CN105546858A - Single aluminum target magnetron sputtering solar selective absorbing coating - Google Patents
Single aluminum target magnetron sputtering solar selective absorbing coating Download PDFInfo
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- CN105546858A CN105546858A CN201510911144.7A CN201510911144A CN105546858A CN 105546858 A CN105546858 A CN 105546858A CN 201510911144 A CN201510911144 A CN 201510911144A CN 105546858 A CN105546858 A CN 105546858A
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
- F24S70/225—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption for spectrally selective absorption
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0617—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0664—Carbonitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/30—Auxiliary coatings, e.g. anti-reflective coatings
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
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Abstract
The invention discloses a single aluminum target magnetron sputtering solar selective absorbing coating which is characterized in that the solar selective absorbing coating takes an aluminum reflecting film deposited on a substrate as a bottom layer, aluminum element ceramic deposited on the aluminum reflecting film as a diffusion blocking film layer, an aluminum element metal ceramic composite component deposited on the aluminum element ceramic diffusion blocking film layer as a solar selective absorbing material film layer, and an aluminum element ceramic antireflective film deposited on the aluminum element metal ceramic composite component solar selective absorbing material film layer as a surface layer, and the film plating of the solar selective absorbing coating is realized through a single aluminum target magnetron sputtering vacuum film plating machine, and with the combination of reactant gas and working gas. The single aluminum target magnetron sputtering solar selective absorbing coating has high absorptivity and good heat stability, so that the heat collection performance is excellent, and the single aluminum target magnetron sputtering solar selective absorbing coating has the advantages of simplicity and convenience in implementation. Surface volatilization and gas release rates of the single aluminum target magnetron sputtering solar selective absorbing coating are less than those of a metal-carbide absorbing material. Therefore, during heat collecting tube manufacturing, the baking temperature can be adjusted to 400-500 DEG C, and the production time period and production energy consumption can be reduced.
Description
Technical field
The present invention relates to a kind of solar selectively absorbing coating, it is for solar thermal collector.
Background technology
Film layer structure is different, causes the principle absorbing sunray different.Graded films, be multilayer film, its absorbed layer is generally 9 layers, and it successively absorbs sunray, and its light-absorbing performance uprises gradually.Due to this grading structure, transmitting ratio rises with temperature and continues to increase.And aluminium ion in absorbed layer at high operating temperatures, activity strengthens greatly, and drifts about.The internal structure generation entanglement of such rete, causes rete to start aging.Aluminium deposits diffusion at high temperature, and its reflecting properties is under some influence.Under being in this condition of high temperature for a long time, rete will come off, thus have impact on collecting efficiency and the life-span of vacuum heat collection pipe.When environment temperature is lower, heat waste is large, and collecting efficiency declines, and impact normally uses; Especially when air drying is more than 270 DEG C, rete start aging, come off, absorptivity reduces fast, and the life-span shortens greatly.
Summary of the invention
In order to overcome the above problems, the ceramic diffusion barrier rete that magnetron sputtering evaporation chemical property is more stable on metallic reflective coating, then can realize the isolation between metallic reflective coating and selective absorbing film, prevent the diffusion of metallic, simultaneously, ceramic diffusion barrier rete printing opacity, refractive index is comparatively large, and some ceramic diffusion barrier retes have certain extinction coefficient, can realize realizing effective reflection to the infrared ray that aluminium mirror coating reflecting layer is launched, reduce further the emissivity of heat absorption rete.Because the composition of ceramic diffusion barrier rete forms close with antireflective coating, so make when manufacturing vacuum heat collection pipe former tooling device and being constant, only changing process route, just can to realize rete at high temperature more stable, and heat resistance improves, the requirement that emissivity is lower.
The present invention is achieved in that a kind of single aluminium target magnetic control sputtering solar selectively absorbing coating, its solar selectively absorbing coating is to be deposited on aluminium mirror coating on substrate as bottom, ceramic for diffusion barrier rete with the aluminium element be deposited on aluminium mirror coating, to be deposited on aluminium element cermet composite parts on aluminium element ceramic diffusion barrier rete for solar selectively absorbing material rete, using be deposited on aluminium element cermet composite parts solar selectively absorbing material rete aluminium element pottery antireflective coating as top layer, solar selectively absorbing coating realizes plated film by single aluminium target magnetic control sputtering vacuum coating equipment association reaction gas and working gas.
