CN105040108B - The etching method of polysilicon solar cell - Google Patents

The etching method of polysilicon solar cell Download PDF

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CN105040108B
CN105040108B CN201510518472.0A CN201510518472A CN105040108B CN 105040108 B CN105040108 B CN 105040108B CN 201510518472 A CN201510518472 A CN 201510518472A CN 105040108 B CN105040108 B CN 105040108B
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acid
aqueous solution
surplus
water
making herbs
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CN105040108A (en
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何云海
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Ningbo Lefeng new energy Co.,Ltd.
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ZHEJIANG QIXIN NEW ENERGY TECHNOLOGY Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Abstract

A kind of etching method of polysilicon solar cell, the making herbs into wool aqueous solution include:Hydrofluoric acid 5 20%, nitric acid 25 55%, silicofluoric acid 0.5 5%, acetic acid 0.1 0.5%, additive 0.5 1.5%, excess water;Additive is:Polyvinyl alcohol 0.2 0.8%, triethanolamine 0.1 6%, HPMA 1 6%, polyvinylpyrrolidone 0.05 0.1%, excess water:0 30 DEG C of making herbs into wool aqueous temperature, silicon chip is placed in 100 300s in the aqueous solution, and carries out ultrasonic vibration simultaneously, the 60KHZ of supersonic frequency 40;Taking-up, which is placed in the cleaning fluid of sodium hydroxide 0.2 0.5%, neopelex 0.5 2%, is cleaned, takes out drying.Good with stability, temperature is easily controllable, and polysilicon surface falls into the advantages of light effect is good and the optoelectronic transformation efficiency of battery is high, and matte is uniform, reflectivity is low.

