CN105426006A - Embedded touch screen with high-resistance film and preparation method thereof - Google Patents
Embedded touch screen with high-resistance film and preparation method thereof Download PDFInfo
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- CN105426006A CN105426006A CN201510890642.8A CN201510890642A CN105426006A CN 105426006 A CN105426006 A CN 105426006A CN 201510890642 A CN201510890642 A CN 201510890642A CN 105426006 A CN105426006 A CN 105426006A
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Abstract
The invention relates to an embedded touch screen with a high-resistance film and a preparation method thereof. The touch screen comprises a first substrate, a thin-film transistor substrate, a liquid crystal layer, a colour optical filter, a touch induction layer, a second substrate and a high-resistance film polarizing plate laminated in sequence; a plurality of mutually insulated induction circuits are arranged on the surface of the thin-film transistor substrate towards the liquid crystal layer; the high-resistance film is arranged on the surface of the second substrate away from the touch induction layer; the high-resistance film is electrically connected with the thin-film transistor substrate; the material of the high-resistance film comprises the mixture of graphite oxide, tin oxide, a surface active agent and a cross-linking agent; therefore, the high-resistance film has good adsorption performance and electrical performance; static electricity generated by the thin-film transistor substrate is instantly released through the high-resistance film; therefore, the electrostatic interaction is eliminated; mutual interference between touch sensors can be reduced; and thus, the touch sensitivity of the embedded touch screen can be improved. The preparation method of the touch screen is simple in preparation process and low in fragment risk and is applied to large-scale production.
Description
Technical field
The present invention relates to display device field, particularly a kind of In-cell touch panel with high resistance film and preparation method thereof.
Background technology
Touch-screen is the important component part of the electronic equipments such as mobile phone, panel computer, e-book.At present, touch-screen generally can be divided into according to composition structure: externally embedded type (On-Cell) and embedded (In-Cell).Externally embedded type (On-Cell) refers to the method be embedded into by touch panel between the colored filter substrate of display screen and polaroid, namely on liquid crystal panel, touch sensor is joined, due to many one deck touch control layer, the problems such as thickness is thicker, the irregular colour easily produced during touch-control.Embeddedly refer to the method be embedded into by touch panel function in liquid crystal pixel, namely embed touch sensor function in display screen inside, can the thickness of thinning module entirety, greatly can reduce again the cost of manufacture of touch-screen, be subject to the favor of Ge great panel producer.
But In-cell touch panel needs the pixel inside on thin-film transistor array base-plate to embed touch sensor usually, easily interference mutually between touch sensor, thus cause touch-control sensitivity lower.
Summary of the invention
Based on this, be necessary In-cell touch panel providing a kind of sensitivity higher and preparation method thereof.
A kind of In-cell touch panel with high resistance film, comprise the first substrate stacked gradually, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer, second substrate, high resistance film and Polarizer, described thin film transistor base plate is provided with the induction line of many mutually insulateds towards the surface of described liquid crystal layer, described high resistance film is formed at the surface of described second substrate away from described touch sensitive layer, described high resistance film is electrically connected with described thin film transistor base plate, the material of described high resistance film comprises graphite oxide, tin oxide, the potpourri of surfactant and crosslinking chemical.
Wherein in an embodiment, the material of described high resistance film comprises the crosslinking chemical of the graphite oxide of 4 parts ~ 7 parts, the tin oxide of 10 parts ~ 13 parts, the surfactant of 25 parts ~ 30 parts and 10 parts ~ 26 parts according to weight parts.
Wherein in an embodiment, also comprise cover sheet, described cover sheet is laminated on the surface of described Polarizer away from described high resistance film.
Wherein in an embodiment, the thickness of described high resistance film is 30nm ~ 50nm.
The above-mentioned preparation method with the In-cell touch panel of high resistance film, comprises the steps:
There is provided first substrate, laminate film transistor base on described first substrate;
The induction line of many mutually insulateds is formed on the surface of described thin film transistor base plate;
The surface being formed with described induction line at described thin film transistor base plate forms liquid crystal layer;
There is provided colored filter, by stacked for described colored filter on described liquid crystal layer;
Second substrate is provided, forms touch sensitive layer on the surface of described second substrate;
Described colored filter and described touch sensitive layer are fitted, obtains the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer and the second substrate that stack gradually;
At the surface formation high resistance film of described second substrate away from described touch sensitive layer, the material of described high resistance film comprises the potpourri of graphite oxide, tin oxide, surfactant and crosslinking chemical;
Stacked Polarizer on described high resistance film; And
Described high resistance film is electrically connected with described tft layer, obtains the In-cell touch panel with high resistance film.
Wherein in an embodiment, being operating as of high resistance film is formed away from the surface of described touch sensitive layer: by the mode of spraying, pulp spraying is applied to the surface of described second substrate away from described touch sensitive layer at described second substrate, described slurry comprises the potpourri of graphite oxide, tin oxide, surfactant, crosslinking chemical and solvent, spray pressure is 0.5MPa ~ 1.5MPa, temperature is 20 DEG C ~ 30 DEG C, and humidity is 50% ~ 60%.
