CN105232144A - Dual-electrode plasma system for otorhinolaryngologic surgeries and control method of dual-electrode plasma system - Google Patents
Dual-electrode plasma system for otorhinolaryngologic surgeries and control method of dual-electrode plasma system Download PDFInfo
- Publication number
- CN105232144A CN105232144A CN201510795528.7A CN201510795528A CN105232144A CN 105232144 A CN105232144 A CN 105232144A CN 201510795528 A CN201510795528 A CN 201510795528A CN 105232144 A CN105232144 A CN 105232144A
- Authority
- CN
- China
- Prior art keywords
- plasma
- electrode
- matrix
- metal
- discharge end
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Surgical Instruments (AREA)
Abstract
The invention discloses a dual-electrode plasma system for otorhinolaryngologic surgeries. The dual-electrode plasma system comprises a cutting electrode, a loop electrode and a normal saline conveying device, wherein the cutting electrode and the loop electrode are connected to a plasma control device; the cutting electrode comprises a first matrix, two first brackets are symmetrically arranged on the first matrix, and a first discharging end and a second discharging end are respectively arranged on the tops of the two first brackets; the loop electrode comprises a second matrix; a third discharging end is arranged on the top of the second matrix; a middle electrode is further arranged between the cutting electrode and the loop electrode. The invention further provides a control method of the dual-electrode plasma system. According to the dual-electrode plasma system, the deficiencies in the prior art can be improved, and the accuracy of focus treatment in the surgery process is improved.
Description
Technical field
The present invention relates to a kind of earnose-throat instruments, especially a kind of plasma kinetic system for ent surgery and control method thereof.
Background technology
In ent surgery process, plasma treatment is the Therapeutic Method of a kind of Wicresoft, low temperature.The plasma unstable that existing plasma kinetic electric knife is formed, can cause cutting inaccurate in operation process.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of plasma kinetic system for ent surgery and control method thereof, can solve the deficiencies in the prior art, improves the accuracy for focus process in operation process.
For solving the problems of the technologies described above, the technical solution used in the present invention is as follows.
A kind of plasma kinetic system for ent surgery, comprise cutting electrode, loop electrode and normal saline conveyer device, cutting electrode and loop electrode are connected on plasma control device, described cutting electrode comprises the first matrix, first matrix is symmetrically arranged with two the first supports, the top of two the first supports is respectively arranged with the first discharge end and the second discharge end; Described loop electrode comprises the second matrix, and the top of the second matrix is provided with the 3rd discharge end; Also target is provided with between cutting electrode and loop electrode.
As preferably, described first discharge end comprises a circular metal ring, and the outside of circular metal ring is enclosed with the first insulation net, and the first insulation Netcom crosses the first tinsel and is connected with insulating bar, first tinsel uniform winding is in the outside of insulation net, and insulating bar is fixed on the first matrix.
As preferably, described second discharge end comprises the metal bar be fixed on the first matrix, and metal bar top is provided with tapered portion, and metal bar has been rotatably connected the first sheet metal.
As preferably, described circular metal ring is provided with arc-shaped recess portion near the side of the second discharge end.
As preferably, described 3rd discharge end comprises two the second sheet metals be arranged in parallel, between the second sheet metal, empire silk is provided with oven wire mesh blanket, and the below of the second sheet metal is fixed on the second matrix by the second insulation net.
As preferably, described target comprises metal needle, and the both sides that metal needle is positioned at cutting electrode and loop electrode are respectively arranged with metal cylinder, and the surface uniform of metal cylinder is provided with through hole.
As preferably, described metal cylinder is provided with reducing.
A control method for the above-mentioned plasma kinetic system for ent surgery, plasma control device uses two groups of power supplys be concerned with synchronously to input; When needs regulate energy of plasma, realized by the phase contrast changing two groups of power supplys; When needing the shape regulating plasma to generate, by carrying out independently pressure limiting cut-off to the top of two groups of power supply wave shapes and bottom.
As preferably, when entering horizontal phasing control to power supply, according to the shape of current plasma, it is follow-up pressure limiting cut-off operation reservation operations surplus; When carrying out pressure limiting cut-off operation to power supply wave shape, sinusoidal wave curve limit is all adopted to the upper and lower bound of voltage.
The beneficial effect adopting technique scheme to bring is: the present invention, by modified electrode structure, can make the plasma that between cutting electrode and loop electrode, formation one is stable.Tapered portion and circular metal ring can keep the continuity of plasma, and the first sheet metal can rotate along with the change of shape of plasma, thus improve the hold facility of plasma for own form.Oven wire mesh blanket is movable between two the second sheet metals, can reduce the undulatory property of plasma.Target can improve the tensile elongation of plasma, is convenient to cutting operation.By using two relevant power supplys to carry out Drazin inverse, the adaptability for different requirements of operation can be improved.
