CN100532997C - Selective solar energy absorbing coating and method for making same - Google Patents
Selective solar energy absorbing coating and method for making same Download PDFInfo
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- CN100532997C CN100532997C CNB2008100160128A CN200810016012A CN100532997C CN 100532997 C CN100532997 C CN 100532997C CN B2008100160128 A CNB2008100160128 A CN B2008100160128A CN 200810016012 A CN200810016012 A CN 200810016012A CN 100532997 C CN100532997 C CN 100532997C
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Abstract
The invention relates to a solar energy selective absorbing coating and a preparation method thereof. The coating comprises a substrate layer and an absorption layer, and is characterized in that a sediment blocking thermal diffusion film layer, a reflective layer, the absorption layer and a micro-irregular surface layer are arranged on the substrate layer; the substrate layer and the reflective layer are both Ni films; the blocking thermal diffusion film layer is a MgO film; the absorption layer is a composite ceramic film which is composed of a metal Ni and a medium MgO; and the micro-irregular surface layer is a Ni-C film and adopts the etching sputtering to form the rough and rugged surface. The coating has transmission-enhancing and wear-resistant properties, high absorption ratio of visible-near infrared spectra, extreme low emissivity of the infrared spectra, good stability of vacuum baking, high-temperature working temperature resistance of more than 300 DEG C, high absorption ratio and smaller emission. The preparation adopts the dual-target sputtering of a nickel target and a magnesium oxide target, which can improve the high-temperature using range, improve the thermal stability of the selective absorbing coating, reduce the infrared emissivity, simplify the production process and reduce the cost.
Description
Technical field
The present invention relates to the solar energy heating technical field, specifically is a kind of solar full-glass vacuum tube substrate surface coating for selective absorption and preparation method thereof.
Background technology
The important form of solar energy utilization is a solar thermal utilization, so the preparation of solar energy absorbing coating becomes the important process approach that solar energy optical-thermal utilizes.All-glass vacuum tube is the critical component of solar water heater and heat collector, and the performance of its coating directly influences the hot property of solar water heater and heat collector.
The solar energy optical-thermal range of application is mainly low temperature range (less than 100 ℃) at present, mainly uses the regular solar water heater, and range of application is family, hotel bathing and domestic water and heating.This kind water heater is not high to the temperature requirement of heat collecting element, and the regular solar all-glass vacuum tube can meet the demands.Therefore the solar selectively absorbing coating that uses in this temperature range has been studied with extensive use the Al-N/Al graded films at present, the advantage of this film system and process is, the work of the single target magnetically controlled DC sputtering of Al plated film, equipment is simple to operate, the rete absorptivity is higher, to using the more suitable of all-glass vacuum tube in low temperature range, but use because its infrared emittance obviously raises with the temperature rising for middle temperature and high temperature, the long-term back rete instability of using, cause the heat collector heat waste to increase, the thermal efficiency obviously descends.Be the application requirements of gentle high temperature in adapting to, absorber coatings must be able to be accomplished high-absorbility and low-launch-rate characteristics.
Middle high temperature field (100-300 ℃) and high temperature field (more than 300 ℃) application development progressively begin to become developing direction.Along with the Solar Heater Market of using the Al-N/Al graded films is progressively saturated, and national governments progressively strengthen the energy-conserving and environment-protective attention degree, and the application of solar water heater and heat collector is progressively extended to more wide high-end, high temperature field.High temperature is mainly used in desalinization, industry and agricultural application (as greenhouse gardening etc.) at present.The main in the field product coating of using has film layer structures such as ALNx/Cu, but, although the key Cu of this coating and process is more stable than AL, be that the rete of ALNx structure causes the absorptivity decay bigger because of factors such as oxidations in high temperature range.
High temperature heat collector can be used for solar energy thermal-power-generating.And heat endurance will be got well when the unattenuated high-temperature baking just of high temperature range theca interna performance.The main in the field product coating of using has W+ALN/W, film layer structures such as Mo+ALN/Mo, and still, the key of this coating and process is to adopt high-temperature stable metal such as W, Mo causes sedimentation rate low, and the production cycle is long, complex process, target is rare expensive, the cost height.