Single aluminium target magnetic control sputtering solar selectively absorbing coating, its substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, inject oxygen afterwards, the aluminium atomic reaction of oxygen and magnetron sputtering, aluminium mirror coating generates Al
2o
3ceramic membrane, as diffusion barrier rete, inject argon gas and nitrogen afterwards, or argon gas and nitrogen, Co mixed gas, or argon gas and nitrogen, methane blended gas, or argon gas and nitrogen, acetylene gas mixture, aluminium atomicity is to nitrogen (or carbon, oxygen) ratio also increase, the absorbing material thickness of corresponding deposition increases, afterwards along with the flow of nitrogen increases gradually, the ratio of nitrogen to aluminium atomicity also increases, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-oxygen-nitrogen (or aluminium-carbon-oxygen-nitrogen), finally inject argon gas and carbon tetrafluoride mist, be formed on aluminium element cermet composite parts solar selectively absorbing material film surface, generate aluminium-nitrogen-fluorine (or aluminium-oxygen-fluorine) antireflective coating as top layer.
Single aluminium target magnetic control sputtering solar selectively absorbing coating, its substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, nitrogen injection afterwards, the aluminium atomic reaction of nitrogen and magnetron sputtering, aluminium mirror coating generates AlN ceramic film, as diffusion barrier rete, inject argon gas and nitrogen afterwards, or argon gas and nitrogen, Co mixed gas, or argon gas and nitrogen, methane blended gas, or argon gas and nitrogen, acetylene gas mixture, in mist, the share of nitrogen reduces, the ratio of aluminium atomicity to nitrogen also increases, the absorbing material thickness of corresponding deposition increases, the nitrogen share injecting argon gas and nitrogen mixed gas afterwards increases, the ratio of nitrogen to aluminium atomicity also increases, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-nitrogen (or aluminium-carbon-nitrogen) finally injects argon gas and carbon tetrafluoride mist, be formed on aluminium element cermet composite parts solar selectively absorbing material film surface, generate aluminium-nitrogen-fluorine antireflective coating as top layer.
Single aluminium target magnetic control sputtering solar selectively absorbing coating, its substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, inject oxygen afterwards, the aluminium atomic reaction of oxygen and magnetron sputtering, aluminium mirror coating generates Al
2o
3ceramic membrane, as diffusion barrier rete, inject argon gas and nitrogen afterwards, or argon gas and nitrogen, Co mixed gas, or argon gas and nitrogen, methane blended gas, or argon gas and nitrogen, acetylene gas mixture, the ratio of aluminium atomicity to nitrogen also increases, the absorbing material thickness of corresponding deposition increases, along with the flow of nitrogen increases gradually, the ratio of nitrogen to aluminium atomicity also increases, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-oxygen-nitrogen (or aluminium-carbon-oxygen-nitrogen), finally inject argon gas and oxygen mixed gas, the aluminium atomic reaction of oxygen and magnetron sputtering, be formed on aluminium element cermet composite parts solar selectively absorbing material film surface, generate Al
2o
3pottery antireflective coating top layer.
Single aluminium target magnetic control sputtering solar selectively absorbing coating, its substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, nitrogen injection afterwards, the aluminium atomic reaction of nitrogen and magnetron sputtering, aluminium mirror coating generates AlN ceramic film, as diffusion barrier rete, inject argon gas and nitrogen afterwards, or argon gas and nitrogen, Co mixed gas, or argon gas and nitrogen, methane blended gas, or argon gas and nitrogen, acetylene gas mixture, in mist, the share of nitrogen reduces, the ratio of aluminium atomicity to nitrogen also increases, the absorbing material thickness of corresponding deposition increases, the nitrogen share of the argon gas injected afterwards and nitrogen mixed gas increases, the ratio of nitrogen to aluminium atomicity also increases, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-nitrogen (or aluminium-carbon-nitrogen), finally inject argon gas and nitrogen mixed gas, the aluminium atomic reaction of nitrogen and magnetron sputtering, on aluminium element cermet composite parts solar selectively absorbing material film surface, generate AlN ceramic film antireflective coating top layer.
Single aluminium target magnetic control sputtering solar selectively absorbing coating, its substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, inject oxygen afterwards, the aluminium atomic reaction of oxygen and magnetron sputtering, aluminium mirror coating generates Al
2o
3ceramic membrane, as diffusion barrier rete, inject argon gas and nitrogen (or carbon monoxide) mist afterwards, aluminium atomicity is to nitrogen (or carbon, oxygen) ratio also increase, the absorbing material thickness of corresponding deposition increases, afterwards along with the flow of nitrogen (or carbon monoxide) increases gradually, nitrogen (or carbon, oxygen) ratio of aluminium atomicity is also increased, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-oxygen-nitrogen (or aluminium-carbon-oxygen-nitrogen), finally inject argon gas and carbon tetrafluoride mist, be formed on aluminium element cermet composite parts solar selectively absorbing material film surface, generate aluminium-nitrogen-fluorine (or aluminium-oxygen-fluorine) antireflective coating as top layer.
The invention has the beneficial effects as follows: rete has high absorptivity, low emissivity, Heat stability is good, thus solar collecting performance is excellent, and has the advantage be easy to implement.Therefore, when manufacturing thermal-collecting tube, baking temperature can be adjusted to 400-500 DEG C, and this will reduce cycle production time and energy consumption.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, the present invention is further described.
Fig. 1 is conventional aluminium-nitrogen-aluminium graded films Rotating fields schematic diagram;
Fig. 2 is aluminium element simple substance component content distribution map in conventional aluminium-nitrogen-aluminium gradual change rete;
Fig. 3 is the aluminium-nitrogen-aluminium graded films Rotating fields schematic diagram of the present invention with diffusion barrier film;
Fig. 4 is that the present invention is with aluminium element simple substance component content distribution map in the aluminium-nitrogen-aluminium gradual change rete of diffusion barrier film.
In figure: 1 glass tube walls, 2 reflectance coatings, 3 absorbing films, 4 antireflective coatings, 5 diffusion barrier films
As shown in Figure 3: a kind of single aluminium target magnetic control sputtering solar selectively absorbing coating, its solar selectively absorbing coating is to be deposited on aluminium mirror coating on substrate for bottom, ceramic for diffusion barrier rete with the aluminium element be deposited on aluminium mirror coating, to be deposited on aluminium element cermet composite parts on aluminium element ceramic diffusion barrier rete for solar selectively absorbing material rete, using be deposited on aluminium element cermet composite parts solar selectively absorbing material rete aluminium element pottery antireflective coating as top layer, solar selectively absorbing coating realizes plated film by single aluminium target magnetic control sputtering vacuum coating equipment association reaction gas and working gas.
As shown in Figure 4: single aluminium target magnetic control sputtering solar selectively absorbing coating, wherein one of structure is: substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, the aluminium mirror coating thickness of bottom evaporation is not less than 100nm, inject oxygen afterwards, the aluminium atomic reaction of oxygen and magnetron sputtering, aluminium mirror coating generates Al
2o
3ceramic membrane, as diffusion barrier rete, alundum (Al2O3) thickness is between 20nm-80nm, inject argon gas and nitrogen (or carbon monoxide) mist afterwards, aluminium atomicity is to nitrogen (or carbon, oxygen) ratio also increase, the absorbing material thickness of corresponding deposition increases, afterwards along with the flow of nitrogen (or carbon monoxide) increases gradually, nitrogen (or carbon, oxygen) ratio of aluminium atomicity is also increased, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-oxygen-nitrogen (or aluminium-carbon-oxygen-nitrogen) thickness is at 100nm-.260nm, finally inject argon gas and carbon tetrafluoride mist, be formed on aluminium element cermet composite parts solar selectively absorbing material film surface, generate aluminium-nitrogen-fluorine (or aluminium-oxygen-fluorine) antireflective coating as top layer, the thickness on antireflective coating top layer is 30-90nm.