Description

The etching method of polysilicon solar cell
Technical field
The present invention relates to preparation method of solar battery technical field, and in particular to a kind of system of polysilicon solar cell Velvet figures method.
Background technology
Polysilicon be melting elemental silicon when being solidified under the conditions of supercooling, silicon atom with diamond lattice morphologic arrangement into permitted More nucleus, as these nucleus grow up to the different crystal grain of high preferred orientation, then these crystal grain combine, and just crystallize into polysilicon.It is more Crystal silicon is different due to the crystal orientation of each crystal grain, it is impossible to caustic corrosion is used as monocrystalline silicon;In order to obtain good polysilicon Matte, there are a variety of methods, such as reactive ion etching method, mechanical carving groove method and chemical corrosion method at present.Wherein chemical corrosion method, Due to easy to operate, repeated strong, large-scale application has been obtained in industrialized production.Its principle is as follows:It is main to use acid Process for etching, system mainly include nitric acid and hydrofluoric acid, and specific reaction equation is as follows:
3Si+4HNO3——3SiO2+2H2O+4NO
SiO2+6HF——H2(SiF6)+2H2O
Wherein silicon is supported into fine and close silica not soluble in water and is attached to silicon chip table by nitric acid as strong oxidant Face, the further reaction of nitric acid and silicon is prevented, but silica can react with the hydrofluoric acid in solution, and production dissolves in The complex compound H2 (SiF6) of water, causes silica to destroy, now nitric acid chemically reacts again with silicon, and silicon chip surface is continuous Be corroded, ultimately form " worm channel shape " structure of continuous densification.Although this method does not need specific consersion unit, technique Relatively easy, manufacturing cost is low, but the method is due to being pure chemistry reaction, acid in silicon chip reaction speed is fast, stability is not allowed Easy to control, temperature of reaction etc. is also to influence the key factor of silicon wafer wool making effect, and somewhat controlling bad can cause polysilicon table The deficiencies of face falls into light effect and the optoelectronic transformation efficiency of battery is low, and battery pile face is uneven, reflectivity is high.
The content of the invention
The present invention is directed to the above-mentioned deficiency of prior art, there is provided a kind of stability is good, and temperature is easily controllable, polysilicon surface Sunken light effect is good and the optoelectronic transformation efficiency of battery is high, the etching method for the polysilicon solar cell that matte is uniform, reflectivity is low.
In order to solve the above-mentioned technical problem, the technical solution adopted by the present invention is:A kind of system of polysilicon solar cell Velvet figures method, step include:
(1) the making herbs into wool aqueous solution is prepared first in texturing slot, preparation raw material includes:Hydrofluoric acid 5-20wt%, nitric acid 25- 55wt%, silicofluoric acid 0.5-5wt%, acetic acid 0.1-0.5wt%, additive 0.5-1.5wt%, surplus are water;By above-mentioned each group Divide and be mixed and stirred for uniformly;
Described additive forms:Polyvinyl alcohol 0.2-0.8wt%, triethanolamine 0.1-6wt%, hydrolyzed polymaleic anhydride Acid anhydride 1-6wt%, polyvinylpyrrolidone 0.05-0.1wt%, surplus are water:
(2) it is 0-30 DEG C the making herbs into wool aqueous solution of step (1) to be maintained into temperature, and polysilicon chip then is placed in into the above-mentioned aqueous solution Middle placement 100-300s, and ultrasonic vibration is carried out simultaneously, supersonic frequency 40-60KHZ;Then take out and be placed in sodium hydroxide 0.2- 0.5wt%, neopelex 0.5-2wt%, surplus are to be cleaned in the cleaning fluid that water is formed, take out drying i.e. Can.
Preferably, preparing the making herbs into wool aqueous solution in described texturing slot, preparation raw material includes:Hydrofluoric acid 10-15wt%, nitre Sour 25-45wt%, silicofluoric acid 0.5-1.5wt%, acetic acid 0.1-0.2wt%, additive 0.5-1.0wt%, surplus are water.
Preferably, described additive composition is:Polyvinyl alcohol 0.2-0.5%, triethanolamine 0.1-0.8%, hydrolysis HPMA 1-2%, polyvinylpyrrolidone 0.05-0.08%, surplus are water.
Advantages of the present invention and excellent effect:
1. the above-mentioned preparation process of the present invention, silicofluoric acid, vinegar are with the addition of in traditional hydrofluoric acid, nitric acid making herbs into wool liquid Acid, the two can play a part of corrosion inhibiter, fast erosion of the hydrofluoric acid to polycrystalline surface be reduced, so as to increase making herbs into wool liquid Stability and controllability;The addition of particularly acetic acid reduces overall mixed liquid concentration, so as to reduce corrosion rate, subtracts simultaneously The small surface tension of polysilicon chip, depart from beneficial to the bubble for being attached to polysilicon surface, so that making herbs into wool liquid and polycrystalline Silicon chip surface fully, uniformly contacts, and improves making herbs into wool effect and the uniformity.In addition, making herbs into wool process uses ultrasonic vibration, can also Realize that the bubble that making herbs into wool process is attached to polysilicon surface departs from, prevent the masking to surface, realize that each corner is uniformly rotten Erosion, prepares preferable matte.In addition, the present invention also with the addition of additive in suede liquid so that the matte rule of preparation, reflection Rate is low, and course of reaction is controllable.
2. the cleaning fluid after the making herbs into wool of the present invention, which has, can effectively go the removal of impurity, uniformity is good after surface clean, reflectivity The advantages of low.
Brief description of the drawings
Silicon wafer wool making microgram prepared by Fig. 1 embodiment of the present invention 1.
Silicon wafer wool making microgram prepared by Fig. 2 embodiment of the present invention 2.
Embodiment
The present invention is further described in detail with reference to embodiments, but is not limited to this.
The silicon chip that embodiment uses is commercially available polysilicon silicon chip, and size is 2 × 2cm, thickness 180-200 microns, resistivity For 0.5-1.5 Ω cm.
Embodiment 1
In order to solve the above-mentioned technical problem, the technical solution adopted by the present invention is:A kind of system of polysilicon solar cell Velvet figures method, step include:
(1) the making herbs into wool aqueous solution is prepared first in texturing slot, preparation raw material includes:Hydrofluoric acid 5wt%, nitric acid 25wt%, Silicofluoric acid 0.5wt%, acetic acid 0.1wt%, additive 0.5wt%, surplus are water;Above-mentioned each component is mixed and stirred for uniformly;
Described additive forms:Polyvinyl alcohol 0.5%, triethanolamine 0.2%, HPMA 3%, poly- second Alkene pyrrolidone 0.06%, surplus are water:
(2) it is 15 DEG C the making herbs into wool aqueous solution of step (1) to be maintained into temperature, and then polysilicon chip is placed in the above-mentioned aqueous solution 120s is placed, and carries out ultrasonic vibration simultaneously, supersonic frequency 40KHZ;Then take out and be placed in sodium hydroxide 0.3%, dodecyl Benzene sulfonic acid sodium salt 0.8%, surplus are to be cleaned in the cleaning fluid that water is formed, take out drying.
Shown in Fig. 1, matte prepared by the embodiment of the present invention, matte size uniform is tiny and than more uniform.
Embodiment 2
With embodiment 1, difference is other steps:The making herbs into wool aqueous solution is prepared in described texturing slot, preparation raw material includes: Hydrofluoric acid 10wt%, nitric acid 45wt%, silicofluoric acid 1.5wt%, acetic acid 0.2wt%, additive 1.0wt%, surplus are water.
Described additive forms:Polyvinyl alcohol 0.5%, triethanolamine 0.7%, HPMA 1.5%, gather Vinylpyrrolidone 0.07%, surplus are water.
Shown in Fig. 2, matte prepared by the embodiment of the present invention, matte size uniform is tiny and than more uniform.
Comparative example
(1) the making herbs into wool aqueous solution is prepared first in texturing slot, preparation raw material includes:Hydrofluoric acid 5wt%, nitric acid 25wt%, Silicofluoric acid 0.5wt%, additive 0.5wt%, surplus are water;Above-mentioned each component is mixed and stirred for uniformly;
Described additive forms:Polyvinyl alcohol 0.5%, triethanolamine 0.2%, HPMA 3%, poly- second Alkene pyrrolidone 0.06%, surplus are water:
(2) it is 15 DEG C the making herbs into wool aqueous solution of step (1) to be maintained into temperature, and then polysilicon chip is placed in the above-mentioned aqueous solution 120s is placed, and carries out ultrasonic vibration simultaneously, supersonic frequency 40KHZ;Then take out and be placed in sodium hydroxide 0.3%, dodecyl Benzene sulfonic acid sodium salt 0.8%, surplus are to be cleaned in the cleaning fluid that water is formed, take out drying.
The product prepared by micro- sem observation, comparative example, its matte is uneven, with the restricted differences of above-described embodiment 1-2 Not.
Shown in Fig. 1, matte prepared by the embodiment of the present invention, matte size uniform is tiny and than more uniform.
Battery performance parameter prepared by 1-2 of the embodiment of the present invention and comparative example is shown in Table 2:
Battery performance parameter prepared by the embodiment 1-2 of table 2 and comparative example
It was found from above-mentioned parameter, battery prepared by method of the invention has that reflectivity is low, can effectively improve battery conversion The advantages of efficiency.