Wherein in an embodiment, described slurry comprises the solvent of the graphite oxide of 4 parts ~ 7 parts, the tin oxide of 10 parts ~ 13 parts, the surfactant of 25 parts ~ 30 parts, the crosslinking chemical of 10 parts ~ 26 parts and 35 parts ~ 45 parts according to weight parts.
Wherein in an embodiment, the viscosity of described slurry is 30cP ~ 40cP.
Wherein in an embodiment, described described colored filter and described touch sensitive layer are fitted be operating as: under vacuum, described colored filter and described touch sensitive layer are fitted.
Wherein in an embodiment, formed after high resistance film on the surface of described second substrate away from described touch sensitive layer, comprise baking process, cleaning treatment and air-dry process, the condition of described baking process is toast 10min ~ 20min at 110 DEG C ~ 120 DEG C, and the condition of described air-dry process is air-dry 10min ~ 50min at 55 DEG C ~ 65 DEG C.
The above-mentioned In-cell touch panel with high resistance film, comprises the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer, second substrate, the high resistance film Polarizer that stack gradually.Thin film transistor base plate is provided with the induction line of many mutually insulateds towards the surface of liquid crystal layer, thin film transistor base plate coordinates with touch sensitive layer and makes touch panel function be embedded in liquid crystal pixel, reduces the thickness of touch-screen.By arranging high resistance film at second substrate away from the surface of touch sensitive layer, and high resistance film is electrically connected with thin film transistor base plate.The material of high resistance film comprises the potpourri of graphite oxide, tin oxide, surfactant and crosslinking chemical, there is excellent absorption property and electrology characteristic, by the electrostatic instant-free that thin film transistor base plate produces by high resistance film, eliminate electrostatic interaction, reduce the mutual interference between touch sensor, thus improve the touch-control sensitivity of In-cell touch panel.
Accompanying drawing explanation
Fig. 1 is the structural representation with the In-cell touch panel of high resistance film of an embodiment;
Fig. 2 is the process flow diagram with the preparation method of the In-cell touch panel of high resistance film of an embodiment.
Embodiment
Mainly in conjunction with concrete drawings and the specific embodiments, In-cell touch panel with high resistance film and preparation method thereof is described in further detail below.
Refer to Fig. 1; the In-cell touch panel 100 with high resistance film of one embodiment; comprise the first substrate 10, thin film transistor base plate (ThinFilmTransistor, TFT substrate) 20, liquid crystal layer 30, colored filter 40, touch sensitive layer 50, second substrate 60, high resistance film 70, Polarizer 80 and the cover sheet 90 that stack gradually.
Thin film transistor base plate 20 is provided with the induction line of many mutually insulateds towards the surface of liquid crystal layer 30, high resistance film 70 is formed at the surface of second substrate 60 away from touch sensitive layer 50, and high resistance film 70 is electrically connected with thin film transistor base plate 20.Concrete, high resistance film 70 is electrically connected by going between with thin film transistor base plate 20.
The surface towards liquid crystal layer 30 of thin film transistor base plate 20 is provided with the induction line of many mutually insulateds, and the induction line of many mutually insulateds can be embedded in liquid crystal layer 30.Thin film transistor base plate 20 coordinates with touch sensitive layer 50, makes touch panel function be embedded in liquid crystal pixel, embeds touch sensor function, forms the touch-screen of In-Cell type, reduce the thickness of touch-screen, make screen more frivolous in display screen inside.By arranging high resistance film 70 at second substrate 60 away from the surface of touch sensitive layer 50, and high resistance film 70 is electrically connected with thin film transistor base plate 20.The electrostatic instant-free that thin film transistor base plate 20 can produce by high resistance film 70, plays elimination electrostatic interaction, reduces the mutual interference between touch sensor, thus improves the touch-control sensitivity with the In-cell touch panel 100 of high resistance film.
In present embodiment, the thickness with the In-cell touch panel 100 of high resistance film is 0.6mm ~ 0.8mm.Be embedded in liquid crystal pixel by touch panel function, greatly reduce the thickness of touch-screen.
Concrete, first substrate 10 and second substrate 60 can be the translucent materials such as glass.
Concrete, the material of high resistance film 70 comprises the potpourri of graphite oxide, tin oxide, surfactant and crosslinking chemical.
Graphite oxide (Graphiteoxide, GO) is a kind of Novel carbon material, has excellent absorption property.Tin oxide (SnO
2) be a kind of activating oxide, there is characteristic of semiconductor.The compound substance that after the mixing of graphite oxide, tin oxide, surfactant and crosslinking chemical, available can be excellent.Tin oxide can change the surface nature of graphite oxide, and the feature of graphite oxide high porosity, high surface area can promote again the dispersiveness of tin oxide.Various component synergy causes high resistance film 70 to have excellent absorption property and electrology characteristic.