Accompanying drawing explanation
Fig. 1 is the structure chart of the present invention's detailed description of the invention.
Fig. 2 is the structure chart of the first discharge end in the present invention's detailed description of the invention.
Fig. 3 is the structure chart of the second discharge end in the present invention's detailed description of the invention.
Fig. 4 is the structure chart of the 3rd discharge end in the present invention's detailed description of the invention.
Fig. 5 is the structure chart of target in the present invention's detailed description of the invention.
Fig. 6 is the structure chart of normal saline conveyer device in the present invention's detailed description of the invention.
In figure: 1, cutting electrode; 2, loop electrode; 3, normal saline conveyer device; 4, plasma control device; 5, the first matrix; 6, the first support; 7, the first discharge end; 8, the second discharge end; 9, the second matrix; 10, the 3rd discharge end; 11, target; 12, circular metal ring; 13, the first insulation net; 14, the first tinsel; 15, insulating bar; 16, metal bar; 17, tapered portion; 18, the first sheet metal; 19, arc-shaped recess portion; 20, the second sheet metal; 21, empire silk; 22, oven wire mesh blanket; 23, the second insulation net; 24, metal needle; 25, metal cylinder; 26, through hole; 27, reducing; 28, jet; 29, deflection plate; 30, pod apertures; 31, guiding gutter.
Detailed description of the invention
With reference to Fig. 1-6, the present invention's detailed description of the invention comprises cutting electrode 1, loop electrode 2 and normal saline conveyer device 3, cutting electrode 1 and loop electrode 2 are connected on plasma control device 4, described cutting electrode 1 comprises the first matrix 5, the top first matrix 5 being symmetrically arranged with two the first supports, 6, two the first supports 6 is respectively arranged with the first discharge end 7 and the second discharge end 8; The top that described loop electrode 2 comprises the second matrix 9, second matrix 9 is provided with the 3rd discharge end 10; Target 11 is also provided with between cutting electrode 1 and loop electrode 2.First discharge end 7 comprises a circular metal ring 12, the outside of circular metal ring 12 is enclosed with the first insulation net 13, first insulation net 13 is connected with insulating bar 15 by the first tinsel 14, and the first tinsel 14 uniform winding is in the outside of insulation net 13, and insulating bar 15 is fixed on the first matrix 5.Second discharge end 8 comprises the metal bar 16 be fixed on the first matrix 5, and metal bar 16 top is provided with tapered portion 17, and metal bar 16 has been rotatably connected the first sheet metal 18.Circular metal ring 12 is provided with arc-shaped recess portion 19 near the side of the second discharge end 8.3rd discharge end 10 comprises between two the second sheet metal 20, second sheet metals 20 be arranged in parallel empire silk 21 is provided with oven wire mesh blanket 22, and the below of the second sheet metal 20 is fixed on the second matrix 9 by the second insulation net 23.Target 11 comprises metal needle 24, and the both sides that metal needle 24 is positioned at cutting electrode 1 and loop electrode 2 are respectively arranged with metal cylinder 25, and the surface uniform of metal cylinder 25 is provided with through hole 26.Metal cylinder 25 is provided with reducing 27.
A control method for the above-mentioned plasma kinetic system for ent surgery, plasma control device 4 uses two groups of power supplys be concerned with synchronously to input; When needs regulate energy of plasma, realized by the phase contrast changing two groups of power supplys; When needing the shape regulating plasma to generate, by carrying out independently pressure limiting cut-off to the top of two groups of power supply wave shapes and bottom.When entering horizontal phasing control to power supply, according to the shape of current plasma, it is follow-up pressure limiting cut-off operation reservation operations surplus; When carrying out pressure limiting cut-off operation to power supply wave shape, sinusoidal wave curve limit is all adopted to the upper and lower bound of voltage.
In addition, normal saline conveyer device 3 comprises several jets 28 be arranged in parallel, and the exit of jet 28 is provided with deflection plate 29, deflection plate 29 is provided with several pod apertures 30, and the exit of pod apertures 30 is evenly provided with several guiding gutters 31.Jet 28 is 13 ° with the angle of deflection plate 29, and pod apertures 30 is 5 ° with the angle of deflection plate 29, and pod apertures 30 is 8 ° with the angle of jet 28.Normal saline conveyer device 3 in the process exporting normal saline, can make normal saline form radial injection stream, effectively can improve the formation speed of plasma, and keep the definition of cutting part.