Claims (3)

1. a kind of etching method of polysilicon solar cell, it is characterised in that step includes:
(1) the making herbs into wool aqueous solution is prepared first in texturing slot, preparation raw material includes:Hydrofluoric acid 5-20wt%, nitric acid 25- 55wt%, silicofluoric acid 0.5-5wt%, acetic acid 0.1-0.5wt%, additive 0.5-1.5wt%, surplus are water;By above-mentioned each group Divide and be mixed and stirred for uniformly;
Described additive forms:Polyvinyl alcohol 0.2-0.8wt%, triethanolamine 0.1-6wt%, HPMA 1- 6wt%, polyvinylpyrrolidone 0.05-0.1wt%, surplus are water:
(2) it is 0-30 DEG C the making herbs into wool aqueous solution of step (1) to be maintained into temperature, and then polysilicon chip is placed in the above-mentioned aqueous solution and put 100-300s is put, and carries out ultrasonic vibration simultaneously, supersonic frequency 40-60KHZ;Then take out and be placed in sodium hydroxide 0.2- 0.5wt%, neopelex 0.5-2wt%, surplus are to be cleaned in the cleaning fluid that water is formed, take out drying i.e. Can.
2. the etching method of polysilicon solar cell according to claim 1, it is characterised in that in described texturing slot The making herbs into wool aqueous solution is prepared, preparation raw material includes:Hydrofluoric acid 10-15wt%, nitric acid 25-45wt%, silicofluoric acid 0.5-1.5wt%, Acetic acid 0.1-0.2wt%, additive 0.5-1.0wt%, surplus are water.
3. the etching method of polysilicon solar cell according to claim 1, it is characterised in that described additive group Turn into:Polyvinyl alcohol 0.2-0.5wt%, triethanolamine 0.1-0.8wt%, HPMA 1-2wt%, polyvinyl pyrrole Alkanone 0.05-0.08wt%, surplus are water.
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CN106098810B (en) * 2016-06-27 2018-11-13 苏州阿特斯阳光电力科技有限公司 A kind of preparation method of crystal silicon solar energy battery suede structure
CN106119976B (en) * 2016-08-19 2018-08-14 常州时创能源科技有限公司 Additive and its application of the black silicon making herbs into wool of polycrystalline with reaming acid solution
CN106222755A (en) * 2016-09-30 2016-12-14 杭州飞鹿新能源科技有限公司 Additive and application process thereof for polycrystalline silicon texturing
CN109119337A (en) * 2017-06-23 2019-01-01 镇江仁德新能源科技有限公司 A kind of solar-grade polysilicon piece surface wool manufacturing method
CN108004597A (en) * 2017-11-09 2018-05-08 润峰电力有限公司 A kind of polysilicon flocking additive and its etching method
CN108470795A (en) * 2018-02-12 2018-08-31 镇江仁德新能源科技有限公司 A kind of solar-grade polysilicon piece surface wool manufacturing method
CN108766866A (en) * 2018-05-25 2018-11-06 南京八度阳光太阳能科技有限公司 A kind of fluff making device used for solar batteries

