CN105072793B - A kind of microwave plasma torch device - Google Patents
A kind of microwave plasma torch device Download PDFInfo
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- CN105072793B CN105072793B CN201510442041.0A CN201510442041A CN105072793B CN 105072793 B CN105072793 B CN 105072793B CN 201510442041 A CN201510442041 A CN 201510442041A CN 105072793 B CN105072793 B CN 105072793B
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Abstract
The present invention proposes a kind of microwave plasma torch device, including cavity portion, microwave coupling part and tuning part；Cavity portion includes the inner tube sequentially coaxially set from inside to outside, middle pipe, outer tube, cavity portion one end is openend, the other end sets the tuning part to adjust the field strength of openend, outer tube wall is provided with microwave coupling opening, microwave coupling part is by the microwave coupling opening and cavity portion microwave coupling, the first microwave cavity is formed between outer tube and middle pipe, it is provided between inner tube and middle pipe to by inner tube and the co-axially fixed porous gasket of middle pipe, first microwave cavity is by the openend of cavity portion by microwave coupling to forming the second microwave cavity between inner tube and middle pipe, the upper surface of the porous gasket is configured to the reflecting surface of second microwave cavity.Suitable power scope of the present invention is wider, and the plasma gas stability of acquisition is splendid, can further avoid because high-strength electric field pyrogenicity is superimposed the series of problems triggered with plasma heat source.
Description
Technical field
The invention belongs to field of spectral analysis technology, specifically, being related to a kind of microwave plasma torch device, can obtain steady
Qualitative splendid plasma, and suitable for scope at several watts to upper kilowatt power condition.
Background technology
MPT (microwave plasma torch) torch pipe is usually three pipe coaxial configurations of one end open, sample (aerosol, or
Aerosol and the combination air-flow of plasma carrier gas) it is passed through out of inner tube, plasma gas is passed through between inner tube and middle pipe, microwave
By being coupled into torch pipe, plasma gas is excited to produce plasma in torch pipe openend, so as to which sample passes through plasma
After carry out spectrum analysis.
Because the volume of plasma that hectowatt grade MPT is formed is smaller, gas temperature is relatively low (2100K), and sample is in plasma
The residence time is shorter in body, is unfavorable for sample aerosol and evaporation is completed when passing through plasma source, removes molten, atomization, electricity
From, excite, a series of processes such as launch, when doing complex sample analysis, matrix effect is more serious.Therefore, it has in sample
Carried out before into plasma source it is molten, sampling system also just it is complicated.If by traditional microwave plasma torch knot
Structure be used in it is high-power under the conditions of, although exciting ability stronger, often form the single-point monofilament of no actual analysis application value
Electric discharge, and be difficult to form valuable, stable funnel shaped plasma.Based on this, it is necessary to which research and development have stronger sharp
The microwave plasma torch device of hair ability, can form the plasma with actual analysis application value, beneficial to sample
Spectrum analysis.
In addition, needing to form two stronger electric fields in MPT structures, one is coupled into MPT cavitys for microwave energy,
One is used to excite and maintain plasma, and is superimposed substantially in two strong electric spatial distributions in existing design, in big work(
Plasma stability can be caused to be interfered with microwave transmission efficiency under the conditions of rate, plasma high-temperature triggers microwave transmission effect
The problems such as rate reduces.
The content of the invention
Purpose to be solved by this invention is to provide a kind of microwave plasma torch device, and suitable power scope is wider, obtains
The plasma gas stability obtained is splendid, while can avoid because what high-strength electric field pyrogenicity was superimposed initiation with plasma heat source is
Row problem.
To solve the above problems, the present invention proposes a kind of microwave plasma torch device, including cavity portion, microwave coupling
Part and tuning part；Cavity portion includes the inner tube, middle pipe, outer tube sequentially coaxially set from inside to outside, cavity portion one end
Setting the tuning part for openend, the other end, outer tube wall is provided with microwave coupling opening to adjust the field strength of openend,
Microwave coupling part is by the microwave coupling opening and cavity portion microwave coupling, to form between outer tube and middle pipe the first microwave humorous
Shake chamber, is provided between inner tube and middle pipe inner tube and the co-axially fixed porous gasket of middle pipe, first microwave cavity to be passed through
The openend of cavity portion is crossed by microwave coupling to forming the second microwave cavity between inner tube and middle pipe, the porous gasket it is upper
Surface configuration is the reflecting surface of second microwave cavity.