The high resistance film 70 electrostatic instant-free that thin film transistor base plate 20 can be produced of the potpourri composition of graphite oxide, tin oxide, surfactant and crosslinking chemical, plays elimination electrostatic interaction, improves touch-control sensitivity.Simultaneously due to its excellent absorption property, do not need to use bonding agent etc. can be formed at the surface of second substrate 60, increase the thickness with the In-cell touch panel 100 of high resistance film hardly.
Preferably, high resistance film 70 material comprises the crosslinking chemical of the graphite oxide of 4 parts ~ 7 parts, the tin oxide of 10 parts ~ 13 parts, the surfactant of 25 parts ~ 30 parts and 10 parts ~ 26 parts according to weight parts.
In present embodiment, the potpourri of graphite oxide, tin oxide, surfactant and crosslinking chemical comprises the crosslinking chemical of the graphite oxide of 5.5 parts, the tin oxide of 11.5 parts, the surfactant of 27.5 parts and 18 parts according to weight parts.
Concrete, surfactant can be stearic acid, neopelex, quaternary ammonium compound, lecithin, fatty glyceride, fatty acid sorb smooth (sapn), polysorbate (tween) etc.
In present embodiment, surfactant is that LG-DOW company produces DOWFAX2A1 type surfactant.
Concrete, crosslinking chemical can be tygon, Polyvinylchloride, polyacrylate, polyalkyl acrylate, styrene, vinyl cyanide, acrylic acid, methacrylic acid, glyoxal, aziridine etc.
In present embodiment, crosslinking chemical is aziridine crosslinker.Be specially Shanghai You En Chemical Co., Ltd. and produce SaC-100 type aziridine crosslinker.
Traditional touch-screen generally needs use one piece of substrate as supporting body, and to reduce the interference of touch, but because add one block of supporting body, the thickness of product increases.After superposition, thickness can increase about about 0.4mm, and greatly increase the thickness of electronic equipment (such as mobile phone), and light transmission is poor, reflectivity is higher in the sun, direct experience lf being influenced effect.Easily go wrong in laminating process simultaneously, reduce yield low.By directly causing, cost improves, the process-cycle is long for this, the market competition environment of inadaptable excitation.
Also can improve the sensitivity of touch-screen according to semiconductor material, but semiconductor material is expensive, complicated process of preparation, is unsuitable for large-scale production.
The potpourri strong adhesion of graphite oxide of the present invention, tin oxide, aziridine and anionic surfactant composition, conduct electricity very well, light transmission is good, and stable strong not easily oxidized, preparation technology is simple, is suitable for large-scale production.
Preferably, the thickness of high resistance film 70 is 30nm ~ 50nm.
Preferably, the surface resistance of high resistance film 70 is 5 × 10
8Ω/cm
2~ 5 × 10
9Ω/cm
2.
In present embodiment, transmittance >=92% of high resistance film 70, transmittance refers to the ratio that the In-cell touch panel 100 with high resistance film forms the rear transmittance with being formed before high resistance film 70 of high resistance film 70 herein.
General, the surface resistance resistance of high resistance film 70 is fewer, and anti-static effect is better.But surface resistance resistance is less, easily interference effect is played to embedded (in-cell) touch screen, make touch effect influenced.Resistance is larger, and anti-static effect is not obvious, and ITO electric conductivity is very strong, and when needing to reach higher resistance, thicknesses of layers is too thin, does not have the effect of electrostatic prevention.
The present invention shows through experiment, and the surface resistance of high resistance film 70 is 5 × 10
8Ω/cm
2~ 5 × 10
9Ω/cm
2time, can not affect touch effect again by electrostatic prevention, and appropriate thickness, have good transmittance and electric conductivity, anti-static effect is good.
The above-mentioned preparation method with the In-cell touch panel of high resistance film as shown in Figure 2, comprises the steps:
S10, provide first substrate, laminate film transistor base on the first substrate.
First substrate can be glass, and glass has good light transmission.
Thin film transistor base plate is layered in the surface of first substrate.
S20, form the induction line of many mutually insulateds on the surface of thin film transistor base plate.
The material of induction line is ITO, and certainly, the material of induction line is not limited to ITO, also can be that other conductive materials are as AZO etc.
Concrete, by the mode of stencil or vacuum magnetic-control sputtering at thin film transistor base plate surface coating, and adopt chemical method for etching to carry out patterning, obtain the induction line of many mutually insulateds.
S30, be formed with induction line at thin film transistor base plate surface on form liquid crystal layer.
The material of liquid crystal layer can be the organism such as aliphatics, aromatic series, stearic acid.Formula Liquid crystal pour method of dripping can be adopted, first liquid crystal is directly dropped on thin film transistor base plate, and then thin film transistor base plate and colored filter are carried out group.Or, perfusion liquid crystal method can be adopted between thin film transistor base plate and colored filter to form liquid crystal layer, by thin film transistor base plate and colored filter to after group, adopt capillary principle to be sucked by liquid crystal and form liquid crystal layer.