As shown in Figure 4: single aluminium target magnetic control sputtering solar selectively absorbing coating, the second structure is: substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, the aluminium mirror coating thickness of bottom evaporation is not less than 100nm, nitrogen injection afterwards, the aluminium atomic reaction of nitrogen and magnetron sputtering, aluminium mirror coating generates AlN ceramic film, as diffusion barrier rete, aluminium nitride thickness is between 20nm-80nm, the share of the argon gas injected afterwards and nitrogen (or carbon monoxide) mist nitrogen reduces, aluminium atomicity is to nitrogen (or carbon, oxygen) ratio also increase, the absorbing material thickness of corresponding deposition increases, the nitrogen share of the argon gas injected afterwards and nitrogen (or carbon monoxide) mist increases, nitrogen (or carbon, oxygen) ratio of aluminium atomicity is also increased, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-nitrogen (or aluminium-carbon-nitrogen) thickness is at 100nm-.260nm, finally inject argon gas and carbon tetrafluoride mist, be formed on aluminium element cermet composite parts solar selectively absorbing material film surface, generate aluminium-nitrogen-fluorine antireflective coating as top layer, the thickness on antireflective coating top layer is 30-90nm.
As shown in Figure 4: single aluminium target magnetic control sputtering solar selectively absorbing coating, the third structure is: substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, the aluminium mirror coating thickness of bottom evaporation is not less than 100nm, inject oxygen afterwards, the aluminium atomic reaction of oxygen and magnetron sputtering, aluminium mirror coating generates Al
2o
3ceramic membrane, as diffusion barrier rete, alundum (Al2O3) thickness is between 20nm-80nm, inject argon gas and nitrogen (or carbon monoxide) mist afterwards, aluminium atomicity is to nitrogen (or carbon, oxygen) ratio also increase, the absorbing material thickness of corresponding deposition increases, along with the flow of nitrogen (or carbon monoxide) increases gradually, nitrogen (or carbon, oxygen) ratio of aluminium atomicity is also increased, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-oxygen-nitrogen (or aluminium-carbon-oxygen-nitrogen) thickness is at 100nm-.260nm, finally inject argon gas and oxygen mixed gas, the aluminium atomic reaction of oxygen and magnetron sputtering, be formed on aluminium element cermet composite parts solar selectively absorbing material film surface, generate Al
2o
3pottery antireflective coating top layer, the thickness on antireflective coating top layer is 30-90nm.
As shown in Figure 4: single aluminium target magnetic control sputtering solar selectively absorbing coating, 4th kind of structure is: substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, the aluminium mirror coating thickness of bottom evaporation is not less than 100nm, nitrogen injection afterwards, the aluminium atomic reaction of nitrogen and magnetron sputtering, aluminium mirror coating generates AlN ceramic film, as diffusion barrier rete, aluminium nitride thickness is between 20nm-80nm, the share of the argon gas injected afterwards and nitrogen (or carbon monoxide) mist nitrogen reduces, aluminium atomicity is to nitrogen (or carbon, oxygen) ratio also increase, the absorbing material thickness of corresponding deposition increases, the nitrogen share of the argon gas injected afterwards and nitrogen (or carbon monoxide) mist increases, nitrogen (or carbon, oxygen) ratio of aluminium atomicity is also increased, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-nitrogen (or aluminium-carbon-nitrogen) thickness is at 100nm-.260nm, finally inject argon gas and nitrogen mixed gas, the aluminium atomic reaction of nitrogen and magnetron sputtering, on aluminium element cermet composite parts solar selectively absorbing material film surface, generate AlN ceramic film antireflective coating top layer, the thickness on antireflective coating top layer is 30-90nm.
Claims (5)
1. a single aluminium target magnetic control sputtering solar selectively absorbing coating, it is characterized in that: solar selectively absorbing coating is to be deposited on aluminium mirror coating on substrate as bottom, ceramic for diffusion barrier rete with the aluminium element be deposited on aluminium mirror coating, to be deposited on aluminium element cermet composite parts on aluminium element ceramic diffusion barrier rete for solar selectively absorbing material rete, using be deposited on aluminium element cermet composite parts solar selectively absorbing material rete aluminium element pottery antireflective coating as top layer, solar selectively absorbing coating realizes plated film by single aluminium target magnetic control sputtering vacuum coating equipment association reaction gas and working gas.
2. single aluminium target magnetic control sputtering solar selectively absorbing coating according to claim 1, it is characterized in that: substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, inject oxygen afterwards, the aluminium atomic reaction of oxygen and magnetron sputtering, aluminium mirror coating generates Al
2o
3ceramic membrane, as diffusion barrier rete, inject argon gas and nitrogen afterwards, or argon gas and nitrogen, Co mixed gas, or argon gas and nitrogen, methane blended gas, or argon gas and nitrogen, acetylene gas mixture, aluminium atomicity is to nitrogen (or carbon, oxygen) ratio also increase, the absorbing material thickness of corresponding deposition increases, afterwards along with the flow of nitrogen increases gradually, the ratio of nitrogen to aluminium atomicity also increases, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-oxygen-nitrogen (or aluminium-carbon-oxygen-nitrogen), finally inject argon gas and carbon tetrafluoride mist, be formed on aluminium element cermet composite parts solar selectively absorbing material film surface, generate aluminium-nitrogen-fluorine (or aluminium-oxygen-fluorine) antireflective coating as top layer.
3. single aluminium target magnetic control sputtering solar selectively absorbing coating according to claim 1, it is characterized in that: substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, nitrogen injection afterwards, the aluminium atomic reaction of nitrogen and magnetron sputtering, aluminium mirror coating generates AlN ceramic film, as diffusion barrier rete, inject argon gas and nitrogen afterwards, or argon gas and nitrogen, Co mixed gas, or argon gas and nitrogen, methane blended gas, or argon gas and nitrogen, acetylene gas mixture, in mist, the share of nitrogen reduces, the ratio of aluminium atomicity to nitrogen also increases, the absorbing material thickness of corresponding deposition increases, the nitrogen share injecting argon gas and nitrogen mixed gas afterwards increases, the ratio of nitrogen to aluminium atomicity also increases, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-nitrogen (or aluminium-carbon-nitrogen) finally injects argon gas and carbon tetrafluoride mist, be formed on aluminium element cermet composite parts solar selectively absorbing material film surface, generate aluminium-nitrogen-fluorine antireflective coating as top layer.
4. single aluminium target magnetic control sputtering solar selectively absorbing coating according to claim 1, it is characterized in that: substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, inject oxygen afterwards, the aluminium atomic reaction of oxygen and magnetron sputtering, aluminium mirror coating generates Al
2o
3ceramic membrane, as diffusion barrier rete, inject argon gas and nitrogen afterwards, or argon gas and nitrogen, Co mixed gas, or argon gas and nitrogen, methane blended gas, or argon gas and nitrogen, acetylene gas mixture, the ratio of aluminium atomicity to nitrogen also increases, the absorbing material thickness of corresponding deposition increases, along with the flow of nitrogen increases gradually, the ratio of nitrogen to aluminium atomicity also increases, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-oxygen-nitrogen (or aluminium-carbon-oxygen-nitrogen), finally inject argon gas and oxygen mixed gas, the aluminium atomic reaction of oxygen and magnetron sputtering, be formed on aluminium element cermet composite parts solar selectively absorbing material film surface, generate Al
2o
3pottery antireflective coating top layer.