According to one embodiment of present invention, the outer tube, middle pipe, inner tube and porous gasket are metal material object.
According to one embodiment of present invention, the inwall of the outer tube, the inside and outside wall of middle pipe, the outer wall of inner tube, Yi Jiduo
The upper surface of hole pad is formed by metal material.
According to one embodiment of present invention, distance range of the porous gasket apart from cavity portion openend end face existsBetween, wherein, N is positive odd number, and λ is the wavelength of microwave.
According to one embodiment of present invention, the tuning part, which is adjusted to the depth of cavity portion, isM is just strange
Number, λ are the wavelength of microwave.
According to one embodiment of present invention, the microwave coupling part includes coupled antenna and coupling ring, and coupling ring connects
It is connected in pipe outer wall, coupled antenna one end connects microwave transmission through microwave coupling opening connection coupling ring, the other end
Line, by microwave coupling to forming first microwave cavity between outer tube and middle pipe.
According to one embodiment of present invention, the coupled antenna configuration is distributed most strong position in cavity portion internal electric field
Place.
According to one embodiment of present invention, pipe outer wall during the coupling ring closely connects, or, the coupling czermak space
Pipe outer wall in connection.
According to one embodiment of present invention, the microwave coupling part includes coupled antenna, and the coupled antenna one end is worn
Cross microwave coupling opening connection tuning part upper surface, other end connection microwave transmission line, by microwave coupling to outer tube and
First microwave cavity is formed between middle pipe.
According to one embodiment of present invention, coupled antenna configuration Distribution of Magnetic Field most strong position in cavity portion
Place.
After adopting the above technical scheme, the present invention has the advantages that compared with prior art：Microwave coupling part will
To after between outer tube and middle pipe, microwave is coupled between middle pipe and inner tube microwave coupling by the openend of cavity portion, tuning
As outer tube and the microwave reflection face of middle pipe, incidence wave and back wave between outer tube and middle pipe form standing wave, pad for part
As the microwave reflection face of middle pipe and inner tube, incidence wave and back wave between middle pipe and inner tube also form standing wave, in opening
The electric-field intensity at end is tuned as most by force, under the conditions of high-power condition and small-power, can be formed and be rotated at a high speed around middle pipe axis
Thread plasma, the root of plasma is located at the certain depth of middle inside pipe wall middle-range openend end face, plasma root
Portion and middle pipe contact area are big, thus area of dissipation is larger so that heat deposition of the plasma source in, on inner tubal wall subtracts
It is few, thus in decreasing, inner tube deformation quantity caused by heat deposition, avoid the electromagnetic transmission caused by deformation
Matter changes, and the root from the sample of inner tube out not with plasma directly acts on, the root of survivable plasma, etc.
The stability of gas ions is splendid.
Further, microwave is introduced by the way of magnetic coupling, by microwave coupling area and plasma formation region in sky
Between it is upper separate, avoid high-power coupled antenna due to relatively near from thermal source and temperature rises, so as to trigger as efficiency of transmission reduces,
The problem of destruction effective output stabilitys such as thermal losses is serious, shelf depreciation and plasma stability.Microwave plasma
The part connection of body torch device is more convenient, while magnetic coupling need not be realized with middle pipe and made electrical contact with, and avoid the transmission of heat
With being superimposed, magnetic coupling, which is separated and is spatially separating with the function that electric field excites, eliminates coupled structure to MPT openends electromagnetism pair
The interference of title property and flow field symmetry.