Citations (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101096596A (en) * 2006-06-30 2008-01-02 天津晶岭电子材料科技有限公司 Silicon chip etching solution
CN101748002A (en) * 2008-11-28 2010-06-23 安集微电子(上海)有限公司 Fluorine-containing composition and application thereof
CN101805929A (en) * 2010-04-02 2010-08-18 日强光伏科技有限公司 Polycrystalline silicon surface wool manufacturing method
CN101937946A (en) * 2010-09-16 2011-01-05 浙江大学 Surface texture method of solar battery silicon slice
CN102181936A (en) * 2010-10-26 2011-09-14 江阴浚鑫科技有限公司 Method and corrosive liquid for manufacturing multicrystalline silicon texture
CN102330091A (en) * 2011-07-27 2012-01-25 常州时创能源科技有限公司 Additive for polycrystalline silicon wafer acidity texture preparation liquid and use method thereof
CN102330155A (en) * 2011-07-27 2012-01-25 常州时创能源科技有限公司 Monocrystalline silicon wafer etching auxiliary, as well as preparation and using method thereof
CN102443801A (en) * 2010-10-08 2012-05-09 华康半导体股份有限公司 Method for forming micropore structure or groove structure on surface of silicon crystal substrate
CN102593263A (en) * 2012-03-20 2012-07-18 浙江大学 Preparation method of N-type crystalline silicon back emitter junction solar battery and corrosive liquid
CN102586780A (en) * 2012-02-21 2012-07-18 上海正帆科技有限公司 Acidic etching solution, as well as preparation method and application thereof
CN102776573A (en) * 2011-05-11 2012-11-14 镇江荣德新能源科技有限公司 Solar-grade polycrystalline crystal brick surface treatment method
CN102912450A (en) * 2012-10-22 2013-02-06 江苏荣马新能源有限公司 Monocrystalline silicon flocking additive
CN103080273A (en) * 2010-09-01 2013-05-01 巴斯夫欧洲公司 Aqueous acidic solution and etching solution and method for texturizing surface of single crystal and polycrystal silicon substrates
CN103132079A (en) * 2013-02-07 2013-06-05 睿纳能源科技(上海)有限公司 Additive for acid texturing of diamond-wire-cutting polycrystalline silicon slices and application method thereof
CN103409808A (en) * 2013-09-04 2013-11-27 常州时创能源科技有限公司 Texturization additive for polycrystalline silicon slices and use method of texturization additive
CN103451739A (en) * 2013-09-04 2013-12-18 常州时创能源科技有限公司 Monocrystalline silicon wafer texturizing additive and using method thereof
CN103681958A (en) * 2013-10-16 2014-03-26 常州时创能源科技有限公司 Texturization method for multi-crystalline silicon wafer
CN103668467A (en) * 2013-12-20 2014-03-26 常州时创能源科技有限公司 Polycrystalline silicon wafer texturization additive and application thereof
CN104060325A (en) * 2014-06-20 2014-09-24 润峰电力有限公司 Polycrystalline silicon texturing solution and texturing method thereof
CN104094383A (en) * 2011-08-22 2014-10-08 1366科技公司 Formulation for acidic wet chemical etching of silicon wafers
CN104505437A (en) * 2014-12-30 2015-04-08 江西赛维Ldk太阳能高科技有限公司 Texturing preprocessing solution and method of diamond wire cutting polycrystalline silicon wafer, texturing preprocessing silicon wafer and application of texturing preprocessing silicon wafer