5. single aluminium target magnetic control sputtering solar selectively absorbing coating according to claim 1, it is characterized in that: substrate is glass tube, in single aluminium target magnetic control sputtering vacuum coating equipment in pure argon non-reaction magnetocontrol sputtering AM aluminum metallization reflectance coating on glass tube, nitrogen injection afterwards, the aluminium atomic reaction of nitrogen and magnetron sputtering, aluminium mirror coating generates AlN ceramic film, as diffusion barrier rete, inject argon gas and nitrogen afterwards, or argon gas and nitrogen, Co mixed gas, or argon gas and nitrogen, methane blended gas, or argon gas and nitrogen, acetylene gas mixture, in mist, the share of nitrogen reduces, the ratio of aluminium atomicity to nitrogen also increases, the absorbing material thickness of corresponding deposition increases, the nitrogen share of the argon gas injected afterwards and nitrogen mixed gas increases, the ratio of nitrogen to aluminium atomicity also increases, the absorbing material thickness of corresponding deposition increases, form aluminium element cermet composite parts solar selectively absorbing material rete, the composition of absorbing material rete is gradual change, absorbing material aluminium-nitrogen (or aluminium-carbon-nitrogen), finally inject argon gas and nitrogen mixed gas, the aluminium atomic reaction of nitrogen and magnetron sputtering, on aluminium element cermet composite parts solar selectively absorbing material film surface, generate AlN ceramic film antireflective coating top layer.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510911144.7A CN105546858A (en) | 2015-12-10 | 2015-12-10 | Single aluminum target magnetron sputtering solar selective absorbing coating |
| PCT/CN2016/109089 WO2017097236A1 (en) | 2015-12-10 | 2016-12-08 | Solar-selective absorbing coating with single aluminum target and magnetron sputtering |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510911144.7A CN105546858A (en) | 2015-12-10 | 2015-12-10 | Single aluminum target magnetron sputtering solar selective absorbing coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105546858A true CN105546858A (en) | 2016-05-04 |
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| CN201510911144.7A Pending CN105546858A (en) | 2015-12-10 | 2015-12-10 | Single aluminum target magnetron sputtering solar selective absorbing coating |
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| WO (1) | WO2017097236A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017097236A1 (en) * | 2015-12-10 | 2017-06-15 | 淄博环能海臣环保技术服务有限公司 | Solar-selective absorbing coating with single aluminum target and magnetron sputtering |
| CN107034468A (en) * | 2017-05-23 | 2017-08-11 | 上海子创镀膜技术有限公司 | A kind of coating structure of new type solar energy absorption film |
| TWI700179B (en) * | 2017-06-05 | 2020-08-01 | 香港商富智康（香港）有限公司 | Housing and method for making same |
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| CN105546858A (en) * | 2015-12-10 | 2016-05-04 | 淄博环能海臣环保技术服务有限公司 | Single aluminum target magnetron sputtering solar selective absorbing coating |
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- 2015-12-10 CN CN201510911144.7A patent/CN105546858A/en active Pending
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| CN101724812A (en) * | 2008-10-24 | 2010-06-09 | 山东力诺新材料有限公司 | Coating and preparation method thereof |
| CN103029374A (en) * | 2011-09-30 | 2013-04-10 | 中国科学院大连化学物理研究所 | Medium-high temperature solar photothermal selective absorbing coating |
| CN102620456A (en) * | 2012-04-06 | 2012-08-01 | 中国科学院宁波材料技术与工程研究所 | Medium-and-low-temperature solar selective absorption thin film and preparation method thereof |
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| CN103317788A (en) * | 2012-11-30 | 2013-09-25 | 北京天瑞星光热技术有限公司 | Spectrum selective absorbing coating and preparation method thereof |
| CN103528251A (en) * | 2013-10-14 | 2014-01-22 | 常州深蓝涂层技术有限公司 | High-temperature resistance metal ceramic solar energy selective absorbing coating and preparing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2017097236A1 (en) * | 2015-12-10 | 2017-06-15 | 淄博环能海臣环保技术服务有限公司 | Solar-selective absorbing coating with single aluminum target and magnetron sputtering |
| CN107034468A (en) * | 2017-05-23 | 2017-08-11 | 上海子创镀膜技术有限公司 | A kind of coating structure of new type solar energy absorption film |
| TWI700179B (en) * | 2017-06-05 | 2020-08-01 | 香港商富智康（香港）有限公司 | Housing and method for making same |
Also Published As
| Publication number | Publication date |
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| WO2017097236A1 (en) | 2017-06-15 |
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