Brief description of the drawings
Fig. 1 is the structural representation of the microwave plasma torch device of one embodiment of the invention；
Fig. 2 is the structural representation of the microwave plasma torch device of another embodiment of the present invention；
Fig. 3 is the Electric Field Simulation distribution map of the microwave plasma torch device of one embodiment of the invention；
Fig. 4 be porous gasket apart from cavity portion openend end face different depth when MPT cavity portions electric-field intensity most
Big Distribution value figure；
The plasma schematic diagram that Fig. 5 a are formed for MPT traditional under the conditions of small-power；
The plasma schematic diagram that Fig. 5 b are formed for MPT of the invention under the conditions of small-power；
Fig. 6 be it is high-power under the conditions of the plasma schematic diagram that is formed of MPT of the invention.
Embodiment
In order to facilitate the understanding of the purposes, features and advantages of the present invention, below in conjunction with the accompanying drawings to the present invention
Embodiment be described in detail.
Many details are elaborated in the following description in order to fully understand the present invention.But the present invention can be with
Much it is different from other manner described here to implement, those skilled in the art can be in the situation without prejudice to intension of the present invention
Under do similar popularization, therefore the present invention is not limited to the specific embodiments disclosed below.
Referring to Fig. 1, in the present embodiment, microwave plasma torch device includes outer tube 1, middle pipe 2, inner tube 3, tuning part
4th, coupled antenna 5, coupling ring 6, porous gasket 7.
Outer tube 1, middle pipe 2 and inner tube 3 constitute the cavity portion of microwave plasma torch device, and the upper end of cavity portion is
One openend, lower end are provided with tuning part 4, and the upper surface of tuning part 4 is as microwave between outer tube 1 and middle pipe 2
Reflecting surface, the position of adjustment tuning part 4 can adjust the height of the reflecting surface, so as to change back wave, in outer tube 1 with
The first microwave cavity is formed between pipe 2, required electromagnetic field standing wave is produced in the first microwave resonance intracavitary.
The lower end of inner tube 3 is used for being passed through sample, and sample is, for example, aerosol, or the mixing of aerosol and plasma gas
Thing air-flow, can also be other object air-flows for being used for spectrum analysis certainly, middle pipe 2 be for being passed through plasma gas,
Plasma gas such as can be argon gas, nitrogen, helium, the plasma gas being passed through between middle pipe 2 and inner tube 3,
The openend of cavity portion is excited to form plasma, sample and the Plasma Interaction.
In Fig. 1, a microwave coupling opening is opened up on the wall of outer tube 1, coupling ring 6 is connected on the outer wall of middle pipe 2, coupled antenna
5 connect through the microwave coupling opening and coupling ring 6, after coupled antenna 5 connects microwave transmission line and introduces microwave, by microwave
Coupled transfer is between outer tube 1 and middle pipe 2.Preferably, coupled antenna 5 configures is distributed most strong position in cavity portion internal electric field
Place, adjustment tuning part 4 highly make it that the electric field strength of cavity portion openend is most strong, and field strength is most weak, tuning part 4
Preferably adjust to so that the depth of cavity portion isM is positive odd number, and λ is the wavelength of microwave.
Optionally, coupling ring 6 closely connects the outer wall of middle pipe 2, by the He of microwave energy feed-in outer tube 1 in a manner of conductive coupling
Between middle pipe 2；Or also have one between the connection of the gap of coupling ring 6 outer wall of middle pipe 2, that is, coupling ring 6 and the outer wall of middle pipe 2
Fixed gap, by between microwave energy feed-in outer tube 1 and middle pipe 2 in a manner of capacity coupled.
In the openend outer tube 1 of cavity portion and the microwave coupling of middle pipe 2 between middle pipe 2 and inner tube 3, due in middle pipe 2
Porous gasket 7 is provided between inner tube 3, porous gasket 7 is a concentric ring structure, the external diameter of porous gasket 7 and the internal diameter of middle pipe 2
Unanimously, the internal diameter of porous gasket 7 is consistent with the external diameter of inner tube 3, and multiple passages, porous gasket 7 have been opened up on porous gasket 7
Effect except the plasma gas and in addition to ensureing the axiality of middle pipe 2 and inner tube 3 of being used for circulating of routine, be also used as middle pipe
The reflecting surface of microwave between 2 and inner tube 3, it will be understood that as the reflecting surface of microwave, the face may be employed to reflect incidence wave
, so as to form the first microwave cavity between middle pipe 2 and inner tube 3, required electromagnetic field standing wave is produced in microwave cavity.