S40, provide colored filter, by stacked for colored filter on liquid crystal layer.
In present embodiment, first liquid crystal is directly dropped on thin film transistor base plate, and then thin film transistor base plate and colored filter are carried out group, make colored filter stacked on liquid crystal layer.
S50, provide second substrate, form touch sensitive layer on the surface of second substrate.
The material of touch sensitive layer is ITO, and certainly, the material of touch sensitive layer is not limited to ITO, also can be that other conductive materials are as AZO etc.
Concrete, by the mode of stencil or vacuum magnetic-control sputtering at second substrate surface coating, and adopt chemical method for etching to carry out patterning, obtain touch sensitive layer.
S60, colored filter and touch sensitive layer to be fitted, obtain the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer and the second substrate that stack gradually.
Sequentially laminated with thin film transistor base plate, liquid crystal layer and colored filter on first substrate, this is a plate.Second substrate is laminated with touch sensitive layer, and this is b plate.A plate and b plate are fitted, wherein, colored filter is relative with touch sensitive layer fits, and obtains the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer and the second substrate that stack gradually.
Preferably, under vacuum, a plate and b plate are fitted, the vacuum abutted intensity being conducive to promoting touch sensitive layer and colored filter and combining closely, makes the touch-screen for preparing thinner.
Thin film transistor base plate coordinates with touch sensitive layer, makes touch panel function be embedded in liquid crystal pixel, embeds touch sensor function in display screen inside.Under the driving of IC (integratedcircuit, integrated circuit), reach the function of touch.
S70, second substrate away from touch sensitive layer surface formed high resistance film, the material of high resistance film comprises the potpourri of graphite oxide, tin oxide, surfactant and crosslinking chemical.
Concrete, the mode pulp spraying by spraying is applied to the surface of second substrate away from touch sensitive layer.Certainly, also other modes can be adopted, as the mode such as vacuum magnetic-control sputtering, serigraphy forms high resistance film on second substrate surface.
In present embodiment, adopt automatic spraying equipment that pulp spraying is applied to second substrate surface.Preferably, spray gun is 20cm ~ 40cm from the distance on second substrate surface, and spray pressure is 0.5MPa ~ 1.5MPa, and temperature is 20 DEG C ~ 30 DEG C, and humidity is 50% ~ 60%.
Concrete, slurry comprises the potpourri of graphite oxide, tin oxide, surfactant, crosslinking chemical and solvent.
Preferably, slurry comprises the solvent of the graphite oxide of 4 parts ~ 7 parts, the tin oxide of 10 parts ~ 13 parts, the surfactant of 25 parts ~ 30 parts, the crosslinking chemical of 10 parts ~ 26 parts and 35 parts ~ 45 parts according to weight parts.
Wherein, graphite oxide (Graphiteoxide, GO) is a kind of Novel carbon material, has excellent absorption property.Tin oxide (SnO
2) be a kind of activating oxide, there is characteristic of semiconductor.The compound substance that after graphite oxide, tin oxide, surfactant, crosslinking chemical mix with solvent, available can be excellent.Tin oxide can change the surface nature of graphite oxide, and the feature of graphite oxide high porosity, high surface area can promote again the dispersiveness of tin oxide.Various component synergy causes slurry to have excellent absorption property and electrology characteristic.
Due to the absorption property that above-mentioned slurry is excellent, do not need to use bonding agent etc. can be sprayed into the surface of second substrate, increase the thickness with the In-cell touch panel of high resistance film hardly.The electrostatic instant-free that thin film transistor base plate can produce by the high resistance film obtained after slurry drying, plays elimination electrostatic interaction, improves touch-control sensitivity.
Concrete, solvent can be water or organic solvent, and preferably, the viscosity of slurry is 30cP ~ 40cP.
Concrete, surfactant can be stearic acid, neopelex, quaternary ammonium compound, lecithin, fatty glyceride, fatty acid sorb smooth (sapn), polysorbate (tween) etc.
Crosslinking chemical can be tygon, Polyvinylchloride, polyacrylate, polyalkyl acrylate, styrene, vinyl cyanide, acrylic acid, methacrylic acid, glyoxal, aziridine etc.
Specifically in the present embodiment, surfactant is that LG-DOW company produces DOWFAX2A1 type surfactant.Crosslinking chemical is specially Shanghai You En Chemical Co., Ltd. and produces SaC-100 type aziridine crosslinker.
Preferably, before the surface formation high resistance film of second substrate away from touch sensitive layer, second substrate can be carried out successively cleaning treatment, dry process and electrostatic dissipation process, the operation of cleaning treatment comprises carries out pure water cleaning, caustic dip, two fluid cleaning showers (BJ cleaning showers), ultrapure water cleaning showers (DI cleaning showers) and high pressure cleaning showers successively.Alkali lye can be clean-out system, as the glass cleaner containing potassium hydroxide or NaOH.Two fluid spray refer to that make gases at high pressure and cleaning fluid form drop by nozzle and spray at a high speed, cleaning of objects is surperficial by high-pressure gaseous fluid if air and fluid liquid are as after water mixes.Ultrapure water sprays, and pure water refers to the water of resistivity >=10 megaohm.Dry process comprises carries out cold air drying and heated-air drying successively.It should be noted that, if colored filter substrate itself is clean, without dirty and dust, then this step can be omitted.Carry out electrostatic dissipation process after cleaning treatment and dry process, and detect surface quality, after qualified, enter spraying slurry operation.
Preferably, formed after high resistance film on the surface of second substrate away from touch sensitive layer, comprise the second substrate forming high resistance film carried out baking processes, cleaning treatment and air-dry process.The condition of baking process is toast 10min ~ 20min at 110 DEG C ~ 120 DEG C, and cleaning treatment preferably uses the pure water of resistivity >=10 megaohm to clean, and the condition of air-dry process is air-dry 10min ~ 50min at 55 DEG C ~ 65 DEG C.Baking process can accelerate the drying of slurry, and each component of high resistance film formed is more evenly distributed.
S80, on high resistance film stacked Polarizer.
Preferably, the material of Polarizer is selected from least one in ethylene-vinyl acetate copolymer (EVA), polyethylene terephthalate (PET), polyvinyl alcohol (PVA) (PVA) and AP (AP).
Preferably, concrete, after formation high resistance film, touch panel can be divided into small pieces, the size of small pieces, generally at 4.5 cun ~ about 6 cun, is applicable to the size of mobile phone screen.After small pieces are cleaned, high resistance film forms Polarizer, then cover sheet is laminated on Polarizer.Preferably, cover sheet and polarizing layer are fitted by optical cement, and cover sheet can protect high resistance film.The material of cover sheet 90 is selected from least one in soda-lime glass, high alumina white glass and rising sun rainbow height lead glass.
S90, high resistance film to be electrically connected with tft layer, to obtain the In-cell touch panel with high resistance film.
Concrete, by lead-in wire, high resistance film is electrically connected with tft layer.High resistance film is electrically connected with thin film transistor base plate.The electrostatic instant-free that thin film transistor base plate produces by high resistance film, plays elimination electrostatic interaction, reduces the mutual interference between touch sensor, thus improves the touch-control sensitivity with the In-cell touch panel of high resistance film.
It should be noted that, the above-mentioned step with the preparation method of the In-cell touch panel of high resistance film is not limited to take said sequence, also can adjust as required.Such as, S50 can before S10.
The above-mentioned In-cell touch panel with high resistance film, comprises the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer, second substrate, the high resistance film Polarizer that stack gradually.Thin film transistor base plate is provided with the induction line of many mutually insulateds towards the surface of liquid crystal layer, thin film transistor base plate coordinates with touch sensitive layer and makes touch panel function be embedded in liquid crystal pixel, reduces the thickness of touch-screen.By arranging high resistance film at second substrate away from the surface of touch sensitive layer, and high resistance film is electrically connected with thin film transistor base plate.The material of high resistance film comprises the potpourri of graphite oxide, tin oxide, surfactant and crosslinking chemical, there is excellent absorption property and electrology characteristic, by the electrostatic instant-free that thin film transistor base plate produces by high resistance film, eliminate electrostatic interaction, reduce the mutual interference between touch sensor, thus improve the touch-control sensitivity with the In-cell touch panel of high resistance film.Meanwhile, have the In-cell touch panel thinner thickness of high resistance film, light transmission is good, and stability is strong, and not easily oxidized, storage environment is low, and the cycle of guaranteeing the quality is long.
The above-mentioned preparation method with the In-cell touch panel of high resistance film, preparation technology is simple, and fragmentation risk is little, is suitable for large-scale production.
Be described in detail below in conjunction with specific embodiment.
In following examples, if no special instructions, the experimental technique of unreceipted actual conditions, usually conveniently condition.
Instrument: automatic spraying equipment, drying oven, cleaning machine, high resistant instrument, film thickness gauge, spectrometer etc.
Reagent: surfactant is that LG-DOW company produces DOWFAX2A1 type surfactant, crosslinking chemical is that Shanghai You En Chemical Co., Ltd. produces SaC-100 type aziridine crosslinker.
Embodiment 1
There is a preparation method for the In-cell touch panel of high resistance film, comprise the steps:
(1) at the upper laminate film transistor base (TFT substrate) of glass baseplate surface (first substrate), and form one deck induction line layer on thin film transistor base plate surface, the material of induction line is ITO, form the induction line of mutually insulated on the surface of thin film transistor base plate after the steps such as overexposure, development, etching, and liquid crystal layer is formed on thin film transistor base plate, stacked colored filter, a plate of system.
(2) on another glass baseplate surface (second substrate), form touch sensitive layer, the material of touch sensitive layer is ITO, the b plate of system.
(3) a plate and b plate are fitted in vacuum environment, wherein, colored filter and touch sensitive layer bonded to each other, obtain the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer and the second substrate that stack gradually.
(4) adopt automatic spraying equipment at the surface formation high resistance film of second substrate away from touch sensitive layer.Substrate is sent on spraying equipment work top, and automatically locate, then pulp spraying is coated on second substrate, slurry comprises the potpourri of graphite oxide, tin oxide, surfactant and crosslinking chemical, and slurry comprises the graphite oxide of 5.5 parts, the tin oxide of 11.5 parts, the surfactant of 27.5 parts, the crosslinking chemical of 18 parts and 37.5 parts of water according to weight parts.The viscosity of slurry is 35cP.Spray gun is 30cm from the distance on second substrate surface, and spray pressure is 1.0MPa.Operating environment is dustless space (hundred grades), and temperature is 25 DEG C, and humidity is 55%.After having sprayed, the second substrate forming high resistance film is carried out baking process, cleaning treatment and air-dry process.Baking is treated to puts into drying oven and toasts, and condition is toast 15min at 115 DEG C, and cleaning treatment preferably uses the pure water of resistivity >=10 megaohm to clean, and the condition of air-dry process is air-dry 30min at 60 DEG C, obtains high resistance film after cooling.
The thickness adopting film thickness gauge test high resistance film is 40nm.
The transmittance adopting spectrometer test high resistance film is 99.8%.
Film hardness is 6H.
Certainly, touch-screen also comprises the preparation of cover plate, Polarizer, lead-in wire, adopts common method in the industry, does not limit at this.
The resistance adopting resistance instrument test high resistance film is 5 × 10
8Ω/cm
2, show to have good electric property, anti-static effect is good.Adopt climatic chamber at 90 DEG C, 60% humidity 240 hours baking experiment, the resistance change rate of high resistance film is 5%, shows to have good moisture-proof.Alcohol-pickled 5 minutes, the resistance change rate of high resistance film was 5%.Baking box cushioning 60 DEG C baking 240 hours, the change in resistance of high resistance film is 5%, shows to have good thermotolerance.
The ITO sheet resistance of touch sensitive layer: 90 Ω, thickness
The above-mentioned In-cell touch panel stability with high resistance film is strong not easily oxidized, and has good electric conductivity and light transmission, and anti-static effect is good.
Embodiment 2
There is a preparation method for the In-cell touch panel of high resistance film, comprise the steps:
(1) at the upper laminate film transistor base (TFT substrate) of glass baseplate surface (first substrate), and form one deck induction line layer on thin film transistor base plate surface, the material of induction line is ITO, induction line is formed on the surface of thin film transistor base plate after the steps such as overexposure, development, etching, and liquid crystal layer is formed on thin film transistor base plate, stacked colored filter, a plate of system.
(2) on another glass baseplate surface (second substrate), form touch sensitive layer, the material of touch sensitive layer is ITO, the b plate of system.
(3) a plate and b plate are fitted in vacuum environment, wherein, colored filter and touch sensitive layer bonded to each other, obtain the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer and the second substrate that stack gradually.
(4) adopt automatic spraying equipment at the surface formation high resistance film of second substrate away from touch sensitive layer.Substrate is sent on spraying equipment work top, and automatically locate, then pulp spraying is coated on second substrate, slurry comprises the potpourri of graphite oxide, tin oxide, surfactant, crosslinking chemical and solvent, comprises the graphite oxide of 4 parts, the tin oxide of 10 parts, the surfactant of 25 parts, the crosslinking chemical of 10 parts and 30 parts of water according to weight parts.Slurry viscosity is 30cP.Spray gun is 20cm from the distance on second substrate surface, and spray pressure is 0.5MPa, and operating environment is dustless space (hundred grades), and temperature is 20 DEG C, and humidity is 50%.After having sprayed, the second substrate forming high resistance film is carried out baking process, cleaning treatment and air-dry process.Baking is treated to puts into drying oven and toasts, and condition is toast 10min at 110 DEG C, and cleaning treatment preferably uses the pure water of resistivity >=10 megaohm to clean, and the condition of air-dry process is air-dry 10min at 55 DEG C, obtains high resistance film after cooling.
The thickness adopting film thickness gauge test high resistance film is 30nm.
The transmittance adopting spectrometer test high resistance film is 98%.
Film hardness is 6H.
Certainly, touch-screen also comprises the preparation of cover sheet, Polarizer, lead-in wire, adopts common method in the industry, does not limit at this.
The resistance adopting resistance instrument test high resistance film is 5 × 10
9Ω/cm
2, show that high resistance film has good electric property.Adopt climatic chamber at 90 DEG C, 60% humidity 240 hours baking experiment, the resistance change rate of high resistance film is 10%, shows to have good moisture-proof.Alcohol-pickled 5 minutes, the resistance change rate of high resistance film was 10%.Baking box cushioning 60 DEG C baking 240 hours, change in resistance is 5%, shows to have good thermotolerance.