Patent Citations (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101096596A (en) * 2006-06-30 2008-01-02 天津晶岭电子材料科技有限公司 Silicon chip etching solution
CN101748002A (en) * 2008-11-28 2010-06-23 安集微电子(上海)有限公司 Fluorine-containing composition and application thereof
CN101805929A (en) * 2010-04-02 2010-08-18 日强光伏科技有限公司 Polycrystalline silicon surface wool manufacturing method
CN103080273A (en) * 2010-09-01 2013-05-01 巴斯夫欧洲公司 Aqueous acidic solution and etching solution and method for texturizing surface of single crystal and polycrystal silicon substrates
CN101937946A (en) * 2010-09-16 2011-01-05 浙江大学 Surface texture method of solar battery silicon slice
CN102443801A (en) * 2010-10-08 2012-05-09 华康半导体股份有限公司 Method for forming micropore structure or groove structure on surface of silicon crystal substrate
CN102181936A (en) * 2010-10-26 2011-09-14 江阴浚鑫科技有限公司 Method and corrosive liquid for manufacturing multicrystalline silicon texture
CN102776573A (en) * 2011-05-11 2012-11-14 镇江荣德新能源科技有限公司 Solar-grade polycrystalline crystal brick surface treatment method
CN102330091A (en) * 2011-07-27 2012-01-25 常州时创能源科技有限公司 Additive for polycrystalline silicon wafer acidity texture preparation liquid and use method thereof
CN102330155A (en) * 2011-07-27 2012-01-25 常州时创能源科技有限公司 Monocrystalline silicon wafer etching auxiliary, as well as preparation and using method thereof
CN104094383A (en) * 2011-08-22 2014-10-08 1366科技公司 Formulation for acidic wet chemical etching of silicon wafers
CN102586780A (en) * 2012-02-21 2012-07-18 上海正帆科技有限公司 Acidic etching solution, as well as preparation method and application thereof
CN102593263A (en) * 2012-03-20 2012-07-18 浙江大学 Preparation method of N-type crystalline silicon back emitter junction solar battery and corrosive liquid
CN102912450A (en) * 2012-10-22 2013-02-06 江苏荣马新能源有限公司 Monocrystalline silicon flocking additive
CN103132079A (en) * 2013-02-07 2013-06-05 睿纳能源科技(上海)有限公司 Additive for acid texturing of diamond-wire-cutting polycrystalline silicon slices and application method thereof
CN103409808A (en) * 2013-09-04 2013-11-27 常州时创能源科技有限公司 Texturization additive for polycrystalline silicon slices and use method of texturization additive
CN103451739A (en) * 2013-09-04 2013-12-18 常州时创能源科技有限公司 Monocrystalline silicon wafer texturizing additive and using method thereof
CN103681958A (en) * 2013-10-16 2014-03-26 常州时创能源科技有限公司 Texturization method for multi-crystalline silicon wafer
CN103668467A (en) * 2013-12-20 2014-03-26 常州时创能源科技有限公司 Polycrystalline silicon wafer texturization additive and application thereof
CN104060325A (en) * 2014-06-20 2014-09-24 润峰电力有限公司 Polycrystalline silicon texturing solution and texturing method thereof
CN104505437A (en) * 2014-12-30 2015-04-08 江西赛维Ldk太阳能高科技有限公司 Texturing preprocessing solution and method of diamond wire cutting polycrystalline silicon wafer, texturing preprocessing silicon wafer and application of texturing preprocessing silicon wafer

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