Preferably, outer tube 1, middle pipe 2, inner tube 3 and porous gasket 7 are metal material object, optionally, outer tube 1 it is interior
Wall, the inside and outside wall of middle pipe 2, the upper surface of the outer wall of inner tube 3 and porous gasket 7 are formed by metal material so that outer tube 1 and in
Between pipe 2, microwave can be transmitted between middle pipe 2 and inner tube 3, and the upper surface of porous gasket 7 can reflect incidence wave.Metal
The preferable metal of material electric conductivity such as can be gold, silver, copper, stainless steel.
Exist preferably, the distance between porous gasket 7 and cavity portion openend end face are configured into scopeBetween, wherein, N is positive odd number, and λ is the wavelength of microwave, and its unit follows microwave wavelength λ's
Unit.Porous gasket 7 is arranged on cavity portion depth in the positive odd number times vicinity of 1/4 microwave wavelength, chamber can be caused
Electric-field intensity at body portion openend reaches high value, and certain distance range is only preferred value, at other distance values
The dual resonance structure of the present invention can be realized, obtains preferable plasma.
Microwave between microwave between outer tube 1 and middle pipe 2, and middle pipe 2 and inner tube 3, form microwave plasma torch dress
The dual resonance structure put, and microwave is formed only between outer tube and middle pipe in the prior art, dual resonance structure can not be formed.Double resonance
The microwave plasma torch device of structure, the maximum field intensity in cavity portion openend is higher, significantly larger than non-double resonance
Structure, it is easier to puncture plasma gas and form plasma and maintain, the root of plasma is located in the inwall of middle pipe 2, leads to
The root for the survivable plasma of sample crossed, the plasma formed are more stable.
Referring to Fig. 2, in the present embodiment, microwave plasma torch device includes outer tube 1 ', middle pipe 2 ', inner tube 3 ', tuner section
Divide 4 ', coupled antenna 5 ', porous gasket 7 '.Microwave coupling opening is opened up on the wall of outer tube 1 ', coupled antenna stretches into the microwave coupling
Run mouth jointly and connected with the upper surface of tuning part 4 ', by microwave energy feed-in outer tube 1 ' and middle pipe 2 ' in a manner of magnetic coupling
Between, preferably, coupled antenna 5 ' is located at the Distribution of Magnetic Field most at strong position in cavity portion.Microwave coupling area is located at tuner section
Divide at 4 ' upper end surface areas, plasma formation region is located at the openend of cavity portion, and both are spatially separated farther out, keep away
Exempt from high-power coupled antenna 5 ' due to relatively near from plasma heat source and temperature rises, so as to trigger as efficiency of transmission reduces,
The problem of destruction effective output stabilitys such as thermal losses is serious, shelf depreciation and plasma stability.Save coupling ring,
The part connection of microwave plasma torch device is more convenient, while magnetic coupling need not make electrical contact with middle pipe 2 ', avoid heat
With being superimposed, magnetic coupling, which is separated and is spatially separating with the function that electric field excites, eliminates coupled structure to MPT openings for the transmission of amount
Hold the interference of electromagnetic symmetry and flow field symmetry.The associated description of other parts may refer to retouching in detail for previous embodiment
State, will not be repeated here.
Optionally, in the present embodiment, coupled antenna 5 ' can also by after the perforate on tuning part 4 ' from tuner section
Divide in 4 ' perforate and penetrate, microwave is introduced between outer tube 1 ' and middle pipe 2 ', so as to be more convenient for realizing tuber function, not in outer tube
After microwave coupling opening is set on 1 ' wall, the tuning setting scope of tuning part 4 ' would not be also limited.
It should be noted that the mode of microwave coupling is not restricted to the embodiment provided in Fig. 1 and Fig. 2, its
He can realize by microwave energy be coupled into cavity portion microwave coupling mode can be used in microwave etc. of the present invention from
In daughter torch device, the change that those skilled in the art make according to the present invention easily each falls within protection scope of the present invention, example
Such as to the change of microwave coupling mode.