By carrying out clinical trial to plasma kinetic system provided by the invention, compared with prior art, procedure efficiency can be significantly improved and improve the cutting accuracy for focus.By 150 example operations, the experimental data meansigma methods of summary is as follows:
| Nasal polyp excision single time | Single resection rate | |
| The present invention | 45min | 98% |
| Prior art | 1h | 91% |
More than show and describe ultimate principle of the present invention and principal character and advantage of the present invention.The technical staff of the industry should understand; the present invention is not restricted to the described embodiments; what describe in above-described embodiment and description just illustrates principle of the present invention; without departing from the spirit and scope of the present invention; the present invention also has various changes and modifications, and these changes and improvements all fall in the claimed scope of the invention.Application claims protection domain is defined by appending claims and equivalent thereof.
Claims (9)
1. the plasma kinetic system for ent surgery, comprise cutting electrode (1), loop electrode (2) and normal saline conveyer device (3), cutting electrode (1) and loop electrode (2) are connected on plasma control device (4), it is characterized in that: described cutting electrode (1) comprises the first matrix (5), first matrix (5) is symmetrically arranged with two the first supports (6), the top of two the first supports (6) is respectively arranged with the first discharge end (7) and the second discharge end (8); Described loop electrode (2) comprises the second matrix (9), and the top of the second matrix (9) is provided with the 3rd discharge end (10); Target (11) is also provided with between cutting electrode (1) and loop electrode (2).
2. the plasma kinetic system for ent surgery according to claim 1, it is characterized in that: described first discharge end (7) comprises a circular metal ring (12), the outside of circular metal ring (12) is enclosed with the first insulation net (13), first insulation net (13) is connected with insulating bar (15) by the first tinsel (14), first tinsel (14) uniform winding is in the outside of insulation net (13), and insulating bar (15) is fixed on the first matrix (5).
3. the plasma kinetic system for ent surgery according to claim 2, it is characterized in that: described second discharge end (8) comprises the metal bar (16) be fixed on the first matrix (5), metal bar (16) top is provided with tapered portion (17), and metal bar (16) has been rotatably connected the first sheet metal (18).
4. the plasma kinetic system for ent surgery according to claim 3, is characterized in that: described circular metal ring (12) is provided with arc-shaped recess portion (19) near the side of the second discharge end (8).
5. the plasma kinetic system for ent surgery according to claim 1, it is characterized in that: described 3rd discharge end (10) comprises two the second sheet metals (20) be arranged in parallel, between second sheet metal (20), empire silk (21) is provided with oven wire mesh blanket (22), the below of the second sheet metal (20) is fixed on the second matrix (9) by the second insulation net (23).
6. the plasma kinetic system for ent surgery according to claim 1, it is characterized in that: described target (11) comprises metal needle (24), the both sides that metal needle (24) is positioned at cutting electrode (1) and loop electrode (2) are respectively arranged with metal cylinder (25), and the surface uniform of metal cylinder (25) is provided with through hole (26).
7. the plasma kinetic system for ent surgery according to claim 6, is characterized in that: described metal cylinder (25) is provided with reducing (27).
8. a control method for the plasma kinetic system for ent surgery described in claim 1 ~ 7, is characterized in that: described plasma control device (4) uses two groups of power supplys be concerned with synchronously to input; When needs regulate energy of plasma, realized by the phase contrast changing two groups of power supplys; When needing the shape regulating plasma to generate, by carrying out independently pressure limiting cut-off to the top of two groups of power supply wave shapes and bottom.