For selective coating, most structures are reflecting layer/absorbed layer/anti-reflection layer structure, and most sorbent surface and anti-reflection surface adopt the preparation of plane, especially anti-reflection layer to adopt the plane, this structure is for the high temperature absorber coatings, and shortcoming is higher in the high-temperature region emissivity.
Summary of the invention
In order to overcome the shortcoming that above-mentioned prior art exists, the purpose of this invention is to provide a kind of solar selectively absorbing coating, it can be used for the hot operation temperature more than 300 ℃, and has the visible-near-infrared spectrum high-absorbility, infrared spectrum utmost point low-launch-rate and vacuum bakeout Heat stability is good.
Technical scheme of the present invention is:
This solar selectively absorbing coating comprises substrate layer, stops thermal diffusion layer, reflecting layer, absorbed layer, little uneven superficial layer.
Substrate layer is the Ni film; The Ni molecular weight is big, the heat endurance height, and its film specular reflective is good, and the Ni film also has the low characteristic of infrared band emissivity, and the effectively heat radiation of the interior pipe of minimizing, and Ni material obtains easily, and cost is low.
Stop that the thermal diffusion rete is deposited on the substrate layer, this stops that thermal diffusion layer is the MgO film; The heat energy that prevents the thermal-collecting tube internal hot-water scatters and disappears by inner pipe wall; MgO heat endurance height has strengthened the stability of solar selectively absorbing coating integral body, and MgO film refractive index and extinction coefficient are lower.
The reflecting layer is deposited on and stops on the thermal diffusion rete, and this reflecting layer is the Ni film; Increase the reflectivity of pipe in the thermal-collecting tube, the radiations heat energy of interior pipe is stayed in the interior pipe to greatest extent.
Absorbed layer is deposited on the reflecting layer, is the metal-dielectric ceramic thin sheet that is made of Ni, MgO; Ni-MgO composite ceramic material is high and Heat stability is good in the high-temperature region absorptivity.
Little uneven superficial layer is deposited on the absorbed layer surface, and little uneven superficial layer is the Ni-C film, and the surface of Ni-C film is made as roughness and the protrusion of surface size of space is 0.4～2.1 μ m, near solar spectrum the sunshine of incident is absorbed through repeatedly reflecting; Its main effect is to form repeatedly to reflect and reflect, and reduces emissivity.
Further technical scheme:
In this solar selectively absorbing coating, along from the reflecting layer to the direction of little uneven superficial layer, the volume ratio of metal Ni reduces to 0.2 gradually from 0.65 in the absorbed layer, the volume ratio of MgO is increased to 0.8 gradually from 0.35.
In this solar selectively absorbing coating, described substrate layer thickness is 50～100nm.
The described thermal diffusion thicknesses of layers that stops is 50～100nm.
The thickness in described reflecting layer is 100-200nm.
The thickness of described absorbed layer is 130-250nm.
The thickness of described little uneven superficial layer is 200-400nm.
The present invention also aims to provide a kind of preparation method of solar selectively absorbing coating, its process stabilizing is simple, and is with short production cycle, and target is cheap, and cost is low.
This preparation method may further comprise the steps:
(1) at first opens mechanical pump coating chamber is taken out in advance, drive diffusion pump then, make coating chamber be evacuated to the order of magnitude 10
-3Pa feeds argon gas to the order of magnitude 10
-1Pa; Adopt two target sputtering apparatus, a target adopts Ni, and a target adopts MgO; Separate the interference when preventing plated film between rete between two targets with baffle plate;
(2) the Ni target is powered up carry out sputter, after the substrate layer Ni film thickness of deposition reaches requirement, the Ni target is cut off the power supply;
(3) the MgO target is powered up sputter, deposition stops that thermal diffusion rete MgO film, MgO film thickness reach after the requirement the outage of MgO target, stop the deposition of MgO on substrate layer Ni film;
(4) again the Ni target is powered up and carry out sputter, stopping deposition of reflective layer on the thermal diffusion rete;
(5) after reflector thickness reaches requirement, the MgO target is powered up, charge into oxygen simultaneously in argon gas, prepare absorbed layer by Ni target and MgO target co-sputtering, oxygen is to be used to deposit MgO; In the two target sputter absorbed layer processes, regulate electrical power, the voltage parameter of two targets and can adjust Ni and the volume ratio of MgO in the metal-dielectric ceramic thin sheet, can improve absorptivity greatly;
(6) absorber thickness cuts off the power supply to the MgO target after reaching requirement; Feed reacting gas in coating chamber, reacting gas is the hydrocarbon that contains 1～4 carbon; The Ni target continues the energising sputter, on absorbed layer, form the Ni-C ceramic thin sheet, and by conditioned reaction gas content and current strength, make the plasma in the coating chamber carry out etching to the surface that forms, make the surface of Ni-C ceramic thin sheet form roughness, the protrusion of surface size of space that forms is 0.4-2.1 μ m, near solar spectrum, obtains little uneven superficial layer;
(7) disconnect various sources of the gas and power supply at last, recover vacuum to the order of magnitude 10
-3Pa, the coating preparation finishes.
Further technical scheme: in little uneven superficial layer preparation process, change the content that feeds reacting gas gradually, make the refractive index alternation of little uneven superficial layer of formation.
The invention has the beneficial effects as follows: this coating has advantages such as anti-reflection, wear-resisting, Heat stability is good, the visible-near-infrared spectrum high-absorbility, and infrared spectrum utmost point low-launch-rate, the vacuum bakeout Heat stability is good can be used for the hot operation temperature more than 300 ℃.The present invention adopts Ni target and MgO target to prepare solar selectively absorbing coating, can improve the heat endurance of high temperature scope of application coating integral body, reduces infrared emittance, controls cost simultaneously and the production technology simplification; This coating hot property in greater than 300 ℃ high temperature range is stable, and the absorptivity height is launched smaller.
Description of drawings
The present invention will be further described below in conjunction with drawings and embodiments:
Fig. 1 is the cutaway view of solar selectively absorbing coating among the present invention,
Fig. 2 is the local structure for amplifying schematic diagram in the I place among Fig. 1,
Among the figure: pipe in 1,2 substrate layers, 3 stop the thermal diffusion rete, 4 reflecting layer, 5 absorbed layers, 6 little not plane surfaces.
The specific embodiment
As shown in Figure 1, this solar selectively absorbing coating, included the pipe 1 outer surface be docile and obedient the preface setting substrate layer 2, stop thermal diffusion rete 3, reflecting layer 4, absorbed layer 5, little uneven superficial layer 6.Prepare this solar selectively absorbing coating and adopt two target sputtering apparatus, a target adopts Ni, and a target adopts MgO; Separate the interference when preventing plated film between rete between two targets with baffle plate.At first open mechanical pump coating chamber is taken out in advance, drive diffusion pump then, make coating chamber be evacuated to the order of magnitude 10
-3Pa feeds argon gas to the order of magnitude 10
-1Pa.Then the Ni target is powered up and carry out sputter, preparation substrate layer 2.After the substrate layer Ni film thickness of deposition reaches 50～100nm, the Ni target is cut off the power supply.Why substrate layer 2 adopts the Ni film, be to consider to stop that thermal diffusion layer is less than adhesive force to metal level to the adhesive force of glass inner tube, simultaneously because the Ni molecular weight is big, the heat endurance height, its film specular reflective is good, and the Ni film also has the low characteristic of infrared band emissivity, the heat radiation of pipe in effectively reducing, and the Ni material obtains easily, and is low than other high-molecule metal costs.
After substrate layer 2 preparation finishes, the MgO target is powered up sputter, deposition forms the MgO film and promptly stops thermal diffusion rete 3 on substrate layer Ni film, after the MgO film thickness reaches 50～100nm, to the outage of MgO target, stops that 3 preparations of thermal diffusion rete finish.This layer effect is the stability that strengthens solar selectively absorbing coating integral body, improves reflectivity, prevents the diffusion of heat.
Again the Ni target is powered up and carry out sputter, stopping that deposition Ni film is reflecting layer 4 on the thermal diffusion rete.Reflecting layer 4 thickness requirements are 100～200nm.The main effect of this layer is the reflectivity of pipe in improving, and the radiations heat energy of interior pipe is stayed in the interior pipe to greatest extent.
After reflecting layer 4 thickness reach requirement, the MgO target is powered up, preparing the Ni-MgO ceramic thin sheet by Ni target and MgO target co-sputtering is absorbed layer 5.Simultaneously charge into oxygen in argon gas, oxygen is to be used to deposit MgO.It is good that the Ni-MgO ceramic thin sheet has absorptivity is high, infrared emittance is extremely low characteristics and a high high-temp stability.In the two target sputter absorbed layer processes, regulate electrical power, the voltage parameter of two targets and can adjust Ni and the volume ratio of MgO in the metal-dielectric ceramic thin sheet.Along 4 directions to little uneven superficial layer 6 from the reflecting layer, the volume ratio of metal Ni reduces to 0.2 gradually from 0.65 in the absorbed layer 5, and the volume ratio of corresponding M gO is increased to 0.8 gradually from 0.35.Like this, absorbed layer 5 is formed by stacking by the different process layer of a plurality of metal volume fractions exactly, thereby has improved absorptivity greatly, emissivity is reduced to minimum.The process layer that forms in the absorbed layer is many more, and the absorbent properties parameter is good more.Ni-MgO ceramic thin sheet thickness requirement is 130-250nm.
Absorbed layer 5 thickness cut off the power supply to the MgO target after reaching requirement; Feed reacting gas in coating chamber, reacting gas is the hydrocarbon that contains 1～4 carbon, generally in order to guarantee technology simple and handling safety employing methane or acetylene.The Ni target continues the energising sputter, and forming the Ni-C ceramic thin sheet on absorbed layer 5 is little uneven superficial layer 6.And pass through to change gradually content and the current strength that feeds reacting gas, thus change the bombardment intensity of plasma to coating, make the little uneven superficial layer height of formation different with the size of space, thus its refractive index alternation.It is cellular generally to be mountain peak shape or class, as shown in Figure 2.The protrusion of surface size of space that forms is 0.4-2.1 μ m, and near solar spectrum, the sunshine that makes incident is through repeatedly reflecting and reflect and be absorbed by the absorption layer the minimizing emissivity.In little uneven superficial layer preparation process, change the content that feeds reacting gas gradually, make the refractive index alternation of little uneven superficial layer of formation.
After little uneven surface layer thickness reaches 200-400nm, disconnect various sources of the gas and power supply, recover vacuum to the order of magnitude 10
-3Pa, the coating preparation finishes.
This invention is not limited to the foregoing description.
Claims (8)
1, a kind of solar selectively absorbing coating comprises substrate layer, absorbed layer, it is characterized in that: described substrate layer is the Ni film; Deposit on the substrate layer and stop the thermal diffusion rete, this stops that thermal diffusion layer is the MgO film; Stop on the thermal diffusion rete to deposit the reflecting layer that this reflecting layer is the Ni film; The metal-dielectric ceramic thin sheet of described absorbed layer for constituting by Ni, MgO, absorbed layer is deposited on the reflecting layer; The absorbed layer surface deposition has little uneven superficial layer, and little uneven superficial layer is the Ni-C film, and the surface of Ni-C film is made as roughness and the protrusion of surface size of space is 0.4～2.1 μ m.
2, a kind of solar selectively absorbing coating according to claim 1, it is characterized in that: along from the reflecting layer to the direction of little uneven superficial layer, the volume ratio of metal Ni reduces to 0.2 gradually from 0.65 in the absorbed layer, and the volume ratio of MgO is increased to 0.8 gradually from 0.35.
3, a kind of solar selectively absorbing coating according to claim 1 and 2 is characterized in that: described substrate layer thickness is 50～100nm.
4, a kind of solar selectively absorbing coating according to claim 1 and 2 is characterized in that: the described thermal diffusion thicknesses of layers that stops is 50～100nm.
5, a kind of solar selectively absorbing coating according to claim 1 and 2 is characterized in that: the thickness in described reflecting layer is 100-200nm.
6, a kind of solar selectively absorbing coating according to claim 1 and 2 is characterized in that: the thickness of described absorbed layer is 130-250nm.
7, a kind of solar selectively absorbing coating according to claim 1 and 2 is characterized in that: the thickness of described little uneven superficial layer is 200-400nm.
8, a kind of preparation method of solar selectively absorbing coating is characterized in that, may further comprise the steps:
(1) at first opens mechanical pump coating chamber is taken out in advance, drive diffusion pump then, make coating chamber be evacuated to the order of magnitude 10
-3Pa feeds argon gas to the order of magnitude 10
-1Pa; Adopt two target sputtering apparatus, a target adopts Ni, and a target adopts MgO; Separate the interference when preventing plated film between rete between two targets with baffle plate;
(2) the Ni target is powered up carry out sputter, after the substrate layer Ni film thickness of deposition reaches requirement, the Ni target is cut off the power supply;
(3) the MgO target is powered up sputter, deposition stops that thermal diffusion rete MgO film, MgO film thickness reach after the requirement the outage of MgO target, stop the deposition of MgO on substrate layer Ni film;
(4) again the Ni target is powered up and carry out sputter, stopping deposition of reflective layer on the thermal diffusion rete;
(5) after reflector thickness reaches requirement, the MgO target is powered up, charge into oxygen simultaneously in argon gas, prepare absorbed layer by Ni target and MgO target co-sputtering, oxygen is to be used to deposit MgO; In the two target sputter absorbed layer processes, regulate electrical power, the voltage parameter of two targets and can adjust Ni and the volume ratio of MgO in the metal-dielectric ceramic thin sheet;
(6) absorber thickness cuts off the power supply to the MgO target after reaching requirement; Feed reacting gas in coating chamber, reacting gas is the hydrocarbon that contains 1～4 carbon; The Ni target continues the energising sputter, on absorbed layer, form the Ni-C ceramic thin sheet, and by conditioned reaction gas content and current strength, make the plasma in the coating chamber carry out etching to the surface that forms, make the surface of Ni-C ceramic thin sheet form roughness, the protrusion of surface size of space that forms is 0.4-2.1 μ m, near solar spectrum, obtains little uneven superficial layer;
(7) disconnect various sources of the gas and power supply at last, recover vacuum to the order of magnitude 10
-3Pa, the coating preparation finishes.
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| CNB2008100160128A CN100532997C (en) | 2008-05-08 | 2008-05-08 | Selective solar energy absorbing coating and method for making same |
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| CNB2008100160128A CN100532997C (en) | 2008-05-08 | 2008-05-08 | Selective solar energy absorbing coating and method for making same |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101839578A (en) * | 2010-03-12 | 2010-09-22 | 海宁伊满阁太阳能科技有限公司 | Preparation method and product of vacuum heat-collecting element of inner glass tube covered, patched and sprayed with metal |
| CN101839577A (en) * | 2010-03-12 | 2010-09-22 | 海宁伊满阁太阳能科技有限公司 | Manufacturing method of heat collection element of selective absorption film with slightly uneven surface |
| TWI500897B (en) * | 2012-12-10 | 2015-09-21 | Univ Nat Cheng Kung | Manufacturing method for heat collection element film |
| CN103032978B (en) * | 2012-12-27 | 2015-05-13 | 北京市太阳能研究所集团有限公司 | Selective absorbing coating for fresnel solar thermal power generation and preparation method of selective absorbing coating |
| CN103350532B (en) * | 2013-07-22 | 2015-10-28 | 江苏大学 | A kind of solar selective absorbing film system and preparation method thereof |
| CN103574950B (en) * | 2013-11-21 | 2017-01-11 | 佛山市东鹏陶瓷有限公司 | Solar ceramic coating and manufacturing method thereof |
| CN110104957A (en) * | 2019-04-17 | 2019-08-09 | 信利光电股份有限公司 | A kind of anti-reflective film of wide bandwidth and preparation method thereof |
| CN114941129A (en) * | 2022-06-23 | 2022-08-26 | 中国科学院宁波材料技术与工程研究所 | Infrared selective absorption composite film with adjustable refractive index and preparation method thereof |
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Application publication date: 20080917 Assignee: Jiangsu Sangle Digital Solar Energy Co.,Ltd. Assignor: Shangdong Sangle Solar Energy Co., Ltd. Contract record no.: 2013370000021 Denomination of invention: Solar selective absorbing coating and preparation method thereof Granted publication date: 20090826 License type: Exclusive License Record date: 20130205 |
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Address after: The 250000 Ji'nan Road, Shandong province high tech Zone No. 2639 spring Patentee after: Shandong sangle Group Co., Ltd Address before: 250014 Shandong Province, Lixia District, Ji'nan City Hospital Road, No. 19 Patentee before: SHANDONG SANGLE SOLAR ENERGY Co.,Ltd. |
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