Fig. 3 is to be located at according to a kind of Electromagnetic Simulation figure of microwave plasma torch device provided by the invention, porous gasket
At the λ of openend end face 1/4 away from cavity portion, by taking 2450MHz electromagnetic waves as an example, λ 122.4mm, i.e. porous gasket be located at away from
The openend end face 30.6mm of cavity portion, at this position, form standing electromagnetic wave field A between outer tube and inner tube, and middle pipe
Standing electromagnetic wave field B is also form between inner tube, i.e. cavity portion forms dual resonance structure.Conventional porous gasket is placed in distance
Openend immediate area (is less than 15mm), primarily serves the effect for ensureing middle pipe and inner tube concentricity, material is not required, nothing
Method forms dual resonance structure.
When Fig. 4 is that porous gasket is located at the openend end face diverse location away from cavity portion, MPT cavity portion electric-field strengths
Maximum distribution map is spent, when porous gasket is apart from openend about 30mm, the maximum field intensity of MPT cavity portions is up to
2204kV/m, significantly larger than non-dual resonance structure, it is easier to puncture plasma gas and form plasma and maintain, formed
Plasma it is more stable, it is deep that openend endface position of the 1-35mm porous gasket away from cavity portion is illustrate only in Fig. 4
Degree, the maximum field intensity of the odd-multiple vicinity of 1/4 wavelength of the positive extension of transverse axis is also and the difference at 30mm in figure
It is few high.
Fig. 5 a show the argon plasma that traditional MPT under the conditions of small-power is formed, porous gasket 70 and cavity portion
The distance of openend end face is less than 15mm, and plasma is relatively easy to form form or the static monofilament plasma bodily form in Fig. 5 a
State, in Fig. 5 a, the root a1 of plasma is formed in the outer wall of inner tube 10, is separated by a certain distance with middle pipe 20, the root of plasma
It is core portion a2 on portion a1, is wake flame a3 on core portion a2, the root a1 of plasma is predominantly located at outer wall of inner tube, in inner tube 10
Also there is thread plasma extraction at wall opening end, this is totally unfavorable for spectrum analysis, and inner tube 10 is mainly used in drawing for sample
Enter, sample aerosol directly acts on plasma root first when being drawn by inner tube, and the energy of plasma root continues
Property destroyed, reduce the stability of plasma and the ability to bear to sample significantly, plasma excites ability
By sample type, the extreme influence of property.
Fig. 5 b show the plasma that MPT of the invention under the conditions of small-power is formed, and porous gasket 7 and cavity portion separate
The distance of mouth end end face is between 20-40mm, and plasma instantaneously sees to be thread plasma due to Kelvin effect, due to this
Thread plasma is stably located at certain region near axis, therefore turns into space-time " motionless area " when it rotates at a high speed around axle, from
And make plasma macroscopic view that the characteristic of falling infundibulate with centre gangway be presented；Additionally due to plasma rotates in high speed, etc.
Gas ions also will not be heated persistently to cavity portion point, and caused heat is taken away by high velocity air again, therefore although works as MPT materials
When matter uses metallic copper, it can not but observe that the spectral line for having copper occurs in spectrum.Fig. 5 b plasmas root b1 is located at
The inwall of middle pipe 2 away from openend certain depth at, be core portion b2 on the root b1 of plasma, be wake flame b3 on core portion b2,
Plasma is drawn between middle pipe 2 and inner tube 1, and sample aerosol does not act on directly with plasma root b1, and only with
Plasma space-time " motionless area " (core portion b2 and wake flame b3) interacts, and is formed using dual resonance structure MPT of the present invention
Plasma greatly improves to the ability to bear of the samples such as aerosol, air.