The ITO sheet resistance of touch sensitive layer: 60 Ω, thickness
The above-mentioned In-cell touch panel stability with high resistance film is strong not easily oxidized, and has good electric conductivity and light transmission, and anti-static effect is good.
Embodiment 3
There is an In-cell touch panel for high resistance film, prepared by following steps:
(1) at the upper laminate film transistor base (TFT substrate) of glass baseplate surface (first substrate), and form one deck induction line layer on thin film transistor base plate surface, the material of induction line is ITO, induction line is formed on the surface of thin film transistor base plate after the steps such as overexposure, development, etching, and liquid crystal layer is formed on thin film transistor base plate, stacked colored filter, a plate of system.
(2) on another glass baseplate surface (second substrate), form touch sensitive layer, the material of touch sensitive layer is ITO, the b plate of system.
(3) a plate and b plate are fitted in vacuum environment, wherein, colored filter and touch sensitive layer bonded to each other, obtain the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer and the second substrate that stack gradually.
(4) adopt automatic spraying equipment at the surface formation high resistance film of second substrate away from touch sensitive layer.Substrate is sent on spraying equipment work top, and automatically locate, then pulp spraying is coated on second substrate, slurry comprises the potpourri of graphite oxide, tin oxide, surfactant, crosslinking chemical and solvent, comprises the graphite oxide of 7 parts, the tin oxide of 13 parts, the surfactant of 30 parts, the crosslinking chemical of 26 parts and 40 parts of water according to weight parts.Slurry viscosity is 40cP.Spray gun is 40cm from the distance on second substrate surface, and spray pressure is 1.5MPa, and operating environment is dustless space (hundred grades), and temperature is 30 DEG C, and humidity is 60%.After having sprayed, the second substrate forming high resistance film is carried out baking process, cleaning treatment and air-dry process.Baking is treated to puts into drying oven and toasts, and condition is toast 20min at 120 DEG C, and cleaning treatment preferably uses the pure water of resistivity >=10 megaohm to clean, and the condition of air-dry process is air-dry 50min at 65 DEG C, obtains high resistance film after cooling.
The thickness adopting film thickness gauge test high resistance film is 50nm.
The transmittance adopting spectrometer test high resistance film is 96%.
Film hardness is 6H.
Certainly, touch-screen also comprises the preparation of cover sheet, Polarizer, lead-in wire, adopts common method in the industry, does not limit at this.
The resistance adopting resistance instrument test high resistance film is 5 × 10
9Ω/cm
2, show that high resistance film has good electric property.Adopt climatic chamber at 90 DEG C, 60% humidity 240 hours baking experiment, the resistance change rate of high resistance film is 10%, shows to have good moisture-proof.Alcohol-pickled 5 minutes, the resistance change rate of high resistance film was 10%.Baking box cushioning 60 DEG C baking 240 hours, change in resistance is 15%, shows to have good thermotolerance.
The ITO sheet resistance of touch sensitive layer: 150 Ω, thickness
The above-mentioned In-cell touch panel stability with high resistance film is strong not easily oxidized, and has good electric conductivity and light transmission, and anti-static effect is good.
Embodiment 4
There is an In-cell touch panel for high resistance film, prepared by following steps:
(1) at the upper laminate film transistor base (TFT substrate) of glass baseplate surface (first substrate), and form one deck induction line layer on thin film transistor base plate surface, the material of induction line is ITO, induction line is formed on the surface of thin film transistor base plate after the steps such as overexposure, development, etching, and liquid crystal layer is formed on thin film transistor base plate, stacked colored filter, a plate of system.
(2) on another glass baseplate surface (second substrate), form touch sensitive layer, the material of touch sensitive layer is ITO, the b plate of system.
(3) a plate and b plate are fitted in vacuum environment, wherein, colored filter and touch sensitive layer bonded to each other, obtain the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer and the second substrate that stack gradually.
(4) adopt automatic spraying equipment at the surface formation high resistance film of second substrate away from touch sensitive layer.Substrate is sent on spraying equipment work top, and automatically locate, then pulp spraying is coated on second substrate, slurry comprises the potpourri of graphite oxide, tin oxide, surfactant, crosslinking chemical and solvent, comprises the graphite oxide of 5 parts, the tin oxide of 12 parts, the surfactant of 28 parts, the crosslinking chemical of 15 parts and 36 parts of water according to weight parts.Slurry viscosity is 38cP.Spray gun is 40cm from the distance on second substrate surface, and spray pressure is 1.0MPa, and operating environment is dustless space (hundred grades), and temperature is 25 DEG C, and humidity is 55%.After having sprayed, the second substrate forming high resistance film is carried out baking process, cleaning treatment and air-dry process.Baking is treated to puts into drying oven and toasts, and condition is toast 15min at 115 DEG C, and cleaning treatment preferably uses the pure water of resistivity >=10 megaohm to clean, and the condition of air-dry process is air-dry 30min at 60 DEG C, obtains high resistance film after cooling.
The thickness adopting film thickness gauge test high resistance film is 50nm.
The transmittance adopting spectrometer test high resistance film is 97%.
Film hardness is 6H.
Certainly, touch-screen also comprises the preparation of cover sheet, Polarizer, lead-in wire, adopts common method in the industry, does not limit at this.
The resistance adopting resistance instrument test high resistance film is 5 × 10
9Ω/cm
2, show that high resistance film has good electric property.Adopt climatic chamber at 90 DEG C, 60% humidity 240 hours baking experiment, the resistance change rate of high resistance film is 5%, shows to have good moisture-proof.Alcohol-pickled 5 minutes, the resistance change rate of high resistance film was 10%.Baking box cushioning 60 DEG C baking 240 hours, change in resistance is 10%, shows to have good thermotolerance.
The ITO sheet resistance of touch sensitive layer: 150 Ω, thickness
The above-mentioned In-cell touch panel stability with high resistance film is strong not easily oxidized, and has good electric conductivity and light transmission, and anti-static effect is good.
The above embodiment only have expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be construed as limiting the scope of the patent.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. one kind has the In-cell touch panel of high resistance film, it is characterized in that, comprise the first substrate stacked gradually, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer, second substrate, high resistance film and Polarizer, described thin film transistor base plate is provided with the induction line of many mutually insulateds towards the surface of described liquid crystal layer, described high resistance film is formed at the surface of described second substrate away from described touch sensitive layer, described high resistance film is electrically connected with described thin film transistor base plate, the material of described high resistance film comprises graphite oxide, tin oxide, the potpourri of surfactant and crosslinking chemical.
2. the In-cell touch panel with high resistance film according to claim 1, it is characterized in that, the material of described high resistance film comprises the crosslinking chemical of the graphite oxide of 4 parts ~ 7 parts, the tin oxide of 10 parts ~ 13 parts, the surfactant of 25 parts ~ 30 parts and 10 parts ~ 26 parts according to weight parts.
3. the In-cell touch panel with high resistance film according to claim 1, is characterized in that, also comprise cover sheet, and described cover sheet is laminated on the surface of described Polarizer away from described high resistance film.
4. the In-cell touch panel with high resistance film according to claim 1, is characterized in that, the thickness of described high resistance film is 30nm ~ 50nm.
5. the preparation method with the In-cell touch panel of high resistance film according to any one of Claims 1 to 4, is characterized in that, comprise the steps:
There is provided first substrate, laminate film transistor base on described first substrate;
The induction line of many mutually insulateds is formed on the surface of described thin film transistor base plate;
The surface being formed with described induction line at described thin film transistor base plate forms liquid crystal layer;
There is provided colored filter, by stacked for described colored filter on described liquid crystal layer;
Second substrate is provided, forms touch sensitive layer on the surface of described second substrate;
Described colored filter and described touch sensitive layer are fitted, obtains the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer and the second substrate that stack gradually;
At the surface formation high resistance film of described second substrate away from described touch sensitive layer, the material of described high resistance film comprises the potpourri of graphite oxide, tin oxide, surfactant and crosslinking chemical;
Stacked Polarizer on described high resistance film; And
Described high resistance film is electrically connected with described tft layer, obtains the In-cell touch panel with high resistance film.
6. the preparation method with the In-cell touch panel of high resistance film according to claim 5, it is characterized in that, being operating as of high resistance film is formed away from the surface of described touch sensitive layer: by the mode of spraying, pulp spraying is applied to the surface of described second substrate away from described touch sensitive layer at described second substrate, described slurry comprises the potpourri of graphite oxide, tin oxide, surfactant, crosslinking chemical and solvent, spray pressure is 0.5MPa ~ 1.5MPa, temperature is 20 DEG C ~ 30 DEG C, and humidity is 50% ~ 60%.
7. the preparation method with the In-cell touch panel of high resistance film according to claim 6, it is characterized in that, described slurry comprises the solvent of the graphite oxide of 4 parts ~ 7 parts, the tin oxide of 10 parts ~ 13 parts, the surfactant of 25 parts ~ 30 parts, the crosslinking chemical of 10 parts ~ 26 parts and 35 parts ~ 45 parts according to weight parts.
8. the preparation method with the In-cell touch panel of high resistance film according to claim 6, is characterized in that, the viscosity of described slurry is 30cP ~ 40cP.
9. the preparation method with the In-cell touch panel of high resistance film according to claim 5, it is characterized in that, described described colored filter and described touch sensitive layer are fitted be operating as: under vacuum, described colored filter and described touch sensitive layer are fitted.
10. the preparation method with the In-cell touch panel of high resistance film according to claim 5, it is characterized in that, formed after high resistance film on the surface of described second substrate away from described touch sensitive layer, comprise baking process, cleaning treatment and air-dry process, the condition of described baking process is toast 10min ~ 20min at 110 DEG C ~ 120 DEG C, and the condition of described air-dry process is air-dry 10min ~ 50min at 55 DEG C ~ 65 DEG C.
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