | 索弗雷什公司 | 吹塑膜材料及其制造方法和用途 |
US11873149B2 (en) | 2018-11-09 | 2024-01-16 | Sofresh, Inc. | Blown film materials and processes for manufacturing thereof and uses thereof |
CN113337214A (zh) * | 2020-03-03 | 2021-09-03 | 中国科学院化学研究所 | 一种氧阻隔涂层及其制备方法 |
CN113337214B (zh) * | 2020-03-03 | 2022-07-29 | 中国科学院化学研究所 | 一种氧阻隔涂层及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2015053405A1 (ja) | 2015-04-16 |
JPWO2015053405A1 (ja) | 2017-03-09 |
JP6319316B2 (ja) | 2018-05-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20160518 |