Fig. 6 show it is high-power under the conditions of (one kilowatt) present invention MPT formed plasma, plasma root c1
Positioned at the inwall of middle pipe 2 away from openend certain depth at, therefrom inside pipe wall draw, it can be seen that MPT dual resonance structures are high-power
Under the conditions of can not only form the plasma of macroeconomic stability, also inherit small-power MPT formation plasma fall funnel shaped,
The characteristics of with the centre gangway introduced beneficial to sample.Compared to small-power, the plasma that multikilowatt MPT is formed is to aerosol
It is further improved with the ability to bear of the sample such as air molecule, the direct nebulization sampling of sample can be accomplished, eliminated
Molten step is gone, this is that conventional disresonance MPT structures are difficult to.
The microwave plasma torch device operating frequency range of the present invention can be microwave and radio frequency band, and power bracket can
Think 20W-5kW, the power scope of application is wider, and the plasma stability of formation more preferably, can be applied to atomic emission spectrum, original
The fields such as sub- absorption spectrum, spectrum mass spectrometry, material surface processing, exhaust-gas treatment.
Although the present invention is disclosed as above with preferred embodiment, it is not for limiting claim, any this area
Technical staff without departing from the spirit and scope of the present invention, can make possible variation and modification, therefore the present invention
Protection domain should be defined by the scope that the claims in the present invention are defined.
Claims (9)
- A kind of 1. microwave plasma torch device, it is characterised in that including cavity portion, microwave coupling part and tuning part； Cavity portion includes the inner tube, middle pipe, outer tube sequentially coaxially set from inside to outside, and cavity portion one end is openend, the other end The tuning part is set to adjust the field strength of openend, outer tube wall is provided with microwave coupling opening, microwave coupling part warp Cross the microwave coupling opening and cavity portion microwave coupling, the first microwave cavity is formed between outer tube and middle pipe, inner tube is with It is provided between pipe inner tube and the co-axially fixed porous gasket of middle pipe, first microwave cavity to be opened by cavity portion Mouthful end by microwave coupling to forming the second microwave cavity between inner tube and middle pipe, the upper surface of the porous gasket be configured to this The reflecting surface of two microwave cavities；Distance range of the porous gasket apart from cavity portion openend end face existsBetween, wherein, N is positive odd number, and λ is the wavelength of microwave.
- 2. microwave plasma torch device as claimed in claim 1, it is characterised in that the outer tube, middle pipe, inner tube and porous Pad is metal material object.
- 3. microwave plasma torch device as claimed in claim 1, it is characterised in that the inwall of the outer tube, middle pipe it is interior The outer wall of outer wall, inner tube, and the upper surface of porous gasket are formed by metal material.
- 4. microwave plasma torch device as claimed in claim 1, it is characterised in that the tuning part is adjusted to cavity portion Point depth beM is positive odd number, and λ is the wavelength of microwave.
- 5. microwave plasma torch device as claimed in claim 1, it is characterised in that the microwave coupling part includes coupling Antenna and coupling ring, coupling ring are connected in middle pipe outer wall, and coupled antenna one end couples through microwave coupling opening connection Ring, other end connection microwave transmission line, by microwave coupling to forming first microwave cavity between outer tube and middle pipe.
- 6. microwave plasma torch device as claimed in claim 5, it is characterised in that the coupled antenna configuration is in cavity portion Divide internal electric field distribution most at strong position.
- 7. microwave plasma torch device as claimed in claim 5, it is characterised in that the coupling ring is closely connected outside middle pipe Wall, or, pipe outer wall in the coupling czermak space connection.
- 8. microwave plasma torch device as claimed in claim 1, it is characterised in that the microwave coupling part includes coupling Antenna, the coupled antenna one end connect microwave transmission through microwave coupling opening connection tuning part upper surface, the other end Line, by microwave coupling to forming first microwave cavity between outer tube and middle pipe.
- 9. microwave plasma torch device as claimed in claim 8, it is characterised in that the coupled antenna configuration is in cavity portion Distribution of Magnetic Field is most at strong position in point.
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| CN201510442041.0A CN105072793B (en) | 2015-07-24 | 2015-07-24 | A kind of microwave plasma torch device |
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| US20230171870A1 (en) * | 2020-05-09 | 2023-06-01 | High-Dimensional Plasma Sources Technology (Xiaogan) Co., Ltd. | Surface coupling induced ionization technique and its corresponding plasma and plasma devices |
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