9. the control method of the plasma kinetic system for ent surgery according to claim 8, is characterized in that: when entering horizontal phasing control to power supply, according to the shape of current plasma, is follow-up pressure limiting cut-off operation reservation operations surplus; When carrying out pressure limiting cut-off operation to power supply wave shape, sinusoidal wave curve limit is all adopted to the upper and lower bound of voltage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510795528.7A CN105232144B (en) | 2015-11-18 | 2015-11-18 | A kind of plasma kinetic system and its control method for ent surgery |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510795528.7A CN105232144B (en) | 2015-11-18 | 2015-11-18 | A kind of plasma kinetic system and its control method for ent surgery |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105232144A true CN105232144A (en) | 2016-01-13 |
| CN105232144B CN105232144B (en) | 2017-07-21 |
Family
ID=55030167
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510795528.7A Active CN105232144B (en) | 2015-11-18 | 2015-11-18 | A kind of plasma kinetic system and its control method for ent surgery |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105232144B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030097129A1 (en) * | 1998-01-21 | 2003-05-22 | Arthrocare Corporation | Apparatus and methods for electrosurgical removal and digestion of tissue |
| US20030130655A1 (en) * | 1995-06-07 | 2003-07-10 | Arthrocare Corporation | Electrosurgical systems and methods for removing and modifying tissue |
| CN1812684A (en) * | 2005-01-28 | 2006-08-02 | 应用材料公司 | Plasma reactor overhead source power electrode |
| CN203763232U (en) * | 2011-05-09 | 2014-08-13 | 艾恩医疗有限公司 | A medical device for tissue welding |
| CN104470465A (en) * | 2012-04-24 | 2015-03-25 | 兰德股份公司 | Plasma treatment device |
| CN104955258A (en) * | 2014-03-25 | 2015-09-30 | Lg电子株式会社 | Plasma electrode device and method for manufacturing the same |
-
2015
- 2015-11-18 CN CN201510795528.7A patent/CN105232144B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030130655A1 (en) * | 1995-06-07 | 2003-07-10 | Arthrocare Corporation | Electrosurgical systems and methods for removing and modifying tissue |
| US20030097129A1 (en) * | 1998-01-21 | 2003-05-22 | Arthrocare Corporation | Apparatus and methods for electrosurgical removal and digestion of tissue |
| CN1812684A (en) * | 2005-01-28 | 2006-08-02 | 应用材料公司 | Plasma reactor overhead source power electrode |
| CN203763232U (en) * | 2011-05-09 | 2014-08-13 | 艾恩医疗有限公司 | A medical device for tissue welding |
| CN104470465A (en) * | 2012-04-24 | 2015-03-25 | 兰德股份公司 | Plasma treatment device |
| CN104955258A (en) * | 2014-03-25 | 2015-09-30 | Lg电子株式会社 | Plasma electrode device and method for manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105232144B (en) | 2017-07-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105170662A (en) | Multi-cavity flow-controllable spray header | |
| CN207638962U (en) | Atmospheric pressure dielectric barrier discharge enhanced direct-current alternating electrode low-temperature plasma jet array | |
| CN105225914B (en) | A kind of semiconductor plasma processing unit for improving crystal column surface film morphology | |
| CN204543937U (en) | A kind of cold plasma discharge electrode | |
| CN102143718A (en) | Method for treating a biological material comprising living cells | |
| CN203015262U (en) | Atmospheric pressure induced air dielectric barrier discharge low-temperature plasma generating device | |
| CN105451425A (en) | Low-temperature plasma generation device in honeycomb structure | |
| CN105190843A (en) | Apparatus and method for tuning a plasma profile using a tuning ring in a processing chamber | |
| CN103656857A (en) | Portable low-temperature plasma sterilizing and beatifying device | |
| CN105232144A (en) | Dual-electrode plasma system for otorhinolaryngologic surgeries and control method of dual-electrode plasma system | |
| CN105578699B (en) | A kind of device and method for generating cold plasma brush | |
| CN110327112A (en) | A kind of radio-frequency ablation clamp and the multielectrode recoding ablation system comprising radio-frequency ablation clamp | |
| CN204539603U (en) | Atmospheric pressure discharges cold plasma generator | |
| CN103997842A (en) | Method of improving space uniformity of atmospheric pressure plasma jet array | |
| CN204052733U (en) | A kind of many fixed length steel wire shearing device | |
| CN205249593U (en) | Honeycomb low temperature plasma generating device | |
| CN206935070U (en) | The uniform emission-control equipment of one kind electric discharge | |
| CN208183092U (en) | A kind of diamond wire electroplanting device | |
| CN207679742U (en) | A kind of bactericidal unit based on high pressure pulse discharge | |
| WO2018040353A1 (en) | Tissue engineering scaffold for directional microchannel and preparation method therefor | |
| CN202396016U (en) | High frequency heating inductor | |
| CN206289342U (en) | A kind of electrostatic filament dividing device | |
| CN203150555U (en) | Quick switching-on thyristor | |
| CN204569978U (en) | A kind of high-voltage electric field spray quenching device | |
| CN206212391U (en) | Arc plasma generator |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: The third and fourth floors of J5, Nanjing University of Technology Industrial Park, No. 15, Wanshou Road, Pukou Economic Development Zone, Nanjing, Jiangsu 210000 Patentee after: Nanjing Yigao Medical Technology Co.,Ltd. Address before: The third and fourth floors of J5, Nanjing University of Technology Industrial Park, No. 15, Wanshou Road, Pukou Economic Development Zone, Nanjing, Jiangsu 210000 Patentee before: NANJING ECO MICROWAVE SYSTEM Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder |